阅读说明：本技术 等离子体处理装置及物品处理方法 (Plasma processing apparatus and article processing method ) 是由 朱利叶斯·雷加拉多 周昕 肯尼思·切里索 迈尔斯·克拉克 于 2015-12-22 设计创作，主要内容包括：对于通过标准方法不容易洗涤或清洁的物品,使用等离子体清洁或消毒物品是特别有利的。产生大量等离子体的毒性和并发症使其难于用于此类目的。本发明通过产生最小量高活性的等离子体来消毒物品而解决该问题。这是通过减少物品周围和内部的空间和环境空气量来实现的。以这种方式,产生的等离子体仅填充待清洁物品的所需体积,并且等离子体被引导到物体,而不是被引导或释放到非目标区域。(The use of plasma to clean or disinfect items is particularly advantageous for items that are not easily laundered or cleaned by standard methods. The toxicity and complications of generating large amounts of plasma make it difficult to use for such purposes. The present invention solves this problem by generating a minimum amount of highly reactive plasma to sterilize the article. This is achieved by reducing the amount of space and ambient air around and within the article. In this way, the generated plasma fills only the required volume of the item to be cleaned, and the plasma is directed to the object, rather than being directed or released to non-target areas.)

1. A processing apparatus, comprising:

a processing chamber for receiving an article to be processed, the processing chamber comprising at least one conformable wall for forming a volume for holding the article;

a pump operably connected to the processing chamber such that at least a portion of ambient air in the processing chamber can be displaced by the pump, thereby creating a negative pressure that collapses the conformable wall and at least partially conforms to the article and at least partially compresses the article, thereby reducing the volume of the processing chamber, and a working volume of air remains in the processing chamber;

an outflow chamber operatively connected to the pump, the pump repeatedly removing at least a portion of the working volume of air from the processing chamber at least once to isolate in the outflow chamber and return the working volume of air to the processing chamber; and

a plasma generator positioned such that each time air from the working volume flowing out of the chamber is returned to the processing chamber, the working volume of air passes through the plasma generator such that at least a portion of the air moving into the working volume in the processing chamber is converted into a plasma, thereby increasing the concentration of the plasma in the processing chamber.

2. The processing apparatus of claim 1, further comprising the pump configured to move the working volume in the processing chamber to the effluent chamber and past the plasma generator such that at least a portion of the working volume is converted to plasma, thereby increasing the concentration of plasma in the effluent chamber.

3. The processing apparatus of claim 2, further comprising the pump configured to move a portion of air from the ambient environment to the processing chamber after the negative pressure is generated such that the working volume includes a portion of air from the ambient environment.

4. The processing device of claim 2, further comprising an atomization mechanism between the pump and the processing chamber, the atomization mechanism comprising:

a reservoir containing a disinfectant, wherein the disinfectant includes at least one of hydrogen peroxide and alcohol; and

a nozzle between the reservoir and the process chamber; such that when the at least one pump moves the working volume into the treatment chamber, the nozzle atomizes the disinfectant so that it is carried at least once by the working volume into the treatment chamber to disinfect the items.

5. The treatment device of claim 1, further comprising the pump configured to remove air from the outflow chamber prior to the pump moving the working volume into the at least one outflow chamber.

Background

Surface disinfection and odor elimination are common challenges facing both personal and professional environments. Many odors are caused by the presence of microorganisms and the organic matter they produce. By eliminating microorganisms and their by-products, odor can often be controlled or eliminated. There are many methods, materials and techniques that are used for this purpose. Not all articles can be treated in the same manner, however, and some of the currently used techniques and substances for controlling microorganisms or removing organic materials may damage or otherwise undesirably affect the treated articles.

The electrical generation of plasma and reactive gas involves the process of creating an electrical potential difference between the two electrode terminals that is greater than the dielectric strength of the gas between the two terminals, thereby causing electrons to form an arc between the terminals. The interaction between the arc (corona discharge) and the dielectric gas excites the molecules comprising the dielectric gas to a higher energy state, resulting in highly reactive products.

Other methods of generating similar reactive plasmas are known in the art, in addition to generating a corona. The highly reactive plasma effectively destroys organic matter by oxidation. Due to this phenomenon, active plasmas or gases, such as ozone, have long been used to disinfect items and eliminate odors caused by a range of sources of smoke to microorganisms.In the journal article, "Cold Atmospheral Air Plasma ionization acquisition of Air spaces and Other Microorganisms of Clinical Interest", et al reported that a physical Cold atmosphere Surface Microdischarge (SMD) Plasma operating in ambient Air for 30 seconds was very effective for different types of vegetative cells and resulted in 4¹⁰To 6¹⁰Reduction of CFU (colony Forming Unit).

Standard plasma sterilization devices are generally ineffective and present safety issues due to the toxicity of some plasmas. According to EPA, breath ozone can cause various health problems, including chest pain, coughing, throat irritation and congestion. It also worsens bronchitis, emphysema and asthma.

Since plasma is generally unstable, conventional plasma sterilization devices generate plasma in amounts far in excess of that required to react with the actual amount of contaminants present on the articles to be sterilized. The excessive plasma causes inefficiency in the front-end plasma generation process and the back-end plasma removal process. Many devices known in the art can move or purge excess plasma through the item to be sterilized or generate excess plasma to immerse the item therein. Purging and immersion disinfection units are inefficient and may take a long time to complete a disinfection task.

Still other devices employ ozone dissolved in a liquid (e.g., water) that can flow around the items to be disinfected. Not only do the above approaches face the same efficiency challenges, but they also create problems in handling the liquid itself, such as unnecessary weight, spillage, corrosion, leakage, etc. In addition, many articles such as leather shoes and leather bags will be damaged by exposure to liquids.

Some devices employ a vacuum to assist in the cleaning process; however, the vacuum chambers in these devices are generally rigid and do not conform or mold to the article being cleaned. In other words, the articles are not physically squeezed by one or more walls of the chamber, making the device inefficient at removing unwanted air present in small openings or holes in the articles. The use of rigid walls in the vacuum chamber may also require a larger volume of plasma to refill the chamber when the negative pressure is reversed.

Other devices use a flexible chamber to direct a plasma stream onto an item, such as mail or a parcel, to reduce the bioburden on the item. Typically, the process employs a continuous "oxygen-containing" gas stream on the mail piece. While such devices may limit the amount of other gases in the vessel, they are inefficient and often only purge ozone or other plasma on the surface of the article. The plasma or other gas is not mechanically input into the interior, small space or hole of the article. Furthermore, with these devices, the gas passes through the plasma generator once. Thus, the reactive "oxygen-containing" molecules entering the vessel must be generated on the first pass through the generator.

