阅读说明：本技术 一种组合式氯气吸收装置及其工作方法 (combined chlorine absorption device and working method thereof ) 是由 罗欢 于 2019-09-24 设计创作，主要内容包括：本发明涉及一种组合式氯气吸收装置及其工作方法,包括：槽体(1)、射流器(3)、第一类分隔板、出气口(7)、第一类喷淋室(12)；其中,所述槽体(1)包括：蚀刻液室(8)与混合室(9),槽体(1)设置有第一类分隔板(4)来将其分隔为蚀刻液室(8)与混合室(9),所述混合室(9)位于槽体(1)的后部,所述蚀刻液室(8)位于槽体(1)的前部；其中,所述第一类喷淋室(12)置于蚀刻液室(8)的上部,出气口(7)设置在第一类喷淋室(12)的侧部和/或上方,且第一类喷淋室(12)与蚀刻液室(8)之间通气,且设置有第二类气体空间通道。采用本发明的一种组合式氯气吸收装置及其工作方法,能够有效了回收氯气。(the invention relates to a combined chlorine absorption device and a working method thereof, wherein the combined chlorine absorption device comprises the following steps: the jet device comprises a tank body (1), a jet device (3), a first type partition plate, an air outlet (7) and a first type spray chamber (12); wherein, the cell body (1) includes: the device comprises an etching liquid chamber (8) and a mixing chamber (9), wherein the trough body (1) is provided with a first type partition plate (4) for dividing the trough body into the etching liquid chamber (8) and the mixing chamber (9), the mixing chamber (9) is positioned at the rear part of the trough body (1), and the etching liquid chamber (8) is positioned at the front part of the trough body (1); the first-type spray chamber (12) is arranged at the upper part of the etching liquid chamber (8), the gas outlet (7) is arranged at the side part and/or the upper part of the first-type spray chamber (12), and a second-type gas space channel is arranged between the first-type spray chamber (12) and the etching liquid chamber (8). By adopting the combined chlorine absorption device and the working method thereof, the chlorine can be effectively recovered.)

1. A modular chlorine absorption unit, comprising: the jet device comprises a tank body (1), a jet device (3), a first type partition plate (4), an air outlet (7) and a first type spray chamber (12);

wherein, the cell body (1) includes: the device comprises an etching liquid chamber (8) and a mixing chamber (9), wherein the trough body (1) is provided with a first type partition plate (4) for dividing the trough body into the etching liquid chamber (8) and the mixing chamber (9), the mixing chamber (9) is positioned at the rear part of the trough body (1), and the etching liquid chamber (8) is positioned at the front part of the trough body (1);

The first-type spray chamber (12) is arranged at the upper part of the etching liquid chamber (8), the gas outlet (7) is arranged at the side part and/or the upper part of the first-type spray chamber (12), and a second-type gas space channel is arranged between the first-type spray chamber (12) and the etching liquid chamber (8) and is communicated with the etching liquid chamber;

Wherein the lower parts of the etching liquid chamber (8) and the mixing chamber (9) are communicated;

Wherein, the upper parts of the etching liquid chamber (8) and the mixing chamber (9) are communicated and are called as a first type gas space channel;

Wherein the ejector (3) comprises: an etching solution inlet and a gas inlet; wherein, the ejector (3) is arranged above the mixing chamber (9), and the bottom end of the ejector (3) is inserted into the mixing chamber (9).

2. The combined chlorine absorber of claim 1, further comprising: a connecting pump (10); the etching liquid chamber (8) is provided with a liquid outlet, the liquid outlet arranged on the etching liquid chamber (8) is connected with one end of a connecting pump (10) through a pipeline, and the other end of the connecting pump (10) is connected with an etching liquid inlet of the ejector (3) through a pipeline.

3. The combined chlorine absorption unit of claim 1, further comprising: a first liquid outlet valve (5), the first liquid outlet valve (5) being arranged outside the mixing chamber (9) and being connected to the etching apparatus.

4. The combined chlorine absorption unit of claim 1, further comprising: the gas inlet pipeline (2) is connected with a gas inlet of the ejector; the projections of the first type gas space channel and the second type gas space channel on the horizontal plane are mutually vertical, and the outer side of the gas outlet (7) is provided with a gas outlet pipeline.

5. a combined chlorine absorption plant according to claim 1, wherein the partition between the first type of shower (12) and the etching liquid chamber (8) is provided with a plurality of holes, and a plurality of polyhedral hollow spheres are filled below the shower.

