阅读说明：本技术 元器件处理设备 (Component processing equipment ) 是由 黄德根 于 2020-05-08 设计创作，主要内容包括：本发明提供一种元器件处理设备,其包括:一个或多个真空吸嘴；一个或多个流量计,被配置的分别测量对应的一个或多个真空吸嘴的实时流量值；以及,控制装置,被配置的获得每个流量计对应的上限范围和/或下限范围,采集每个流量计的实时流量值,并基于采集的每个流量计的实时流量值与对应的上限范围和/或下限范围确定对应的真空吸嘴的工作情况。这样,可以为元器件处理设备的使用、维护和维修提供非常有效的帮助,实现机器的智能化管理。(The invention provides a component processing device, which comprises one or more vacuum suction nozzles; one or more flow meters configured to measure real-time flow values of the corresponding one or more vacuum nozzles, respectively; and the control device is configured to obtain the upper limit range and/or the lower limit range corresponding to each flowmeter, acquire the real-time flow value of each flowmeter, and determine the working condition of the corresponding vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range. Therefore, very effective help can be provided for the use, maintenance and repair of the component processing equipment, and the intelligent management of the machine is realized.)

1. A component processing apparatus, comprising:

one or more vacuum nozzles;

one or more flow meters configured to measure real-time flow values of the corresponding one or more vacuum nozzles, respectively; and

and the control device is configured to obtain the upper limit range and/or the lower limit range corresponding to each flowmeter, acquire the real-time flow value of each flowmeter, and determine the working condition of the corresponding vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range.

2. The component parts handling equipment according to claim 1, wherein at least one vacuum nozzle has a continuous material-free state and a material-free material alternating state, each state of the vacuum nozzle is provided with a corresponding upper limit range and/or lower limit range, the flow meter is capable of providing a real-time flow value in a period of the material-free material alternating state, the control device compares a highest value of the real-time flow value in each period of the material-free material alternating state with the corresponding upper limit range, compares a lowest value of the real-time flow value in each period of the material-free material alternating state with the corresponding lower limit range, determines an operation condition of the corresponding vacuum nozzle in the material-free material alternating state, and compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range, determining the working condition of the corresponding vacuum suction nozzle in the continuous material-free state; alternatively, the first and second electrodes may be,

the control device compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range to determine the working condition of the corresponding vacuum suction nozzle in the continuous material-free state, and the control device determines the working condition of the corresponding vacuum suction nozzle in the material-free state based on the waveform of the real-time flow value in the material-free state.

3. A component processing apparatus as claimed in claim 2, further comprising:

at least one or more motion components configured to cooperate with the vacuum nozzle to cause the vacuum nozzle to pick up or drop a component;

the control device is also configured to collect the action signal of the action component, and determine which state the vacuum suction nozzle is in the continuous material-free state and the material-free alternating state or which state the vacuum suction nozzle is in the continuous material-free state and the material-free state is switched to the material-free state based on the collected action signal of the action component and the real-time flow value of the vacuum suction nozzle.

4. The component processing apparatus according to claim 1, further comprising:

a machine platform;

the rotary table is arranged on the machine table, driven to rotate during work and comprises a plurality of grooves arranged on the edge;

the feeding part comprises a feeding vacuum suction nozzle which is arranged on the machine table and belongs to one of the one or more vacuum suction nozzles;

the discharging part comprises a discharging vacuum suction nozzle which is arranged on the machine table and belongs to one of the one or more vacuum suction nozzles, and a plurality of grooves which are positioned on the edge of the turntable sequentially pass through the feeding vacuum suction nozzle and the discharging vacuum suction nozzle when the turntable rotates;

and the control device determines the working conditions of the corresponding feeding vacuum suction nozzle and the corresponding discharging vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range.

5. The component processing apparatus according to claim 4, further comprising:

a detection device;

an implantation portion comprising an implantation vacuum nozzle belonging to one of the one or more vacuum nozzles;

a carrier tape driving part which drives a carrier tape through the implanting part, wherein the carrier tape comprises a plurality of accommodating grooves arranged in a row; and

wherein the implantation vacuum suction nozzle is communicated with a vacuum pump through a pipeline, the feeding vacuum suction nozzle is communicated with the vacuum pump through a pipeline, the discharging vacuum suction nozzle is controlled by a pipeline to be selectively communicated with one of the vacuum pump and the air outlet pump,

the pan feeding vacuum suction nozzle inhales components and parts through vacuum suction and is located in the recess of pan feeding vacuum suction nozzle department, be located components and parts in the recess of carousel can by detection device detects, arrange material vacuum suction nozzle and will detect normal components and parts through vacuum suction and adsorb and be located in arrange the recess of material vacuum suction nozzle department, arrange material vacuum suction nozzle and will detect unusual components and parts through the thrust of blowing and follow and be located arrange and blow off in the recess of material vacuum suction nozzle department, it will be located through vacuum suction to implant the components and parts in the recess of vacuum suction nozzle department and hold and implant in the groove of accomodating of carrier band.

6. The component processing apparatus according to claim 5,

the feeding part also comprises a feeding track, a separation needle and a positioning detector, the feeding track, the separation needle and the positioning detector are arranged on the machine table, the separation needle is controlled to move between a blocking position and an opening position, components on the feeding track are blocked when the separation needle is at the blocking position, the feeding vacuum suction nozzle sucks the components on the feeding track into a groove at the feeding vacuum suction nozzle through vacuum suction when the separation needle is at the opening position, and the positioning detector is configured to detect whether the components enter the groove at the feeding vacuum suction nozzle;

the discharge part further comprises an electromagnetic valve, a first port of the electromagnetic valve is communicated with a discharge vacuum suction nozzle, a second port of the electromagnetic valve is communicated with the vacuum pump, a third port of the electromagnetic valve is communicated with the air outlet pump, the electromagnetic valve is controlled to selectively communicate the first port with one of the second port and the third port, and the discharge vacuum suction nozzle is controlled to selectively communicate with one of the vacuum pump and the air outlet pump through the electromagnetic valve;

the implantation part further comprises an implantation driving part, the implantation driving part drives the implantation vacuum suction nozzle to reciprocate between a material taking position and an implantation position, the implantation vacuum suction nozzle is used for sucking components in a groove at the position of the implantation vacuum suction nozzle when the material taking position is reached, and the sucked components are implanted into the accommodating groove of the carrier tape when the material implanting position is reached.

7. The component processing apparatus according to claim 5, wherein the flow meter includes:

the first flowmeter is arranged on a pipeline communicated with the feeding vacuum suction nozzle and is configured for measuring the gas flow of the feeding vacuum suction nozzle to obtain a first flow value;

a second flow meter disposed on a conduit in communication with the discharge vacuum nozzle and configured to measure a gas flow rate of the discharge vacuum nozzle to obtain a second flow value;

a third flow meter disposed on a conduit in communication with the implanted vacuum nozzle and configured to measure a flow of gas to the implanted vacuum nozzle to obtain a third flow value.

8. The component processing apparatus according to claim 5, wherein the flow meter includes:

a fourth flow meter disposed on the piping of the vacuum pump, configured to measure a total flow value;

and the communication module is configured to receive the upper limit range and/or the lower limit range corresponding to each flow meter sent by the upper computer.