Disclosure of Invention

According to the invention, the problem of generating the minimum amount of highly active plasma needed for the sterilization of objects is solved by reducing the amount of space and surrounding air around and inside the object. In the above manner, the plasma generated by the apparatus of the present invention is directed toward the object to be sterilized, rather than toward the non-target area.

One embodiment of the invention utilizes a housing having a process chamber therein in which a negative pressure can be established and maintained around the items to be sterilized. By removing excess ambient air from the process chamber to create a negative pressure, the amount of plasma required to sterilize the articles is thereby reduced. The process of removing excess ambient air from the chamber may also promote dispersion of the plasma within the processing chamber around various portions of the article and the article. The housing may include a top 51 and a base 52, the top 51 may be attached to the base 52. The base may also serve as a storage area for plasma processing device components. For example, pumps, valves, tubes, outflow chambers, and other components may be stored in the base. It is not essential to the invention that the components be maintained in other parts of the plasma processing apparatus or even remote from the plasma processing apparatus.

Certain embodiments employ a process chamber having at least one compliant wall. The conformable wall may be a material that can be deformed, collapsed, molded, or otherwise shaped around or near the article to reduce the amount of space or volume in the processing chamber. The ability of the conformal wall to substantially conform or mold to the article to be treated, as well as the ability to reduce the amount of non-target space around the article, can further reduce the total amount of plasma required. The compliant wall may also deform softer articles, which may further promote dispersion of the plasma throughout the space and holes around and in the article.

Other embodiments use a treatment chamber in the form of a flexible or elastomeric bag into which the articles can be placed and which is sealed. With this embodiment, the entire bag can adapt to the shape of the article when a negative pressure is reached in the bag.

Another embodiment may have at least one outflow chamber. The treatment chamber may be collapsed by pumping excess air in the treatment chamber to the ambient environment to remove it from the treatment chamber or to store it in the outflow chamber so that it substantially conforms to the shape of the items in the treatment chamber. Thus, the working volume is reduced, thereby reducing the volume of air that must be removed during the treatment cycle. In such embodiments, air in the working volume is transferred back and forth between the process chamber and the second effluent chamber (via the plasma generator) during the process cycle. The reduction in volume results in less time spent pumping air and an increase in the concentration of plasma used to treat the article.

Furthermore, in one embodiment, the present invention contemplates the use of at least one filtering mechanism to remove any excess plasma to protect the user from potentially harmful exposure.

Drawings

In order that a more particular understanding of the invention described above may be obtained by reference to the specific embodiments thereof that are illustrated in the appended drawings. The drawings presented herein may not be to scale and any reference to dimensions in the drawings or the following description is specific to the disclosed embodiments. Any variation of these dimensions which would allow the invention to function for its intended purpose is considered to be within the scope of the invention. Understanding that these drawings depict only typical embodiments of the invention and are not therefore to be considered to be limiting of its scope, the invention will be described and explained with additional specificity and detail through the use of the accompanying drawings in which:

fig. 1 shows an external structure of one embodiment of the housing of the present invention. In this embodiment, the housing includes a base and a top that fits over the base.

Figure 2 shows an embodiment of the invention with the top of the housing removed to show the expansion and contraction of the chamber within the device during processing. Step 1 shows an article placed within a processing chamber. For simplicity, the article is not shown in the remaining steps. In step 2, a process chamber is formed when the device is closed and the compliant wall edge is sealed against the rigid plate. At least one aperture in the rigid plate allows at least a portion of the ambient air to escape from the process chamber and be isolated in the primary effluent chamber. Step 2 shows the end of the primary vacuum cycle, in which the treatment chamber is matched to the surface of the item to be treated and the primary effluent chamber above the treatment chamber expands when filled with excess air from the treatment chamber. (alternatively, instead of using a primary effluent chamber, excess air from the process chamber may be vented to the ambient environment). Once the process chamber substantially matches the shape of the article, a secondary vacuum cycle is initiated. Step 3 shows the end of the secondary vacuum cycle, wherein the item, e.g. boot, is further compressed and the ambient air removed during this compression is directed into the secondary effluent chamber, which is shown above the primary effluent chamber. Step 4 shows the partial refilling of the process chamber as air from the secondary effluent chamber passes through the plasma generator and into the process chamber. The process cycle occurs as ambient air passes back and forth (through the plasma generator) between the secondary effluent chamber and the process chamber. Step 5 shows that at the end of the planned number of processing cycles, the process chamber (the non-plasma air in the primary effluent chamber or from the ambient chamber) eventually refills, and the primary effluent chamber contracts as air is transferred to the process chamber.

Fig. 3A and 3B are schematic views of different structures of a plasma processing apparatus according to the present invention. These structures include a process chamber, a plasma generator, an air pump, and valves for controlling the gas flow. In these structures, air is moved into and out of the ambient environment.

Fig. 4A-4D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The arrangement shown here includes a process chamber, a plasma generator, an air pump, a filter mechanism and a valve for controlling the air flow. In these structures, air is moved into and out of the ambient environment.

Fig. 5A-5D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The arrangement shown here includes a process chamber, a plasma generator, an air pump, a filter mechanism and a valve for controlling the air flow. In these structures, air is moved into and out of the ambient environment.

Fig. 6A and 6B are schematic views of different structures of a plasma processing apparatus according to the present invention. The arrangement shown here includes a process chamber, a plasma generator, an air pump, a filter mechanism, and a multi-way valve for controlling the air flow. In these structures, air is moved into and out of the ambient environment.

Fig. 7A and 7B are schematic views of different structures of a plasma processing apparatus according to the present invention. The arrangement shown here includes a process chamber, a plasma generator, an air pump, a filter mechanism and a valve for controlling the air flow. In these structures, air is moved into and out of the ambient environment.

Fig. 8A-8D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The structure shown here includes a treatment chamber, a plasma generator, an air pump, a scent cartridge, and a valve for controlling air flow. In these structures, air is moved into and out of the ambient environment.

Fig. 9A-9H are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configuration shown in fig. 9A-9D includes a treatment chamber, a plasma generator, an air pump, at least one primary effluent chamber, and a valve for controlling air flow. The configurations shown in fig. 9E-9H include a treatment chamber, a plasma generator, an air pump, a filter mechanism, at least one primary effluent chamber, and a valve for controlling air flow.

Fig. 10A-10D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The arrangement shown here comprises a treatment chamber, a plasma generator, an air pump, a filter mechanism, at least one primary effluent chamber and a valve for controlling the air flow.

Fig. 11A-11D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The structures shown here may include a treatment chamber, a plasma generator, an air pump, an odor box, at least one primary effluent chamber, at least one secondary effluent chamber, and one or more valves for controlling air flow or multi-way valves.

Fig. 12 is a schematic view showing a pneumatic structure of one embodiment of a plasma processing apparatus according to the present invention.