6. the modular chlorine absorption unit of any of claims 1 to 5, further comprising: at least 1 second type of shower (13); the second type of spray chamber (13) is also arranged above the etching solution chamber;

The first type spray rooms (12) and the second type spray rooms (13) form a spray room row, namely the first type spray rooms (12) and the second type spray rooms (13) are arranged in a row;

The first type of spray rooms (12) are arranged at the end parts of the spray room rows, and the second type of spray rooms (13) at the other end parts of the spray room rows correspond to the mixing chambers;

the upper part of each second-type spray chamber (13) is provided with a spray pipe, the lower part of each second-type spray chamber is filled with a plurality of multi-surface hollow balls, and an air channel is arranged below each second-type spray chamber and the etching liquid chamber;

The spray chamber rows are set as follows: a second type partition plate (15) is arranged on the left side of the former spray room, and a third type partition plate (14) is arranged on the right side of the latter spray room;

the second type partition plate (15) and the third type partition plate (14) are vertically arranged, a vertical second ventilation channel is formed between the second type partition plate and the third type partition plate, and the second type partition plate (15) and the third type partition plate (14) are both vertical to the first type partition plate (4);

The upper part of the second type partition plate (15) is provided with a vent hole which becomes a first vent channel;

A third air passage is arranged in the middle of the third type partition plate, and the height of the third air passage is lower than that of the bottom plate of the spray chamber;

the first vent channel, the second vent channel and the third vent channel between the former spray chamber and the latter spray chamber form an S shape.

7. the combined chlorine gas absorption unit of claim 6, wherein each of the second type of spray chambers is provided with a controllable on-off type outlet, and an outlet duct is provided outside the controllable on-off type outlet, and each of the first aeration channels of the row of spray chambers is provided with a controllable on-off.

8. The method of operating a modular chlorine absorber unit as claimed in any one of claims 1 to 7, wherein:

The air inlet pipeline (2) is connected with an anode air pipe of the electrolysis equipment, chlorine generated by electrolysis of the electrolysis equipment enters the ejector after passing through the anode air pipe of the electrolysis equipment and the air inlet pipeline (2), and enters a mixing chamber after being mixed with etching liquid in the mixing chamber in the ejector;

Then, the residual chlorine enters the etching liquid chamber through a first type gas space channel of the mixing chamber and the etching liquid chamber, and the chlorine enters the first type spraying chamber through a second type gas space channel of the etching liquid chamber and the first type spraying chamber;

spraying the etching solution by a spraying pipe of the first-class spraying chamber to enable the chlorine gas to react with the sprayed etching solution again;

Finally, the residual chlorine flows into the air outlet pipeline from an air outlet arranged above the first-type spray chamber and returns to the air inlet pipeline again for circular treatment;

Wherein, the etching solution after absorbing chlorine in the mixing chamber is conveyed to etching equipment through a first liquid outlet valve (5), and the etching solution reflows to the spraying pipe after production.

9. the method of operation of claim 8, wherein: the chlorine gas passes through a second type gas space channel of the etching liquid chamber and the first type spray chamber and enters the first type spray chamber in the following mode: chlorine enters the second air channel from the top of the previous spray chamber through the first air channel, then downwards enters the bottom of the next spray chamber from the third air channel, then upwards passes through a plurality of multi-surface hollow balls arranged at the bottom of the next spray chamber, and is circulated for multiple times in sequence.

10. the operating method according to claim 8 or 9, characterized in that: and firstly adjusting the switch of each air outlet of the spray chamber row and the switch of the first ventilation channel between chlorine gas introduction.

Technical Field

the invention relates to the technical field of resource recovery in energy conservation and environmental protection, in particular to a combined chlorine absorption device and a working method thereof.

Background

the recovery of chlorine is an important process of the acid etching solution recycling copper recovery production line, and is a research and development concern of many production enterprises nowadays due to important environmental protection value and economic value.

Such as: CN 109023373A of Jiangsu JingTuo environmental protection science and technology Limited discloses a system for chlorine treatment in an acid etching solution recycling copper recovery system. The chlorine generated in the electrolytic process is subjected to three-stage treatment, firstly, the electrolyzed etching solution is concentrated and separated into the high-acidity etching solution and the low-acidity etching solution in the regenerated solution treatment system, the high-acidity etching solution can be directly used as the etching solution, and the low-acidity etching solution is mixed with the chlorine in the primary treatment system to generate the high-acidity etching solution which is also used as the etching solution, so that the production cost is reduced; and the chlorine which is not completely dissolved is mixed with the sodium hydroxide solution again, so that the content of the chlorine is further reduced, and finally, the chlorine is discharged into the atmosphere through a three-stage treatment system, so that zero emission of the chlorine is basically realized, and the atmospheric environment is protected. In addition, due to the use of the ejector, the mixing uniformity of the chlorine and the low-acidity etching solution or the sodium hydroxide solution is greatly improved, and the absorption rate of the chlorine is improved.

for another example: CN110184607A of Qixintian Zhengzhen environmental protection science and technology Limited in Shenzhen city discloses a chlorine treatment method and treatment system in an acidic etching waste liquid copper extraction recovery system. The chlorine treatment method in the acid etching waste liquid copper extraction recovery system comprises the following steps: washing chlorine generated in the electrolysis process by using a washing solution to remove metallic copper ions included in the chlorine; and absorbing the washed chlorine by using alkaline absorption liquid to obtain hypochlorite.

