Cleaning member mounting mechanism and substrate cleaning device
阅读说明：本技术 清洗部件安装机构及基板清洗装置 (Cleaning member mounting mechanism and substrate cleaning device ) 是由 宫崎充 藤本友章 井上拓也 于 2021-06-02 设计创作，主要内容包括：一种清洗部件安装机构及基板清洗装置,清洗部件安装机构具有：清洗部件保持部(200),该清洗部件保持部能够安装具有用于对基板(W)进行清洗的清洗部件的清洗部件组件(100)；部件旋转部(180),该部件旋转部使由所述清洗部件保持部(200)保持的所述清洗部件组件(100)旋转；以及移动部(150),该移动部使所述清洗部件保持部(200)以拆卸了所述清洗部件组件(100)的状态沿着轴向进行移动,并且定位于限制所述清洗部件保持部(200)的旋转的旋转固定位置。(A cleaning component mounting mechanism and a substrate cleaning apparatus, the cleaning component mounting mechanism includes: a cleaning member holding unit (200) to which a cleaning member assembly (100) having a cleaning member for cleaning a substrate (W) can be attached; a component rotating unit (180) that rotates the cleaning component assembly (100) held by the cleaning component holding unit (200); and a moving unit (150) that moves the cleaning member holding unit (200) in the axial direction in a state in which the cleaning member assembly (100) is removed, and that is positioned at a rotation fixing position that restricts rotation of the cleaning member holding unit (200).)
1. A cleaning member mounting mechanism is characterized by comprising:
a cleaning member holding section to which a cleaning member module having a cleaning member for cleaning a substrate can be attached;
a component rotating unit that rotates the cleaning component assembly held by the cleaning component holding unit; and
a moving portion that moves the cleaning member holding portion in an axial direction in a state where the cleaning member assembly is detached, and is positioned at a rotation fixing position where rotation of the cleaning member holding portion is regulated.
2. The cleaning-component mounting mechanism as claimed in claim 1,
the moving part is an elastic component.
3. The cleaning-component mounting mechanism as claimed in claim 1 or 2,
the cleaning member holding portion includes: a cleaning component holding part at the driving part side rotated by the component rotating part and a cleaning component holding part at the driven part side rotated in a driven way,
the moving part is provided on the cleaning member holding part on the driven part side.
4. The cleaning-component mounting mechanism as claimed in claim 1 or 2,
the cleaning member holding portion has a peripheral edge protruding portion protruding outside the peripheral edge,
the peripheral protruding portion is in surface contact with an inner surface of an accommodating portion accommodating at least a part of the cleaning member holding portion, and the peripheral protruding portion is pressed against the inner surface of the accommodating portion, thereby restricting rotation of the cleaning member holding portion.
5. The cleaning-component mounting mechanism as claimed in claim 4,
the peripheral projection has one or more grooves.
6. The cleaning-component mounting mechanism as claimed in claim 4,
in the longitudinal section, the thickness of the peripheral edge projection on the cleaning member side is greater than the thickness of the peripheral edge projection on the opposite side to the cleaning member.
7. The cleaning-component mounting mechanism as claimed in claim 1 or 2,
the cleaning member holding portion has a first protruding portion protruding outward of a peripheral edge, and the receiving portion that receives at least a part of the cleaning member holding portion has a first recess that receives the first protruding portion on an inner surface, or the receiving portion that receives at least a part of the cleaning member holding portion has a second protruding portion on an inner surface, and the cleaning member holding portion has a second recess that receives the second protruding portion.
8. The cleaning-component mounting mechanism as claimed in claim 7,
a plurality of the first recesses are provided in a case where the first protruding portion is provided, or a plurality of the second recesses are provided in a case where the second protruding portion is provided.
9. A substrate cleaning apparatus, comprising:
a substrate supporting portion for supporting a substrate;
a cleaning member holding unit to which a cleaning member module having a cleaning member for cleaning the substrate can be attached;
a component rotating unit that rotates the cleaning component assembly held by the cleaning component holding unit; and
a moving portion that moves the cleaning member holding portion in an axial direction in a state where the cleaning member assembly is detached, and is positioned at a rotation fixing position where rotation of the cleaning member holding portion is regulated.
Technical Field
The present invention relates to a cleaning member mounting mechanism and a substrate cleaning apparatus, which can include a cleaning member holding portion to which a cleaning member unit is mounted and which can rotate in a state in which the cleaning member unit is mounted.
Background
Conventionally, as a method of cleaning a substrate such as a polished wafer with high cleaning degree, it is known that a cleaning member made of a brush or sponge rubs a cleaning surface of the substrate to perform scrubbing (primary cleaning), and then high-pressure water (high-speed jet flow) is jetted toward the substrate, and bubbles are generated by cavitation to perform finish cleaning (secondary cleaning).
As the cleaning member, for example, a roller type cleaning member and a pen type cleaning member are known. As an example, japanese patent application laid-open No. 2000-301079 discloses a substrate cleaning apparatus including: a substrate holding section that rotates and holds the substrate substantially in a horizontal plane; a cleaning member that scrubs a surface to be cleaned of the substrate; and a cleaning member holding portion that holds the cleaning member so as to be rotatable about an axis of the cleaning member. Cleaning members such as roller-type cleaning members and pen-type cleaning members are suitably cleaned and used, but are replaced at regular intervals. When the cleaning member is replaced, the cleaning member assembly including the cleaning member is attached to the cleaning member holding portion, but the cleaning member holding portion is rotatable, and therefore, the attachment work takes a lot of time.
Disclosure of Invention
Technical problem to be solved by the invention
The present invention has been made in view of the above, and an object thereof is to provide a cleaning member mounting mechanism and a substrate cleaning apparatus capable of easily mounting a cleaning member assembly to a cleaning member holding portion.
Means for solving the problems
[ concept 1]
A cleaning member mounting mechanism according to the present invention may include:
a cleaning member holding section to which a cleaning member module having a cleaning member for cleaning a substrate can be attached;
a component rotating unit that rotates the cleaning component assembly held by the cleaning component holding unit; and
a moving portion that moves the cleaning member holding portion in an axial direction in a state where the cleaning member assembly is detached, and is positioned at a rotation fixing position where rotation of the cleaning member holding portion is regulated.