9. The component processing device according to claim 8, wherein the upper computer generates and updates the upper limit range and/or the lower limit range corresponding to each flow meter based on the total flow value of the vacuum pump, the device type of the component processing device, and the component type transmitted from the communication module.

10. A component processing apparatus as claimed in claim 8, wherein the upper computer is connected to an artificial intelligence module, and the artificial intelligence module generates and updates an upper limit range and/or a lower limit range corresponding to each flow meter according to production record data of one or more component processing apparatuses, and transmits the obtained upper limit range and/or lower limit range corresponding to each flow meter to the upper computer.

11. The component processing device according to claim 8, wherein the upper computer determines whether the component processing device is allowed to operate normally based on a total flow value and a total flow value limit value transmitted from the communication module.

12. The component processing apparatus according to claim 5, wherein each state of the vacuum nozzle is provided with a corresponding upper limit range and/or lower limit range,

the control device performs the following operations:

when the feeding part is in a continuous material-free state, if the acquired flow value of the feeding vacuum suction nozzle is lower than the corresponding upper limit range, determining that the feeding part is in a first vacuum abnormal state; when the feeding part is in a continuous material-free state, if the acquired flow value of the feeding vacuum suction nozzle is higher than the corresponding upper limit range, determining that the feeding part is in a second type of vacuum abnormity; when the feeding part is in a material-existence alternative conversion state, if the high value of the acquired flow value of the feeding vacuum suction nozzle is in the corresponding upper limit range, and the low value of the acquired flow value of the feeding vacuum suction nozzle is higher than the corresponding lower limit range, determining that the feeding part is in vacuum anomaly; and/or

When the discharge part is in a continuous material-free state, if the acquired flow value of the discharge vacuum suction nozzle is lower than the corresponding upper limit range, determining that the first type of discharge part is abnormal in vacuum; when the discharge part is in a continuous material-free state, if the acquired flow value of the discharge vacuum nozzle is higher than the corresponding upper limit range, determining that the second type of discharge part is abnormal in vacuum; when the discharge part is in a state of material existence and material nonexistence, if the high value and the low value of the acquired flow value of the discharge vacuum suction nozzle are converted too slowly, the third type of discharge part is determined to be abnormal in vacuum; and/or

When the implant part is in a continuous material-free state, if the acquired flow value of the implant vacuum suction nozzle is lower than the corresponding upper limit range, determining that the implant part is in a first type of vacuum abnormity; when the implanted part is in a material-free alternative conversion state, if the high value of the acquired flow value of the implanted vacuum suction nozzle is in the corresponding upper limit range, and the low value of the acquired flow value of the implanted vacuum suction nozzle is higher than the corresponding lower limit range, determining that the implanted part is abnormal in vacuum; when the implanted part is in a material-free alternative conversion state, if the high value of the acquired flow value of the implanted vacuum suction nozzle is in the corresponding upper limit range, and the low value of the acquired flow value of the implanted vacuum suction nozzle is in the corresponding lower limit range but is close to the upper limit value of the corresponding lower limit range and regularly fluctuates, determining that the implanted part is in a third abnormal vacuum state; and under the condition that the implanted part is in a material-free alternative conversion state, if the high value of the acquired flow value of the implanted vacuum suction nozzle is in the corresponding upper limit range, and the low value of the acquired flow value of the implanted vacuum suction nozzle is in the corresponding lower limit range and fluctuates irregularly, determining that the implanted part is in vacuum anomaly.

13. The component processing apparatus according to claim 12,

to first kind pan feeding portion vacuum unusual, the suggestion unusual reason is: one or more of insufficient vacuum of the feeding part, blockage of a feeding vacuum suction nozzle, blockage of a pipeline of the feeding part and air leakage of a pipeline in front of a flow meter of the feeding part; to the vacuum anomaly of the second feeding part, the anomaly reason is prompted as follows: the feeding part is over-vacuum; to the vacuum anomaly of the third feeding part, the anomaly reason is prompted as follows: the air leakage of the rear pipeline of the flowmeter of the feeding part; and/or

For the first discharge part vacuum abnormity, the abnormity reason is shown as follows: one or more of insufficient vacuum of the discharge part, blockage of a discharge vacuum suction nozzle, blockage of a pipeline of the discharge part and air leakage of a pipeline in front of a flowmeter of the discharge part; for the second discharge part vacuum abnormality, the abnormality reason is suggested as follows: one or more of overlarge vacuum of the removing part and air leakage of a pipeline behind the flowmeter of the discharging part; for the third discharge part vacuum anomaly, the anomaly reason is suggested as: one or more of aging of an electromagnetic valve of the discharge part and blockage of a discharge vacuum suction nozzle of the discharge part; and/or

The first type of vacuum abnormality of the implant part suggests the causes of the abnormality as: one or more of insufficient vacuum of the implantation part, blockage of an implantation vacuum suction nozzle, blockage of a pipeline of the implantation part and air leakage of the pipeline before a flow meter of the implantation part; the second type of vacuum abnormality of the implant part suggests the causes of the abnormality are: one or more of damage of the implanted vacuum suction nozzle, abrasion of the implanted vacuum suction nozzle and air leakage of a pipeline behind the flow meter of the implanted part; for the third type of vacuum abnormality of the implant part, the abnormality is suggested to be caused by: implanting one or more of a half blockage of the vacuum suction nozzle and a single hole blockage of the vacuum suction nozzle; for the fourth kind of vacuum abnormality of the implanted part, the reason for the abnormality is as follows: abnormal size of the components; and when the fourth implantation part is abnormal in vacuum, judging the nonstandard rate of the components according to the acquired flow value of the implantation vacuum suction nozzle with the preset number of the components.

14. The component processing apparatus according to claim 12,

the control device is also configured to acquire one or more of a rotation action signal of the turntable, an implantation action signal of the implantation part, a feeding action signal of the feeding part and a discharging action signal of the discharging part,

the control device judges whether the implantation part is in a continuous material-free state and a material-free alternate conversion state or not based on the acquired implantation action signal of the implantation part and/or the acquired flow value of the implantation vacuum suction nozzle;

the control device judges whether the feeding part is in a continuous material-free state and a material-free alternate conversion state or not based on the collected feeding action signal of the feeding part and/or the collected flow value of the feeding vacuum suction nozzle;

the control device judges whether the discharge part is in a continuous material-free state or not and whether the discharge part is in a material-free state or not and whether the discharge part is converted into the material-free state or not according to the collected discharge action signal of the discharge part and/or the collected flow value of the discharge vacuum suction nozzle;

the control device is combined with a rotation action signal of the turntable to judge the states of the material discharging part, the material feeding part and the implanting part.

15. The component processing apparatus according to claim 14,

the implantation action signal of the implantation part comprises an action signal of an implantation driving part of the implantation part;

the feeding action signal of the feeding part comprises an action signal of a separation needle of the feeding part and/or a detection signal of the positioning detector;

the discharging action signal of the discharging part comprises the electromagnetic valve switching signal of the discharging part.

