阅读说明：本技术 盖板的制备方法、盖板及其应用 (Preparation method of cover plate, cover plate and application thereof ) 是由 李可峰 许仁 王伟 于 2020-05-27 设计创作，主要内容包括：本发明涉及一种盖板的制备方法、盖板及其应用。该制备方法包括如下步骤：在基体的一个表面进行离子注入处理,制备一侧表层具有离子注入层的盖板预成品,然后再进行化学强化处理。该制备方法中,在基体的一个表面进行离子注入处理,离子注入能够在基体的表面以及一定深度的范围内形成大量的微观通道。在后续化学强化过程中,离子注入形成的微观通道能够加速化学强化过程中的离子交换速度,提高化学强化的效果和速率,同时化学强化处理过程的高温和离子注入处理能够形成新的化学键,形成新的硬质物表层,进而提高盖板的硬度和强度。该盖板具有良好的硬度和强度性能,在日常使用过程中,该盖板的外表面不易出现划痕和破裂,能够保持良好的外观。(The invention relates to a cover plate, a preparation method thereof and application thereof. The preparation method comprises the following steps: ion implantation treatment is carried out on one surface of the substrate, a cover plate preform with an ion implantation layer on one surface layer is prepared, and then chemical strengthening treatment is carried out. In the preparation method, ion implantation treatment is carried out on one surface of the substrate, and the ion implantation can form a large number of microscopic channels on the surface of the substrate and in a certain depth range. In the subsequent chemical strengthening process, the ion exchange speed in the chemical strengthening process can be accelerated by the micro channel formed by ion injection, the chemical strengthening effect and speed are improved, and meanwhile, a new chemical bond can be formed by the high temperature in the chemical strengthening treatment process and the ion injection treatment, so that a new hard object surface layer is formed, and the hardness and strength of the cover plate are improved. The cover plate has good hardness and strength performance, and the outer surface of the cover plate is not easy to scratch and break in the daily use process, so that the good appearance can be kept.)

1. A preparation method of a cover plate is characterized by comprising the following steps: the method comprises the following steps:

performing ion implantation treatment on one surface of the substrate to prepare a cover plate preform with an ion implantation layer on the surface layer of one side;

and carrying out chemical strengthening treatment on the cover plate preform.

2. The method for preparing a sheathing board according to claim 1, wherein: the substrate is a glass substrate, a metal substrate, a ceramic substrate or a plastic substrate.

3. The method for preparing a sheathing board according to claim 2, wherein: the glass matrix is an aluminum-silicon glass matrix, a soda-lime glass matrix, a lithium glass matrix or a microcrystalline glass matrix.

4. The method for preparing a sheathing board according to claim 1, wherein: the ions implanted in the ion implantation treatment are at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver and copper.

5. The method for producing a cover sheet according to any one of claims 1 to 4, wherein: the depth of ion implantation in the ion implantation treatment is 0.001-30 μm.

6. The method for producing a cover sheet according to any one of claims 1 to 4, wherein: the ion implantation treatment conditions are as follows: the ion implantation energy is 0.1 keV-1000 keV, and the ion implantation dosage is 10⁶ions/cm²～10²⁶ions/cm²。

7. The method for producing a cover sheet according to any one of claims 1 to 4, wherein: the chemical strengthening treatment comprises the following steps: and carrying out chemical strengthening treatment on the cover plate preform by adopting strengthening liquid at the temperature of 300-600 ℃, wherein the treatment time of the chemical strengthening treatment is 0.01-30 h.

8. The method for preparing a sheathing board according to claim 7, wherein: the strengthening solution is a potassium nitrate molten solution, or the strengthening solution is a potassium nitrate molten solution containing at least one ion of sodium ions and lithium ions.

9. The method for producing a cover sheet according to any one of claims 1 to 4 and 8, wherein: further comprising the step of subjecting the substrate to an etching treatment before the ion implantation treatment.

10. The method for producing a cover sheet according to any one of claims 1 to 4 and 8, wherein: further comprising the step of annealing the cover plate preform after the ion implantation treatment and before the chemical strengthening treatment.

11. The method for producing a cover sheet according to any one of claims 1 to 4 and 8, wherein: the method also comprises the step of processing a preset pattern on the surface of the substrate after the chemical strengthening treatment.

12. The method for producing a cover sheet according to any one of claims 1 to 4 and 8, wherein: further comprising the step of performing ion implantation treatment on the surface of the substrate after the chemical strengthening treatment.

13. A cover plate, characterized in that: comprises a substrate, an ion implantation layer, a first ion strengthening layer and a second ion strengthening layer; the substrate is provided with an ion implantation surface and an ion strengthening surface which are oppositely arranged;

the ion injection layer penetrates into the substrate, and one surface of the ion injection layer is flush with the ion injection surface of the substrate;

the first ion strengthening layer permeates into the inside of the base body, one surface of the first ion strengthening layer is flush with the ion injection surface of the base body, and the second ion strengthening layer permeates into the inside of the base body, one surface of the second ion strengthening layer is flush with the ion strengthening surface of the base body.

14. The decking of claim 13, wherein: the ion implantation layer is an ion implantation layer containing at least one ion of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper.

