阅读说明：本技术 基于lcd技术的曝光工艺以及uv光刻机 (Exposure process based on LCD technology and UV photoetching machine ) 是由 刘建文 于 2021-07-30 设计创作，主要内容包括：本发明提供了一种UV光刻机,所述UV光刻机包括：UV光源,所述UV光源用于产生UV光；LCD液晶透光屏,所述LCD液晶透光屏设于所述UV光源产生的UV光的光通道上,且所述LCD液晶透光屏具有像素点阵,通过调节电压可控制每一所述像素点的透光度；驱动模块,所述驱动模块可根据预先设定的图案数据控制所述LCD液晶透光屏上的像素点的透光度。(The invention provides a UV lithography machine, comprising: a UV light source for generating UV light; the LCD liquid crystal light-transmitting screen is arranged on a light channel of UV light generated by the UV light source, and is provided with a pixel dot matrix, and the transmittance of each pixel point can be controlled by adjusting voltage; and the driving module can control the transmittance of the pixel points on the LCD liquid crystal light-transmitting screen according to preset pattern data.)

1. A UV lithography machine, characterized in that said UV lithography machine comprises:

a UV light source for generating UV light;

the LCD liquid crystal light-transmitting screen is arranged on a light channel of UV light generated by the UV light source, and is provided with a pixel dot matrix, and the transmittance of each pixel point can be controlled by adjusting voltage;

and the driving module can control the transmittance of the pixel points on the LCD liquid crystal light-transmitting screen according to preset pattern data.

2. The UV lithography machine according to claim 1, further comprising:

the image storage unit stores preset patterns and is connected with the driving module to enable the driving module to call data.

3. The UV lithography machine of claim 1, comprising a focusing unit, wherein the focusing unit is disposed between the UV light source and the LCD liquid crystal transparent screen, and UV light emitted by the UV light source is focused and collimated by the focusing unit and then vertically irradiates the LCD liquid crystal transparent screen.

4. The UV lithography machine according to claim 3, wherein the central axes of said UV light source, said focusing unit and said LCD liquid crystal transmission screen are collinear.

5. The UV lithography machine according to claim 1, wherein said LCD liquid crystal light transmissive screen is a normally black hard screen.

6. An exposure process based on LCD technology, using a UV lithography machine according to any one of the claims 1 to 4, characterized in that it comprises the following steps:

coating a photosensitive layer on a product to be processed, wherein the product to be processed comprises a substrate and an imprinting layer coated on the substrate, and the photosensitive layer can react with UV light;

adjusting voltage according to a preset pattern to control the transmittance of each pixel point of the LCD liquid crystal light-transmitting screen to obtain a light-transmitting pattern corresponding to the shape of the preset pattern;

and controlling a UV light source to emit UV light rays, wherein the UV light rays penetrate through the LCD liquid crystal light-transmitting screen to irradiate on the product to be processed.

7. The exposure process according to claim 6, wherein after "controlling a UV light source to emit UV light, and the UV light is irradiated onto the product to be processed through the LCD liquid crystal transmission screen", the exposure process further comprises a developing step of:

and cleaning the irradiated product to be processed by using a developing solution, and removing the photosensitive layer in the area which is not irradiated by light to expose the imprinting layer.

8. The exposure process according to claim 6, wherein after "cleaning the irradiated product to be processed by a developer to remove the photosensitive layer of the region not irradiated with light to reveal the imprint layer", the exposure process further comprises an etching step of:

corroding the exposed imprinting layer on the product to be processed by using a corrosive agent, wherein the corrosive agent does not react with the photosensitive layer;

and removing the photosensitive layer on the product to be processed.

9. The exposure process according to claim 6, wherein the UV lithography machine further comprises an image storage unit, the image storage unit stores a preset pattern, and the preset pattern stored in the image storage unit is called according to the obtained calling instruction.

10. The exposure process according to claim 6, wherein the UV lithography machine further comprises a port connected for external communication, and the port receives externally transmitted data information before "adjusting the voltage according to the predetermined pattern to control the transmittance of each pixel of the LCD liquid crystal transparent screen to obtain a light transmission pattern corresponding to the shape of the predetermined pattern".

