阅读说明：本技术 光学膜片厚度自适应设计方法及系统 (Adaptive design method and system for thickness of optical diaphragm ) 是由 陈瑜 黄杰明 林媛媛 戴顺鹏 邱旭平 于 2021-10-21 设计创作，主要内容包括：本发明公开了一种光学膜片厚度自适应设计方法及系统,包括如下步骤：S1：首先处理器初步计算目标亮度/色度要求下各区域对应的膜厚数据；S2：调节上下基板的电压,使各区域液位发生变化；S3：位于出光成像侧的成像亮度色度计扫描出光面,获取各区域对应的多点亮度与色度数据,上传至数据处理器中；S4：将步骤S3上传的亮度/色度数据和分布情况与给定的目标值进行比较,判断是否符合要求；S5：结束调整循环,输出各区域电压、液位、膜厚、亮度/色度数据及均匀性结果；本发明创新的将反馈控制引入光学膜片设计中,实现指定亮度/色度指标下的光学膜片厚度、表面形貌自动设计；可解决人工设计效率低、工作繁琐、精度低、成本高等问题。(The invention discloses a method and a system for adaptively designing the thickness of an optical diaphragm, which comprises the following steps: s1: firstly, a processor preliminarily calculates film thickness data corresponding to each region under the requirement of target brightness/chromaticity; s2: adjusting the voltage of the upper and lower substrates to change the liquid level of each region; s3: an imaging brightness colorimeter positioned on the light-emitting imaging side scans the light-emitting surface, acquires multi-point brightness and chromaticity data corresponding to each region, and uploads the multi-point brightness and chromaticity data to a data processor; s4: comparing the brightness/chromaticity data and the distribution situation uploaded in the step S3 with a given target value, and judging whether the brightness/chromaticity data and the distribution situation meet the requirements; s5: ending the adjustment cycle, and outputting voltage, liquid level, film thickness, brightness/chromaticity data and uniformity results of each region; feedback control is innovatively introduced into the design of the optical diaphragm, so that the automatic design of the thickness and the surface appearance of the optical diaphragm under the specified brightness/chromaticity index is realized; the problems of low manual design efficiency, complex work, low precision, high cost and the like can be solved.)

1. An adaptive design method for the thickness of an optical diaphragm is characterized by comprising the following steps: the method comprises the following steps:

s1: firstly, a processor preliminarily calculates film thickness data corresponding to each region under the requirement of target brightness/chromaticity;

s2: adjusting the voltage of the upper and lower substrates according to the voltage values of the regions obtained in the step S1 to change the liquid level of each region;

s3: an imaging brightness colorimeter positioned on the light-emitting imaging side scans the light-emitting surface, acquires multi-point brightness and chromaticity data corresponding to each region, and uploads the multi-point brightness and chromaticity data to a data processor;

s4: comparing the brightness/chromaticity data and the distribution situation uploaded in the step S3 with a given target value, and judging whether the brightness/chromaticity data and the distribution situation meet the requirements;

if the current brightness/chroma condition is consistent with the target condition, sending a response of 'yes', and if not, sending a response of 'no';

when a yes response is sent, the liquid level distribution can enable the brightness or the chroma to meet the expected uniformity or distribution rule at the moment, and continuous adjustment is not needed;

when the "no" response is sent, it indicates that the liquid level distribution cannot make the brightness or the chromaticity meet the desired uniformity or distribution rule, and the process needs to return to step S1 to continue the adjustment, and the voltage can be changed in a small-amplitude increase-decrease and successive approach manner until the "yes" response is sent;

s5: ending the adjustment cycle, and outputting voltage, liquid level, film thickness, brightness/chromaticity data and uniformity results of each region; if only the thickness design is needed, the method is finished and the design is finished; if the method is used for data collection of material development, the output data is uploaded to a computer or a processor after the method, a material database is built, and light effect data of a certain material or a combination of two materials under different thicknesses is obtained.

2. The adaptive design method for the thickness of the optical film according to claim 1, wherein: the step S1 may be a calculation based on the existing knowledge or data, or a value randomly assigned if there is no related data; the different thicknesses correspond to the liquid level distribution of two types of liquid with points in each area, and the processor converts the thickness data of each area into corresponding voltage values.