15. The cover sheet of any one of claims 13 to 14, wherein: the thickness of the ion implantation layer is 0.001-30 μm.

16. The cover sheet of any one of claims 13 to 14, wherein: the thickness of the first ion strengthening layer is 1-200 mu m; and/or the presence of a gas in the gas,

the thickness of the second ion strengthening layer is 1-200 μm.

17. An electronic device, characterized in that: the cover plate of the electronic device is as claimed in any one of claims 13 to 16, and the ion injection layer is close to the outer surface of the electronic device.

18. A structural member, characterized by: the cover plate of the structural member is as claimed in any one of claims 13 to 16, and the ion implantation layer is close to the outer surface of the structural member.

Technical Field

The invention relates to the technical field of cover plates, in particular to a cover plate, a preparation method of the cover plate and application of the cover plate.

Background

With the progress of production technology and the continuous improvement of consumer demands, the cover plate shows more excellent decorative effect; meanwhile, the cover plate is higher in customization degree and has good optical performance, and the appearance requirement of consumers on the electronic equipment can be well met

However, a great disadvantage of the cover plate during use is that the rigidity and strength of the cover plate are low. During use, particularly in portable electronic devices, high frequency impacts and friction tend to form scratches on the surface of the cover plate and even break the cover plate. The traditional preparation method of the cover plate is difficult to meet the requirements of hardness and strength of the cover plate.

Disclosure of Invention

In view of the above, there is a need for a method for manufacturing a cover plate, which can effectively improve the hardness and strength of the cover plate.

In addition, there is a need to provide a cover plate that has good stiffness and strength properties and is less prone to scratching and cracking during use.

In addition to the above method for manufacturing a cover plate and a cover plate, it is necessary to provide an electronic device and a structural member having a cover plate with high rigidity and strength. In the daily use process, the surface of the electronic equipment is not easy to scratch or crack, and the good appearance can be kept.

The specific scheme for solving the technical problems is as follows:

an object of the present invention is to provide a method for preparing a cover plate, the method comprising the steps of:

performing ion implantation treatment on one surface of the substrate to prepare a cover plate preform with an ion implantation layer on the surface layer of one side;

and carrying out chemical strengthening treatment on the cover plate preform.

In one embodiment, the substrate is a glass substrate, a metal substrate, a ceramic substrate, or a plastic substrate.

In one embodiment, the glass matrix is an aluminosilicate glass matrix, a soda lime glass matrix, a lithium glass matrix, or a microcrystalline glass matrix.

In one embodiment, the ions implanted in the ion implantation process are at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper.

In one embodiment, the depth of the ion implantation in the ion implantation treatment is 0.001 μm to 30 μm.

In one embodiment, the ion implantation process conditions are: the ion implantation energy is 0.1 keV-1000 keV, and the ion implantation dosage is 10⁶ions/cm²～10²⁶ions/cm²。

In one embodiment, the chemical strengthening treatment comprises the following steps: and carrying out chemical strengthening treatment on the cover plate preform by adopting strengthening liquid at the temperature of 300-600 ℃, wherein the treatment time of the chemical strengthening treatment is 0.01-30 h.

In one embodiment, the strengthening liquid is a potassium nitrate molten liquid, or the strengthening liquid is a potassium nitrate molten liquid containing at least one of sodium ions and lithium ions. .

In one embodiment, the method for preparing the cover plate further includes a step of performing an etching process on the substrate before the ion implantation process.

In one embodiment, the method for manufacturing the cover plate further includes a step of annealing the cover plate preform after the ion implantation process and before the chemical strengthening process.

In one embodiment, the method for manufacturing the cover plate further includes the step of processing a predetermined pattern on the surface of the substrate after the chemical strengthening treatment.

In one embodiment, the method for manufacturing the cover plate further includes a step of performing an ion implantation process on the surface of the substrate after the chemical strengthening process.

It is another object of the present invention to provide a cover plate comprising a substrate, an ion implantation layer, a first ion strengthening layer, and a second ion strengthening layer; the substrate is provided with an ion implantation surface and an ion strengthening surface which are oppositely arranged;

the ion injection layer penetrates into the substrate, and one surface of the ion injection layer is flush with the ion injection surface of the substrate;

the first ion strengthening layer permeates into the inside of the base body, one surface of the first ion strengthening layer is flush with the ion injection surface of the base body, and the second ion strengthening layer permeates into the inside of the base body, one surface of the second ion strengthening layer is flush with the ion strengthening surface of the base body.

In one embodiment, the ion-implanted layer is an ion-implanted layer containing ions of at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper.

In one embodiment, the thickness of the ion implantation layer is 0.001 μm to 30 μm.

In one embodiment, the thickness of the first ion strengthening layer is 1-200 μm; and/or the presence of a gas in the gas,

the thickness of the second ion strengthening layer is 1-200 μm.

Another object of the present invention is to provide an electronic device, wherein the cover plate of the electronic device is the cover plate in any of the above embodiments, and the ion implantation layer is close to the outer surface of the electronic device.

It is another object of the present invention to provide a structural member, the cover plate of the structural member is the cover plate of any of the above embodiments, and the ion implantation layer is near the outer surface of the structural member.