16. The component processing apparatus according to claim 14,

in a continuous period of time, when the feeding part continuously has no action signal and the acquired flow value of the feeding vacuum suction nozzle is continuously at a high value, the situation that the feeding part is in a continuous material-free state is judged; when the acquired flow value of the feeding vacuum suction nozzle is matched with the acquired action signal of the feeding part to be alternately switched between a high value and a low value, judging that the feeding part is in a material-existence alternate switching state;

when the implanted part continuously has no action signal and the acquired flow value of the implanted vacuum suction nozzle is continuously at a high value in a continuous period of time, judging that the implanted part is in a continuous material-free state; when the acquired flow value of the implanted vacuum suction nozzle is matched with the acquired action signal of the implanted part to be alternately switched between a high value and a low value, judging that the implanted part is in a material-containing or material-free alternate switching state;

in a continuous period of time, when the discharge part continuously has no action signal and the acquired flow value of the discharge vacuum suction nozzle is continuously at a high value, the discharge part is judged to be in a continuous material-free state; and when the acquired flow value of the discharge vacuum suction nozzle is matched with the acquired action signal of the discharge part and is switched from a low value to a high value, judging that the discharge part is in a material-existing state and is switched to a material-nonexisting state.

Technical Field

The invention relates to the field of component processing, in particular to small-sized component processing equipment.

Background

The existing small-sized component packaging equipment (sometimes also called Taping equipment) mainly utilizes vacuum adsorption to realize feeding of small-sized components such as chips (chips), mainly utilizes switching of vacuum adsorption and air outlet to realize discharging of normal small-sized components after detection, and mainly implants the small-sized components into an accommodating groove of a carrier tape through vacuum adsorption.

However, the existing small-sized component packaging apparatus does not achieve effective management of various vacuums. At present, a plurality of flowmeters and flowmeter induction meters connected with the flowmeters are arranged in various vacuum pipelines of the small-sized components and devices. However, the flow meter sensing meters have alarm limit values set by operators, and the measurement values of all the flow meters exceed the alarm limit values set by the operators to give alarms.

However, problems often arise in the use of vacuum in the Taping apparatus:

1. the alarm mode of the vacuum flowmeter is limit value alarm, and the equipment can not alarm in vacuum because of false alarm or speed reduction, equipment failure and product failure occurrence due to limit value setting;

2. in the actual use of the vacuum flow of the equipment, the vacuum adsorption chip state and the non-adsorption chip state alternately appear at high speed, and the state cannot be distinguished by setting the limit value of the flow meter induction meter;

3. when the suction nozzle is half-blocked or the pipeline is half-blocked due to the problems of dust and the like in vacuum, the flow meter induction meter cannot make correct state judgment;

4. when the vacuum front-end pipeline is not connected and is in an abnormal state, the flow meter induction meter displays that the flow is normal and cannot be detected;

5. when the vacuum front end is blocked (a suction nozzle is blocked and a pipeline is blocked), and the pipeline is damaged and the vacuum is leaked between the blocked part and the mounting part of the flowmeter, the flow rate displayed by the flowmeter induction meter is normal and cannot be detected;

6. during equipment production, materials are replaced, vacuum adsorption is poor due to material size deviation, equipment cannot judge the cause of failure when equipment failure and products are poor, and failure positioning and analysis become very difficult.

In addition, compared with the existing component screening equipment, the existing component screening equipment does not need to implant components into a carrier tape, and only needs to select partial qualified components from the components, such as normal components. The working principle of the component screening equipment is similar to that of the component screening equipment. Of course, there are other component processing devices that use vacuum adsorption to take, discharge and solidify materials, and similar problems exist.

Therefore, it is necessary to improve the vacuum management system of the existing component processing apparatus to solve the above problems.

Disclosure of Invention

It is an object of the present invention to provide a component handling apparatus that solves one or more of the problems of the prior art using an improved vacuum management scheme.

To achieve the object, according to one aspect of the present invention, there is provided a component handling apparatus including one or more vacuum nozzles; one or more flow meters configured to measure real-time flow values of the corresponding one or more vacuum nozzles, respectively; and the control device is configured to obtain the upper limit range and/or the lower limit range corresponding to each flowmeter, acquire the real-time flow value of each flowmeter, and determine the working condition of the corresponding vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range.

Furthermore, at least one vacuum suction nozzle has a continuous material-free state and a material-free alternating state, the various states of the vacuum nozzle are provided with corresponding upper and/or lower limits, the flowmeter can provide real-time flow values in the period of the material-in-material-out alternating state, the control device compares the highest value of the real-time flow value in each period of the material and material existence alternating state with the corresponding upper limit range, compares the lowest value of the real-time flow value in each period of the material and material existence alternating state with the corresponding lower limit range, and determines the working condition of the corresponding vacuum suction nozzle in the material and material existence alternating state, the control device compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range to determine the working condition of the corresponding vacuum suction nozzle in the continuous material-free state; or at least one vacuum suction nozzle has a continuous material-free state and is switched from a material-free state to a material-free state, each state of the vacuum suction nozzle is provided with a corresponding upper limit range and/or lower limit range, the control device compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range to determine the working condition of the corresponding vacuum suction nozzle in the continuous material-free state, and the control device determines the working condition of the corresponding vacuum suction nozzle in the material-free state to the material-free state based on the waveform of the real-time flow value in the material-free state to the material-free state.

Further, the component processing apparatus further includes: a machine platform; the rotary table is arranged on the machine table, driven to rotate during work and comprises a plurality of grooves arranged on the edge; the feeding part comprises a feeding vacuum suction nozzle which is arranged on the machine table and belongs to one of the one or more vacuum suction nozzles; the discharging part comprises a discharging vacuum suction nozzle which is arranged on the machine table and belongs to one of the one or more vacuum suction nozzles, and a plurality of grooves which are positioned on the edge of the turntable sequentially pass through the feeding vacuum suction nozzle and the discharging vacuum suction nozzle when the turntable rotates; and the control device determines the working conditions of the corresponding feeding vacuum suction nozzle and the corresponding discharging vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range.

Further, the component processing apparatus further includes: a detection device; an implantation portion comprising an implantation vacuum nozzle belonging to one of the one or more vacuum nozzles; a carrier tape driving part which drives a carrier tape through the implanting part, wherein the carrier tape comprises a plurality of accommodating grooves arranged in a row; and wherein the implantation vacuum nozzle is communicated with a vacuum pump through a pipeline, the feeding vacuum nozzle is communicated with the vacuum pump through a pipeline, the discharge vacuum suction nozzle is controlled and selectively communicated with one of the vacuum pump and the air outlet pump through a pipeline, the feeding vacuum suction nozzle sucks the components into the groove at the feeding vacuum suction nozzle through vacuum suction, the components in the groove of the turntable are detected by the detection device, the discharging vacuum suction nozzle absorbs the components which are detected normally in the groove positioned at the discharging vacuum suction nozzle through vacuum suction, the discharging vacuum suction nozzle blows out the abnormal component from the groove at the discharging vacuum suction nozzle through air blowing thrust, the implantation vacuum suction nozzle sucks the components in the groove at the implantation vacuum suction nozzle and implants the components into the receiving groove of the carrier tape through vacuum suction.

Compared with the prior art, the invention provides the component processing equipment adopting the improved vacuum management scheme, which stores the upper limit range and/or the lower limit range corresponding to the plurality of flowmeters, so that the vacuum working condition of each suction nozzle is determined based on the acquired flow value of each flowmeter and the corresponding upper limit range and/or lower limit range, and one or more problems in the prior art are solved.