Fig. 13 is a schematic view of air flow when evacuating a process chamber using one embodiment of the plasma processing apparatus according to the present invention.

Fig. 14 is a schematic view of the air flow of one embodiment of a plasma processing apparatus according to the present invention as an article undergoes a processing cycle.

Fig. 15 is a diagram of one embodiment of a plasma processing apparatus according to the present invention. As can be seen in the figure, the conformable sheet collapses around the article before it is processed.

Fig. 16 is an exploded view of the housing base of one embodiment of a plasma processing apparatus according to the present invention, showing how the working components can be fully contained within the apparatus base.

Fig. 17-23 illustrate a method of processing an article using one embodiment of a plasma processing apparatus according to the present invention. Each figure includes a schematic diagram showing the structure of the device and/or the air flow during the different process steps. Also included in each figure is a device diagram showing the condition of the process chamber during each step. Fig. 22B shows an alternative scent delivery device that employs an atomizing mechanism.

FIG. 24 is a diagram of one embodiment of a gas directing component. In this embodiment, one port within the rigid plate connects a hose or tube that can be directed to a specific area of the item for more direct or focused sterilization.

Fig. 25A and 25B show an alternative embodiment of the gas directing component. This embodiment utilizes a cover layer having a plurality of smaller openings that can cover one or more ports in the rigid plate such that gas diffuses upwardly through the cover layer toward the article. Fig. 25B is a cross-section of the cover layer showing how it is placed over the port in the rigid plate.

FIG. 26 illustrates one embodiment of a vacuum storage system that may be used with embodiments of the present invention.

Fig. 27 illustrates one embodiment of a plasma processing apparatus using a conformal bag for a processing chamber.

Fig. 28 shows the plasma treatment device of fig. 27 with an item to be cleaned and/or sterilized placed within the conformal bag and a gas directing component placed therein for more thorough treatment.

Fig. 29 shows the plasma processing apparatus of fig. 28 with the article sealed therein and flowing out of the ambient air in which the chamber has not been filled with the processing chamber.

Detailed Description

The present invention relates to a device and a method for sterilization of objects. More specifically, the present invention provides embodiments of a plasma processing chamber capable of sterilizing an article disposed therein. In particular embodiments, the treatment chamber can be at least partially matched to the shape of the article in order to reduce the volume of plasma required for sterilization of the article.

The invention is particularly useful for disinfecting, particularly controlling or eliminating, odors of household or personal items, particularly porous items or irregularly shaped items, where standard aeration or disinfection procedures may be less effective.

The term "plasma" is used in relation to the present invention for ease of reading only. The term refers to highly reactive ions, atoms and molecules produced by an electric current or corona discharge, regardless of their physical state.

The terms "air" and "gas" are used interchangeably herein to describe a fluid mixture that moves throughout the device during operation.

The present invention is more particularly described in the following examples, which are intended as illustrations only, since numerous modifications and variations therein will be apparent to those skilled in the art. As used in the specification and in the claims, the singular form of "a", "an", and "the" include plural referents unless the context clearly dictates otherwise.

Reference will be made to the drawings wherein like reference numerals are used to refer to the same or similar parts. Referring to the drawings, which illustrate certain embodiments of the invention, it can be seen that in some embodiments of the plasma treatment device 10 of the invention comprising a housing 50, the housing 50 contains a process chamber 100 having dimensionally variable properties, determined by the amount of negative pressure obtained in the process chamber that deforms a bag or conformable wall 102 structure that may form the process chamber. There may also be at least one outflow chamber 3. Furthermore, there may be at least one primary effluent chamber 1 and/or at least one secondary effluent chamber 2. Other embodiments use a conformable bag in which items for treatment may be placed. The conformable bag may, but need not, be within the housing 50.

In one embodiment, the plasma generator 200 is used to form a plasma that can be pumped into the process chamber to sterilize and/or clean the articles. Alternatively, the atomizing mechanism may be used with or in place of the plasma generator to effect sterilization and/or cleaning of the article. Each of these general components may have one or more subcomponents, which will be discussed in detail below.

The description herein does not discuss or particularly describe various control devices known in the art that may be used to operate or direct the devices or components of the present invention. The electrical cord of the present invention is also not discussed in detail. However, those of ordinary skill in the art will know how the various components described herein may be connected, for example, to each other or to a power source, and various types of controllers or operating mechanisms may be configured with the device in such a manner as to enable those skilled in the art to realize the benefits of the present invention. In the simplest iteration, the controller may be an actuator mechanism that moves or changes a component, such as a valve, on the plasma processing device to effect a change in the process or to advance the process. The controller may be operably connected to any of a number of sensors 800, the sensors 800 being capable of detecting a condition and thus operation of the controller. Variations in the type of controller and the manner of attachment of the components of the invention that provide the same functionality and have substantially the same desired results in a manner substantially as described herein are within the scope of the invention.

In one embodiment, plasma processing apparatus 10 includes a plasma generator 200, a processing chamber 100, and means for transferring air between the plasma generator and the processing chamber. The plasma generator may include, but is not limited to, corona, electrolysis, or ultraviolet plasma generation. Some embodiments include a flow generator to facilitate use with the air pump 300 used in the plasma treatment device 10 of the present invention. The various products formed by the plasma generator used in the process of the invention may be in gaseous or plasma form. Alternative embodiments also treat the articles in the processing chamber with the atomized sterilant outside the plasma or use the atomized sterilant in place of the articles in the plasma treatment chamber. For the purposes of this application, treatment refers to reaction with biological or non-biological organic matter, including killing of microorganisms. The treatment may include reducing or eliminating odors associated with such organics.

In one embodiment, the processing chamber 100 has at least one compliant wall 102 that changes shape to at least partially surround or match the shape of the item to be processed. The compliant wall can be sealed to the rigid plate 102 using a gasket 103, one example of which is shown in fig. 16. Materials that may be used for the conformable wall include, but are not limited to, polyethylene, polypropylene, EPDM, fluorinated hydrocarbons (e.g., PTFE), PEEK, or any combination thereof, or any other material that is sufficiently gas impermeable so as to maintain a sufficient pressure differential and to withstand exposure to the various plasmas and chemical products that may be generated during the sterilization process of the present invention.

Because the process chamber 100 can be adjusted to conform to the shape of the items to be processed therein through the use of the compliant wall 102, the volume of air in the process chamber that must be moved during a processing cycle can be reduced, thereby making the apparatus faster and more efficient. The conformability of the process chamber also allows the plasma processing device 10 to compress or compress the items therein when sufficient negative pressure is generated in the process chamber. Such compression or compaction may enhance the removal of contaminants from and penetration of plasma into the voids in the article. If embodiments of the present invention utilize an atomized sterilant, the negative pressure may also improve distribution and penetration of the sterilant in and around the material of the article. This enables the plasma-generating device 10 to achieve faster, deeper processing of porous articles.