[ concept 2]
In the cleaning component mounting mechanism of concept 1,
the moving portion may be an elastic member.
[ concept 3]
In the cleaning component mounting mechanism of concept 1 or 2,
the cleaning member holding portion may include: a cleaning component holding part at the driving part side rotated by the component rotating part and a cleaning component holding part at the driven part side rotated in a driven way,
the moving part is provided on the cleaning member holding part on the driven part side.
[ concept 4]
In the cleaning component mounting mechanism of any one of concepts 1 to 3,
the cleaning member holding part may have a peripheral edge protruding part protruding outside the peripheral edge,
the peripheral protruding portion is in surface contact with an inner surface of an accommodating portion accommodating at least a part of the cleaning member holding portion, and the peripheral protruding portion is pressed against the inner surface of the accommodating portion, thereby restricting rotation of the cleaning member holding portion.
[ concept 5]
In the cleaning component mounting mechanism of concept 4,
the peripheral projection may have one or more grooves.
[ concept 6]
In the cleaning component mounting mechanism of concept 4 or 5,
in the vertical cross section, the thickness of the peripheral edge projection may be larger on the cleaning member side than on the opposite side.
[ concept 7]
In the cleaning component mounting mechanism of any one of concepts 1 to 6,
the cleaning member holding portion may have a first protruding portion protruding outward of the peripheral edge, the receiving portion that receives at least a part of the cleaning member holding portion may have a first recess that receives the first protruding portion on an inner surface, or the receiving portion that receives at least a part of the cleaning member holding portion may have a second protruding portion on an inner surface, and the cleaning member holding portion may have a second recess that receives the second protruding portion.
[ concept 8]
In the cleaning component mounting mechanism of concept 7,
when the first protruding portion is provided, a plurality of the first concave portions may be provided, or when the second protruding portion is provided, a plurality of the second concave portions may be provided.
[ concept 9]
A substrate cleaning apparatus may include:
a substrate supporting portion for supporting a substrate;
a cleaning member holding unit to which a cleaning member module having a cleaning member for cleaning the substrate can be attached;
a component rotating unit that rotates the cleaning component assembly held by the cleaning component holding unit; and
a moving portion that moves the cleaning member holding portion in an axial direction in a state where the cleaning member assembly is detached, and is positioned at a rotation fixing position where rotation of the cleaning member holding portion is regulated.
Effects of the invention
According to the present invention, the cleaning member assembly can be easily attached to the cleaning member holding portion.
Drawings
Fig. 1 is a schematic plan view showing the overall configuration of a substrate processing apparatus according to an embodiment of the present invention.
Fig. 2 is a perspective view showing a substrate cleaning apparatus usable in the embodiment of the present invention.
Fig. 3 is a schematic diagram showing a substrate cleaning apparatus used as an example of the embodiment of the present invention.
Fig. 4 is a schematic diagram showing a substrate cleaning apparatus used as another example of the embodiment of the present invention.
Fig. 5 is a side sectional view showing a structure in which a cleaning member unit is attached to a cleaning member holding portion that can be used in the embodiment of the present invention.
Fig. 6 is a side sectional view showing a structure in which the cleaning member unit is detached from the cleaning member holding portion usable in the embodiment of the present invention.
Fig. 7 is a perspective view showing an example of a roller-type cleaning member that can be used in the embodiment of the present invention.
Fig. 8 is a perspective view showing another example of the roller-type cleaning member that can be used in the embodiment of the present invention.
Fig. 9 is a view showing a state in which the cleaning member holding portion usable in the embodiment of the present invention is viewed along the rotation axis of the cleaning member assembly.
Fig. 10 is a view showing a state in which a first example of the cleaning member holding portion having the peripheral edge protruding portion, which can be used in the embodiment of the present invention, is viewed along the rotation axis of the cleaning member assembly.
Fig. 11 is a view showing a configuration of a second example of the cleaning member holding portion having the peripheral edge protruding portion which can be used in the embodiment of the present invention, as viewed along the rotation axis of the cleaning member assembly.
Fig. 12 is a view showing a configuration of a third example of the cleaning member holding portion having the peripheral edge protruding portion which can be used in the embodiment of the present invention, as viewed along the rotation axis of the cleaning member assembly.
Fig. 13 is a view showing a first example of a form in which a cleaning member holding portion having a first protruding portion and a receiving portion having a first recess portion for receiving the first protruding portion, which can be used in the embodiment of the present invention, are viewed along a rotation axis of the cleaning member assembly.
Fig. 14 is a view showing a second example of a form in which a cleaning member holding portion having a first protruding portion and a receiving portion having a first recess for receiving the first protruding portion, which can be used in the embodiment of the present invention, are viewed along a rotation axis of the cleaning member assembly.
Fig. 15 is a view showing a first example of a form of a cleaning member holding portion having a receiving portion with a second protruding portion and a second recess portion with a second protruding portion, which can be used in the embodiment of the present invention, when viewed along a rotation axis of the cleaning member assembly.
Fig. 16 is a view showing a second example of a form of a cleaning member holding portion having a receiving portion with a second protruding portion and a second recess portion with a second protruding portion, which can be used in the embodiment of the present invention, when viewed along a rotation axis of the cleaning member assembly.
Fig. 17 is a view showing a state in which a cleaning member holding portion having a peripheral edge protruding portion and a first protruding portion and a receiving portion having a first recess for receiving the first protruding portion, which can be used in the embodiment of the present invention, are viewed along a rotation axis of the cleaning member assembly.
Fig. 18 is a view showing a state in which the cleaning member holding portion having the receiving portion with the second protruding portion and the second recess with the peripheral protruding portion and the second protruding portion, which can be used in the embodiment of the present invention, is viewed along the rotation axis of the cleaning member assembly.
Fig. 19A is a view showing a third example of a state when the cleaning member holding portion having the first protruding portion and the receiving portion having the first recess receiving the first protruding portion are viewed along the rotation axis of the cleaning member assembly.
Fig. 19B is a side sectional view of the form shown in fig. 19A.
Fig. 20A is a view showing a third example of a form of a cleaning member holding portion having a receiving portion with a second protruding portion and a second recess portion with a second protruding portion, which can be used in the embodiment of the present invention, when viewed along a rotation axis of the cleaning member assembly.
Fig. 20B is a side sectional view of the form shown in fig. 20A.
