阅读说明：本技术 水蒸气产生装置和方法 (Steam generation device and method ) 是由 吴煜 谢耀 宋旭东 沈婷婷 蔡敏 刘振强 于 2021-10-14 设计创作，主要内容包括：本发明提供了水蒸气产生装置和方法,所述水蒸气产生装置包括：填料设置在第一容器内,所述第一容器具有出口；过滤模块用于阻止液态水的穿过,并允许水蒸气穿过；所述过滤模块设置在所述第一容器内,且处于所述填料的上侧；气流均匀器设置在所述第一容器内,且处于所述填料的下侧；第一管道用于将液态水送入所述第一容器内填料的下侧,第二管道用于将气体送入所述第一容器内气流均匀器的下侧,气体依次穿过所述气流均匀器、填料、过滤模块和所述出口；从所述出口排出的水蒸气进入降压单元,加热单元用于加热所述降压单元；所述第一容器设置在温控箱内。本发明具有水蒸气含量稳定等优点。(The present invention provides a water vapor generation device and method, the water vapor generation device comprising: a packing disposed within a first vessel, the first vessel having an outlet; the filtering module is used for preventing liquid water from passing through and allowing water vapor to pass through; the filter module is arranged in the first container and is positioned on the upper side of the filler; the airflow uniformizer is arranged in the first container and is positioned at the lower side of the filler; the first pipeline is used for sending liquid water to the lower side of the filler in the first container, the second pipeline is used for sending gas to the lower side of the gas flow homogenizer in the first container, and the gas sequentially passes through the gas flow homogenizer, the filler, the filtering module and the outlet; the water vapor discharged from the outlet enters a pressure reduction unit, and a heating unit is used for heating the pressure reduction unit; the first container is arranged in the temperature control box. The invention has the advantages of stable water vapor content and the like.)

1. A water vapor generation device, characterized in that the water vapor generation device comprises:

a first container and a fill material, the fill material disposed within the first container, the first container having an outlet;

a filter module for preventing the passage of liquid water and allowing the passage of water vapor; the filter module is arranged in the first container and is positioned on the upper side of the filler;

the airflow homogenizer is arranged in the first container and is positioned at the lower side of the filler;

the first pipeline is used for sending liquid water to the lower side of the filler in the first container, the second pipeline is used for sending gas to the lower side of the gas flow homogenizer in the first container, and the gas sequentially passes through the gas flow homogenizer, the filler, the filtering module and the outlet;

the water vapor discharged from the outlet enters the pressure reduction unit, and the heating unit is used for heating the pressure reduction unit;

the first container is arranged in the temperature control box.

2. The water vapor generation device of claim 1, further comprising:

the buffer tank is used for discharging the water vapor of the pressure reduction unit and allowing the water vapor to enter the buffer tank;

and the first pressure regulating valve is used for discharging the water vapor of the buffer tank and passing through the first pressure regulating valve.

3. The water vapor generation device of claim 1, further comprising:

the pressure stabilizing valve and the second pressure regulating valve are arranged on the second pipeline, and gas in the second pipeline sequentially passes through the pressure stabilizing valve and the second pressure regulating valve.

4. The water vapor generation device of claim 1, further comprising:

a second container, wherein the second container is provided with an overflow port, and the first pipeline is communicated with the second container;

a third container and a pump, wherein the pump sends the water in the third container to the second container.

5. The water vapor generation device of claim 2, further comprising:

the first flow controller is used for allowing water vapor to sequentially enter the first pressure regulating valve, the first flow controller and the mixing module;

the second flow controller is used for enabling the diluent gas to sequentially enter the second flow controller and the mixing module;

a mixing module in which the water vapor and the dilution gas are mixed.

6. A water vapor generation device in accordance with claim 5, wherein said mixing module is a third conduit.

7. A water vapor generation device in accordance with claim 1, wherein said flow homogenizer has a plurality of through holes therethrough, the farther from a central axis of said flow homogenizer, the greater the angle between the through holes and said central axis.

8. A water vapor generation method, comprising:

liquid water enters a first container, and the first container is positioned in a temperature control box;

the gas enters the first container, passes through the gas flow homogenizer and performs gas-liquid exchange with liquid water;

gas carries liquid water into the filler, and the gas and the water on the surface of the filler are subjected to gas-liquid balance; the pressure in the first container is not lower than a threshold value_P0Such that the absolute content of water vapour in the first container is a stable value;

passing water vapor through a filtration module, liquid water being trapped by the filtration module, after which water vapor exits the first vessel;

the water vapor exiting the first vessel is depressurized.