In one embodiment, the process chamber 100 can be formed when the housing 50 of the plasma processing apparatus 10 is closed such that the top 51 of the housing is shielded and operably attached to the base 52. As shown in fig. 2, in step 1, a rigid plate 101 may be sealed to a conformable sheet 102 with an article to be treated therebetween. With this embodiment, one or more operating mechanisms of the device 10, such as pumps, valves, conduits, lines, and/or other components, may be stored or retained within the base 52. Alternatively, the various components may be held in other parts of the housing, or even remote from the housing.

In other embodiments, the process chamber consists of a conformable bag 125 having at least one conformable wall 102, such as shown in fig. 27, 28, and 29. The conformal bag may be operably connected to the pump 300 and any necessary components to create a negative pressure therein and inject the desired treatment material (e.g., plasma or sterilant). In one embodiment, the conformable bag is attached to a base in which the pump and other components are stored, one example of which is shown in fig. 27, 28, and 29. The formation of negative pressure within the conformable bag may cause the at least one conformable wall to collapse toward the article such that it at least partially conforms to the shape of the article.

The conformable bag may use a variety of sealing devices 130 and techniques known in the art. In one embodiment, the bag may utilize a reusable seal that allows the bag to be opened and closed for reuse. For example, a sliding seal or zipper seal may be used, such as those commonly used for household storage bags, or a separate component may be attached to the bag to achieve an adequate seal. The bag may also be sealed by folding and pinching or any other means capable of forming an airtight seal.

In one embodiment, the bag may be permanently sealed such that the items placed therein are completely isolated from the surrounding environment. In this embodiment, the conformal bag 125 can be disposable such that the bag can be removed from the pump 300 and any other components of the plasma processing apparatus after the items are cleaned and/or sterilized. A new or replacement bag may then be attached to the plasma processing device to effect processing of another article.

Alternatively, the bag may be reusable, having a seal 130 that allows the bag to be repeatedly opened and closed for receiving and isolating the contents therein. With this embodiment, the conformable bag may be permanently attached to the pump and other components. Alternatively, the bag may be removed and replaced on the plasma processing device. To protect the conformable material of the conformable wall or the conformable bag, embodiments may include an anti-puncture liner disposed within the treatment chamber between the conformable material and the item to be treated. One skilled in the art will be able to determine any of a variety of materials and seals that may be used in a process chamber and to seal embodiments of the present invention.

The transfer of ambient air between the process chamber and the plasma generator may include the use of a vacuum pump 300 and an airtight tube connecting the process chamber 100, the plasma generator 200, and the vacuum pump. Pumps suitable for use in the present invention include, but are not limited to, vibrating piston, diaphragm, oscillating ram, vibrating diaphragm, peristaltic, positive displacement, centrifugal, screw, blower, and rotary vane type pumps.

One embodiment of the plasma processing apparatus includes a valve mechanism 500 for directing the flow of air between various components of the apparatus. Types of valves suitable for use with the present invention include flow reversing valves and selector valves. Flow reversing valves that may be used include, but are not limited to, 4/2, 4/3, 5/2, or 5/3 valves. Multiple solenoid valves may also be provided to allow reversal of the direction of air flow in the system. The airflow diverter valve can be eliminated if a pumping mechanism is used that allows flow reversal. The selection valve may be any valve that allows one common inlet port to select multiple outlet ports. It should be understood that the air flowing between the components may pass through a tube or manifold that is directly connected to one or more components.

While pumping to and from ambient environment 15 is possible (as shown in fig. 3A-8D), certain embodiments of the present invention include one or more effluent chambers 3 connected to process chamber 100 (with respect to gas flow). These outflow chambers facilitate the storage of plasma and odors until they can be slowed and allow for more efficient handling of the items. In one embodiment, the outflow chambers 3 are formed of a rigid material so that they do not change shape or can minimally change shape when air is drawn in. In an alternative embodiment, the outflow chamber is formed of a flexible or conformable material that allows for expansion and contraction as air is pumped into or out of the outflow chamber. Although reference is made herein to primary and secondary effluent chambers, as used herein, these references are only used to indicate the presence of an effluent chamber for a particular purpose, which may be present in at least one unless specifically stated otherwise. Thus, reference to "first" does not mean that there must be two or more. Furthermore, reference to a secondary effluent chamber does not mean that there must be a first. These references are not intended to confer any order, structural orientation, or planarity (e.g., left or right, top or bottom) in time with respect to a particular feature.

In one embodiment, two outflow chambers 3 are included, a primary outflow chamber 1 and a secondary outflow chamber 2. Each effluent chamber (with respect to gas flow) can be connected to a process chamber 100, for example, as shown in fig. 2 and 9A-11D. In this embodiment, ambient air from the process chamber 100 can be pumped into the primary effluent chamber 1 until certain process conditions are met. Such process conditions may be, for example, a predetermined time limit for pumping air, or when a sensor 800, such as a pressure sensor 850, indicates that a predetermined pressure has been reached in the process chamber 100. Air remaining in the process chamber after the first process conditions are met may be pumped into the secondary effluent chamber 2.

In one embodiment, the controller may switch the device from one stage to another (e.g., from a primary to a secondary vacuum cycle) based on achieving a particular "absolute" pressure (as measured against the atmosphere) within the process chamber (as measured by one or more sensors 800). In this embodiment, the pressure will be measured within the process chamber during the primary vacuum cycle. To determine when the chamber walls substantially conform to the article, a one-stage vacuum cycle is continued until the pressure within the chamber reaches a predetermined pressure. The predetermined pressure level depends in part on the rigidity of the compliant walls of the process chamber. For example, thicker or more rigid conformable wall materials may result in lower pressures required to conform the material to the article. One of ordinary skill in the art can determine the appropriate pressure for conforming a chamber made of a particular material by applying a vacuum to the chamber and measuring the pressure as the conformable wall collapses and conforms to the contents of the chamber. To determine the end of the primary vacuum cycle (the point at which the conformable material of the processing chamber substantially conforms to the item within the chamber without substantially squeezing or otherwise deforming the item), the pressure sensor may determine that the pressure within the processing chamber is slightly more negative than the pressure required to deform the conformable wall material. In one embodiment, the negative pressure level sufficient to indicate that the conformable wall 102 substantially conforms to the article 75 may be between about 0.00PSIV to about-14.7 PSIV. In more specific embodiments, a negative pressure level sufficient to indicate that the conformable wall substantially conforms to the article can be between about-0.001 PSIV to about-5 PSIV.