Technical Field

The invention relates to the technical field of UV lithography, in particular to an exposure process based on an LCD technology and a UV lithography machine.

Background

The exposure is to project the pattern on the mask plate onto the photoresist through an optical system by utilizing illumination to realize pattern transfer. The exposure process carries out exposure imaging in a mode of LCD screen projection, the front and back processes are completely compatible with the traditional process, and the process is widely applied to screen printing industries such as printing, stained paper, packaging, PCB, label tags, automobile glass, household appliance glass, electronic glass, decoration and the like,

for example, when the product to be processed is a PCB, the photoresist layer of the PCB is a copper layer, and the chemical agent used is an agent capable of corroding copper metal. The method comprises the steps of printing a circuit pattern on a preset film or a preset mask plate (a photosensitive film printed with the pattern), irradiating UV light through the film/the mask plate, allowing the UV light to pass through a transparent area and then directly irradiate a product to be processed, wherein the light cannot penetrate through the opaque area after being irradiated on the opaque area, coating an engraving layer on the product to be processed at the moment, coating a resistance agent layer on the engraving layer, allowing the resistance agent layer to react with purple light, removing a product after the reaction by using a developing solution, leaving an unsensitized resistance agent layer (corresponding to the preset pattern), etching the product to be processed with the unsensitized resistance agent layer, and etching a copper sheet without the resistance agent layer to form a preset circuit diagram.

However, in the existing method, no matter the film or the mask is adopted, new films and masks need to be used every time exposure is performed, the service life of the film and mask is short, once too many printed patterns exist, the service frequency of all the films and masks needs to be recorded so as to judge the service life, and a mode capable of using the films or the masks is needed, so that an exposure process based on the LCD technology and a UV photoetching machine are needed.

Disclosure of Invention

The invention provides an exposure process based on an LCD technology and a UV photoetching machine, and aims to solve the technical problems mentioned in the background technology.

The invention provides a UV lithography machine, comprising:

a UV light source for generating UV light;

the LCD liquid crystal light-transmitting screen is arranged on a light channel of UV light generated by the UV light source, and is provided with a pixel dot matrix, and the transmittance of each pixel point can be controlled by adjusting voltage;

and the driving module can control the transmittance of the pixel points on the LCD liquid crystal light-transmitting screen according to preset pattern data.

Further, the UV lithography machine further includes:

the image storage unit stores preset patterns and is connected with the driving module to enable the driving module to call data.

Furthermore, the UV photoetching machine comprises a focusing unit, the focusing unit is arranged between the UV light source and the LCD liquid crystal light-transmitting screen, and UV light emitted by the UV light source vertically irradiates the LCD liquid crystal light-transmitting screen after being focused and collimated by the focusing unit.

Further, the central axes of the UV light source, the focusing unit and the LCD liquid crystal light-transmitting screen are collinear.

Further, the LCD liquid crystal light-transmitting screen is a normally black hard screen.

The invention also provides an exposure process based on the LCD technology, which adopts the UV photoetching machine and comprises the following steps:

coating a photosensitive layer on a product to be processed, wherein the product to be processed comprises a substrate and an imprinting layer coated on the substrate, and the photosensitive layer can react with UV light;

adjusting voltage according to a preset pattern to control the transmittance of each pixel point of the LCD liquid crystal light-transmitting screen to obtain a light-transmitting pattern corresponding to the shape of the preset pattern;

and controlling a UV light source to emit UV light rays, wherein the UV light rays penetrate through the LCD liquid crystal light-transmitting screen to irradiate on the product to be processed.

Further, after the step of controlling the UV light source to emit UV light rays, and irradiating the UV light rays onto the product to be processed through the LCD liquid crystal light-transmitting screen, the exposure process further comprises the step of developing:

and cleaning the irradiated product to be processed by using a developing solution, and removing the photosensitive layer in the area which is not irradiated by light to expose the imprinting layer.

Further, after "cleaning the irradiated product to be processed by a developing solution, and removing the photosensitive layer in the region not irradiated by light to expose the imprint layer", the exposure process further includes an etching step of:

corroding the exposed imprinting layer on the product to be processed by using a corrosive agent, wherein the corrosive agent does not react with the photosensitive layer;

and removing the photosensitive layer on the product to be processed.