Drawings

FIG. 1 is a schematic top view of a component handling apparatus of the present invention in one embodiment, with some components not shown;

fig. 2 is a side view of a part of the structure of the component processing apparatus in fig. 1, in which only the relevant part of the structure of the material inlet part is schematically shown;

fig. 3 is a side-view enlarged schematic view of a part of the structure of the component processing apparatus in fig. 1, in which only the relevant part of the structure of the discharging part is schematically shown;

fig. 4 is an enlarged side view of a part of the structure of the component processing apparatus in fig. 1, in which only the relevant part of the structure of an implant is schematically shown;

FIG. 5 is a schematic view of a gas passage structure of the component processing apparatus of FIG. 1;

fig. 6 is a schematic circuit configuration diagram of the component processing apparatus in fig. 1;

FIGS. 7a-7c are graphs of real-time waveform data obtained from corresponding flow meters in different states of the implanted vacuum nozzle of the present invention;

FIG. 8a is a graphic diagram illustrating the real-time flow data obtained by the flow meter corresponding to the implanted vacuum nozzle of the present invention and the corresponding action signal;

fig. 8b is an enlarged schematic view of the waveform data obtained by the flow meter of fig. 8a in combination with the corresponding operating signal.

Detailed Description

To further explain the technical means and effects of the present invention adopted to achieve the predetermined objects, the following detailed description of the embodiments, structures, features and effects according to the present invention will be given with reference to the accompanying drawings and preferred embodiments.

The invention provides a component processing device, which adopts an improved vacuum management scheme, can provide very effective help for the use, maintenance and repair of the component processing device, and realizes the intelligent management of a machine. It should be noted that, in this document, the term "processing" in the component processing apparatus has a broad meaning, and the component picking, transferring, detecting, removing, blanking, placing, mounting, and the like can be referred to as the processing of the component. The components herein may include small components such as chips, resistors, capacitors, and the like.

There are many kinds of the component handling apparatuses. Some component processing equipment can pack components into a containing groove in a carrier tape by utilizing the principle of vacuum adsorption, wherein the loading of the components (namely, the picking of the components), the transferring of the components, the detection of the components, the removal of the abnormal components and the implantation of the normal components (namely, the arrangement of the components) are involved, and a plurality of actions are required to be completed through the vacuum adsorption. In addition, some component processing apparatuses are designed not to pack the components into a carrier tape, but to select qualified component devices, and the selected components are directly loaded into the relevant containers, wherein the operations include component loading (i.e., component pickup), component transportation, component detection, abnormal component removal, normal component unloading (i.e., the selected components are directly loaded into the relevant containers), and the like, and the operations are all completed by vacuum adsorption. In addition, there are component handling apparatuses for mounting components on a carrier plate, such as a circuit board, which involve loading of components (i.e., picking up components), transporting of components, mounting of components, and the like, wherein a plurality of operations are performed by vacuum suction.

The description will be given mainly by taking a component handling apparatus for packaging components in receiving grooves in a carrier tape as an example. It is clear that in some embodiments, other component handling apparatuses employ the same vacuum suction principle, and those skilled in the art can apply the vacuum management scheme detailed herein to other types of component handling apparatuses (such as component screening apparatuses or component placement apparatuses) according to the teachings herein.

Fig. 1 is a schematic top view of a component handling apparatus 100 of the present invention in one embodiment, with some components not shown. The component handling apparatus 100 may pack the components 200 into the receiving slots 320 in the carrier tape 300. The component 200 may be a small passive component such as a chip. Before packing components 200 into the accommodating groove 320 in the carrier tape 300, the component processing equipment 100 can also detect the electrical performance of the components 200, and the component processing equipment 100 also needs to eliminate the components 200 which are detected abnormally and keep detecting normal components.

As shown in fig. 1 to 4, the component processing apparatus 100 includes a machine table 180, a turntable 120 disposed on the machine table 180, a feeding portion 110, a discharging portion 130, an implanting portion 140, and a detecting device (not shown).

The driven rotation of the turntable 120 during operation, which may be oriented as D2 in fig. 1, includes a plurality of grooves 121 disposed on the edge of the turntable 120. For simplicity, several recesses 121 are shown in fig. 1 only as an example, which are provided on part of the edge of the turntable 120, in practice, the recesses 121 are provided uniformly on all edge parts of the turntable 120.

Fig. 2 is a side-view enlarged schematic diagram of a part of the structure of the component processing apparatus 100 in fig. 1, in which only the relevant part of the structure of the material inlet portion 110 is schematically shown. Fig. 5 is a schematic view of a gas passage structure of the component processing apparatus in fig. 1. As shown in fig. 1, 2 and 5, the feeding portion 110 includes a feeding vacuum nozzle 111 disposed on the machine platform 180, a feeding rail 113 disposed on the machine platform 180, a separating needle 112 and a positioning detector 114. The implantation vacuum nozzle 111 is in communication with a vacuum pump 151 (shown in FIG. 5) via a conduit. The separator pin 112 is controlled to move between a blocking position and an open position. The component 200 on the feeding track 113 is blocked when the separating pin 112 is in the blocking position, as shown in fig. 2, when the separating pin 112 is in the blocking position. When the separating pin 112 is in the open position, the top end of the separating pin 112 is lower than or equal to the track surface of the feeding track 113, the feeding vacuum nozzle 111 sucks the component 200 on the feeding track 113 into the groove 121 at the feeding vacuum nozzle 111 through vacuum suction, and then the separating pin 112 returns to the blocking position from the normally open position. The docking detector 114 is configured to detect whether the component 200 enters the recess 121 at the feeding vacuum nozzle 111. When the turntable 120 rotates, the grooves 121 of the turntable 120 sequentially pass through the feeding vacuum suction nozzle 111, and are matched with the reciprocating motion of the separating needle 112 between the blocking position and the opening position, so that the components 200 are adsorbed into the grooves 121 of the turntable 120 one by one.

With the rotation of the turntable 120, the detection device can sequentially perform electrical performance detection, such as resistance detection or capacitance detection, on the components 200 adsorbed into the grooves 121 of the turntable 120. For the components 200 that are detected to be abnormal to be excluded from the turntable 120, the bin 130 may be configured to perform the operation of excluding the components 200 that are detected to be abnormal. Of course, the placement unit 130 does not perform the removal operation for the component 200 whose inspection is normal, and it is necessary to suck the component 200 whose inspection is normal.

Fig. 3 is a side-view enlarged schematic diagram of a partial structure of the component processing apparatus 100 in fig. 1, in which only a relevant partial structure of the discharging section 130 is schematically illustrated. As shown in fig. 1, 2 and 5, the discharging portion 130 includes a discharging vacuum nozzle 131, a receiving chamber 132 and a solenoid valve 133 (shown in fig. 5) disposed on the machine. A first port of the electromagnetic valve 133 is communicated with the discharge vacuum nozzle 131, a second port of the electromagnetic valve 133 is communicated with the vacuum pump 151, and a third port of the electromagnetic valve 133 is communicated with the air outlet pump 135. The solenoid valve 133 is controlled to selectively communicate the first port with one of the second port and the third port. The discharge vacuum nozzle 131 is controlled to selectively communicate with one of the vacuum pump 151 and the air outlet pump 135 through a solenoid valve 133.