The following steps are repeated: CN 106395750B of huizhou city zhen ding environmental protection technology ltd discloses: a chlorine treatment process of an acid etching waste liquid copper recovery system comprises the steps of generating industrial-grade bleaching water from waste gas through gas-liquid separation, chlorine purification and chlorine absorption, and the steps are respectively provided with a gas-liquid separation device, a chlorine purification device and a chlorine absorption device, and corresponding reactants are matched in the devices, so that the chlorine is treated by matching with various process links to generate the industrial-grade bleaching water which can be directly applied, and the environment is protected while the economic value is created.

the first two modes need to use alkaline absorption liquid, an acid etching liquid system needs to use an additional alkaline system, the treatment cost is increased, and meanwhile, after the alkaline absorption liquid absorbs chlorine, secondary treatment is carried out, and the chlorine does not return to the circulation of the acid etching liquid system.

In the last approach, the problem is similar to the first two.

The common problem of the three methods is that additional processing equipment is needed, and more importantly, on one hand, the etching solution needs to be continuously supplemented with hydrochloric acid (containing chloride ions); on the other hand, chlorine gas is continuously separated from the etching solution system; on the one hand, more and more waste liquid is treated, and on the other hand, a large amount of hydrochloric acid needs to be supplemented.

Therefore, how to effectively recycle the chlorine gas into the etching solution circulating system becomes a problem to be solved.

Disclosure of Invention

The invention aims to provide a combined chlorine absorption device to solve the problem of hydrochloric acid recovery in the prior art.

another objective of the present invention is to provide a combined chlorine absorption device to solve the problem of how to work the combined chlorine absorption device.

a modular chlorine absorption unit comprising: the jet device comprises a tank body (1), a jet device (3), a first type partition plate (4), an air outlet (7) and a first type spray chamber (12);

Wherein, the cell body (1) includes: the device comprises an etching liquid chamber (8) and a mixing chamber (9), wherein the trough body (1) is provided with a first type partition plate (4) for dividing the trough body into the etching liquid chamber (8) and the mixing chamber (9), the mixing chamber (9) is positioned at the rear part of the trough body (1), and the etching liquid chamber (8) is positioned at the front part of the trough body (1);

The first-type spray chamber (12) is arranged at the upper part of the etching liquid chamber (8), the gas outlet (7) is arranged at the side part and/or the upper part of the first-type spray chamber (12), and a second-type gas space channel is arranged between the first-type spray chamber (12) and the etching liquid chamber (8) and is communicated with the etching liquid chamber;

Wherein the lower parts of the etching liquid chamber (8) and the mixing chamber (9) are communicated;

wherein, the upper parts of the etching liquid chamber (8) and the mixing chamber (9) are communicated and are called as a first type gas space channel;

Wherein the ejector (3) comprises: an etching solution inlet and a gas inlet; wherein, the ejector (3) is arranged above the mixing chamber (9), and the bottom end of the ejector (3) is inserted into the mixing chamber (9).

Further, the method also comprises the following steps: a connecting pump (10); the etching liquid chamber (8) is provided with a liquid outlet, the liquid outlet arranged on the etching liquid chamber (8) is connected with one end of a connecting pump (10) through a pipeline, and the other end of the connecting pump (10) is connected with an etching liquid inlet of the ejector (3) through a pipeline.

further, still include: a first liquid outlet valve (5), the first liquid outlet valve (5) being arranged outside the mixing chamber (9) and being connected to the etching apparatus.

further, still include: and the gas inlet pipeline (2) is connected with a gas inlet of the ejector.

Further, an air outlet pipeline is arranged on the outer side of the air outlet (7).

Furthermore, a plurality of holes are formed in a partition plate between the first-type spray chamber (12) and the etching liquid chamber (8), and a plurality of multi-surface hollow balls are filled below the spray pipe.

Further, the projections of the first type of gas space channel and the second type of gas space channel on the horizontal plane are mutually vertical.