Further, the UV lithography machine further comprises an image storage unit, wherein a preset pattern is stored in the image storage unit, and the preset pattern stored in the image storage unit is called according to the obtained calling instruction.

Furthermore, the UV lithography machine also comprises a port which is in communication connection with the outside, receives data information transmitted from the outside through the port, and receives the preset pattern transmitted from the outside through the port before 'adjusting the voltage according to the preset pattern to control the transmittance of each pixel point of the LCD liquid crystal light-transmitting screen to obtain the light-transmitting pattern corresponding to the shape of the preset pattern'.

According to the invention, the LCD liquid crystal light-transmitting screen is arranged to replace a film used in the existing exposure process, and different patterns (such as circuit diagrams to be processed) are displayed on the LCD liquid crystal light-transmitting screen by utilizing the characteristic that the LCD liquid crystal light-transmitting screen can control the light transmittance of each pixel point by adjusting the voltage. Therefore, on one hand, the patterns displayed by the LCD liquid crystal transparent screen are only required to be changed in the face of exposure of different patterns, films do not need to be replaced, a large number of films with different patterns do not need to be stored, and the method conforms to the current trend of electronic informatization; on the other hand, the LCD liquid crystal light-transmitting screen replaces a film or a mask plate, so that the situation that the use frequency of different films or masks is different and the service lives of the films or masks are different is avoided, and the use times of the films or masks do not need to be recorded and stored.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.

Drawings

Fig. 1 is a schematic structural diagram of a UV lithography machine according to an embodiment of the present invention.

FIG. 2 is a schematic diagram of a specific implementation of the embodiment of FIG. 1.

FIG. 3 is a flowchart illustrating steps of an exposure process based on LCD technology according to an embodiment of the present invention.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative only and should not be construed as limiting the invention.

As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, or operations, but do not preclude the presence or addition of one or more other features, integers, steps, operations, or groups thereof.

It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

It will be appreciated by those skilled in the art that the terms "application," "application program," "application software," and the like, as used herein, are intended to refer to a computer software product electronically-adapted to be electronically-constructed, from a collection of computer instructions and associated data resources, in accordance with the principles of the present invention. Unless otherwise specified, such nomenclature is not itself limited by the programming language class, level, or operating system or platform upon which it depends. Of course, such concepts are not limited to any type of terminal.

Lithography machines (also known as exposure machines) transmit image information from a film or other transparent body to a machine coated with a photosensitive material by turning on light, emitting ultraviolet wavelengths. One of the most critical processes in the printed circuit board manufacturing process is the transfer of a negative image to the copper foil substrate. Firstly, a layer of photosensitive material (such as liquid photosensitive glue, a photosensitive anticorrosive dry film and the like) is coated on a substrate; then, the photosensitive material coated on the substrate is irradiated with light to change its solubility. The material of the non-irradiated area is not polymerized and dissolved under the action of the developer, and the material of the irradiated area is left on the substrate to form an image. This process is known as exposure, i.e. the process carried out by a lithography machine in the production of printed circuit boards.

Referring to fig. 1-2, the present invention provides a UV lithography machine 100, wherein the UV lithography machine 100 comprises:

a UV light source 10, the UV light source 10 for generating UV light.

LCD liquid crystal screen 30 that passes through, LCD liquid crystal screen 30 that passes through locates on the light channel of the UV light that UV light source 10 produced, just LCD liquid crystal screen 30 has the pixel dot matrix, through the steerable each of regulation voltage the transmittance of pixel.

And the driving module can control the transmittance of the pixel points on the LCD transparent screen 30 according to preset pattern data.

In the invention, the LCD liquid crystal transparent screen 30 is arranged to replace a film used in the existing exposure process, and different types of patterns (such as circuit diagrams to be processed) are displayed on the LCD liquid crystal transparent screen 30 by utilizing the characteristic that the LCD liquid crystal transparent screen 30 can control the transmittance of each pixel point by adjusting voltage. Therefore, on one hand, in the face of exposure of different patterns, only the pattern displayed by the LCD liquid crystal transparent screen 30 needs to be changed, the film does not need to be replaced, a large number of films with different patterns do not need to be stored, and the method conforms to the current trend of electronic informatization; on the other hand, the LCD liquid crystal transparent screen 30 is used for replacing films or masks, so that the situation that the use frequency of different films or masks is different and the service lives of the films or masks are different is avoided, and the use times of the films or masks do not need to be recorded and stored.