Fig. 21A is a view showing a fourth example of a state in which the cleaning member holding portion having the first protruding portion and the receiving portion having the first recess receiving the first protruding portion are viewed along the rotation axis of the cleaning member assembly.
Fig. 21B is a side cross-sectional view of the form shown in fig. 21A.
Fig. 22A is a view showing a fourth example of a state when the accommodating portion having the second protruding portion and the cleaning member holding portion having the second recess portion accommodating the peripheral protruding portion and the second protruding portion are viewed along the rotation axis of the cleaning member assembly.
Fig. 22B is a side sectional view of the form shown in fig. 22A.
Fig. 23A is a view showing a state in which the thickness of the peripheral edge protruding portion usable in the embodiment of the present invention is uniform when viewed along the rotation axis of the cleaning member assembly.
Fig. 23B is a side cross-sectional view of the form shown in fig. 23A.
Fig. 24 is a side cross-sectional view showing a form in which a mark such as a notch is provided on the mounting portion of the cleaning member holding portion, which can be used in the embodiment of the present invention.
Fig. 25A is a side cross-sectional view showing a form in which a peripheral edge protruding portion usable in an embodiment of the present invention has an elastic member, and is a side cross-sectional view showing a case in which the elastic member does not come into contact with a housing portion.
Fig. 25B is a side cross-sectional view showing a form in which the peripheral edge protruding portion usable in the embodiment of the present invention has an elastic member, and is a side cross-sectional view showing a case in which the elastic member does not abut against the accommodating portion.
Fig. 26 is a block diagram of a substrate processing apparatus according to an embodiment of the present invention.
Description of the symbols
40 column (base plate supporting part)
100 cleaning element assembly
120 housing part
150 moving part
180 parts rotating part
190 first recess
195 second projection
200 cleaning member holding part
220 peripheral edge projection
220a groove part
230 first projection
240 second recess
W substrate
Detailed Description
Structure (of the related Art)
An embodiment of a substrate processing apparatus including a substrate cleaning apparatus and the like will be described.
As shown in fig. 1, the substrate processing apparatus according to the present embodiment includes a substantially rectangular housing 310 and a load port 312 on which a substrate cassette storing most of the substrates W is placed. The load port 312 is disposed adjacent to the housing 310. An open cassette, a Standard Mechanical Interface (SMIF) Pod, or a Front Opening Unified Pod (FOUP) can be mounted on the load port 312. The SMIF pod and the FOUP are sealed containers capable of storing substrate cassettes therein and maintaining an environment independent of an external space by being covered with a partition wall. As the substrate W, for example, a semiconductor wafer or the like can be cited.
Inside the housing 310, there are housed: a plurality of (four in the form shown in fig. 1) polishing units 314a to 314 d; a first cleaning unit 316 and a second cleaning unit 318 for cleaning the polished substrate W; and a drying unit 320 for drying the cleaned substrate W. The polishing units 314a to 314d are arranged along the longitudinal direction of the substrate processing apparatus, and the cleaning units 316 and 318 and the drying unit 320 are also arranged along the longitudinal direction of the substrate processing apparatus. The substrate processing apparatus according to the present embodiment can polish various substrates W in a process of manufacturing a magnetic film of a Semiconductor wafer having a diameter of 300mm or 450mm, a flat panel, an image sensor such as a CMOS (Complementary Metal Oxide Semiconductor) or a CCD (Charge Coupled Device), or an MRAM (Magnetoresistive Random Access Memory). In addition, an apparatus for performing the cleaning process and the drying process of the substrate W without providing a polishing unit for polishing the substrate W in the housing 310 may be used as the substrate processing apparatus according to another embodiment.
A first transport robot 322 is disposed in a region surrounded by the load port 312, the polishing unit 314a located on the load port 312 side, and the drying unit 320. Further, a conveyance unit 324 is disposed in parallel with the polishing units 314a to 314d, the cleaning units 316 and 318, and the drying unit 320. The first transfer robot 322 receives the pre-polished substrate W from the load port 312 and transfers the pre-polished substrate W to the transfer unit 324, or receives the dried substrate W taken out from the drying unit 320 from the transfer unit 324.
A second transfer robot 326 is disposed between the first cleaning unit 316 and the second cleaning unit 318, the second transfer robot 326 transfers the substrate W between the first cleaning unit 316 and the second cleaning unit 318, and a third transfer robot 328 is disposed between the second cleaning unit 318 and the drying unit 320, the third transfer robot 328 transfers the substrate W between the second cleaning unit 318 and the drying unit 320. A control unit 350 for controlling the operation of each device of the substrate processing apparatus is disposed inside the casing 310. In the present embodiment, the configuration in which the control unit 350 is disposed inside the housing 310 has been described, but the present invention is not limited to this, and the control unit 350 may be disposed outside the housing 310, or the control unit 350 may be provided at a remote location.
As the first cleaning unit 316, a roller type cleaning device may be used which, in the presence of a cleaning liquid, brings a roller type cleaning member 110 linearly extending across almost the entire length of the diameter of the substrate W into contact with the substrate W and brushes the surface of the substrate W while rotating around a central axis parallel to the substrate W. Further, a pen-type cleaning device that brushes the surface of the substrate W by bringing a contact surface of a cylindrical pen-type cleaning member extending in the vertical direction into contact with the substrate W and moving the pen-type cleaning member in one direction while rotating the pen-type cleaning member may be used as the second cleaning unit 318. Further, as the drying unit 320, a spin drying unit may be used which sprays IPA vapor from a moving spray nozzle toward the substrate W held horizontally and rotated to dry the substrate W, and further rotates the substrate W at a high speed to dry the substrate W by centrifugal force.
Note that, instead of using the roller type cleaning device, a pen type cleaning device similar to the second cleaning unit 318 may be used, or a two-fluid jet cleaning device that cleans the surface of the substrate W by two-fluid jet may be used as the first cleaning unit 316. In addition, a roller type cleaning device similar to the first cleaning unit 316 may be used instead of the pen type cleaning device, or a two-fluid jet cleaning device that cleans the surface of the substrate W by two-fluid jet may be used as the second cleaning unit 318.