The preparation method of the cover plate comprises the following steps: performing ion implantation treatment on one surface of the substrate to prepare a cover plate preform with an ion implantation layer on the surface layer of one side; and carrying out chemical strengthening treatment on the cover plate preform. According to the manufacturing method of the cover plate, ion implantation treatment is carried out on one surface of the base body, a large number of microscopic channels can be formed on the surface of the base body and within a certain depth range through ion implantation, in the subsequent chemical strengthening process, the microscopic channels formed through ion implantation can accelerate the ion exchange speed in the chemical strengthening process, the chemical strengthening effect and speed are improved, meanwhile, new chemical bonds can be formed through high temperature in the chemical strengthening treatment process and the ion implantation treatment, a new hard substance surface layer is formed, and the hardness and strength of the cover plate can be effectively improved.

The cover plate comprises a substrate, an ion implantation layer, a first ion strengthening layer and a second ion strengthening layer. The substrate has an ion implantation surface and an ion strengthening surface which are arranged oppositely. The ion-implanted layer penetrates into the interior of the base body and one surface of the ion-implanted layer is flush with the ion-implanted surface of the base body. The first ion strengthening layer is arranged on the ion implantation surface of the substrate, and the second ion strengthening layer is arranged on the ion strengthening surface of the substrate. The ion injection layer is matched with the first ion strengthening layer and the second ion strengthening layer, so that the cover plate has good hardness and strength performance.

The cover plate of the electronic device is the cover plate, and the ion injection layer of the cover plate is close to the outer surface of the electronic device. The cover plate of the electronic device has high hardness and strength. In the daily use process, the surface of the electronic equipment is not easy to scratch or crack, and the good appearance can be kept.

The cover plate of the structural member is the cover plate, and the ion implantation layer of the cover plate is close to the outer surface of the structural member. The cover plate of the structural member has high hardness and strength. In the daily use process, the surface of the structural part is not easy to scratch or crack, and the good appearance can be kept.

Drawings

FIG. 1 is a flow chart illustrating the process of manufacturing a glass cover plate according to an embodiment of the present invention.

FIG. 2 is a flow chart illustrating the preparation of a glass cover plate according to another embodiment of the present invention.

Fig. 3 is a schematic structural diagram of a glass cover plate according to an embodiment of the invention.

FIG. 4 is a schematic structural diagram of a glass cover plate according to another embodiment of the present invention.

FIG. 5 is an etched texture map of a glass cover plate according to an embodiment of the present invention.

FIG. 6 is an etched texture pattern of a glass cover plate according to another embodiment of the present invention.

The notation in the figure is:

10. a glass cover plate; 11. a glass substrate; 12. an ion-implanted layer; 13. a first ion-strengthening layer; 14. a second ion-strengthening layer; 15. a first plating layer; 16. a second plating layer; 17. presetting a graphic layer; 18. an anti-fingerprint layer; 19. and etching the texture.

Detailed Description

In order that the invention may be more fully understood, reference will now be made to the accompanying examples. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

An embodiment of the present invention provides a method for manufacturing a cover plate, including the steps of: performing ion implantation treatment on one surface of the substrate to prepare a cover plate preform with an ion implantation layer on the surface layer of one side; and carrying out chemical strengthening treatment on the cover plate preform.

In a specific example, the substrate is a glass substrate, a metal substrate, a ceramic substrate, or a plastic substrate.

Referring to fig. 1, an embodiment of the present invention provides a method for manufacturing a glass cover plate, including the steps of:

s01, pretreatment of the glass substrate: and (3) pretreating the glass substrate to remove impurities on the surface of the glass substrate. The impurities such as dust, oil stain, fingerprints and the like on the surface of the glass substrate or uneven layers on the surface layer are removed through pretreatment, so that the subsequent processing of the glass substrate is facilitated, and the improvement of the precision of the subsequent processing is facilitated. The pretreatment comprises the steps of cleaning, polishing and the like. It is understood that the pretreatment also includes operations such as contour machining, which first machines the glass substrate into a corresponding shape according to design requirements, and then performs subsequent machining.

S02, ion implantation treatment: and performing ion implantation treatment on one surface of the pretreated glass substrate to prepare a glass cover plate preform with an ion implantation layer on one surface layer. After pretreatment, the surface of the glass matrix has high cleanliness, ion implantation treatment is carried out on one surface of the glass matrix, microscopic channels are formed in the surface and in a certain depth from the surface of the glass matrix, the implanted ions are introduced into the surface and in the certain depth of the glass matrix to modify the glass matrix, the performance of the glass matrix is optimized, and a better ion exchange foundation is laid for subsequent chemical strengthening.

It is understood that for substrates of different materials, the specific modification of the substrate can be realized by matching the corresponding implanted ions. For example, silicon and aluminum plasma are injected into the surface of the organic glass substrate, so that the surface hardness of the organic glass substrate can be improved; the surface hardness of the metal substrate can be improved by injecting nitrogen and carbon plasma into the surface of the metal substrate.

In this example, the surface of the glass substrate subjected to the ion implantation treatment was the outer surface of the glass substrate. When the glass cover plate is used, the outer surface (namely the surface facing the external environment) faces a consumer, and is more easily affected by external forces such as impact and friction, and the glass cover plate is more easily damaged. Therefore, the properties of the outer surface of the glass cover plate are particularly important. In the embodiment, the outer surface of the glass substrate is subjected to ion implantation treatment and then is subjected to subsequent processing, so that the hardness and the strength of the glass cover plate can be effectively improved, and particularly the hardness and the strength of the outer surface of the glass cover plate can be effectively improved.