Further, still include: at least 1 second type of shower (13); a second type of spray chamber (13) is also arranged above the etching liquid chamber 8;

the first type spray rooms (12) and the second type spray rooms (13) form a spray room row, namely the first type spray rooms (12) and the second type spray rooms (13) are arranged in a row;

the first type of spray rooms (12) are arranged at the end parts of the spray room rows, and the second type of spray rooms (13) at the other end parts of the spray room rows correspond to the mixing chambers;

the upper part of each second-type spray chamber (13) is provided with a spray pipe, the lower part of each second-type spray chamber is filled with a plurality of multi-surface hollow balls, and an air channel is arranged below each second-type spray chamber and the etching liquid chamber;

The spray chamber rows are set as follows: a second type partition plate (15) is arranged on the left side of the former spray room, and a third type partition plate (14) is arranged on the right side of the latter spray room;

The second type partition plate (15) and the third type partition plate (14) are vertically arranged, a vertical second ventilation channel is formed between the second type partition plate and the third type partition plate, and the second type partition plate (15) and the third type partition plate (14) are both vertical to the first type partition plate (4);

the upper part of the second type partition plate (15) is provided with a vent hole which becomes a first vent channel;

a third air passage is arranged in the middle of the third partition plate 14, and the height of the third air passage is lower than that of the bottom plate of the spray chamber;

The first vent channel, the second vent channel and the third vent channel between the former spray chamber and the latter spray chamber form an S shape.

Furthermore, every second type spray room all is provided with steerable switch type gas outlet, and is provided with the pipeline of giving vent to anger outside steerable switch type gas outlet, and each first air channel of spray room row all sets up steerable switch.

a working method of a combined chlorine absorption device comprises the steps that an air inlet pipeline (2) is connected with an anode air pipe of electrolysis equipment, chlorine generated by electrolysis of the electrolysis equipment enters an ejector after passing through the anode air pipe of the electrolysis equipment and the air inlet pipeline (2), and enters a mixing chamber after being mixed with etching liquid in the mixing chamber in the ejector;

then, the residual chlorine enters the etching liquid chamber through a first type gas space channel of the mixing chamber and the etching liquid chamber, and the chlorine enters the first type spraying chamber through a second type gas space channel of the etching liquid chamber and the first type spraying chamber;

Spraying the etching solution by a spraying pipe of the first-class spraying chamber to enable the chlorine gas to react with the sprayed etching solution again;

And finally, the residual chlorine flows into the gas outlet pipeline from a gas outlet arranged above the first-type spray chamber and returns to the gas inlet pipeline for circular treatment.

Further, the etching solution after absorbing chlorine in the mixing chamber is conveyed to etching equipment through a first liquid outlet valve (5), and the etching solution after production flows back to the spraying pipe.

furthermore, the chlorine gas passes through the etching liquid chamber and the second type gas space channel of the first type spray chamber, and enters the first type spray chamber in the following mode: chlorine enters the second air channel from the top of the previous spray chamber through the first air channel, then downwards enters the bottom of the next spray chamber from the third air channel, then upwards passes through a plurality of multi-surface hollow balls arranged at the bottom of the next spray chamber, and is circulated for multiple times in sequence.

Further, between the chlorine gas introduction, the switches of the respective gas outlets of the shower row and the switch of the first ventilation passage are first adjusted.

by adopting the technical scheme, compared with the prior art, the method has the advantages of the following points.

Firstly, the device is totally enclosed, has high chlorine absorption efficiency, low operation cost and high etching solution reuse rate, and achieves the purposes of energy conservation and emission reduction.

secondly, the design of the device is as follows: jet flow absorption and spray absorption combined design; particularly, the second embodiment provides a design of a spray chamber column, and the spray effect is improved through the design of an S-shaped path.

Thirdly, the concentration of chlorine varies, and the number of spray chambers required to pass varies accordingly. Therefore, the third embodiment proposes the following design for solving the above problems, in which the second type of spray chambers are all provided with controllable switch type air outlets, and air outlet pipelines are arranged outside the controllable switch type air outlets, and the air outlet pipelines are communicated with the air inlet pipelines, so that the chlorine gas which is not completely recovered is further recovered; and each first ventilation channel is provided with a controllable switch (the air outlet and the first ventilation channel are of a controllable switch type, which belongs to the prior art, for example, a valve is arranged on the air outlet, and whether ventilation is controlled by opening and closing the valve). Namely, the design of the third embodiment can realize the amount of chlorine passing through the spray chamber by opening and closing the valve. Thereby realizing the universality of the device.

Description of the drawings:

FIG. 1: example one side elevation view of a modular chlorine absorber.

FIG. 2: a front elevation plan view of a first type of separator plate of embodiment one.

FIG. 3: second embodiment is a front elevation view of a modular chlorine absorber.

the reference numerals in fig. 1-3 are:

The device comprises a tank body 1, an air inlet pipeline 2, an ejector 3, a first type partition plate 4, a first liquid outlet valve 5, a spray pipe 6, an air outlet 7, an etching liquid chamber 8, a mixing chamber 9, a connecting pump 10, a first type spray chamber 12, a second type spray chamber 13, a third type partition plate 14 and a second type partition plate 15.

Detailed Description