The cleaning liquid of the present embodiment includes a rinse liquid such as deionized water (DIW), a chemical liquid such as ammonia hydroperoxide (SC1), hydrogen peroxide hydrochloride (SC2), hydrogen peroxide Sulfate (SPM), sulfuric acid added with water, or hydrofluoric acid. Further, a mixed solution or a diluted solution containing these as main components may be used. In the present embodiment, unless otherwise specified, the cleaning liquid refers to a rinse liquid, a chemical liquid, or both of the rinse liquid and the chemical liquid. The cleaning according to the present embodiment includes a mode in which the cleaning member such as the roller-type cleaning member 110 is rotated while being in contact with the substrate and the cleaning liquid is supplied to the substrate to perform brushing, and a mode in which only the cleaning liquid is supplied without bringing the member into contact with the substrate.
As shown in fig. 2, the substrate cleaning apparatus may include a plurality of (four in fig. 2) support columns (substrate support portions) 40 for supporting a peripheral edge portion of a substrate W such as a semiconductor wafer and horizontally rotating the substrate W. These struts 40 are able to move in the horizontal direction as indicated by the arrows in fig. 2. The substrate cleaning apparatus may further include an upper roller arm 42 arranged to be movable upward and downward above the substrate W and a lower roller arm 44 arranged to be movable upward and downward below the substrate W.
The column 40 may have a roller 80 as a substrate support portion at an upper portion. A fitting groove 80a is formed in the outer peripheral side surface of the roller 80. The peripheral edge of the substrate W is positioned in the fitting groove 80a, and the roller 80 is pressed against the substrate W and rotated. Thereby, the substrate W horizontally rotates as indicated by an arrow E in fig. 2. In the embodiment shown here, all four rollers 80 are coupled to a drive mechanism not shown in the figure to apply a rotational force to the substrate W. Further, two rollers 80 of the four rollers may apply a rotational force to the substrate W (a driving mechanism is not shown), and the other two rollers 80 may function as bearings for receiving the rotation of the substrate W.
In the upper roller arm 42 shown in fig. 2, a cylindrical roller-shaped cleaning member (roller-shaped sponge) 110 extending horizontally is rotatably supported. The roller type cleaning member 110 is, for example, as shown by an arrow F in FIG. 21Rotating as shown. In the lower roller arm 44 shown in fig. 2, a cylindrical roller-shaped cleaning member (roller-shaped sponge) 110 extending horizontally is rotatably supported. The roller type cleaning part 110 is shown by an arrow F in FIG. 22Rotating as shown. The upper roller arm 42 may be provided to a support arm 58 extending in the horizontal direction via the load cell 54. A tilting mechanism 70 for supporting the upper roller arm 42 to be tiltable may be provided between the load cell 54 and the free end of the support arm 58. Such a tilting mechanism may be provided to the lower roller arm 44.
In the embodiment shown in fig. 2, two upper supply nozzles 50 are disposed, and the two upper supply nozzles 50 are positioned above the substrate W supported and rotated by the support 40, and supply the chemical solution and the pure water (rinse solution) to the front surface (upper surface) of the substrate W. One of the two upper supply nozzles 50 may be supplied with the chemical solution, and the other may be supplied with the deionized water. Further, two lower supply nozzles 52 may be disposed, and the two lower supply nozzles 52 may be positioned below the substrate W supported and rotated by the support column 40 to supply the chemical solution and the pure water (rinse solution) to the back surface (lower surface) of the substrate W. One of the two lower supply nozzles 52 may be supplied with the chemical liquid, and the other may be supplied with the deionized water.
The support column 40 is an example of a substrate support portion that supports the substrate W, but the substrate support portion may hold the substrate W to extend in the horizontal direction, may hold the substrate to extend in the vertical direction, or may hold the substrate to be inclined from the horizontal direction. A different form from the above-described support column 40 may be adopted as the substrate support portion, in which the substrate W is held by being chucked or sucked and rotated.
As shown in fig. 3 and 4, the substrate cleaning apparatus includes: a cleaning member holding unit 200, to which a cleaning member assembly 100 having a cleaning member such as a roller-type cleaning member 110 for cleaning the substrate W can be attached, and which can be rotated in a state in which the cleaning member assembly 100 is attached, at the cleaning member holding unit 200; and a member rotating part 180, the member rotating part 180 rotating the cleaning member assembly 100 held by the cleaning member holding part 200.
The cleaning member assembly 100 may also have a cleaning member mounting portion 105 and a cleaning member mounted on the surface of the cleaning member mounting portion 105. Hereinafter, a description will be given using the roller-type cleaning member 110 as an example of the cleaning member. As shown in fig. 7, the roller-type cleaning member 110 may be a sponge having a plurality of small pieces (protruding members) 115. The area of the top of the small block 115 may be set to 5cm2The following. PVDF or PTFE may be used as the material of the cleaning member attachment portion 105. As shown in fig. 8, the roller-type cleaning member 110 may be configured without the small pieces (protruding members) 115.
The cleaning member mounting portion 105 shown in fig. 8 has a pair of protruding portions 105a at the end as the mounting portion, and a key recess 105b is formed between the pair of protruding portions 105 a. In the embodiment shown in fig. 8 and 9, the cleaning member assembly 100 is attached to the cleaning member holding portion 200 by fitting the key convex portion 205b of the cleaning member holding portion 200 into the key concave portion 105 b. At this time, the protruding portion 205a provided with the key protrusion 205b is positioned between the pair of protruding portions 105 a. In the embodiment shown in fig. 8 and 9, the cleaning member mounting portion 105 and the cleaning member holding portion 200 have directional characteristics, and both cannot be mounted in a predetermined direction.
The cleaning member assembly 100 may be formed by integrating the cleaning member mounting portion 105 and the roller-type cleaning member 110, or the roller-type cleaning member 110 may be formed on the cleaning member mounting portion 105. The cleaning member mounting portion 105 and the roller-type cleaning member 110 may be configured as separate members and may be detachable. The roller-type cleaning member 110 may be made of a PVA (polyvinyl alcohol) sponge material or PVFM (polyvinyl formal) obtained by reacting PVA. The PVA sponge material can be adjusted by a homopolymer of polyvinyl acetate or the like. As the material of the roller type cleaning roller member 110, nylon, polyurethane, or a combination of polyurethane and PVA, or other formable materials such as other copolymers that do not scratch the surface of the substrate W and provide suitable material removal for the process, can be used.