For the component 200 with normal detection, the electromagnetic valve 133 enables the discharge vacuum nozzle 131 to communicate with the vacuum pump 151, and the discharge vacuum nozzle 131 adsorbs the component with normal detection in the groove 121 at the discharge vacuum nozzle 131 through vacuum suction. For the abnormal component 200, the electromagnetic valve 133 connects the discharge vacuum nozzle 131 with the air pump 135, the discharge vacuum nozzle 131 blows the abnormal component 200 out of the groove 121 at the discharge vacuum nozzle 131 by the blowing thrust, and the blown component 200 falls into the receiving cavity 132. With the rotation of the turntable 120, the grooves 121 on the edge of the turntable 120 sequentially pass through the discharging vacuum nozzles 131 of the discharging unit 130, and the components 200 detected normally can be retained and the components 200 detected abnormally can be removed by cooperating with the action control of the electromagnetic valve 133.

As shown in fig. 1, three discharge portions 130 are schematically illustrated, the discharge vacuum nozzles of which are respectively designated 131a, 131b and 131c, the receiving chambers of which are respectively designated 132a, 132b and 132c, and the three discharge portions 130 also have three solenoid valves 133. Fig. 5 and 6 illustrate only one discharging portion 130. Of course, in other embodiments, one discharge, two discharges or more discharges may be provided, the number of discharges depending on the application and design.

Fig. 4 is an enlarged side view of a partial structure of the component processing apparatus in fig. 1, in which only a relevant partial structure of the implant 140 is schematically shown. As shown in connection with figures 1, 4 and 5,

the implant part 140 includes an implant vacuum nozzle 141 and an implant driving part 142. The implantation vacuum nozzle 141 is in communication with a vacuum pump 151 via a conduit. The implanting vacuum nozzle 141 sucks and implants the components 200 located in the grooves 121 at the implanting vacuum nozzle 141 into the receiving grooves 320 of the carrier tape 300 by vacuum suction. The implantation driving part 142 drives the implantation vacuum nozzle 141 to reciprocate between the material-taking position and the implantation position. As shown in fig. 4, the implantation vacuum nozzle 141 is located at a material removal position, and the implantation vacuum nozzle 141 moves downward to an implantation position (not shown). The implanting vacuum nozzle 141 sucks the components 200 in the grooves 121 at the implanting vacuum nozzle 141 at the pick-up position, and implants the sucked components 200 in the receiving grooves 320 of the carrier tape 300 at the implanting position.

The component processing apparatus 100 further includes a carrier tape drive section (not shown). As shown in fig. 1, the carrier tape driving part drives the carrier tape 300 through the implanting part 140. The carrier tape 300 includes a plurality of receiving grooves 320 arranged in a row and carrier tape holes 310 arranged in a row. The carrier tape driving part drives the receiving slots 320 of the carrier tape 300 forward through the carrier tape holes 310 of the carrier tape 300 to pass through the implanting vacuum nozzle 141 in sequence.

As shown in fig. 1, with the rotation of the turntable 120, the grooves 121 on the edge of the turntable 120 sequentially pass through the material feeding vacuum nozzle 111, the material discharging vacuum nozzle 131 and the implanting vacuum nozzle 141, and cooperate with the reciprocating motion of the separating needle 112 between the blocking position and the opening position, the components 200 are adsorbed into the grooves 121 of the turntable 120 one by one, the components 200 detected normally can be retained by cooperating with the action control of the electromagnetic valve 133, the components 200 detected abnormally can be removed, and the components 200 implanted into the grooves 121 on the edge of the turntable 120 can be sequentially placed into the accommodating grooves 320 of the carrier tape 300 by cooperating with the reciprocating motion of the implanting vacuum nozzle 141 and the forward motion of the carrier tape 300.

Fig. 6 is a schematic circuit diagram of the component processing apparatus 100 in fig. 1. As shown in fig. 5-6, the component processing apparatus 100 further includes a plurality of flow meters and control devices 160. The plurality of flow meters are configured to measure flow values of the feed vacuum nozzle 111, the discharge vacuum nozzle 131, and the implant vacuum nozzle 141, respectively. The control device 160 is configured to store the upper and/or lower limit ranges corresponding to the respective flow meters, collect the flow rate values of the respective flow meters, and determine the vacuum operation of the implant 110, the feeding portion 130, and/or the implant 140 based on the collected flow rate values of the respective flow meters and the corresponding upper and/or lower limit ranges. It should be noted that the control device 160 can collect real-time flow rate values of the flow meter, so that the vacuum conditions can be known in more detail.

The plurality of flow meters may include a first flow meter 115 disposed on a conduit in communication with the feeding vacuum nozzle 111, a second flow meter 134 disposed on a conduit in communication with the discharging vacuum nozzle 131, and a third flow meter 134 disposed on a conduit in communication with the implanting vacuum nozzle 141.

The first flow meter 115 is electrically connected to the control device 160 and is configured to measure the gas flow rate of the inlet vacuum nozzle 111 to obtain a first flow value and transmit the obtained first flow value to the control device 160. The second flow meter 134 is electrically connected to the control device 160, and is configured to measure the gas flow of the discharge vacuum nozzle 131 to obtain a second flow value, and transmit the second flow value to the control device 160. The third flow meter 134 is electrically connected to the control device 160 and is configured to measure the flow of the gas to the implanted vacuum nozzle 141 to obtain a third flow value and to transmit the obtained second flow value to the control device 160. The control device 160 may be a single chip, a programmable controller, a microcontroller, a computing device, or the like.

The component processing apparatus 100 further includes a flow divider 152, and the flow divider 152 is connected to the vacuum pump 151 through a pipe. The vacuum pump 151 is in communication with the feeding vacuum nozzle 111, the discharging vacuum nozzle 131, and the implanting vacuum nozzle 141 through the flow splitter 152. The plurality of flow meters includes: a fourth flow meter 153 disposed on a pipe of the vacuum pump 151, the fourth flow meter 153 may be configured to measure a total flow value.

The docking detector 114 is electrically connected to the control device 160 and provides docking detection signals to the control device 160. The solenoid valve 133 is connected to the control device 160, and the control device 160 can control the solenoid valve 133. The separation needle 112 and the implantation driving part 142 are electrically connected to the control device 160, and the control device 160 controls the actions of the separation needle 112 and the implantation driving part 142. The component processing apparatus 100 further includes a turntable driving portion 122 for driving the turntable 120 to rotate, and the turntable driving portion 122 is electrically connected to the control device 160.

As shown in fig. 6, in an embodiment, the component processing apparatus 100 may further include: and a communication module 170 for communicating with an upper computer (not shown). The upper computer may be a computer device that communicates with the component processing device 100. The communication module 170 may be a wired or wireless module, such as a Wifi wireless communication module, a bluetooth wireless communication module, a USB communication module, an RS485 module, and the like. In one embodiment, the communication module 170 is configured to receive an upper limit range and/or a lower limit range corresponding to each flow meter transmitted by the upper computer.

