阅读说明：本技术 放电发生结构及基于其的平面式等离子放电发生装置 (Discharge generating structure and planar plasma discharge generating device based on same ) 是由 陈大龙 陈伟 谢帅 于 2021-09-02 设计创作，主要内容包括：本发明公开了一种放电发生结构,包括至少一对极性不同的电极,不同极性的电极间隔排列,相邻的电极之间填充有绝缘介质,通电后,相邻的电极之间形成电弧,所述电弧在绝缘介质的阻隔之下高于相邻的电极最高点所在的平面。基于上述放电发生结构,选择适配的用于固定放电发生结构的固定支架,还设计了一种平面式等离子放电发生装置。本发明采用单边电极放电和填充绝缘介质的设计,可以产生大面积的等离子体放电区域,解决了在表面处理、制备臭氧、以及灭杀细菌和病毒等领域内现有技术难以进行单面处理的问题,具有处理方式灵活、效果好、面积大、效率高的优势,同时,放电电极的体积更小、结构更简单、放电电量高且系统稳定,适用于工业生产和应用。(The invention discloses a discharge generating structure, which comprises at least one pair of electrodes with different polarities, wherein the electrodes with different polarities are arranged at intervals, an insulating medium is filled between every two adjacent electrodes, after the electrodes are electrified, an electric arc is formed between every two adjacent electrodes, and the electric arc is higher than the plane where the highest point of each adjacent electrode is located under the obstruction of the insulating medium. Based on the discharge generating structure, the adaptive fixing support for fixing the discharge generating structure is selected, and the planar plasma discharge generating device is further designed. The invention adopts the design of single-side electrode discharge and insulating medium filling, can generate a large-area plasma discharge area, solves the problem that the prior art is difficult to perform single-side treatment in the fields of surface treatment, ozone preparation, bacteria and virus killing and the like, has the advantages of flexible treatment mode, good effect, large area and high efficiency, simultaneously has smaller volume of the discharge electrode, simpler structure, high discharge capacity and stable system, and is suitable for industrial production and application.)

1. An electric discharge generating structure characterized in that: the discharge generating structure comprises at least one pair of electrodes with different polarities, the electrodes with different polarities are arranged at intervals, an insulating medium (1) is filled between every two adjacent electrodes, after the electrodes are electrified, an electric arc is formed between every two adjacent electrodes, and the electric arc is higher than the plane where the highest point of each adjacent electrode is located under the obstruction of the insulating medium (1).

2. The discharge generating structure according to claim 1, wherein: the filling height of the insulating medium (1) is flush with or higher than the height of the electrode.

3. The discharge generating structure according to claim 1, wherein: the electrode comprises an electrode tube (2) and conductive metal (3), wherein the electrode tube (2) is hollow and communicated with the inside of the electrode tube, the electrode tube (2) comprises a clamping part (210), an electrode part (220) and groove parts (230) formed by inwards concave parts on two sides of the connecting part of the clamping part (210) and the electrode part (220), an electrode hole (240) is formed in the electrode part (220), and the conductive metal (3) is arranged in the electrode hole (240).

4. The discharge generating structure according to claim 3, wherein: the electrode tube (2) is square, round or I-shaped.

5. The discharge generating structure according to claim 3, wherein: two sides of the electrode hole (240) are obliquely arranged and used for pressing the conductive metal (3).

6. A planar plasma discharge generating device is characterized in that: the planar plasma discharge generating device comprises the discharge generating structure as claimed in any one of claims 1 to 5 and a fixing bracket for fixing the discharge generating structure.

7. The planar plasma discharge generating apparatus according to claim 6, wherein: the fixed bolster includes insulating mount (4) and insulating backup pad (5), insulating mount (4) are two, insulating mount (4) set up the both ends at insulating backup pad (5), the even arrangement of electrode of discharging generating structure is between two insulating mounts (4).

8. The planar plasma discharge generating apparatus according to claim 7, wherein: the insulating support plate (5) and the insulating fixing frame (4) are integrally formed.

9. The planar plasma discharge generating apparatus according to claim 7, wherein: the insulating fixing frame (4) comprises a fixing plate (6), a groove (7) is formed in the fixing plate (6), and one end of the electrode is arranged in the groove (7).

10. The planar plasma discharge generating apparatus according to claim 6, wherein: the fixing support further comprises a limiting structure (10) for limiting the position of the electrode.

Technical Field

The invention relates to the technical field of discharge equipment, in particular to a discharge generation structure.

Background

Corona treatment is an electric shock treatment that provides the surface of the substrate with higher adhesion. The principle is that corona discharge is carried out on the surface of the treated plastic by using high frequency and high voltage to generate low-temperature plasma, so that free radical reaction is generated on the surface of the plastic to crosslink the polymer. The plastic surface becomes rough and increases the wettability to polar solvents, the molecular structure of the plasmas is damaged by electric shock and penetration into the surface of the printed body, the treated surface molecules are oxidized and polarized, and the ion shock erodes the surface, so that the adhesion capability of the surface of the printed material is increased.