S03, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment, and forming a first ion strengthening layer and a second ion strengthening layer on the surface of the glass substrate. In the chemical strengthening process, the ion implantation in S02 enables one surface of the glass substrate and microscopic channels formed in a certain depth of the glass substrate from the surface, the microscopic channels can accelerate the ion exchange speed in the chemical strengthening process, the chemical strengthening effect and speed are improved, the chemical strengthening is matched with the ion implantation to modify the surface layer of the glass substrate, and further the hardness and strength of the glass cover plate are effectively improved. Meanwhile, the hardness and the strength of the surface which is not subjected to ion implantation treatment are correspondingly improved after the surface is chemically strengthened.

In the method for manufacturing the glass cover plate according to the embodiment, firstly, impurities such as dust, oil stains, fingerprints and the like on the surface of the glass substrate are removed through pretreatment. Such as removing dust, oil stain, handprint and other impurities on the surface of the glass substrate by cleaning. Or the surface scratch or the micro-crack is removed through polishing or etching, or the heterogeneous layer on the surface of the glass substrate is removed, so that the subsequent processing of the glass substrate is facilitated. After the pretreatment, ion implantation treatment is carried out on one surface of the glass substrate, and the ion implantation can form a large number of microscopic channels on the surface of the glass substrate and within a certain depth range. In the subsequent chemical strengthening process, the ion exchange speed in the chemical strengthening process can be accelerated by the micro channel formed by ion injection, the chemical strengthening effect and speed are improved, and meanwhile, a new chemical bond can be formed by the high temperature in the chemical strengthening treatment process and the ion injection treatment, so that a new hard object surface layer is formed, and the hardness and strength of the glass cover plate are improved.

In a particular example, the glass substrate is an aluminosilicate glass substrate, a soda lime glass substrate, a lithium glass substrate, or a microcrystalline glass substrate. When the glass cover plate is a plane glass cover plate, the steps of pretreatment, ion implantation treatment and chemical strengthening treatment are carried out. When the glass cover plate is a curved glass cover plate, the hot bending forming treatment can be performed before the ion implantation treatment, or after the ion implantation treatment and before the chemical strengthening treatment, so that the curved glass cover plate with excellent hardness and strength performance can be obtained.

In a specific example, the ions implanted in the ion implantation process are at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper. By implanting ions of at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper, the hardness and strength of the glass cover plate can be improved while maintaining the light transmission performance of the glass cover plate. Preferably, the ions injected in the ion injection process are nitrogen ions, carbon ions, aluminum ions, silicon ions, silver ions, aluminum-nitrogen mixed ions, aluminum-oxygen mixed ions, aluminum-nitrogen mixed ions, silicon-nitrogen-oxygen mixed ions, titanium-nitrogen-oxygen mixed ions, chromium-nitrogen-oxygen mixed ions, copper-nitrogen mixed ions, and copper-nitrogen-oxygen mixed ions.

In a specific example, the depth of ion implantation in the ion implantation process is 0.001 μm to 30 μm. Preferably, the depth of ion implantation in the ion implantation treatment is 0.01 μm to 6 μm. Specifically, the depth of ion implantation in the ion implantation treatment is 0.2 μm, 0.3 μm, 0.4 μm, 0.5 μm, 0.6 μm, 0.7 μm, 0.8 μm, 0.9 μm, 1 μm, 1.5 μm, 1.8 μm, 2 μm, 2.5 μm, 2.8 μm, 3 μm, 3.5 μm, 4 μm, 4.5 μm, 5 μm, 5.5 μm.

In one specific example, the conditions of the ion implantation process are: the ion implantation energy is 0.1 keV-1000 keV, and the ion implantation dosage is 10⁶ions/cm²～10²⁶ions/cm²。

In one specific example, the chemical strengthening treatment comprises the following steps: and carrying out chemical strengthening treatment on the cover plate preform by adopting strengthening liquid at the temperature of 300-600 ℃, wherein the treatment time of the chemical strengthening treatment is 0.01-12 h. Specifically, the strengthening liquid is a potassium nitrate melt, or the strengthening liquid is a potassium nitrate melt containing at least one ion of sodium ions and lithium ions. It is understood that the reinforcing liquid may be an alkali salt melt capable of replacing alkali ions in the cover plate preform. . Preferably, the temperature of the chemical strengthening treatment is 320 ℃ to 600 ℃, and more preferably, the temperature of the chemical strengthening treatment is 350 ℃ to 500 ℃. For example, the temperature of the chemical strengthening treatment may be 350 ℃, 380 ℃, 450 ℃ or 500 ℃. It is understood that during the manufacturing process of the cover plate, one chemical strengthening may be performed, or multiple chemical strengthening may be performed. The conditions for each chemical strengthening may be the same or different.