In particular embodiments, once sensor 800 has determined, e.g., via pressure measurements, that the process chamber is substantially conforming to article 75, a secondary vacuum cycle is initiated. The secondary vacuum cycle may compress the article by increasing the vacuum within the process chamber 100, thereby forcing the compliant wall against the article. In this embodiment, the secondary vacuum cycle will continue until at least one of the following three events occurs: 1) the pressure in the chamber reaches a predetermined value; 2) the pressure reaches the maximum vacuum which can be realized by the vacuum pump; or 3) Δ P/Δ t (discussed below) stabilizes or begins to stabilize.

In one embodiment, a sensor 800 operatively connected to the controller will determine the end of the primary or secondary vacuum cycle based on the rate of change of pressure (Δ P/Δ t) measured in the process chamber. This method is less affected by changes in the conformable material in the processing chamber and more affected by the physical deformation characteristics of the processed article. For example, when handling a rigid article 75 (e.g., a lacrosse helmet), at the end of the primary vacuum cycle, the Δ P/Δ t will be much greater than when handling a softer or softer article of similar size (e.g., a throw pillow). In one embodiment, the plasma processing device 10 has different setup options based on the type of article being processed, which will take into account different Δ P/Δ t value parameters for triggering the processing sequence. For example, a setting for soft goods may use a smaller Δ P/Δ t value than a setting for hard goods. During the primary vacuum cycle, as excess air is removed from the process chamber, the pressure within the process chamber may be reduced at a fairly constant rate until the chamber conforms to the article. Once the compliant wall 102 is prevented from collapsing easily (e.g., because it contacts the article), Δ P/Δ t increases rapidly. Thus, measuring the pressure and calculating Δ P/Δ t allows the controller to predict when the chamber wall will substantially conform to the article, at which point the apparatus can initiate a secondary vacuum cycle.

In another embodiment, the Δ P/Δ t value may be used to determine the end of the secondary vacuum cycle. Once one or more pumps begin to reach their maximum vacuum capacity, the Δ P/Δ t value will begin to stabilize and the controller can then switch the device to the next phase. Again, by measuring Δ P/Δ t while observing when the compliant walls of the processing chamber substantially conform to, but do not actually deform, the article, an appropriate value of Δ P/Δ t for indicating the end of the primary vacuum cycle can be empirically determined. The value of Δ P/Δ t used to indicate the end of the secondary vacuum cycle may be determined by the stability of the value of Δ P/Δ t when the pump is near its maximum vacuum or the deformation of the article is stopped.

Some embodiments of plasma processing apparatus 10 measure the rate of change of the load of the pump (change in current (I) over time (t): Δ I/Δ t). Essentially, the same events trigger higher Δ I/Δ t values (e.g., conforming to the article and reaching maximum vacuum), as those triggering Δ P/Δ t values, and this measurement may be used similarly.

Once the predetermined pressure level is reached in the process chamber, the valve mechanism 500 may be operated using any of a variety of controllers, the valve mechanism 500 stopping the removal of ambient air from the primary effluent chamber 1 and starting the removal of residual air from the process chamber so that it enters the secondary effluent chamber 2 instead of the primary effluent chamber 1, and the pump 300 operably connected to the valve mechanism 500 will drop the process chamber vacuum to a more negative pressure, thereby collapsing the conformable wall 102 of the process chamber 100 even further and squeezing or compressing the article as much as possible. Fig. 11A-11D, 12 and 13 show a non-limiting embodiment of a plasma processing apparatus 10 having a primary effluent chamber 1 and a secondary effluent chamber 2. In fig. 13, the primary outflow chamber is formed by the housing 50, with the secondary outflow chamber 2 therein.

One embodiment of the apparatus includes a vacuum storage system 900 to reduce processing time. The vacuum storage system may include a vacuum container 920 capable of withstanding a sufficient negative pressure, a high flow valve 940 capable of withstanding a negative pressure and operably connected to the vacuum container, and a vacuum pump also operably connected to the vacuum container. In one embodiment, the vacuum storage system is operably connected to the process chamber such that ambient air can enter the vacuum vessel from the process chamber when the high flow valve is open.

In another embodiment, when the device is energized and the high flow valve is closed, the vacuum pump may pull a negative pressure on the vacuum vessel to create a negative pressure chamber.

The items to be treated may be initially placed and sealed within the treatment chamber such that when the pressure differential between the two chambers reaches equilibrium, the high flow valve may open and allow rapid flow of air from the treatment chamber to the vacuum vessel. Once pressure equilibrium between the process chamber and the vacuum vessel is reached, the high flow valve may be closed and the vacuum pump activated to again pull pressure on the vacuum vessel. If more air must be removed to achieve the above-mentioned pressure parameters indicating the end of the primary vacuum cycle, the primary vacuum cycle will continue until such parameters are met.

This technique, which utilizes a negative pressure vacuum storage system, allows for very rapid removal of air from a given chamber without the need for a high-flow pump. Instead, a pump may be used to slowly establish a negative vacuum "reservoir" during the idle phase of the process, and a high flow valve may be used to maintain the negative pressure until needed.

In one embodiment, the vacuum vessel is a rigid vessel disposed within the same compartment as the other components of the device. In one embodiment, the vacuum vessel is a rigid cylindrical chamber. In another embodiment, the vacuum vessel is a rigid vessel that is contoured to fill voids around other components in the storage chamber and further assist in holding it in place.

In another embodiment, the ambient air delivered to and from secondary effluent chamber 2 passes through plasma generator 200 as it is pumped between the secondary effluent chamber and the process chamber. This arrangement has several benefits, including: 1) safety-the ultimate volume of gas that can be converted to plasma helps prevent the device from producing a potentially dangerous amount of plasma; 2) efficiency-pumping a smaller volume of air between the process chamber and the secondary effluent chamber, shortens cycle time, and can result in a higher concentration of plasma for treating the article (particularly when the small volume moves between chambers multiple times through the generator). The present invention further contemplates the use of a filtering mechanism to allow the ambient environment 15 to replace the primary effluent chamber 1, the secondary processing chamber 100, or both.

Once the plasma has been pumped into the processing chamber, it can surround and penetrate the fibers, openings, pores, spaces, and contact surfaces on the article 75. The reactivity of the plasma ions may effectively and quickly begin reacting with any biological or other organic material in the processing chamber and/or on the article. To facilitate contact, there may be a pause period 250 during a processing cycle to allow the plasma formed during the processing cycle to remain in the processing chamber for a predetermined time. Figure 2 illustrates one embodiment of how the pause period is incorporated into the processing loop. The length of the pause period depends on several factors including, for example, the type of plasma used, the size or configuration of the article, the amount of organic or biological material on the article, and other factors.

In one embodiment, the primary effluent chamber 1 is a rigid enclosure sealed against the outer surface of a conformable sheet 102 forming the process chamber 100. In this embodiment, the primary effluent chamber may be formed by the top 51 of the housing fitting onto the base 52 and may house the secondary effluent chamber 2 and the process chamber 100 (when the apparatus is closed), one example of which is shown in fig. 15. In another embodiment, the primary effluent chamber 1 has at least one conformable side, or is a conformable bag. Similarly, in certain embodiments, the secondary outflow housing may be rigid, or have at least one compliant side.