In one embodiment, the upper computer may generate and update the upper limit range and/or the lower limit range corresponding to each flow meter based on the total flow value of the vacuum pump 151, the device type of the component processing device 100, and the component type transmitted from the communication module 170. The upper limit range and/or the lower limit range corresponding to each flow meter are set in association with the total flow rate value of the vacuum pump 151, the type of the device of the component processing apparatus 100, and the type of the component, and it is necessary to combine these factors to set the upper limit range and/or the lower limit range corresponding to each flow meter appropriately. Of course, other factors may be associated with the setting of the upper and/or lower range for each flow meter, and other factors may need to be considered. Of course, in another embodiment, the upper limit range and/or the lower limit range corresponding to each flow meter may also be directly set on the component processing apparatus 100.

In addition, the upper limit range and/or the lower limit range corresponding to each flow meter of the same component processing apparatus 100 are not constant, and they may vary depending on the use of the apparatus. Therefore, the upper computer may recalculate the upper limit range and/or the lower limit range corresponding to each flow meter periodically or according to a request, and update the parameters into the component processing apparatus 100.

Preferably, the upper computer may be connected to an artificial intelligence module (AI), and the artificial intelligence module may generate and update an upper limit range and/or a lower limit range corresponding to each flow meter according to production record data of one or more component processing apparatuses 100. The production log data includes real-time measurement values measured by the respective flow meters during the production process, the component type, the equipment type of the component processing equipment 100, and the like. One part of the real-time measured values is a high value, namely the flow value obtained by each path of flow meter in a material-free state, and the other part of the real-time measured values is a low value, namely the flow value obtained by each path of flow meter in a material state. The upper limit range of each flowmeter can be accurately obtained by counting the value range of the high position in the real-time measurement value, and the lower limit range of each flowmeter can be accurately obtained by counting the value range of the low position in the real-time measurement value. And the upper computer is communicated with the artificial intelligence module to obtain the upper limit range and/or the lower limit range of each flowmeter.

The upper computer determines whether to allow the component processing apparatus 100 to normally operate (or to be referred to as normal operation) based on the total flow value of the vacuum pump 151 transmitted by the communication module 170 and the total flow value limit value obtained by the fourth flow meter 153.

The upper limit range comprises a highest upper limit value and a lowest upper limit value, if the flow value is between the highest upper limit value and the lowest upper limit value, the flow value is considered to be in the upper limit range, if the flow value is higher than the highest upper limit value, the flow value is considered to be higher than or exceed the upper limit range, and if the flow value is lower than the lowest upper limit value, the flow value is considered to be lower than the upper limit range. Likewise, the lower limit range includes a highest lower limit value and a lowest lower limit value, and if the flow value is between the highest lower limit value and the lowest lower limit value, the flow value is considered to be within the lower limit range, if the flow value is higher than the highest lower limit value, the flow value is considered to be higher than or exceed the lower limit range, and if the flow value is lower than the lowest lower limit value, the flow value is considered to be lower than the lower limit range. For example, if the lowest limit value is 0, the flow rate value is generally not lower than the lower limit range.

Specifically, the first flow meter 115 is provided with a corresponding upper limit range and/or lower limit range, which is an upper limit range and/or lower limit range of the gas flow rate of the material inlet vacuum nozzle 111, the second flow meter 134 is provided with a corresponding upper limit range and/or lower limit range, which is an upper limit range and/or lower limit range of the gas flow rate of the material outlet vacuum nozzle 131, and the third flow meter 143 is provided with a corresponding upper limit range and/or lower limit range, which is an upper limit range and/or lower limit range of the gas flow rate of the material inlet vacuum nozzle 141. In addition, it should be noted that, for each state of each vacuum nozzle, a corresponding upper limit range and/or lower limit range is provided, and the upper limit range and/or lower limit range corresponding to different states may be different or may be the same.

In the invention, the real-time measurement values of the flow meters are collected, so that technical support can be provided for subsequent more accurate analysis, and rich information contained in the real-time measurement values of the flow meters can be extracted. Because the corresponding upper limit range and/or lower limit range is set for the flow value of each flowmeter, the abnormal conditions of various flow values can be distinguished more clearly, so that the reason of the abnormal conditions can be analyzed, the fault removal help is provided for users, the specific conditions of the normal conditions of the flow values can be known, and the health condition of corresponding machine equipment can be evaluated.

The vacuum management scheme employed by the control device 160 is described in detail below.

1) Vacuum management with respect to the material inlet portion 110

When the feeding portion 110 is in a continuous material-free state, if the acquired real-time flow value of the feeding vacuum nozzle 111 is lower than the corresponding upper limit range, the control device 160 determines that the feeding portion vacuum is abnormal of a first type. For the first feeding portion vacuum abnormality, the control device 160 may prompt the abnormality cause: one or more of insufficient vacuum of the feeding part 110, blockage of a feeding vacuum nozzle 111, blockage of a pipeline of the feeding part 110 and air leakage of a pipeline in front of a flow meter of the feeding part 110. When the feeding portion 110 is in a continuous material-free state, if the collected real-time flow value of the feeding vacuum nozzle 111 is higher than the corresponding upper limit range, the control device 160 determines that the feeding portion vacuum is abnormal of the second type. For the second feeding portion vacuum anomaly, the control device 160 may prompt the anomaly cause as follows: the feeding portion 110 is over-vacuumed.

And under the condition that the feeding part 110 is in a material-existence alternative conversion state, if the high value of the acquired real-time flow value of the feeding vacuum suction nozzle 111 is in the corresponding upper limit range, and the low value of the acquired real-time flow value of the feeding vacuum suction nozzle 111 is higher than the corresponding lower limit range, determining that the feeding part is in vacuum anomaly of a third kind. For the third vacuum anomaly of the feeding portion, the control device 160 may prompt the anomaly cause: and the air leakage of the pipeline behind the flowmeter of the feeding part.

The continuous material-free state of the feeding part is provided with a corresponding upper limit range, the material-free state of the feeding part is provided with a corresponding upper limit range and a corresponding lower limit range, and the continuous material-free state of the feeding part and the material-free state of the feeding part are alternately switched in different upper limit ranges.

Therefore, the user can be helped to quickly find out the fault reason of the vacuum abnormity of the feeding part, and the efficiency is improved. In addition, even if the real-time flow value of the feeding part is in the corresponding upper limit range or lower limit range, and the feeding part is normal in vacuum, the health condition of the feeding vacuum suction nozzle 111 of the feeding part can be evaluated according to the real-time flow value of the specific feeding part, and a prompt can be given when the health condition deteriorates to a certain threshold value, so as to avoid abnormal conditions.

The control device 160 is further configured to collect one or more of a rotation signal of the turntable 120, an implantation signal of the implantation portion 140, a feeding signal of the feeding portion 110, and a discharging signal of the discharging portion 130. The feeding action signal of the feeding portion 110 may include an action signal of the separation needle 112 of the feeding portion 110 and/or a detection signal of the docking detector 114. The implant operation signal of the implant part 140 may include an operation signal of the implant driving part 142 of the implant part 140. The discharging operation signal of the discharging unit 130 may include a switching signal of the solenoid valve 133 of the discharging unit 130.

The control device 160 can determine whether the feeding portion 110 is in a continuous material-free state and a material-free alternate switching state based on the collected feeding action signal of the feeding portion 110 and/or the collected real-time flow value of the feeding vacuum nozzle 111. Of course, the control device 160 may also determine the state of the material feeding portion 110 according to the rotation signal of the turntable 120.