Preferably, the time for the chemical strengthening treatment is 0.5 to 8 hours. Further, the time of the chemical strengthening treatment is 1 to 5 hours. For example, the time of the chemical strengthening treatment may be 1 hour, 1.5 hours, 2 hours, 2.5 hours, 3 hours, or 4 hours. In the chemical strengthening treatment process, the glass substrate after the ion implantation treatment is treated by using a potassium nitrate molten solution as a strengthening solution, and a first ion strengthening layer and a second ion strengthening layer are formed on the surface of the glass substrate. Meanwhile, the defects on the surface of the glass substrate can be repaired through chemical strengthening, particularly, the defects formed on the surface of the glass substrate and in a certain depth in the ion implantation treatment process can be well repaired through chemical strengthening, and meanwhile, a new chemical bond can be formed through high temperature and ion implantation treatment in the chemical strengthening treatment process to form a new hard object surface layer, so that the hardness and the strength of the glass cover plate are effectively improved.

In a specific example, the method for manufacturing a glass cover plate further includes a step of subjecting the glass substrate to an etching process before the ion implantation process. The glass substrate is etched before the ion implantation treatment, corresponding textures are formed on the surface of the glass substrate, and the appearance diversity of the glass cover plate is improved. The etching treatment may be performed on either surface of the glass substrate, or may be performed on both surfaces of the glass substrate. Referring to fig. 5, in one embodiment of the present invention, an etched texture of a glass cover plate is provided, and the etched texture 19 is circular and uniformly distributed on the surface of the glass substrate 11. Referring to fig. 6, another embodiment of the present invention provides an etched texture of a glass cover plate, wherein the etched texture 19 is in the shape of a regular hexagon and is uniformly distributed on the surface of the glass substrate 11. It can be understood that, in the preparation process of the glass cover plate, different etching treatments can be performed on the surface of the glass substrate 11 according to needs to process etching textures of different shapes, so as to meet the requirement of consumers on the appearance diversity of the glass cover plate. It will be appreciated that the glass substrate is subjected to an etching process after the pretreatment and before the ion implantation process in order to obtain a more effective etching texture. After pretreatment, the surface of the glass substrate has high cleanliness, which is beneficial to improving the etching treatment effect and obtaining etching texture with better effect.

In a specific example, the method for manufacturing a glass cover plate further includes the step of annealing the cover plate preform after the ion implantation process and before the chemical strengthening process. Specifically, the temperature of the annealing treatment is 300-1000 ℃, and the time of the annealing treatment is 1-200 min.

In a specific example, the method for manufacturing a glass cover plate further includes the step of processing a predetermined pattern on the surface of the glass substrate after the chemical strengthening treatment. For example, a predetermined pattern is processed on the inner surface of the glass substrate after the chemical strengthening treatment. After the chemical strengthening treatment, in order to make the glass cover plate show different appearances, the glass cover plate can be decorated by processing preset patterns on the inner surface of the glass substrate. Further, the predetermined pattern may be formed by printing ink or spraying ink on the surface of the glass substrate to form a desired pattern. It can be understood that when the preset pattern is processed, the pattern processing is performed by adopting a material with good toughness, so that the strength performance of the glass cover plate can be further improved. For example, the strength performance of the glass cover plate can be further improved by processing a preset pattern on the surface of the glass substrate by processing the preset pattern with polyurethane. Preferably, the predetermined pattern layer formed of polyurethane has a thickness of 0.1 μm to 200 μm. Further preferably, the predetermined pattern layer formed of polyurethane has a thickness of 1 μm to 60 μm.

As a preferable mode, the method for manufacturing the glass cover plate further includes the step of processing a predetermined pattern on the surface of the glass substrate away from the ion implantation treatment after the chemical strengthening treatment. The preset pattern is processed on the surface of the glass substrate which is not subjected to ion implantation treatment, so that the glass cover plate can be well decorated, and meanwhile, the preset pattern layer is positioned on the inner surface of the glass cover plate, so that a lasting decoration effect can be kept.

In a specific example, the method for manufacturing a glass cover plate further includes a step of performing an ion implantation treatment on the surface of the substrate after the chemical strengthening treatment. And ion implantation treatment is carried out after the chemical strengthening treatment, so that the hardness and the strength of the glass cover plate are further improved.

Referring to fig. 2, another embodiment of the present invention provides a method for manufacturing a glass cover plate, including the steps of:

s101, pretreatment of a glass substrate: and (3) pretreating the glass substrate to remove impurities on the surface of the glass substrate.

S102, etching treatment of the glass substrate: etching texture is made on the surface of the glass substrate through an etching process. In this embodiment, the etching process only etches the outer surface of the glass substrate (i.e., the surface to be subjected to the ion implantation process), so as to obtain the corresponding etching texture.

S103, ion implantation treatment: after etching treatment, ion implantation treatment is carried out on the surface of the glass substrate with the etching texture, microscopic channels are formed in the surface and a certain depth from the surface of the glass substrate, the surface layer of the glass substrate is modified, the performance of the glass substrate is optimized, and a glass cover plate preform is obtained after the ion implantation treatment.

S104, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment, and forming a first ion strengthening layer and a second ion strengthening layer on the surface of the glass substrate.

S105, processing a plating layer: and processing and plating the glass substrate after the chemical strengthening treatment, and respectively forming a first plating layer and a second plating layer on the surfaces of the first ion strengthening layer and the second ion strengthening layer. The method for processing the coating can adopt a conventional vacuum plating method, and the first coating and/or the second coating can be one or more of a nitride coating, a carbide coating, an oxide coating (such as a silicon oxide coating) and a carbon coating. The hardness and the strength performance of the glass cover plate can be further improved by processing the coating.