For the LCD liquid crystal light-transmitting panel 30, each pixel can be simplified in structure as if a layer of liquid crystal is sandwiched between the pixel electrode and the common electrode. More importantly, it can be seen as a capacitor from an electrical point of view. To charge the pixels P (i, j) in j rows and i columns, the switch T (i, j) is turned on, and a target voltage is applied to the signal line d (i). When the pixel electrode is sufficiently charged, even if the switch is turned off, the charge in the capacitor is stored, and the liquid crystal layer molecules between the electrodes continue to be applied with the voltage application field. The data (column) driver functions to apply a target voltage to the signal lines, and the gate (row) driver functions to turn on and off the switches. Since the display voltage applied to the liquid crystal layer can be stored in the storage capacitance of each pixel, the liquid crystal layer can be operated stably. The key to displaying images is also the molecular orientation of the liquid crystals under the influence of an electric field. Different display modes are generally realized by subjecting the inside of the substrate 200 to an alignment treatment to deform the arrangement of liquid crystal molecules into a desired structure. A certain display mode is selected, liquid crystal molecules generate orientation change under the action of an electric field, and the intensity of incident light after passing through the liquid crystal layer is changed along with the orientation change through the matching of the liquid crystal molecules and the polaroid. Thereby realizing image display.

The UV lithography machine 100 further comprises an image storage unit, wherein the image storage unit stores preset patterns, and is connected with the driving module to enable the driving module to call data. When the image storage unit is arranged in the UV lithography machine 100, the pattern to be processed can be stored in the image storage unit in advance so as to be extracted at any time for performing the exposure process, so that the UV lithography machine 100 can be operated offline for exposure only by transmitting data once.

The UV lithography machine 100 further comprises a port communicatively connected to the outside, through which externally transmitted data information is received. When the UV lithography machine 100 performs an exposure process, external data information may be received through the port to implement wireless communication or remote communication, so that an external preset pattern may be transmitted to the LCD 30 of the UV lithography machine 100 for display.

Specifically, in an embodiment of the present invention, the UV lithography machine 100 includes a focusing unit 20, the focusing unit 20 is disposed between the UV light source 10 and the LCD liquid crystal light-transmitting screen 30, and UV light emitted by the UV light source 10 is focused and collimated by the focusing unit 20 and then vertically irradiates the LCD liquid crystal light-transmitting screen 30. In this embodiment, light emitted from the UV light sources 10 enters the focusing unit 20 and is collimated by the focusing unit 20, and then is emitted to the LCD liquid crystal transparent screen 30, in this embodiment, by adjusting the distances among the LCD liquid crystal transparent screen 30, the focusing unit 20, and the UV light sources 10, light of the UV light sources 10 is respectively collimated and completely covers the LCD liquid crystal transparent screen 30, so that each pixel point of the LCD liquid crystal transparent screen 30 can be irradiated by light.

Further, when there is only one UV light source 10, the central axes of the UV light source 10, the focusing unit 20 and the LCD panel 30 are collinear, so that the focusing unit 20 is aligned with the emitted UV light, and the LCD panel 30 can better receive the UV light.

As shown in fig. 2, the LCD liquid crystal light-transmitting screen 30 is a normally black hard screen. The normally black LCD liquid crystal light transmissive panel 30 is light opaque when not energized, i.e., UV light is not transmitted through the LCD liquid crystal light transmissive panel 30. The photosensitive layer 220 will not react in the event of a machine failure or shutdown. The hard LCD liquid crystal transparent screen 30 has the advantages that liquid crystal does not change under the external force state, so that the LCD liquid crystal transparent screen 30 is prevented from being whitened and leaking light, and the situation of stay wires of printed patterns of a circuit board is prevented.

Preferably, the LCD liquid crystal transparent screen 30 is a black and white screen, that is, the RGB layers are removed, so that the LCD liquid crystal transparent screen 30 has a better light transmission effect.