Certain embodiments of the present invention include more than one device for delivering air. For example, certain embodiments may include a first pump 300 that rapidly moves excess air from the processing chamber into the primary effluent chamber or ambient 15, and a second pump 300 that has sufficient power to create or increase the negative pressure within the processing chamber in order to move air from the processing chamber into the secondary effluent chamber and compress the articles.

Multiple vacuum pumps in series or parallel may also be used, including at least one embodiment, wherein two or more pumps may be switched between parallel and series configurations. The parallel configuration allows the device to move a larger volume of air in a given amount of time, while the series configuration may increase the negative pressure pulled in the process chamber. Non-limiting examples of these pump configurations are given in fig. 4A-4D.

To monitor pressure differences between the various airways or chambers, which may indicate, for example, when to cause the controller to reconfigure the valve from directing air to primary effluent chamber 1 to directing air to secondary effluent chamber 2, certain embodiments of the present invention also include one or more sensors 800. In one embodiment, the sensor 800 is a pressure sensor 850 capable of detecting and/or responding to pressure within the process chamber 100 and triggering any of a variety of known control mechanisms to initiate a particular event. In another embodiment, a pressure sensor 850 responsive to pressure elsewhere in the system may be used to trigger these same or other events. Fig. 13, 14, and 17-23 illustrate an embodiment utilizing a pressure sensor 850. Pressure sensors and other types of sensors for various purposes and devices are well known in the art. One of ordinary skill in the art will be able to determine an appropriate sensor, whether a pressure sensor or other sensor used in any of the chambers described herein, or a sensor that can be connected to a gas line connected to the chamber that is measuring pressure. In some embodiments, another gas flow meter may be used instead of the pressure sensor 850.

Another embodiment of the present invention may include a filter mechanism 400 to remove unpleasant odors from the item 75 itself and to react with the excess plasma. Fig. 13 and 14 show a non-limiting embodiment including a filter 400. In one embodiment, the filter mechanism will be disposed (relative to the gas flow) between the process chamber 100 and the primary effluent chamber 1, the secondary effluent chamber 2, or the ambient environment 15 (depending on the embodiment). Because some plasmas are considered harmful to humans, a filtering mechanism may provide another measure of safety for embodiments of the present invention. The filter mechanism 400 can include a catalyst (e.g., manganese dioxide) that catalyzes the electrically generated plasma to form a more stable product, or the filter mechanism 400 can be a consumable filter that includes a reactant material (e.g., carbon or an oxidizable metal, such as iron) that will react with the electrically generated plasma to form a more stable product. The filter mechanism 400 may also have a combination of a catalyst and a consumable filter. One embodiment of the filter mechanism 400 using a consumable filter may be a replaceable cartridge.

One embodiment illustrated in fig. 17-23 utilizes at least one odor filter mechanism 401 to remove odors from the air in the process chamber 100 during a primary vacuum cycle, and at least one other plasma filter mechanism 402 to remove excess plasma from the ambient air after the process cycle is complete. For additional safety, certain embodiments include a detection mechanism for determining the level of plasma removal from the processing chamber after a processing cycle before unlocking the processing chamber.

Another embodiment includes a scent cartridge 700 operatively connected (with respect to airflow) to a processing chamber, one embodiment of which is shown in fig. 16 and 17-23. In this embodiment, after the completion of the planned number of processing cycles, air may be actively (e.g., pumped or forced through) or passively (e.g., by releasing a valve that maintains a negative pressure in the processing chamber, allowing intake of ambient air) passed through the scent cartridge 700 into the processing chamber 100 to impart a scent to the treated items. In such embodiments, scent cartridge 700 can be placed in series or parallel with the plasma generator (with reference to the air path). In another embodiment, the scent cartridge 700 may be disposed in series or parallel (with respect to the air path) with the air pump 300. The scent cartridge 700 can also be disposed in series with the valve and operably attached to the process chamber 100. In such embodiments, the valve may be disposed on the side of the scent cartridge 700 that is toward the process chamber 100 or on the side of the scent cartridge 700 that is opposite the process chamber 100. In certain embodiments, the invention also utilizes a scent cartridge having a filter mechanism. In one embodiment, the scent cartridge is combined with a filter mechanism.

Other devices and techniques may be combined with embodiments of the present invention to facilitate effective reduction of viable microorganisms on an article. One embodiment includes a UV light source 150 positioned to emit UV light onto the articles in the treatment chamber. UV lamp devices have been used to kill microorganisms in hospital rooms and other environments. Embodiments of the present invention may have an increased antimicrobial effect using a UV light source. Fig. 2 and 16 show non-limiting examples of how the UV light source may be combined with embodiments of the present invention.

Certain articles may have areas, spaces or structures thereon that may require additional or more direct application of air containing treatment materials (e.g., plasma or disinfectants) to achieve the desired effect of killing microorganisms and removing odors. An additional feature of embodiments of the present invention may be the ability to direct process air in a manner that maximizes the processing of certain articles. One embodiment of the present invention has multiple ports 750 to the process chamber, an example of which is shown in fig. 24 and 25B. Fig. 27, 28, and 29 illustrate a conformable bag. These ports may not only be provided in a particular pattern to regulate the flow of process air into and out of the process chamber, but also to allow for particular arrangements of gas directing members 755 (e.g., hoses, funnels, or diffusers) to be attached to the ports to enhance the treatment of certain items. For example, to treat the interior of a boxing glove, it may be desirable to have the treatment gas enter and exit the interior of the glove directly.

One embodiment includes a gas directing member in the form of a flexible tube attached to at least one port, one example of which is shown in fig. 24, the end of the tube being insertable into the interior of an article (e.g., a glove) to introduce and remove gas from the interior of the article during a processing cycle. Alternatively, it may be desirable to diffuse the gas more generally into and out of the processing chamber, for example, when processing towels. In another embodiment, multiple ports 75 in the walls of the process chamber (e.g., in the rigid plate 101) may be used. In another embodiment, a diffuser attachment may be attached to one or more ports, such as shown in fig. 25A and 25B.

The plasma processing apparatus 10 of the present invention is not limited to processing a particular size of article 75. The size of any article that can be processed is limited only by the size and/or volume of the processing chamber 100. In one embodiment, the plasma treatment device may be hand-portable and suitable for home use. For example, the plasma treatment device of the present invention may be used to treat household articles or clothes, and may have a treatment chamber sized to fit into the portable housing 50. In another embodiment, the portable processing device may be permanently affixed, or at least not portable by hand, and have a processing chamber of sufficient size to accommodate larger items or industrial or commercial use. In one embodiment, the process chamber has a volume of about 50ml to about 500 liters. In a more specific embodiment, the process chamber has a volume of about 200ml to 50 liters.