In this example, the upper and lower surfaces of the glass substrate were coated with the plating. It is understood that, when the plating layer is processed, the plating layer may be selectively processed on the surface of the glass substrate according to the performance design of the glass cover plate. For example, a plating treatment is performed on the surface near the ion implantation treatment; and/or, performing a processing plating treatment on the surface far away from the ion implantation treatment.

S106, processing a preset graph: after the plating layer is processed, a preset pattern is processed on the surface of the glass substrate away from the ion implantation treatment. The glass cover plate is decorated, meanwhile, the strength performance of the glass cover plate can be further improved, meanwhile, the preset pattern layer is located on the inner surface of the glass cover plate, a lasting decoration effect can be kept, and the preset pattern can be an ink decoration layer or a laminating decoration layer.

S107, processing the anti-fingerprint layer: after the preset pattern is processed, an anti-fingerprint layer is processed on the surface of the glass substrate close to the ion implantation treatment. When the glass cover plate is used, fingerprints are left on the surface of the glass cover plate by touch or touch of a consumer, and the appearance of the glass cover plate is affected. Therefore, after the preset pattern is processed, the anti-fingerprint layer is processed on the surface of the glass substrate close to the ion implantation treatment (namely the outer surface of the glass cover plate), so that the appearance of the glass cover plate is kept attractive. It is understood that an anti-glare layer may be formed on the surface of the cover plate during the preparation of the cover plate in order to express other appearance properties to the cover plate, such as the need for the anti-glare property of the cover plate.

Another embodiment of the present invention provides a cover plate comprising a substrate, an ion implantation layer, a first ion strengthening layer, and a second ion strengthening layer. The substrate has an ion implantation surface and an ion strengthening surface which are arranged oppositely. The ion-implanted layer penetrates into the interior of the base body and one surface of the ion-implanted layer is flush with the ion-implanted surface of the base body. The first ion strengthening layer permeates into the inside of the substrate, one surface of the first ion strengthening layer is flush with the ion injection surface of the substrate, and the second ion strengthening layer permeates into the inside of the substrate, one surface of the second ion strengthening layer is flush with the ion strengthening surface of the substrate.

Referring to fig. 3, an embodiment of the present invention provides a glass cover plate 10, where the glass cover plate 10 includes a glass substrate 11, an ion implantation layer 12, a first ion strengthening layer 13, and a second ion strengthening layer 14. The glass substrate 11 has an ion implantation surface and an ion strengthening surface which are provided to face each other. The ion-implanted layer 12 penetrates the inside of the glass base 11 and one surface of the ion-implanted layer 12 is flush with the ion-implanted face of the glass base 11. The first ion strengthening layer 13 penetrates into the glass substrate 11 and one surface of the first ion strengthening layer 13 is flush with the ion implantation surface of the glass substrate 11, and the second ion strengthening layer 14 penetrates into the glass substrate 11 and one surface of the second ion strengthening layer 14 is flush with the ion strengthening surface of the glass substrate 11. The ion implantation layer 12 is matched with the first ion strengthening layer 13 and the second ion strengthening layer 14, so that the glass cover plate has good hardness and strength performance, and is not easy to scratch or crack in the using process.

In a specific example, the ion-implanted layer 12 is an ion-implanted layer containing ions of at least one of nitrogen, carbon, aluminum, oxygen, silicon, titanium, chromium, silver, and copper. Preferably, the ion-implanted layer 12 is an ion-implanted layer containing nitrogen ions, carbon ions, aluminum ions, silicon ions, silver ions, aluminum-nitrogen mixed ions, aluminum-oxygen mixed ions, aluminum-nitrogen mixed ions, silicon-nitrogen-oxygen mixed ions, titanium-nitrogen mixed ions, titanium-nitrogen-oxygen mixed ions, chromium-nitrogen-oxygen mixed ions, copper-nitrogen mixed ions, or copper-nitrogen-oxygen mixed ions.

In a specific example, the thickness of the ion-implanted layer 12 is 0.001 μm to 30 μm. The thickness of the ion-implanted layer 12 is 0.001 to 30 μm, which can effectively improve the hardness and strength of the glass cover plate 10. The thickness of the ion implantation layer 12 is too small, which is not beneficial to improving the hardness and strength of the glass cover plate 10; if the thickness of the ion-implanted layer 12 is too large, the cost will increase, and the defects of the glass substrate 11 will be too large, which is not favorable for improving the hardness and strength of the glass cover plate 10. Preferably, the thickness of the ion-implanted layer 12 is 0.01 μm to 6 μm. The thickness of the ion implantation layer 12 is 0.01 μm to 6 μm, which considers the processing cost and the improvement of the hardness and strength of the glass cover plate 10.

In a specific example, the thickness of the first ion-strengthening layer 13 is 1 μm to 200 μm, preferably 10 μm to 60 μm; and/or the thickness of the second ion-strengthening layer 14 is 1 μm to 200 μm, preferably 10 μm to 60 μm.