As shown in fig. 3 and 4, the substrate cleaning apparatus may include an inner cleaning liquid supply portion 410 for supplying a cleaning liquid into the roller-type cleaning member 110 and an outer cleaning liquid supply portion 420 for supplying a cleaning liquid from the outside of the roller-type cleaning member 110. The rotation speed of the roller type cleaning member 110 is, for example, 50rpm (revolutions per minute) to 400 rpm.
The inner cleaning liquid supply part 410 and the outer cleaning liquid supply part 420 may supply the same cleaning liquid, but are not limited to this form, and the inner cleaning liquid supply part 410 and the outer cleaning liquid supply part 420 may supply different cleaning liquids.
When the cleaning liquid of the inner cleaning liquid and the outer cleaning liquid is supplied, the filters 412 and 422 (see fig. 3 and 4) having a mesh size of about 10nm may be used. By using such filters 412 and 422, dust contained in the cleaning liquid can be removed. The external cleaning liquid supply part 420 may include an external cleaning liquid supply member including the nozzles 50 and 52 and an external cleaning liquid reservoir 424 connected to the external cleaning liquid supply member and configured to supply a cleaning liquid to the external cleaning liquid supply member. In this case, the filter 422 may be provided between the external cleaning liquid storage 424 and the external cleaning liquid supply member. Further, a filter 412 may be provided between the internal cleaning liquid supply portion 410 and the cleaning member holding portion 200.
As shown in fig. 3 and 4, the cleaning member mounting portion 105 may include a main body 130, a cleaning liquid introduction portion (gap) 135 extending inside the main body 130, and a plurality of cleaning liquid supply holes 140 communicating with the cleaning liquid introduction portion 135. The cleaning member mounting portion 105 may be formed in a cylindrical shape having a hollow region. The hollow area may be the cleaning liquid introduction portion 135, the cleaning liquid supply hole 140 may communicate with the cleaning liquid introduction portion 135, and the cleaning liquid supplied to the cleaning liquid introduction portion 135 may be used for cleaning the substrate W by being introduced into the roller-type cleaning member 110. Fig. 3 and 4 are cross-sections of the roller-type cleaning member 110 and the like cut at positions where the small blocks 115 are not provided.
The cleaning liquid may be introduced into the cleaning liquid introduction portion 135 via a supply pipe 215 provided inside the cleaning member holding portion 200.
As shown in fig. 5 and 6, the substrate cleaning apparatus includes a moving unit 150, and the moving unit 150 moves the cleaning member holding unit 200 in the axial direction in a state where the cleaning member assembly 100 is detached, and positions the cleaning member holding unit 200 at a rotation fixing position where the rotation of the cleaning member holding unit 200 is regulated. The moving part 150 may be an elastic member 150a such as a spring. The elastic member 150a may be housed in the housing portion 120 and provided at an end portion on the opposite side (left side in fig. 5 and 6) to the side holding the roller-type cleaning member 110. In the case where such an elastic member 150a is provided, when the cleaning member assembly 100 is detached from the cleaning member holding portion 200, the cleaning member holding portion 200 is moved in the axial direction by receiving an elastic force from the elastic member 150a, and is positioned at the rotation fixing position shown in fig. 6. However, the moving unit 150 is not limited to this configuration, and may include a driving unit (not shown) such as a motor, which moves the cleaning member holding unit 200 in the axial direction.
The cleaning member holding part 200 may include a holding body 210 and a peripheral edge protruding part 220 protruding outward from the holding body 210. The holding body 210 and the peripheral edge projection 220 may be integrally formed. The peripheral edge projection 220 may project outward from the holding body 210 by about 2mm to 5 mm.
Although fig. 5 shows a state in which the cleaning member assembly 100 is attached to the cleaning member holding portion 200, in this state, the elastic member 150a is pressed by the cleaning member assembly 100 toward the opposite side of the cleaning member assembly 100, and the peripheral edge protruding portion 220 is separated from the receiving portion 120. Although fig. 6 shows a state in which the cleaning member assembly 100 is detached from the cleaning member holding portion 200, in this state, the elastic member 150a presses the cleaning member holding portion 200, and the peripheral edge protruding portion 220 comes into contact with the housing portion 120.
As shown in fig. 6, the peripheral edge protruding portion 220 may be in contact with the inner surface of the housing portion 120 that houses at least a part of the cleaning member holding portion 200, and the rotation of the cleaning member holding portion 200 may be restricted (fixed) by the peripheral edge protruding portion 220 being pressed against the inner surface of the housing portion 120. When the moving portion 150 is formed of an elastic member 150a such as a spring, the peripheral edge protruding portion 220 comes into contact with the inner surface of the housing portion 120 by receiving an elastic force from the elastic member 150a, and the rotation of the cleaning member holding portion 200 is restricted. The peripheral edge protruding portion 220 may protrude entirely in the peripheral edge direction with respect to the rotation axis of the roller-type cleaning member 110 (see fig. 10), but a plurality of peripheral edge protruding portions 220 may be disposed at intervals (see fig. 11). However, since the large contact area with the inner surface of the housing portion 120 tends to restrict the rotation of the cleaning member holding portion 200, the configuration in which the peripheral edge protruding portion 220 protrudes entirely in the peripheral edge direction with respect to the rotation axis of the roller-type cleaning member 110 is advantageous from this viewpoint.
The surface of the peripheral projection 220 that contacts the inner surface of the housing portion 120 may have a concave-convex shape or may be a rough surface. Further, an elastic member 220a such as rubber may be provided on the surface of the peripheral protruding portion 220 that contacts the inner surface of the housing portion 120, and the elastic member 220a such as rubber may be deformed when the peripheral protruding portion 220 is pressed against the inner surface of the housing portion 120 (see fig. 25A and 25B). By adopting such a configuration, the resistance value with the inner surface of the housing portion 120 can be increased. In addition, when the moving unit 150 is formed of the elastic member 150a such as a spring, it is not necessary to use a member having an extremely high spring constant as the elastic member 150 a. As the spring constant, for example, a spring of 0.03kg/mm to 0.10kg/mm can be considered.