9. The steam generation method of claim 8, wherein the gas is sequentially subjected to pressure stabilization and pressure regulation and then enters the first container;

the water vapor after pressure reduction enters a buffer tank and then is discharged, and the discharged water vapor is discharged to the downstream after pressure regulation;

adjusting the pressure of the gas entering the first container and the pressure of the water vapor exiting the buffer tank such that the pressure of the water vapor in the first container is not lower than the threshold value P₀。

10. A water vapour generating method according to claim 8, wherein said threshold value P₀The obtaining method is as follows:

t is the temperature within the first vessel.

Technical Field

The present invention relates to gas generation, and more particularly to a water vapor generation apparatus and method.

Background

In the GFC infrared project of the smoke, stable water standard gas is needed to be used for establishing a water vector, and water interference compensation can be performed on other component gases while the water concentration in the smoke is measured.

For obtaining the water vapor standard gas, the following 3 ways are generally adopted:

1. the water mark gas generated by the water gas generator of the patent applicant is adopted. The water gas generator adopts a weighing method, water with certain weight is vaporized at high temperature and then mixed with nitrogen to obtain water standard gas with different concentrations, but the water standard gas has the defect of low humidity stability, and particularly, the water standard gas with low concentration within 10000ppm is difficult to stably prepare;

2. standard gas is purchased, and after consulting various standard gas companies, the concentration of the water standard gas is very unstable, and the purchase is not recommended;

3. self-made water mark gas generating device. According to the query, the preparation of the humidity generator is generally carried out by a double-temperature method, a double-pressure method, a shunt method, an osmosis method, a fixed humidity point method, a coulomb method and the like. The latter three methods are complex and have high preparation cost, and the water mark gas is prepared by adopting a double-temperature method, a double-pressure method and a flow dividing method, but the obtained effects are not ideal, and the humidity of the water mark gas fluctuates by about 100 ppm. Considering that the three traditional methods have high requirements on generating equipment, and the concentration of the prepared water standard gas is not easy to be stable under laboratory conditions, a new method for preparing the water standard gas with stable humidity needs to be found.

Disclosure of Invention

In order to overcome the defects in the prior art, the invention provides a water vapor generation device.

The purpose of the invention is realized by the following technical scheme:

a water vapor generation device, the water vapor generation device comprising:

a first container and a fill material, the fill material disposed within the first container, the first container having an outlet;

a filter module for preventing the passage of liquid water and allowing the passage of water vapor; the filter module is arranged in the first container and is positioned on the upper side of the filler;

the airflow homogenizer is arranged in the first container and is positioned at the lower side of the filler;

the first pipeline is used for sending liquid water to the lower side of the filler in the first container, the second pipeline is used for sending gas to the lower side of the gas flow homogenizer in the first container, and the gas sequentially passes through the gas flow homogenizer, the filler, the filtering module and the outlet;

the water vapor discharged from the outlet enters the pressure reduction unit, and the heating unit is used for heating the pressure reduction unit;

the first container is arranged in the temperature control box.

The invention also provides a water vapor generation method, and the purpose of the invention is realized by the following technical scheme:

a water vapor generation method, comprising:

liquid water enters a first container, and the first container is positioned in a temperature control box;

the gas enters the first container, passes through the gas flow homogenizer and performs gas-liquid exchange with liquid water;

gas carries liquid water into the filler, and the gas and the water on the surface of the filler are subjected to gas-liquid balance; the pressure in the first container is not lower than a threshold value P₀Such that the absolute content of water vapour in the first container is a stable value;

passing water vapor through a filtration module, liquid water being trapped by the filtration module, after which water vapor exits the first vessel;

the water vapor exiting the first vessel is depressurized.

Compared with the prior art, the invention has the beneficial effects that:

the concentration of the water vapor is stable;

the first container, the filler, the airflow homogenizer, the filtering module and the temperature control box are combined into a whole, and the pressure in the first container is not lower than a threshold value during working, so that the water vapor in the first container is output as saturated gas, and the concentration is stable;

the pressure in the first container is stabilized by adjusting the pressure of gas entering the first container and the pressure of water vapor discharged from the buffer tank, so that the concentration stability of the water vapor output from the first container is ensured;

the third container and the second container (with overflow port) are designed to stabilize the pressure of the liquid water entering the first pipeline;

the pressure reduction units such as the expansion valve are utilized, and the heating unit is used for heating, so that condensed water of the water vapor is prevented from being generated in the pressure reduction process, and the stability of the concentration of the water vapor is ensured.

