阅读说明：本技术 一种基于低温等离子体表面改性的非球面反射镜镀膜方法 (Aspheric surface reflector coating method based on low-temperature plasma surface modification ) 是由 张裕 曹猛 彭新力 李梦迪 张越 陈蔓菲 张恺霖 于子雯 孟锦 徐熙平 于 2021-07-19 设计创作，主要内容包括：一种基于低温等离子体表面改性的非球面反射镜镀膜方法,属于镀膜加工技术领域,为了解决现有镀膜工艺PMMA衬底容易吸潮,导致膜层脱落的问题,该方法包括以下步骤：支持系统保证与控制电脑连接,控制电脑首先控制真空系统为镀膜提供真空环境,控制电脑再控制主要电脑,主要电脑通过控制高压电源来使电子枪发射电子束,通过改变高压电源的电压来改变电子束的速度,主要电脑控制电子束控制单元,电子束控制单元通过改变极板之间的电压来控制电子束的运动方向,电子枪位于高真空室内由其产生电子束,并通过入射窗进入低真空室；电子束电离反应气而产生等离子体,或者通过射频源激发反应室内反应气体,产生等离子体云；对PMMA样品表面进行改性。(A coating method of an aspheric surface reflector based on low-temperature plasma surface modification belongs to the technical field of coating processing, and aims to solve the problem that a PMMA substrate is easy to absorb moisture to cause film layer shedding in the existing coating process, and the method comprises the following steps: the support system is connected with a control computer, the control computer firstly controls the vacuum system to provide a vacuum environment for coating, and then controls the main computer, the main computer enables the electron gun to emit electron beams by controlling the high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls the electron beam control unit, the electron beam control unit controls the motion direction of the electron beams by changing the voltage between the polar plates, the electron gun is positioned in the high-vacuum chamber, generates the electron beams by the electron gun and enters the low-vacuum chamber through the incident window; the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; the surface of the PMMA sample is modified.)

1. A method for coating a film on an aspheric surface reflector based on low-temperature plasma surface modification is characterized by comprising the following steps:

firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, the electron gun is positioned in a high-vacuum chamber, generates the electron beams by the electron gun and enters a low-vacuum chamber through an incidence window;

secondly, filling a reaction gas O in the low vacuum chamber₂At the moment, the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; detecting the concentration of the generated plasma in real time through a plasma detection system;

and step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample.

Technical Field

The invention relates to a film coating method for an aspheric reflector, and belongs to the technical field of film coating processing.

Background

At present, the aspheric surface reflector in the panoramic lens is made of plastic materials, and because the plastic lens can be processed by an injection molding method, compared with the traditional processing method of the glass aspheric surface optical element, the aspheric surface optical element needs to be prepared with a high reflection film.

The metal reflection film is designed by adopting metal, common metal coating materials comprise Al, Ag, Au and Cu, and the Al is adopted as the coating material in consideration of excellent performance and economy of the Al. However, when only a single-layer Al reflective film is prepared, the reflectivity of the film in the visible light range is only about 90%, and the film cannot meet the use requirements. Therefore, the reinforced aluminum reflective film design should be adopted to meet the use requirement of high reflection. Reinforcing an aluminum reflective film base film system: p | LALHL | Air, wherein P stands for PMMA substrate, L stands for SiO2, H stands for TiO2, A stands for Al, and the first layer SiO2 is set to 20nm as a connecting layer, which does not participate in the optimization of the film system and mainly aims at improving the bonding force of Al and PMMA.

The total number of layers of the high-reflection film designed by the all-dielectric material is large, the total thickness is too thick, the preparation difficulty is high, and meanwhile, the substrate temperature is increased, the color of the PMMA substrate is changed, and the film layer falls off due to overlong film deposition time in consideration of the particularity of PMMA substrate film coating.

Disclosure of Invention

The invention provides a coating method of an aspheric surface reflector based on low-temperature plasma surface modification, aiming at solving the problem that a PMMA substrate is easy to absorb moisture to cause film layer falling in the existing coating process.

A method for coating a film on an aspheric surface reflector based on low-temperature plasma surface modification is characterized by comprising the following steps:

firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, the electron gun is positioned in a high-vacuum chamber, generates the electron beams by the electron gun and enters a low-vacuum chamber through an incidence window;

secondly, filling a reaction gas O in the low vacuum chamber₂At the moment, the electron beam ionizes the reaction gas to generate plasma, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud; detecting the concentration of the generated plasma in real time through a plasma detection system;

and step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample.

The invention has the beneficial effects that:

the first is that the temperature is low, and the low-temperature plasma is adopted to modify the PMMA substrate to improve the film adhesion;

secondly, only surface nano-scale modification is involved, and the damage to the surface of the material is small;

and thirdly, the surface is uniformly modified and is suitable for surface type treatment of the high-order aspheric surface reflector adopted in the method.

Drawings

FIG. 1 is a working system diagram of a method for coating a non-spherical reflector based on low-temperature plasma surface modification according to the present invention.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings.

As shown in fig. 1, a method for coating an aspheric mirror based on low-temperature plasma surface modification includes the following steps:

firstly, a support system is connected with a control computer to keep fast and normal operation, the control computer firstly controls a vacuum system to provide a vacuum environment for coating, and then controls a main computer, the main computer enables an electron gun to emit electron beams by controlling a high-voltage power supply, the speed of the electron beams is changed by changing the voltage of the high-voltage power supply, the main computer controls an electron beam control unit, the electron beam control unit controls the moving direction of the electron beams by changing the voltage between polar plates, an electron gun 1 is positioned in a high-vacuum chamber, generates electron beams 2 by the electron gun, and enters a low-vacuum chamber 3 through an incidence window 4.

Secondly, filling a reaction gas O in the low vacuum chamber₂At this time, the electron beam ionizes the reaction gas to generate plasma 6, or the reaction gas in the reaction chamber is excited by the radio frequency source to generate plasma cloud. The concentration of plasma generation is detected in real time by a plasma detection system.

And step three, carrying out complex physical and chemical actions on the high-chemical-activity plasma and the surface of the sample to modify the surface of the PMMA sample 7.