The surface of the peripheral projection 220 that contacts the inner surface of the housing 120 may be a flat surface. In this case, the force from the moving portion 150 can be uniformly transmitted to the inner surface of the housing portion 120, and a frictional force can be generated between the entire inner surface of the housing portion 120 and the peripheral edge protruding portion 220. Further, by using such a flat surface, it is possible to prevent unexpected dust or the like from being generated when the peripheral edge protruding portion 220 comes into contact with the inner surface of the housing portion 120.
One end of the cleaning member assembly 100 may be driven and held by the cleaning member holding portion 200, and the other end may be driven by a member rotating portion 180 having a driving portion such as a motor (see fig. 3). In this case, the cleaning member holding portion 200 includes the second cleaning member holding portion 205b driven by the member rotating portion 180 and the first cleaning member holding portion 200a driven. In such an embodiment, the moving unit 150 formed of the elastic member 150a or the like may be provided in the driven unit.
The roller-type cleaning part 110 need not be a double-support structure but may be a cantilever structure as shown in fig. 4. In this case, the member rotating unit 180 is provided on the side holding the roller type cleaning member 110.
The peripheral edge projection 220 may be formed to have a thickness (right side in fig. 5 and 6) on the cleaning member assembly 100 side larger than a thickness (left side in fig. 5 and 6) on the opposite side of the roller-type cleaning member 110 in the vertical cross section. In the embodiment shown in fig. 5 and 6, the thickness of the peripheral edge projection 220 increases toward the cleaning member assembly 100 in the vertical cross section. However, the present invention is not limited to this configuration, and a configuration may be adopted in which the thickness of the peripheral edge projection 220 increases toward the cleaning member assembly 100 intermittently (for example, in a step-like manner). As shown in fig. 23A and 23B, the peripheral projection 220 may have a rectangular cross section and a uniform thickness.
As shown in fig. 13, the cleaning member holding portion 200 may have a first protruding portion 230 protruding outward of the peripheral edge, and the receiving portion 120 receiving the cleaning member holding portion 200 may have a first recess 190 receiving the first protruding portion 230 on the inner surface. In this case, the first protruding portion 230 is housed in the first recess 190, thereby restricting the rotation of the cleaning member holding portion 200. When one or more first protrusions 230 are provided, a plurality of first recesses 190 (see fig. 14) may be provided. The number of the first protrusions 230 need not coincide with the number of the first recesses 190 as long as the number of the first recesses 190 is greater than the number of the first protrusions 230. In this case, the first protruding portion 230 is housed in one of the first concave portions 190, thereby restricting the rotation of the cleaning member holding portion 200. The first protrusion 230 may have a pin shape, and the length thereof may be about 2mm to 5 mm.
In addition, unlike the above-described embodiment, as shown in fig. 15, the housing portion 120 housing the cleaning member holding portion 200 may have a second protruding portion 195 on the inner surface, and the cleaning member holding portion 200 may have a second recess 240 housing the second protruding portion 195. In this case, the second protruding portion 195 is accommodated in the second recess 240, thereby restricting the rotation of the cleaning member holding portion 200. When one or more second protrusions 195 are provided, a plurality of second recesses 240 (see fig. 16) may be provided. The number of the second protrusions 195 does not need to coincide with the number of the second recesses 240, and as long as the number of the second recesses 240 is greater than the number of the second protrusions 195. The second protrusion 195 may have a pin shape, and the length thereof may be about 2mm to 5 mm.
In addition, the above-described embodiments may be combined. For example, a combination of the peripheral edge protrusion 220, the first protrusion 230, and the first recess 190 may be used, or a combination of the peripheral edge protrusion 220, the second protrusion 195, and the second recess 240 may be used.
In the embodiment shown in fig. 17, a combination of the peripheral edge protruding portion 220, the first protruding portion 230, and the first recessed portion 190 is used. In the embodiment shown in fig. 18, a combination of the peripheral edge projection 220, the second projection 195, and the second recess 240 is shown.
In addition, when the combination of the peripheral edge protruding portion 220, the first protruding portion 230, and the first recess 190 is adopted, the configuration shown in fig. 19A and 19B may be adopted. As shown in fig. 21A and 21B, a plurality of first protrusions 230 and first recesses 190 may be used.
In addition, when the combination of the peripheral edge protruding portion 220, the second protruding portion 195, and the second recessed portion 240 is adopted, the configuration shown in fig. 20A and 20B may be adopted. As shown in fig. 22A and 22B, a plurality of second protrusions 195 and second recesses 240 may be used.
As shown in fig. 5 and 6, bearing 260 may include two or more bearing members 261. A lubricating fluid for wetting the bearing 260 may be supplied between the bearing members 261 in the axial direction. The lubricating fluid may be a cleaning fluid, in particular a rinsing fluid. Further, a sealing portion 290 may be provided outside the periphery of the inner member 280. The sealing portion may include a first sealing portion 291 and a second sealing portion 292 provided adjacent to the first sealing portion 291. The first closing part 291 and the second closing part 292 may be O-rings, respectively.
As shown in fig. 12, the peripheral projection 220 may have one or more grooves 220 a. The lubricating fluid for wetting the bearing 260 can flow to the cleaning member assembly 100 side of the housing portion 120 through the groove portion 220 a.
The steps of attaching the cleaning member assembly 100 to the cleaning member holding unit 200 and detaching the cleaning member assembly 100 from the cleaning member holding unit 200 will be described with reference to the embodiments shown in fig. 5, 6, 8, and 9.
When the cleaning member assembly 100 is attached to the cleaning member holding portion 200, the elastic member 150a is contracted by pressing the cleaning member assembly 100 into the cleaning member holding portion 200 on the driven portion side. In the embodiment shown in fig. 8 and 9, after the protruding portion 205a is positioned between the pair of protruding portions 105a, the cleaning member assembly 100 is press-fitted into the cleaning member holding portion 200 by fitting the key protruding portion 205b into the key recessed portion 105 b. In this state, since the mounting portion 201 of the cleaning member holding portion 200 is rotatable, the cleaning member assembly 100 is rotated to an appropriate position, and the other end of the cleaning member assembly 100 is mounted on the cleaning member holding portion 200 on the drive portion side (the member rotating portion 180 side). In the cleaning member holding portion 200 on the driving portion side, the key convex portion 205b is fitted into the key concave portion 105b after the protruding portion 205a is positioned between the pair of protruding portions 105 a.