3. The adaptive design method for the thickness of the optical film according to claim 1, wherein: in step S4, if the deviation amount is set and the determination is made within the deviation range or if a "yes" response is issued and the requirement for the luminance uniformity is 80% ± 2%, a "yes" response may be issued when the actual luminance uniformity reaches 78%.

4. A system of the adaptive design method for optical film thickness according to any one of claims 1 to 3, characterized in that: the device comprises an imaging brightness colorimeter (1), an upper transparent electrode (2), a lower transparent electrode (3), a first charged liquid layer (4), a second charged liquid layer (5) and a light source (6).

5. The system of claim 4, wherein the adaptive design method for optical film thickness comprises: the upper transparent electrode (2) and the lower transparent electrode (3) are divided into a plurality of areas, and voltages among the areas can be independently adjusted and controlled and do not affect each other.

6. The system of claim 4, wherein the adaptive design method for optical film thickness comprises: the first charged liquid layer (4) and the second charged liquid layer (5) are two liquids with different densities, which are mutually insoluble and have opposite electric properties, and are respectively communicated with the outside through a tiny conduit for introducing or discharging the liquid in the device.

7. The system of claim 4, wherein the adaptive design method for optical film thickness comprises: the imaging brightness colorimeter (1) is arranged on the light-emitting imaging side and is used for scanning and detecting multi-point brightness and chromaticity data; the light source (6) is arranged at the lowest part.

Technical Field

The invention belongs to the technical field of optical diaphragms, and particularly relates to a method and a system for adaptively designing the thickness of an optical diaphragm.

Background

For the illumination system and the light source module of the flat panel display, the uniformity of brightness and chromaticity has been an important index. The traditional method for improving uniformity usually starts from several aspects of light source design, LED arrangement design and optical film material and combination, and the most commonly adopted method is to change the LED arrangement mode and use a diffusion film to uniform light. Recently, there is a new research angle proposed by related research, namely, the thickness and surface morphology of the optical film are designed, and the thickness of each area of the film is matched with the light intensity distribution of different areas, so as to develop a film with non-uniform thickness different from the traditional film, and the film is especially suitable for a color conversion film. The design can integrate the effects of color conversion, color absorption, light diffusion or light concentration and the like in the same optical film, and has positive effects and significance for optimizing the optical film, improving the integration degree of the module and thinning the module.

Aiming at the new research angle, the invention introduces feedback control and provides an optical film thickness self-adaptive design method and system. The method is suitable for various light sources such as LEDs and OLEDs, can automatically and adaptively match the thicknesses of various regions, is beneficial to improving the development efficiency and the automation degree of the membrane with non-uniform thickness, and solves the problems of complicated work, long period, low precision and the like of manual adjustment.

Disclosure of Invention

The present invention is directed to a method and a system for adaptively designing a thickness of an optical film, so as to solve the problems mentioned in the background art.

In order to achieve the purpose, the invention provides the following technical scheme: an adaptive design method for the thickness of an optical film comprises the following steps:

s1: firstly, a processor preliminarily calculates film thickness data corresponding to each region under the requirement of target brightness/chromaticity;

s2: adjusting the voltage of the upper and lower substrates according to the voltage values of the regions obtained in step S1 to change the liquid level of each region, wherein the liquid level of the first charged liquid layer corresponds to the film thickness of the region, and different film thicknesses cause different brightness/chromaticity changes of each region;

s3: an imaging brightness colorimeter positioned on the light-emitting imaging side scans the light-emitting surface, acquires multi-point brightness and chromaticity data corresponding to each region, and uploads the multi-point brightness and chromaticity data to a data processor;

s4: comparing the brightness/chromaticity data and the distribution situation uploaded in the step S3 with a given target value, and judging whether the brightness/chromaticity data and the distribution situation meet the requirements;

if the current brightness/chroma condition is consistent with the target condition, sending a response of 'yes', and if not, sending a response of 'no';

when a yes response is sent, the liquid level distribution can enable the brightness or the chroma to meet the expected uniformity or distribution rule at the moment, and continuous adjustment is not needed;

when the "no" response is sent, it indicates that the liquid level distribution cannot make the brightness or the chromaticity meet the desired uniformity or distribution rule, and the process needs to return to step S1 to continue the adjustment, and the voltage can be changed in a small-amplitude increase/decrease and successive approach manner until the "yes" response is sent.