Referring to fig. 4, another embodiment of the present invention provides a glass cover plate 10, the glass cover plate 10 including a glass substrate 11, an ion implantation layer 12, a first ion strengthening layer 13, and a second ion strengthening layer 14. The glass substrate 11 has an ion implantation surface and an ion strengthening surface which are provided to face each other. The ion-implanted layer 12 penetrates the inside of the glass base 11 and one surface of the ion-implanted layer 12 is flush with the ion-implanted face of the glass base 11. The first ion strengthening layer 13 penetrates into the glass substrate 11 and one surface of the first ion strengthening layer 13 is flush with the ion implantation surface of the glass substrate 11, and the second ion strengthening layer 14 penetrates into the glass substrate 11 and one surface of the second ion strengthening layer 14 is flush with the ion strengthening surface of the glass substrate 11. Meanwhile, a first plating layer 15 is arranged on the surface of the first ion strengthening layer 13, and an anti-fingerprint layer 18 is arranged on the surface of the first plating layer 15; the surface of the second ion strengthening layer 14 is provided with a second plating layer 16, and the surface of the second plating layer 16 is provided with a preset pattern layer 17.

In yet another embodiment of the present invention, an electronic device is provided, wherein the cover plate is the cover plate, and the ion-implanted layer is adjacent to an outer surface of the electronic device.

In yet another embodiment of the present invention, a structural member is provided having a cover plate as described above and an ion-implanted layer adjacent to an outer surface of the structural member.

The following are specific examples.

Example 1

In the embodiment, the glass substrate is made of 0.7mm aluminosilicate glass, and the preparation method of the glass cover plate comprises the following steps:

s01, pretreatment of the glass substrate: the glass substrate is pretreated by shape processing, cleaning and polishing.

S02, ion implantation treatment: an ion implantation treatment is performed on one surface (outer surface) of the glass substrate after the pretreatment to form an ion implanted layer. And obtaining a glass cover plate preform with an ion injection layer on one surface layer. In the ion implantation treatment, the implanted ions are nitrogen ions, the ion implantation energy is controlled to be 160keV, and the ion implantation dosage is 10¹⁶ions/cm²The depth of ion implantation (i.e., the thickness of the ion implantation layer) was 0.3 μm.

S03, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment to form a first ion strengthening layer and a second ion strengthening layer. The conditions of the chemical strengthening treatment are as follows: the potassium nitrate melt is used as strengthening liquid, the strengthening treatment temperature is 400 ℃, and the strengthening treatment time is 5 hours. The glass cover plate of the present example was obtained after the chemical strengthening treatment.

And S04, processing the anti-fingerprint layer on the surface close to the ion implantation surface after the chemical strengthening treatment.

Example 2

The preparation method of the glass substrate adopting the 0.7mm aluminum silicon glass cover plate in the embodiment comprises the following steps:

s01, pretreatment of the glass substrate: the glass substrate is pretreated by shape processing, cleaning and polishing.

S02, ion implantation treatment: an ion implantation treatment is performed on one surface (outer surface) of the glass substrate after the pretreatment to form an ion implanted layer. And obtaining a glass cover plate preform with an ion injection layer on one surface layer. In the ion implantation treatment, the implanted ions are nitrogen ions, the ion implantation energy is controlled to be 120keV, and the ion implantation dosage is 10¹⁵ions/cm²The depth of ion implantation (i.e., the thickness of the ion implantation layer) was 0.1 μm.

S03, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment to form a first ion strengthening layer and a second ion strengthening layer. The conditions of the chemical strengthening treatment are as follows: the potassium nitrate melt is used as strengthening liquid, the strengthening treatment temperature is 390 ℃, and the strengthening treatment time is 4 h. The glass cover plate of the present example was obtained after the chemical strengthening treatment.

And S04, processing the anti-fingerprint layer on the surface close to the ion implantation surface after the chemical strengthening treatment.

Example 3

In the embodiment, the glass substrate is made of 0.7mm aluminosilicate glass, and the preparation method of the glass cover plate comprises the following steps:

s01, pretreatment of the glass substrate: the glass substrate is pretreated by shape processing, cleaning and polishing.

S02, ion implantation treatment: an ion implantation treatment is performed on one surface (outer surface) of the glass substrate after the pretreatment to form an ion implanted layer. And obtaining a glass cover plate preform with an ion injection layer on one surface layer. In the ion implantation treatment, the implanted ions are nitrogen and aluminum ions, the ion implantation energy is controlled to be 160keV, and the ion implantation dosage is 10 keV¹⁶ions/cm²The depth of ion implantation (i.e., the thickness of the ion implantation layer) was 0.3 μm.

S03, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment to form a first ion strengthening layer and a second ion strengthening layer. The conditions of the chemical strengthening treatment are as follows: the potassium nitrate melt is used as strengthening liquid, the strengthening treatment temperature is 400 ℃, and the strengthening treatment time is 5 hours. The glass cover plate of the present example was obtained after the chemical strengthening treatment.

And S04, processing the anti-fingerprint layer on the surface close to the ion implantation surface after the chemical strengthening treatment.

Example 4

In the embodiment, the glass substrate is made of 0.7mm aluminosilicate glass, and the preparation method of the glass cover plate comprises the following steps:

s101, pretreatment of a glass substrate: the glass substrate is pretreated by shape processing, cleaning and polishing.

S102, etching treatment of the glass substrate: etching texture is made on the outer surface of the glass substrate through an etching process.