In one embodiment, the control device 160 can determine that the material feeding portion 110 is in the continuous material-free state when the material feeding portion 110 has no action signal continuously and the collected real-time flow value of the material feeding vacuum nozzle 111 is continuously at the high value continuously for a continuous period of time. When the collected real-time flow value of the feeding vacuum nozzle 111 is alternatively switched between a high value and a low value in cooperation with the collected action signal of the feeding portion 110, the control device 160 may determine that the feeding portion 110 is in a material-presence/absence alternative switching state.

2) Vacuum management for discharge section 130

When the discharging portion 130 is in a continuous material-free state, if the collected real-time flow value of the discharging vacuum nozzle 131 is lower than the corresponding upper limit range, the control device 160 determines that the first discharging portion vacuum is abnormal. For the first discharge portion vacuum anomaly, the control device 160 may indicate the anomaly reason: the material discharging part is one or more of insufficient vacuum, blockage of a material discharging vacuum suction nozzle, blockage of a pipeline of the material discharging part and air leakage of a pipeline in front of a flowmeter of the material discharging part.

If the collected real-time flow value of the discharge vacuum nozzle is higher than the corresponding upper limit range under the continuous material-free state of the discharge part, the control device 160 determines that the second type of discharge part vacuum is abnormal. For the second type of vacuum anomaly in the discharge portion, the control device 160 may indicate the anomaly cause: one or more of excessive vacuum of the discharging part 130 and air leakage of the rear pipeline of the flowmeter of the discharging part 130

When the discharging portion is in a state of being charged and being converted into a state of being discharged, if the high value and the low value of the collected real-time flow value of the discharging vacuum nozzle are converted too slowly, the control device 160 determines that the discharging portion is in a third vacuum abnormal state. For a third discharge portion vacuum anomaly, the control device 160 may indicate the anomaly reason: one or more of aging of the solenoid valve 133 of the discharge portion 130 and clogging of the discharge vacuum nozzle 131 of the discharge portion 130.

Wherein, a corresponding upper limit range is set for the continuous material-free state of the discharging part 130.

Therefore, the user can be helped to quickly find out the fault reason of the empty abnormity of the discharging part 130, and the efficiency is improved. In addition, even if the real-time flow value of the discharging part 130 is within the corresponding upper limit range, and the discharging part 130 is normally vacuumized, the health condition of the discharging vacuum suction nozzle of the discharging part 130 can be evaluated according to the real-time flow value of the discharging part 130, and a prompt can be given when the health condition deteriorates to a certain threshold value, so as to avoid abnormal occurrence.

The control device 160 may determine whether the discharging portion 130 is in the continuous material-free state and the material-free state based on the collected discharging action signal of the discharging portion 130 and/or the collected real-time flow value of the discharging vacuum nozzle 131. The control device 160 may also determine the state of the discharging unit 130 in combination with a rotation operation signal of the turntable 120.

In one embodiment, when the discharge portion 130 continues to have no operation signal and the collected real-time flow value of the discharge vacuum nozzle 131 continues to be at the high value for a continuous period of time, the control device 160 may determine that the discharge portion 130 is in the continuous material-free state; when the collected real-time flow value of the discharge vacuum nozzle 131 is matched with the collected action signal of the discharge part 130 and is switched from a low value to a high value, the discharge part 130 is judged to be in a material-existing state and is switched to a material-nonexisting state.

3) Vacuum management with respect to implant 140

In the continuous no-material state of the implant 140, the control device 160 may determine that the implant vacuum is abnormal of a first type if the real-time flow value of the implant vacuum nozzle 141 is collected below a corresponding upper range. For the first type of implant vacuum anomaly, the control device 160 may indicate the anomaly cause as: one or more of an implant vacuum deficiency, an implant vacuum nozzle blockage, an implant tubing blockage, an implant pre-flow meter tubing leak.

In the material-filled/material-free alternate switching state of the implant 140, if the acquired high value of the real-time flow value of the implant vacuum nozzle 141 is within the corresponding upper limit range and the acquired low value of the real-time flow value of the implant vacuum nozzle 141 is higher than the corresponding lower limit range, the control device 160 may determine that the implant vacuum is abnormal of a second type. For the second type of vacuum anomaly of the implant, the control device 160 may indicate the anomaly cause: one or more of a breakage of the implanted vacuum nozzle, a wear of the implanted vacuum nozzle, and a leakage of air from the conduit behind the flow meter of the implanted portion.

And under the condition that the implantation part 140 is in a material-free alternate conversion state, if the high value of the acquired real-time flow value of the implantation vacuum suction nozzle 141 is in the corresponding upper limit range, and the low value of the acquired real-time flow value of the implantation vacuum suction nozzle 141 is in the corresponding lower limit range but is close to the upper limit value of the corresponding lower limit range and regularly fluctuates, determining that the implantation part is in a third implantation part vacuum anomaly. For a third type of implant vacuum anomaly, the control device 160 may indicate the anomaly cause: one or more of a half-occlusion of the implanted vacuum nozzle 141, and an occlusion of a single orifice of the implanted vacuum nozzle 141.

In the state that the implanting part 140 is in the material-to-material alternate switching state, if the high value of the collected real-time flow value of the implanting vacuum nozzle 141 is within the corresponding upper limit range, and the low value of the collected real-time flow value of the implanting vacuum nozzle 141 is within the corresponding lower limit range and fluctuates irregularly, the control device 160 may determine that the fourth implanting part is abnormal in vacuum. For the fourth implantation vacuum anomaly, the control device 160 may indicate the anomaly reason: the size of the component is abnormal.

In the event of a fourth implantation vacuum anomaly, the control device 160 can determine the non-standard rate of the components 200 according to the collected real-time flow values of the implantation vacuum nozzles 111 of a predetermined number of component devices (e.g., 100 or other numbers).

The control device 160 may determine whether the implant 140 is in the continuous material-free state and the material-free alternate transition state based on the collected implant motion signal of the implant 140 and/or the collected real-time flow value of the implant vacuum nozzle 141. The control device 160 can also determine the state of the implantation portion 140 in combination with the rotation signal of the turntable 120.

In one embodiment, the control device 160 may determine that the implant 140 is in the material-free state when the implant 140 continues to have no motion signal and the collected real-time flow value of the implant vacuum nozzle 141 continues to be at the high value for a continuous period of time; when the collected real-time flow value of the implanted vacuum nozzle 141 is alternately switched between a high value and a low value in cooperation with the collected operation signal of the implanted part 140, the control device 160 may determine that the implanted part is in a material-presence/absence alternate switching state.

Wherein, a corresponding upper limit range is set for the continuous material-free state of the implantation part 140, and a corresponding upper limit range and a corresponding lower limit range are set for the material-free and material-free alternating conversion state of the implantation part 140, wherein the upper limit range of the continuous material-free state and the upper limit range of the material-free and material-free alternating conversion state of the implantation part 140 are different.

This helps the user to quickly find the cause of the failure of the vacuum abnormality of the implant 140, thereby improving efficiency. In addition, even if the real-time flow value of the implant part 140 is within the corresponding upper limit range or lower limit range, and the vacuum of the implant part 140 is normal, the health condition of the implant vacuum nozzle of the implant part 140 can be evaluated according to the real-time flow value of the specific implant part 140, and a prompt is given when the health condition deteriorates to a certain threshold value, so as to avoid the generation of abnormality.

