阅读说明：本技术 一种等离子蚀刻阳极板 (Plasma etching anode plate ) 是由 柯良节 伍连彬 王照洋 于 2021-07-28 设计创作，主要内容包括：本发明公开了一种等离子蚀刻阳极板,其中,所述等离子蚀刻阳极板包括设置有若干安装位的阳极板本体,以及可拆卸安装在所述安装位上的通孔个体。本发明将通孔个体制备成可拆卸的单独产品,而在所述阳极板本体上预留安装这些通孔个体的安装位,这样可实现通孔个体在阳极板本体上的可拆卸安装。采用本发明提供的等离子蚀刻阳极板,每次蚀刻生产结束后可直接检查通孔个体磨损情况,对有磨损的通孔个体进行更换即可,不必更换整块阳极板,从而可避免浪费、节约成本,又可以节约拆卸阳极板的时间,进而提高生产效率。(The invention discloses a plasma etching anode plate, wherein the plasma etching anode plate comprises an anode plate body provided with a plurality of mounting positions and a through hole body detachably mounted on the mounting positions. The invention prepares the individual through holes into a detachable individual product, and reserves the installation positions for installing the individual through holes on the anode plate body, thereby realizing the detachable installation of the individual through holes on the anode plate body. By adopting the plasma etching anode plate provided by the invention, the abrasion condition of the through hole individual can be directly checked after the etching production is finished each time, the abraded through hole individual can be replaced without replacing the whole anode plate, so that the waste can be avoided, the cost can be saved, the time for detaching the anode plate can be saved, and the production efficiency can be further improved.)

1. The plasma etching anode plate is characterized by comprising an anode plate body provided with a plurality of mounting positions and a through hole body detachably mounted on the mounting positions.

2. The plasma etched anode plate of claim 1, wherein the mounting location includes a first through hole and a tongue located at a periphery of the first through hole.

3. The plasma-etched anode plate of claim 2, wherein the individual through-holes comprise a plate body sized to fit the first through-hole, and a second through-hole disposed in the middle of the plate body.

4. The plasma-etched anode plate of claim 3, wherein a groove is disposed around the plate body and is adapted to the tongue.

5. The plasma-etched anode plate of claim 2, wherein at least two mounting locations are provided on the anode plate body, and the square through-holes in different mounting locations are the same or different in size.

6. The plasma etched anode plate of claim 1, wherein the anode plate body is an alumina plate.

7. The plasma-etched anode plate of claim 1, wherein the individual through-holes are made of a metal material and a graphene film is formed on a surface of the individual through-holes.

Technical Field

The invention relates to the technical field of stone plasma etching, in particular to a plasma etching anode plate.

Background

Plasma etching is a very important process in semiconductor manufacturing, including etching circuits, surface cleaning, dicing, etc.

One general process of plasma etching is: the plasma is accelerated in a strong electric field to bombard the etched surface, thereby achieving the purpose of etching. As shown in fig. 1, in the etching process, the anode plate is an alumina plate with a sapphire structure, and through holes with different aperture sizes are punched on the alumina plate according to the etching requirement. A portion of the plasma is passed through the aperture to etch the etched object. While the remaining majority of the plasma bombards directly on the anode plate. The desired pattern or line is etched by planar motion of the object being etched. The size of the through hole on the anode plate is generally determined according to the thickness of the line body to be etched.

However, since a large amount of plasma penetrates through the through-holes of the anode plate, the edges of the through-holes are also etched by the plasma impinging on the through-holes, which may deform the through-holes over time, thereby affecting the etching accuracy. Generally, in the production process, in order to ensure the precision of products and the stability of product performance, an anode plate needs to be replaced when one product is etched, which causes great waste of the anode plate and high etching cost.

Accordingly, the prior art is yet to be improved and developed.