S103, ion implantation treatment: after the etching treatment, an ion implantation treatment is performed on one outer surface of the glass substrate to form an ion implanted layer. And obtaining a glass cover plate preform with an ion injection layer on one surface layer. In the ion implantation treatment, the implanted ions are nitrogen ions, the ion implantation energy is controlled to be 160keV, and the ion implantation dosage is 10¹⁶ions/cm²The depth of ion implantation (i.e., the thickness of the ion implantation layer) was 0.3 μm.

S104, chemical strengthening treatment: and carrying out chemical strengthening treatment on the glass cover plate preform obtained after ion implantation treatment to form a first ion strengthening layer and a second ion strengthening layer. The conditions of the chemical strengthening treatment are as follows: the potassium nitrate melt is used as strengthening liquid, the strengthening treatment temperature is 400 ℃, and the strengthening treatment time is 5 hours. The glass cover plate of the present example was obtained after the chemical strengthening treatment.

S105, processing a plating layer: and processing a coating on the substrate after the chemical strengthening treatment, and respectively forming a first coating and a second coating on the surfaces of the first ion strengthening layer and the second ion strengthening layer, wherein the first coating is silicon nitride, and the second coating is a silicon oxide coating.

S106, processing a preset graph: after the plating layer is processed, a preset pattern is processed on the surface of the glass substrate away from the ion implantation treatment. A50 μm thick graphic layer was processed using polyurethane.

S107, processing the anti-fingerprint layer: after the preset pattern is processed, an anti-fingerprint layer is processed on the surface of the glass substrate close to the ion implantation treatment. The glass cover plate of this example was obtained after processing the anti-fingerprint layer.

Example 5

In the embodiment, the glass substrate is made of 0.7mm aluminosilicate glass, and the preparation method of the glass cover plate comprises the following steps:

s01, pretreatment of the glass substrate: the glass substrate is pretreated by shape processing, cleaning and polishing.

S02, ion implantation treatment: an ion implantation treatment is performed on one surface (outer surface) of the glass substrate after the pretreatment to form an ion implanted layer. And obtaining a glass cover plate preform with an ion injection layer on one surface layer. In the ion implantation treatment, the implanted ions are nitrogen ions, the ion implantation energy is controlled to be 200keV, and the ion implantation dosage is 6 x 10¹⁶ions/cm²The depth of ion implantation (i.e., the thickness of the ion implantation layer) was 3 μm.

S03, annealing treatment is carried out for 60min at 500 ℃ after the ion implantation treatment. Then, the ion-implanted surface was subjected to chemical etching treatment to an etching depth of 100 nm.

And S04, performing chemical strengthening treatment on the glass cover plate preform obtained after the etching treatment to form a first ion strengthening layer and a second ion strengthening layer. The conditions of the chemical strengthening treatment are as follows: the potassium nitrate melt is used as strengthening liquid, the strengthening treatment temperature is 400 ℃, and the strengthening treatment time is 5 hours. The glass cover plate of the present example was obtained after the chemical strengthening treatment.

And S05, processing the anti-fingerprint layer on the surface close to the ion implantation surface after the chemical strengthening treatment.

Comparative example 1

The present comparative example is different from example 1 in that both surfaces (inner surface and outer surface) of the glass substrate after the pretreatment are subjected to the ion implantation treatment. The ion implantation conditions and the implantation depth of both surfaces were the same as in example 1.

Comparative example 2

The present comparative example is different from example 1 in that chemical strengthening is not performed after the ion implantation treatment.

Comparative example 3

This comparative example is different from example 1 in that ion implantation treatment was performed on both surfaces of the glass substrate, and thereafter chemical strengthening was not performed.

Comparative example 4

The comparative example is different from example 1 in that the glass substrate is not subjected to the ion implantation treatment after the pretreatment, and is directly subjected to the chemical strengthening.

Comparative example 5

The present comparative example is different from example 1 in that the chemical strengthening treatment is replaced with the annealing treatment. The annealing condition was 400 ℃ and the annealing time was 5 hours.

Comparative example 6

This comparative example is different from example 4 in that both surfaces (inner surface and outer surface) of the glass substrate were subjected to ion implantation treatment. The ion implantation conditions and the implantation depth of both surfaces were the same as in example 4.

Test example

The glass cover plates obtained in examples 1 to 5 and comparative examples 1 to 6 were subjected to a strength test, a hardness test, an optical property test and an outer surface abrasion resistance test, respectively.

(1) Strength test

The test method comprises the following steps: 60g of falling ball breaking height, and performing a falling ball test at an increasing speed of 5 cm. The falling ball is contacted with the outer surface of the glass cover plate. And testing the bending and breaking stress at 3 points, wherein a bending tester adopts a compression bar with the diameter of 8mm and the span of 40 mm.

(2) Hardness test

The test method comprises the following steps: anton Paar nano hardness tester; 0.5mN maximum load; 1mN/min loading rate.

(3) Optical Performance testing

The test method comprises the following steps: shimadzu UV2550 optical tester.

(4) Outer surface abrasion resistance test

The test method comprises the following steps: 1kg load; 10 x 10mm steel wool; a stroke of 60 mm; and (5) the finished product is scratched in a wear resistance test.

The test results are shown in the following table

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.