When the cleaning member assembly 100 is detached from the cleaning member holding unit 200, the cleaning member assembly 100 is pushed into the cleaning member holding unit 200 on the driven unit side to contract the elastic member 150a, and then the other end of the cleaning member assembly 100 is detached from the cleaning member holding unit 200 on the driving unit side (the unit rotating unit 180 side). Subsequently, one end of the cleaning member assembly 100 is detached from the cleaning member holding part 200 on the driven part side. By detaching the cleaning member assembly 100 from the cleaning member holding portion 200 in this manner, the peripheral edge projection 220 comes into contact with the inner surface of the housing portion 120 housing the cleaning member holding portion 200 via the elastic member 150 a. The rotation of the cleaning member holding part 200 is restricted (fixed) by the peripheral edge projection 220 being pressed against the inner surface of the housing part 120 in this manner.
In the case of the cleaning member assembly 100 in which the cleaning member mounting portion 105 and the roller-type cleaning member 110 are separate bodies, the roller-type cleaning member 110 can be replaced by removing a mounting member such as a nut for fixing the roller-type cleaning member 110 to the cleaning member mounting portion 105 and mounting a new or cleaned roller-type cleaning member 110 to the cleaning member mounting portion 105.
As shown in fig. 26, the internal cleaning liquid supply unit 410, the external cleaning liquid supply unit 420, the component rotation unit 180, the support column 40 as a substrate support unit, the input unit 400 for inputting information by an operator, and the like are connected to the control unit 350 by wire or wirelessly, and configured to receive information from these components and give instructions to these components. In fig. 26, the conveyance mechanisms such as the first conveyance robot 322, the conveyance unit 324, the second conveyance robot 326, and the third conveyance robot 328 are collectively referred to as a conveyance unit 300.
Effect
Next, the effects of the present embodiment configured by the above-described configuration and effects not yet described will be mainly described. Even if not described in the "structure", all the structures described in the "effect" can be adopted in the present invention.
In general, the cleaning member holding part 200 has a rotatable structure because it has the bearing 260. Therefore, when the aspect of the present embodiment is not adopted, the part of the cleaning member holding part 200 on the cleaning member assembly 100 side (the right part in fig. 5) is rotatable. Since the rotational position of the cleaning member holding part 200 cannot be visually observed at the place where the roller-type cleaning member 110 is mounted on the cleaning member holding part 200, it takes time and effort to mount the roller-type cleaning member 110. For example, in the configuration shown in fig. 8 and 9, the cleaning member assembly 100 is mounted on the cleaning member holding portion 200 by fitting the key convex portion 205b into the key concave portion 105b, but since the mounting portion 201 of the cleaning member holding portion 200 is rotatable in a visually undetectable state, it takes time to position the protruding portion 205a between the pair of protruding portions 105 a. In addition, unlike the form in which the protruding portion 205a and the pair of protruding portions 105a are provided as shown in fig. 8 and 9, when the form in which the cleaning member assembly 100 can be attached in any direction of the cleaning member holding portion 200 without providing these protruding portions 205a and the pair of protruding portions 105a (the form having no directional characteristic at all) is adopted, the problem of the trouble of attachment is solved, but another problem occurs in which the rotational power cannot be appropriately transmitted from the cleaning member holding portion 200 to the cleaning member assembly 100.
In the present embodiment, the moving unit 150 is used, and the moving unit 150 moves the cleaning member holding unit 200 in the axial direction in a state where the cleaning member assembly 100 is removed and positions the cleaning member holding unit 200 at a rotation fixing position for restricting rotation of the cleaning member holding unit 200, and in this case, rotation of the cleaning member holding unit 200 can be restricted (fixed) in a state where the cleaning member assembly 100 is removed. Therefore, the cleaning member assembly 100 can be easily attached to the cleaning member holding portion 200. In the conventional aspect, since the cleaning member holding unit 200 is rotatable as described above, it takes time and effort to attach the cleaning member assembly 100 to the cleaning member holding unit 200. According to the present aspect, such a problem can be solved. Further, if it takes time to attach the cleaning member assembly 100 to the cleaning member holding part 200, the roller-type cleaning member 110 is contaminated, and the degree of cleaning is lowered.
When the moving unit 150 is formed of an elastic member 150a such as a spring, the rotation of the cleaning member holding unit 200 can be restricted without introducing a driving unit such as a motor. Therefore, the rotation of the cleaning member holding part 200 can be restricted easily and inexpensively.
Since there is no locking mechanism by the member rotating unit 180 such as a motor on the driven portion side of the cleaning member holding unit 200, the problem that the cleaning member holding unit 200 is rotatable easily occurs. In this regard, the problem can be solved by providing the driven portion with the moving portion 150 that restricts the rotation of the cleaning member holding portion 200. On the other hand, the member rotating portion 180 is restricted from rotating by a lock mechanism such as a servo lock, and therefore, will not rotate freely. However, when the lock mechanism such as the servo lock is released, the cleaning member holding unit 200 on the driving unit side (the unit rotating unit 180 side) is also rotatable, and therefore the moving unit 150 for positioning the cleaning member holding unit 200 at the rotation fixing position may be provided on the driving unit side (the unit rotating unit 180 side).
As shown in fig. 10 and 11, the cleaning member holding portion 200 has a peripheral edge protruding portion 220 protruding outside the peripheral edge, the peripheral edge protruding portion 220 is in surface contact with the inner surface of the housing portion 120 housing the cleaning member holding portion 200, and the rotation of the cleaning member holding portion 200 is restricted by the peripheral edge protruding portion 220 being pressed against the inner surface of the housing portion 120, and when this form is adopted, the rotation of the cleaning member holding portion 200 can be restricted by the resistance (sliding resistance) at the surface of the peripheral edge protruding portion 220. In the case of using the elastic member 150a as the moving portion 150, it is considered to use the elastic member 150a having a large spring constant in order to restrict the selection of the cleaning member holding portion 200, but it is advantageous in that the rotation of the cleaning member holding portion 200 can be restricted by bringing the peripheral edge protruding portion 220 into contact with the inner surface of the housing portion 120 without using the elastic member 150a having a very large spring constant.