Disclosure of Invention

In view of the above-mentioned deficiencies of the prior art, an object of the present invention is to provide a plasma-etched anode plate, which aims to solve the problems of the conventional plasma-etched anode plate that the edge of the through hole is easily etched, resulting in large waste of the anode plate and high etching cost.

The technical scheme of the invention is as follows:

a plasma etching anode plate comprises an anode plate body provided with a plurality of mounting positions and a through hole body detachably mounted on the mounting positions.

The plasma etching anode plate is characterized in that the mounting position comprises a first through hole and a convex groove positioned on the periphery of the first through hole.

The plasma etching anode plate is characterized in that the through hole body comprises a plate body with the size matched with that of the first through hole and a second through hole arranged in the middle of the plate body.

The plasma etching anode plate is characterized in that grooves matched with the convex grooves are formed in the periphery of the plate body.

The plasma etching anode plate is characterized in that at least two mounting positions are arranged on the anode plate body, and the sizes of square through holes in different mounting positions are the same or different.

The plasma etching anode plate is characterized in that the anode plate body is an aluminum oxide plate.

The plasma etching anode plate is characterized in that the through hole individuals are made of metal materials, and graphene films are formed on the surfaces of the through hole individuals.

Has the advantages that: compared with the prior art, the invention provides the detachable separated plasma etching anode plate, through the separation of the through hole individuals and the anode plate body, namely, the through hole individuals are prepared into detachable independent products, and the installation positions for installing the through hole individuals are reserved on the anode plate body. Like this, direct check through-hole individual wearing and tearing condition after production at every turn, to have wearing and tearing through-hole individual change can, need not change monoblock anode plate to can avoid extravagant, practice thrift the cost, can practice thrift the time of dismantling the anode plate again, and then improve production efficiency.

Drawings

FIG. 1 is a schematic diagram of a prior art plasma etch process.

FIG. 2 is a comparison of plasma etched anode plates before and after etching.

Fig. 3 is a schematic structural diagram of an anode plate body according to the present invention.

FIG. 4 is a schematic structural diagram of a through-hole unit according to the present invention.

FIG. 5 is a schematic diagram of a plasma etched anode plate according to the present invention.

Detailed Description

The present invention provides a plasma etching anode plate, and the present invention is further described in detail below to make the purpose, technical scheme and effect of the present invention clearer and clearer. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

As shown in fig. 1, in the etching process, the anode plate is an alumina plate with a sapphire structure, and through holes with different aperture sizes are punched on the alumina plate according to the etching requirement. A portion of the plasma is passed through the aperture to etch the etched object. While the remaining majority of the plasma bombards directly on the anode plate. The desired pattern or line is etched by planar motion of the object being etched. The size of the through hole on the anode plate is generally determined according to the thickness of the line body to be etched.

However, since there is a large amount of plasma passing through the through-holes of the anode plate, the through-holes are also etched by the plasma impinging on the through-holes, which may deform the through-holes over time, as shown in fig. 2, thereby affecting the etching accuracy. Generally, in the production process, in order to ensure the precision of products and the stability of product performance, an anode plate needs to be replaced every time a product is etched.

Based on this, the invention provides a plasma etching anode plate, as shown in fig. 3-4, which comprises an anode plate body 10 provided with a plurality of mounting positions 11, and a through hole individual 20 detachably mounted on the mounting positions 11.

In the embodiment, the through hole individuals are prepared into detachable independent products, and the installation positions for installing the through hole individuals are reserved on the anode plate body, so that the detachable installation of the through hole individuals on the anode plate body can be realized. Adopt the plasma etching anode plate that this embodiment provided, can directly inspect the individual wearing and tearing condition of through-hole after the etching production at every turn, to having wearing and tearing through-hole individual change can, needn't change monoblock anode plate to practice thrift the cost, can practice thrift the time of dismantling the anode plate again, and then improve production speed.