S5: ending the adjustment cycle, and outputting voltage, liquid level, film thickness, brightness/chromaticity data and uniformity results of each region; if only the thickness design is needed, the method is finished and the design is finished; if the method is used for collecting data of material development, the output data is uploaded to a computer or a processor after the method, a material database is established, light effect data of a certain material or a combination of two materials under different thicknesses is obtained, a complex repeated test process is omitted, and the development efficiency is greatly improved in a dynamic experiment mode.

The step S1 may be a calculation based on the existing knowledge or data, or a value randomly assigned if there is no related data; the different thicknesses correspond to the liquid level distribution of two types of liquid with points in each area, and the processor converts the thickness data of each area into corresponding voltage values.

In step S4, if the deviation amount is set and the determination is made within the deviation range or if a "yes" response is issued and the requirement for the luminance uniformity is 80% ± 2%, a "yes" response may be issued when the actual luminance uniformity reaches 78%.

A system of an optical diaphragm thickness self-adaptive design method comprises an imaging brightness colorimeter, an upper transparent electrode, a lower transparent electrode, a first charged liquid layer, a second charged liquid layer and a light source.

The upper transparent electrode and the lower transparent electrode are divided into a plurality of areas, and voltages in the areas can be independently adjusted and controlled and do not affect each other.

The first charged liquid layer and the second charged liquid layer are two liquids with different densities, are not mutually soluble and have opposite electric properties, are respectively communicated with the outside through a tiny conduit and are used for introducing or discharging the liquid in the device.

The imaging brightness colorimeter is arranged on the light-emitting imaging side and is used for scanning and detecting multi-point brightness and chromaticity data; the light source is arranged at the lowest part.

The invention aims to develop a method and a system for adaptively designing the thickness of an optical film, which can realize the automatic design of the thickness and the surface appearance of the optical film under the specified brightness/chromaticity index, are suitable for the film design of an illumination system, a direct type backlight system or a side type backlight system and the like, can control the uniformity to reach a certain standard, and can also ensure that the brightness/chromaticity is distributed according to a certain rule. The method can greatly improve the development efficiency of the optical diaphragm, and can also be used for data collection of material development, diaphragm mold manufacturing, diaphragm production and the like.

The invention provides a method and a system for adaptively designing the thickness of an optical film, which are used for controlling the brightness and the chromaticity uniformity of an optical system or enabling the brightness and the chromaticity uniformity to be distributed according to certain requirements. Dividing an optical system panel into a plurality of areas, and preliminarily calculating the film thickness corresponding to each area according to the brightness/chromaticity distribution requirement; the film layer area is filled with charged liquid, and different liquid level distributions are realized by controlling the voltage between the upper substrate and the lower substrate of each area, namely different film thicknesses of each area are controlled; measuring and sampling the surface brightness and the chromaticity by an imaging brightness colorimeter; and analyzing and calculating the measurement data, feeding the result back to the input end to be compared with the target uniformity index or the distribution requirement, generating a deviation signal, and adjusting the system by the signal in a new round until the target brightness/chromaticity uniformity index or the distribution requirement is reached. The invention introduces feedback control, innovatively provides an optical diaphragm thickness self-adaptive design method and system, is suitable for the fields of non-imaging optics illumination, display systems and the like, realizes automatic design of optical diaphragm thickness and surface appearance, solves the problems of low manual design efficiency, tedious work, low precision and the like, and can be further applied to data collection of material development, diaphragm mold manufacturing, diaphragm production and the like.

Compared with the prior art, the invention has the beneficial effects that: according to the method and the system for self-adaptive design of the thickness of the optical diaphragm, feedback control is innovatively introduced into the design of the optical diaphragm, so that the automatic design of the thickness and the surface appearance of the optical diaphragm under the specified brightness/chromaticity index is realized;

the method is widely applicable to the non-imaging optical fields of illumination, display and the like, has high flexibility and easy regulation and control, and can solve the problems of low manual design efficiency, tedious work, low precision, high cost and the like;

the method has great potential for subsequent application, can be used for data collection of material development, membrane mold manufacturing, membrane production and the like, and has high developability.

Drawings

FIG. 1 is a schematic diagram of a system architecture of an optical film thickness adaptive design method according to the present invention;

FIG. 2 is a system block diagram of the adaptive closed-loop control of the present invention;

FIG. 3 is a flowchart illustrating steps of a method for adaptively designing a thickness of an optical film according to the present invention;

FIG. 4 is a schematic view of a curing system according to the present invention;

FIG. 5 is a diagram of the steps of mold making and film production according to the present invention.