At present, most of existing plasma discharge technical products on the market adopt the traditional technical scheme of two-side opposite type pair of electrodes and double-side penetration discharge, so that the problems of single-side treatment difficulty, low treatment efficiency, poor treatment effect and the like exist, the requirement of large-area plasma discharge treatment cannot be met, and the plasma discharge technical products are very inconvenient to apply. Therefore, the plasma discharge generating structure capable of single-side discharge treatment is designed, which is very beneficial to industrial production.

Disclosure of Invention

The present invention is directed to a plasma discharge generating structure capable of single-sided discharge processing to solve the above problems.

The technical scheme adopted by the invention for solving the problems is as follows: a discharge generating structure comprises at least one pair of electrodes with different polarities, the electrodes with different polarities are arranged at intervals, insulating media are filled between every two adjacent electrodes, after the electrodes are electrified, electric arcs are formed between every two adjacent electrodes, and the electric arcs are higher than the planes where the highest points of the adjacent electrodes are located under the obstruction of the insulating media.

Further specifically, the filling height of the insulating medium is flush with or higher than the height of the electrode.

Further specifically, the electrode comprises an electrode tube and conductive metal, wherein the electrode tube is hollow and penetrates through the inside of the electrode tube, the electrode tube comprises a clamping part, an electrode part and groove parts formed by concave recesses on two sides of the connecting part of the clamping part and the electrode part, an electrode hole is formed in the electrode part, and the conductive metal is arranged in the electrode hole.

Further specifically, the electrode tube is square, circular or I-shaped.

Further specifically, both sides of the electrode hole are obliquely arranged for compressing the conductive metal.

Further specifically, the planar plasma discharge generating device comprises the discharge generating structure and a fixing bracket for fixing the discharge generating structure.

Further specifically, the fixed bolster includes insulating mount and insulating backup pad, insulating mount is two, insulating mount sets up the both ends at insulating backup pad, the even arrangement of electrode of structure takes place in two insulating mounts.

Further specifically, the insulating support plate and the insulating fixing frame are integrally formed.

Further specifically, the insulating mount includes the fixed plate, it has the recess to open on the fixed plate, the one end setting of electrode is in the recess.

Further specifically, the fixed support further comprises a limiting structure for limiting the position of the electrode.

The invention has the following beneficial effects:

1. the invention adopts the design of single-side electrode discharge and filling of insulating medium, can generate a large-area plasma discharge area, solves the problem that the prior art is difficult to carry out single-side treatment in the fields of surface treatment, ozone preparation, sterilization, virus killing and the like, and has the advantages of flexible treatment mode, good effect, large area and high efficiency.

2. Due to the design of the unilateral electrode, the discharge electrode is smaller in volume, simpler in structure, high in discharge capacity and stable in system, and is suitable for industrial production and application.

Drawings

FIG. 1 is a schematic structural diagram of a planar plasma discharge generator;

FIG. 2 is a schematic diagram of the structure of an electrode;

FIG. 3 is a schematic structural diagram of an insulating fixing frame;

wherein: 1-insulating medium, 2-electrode tube, 3-conductive metal, 4-insulating fixing frame, 5-insulating supporting plate, 6-fixing plate, 7-groove, 8-high-voltage insulator, 9-fixing hole, 10-limit stop, 210-clamping part, 220-electrode part, 230-groove part and 240-electrode hole.

Detailed Description

The present invention will be described in detail below with reference to specific embodiments shown in the drawings. These embodiments are not intended to limit the present invention, and structural, methodological, or functional changes made by those skilled in the art according to these embodiments are included in the scope of the present invention.

If the invention is described in terms of orientations (e.g., up, down, left, right, front, back, outside, inside, etc.), the orientation involved needs to be defined, for example, "for clarity of presentation of the positions and orientations described within the invention, with reference to the operator of the instrument, the end proximal to the operator being the proximal end and the end distal to the operator being the distal end. "or defined with reference to the paper surface, the refrigerator depth direction, and the like. Of course, if the positional relationship between the two is defined by cross-reference at the time of the subsequent description, it may not be defined here.

The invention aims to provide a plasma discharge generating structure capable of performing single-side discharge treatment so as to realize single-side treatment on an article.

As shown in fig. 2, the technical solution adopted by the present invention is: a discharge generating structure comprises at least one pair of electrodes with different polarities, the electrodes with different polarities are arranged at intervals, an insulating medium 1 is filled between every two adjacent electrodes, after the electrodes are electrified, an electric arc is formed between every two adjacent electrodes, the electric arc is higher than a plane where the highest points of the adjacent electrodes are located under the obstruction of the insulating medium 1, and the plane where the highest points are located is a plane where the highest points of the two electrodes on the upper portion of a figure 2 are located. The discharge generating structure adopts double-medium plasma discharge, the plasma generated by the discharge mode is several times of that of the traditional single-medium discharge, and the discharge generating structure is more stable, has lower temperature and has larger processing range in principle. Every two adjacent electrodes with different polarities can generate double-medium plasma discharge, so that the space can be effectively utilized.