Because of the extremely high demands of semiconductor production, the anode plate in etching machines is typically made of high purity alumina (sapphire structure) and is therefore costly, considering that some products are etched over long periods of time. Through the scheme of the embodiment, the replacement of one whole block of high-purity alumina (sapphire structure) at a time can be changed into the replacement of only a small part of the high-purity alumina, so that a large amount of capital cost can be saved.

In some embodiments, the mounting location comprises a first through hole and a tongue located at the periphery of the first through hole; the through hole body comprises a plate body matched with the first through hole in size and a second through hole arranged in the middle of the plate body. In this embodiment, the first through hole may be one of a square, a triangle, a circle, or any polygon, but is not limited thereto. The plate body is matched with the first through hole in shape and size, so that the through hole is conveniently and individually connected with the mounting position in a seamless mode.

In some embodiments, as shown in fig. 3, taking the first through hole as a square through hole as an example, the mounting position 11 includes a square through hole 12 and a convex groove 13 located at the periphery of the square through hole 12. Correspondingly, as shown in fig. 4, the through-hole unit 20 includes a square plate body 21 adapted to the square through-hole 12 in size, and a second through-hole 22 disposed in the middle of the square plate body 21, a groove adapted to the convex groove 13 is disposed around the square plate body, and the second through-hole 22 is circular.

In this embodiment, the square plate body 21 of the through-hole unit 20 is matched with the square through-hole of the mounting position in shape and size, and the through-hole unit 20 and the mounting position 11 can be mounted by matching the groove and the tongue.

In some embodiments, as shown in fig. 5, the shape of the first through hole is a circular through hole, and then the shape of the plate body of the individual through hole is also circular, and the size of the circular plate body is matched with the size of the circular through hole.

In some embodiments, at least two mounting positions are arranged on the anode plate body, and the sizes of the square through holes in different mounting positions are the same or different. Specifically, the number of the installation positions arranged on the anode plate body can be set according to actual needs, and the size of the square through hole in the different installation positions can also be set according to needs.

In some embodiments, the sizes of the square through holes in different mounting positions may be the same or different, and as shown in fig. 3, two mounting positions are provided on the anode plate body, and the sizes of the square through holes in the two mounting positions are different.

In some embodiments, the anode plate body is an alumina plate, but is not limited thereto.

In some embodiments, the through-hole unit is made of a metal material, and a graphene film is formed on a surface of the through-hole unit. Specifically, since the through-hole unit is required to have wear resistance and robustness, the present embodiment considers that a graphene film is formed on the surface of the through-hole unit made of a metal material to enhance the wear resistance and robustness and to improve the service life thereof. In this embodiment, a graphene film may be formed on the through hole unit by a vapor deposition method, specifically, taking the copper plate as the through hole unit as an example, methane and the copper plate are placed in the 1200-degree high-temperature vacuum chamber, the methane may be split into carbon atoms and hydrogen atoms, the hydrogen atoms may be combined into hydrogen molecules when the temperature is gradually reduced, the carbon atoms may be drilled into the copper plate when the temperature is reduced, and the carbon atoms may be separated from the inside of the copper to form the graphene film on the surface of the copper when the temperature is reduced. Due to the fact that the mechanical strength of the graphene is very high, the graphene can resist the friction of plasma, and deformation of the through hole is reduced.

In summary, the invention provides a detachable plasma etching anode plate, which separates through-hole individuals from an anode plate body, i.e. the through-hole individuals are prepared into detachable individual products, and mounting positions for mounting the through-hole individuals are reserved on the anode plate body. Like this, direct check through-hole individual wearing and tearing condition after production at every turn, to have wearing and tearing through-hole individual change can, need not change monoblock anode plate to can avoid extravagant, practice thrift the cost, can practice thrift the time of dismantling the anode plate again, and then improve production efficiency.

It is to be understood that the invention is not limited to the examples described above, but that modifications and variations may be effected thereto by those of ordinary skill in the art in light of the foregoing description, and that all such modifications and variations are intended to be within the scope of the invention as defined by the appended claims.