In the figure: 1. an imaging brightness colorimeter; 2. an upper transparent electrode; 3. a lower transparent electrode; 4. a first charged liquid layer; 5. a second charged liquid layer; 6. a light source; 7. an upper curing device; 8. a lower curing device; 110. a controller; 120. an actuator; 130. a controlled object; 140. a comparator; 150. and a data processing module.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The first embodiment is as follows: fig. 1 is a schematic system structure diagram of an optical film thickness adaptive design method, which includes an imaging brightness colorimeter 1, an upper transparent electrode 2, a lower transparent electrode 3, a first charged liquid layer 4, a second charged liquid layer 5, and a light source 6.

The upper transparent electrode 2 and the lower transparent electrode 3 are divided into a plurality of areas, and the voltages in the areas can be independently adjusted and controlled and do not affect each other.

The first charged liquid layer 4 and the second charged liquid layer 5 are two liquids with different densities, which are mutually insoluble and have opposite electric properties, and are respectively communicated with the outside through a small conduit for introducing or discharging the liquid in the device.

The imaging brightness colorimeter 1 is arranged on the light-emitting imaging side and is used for scanning and detecting multi-point brightness and chromaticity data; the light source 6 is disposed at the lowest position, and takes LCD backlight as an example, and may be a direct type backlight or a side type backlight.

As shown in fig. 2, the system block diagram of the adaptive closed-loop control is shown, where the input quantity is a given luminance/chrominance distribution, and the output quantity is an actual luminance/chrominance distribution, where the distribution may be the luminance/chrominance of each specific region, or may be a uniformity index of the luminance/chrominance.

The control process comprises the following parts: a controller 110 (voltage controller), an actuator 120 (liquid level change in the device), a controlled object 130 (film thickness distribution), an imaging brightness colorimeter 1 (detection device), a data processing module 150 and a comparator 140;

wherein the controller 110 and the actuator 120 can vary the upper and lower electrode voltages, under which the first and second charged liquid layers 4, 5 in the zone form a specific liquid level, and the different voltages in each zone will produce different liquid levels. These regions with different liquid levels combine to form a monolithic film layer having a specific thickness profile. The imaging luminance colorimeter 1 is used as a detection device, and upper surface luminance/chromaticity data are collected and processed, analyzed and converted through the data processing module 150. The result is input to the comparator 140 and compared with the input quantity to form a difference signal, and the difference signal is used as a new input quantity to start the next round of liquid level control until the difference signal disappears, that is, the output quantity is consistent with the input quantity, and at this time, the closed-loop feedback control process is ended.

Fig. 3 is a flowchart illustrating steps of a method for adaptively designing a thickness of an optical film according to a first embodiment of the present invention, wherein a model-up cycle is taken as a main body. The method comprises the following steps:

s1: firstly, a processor preliminarily calculates film thickness data corresponding to each region under the requirement of target brightness/chromaticity;

s2: according to the voltage values of the regions obtained in the step S1, the voltages of the upper and lower substrates are adjusted to change the liquid level of each region, wherein the liquid level of the first charged liquid layer 4 corresponds to the film thickness of the region, and different film thicknesses will cause different brightness/chromaticity changes of each region;

s3: an imaging brightness colorimeter positioned on the light-emitting imaging side scans the light-emitting surface, acquires multi-point brightness and chromaticity data corresponding to each region, and uploads the multi-point brightness and chromaticity data to a data processor;

s4: comparing the brightness/chromaticity data and the distribution situation uploaded in the step S3 with a given target value, and judging whether the brightness/chromaticity data and the distribution situation meet the requirements;

if the current brightness/chroma condition is consistent with the target condition, sending a response of 'yes', and if not, sending a response of 'no';

when a yes response is sent, the liquid level distribution can enable the brightness or the chroma to meet the expected uniformity or distribution rule at the moment, and continuous adjustment is not needed;

when the "no" response is sent, it indicates that the liquid level distribution cannot make the brightness or the chromaticity meet the desired uniformity or distribution rule, and the process needs to return to step S1 to continue the adjustment, and the voltage can be changed in a small-amplitude increase/decrease and successive approach manner until the "yes" response is sent.