The electrode comprises an anode and a cathode, the anode is an insulated electrode connected with a high-voltage power supply and provides a high-voltage anode, and the cathode is an insulated electrode grounding wire and provides a low-voltage cathode. The cathode and the anode are arranged in the same direction, so that the two poles are prevented from being opposite.

An insulating medium 1 is filled between the anode and the cathode, wherein the filling height of the insulating medium 1 is flush with or higher than the height of the electrode, so that the arc is completely positioned at one side of the electrode.

Fig. 2 shows an embodiment of the electrode of the present invention.

The electrode comprises an electrode tube 2 and conductive metal 3, wherein the electrode tube 2 is hollow and communicated with the inside of the electrode tube, the electrode tube 2 comprises a clamping part 210, an electrode part 220 and groove parts 230 formed by inwards recessing two sides of the connecting part of the clamping part 210 and the electrode part 220, an electrode hole 240 is formed in the electrode part 210, and the conductive metal 3 is arranged in the electrode hole 240. The hollow through design ensures that the inside of the electrode is well ventilated, heat can be directly exchanged with the outside, better heat dissipation is facilitated, and the stability and the safety of the system are improved.

Both sides of the electrode hole 240 are obliquely arranged to compress the conductive metal 3. The inclined angles of the two sides can be consistent or inconsistent, and the conductive metal 3 can be selected according to the requirements of users only by being capable of being pressed and is stable without moving.

In addition, the electrode tube 2 may also be square, circular or i-shaped.

Further, based on the discharge generating structure, the invention also provides a planar plasma discharge generating device, which comprises the discharge generating structure and a fixing bracket for fixing the discharge generating structure.

As shown in fig. 1 and fig. 3, in this embodiment, the fixing bracket includes an insulating fixing frame 4 and an insulating supporting plate 5, where the insulating fixing frame 4 is used to limit an electrode, fix the electrode, and isolate a high-voltage environment of the electrode.

The number of the insulation fixing frames 4 is two, the insulation fixing frames 4 are arranged at two ends of the insulation supporting plate 5, and the electrodes of the discharge generating structure are uniformly distributed between the two insulation fixing frames 4. The insulating fixing frame 4 comprises a fixing plate 6, a groove 7 is formed in the fixing plate 6, and one end of the electrode is arranged in the groove 7. After the power is switched on, under the blocking action of the insulating medium 1, a plurality of electric arcs completely positioned on the same side of the electrode extend to the upper surface of the insulating support plate 5, and under the condition that the sizes of all parts are proper, the electric arcs can extend to another electric arc to form an approximate plane.

In practical use, the electrode can be fixed on the insulating fixing frame 4 or the insulating supporting plate 5 by gluing. In addition, fixing holes may be formed in the insulating fixing frames 4, and the electrodes may pass through the corresponding fixing holes in the two insulating fixing frames 4 and be fixed to the insulating fixing frames 4 by fasteners.

And a lead and a high-voltage insulator 8 are arranged on the insulating support plate 5.

The insulating support plate 5 and the insulating fixing frame 4 can be two separate parts or one part formed integrally, and only the function of fixing and supporting the insulating support plate is needed to be realized.

And the corresponding positions of the insulating fixing frame 4 and the insulating supporting plate 5 are provided with insulating fixing holes 9, and the insulating fixing holes 9 are used for fixing the whole planar plasma discharge generating device on an external structure so as to realize the function of the planar plasma discharge generating device.

Further specifically, the fixed support further comprises a limiting structure for limiting the position of the electrode. According to user's demand, can increase and decrease the quantity of electrode, adopt limit structure to carry out spacingly to the electrode, make it not take place the displacement, improve its stability. The limiting structure can be a limiting stop 10 or a limiting barrier strip, and is clamped in the groove 7 of the insulating fixing frame 4.

The plane plasma discharge generating device provided by the invention is mainly used for surface treatment of various materials, ozone preparation and sterilization and virus killing on the surface of an object. The surface treatment mainly comprises surface purification, surface activation, surface roughening, surface etching and surface deposition.

The invention adopts the design of single-side electrode discharge and filling of the insulating medium 1, can generate a large-area plasma discharge area, solves the problem that the prior art is difficult to carry out single-side treatment, and has the advantages of flexible treatment mode, good effect, large area and high efficiency.

Meanwhile, one side of the two sides of the pair of discharge electrodes is reduced due to the design of the single-side electrode, so that the discharge electrodes are smaller in volume, simpler in structure, high in discharge capacity, stable in system and suitable for industrial production and application.

It should be understood that although the present description refers to embodiments, not every embodiment contains only a single technical solution, and such description is for clarity only, and those skilled in the art should make the description as a whole, and the technical solutions in the embodiments can also be combined appropriately to form other embodiments understood by those skilled in the art.

The above-listed detailed description is only a specific description of a possible embodiment of the present invention, and they are not intended to limit the scope of the present invention, and equivalent embodiments or modifications made without departing from the technical spirit of the present invention should be included in the scope of the present invention.