The device of the present invention can be used to process articles by employing a repeatable process comprising a vacuum phase and a refill phase. One embodiment of this process is shown in fig. 17-23. During the vacuum phase of the process, such as shown in fig. 18, a negative pressure is pulled on the process chamber 100 having the compliant walls 102, thereby collapsing the compliant walls onto the articles and further compressing or compressing the articles being processed to remove as much ambient air from the process chamber as possible. During the refill phase of the process, as shown in fig. 19, the negative pressure is reversed or released within the process chamber until a neutral or positive pressure point is achieved. A vacuum phase is followed by a refill phase, constituting a process cycle. In one particular embodiment, the vacuum phase and the refill phase are repeated multiple times to perform multiple processing cycles.

In another embodiment, there is a last cycle after a plurality of processing cycles. In the final cycle, air enters the process chamber until the pressure in the process chamber is restored or approximately restored to neutral pressure, at which point the articles can be removed from the process chamber, as shown in fig. 23. In one particular embodiment, during the final cycle, the air passes through the scent cartridge before entering the treatment chamber, thereby imparting a scent to the treated item, as shown in fig. 22 and 23.

Embodiments of the method treat an article with a plasma within a processing chamber. In this embodiment, air entering the process chamber during the refill phase passes through the plasma generator 200 before entering the process chamber 100. Since the plasma has high activity, it can attack organic substances in the article. Organic matter on the article is destroyed or may have odor neutralizing, deodorizing or antimicrobial effects.

In an alternative embodiment, the article may be treated with an atomized sterilant as a supplement to or in place of the plasma. Examples of similar atomized disinfectants include, but are not limited to, hydrogen peroxide and alcohols. One embodiment of the apparatus includes an atomizing mechanism 960 to apply atomized sterilant to the articles 75 as the ambient air is moved back into the processing chamber 100. Fig. 22B shows a non-limiting example of this embodiment. In this embodiment, the disinfectant may be used during each treatment cycle or during the last refill cycle. In certain embodiments, the aerosolization mechanism includes a fluid reservoir 965 for containing the disinfectant and a nozzle 970 for aerosolizing the fluid disinfectant into the ambient air path. Examples of atomizing nozzles that may be used with embodiments of the present invention include, but are not limited to, venturi or orifice type nozzles or any other nozzle known in the art that may produce droplets from a reservoir that are small enough that they may be transported to a process chamber by a flow of ambient air. In another embodiment, the atomizing mechanism is preferably connected to the pathway of ambient air to the process chamber and can be activated at the same time as ambient air enters the process chamber so that atomized disinfectant is delivered to the process chamber during the refill phase. In an alternative embodiment, the atomizing mechanism is used to disperse the scent fluid as an alternative or supplement to the sanitizing fluid.

The vacuum phase of the process may include primary and secondary vacuum cycles. In embodiments that include a secondary vacuum cycle, the primary vacuum cycle first removes ambient air from the process chamber 100 so that the compliant walls 102 of the process chamber begin to conform to the item and create a reduced working volume of air within the process chamber. Removal of ambient air during the primary vacuum cycle does not necessarily require but may create a negative pressure within the process chamber. This step in the process may be followed by a secondary vacuum cycle that may pull at least a minimum negative pressure on the process chamber and move all or most of the remaining reduced working volume of ambient air. The secondary vacuum cycle can move the remaining ambient air into the effluent chamber either directly or through a plasma generator. Then, during the refill phase, air from the effluent chamber is returned to the process chamber through the plasma generator. Subsequent processing cycles move the reduced volume of air back and forth (through the plasma generator) between the effluent chamber and the process chamber. Reducing the working volume reduces the amount of time required to pump air back and forth and increases the efficiency of the process (as described above).

As described above, certain embodiments of the plasma processing apparatus use a conformable bag 125 having at least one conformable wall 102 that can be sealed 130 as the processing chamber 100. The conformable bag may utilize any of the methods and assemblies described herein for embodiments using a conformable wall 102 sealed against a rigid plate 101. In embodiments using a conformal bag as the processing chamber, sealed inlet and outlet ports may be created to allow air to flow in and out during the cycle. The port may also include an attachment for a gas directing component. In such embodiments, the process chamber may be sealed within the housing 50, or in alternative embodiments, the process chamber is not enclosed within the housing. For example, when the device is used to treat very large items (e.g., mattresses), it is advantageous to leave the treatment chamber unenclosed. In such an embodiment, the items to be processed would be placed in a conformable bag with the opening of the bag sealed closed.

The method of processing an article using the plasma processing apparatus 10 of the present invention can be started when an article is placed into the processing chamber 100 and the processing chamber 100 is closed. A first vacuum cycle may then begin. In one embodiment, during a primary vacuum cycle, air is removed from the process chamber 100 and enters the ambient environment 15 either directly or through the filter mechanism 400. The primary vacuum cycle may continue until the controller is activated when one or more process conditions are met (e.g., when a limit time is reached or when the pressure sensor 850 indicates that a predetermined pressure is reached in the process chamber 100). The controller may then activate the plasma generator 200 and may initiate a refill cycle in which air is diverted from the ambient environment 15 (either actively-driving the air using the air pump 300, or passively-merely opening a valve to allow for relative pressure equalization) through the activated plasma-generating electrode 200. The active or passive transfer of air to deliver plasma into the processing chamber 100 may continue until the sensor 850 determines that one or more process conditions, as described above, are met and activates the controller 850. In one embodiment, the controller initiates a process pause for a predetermined amount of time while the plasma is in the process chamber for item sterilization. After the process is paused, the controller may be activated to begin the primary vacuum cycle again and pump air from the process chamber 100 through the filter mechanism again and into the ambient environment 15 until the sensors determine that one or more process conditions are met.

In another embodiment, the controller may initiate an additional processing cycle (depending on the planned recipe) in which the controller activates plasma generator 200 and switches the air flow so that it flows from ambient environment 15 through plasma generator 200 and plasma enters processing chamber 100. After the final processing cycle, the controller may initiate a final vacuum cycle in which air from the processing chamber 100 is pumped back to the ambient environment 15, either directly or through the filter mechanism 400. After the scheduled number of processing cycles and final vacuum cycles are completed, the controller may initiate a final flow cycle in which air from the ambient environment 15 enters (actively or passively) the processing chamber 100 until the sensors determine that certain process conditions are met (e.g., time limits, or when the pressure sensor 850 indicates that a preset pressure has been reached within the processing chamber 100). In some embodiments, the final flow cycle delivers air from the ambient environment 15 directly to the processing chamber 100, or in other embodiments, scents the items by the scent cartridge 700. Once the sensors determine that the entire processing scheme has been completed, the article may be removed from the processing chamber 100.