S5: ending the adjustment cycle, and outputting voltage, liquid level, film thickness, brightness/chromaticity data and uniformity results of each region; if only the thickness design is needed, the method is finished and the design is finished; if the method is used for collecting data of material development, the output data is uploaded to a computer or a processor after the method, a material database is established, light effect data of a certain material or a combination of two materials under different thicknesses is obtained, a complex repeated test process is omitted, and the development efficiency is greatly improved in a dynamic experiment mode.

The step S1 may be a calculation based on the existing knowledge or data, or a value randomly assigned if there is no related data; the different thicknesses correspond to the liquid level distribution of two types of liquid with points in each area, and the processor converts the thickness data of each area into corresponding voltage values.

In step S4, if the deviation amount is set and the determination is made within the deviation range or if a "yes" response is issued and the requirement for the luminance uniformity is 80% ± 2%, a "yes" response may be issued when the actual luminance uniformity reaches 78%.

Example two: the method is used for directly producing and manufacturing the membrane;

on the basis of the first embodiment, the adaptive film thickness design method and system provided by the invention can further carry out direct production and manufacturing of the film.

Fig. 4 is a schematic structural diagram of a curing system, which includes an upper transparent electrode 2, a lower transparent electrode 3, a first charged liquid layer 4, a second charged liquid layer 5, an upper curing device 7, and a lower curing device 8. The curing means may be in the form of uv curing or heat curing, depending on the nature of the material. In the charged liquid layer in which the solvent or the material is not highly volatile, after step S5 in the first design process example is completed, the voltages of the upper and lower transparent electrodes 2 and 3 are maintained, the structure is transferred or switched to the curing system, and the first charged liquid layer 4 and the second charged liquid layer 5 or the first charged liquid layer 4 and the second charged liquid layer 5 are directly cured.

The way of selecting the layer of solidified liquid consists in: if the thickness distribution design is carried out on one material, only upper layer or lower layer liquid needs to be selected for curing, namely, one of the first charged liquid layer 4 and the second charged liquid layer 5 is selected for ultraviolet curing or heating curing; if the thickness distribution design is performed for the composite structure of the two materials, the first charged liquid layer 4 and the second charged liquid layer 5 are subjected to ultraviolet curing or heating curing simultaneously or respectively by upper and lower curing devices.

Finally obtaining the dried and cured film meeting the design requirement.

Example three: the method is used for manufacturing the diaphragm die and producing the diaphragm;

the method and the system for designing the self-adaptive film thickness can be further applied to manufacturing of a film die and production of a film. In contrast to the second example, if the solvent or material is more volatile and the curing results in a significant volume reduction, the film production can be performed by making a mold.

Fig. 5 shows a diagram of the steps of making the mold and producing the film. The data processing module 150 of the adaptive closed-loop-control system in the first embodiment outputs data as input, and is implemented according to the method shown in fig. 5. The following description will be given by taking as an example the first charged liquid layer 4 corresponding to the desired membrane and the second charged liquid layer 5 as an auxiliary liquid layer (the second charged liquid layer 5 is selected from a material having little or no volatility).

First, step 410 is performed, in which the second charged liquid layer 5 is cured by a curing device, and the cured second charged liquid layer 5 is used as a mold for film production;

then, in step 420, removing the first charged liquid layer 4, cleaning the cured structure, completely removing the first charged liquid layer 4 and other impurities which may be introduced, and transferring the structure to an oven for drying;

continuing to step 430, inverting the cured second charged liquid layer 5, adding a frame around to limit the liquid from flowing out, and coating or filling the required material above the liquid layer with a desired thickness to naturally form a specific shape;

finally, step 440 is performed, the coated or filled liquid is cured and demolded, and the process from step 430 to step 440 can be repeatedly performed for rapid production.

The method and the process have the advantages of flexible regulation and control, wide applicability and low cost, and can be used for manufacturing moulds and producing membranes with various specific surface appearances.

In conclusion, compared with the prior art, the method has the advantages that feedback control is innovatively introduced into the design of the optical film, so that the automatic design of the thickness and the surface appearance of the optical film under the specified brightness/chromaticity index is realized;

the method is widely applicable to the non-imaging optical fields of illumination, display and the like, has high flexibility and easy regulation and control, and can solve the problems of low manual design efficiency, tedious work, low precision, high cost and the like;

the method has great potential for subsequent application, can be used for data collection of material development, membrane mold manufacturing, membrane production and the like, and has high developability.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments or portions thereof without departing from the spirit and scope of the invention.