In one embodiment, the control device 160 may report the vacuum abnormal conditions of the material inlet portion 110, the material discharge portion 130 and the implantation portion 140 to an upper computer, and the upper computer displays, prompts or alarms. Of course, the component processing device 100 may prompt itself, specifically, the component processing device may prompt through a self-configured display screen, or may display the component processing device through a related indicator light. In addition, the control device 160 may also report the vacuum normal conditions of the material inlet portion 110, the material discharge portion 130, and the implantation portion 140 to an upper computer, and the upper computer may analyze the vacuum normal conditions or perform health condition assessment.

The real-time flow value of the implanted vacuum nozzle 141 will be described with reference to the drawings.

Figures 7a-7c are graphs of waveform data obtained from a corresponding flow meter in different states of the implanted vacuum nozzle 141 of the present invention. Fig. 7a is a waveform data diagram (real-time flow rate value) obtained by the corresponding flow meter when the implanted vacuum nozzle 141 is in a material state, wherein the Y-axis is an induced voltage value, the X-axis is time (unit is 10us), and the voltage value obtained by the flow meter fluctuates between 2.02V and 2.62V at a period of 21 ms. Fig. 7b is a waveform data diagram of the flow meter corresponding to the implant vacuum nozzle 141 in the material-free state, wherein the Y-axis represents the induced voltage value and the X-axis represents the time (unit is 10us), and the voltage value obtained by the flow meter fluctuates between 3.75V and 4.15V with a period of 21 ms. Fig. 7c is a waveform data diagram obtained by the corresponding flow meter when the implanted vacuum nozzle 141 is in the material-free alternate switching state, wherein the Y-axis is the induced voltage value, the X-axis is the time, the voltage value obtained by the flow meter fluctuates between 3.75V and 4.15V at this time, and the period is 60-80 ms.

FIG. 8a is a schematic diagram of the real-time flow value waveform data obtained by the flow meter corresponding to the implanted vacuum nozzle of the present invention, and the corresponding action signal. Fig. 8b is a time-enlarged schematic view of a graph of waveform data obtained by the flow meter of fig. 8a in cooperation with corresponding action signals. For clarity, the X-axis is time (in units of 10us) and the Y-axis is amplitude for real-time flow values, where in fig. 8a and 8b not voltage values are already present, but rather mapped values of the voltage values after the scaling. The waveform C1 is waveform data obtained by a flowmeter corresponding to the implanted vacuum suction nozzle, and C2 is a time sequence waveform of the turntable, wherein the high level represents the rotation of the turntable, and the low level represents the immobility of the turntable; c3 is the action signal after the implantation vacuum nozzle moves down, wherein the low level represents the implantation position and the high level represents the material taking position. The falling edge of the action signal after the implanted vacuum suction nozzle moves downwards is delayed by 6.5ms until the flow sensing minimum value, and the falling edge of the action signal after the implanted vacuum suction nozzle moves downwards is delayed by 7.5ms until the flow sensing maximum value is reached. As shown in fig. 8a, in the D1 region of the waveform C1, since the components implanted in the grooves of the corresponding turntable of the vacuum nozzle have been removed in the removal portion, the real-time flow rate value is greatly increased, and in the other portions except the D1 region, the implantation portion 140 is in the material-free alternate switching state, and the real-time flow rate value fluctuates periodically up and down, and the high value of the real-time flow rate value is in the corresponding upper limit range, and the low value of the real-time flow rate value is in the corresponding lower limit range, in cooperation with the operation signal of the turntable and the operation signal of the implantation portion.

Thus, the control device, the upper computer or the artificial intelligence module can obtain the appropriate upper limit range and/or lower limit range of each state according to the real-time flow value collected by the flow meter and related to the implanted vacuum nozzle 141. Therefore, by combining the real-time flow value acquired by the flowmeter and the action signals of all the action parts, the working conditions of all the vacuum suction nozzles, including abnormal conditions and normal conditions, can be analyzed very accurately. For abnormal conditions, analysis and prompt of abnormal reasons can be carried out, for normal conditions, health conditions can be evaluated, and abnormal hidden dangers can be discovered in time.

Similarly, the control device, the upper computer or the artificial intelligence module can obtain the appropriate upper limit range and/or lower limit range of other vacuum suction nozzles in each state according to the real-time flow value acquired by the flowmeter.

According to another aspect of the invention, in one embodiment, the component handling apparatus of the invention comprises one or more vacuum nozzles configured to pick up or drop components; one or more flow meters configured to measure real-time flow values of the corresponding one or more vacuum nozzles, respectively; and the control device is configured to obtain the upper limit range and/or the lower limit range corresponding to each flowmeter, acquire the real-time flow value of each flowmeter, and determine the working condition of the corresponding vacuum suction nozzle based on the acquired real-time flow value of each flowmeter and the corresponding upper limit range and/or lower limit range. The operating conditions may include abnormal conditions and normal conditions.

Preferably, at least one vacuum suction nozzle has a continuous material-free state and a material-free material alternating state, the flowmeter is capable of providing a real-time flow value in a period of the material-free material alternating state, the control device compares a highest value of the real-time flow value in each period of the material-free material alternating state with a corresponding upper limit range, compares a lowest value of the real-time flow value in each period of the material-free material alternating state with a corresponding lower limit range, and determines the working condition of the corresponding vacuum suction nozzle in the material-free material alternating state, and the control device compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range, and determines the working condition of the corresponding vacuum suction nozzle in the continuous material-free state.

Preferably, at least one vacuum suction nozzle has a continuous material-free state and is switched from a material-free state to a material-free state, the control device compares the highest value of the real-time flow value in the continuous material-free state with the corresponding upper limit range to determine the working condition of the corresponding vacuum suction nozzle in the continuous material-free state, and the control device determines the working condition of the corresponding vacuum suction nozzle in the material-free state to the material-free state based on the waveform of the real-time flow value in the material-free state to the material-free state.

Preferably, the component processing apparatus further includes: at least one or more motion components configured to cooperate with the vacuum nozzle to cause the vacuum nozzle to pick up or drop a component; the control device is also configured to collect the action signal of the action component, and determine which state the vacuum suction nozzle is in the continuous material-free state and the material-free alternating state or which state the vacuum suction nozzle is in the continuous material-free state and the material-free state is switched to based on the collected action signal of the action component and the real-time flow value of the vacuum suction nozzle. Therefore, by combining the real-time flow value acquired by the flowmeter and the action signals of all the action parts, the working conditions of all the vacuum suction nozzles, including abnormal conditions and normal conditions, can be analyzed very accurately. The abnormal condition of the needle can be analyzed and prompted according to the abnormal reason of the vacuum, and the health condition can be evaluated according to the normal condition, so that the abnormal hidden danger can be discovered in time.

As used herein, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, including not only those elements listed, but also other elements not expressly listed.

In this document, the terms front, back, upper and lower are used to define the components in the drawings and the positions of the components relative to each other, and are used for clarity and convenience of the technical solution. It is to be understood that the use of the directional terms should not be taken to limit the scope of the claims.

The features of the embodiments and embodiments described herein above may be combined with each other without conflict.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.