Referring to fig. 3, the present invention further provides an exposure process based on LCD technology, which uses the above-mentioned UV lithography machine 100, and the exposure process includes the following steps:

and S100, coating a photosensitive layer 220 on a product to be processed, wherein the product to be processed comprises a substrate 200 and an imprinting layer 210 coated on the substrate 200, and the photosensitive layer 220 can react with UV light.

The product to be processed in the embodiment can be screen printing industries such as printing, stained paper, packaging, PCB, label tags, automobile glass, household appliance glass, electronic glass, decoration and the like, exposure imaging is carried out in a mode of LCD screen projection, and the front and back processes are completely compatible with the traditional process. For example, when the product of the modern process is a PCB, the photoresist layer of the PCB is a copper layer, and the chemicals used are those that need to be able to corrode copper metal.

And S300, adjusting the voltage according to a preset pattern to control the light transmittance of each pixel point of the LCD liquid crystal light-transmitting screen 30 so as to obtain a light-transmitting pattern corresponding to the shape of the preset pattern.

In the invention, the LCD liquid crystal transparent screen 30 is arranged to replace a film used in the existing exposure process, and different types of patterns (such as circuit diagrams to be processed) are displayed on the LCD liquid crystal transparent screen 30 by utilizing the characteristic that the LCD liquid crystal transparent screen 30 can control the transmittance of each pixel point by adjusting voltage. Therefore, on one hand, in the face of exposure of different patterns, only the pattern displayed by the LCD liquid crystal transparent screen 30 needs to be changed, the film does not need to be replaced, a large number of films with different patterns do not need to be stored, and the method conforms to the current trend of electronic informatization; on the other hand, the LCD liquid crystal transparent screen 30 is used for replacing films or masks, so that the situation that the use frequency of different films or masks is different and the service lives of the films or masks are different is avoided, and the use times of the films or masks do not need to be recorded and stored.

And S300, controlling the UV light source 10 to emit UV light rays, wherein the UV light rays penetrate through the LCD liquid crystal light-transmitting screen 30 and irradiate on a product to be processed.

After "controlling the UV light source 10 to emit UV light rays, and the UV light rays pass through the LCD liquid crystal light-transmitting screen 30 and irradiate on the product to be processed", the exposure process further includes a developing step:

and cleaning the irradiated product to be processed by a developing solution, and removing the photosensitive layer 220 in the region which is not irradiated by light to expose the imprinting layer 210.

Further, after "cleaning the irradiated product to be processed by the developing solution, removing the photosensitive layer 220 in the non-irradiated area to expose the imprinting layer 210", the exposure process further includes an etching step: etching the exposed imprinting layer 210 on the product to be processed by using an etching agent; the photosensitive layer 220 on the product to be processed is removed.

In an embodiment of the present invention, the UV lithography machine 100 further includes an image storage unit, where the image storage unit stores a preset pattern, and the preset pattern stored in the image storage unit is called according to the obtained calling instruction. When the image storage unit is arranged in the UV lithography machine 100, the pattern to be processed can be stored in the image storage unit in advance so as to be extracted at any time for performing the exposure process, so that the UV lithography machine 100 can be operated offline for exposure only by transmitting data once.

In an embodiment of the present invention, the UV lithography machine 100 further includes a port communicatively connected to the outside, and the port receives externally transmitted data information before "adjusting the voltage according to a predetermined pattern to control the transmittance of each pixel of the LCD 30 to obtain a transmittance pattern corresponding to the shape of the predetermined pattern".

Throughout the description and claims of this application, the words "comprise/comprises" and the words "have/includes" and variations of these are used to specify the presence of stated features, values, steps or components but do not preclude the presence or addition of one or more other features, values, steps, components or groups thereof.

Some features of the invention, which are, for clarity, described in the context of separate embodiments, may also be provided in combination in a single embodiment. Conversely, certain features of the invention, which are, for brevity, described in the context of a single embodiment, may also be provided separately or in any suitable combination in different embodiments.

Various embodiments of the LCD technology based exposure process of the present invention have been described in detail above. Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present invention and not for limiting the same. Although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.