As shown in fig. 12, in the case where the peripheral edge protruding portion 220 has one or more groove portions 220a, the lubricating fluid supplied to the bearing 260 through the groove portions 220a can be guided to the cleaning member assembly 100 side. Therefore, even if dust or the like adheres to the surface of the peripheral edge projection 220 on the cleaning member assembly 100 side, flushing with the lubricating fluid is enabled. When the cleaning member assembly 100 is attached and the substrate W is cleaned, the peripheral edge protruding portion 220 is rotatably separated from the housing portion 120, and therefore the surface of the peripheral edge protruding portion 220 on the cleaning member assembly 100 side can be easily cleaned by the lubricating fluid.
As shown in fig. 5 and 6, in the case where the thickness of the peripheral edge projection 220 in the vertical cross section on the cleaning member assembly 100 side is larger than the thickness on the opposite side of the roller-type cleaning member 110, the lubricating fluid supplied from the lubricating fluid supply pipe 121 is easily guided to the cleaning member assembly 100 side beyond the peripheral edge projection 220. Therefore, even if dust or the like adheres to the surface of the peripheral edge projection 220 on the cleaning member assembly 100 side as described above, flushing can be performed by the lubricating fluid. In addition, in the case of this form, the thickness of the rotation axis side (root) of the peripheral edge protruding portion 220 can be increased, and the strength can be improved.
As shown in fig. 13 and 14, in the case where the cleaning member holding portion 200 has the first protruding portion 230 protruding outward in the peripheral edge, and the accommodating portion 120 accommodating the cleaning member holding portion 200 has the first recess 190 accommodating the first protruding portion 230 on the inner surface, the first protruding portion 230 is accommodated in the first recess 190, whereby the rotation of the cleaning member holding portion 200 can be restricted. In this case, the end (mounting portion) of the cleaning member holding portion 200 on the cleaning member assembly 100 side can be more reliably prevented from rotating. However, in this embodiment, since the first protruding portion 230 needs to be housed in the first recess 190, the convenience is inferior to the configuration in which the peripheral edge protruding portion 220 protrudes on the peripheral edge of the holding main body portion 210. Further, by rotating the end portion (mounting portion 201) of the cleaning member holding portion 200 on the cleaning member assembly 100 side, the first protruding portion 230 is automatically housed in the first recess 190, so that the first protruding portion 230 is housed in the first recess 190.
When a plurality of first recesses 190 are provided, the number of first recesses 190 capable of accommodating the first protruding portion 230 can be increased, and therefore, the time and effort required to accommodate the first protruding portion 230 in the first recess 190 when the cleaning member assembly 100 is removed can be simplified. In the case where one first protrusion 230 and one first recess 190 are provided, respectively, when the cleaning member assembly 100 is detached, the cleaning member holding portion 200 can be always positioned at the same position. Therefore, in the case of the configuration shown in fig. 8 and 9, when the cleaning member assembly 100 is detached, the protruding portions 205a can be positioned substantially at the same position, and the protruding portions 205a can be easily positioned between the pair of protruding portions 105 a.
As shown in fig. 15 and 16, in the case where the receiving portion 120 for receiving the cleaning member holding portion 200 has the second protruding portion 195 on the inner surface and the cleaning member holding portion 200 has the second recessed portion 240 for receiving the second protruding portion 195, the rotation of the cleaning member holding portion 200 can be restricted by receiving the second protruding portion 195 in the second recessed portion 240. However, in this embodiment, since the second protruding portion 195 needs to be housed in the second recessed portion 240, it is necessary to confirm the positions of the second protruding portion 195 and the second recessed portion 240 when the cleaning member assembly 100 is detached, and this is less convenient than the configuration in which the peripheral edge protruding portion 220 protrudes on the peripheral edge of the main body portion 210. In the case where one second recess 240 and one second projection 195 are provided, the cleaning member holding part 200 can be always positioned at the same position when the cleaning member assembly 100 is detached, as in the above-described embodiment. Therefore, in the case of the configuration shown in fig. 8 and 9, when the cleaning member assembly 100 is detached, the protruding portions 205a can be positioned substantially at the same position, and the protruding portions 205a can be easily positioned between the pair of protruding portions 105 a.
As shown in fig. 24, in the form of using the peripheral edge protruding portion 220, the attachment portion 201 of the cleaning member holding portion 200 may be provided with a mark 270 such as a notch. The marks 270 may be provided in only one place, or may be provided in a pair in a positional relationship of 180 degrees. By providing such a mark 270, the attachment portion 201 of the cleaning member holding portion 200 can be positioned at a predetermined position, the cleaning member holding portion 200 can be positioned at an arbitrary position in the rotational direction, and the attachment portion 201 can be positioned at a position where it is easy to attach in accordance with the relationship with the cleaning member holding portion 200 on the drive portion side (the member rotating portion 180 side).
When a plurality of second recesses 240 are provided, the number of second recesses 240 capable of accommodating the second protruding portion 195 can be increased, and therefore, the time and effort required to accommodate the second protruding portion 195 in the second recesses 240 can be simplified when the cleaning member assembly 100 is detached.
The combination of the first protrusion 230 and the first recess 190 is superior to the combination of the second protrusion 195 and the second recess 240 in view of ease of manufacture.
The object to be processed to be cleaned by the cleaning member according to one embodiment is not limited to a semiconductor wafer, and may be a silicon wafer, a glass substrate, a printed wiring board, a liquid crystal panel, or a solar panel. The shape of the plane of the object to be processed may be circular or rectangular, and the thickness of the plane may be a thickness allowing in-plane deflection. The processed substrates include square substrates and circular substrates. The square substrate includes a polygonal glass substrate such as a rectangular substrate, a liquid crystal substrate, a printed circuit board, and other polygonal objects to be plated. The circular substrate includes a semiconductor wafer, a glass substrate, and other circular objects to be plated.
As the cleaning liquid, high-temperature pure water, APM (Ammonium Hydrogen-Peroxide Mixture, Mixture of ammonia and Hydrogen Peroxide water), SPM (Sulfuric-Acid Hydrogen Peroxide Mixture, Mixture of Sulfuric Acid and Hydrogen Peroxide water), carbonated water, ultrasonic water, ozone water, and the like can be used.
The above description of the embodiments and the drawings are only for the purpose of illustrating the invention to be protected, and the invention to be protected is not limited to the above description of the embodiments or the drawings. The description of the scope of the invention to be protected at the time of application is merely an example, and the description of the invention to be protected can be appropriately modified based on the description of the specification and the drawings.
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