In one embodiment, during a primary vacuum cycle, air is removed from process chamber 100 and passed directly through filter mechanism 400, or through activated plasma generator 200, into primary effluent chamber 1. In such embodiments, the primary vacuum cycle continues until a sensor 800 operatively connected to the controller determines that certain process conditions are met (e.g., a time limit, or when a pressure sensor 850 indicates that a predetermined pressure has been reached within the process chamber 100), indicating that the primary vacuum cycle is over.

In embodiments where the plasma generator has not been activated at the beginning of the primary vacuum cycle, once the primary vacuum cycle is over, the controller may activate the plasma generator 200, and then air may be passed from the primary effluent chamber 1 through the (active or passive) activated plasma generating electrodes that generate plasma, and then pass plasma into the process chamber 100 until the sensor determines and activates the controller when certain process conditions are met (e.g., a time limit, or when the pressure sensor 850 indicates that a preset pressure has been reached in the process chamber 100).

If plasma generator 200 is activated at the beginning of a primary vacuum cycle, generator 200 may remain activated after the end of the primary vacuum cycle and air flows from primary chamber 1 through generator 200 and into process chamber 100. The controller may then initiate a process pause for a predetermined amount of time, thereby allowing time for the plasma to sterilize the article. After the process is suspended, the controller again starts the primary vacuum cycle and pumps air from the process chamber 100 into the primary effluent chamber 1 again through the filter mechanism.

In an alternative embodiment, air is pumped directly from the process chamber 100 to the primary effluent chamber 1 without passing through a filter mechanism until the sensor 800 determines that certain process conditions are met (e.g., a time limit, or when the pressure sensor 850 indicates that a predetermined pressure has been reached in the process chamber 100) and activates the controller.

In one embodiment, the controller initiates additional processing cycles (the number of times depending on the planned recipe), wherein the controller activates plasma generator 200 and switches the air flow such that it flows from primary effluent chamber 1 through plasma generator 200 and plasma enters processing chamber 100. After the final process cycle, the controller initiates a final vacuum cycle in which air from the process chamber 100 is pumped back into the primary effluent chamber 1. After completing these programmed number of process cycles and final vacuum cycles, the controller initiates a final flow cycle in which air from the primary effluent chamber 1 is transferred (actively or passively) into the process chamber 100 until a sensor that determines that the desired process conditions are met activates the controller. The final flow cycle delivers air from the primary effluent chamber 1 directly into the process chamber 100 in one embodiment, or in another embodiment, imparts a scent to the item 75 through the scent cartridge 700. Once the entire processing scheme is complete, the articles may be removed from the processing chamber 100.

In one embodiment, when the controller initiates a primary vacuum cycle, air is removed from the process chamber 100 and enters the primary effluent chamber 1 either directly or through the filter mechanism 400. In at least one embodiment, the primary vacuum cycle continues until it is determined that the sensor meeting the process conditions activates the controller, as described above. The controller may initiate a secondary vacuum cycle in which air from the process chamber 100 is pumped into the secondary effluent chamber 2, and the secondary effluent chamber 2 may also be conformable to allow it to expand or contract. When process conditions are met, for example, when pressure sensor 850 indicates that a predetermined pressure has been reached in processing chamber 100, for example, when there is a lower pressure than the pressure in processing chamber 100, triggering termination of the primary vacuum cycle, the controller may activate plasma generator 200 and switch the air flow so that it flows from secondary effluent chamber 2 through plasma generator 200 and plasma enters processing chamber 100. An example of this method is shown in figure 2.

In another embodiment, the controller may initiate a process pause for a predetermined amount of time while the plasma sterilizes the article. The controller again begins the secondary vacuum cycle and then air from the process chamber 100 is again pumped through the filter mechanism, either through the plasma generator, or directly into the secondary effluent chamber 2 until it is determined that certain process conditions are met. Next, the controller may initiate additional processing cycles (the number depending on the planned recipe) in which the controller activates plasma generator 200 and switches the air flow so that it flows from secondary effluent chamber 2 through plasma generator 200 and plasma enters processing chamber 100. Among the several advantages achieved by this method is the smaller volume of air that is transferred back and forth between the secondary effluent chamber and the treatment chamber, which enables the device to more efficiently treat the articles. The method may also reduce the time to complete each processing cycle. In addition, in embodiments where the air passes through the plasma generator on a back and forth path from the process chamber to the secondary effluent chamber, the amount of air converted to plasma is increased, thereby increasing the concentration of plasma used to process the article.

In at least one embodiment, when the controller initiates a primary vacuum cycle, air from the process chamber 100 is pumped to the ambient environment 15 (either directly or through the filter mechanism 400). In at least one embodiment, the primary vacuum cycle continues to run until the controller determines that certain process conditions are met. Next, the controller initiates a secondary vacuum cycle, wherein the valve is switched to allow air to be pumped from the process chamber 100 into the secondary effluent chamber 2. In one embodiment, the secondary outflow housing 2 is conformable to allow it to expand or contract. When the sensors determine that certain process conditions are met, the controller may activate plasma generator 200 and switch the flow of air from secondary effluent chamber 2 through plasma generator 200 and the plasma into process chamber 100. The controller then initiates a process pause for a predetermined amount of time while the plasma sterilizes the article. After the process is suspended, the controller again begins the secondary vacuum cycle and air is again pumped through the filter mechanism or directly from the process chamber 100 to the secondary effluent chamber 2 until the sensors determine that certain process conditions are met. The controller may initiate additional processing cycles (depending on the planned recipe) wherein the controller activates plasma generator 200 and switches the air flow from secondary effluent chamber 2 through plasma generator 200 and then into processing chamber 100.

After the final processing pause, the controller may initiate a final flow cycle in which air from the processing chamber 100 is pumped through the filter mechanism into the ambient environment 15 until the controller determines that certain process conditions are met. The valves are switched to pump air from the ambient environment 15 into the processing chamber 100, either directly or through the scent cartridge 700, until the controller determines that certain process conditions are met. Once the controller determines that the entire processing scheme has been completed, the article may be removed from the processing chamber 100.

The examples and embodiments described herein are for illustrative purposes only and various modifications or changes in light thereof will be suggested to persons skilled in the art and are to be included within the spirit and purview of this invention.

References in this specification to "one embodiment," "an example embodiment," "another embodiment," "an alternate embodiment," etc., are for convenience in writing. It is intended that any particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment. Furthermore, any elements or limitations of any invention or embodiment thereof disclosed herein can be combined with any and/or all other elements or limitations (alone or in any combination) or any other invention or embodiment thereof disclosed herein, and all such combinations are encompassed within the scope of the invention, rather than limitations thereof.