Drawings

The disclosure of the present invention will become more readily understood with reference to the accompanying drawings. As is readily understood by those skilled in the art: these drawings are only for illustrating the technical solutions of the present invention and are not intended to limit the scope of the present invention. In the figure:

fig. 1 is a schematic structural view of a water vapor generation device according to an embodiment of the present invention.

Detailed Description

Fig. 1 and the following description depict alternative embodiments of the invention to teach those skilled in the art how to make and reproduce the invention. Some conventional aspects have been simplified or omitted for the purpose of explaining the technical solution of the present invention. Those skilled in the art will appreciate that variations or substitutions from these embodiments will be within the scope of the invention. Those skilled in the art will appreciate that the features described below can be combined in various ways to form multiple variations of the invention. Thus, the present invention is not limited to the following alternative embodiments, but is only limited by the claims and their equivalents.

Example 1:

fig. 1 is a schematic structural view of a water vapor generation device according to an embodiment of the present invention, and as shown in fig. 1, the water vapor generation device includes:

a first container 11 and a packing 21, the packing 21 being disposed within the first container 11, the first container 11 having an outlet;

a filtration module 23, said filtration module 23 being adapted to prevent the passage of liquid water and to allow the passage of water vapor; the filter module 23 is arranged in the first container 11 and is positioned at the upper side of the filler 21;

an airflow homogenizer 22, wherein the airflow homogenizer 22 is arranged in the first container 11 and is positioned at the lower side of the filler 21;

a first pipe 51 and a second pipe 52, the first pipe 51 being used for feeding liquid water to the lower side of the packing 21 in the first container 11, the second pipe 52 being used for feeding gas to the lower side of the gas flow homogenizer 22 in the first container 11, the gas passing through the gas flow homogenizer 22, the packing 21, the filter module 23 and the outlet in sequence;

a pressure reducing unit 44 and a heating unit 91, the water vapor discharged from the outlet enters the pressure reducing unit 44, and the heating unit 91 is used for heating the pressure reducing unit 44;

a temperature control box 31, wherein the first container 11 is arranged in the temperature control box 31.

In order to keep the pressure in the first container 11 stable, further, the water vapor generating device further comprises:

a buffer tank 81 into which the water vapor discharged from the depressurization unit 44 is introduced;

and a first pressure regulating valve 43 through which the water vapor discharged from the buffer tank 81 passes.

In order to stabilize the pressure of the gas entering the first container 11, the water vapor generating apparatus further comprises:

the pressure stabilizing valve 41 and the second pressure regulating valve 42 are arranged on the second pipeline 52, and gas in the second pipeline 52 passes through the pressure stabilizing valve 41 and the second pressure regulating valve 42 in sequence.

In order to ensure the pressure of the liquid water entering the first container 11 to be stable, further, the water vapor generating device further comprises:

a second container 13, wherein the second container 13 is provided with an overflow port, and the first pipeline 51 is communicated with the second container 13;

a third container 12 and a pump 91, wherein the pump 91 sends the water in the third container 12 to the second container 13.

In order to obtain water vapor of various concentrations, further, the water vapor generation device further includes:

a first flow controller 71, wherein the water vapor enters the first pressure regulating valve 43, the first flow controller 71 and the mixing module 53 in sequence;

a second flow controller 72, the dilution gas entering the second flow controller 72 and the mixing module 53 in sequence;

the mixing module 53, the water vapor and the dilution gas are mixed in the mixing module 53.

In order to make the gas enter the filler uniformly, further, the gas flow homogenizer 22 has a plurality of through holes therethrough, and the farther from the central axis of the gas flow homogenizer 22, the larger the angle between the through holes and the central axis.

The water vapor generation method of the embodiment of the invention comprises the following steps:

liquid water enters a first container 11, and the first container 11 is positioned in a temperature control box 31;

the gas enters the first container 11, passes through the gas flow homogenizer 22 and is subjected to gas-liquid exchange with liquid water;

the gas carries liquid water into the filler 21, and the gas and the water on the surface of the filler 21 are in gas-liquid equilibrium; the pressure in said first container 11 is not lower than a threshold value P₀So that the absolute content of water vapour in said first container 11 is a stable value;

the water vapour passes through the filtration module 23, the liquid water is trapped by said filtration module 23, after which the water vapour exits said first container 11;

the water vapor exiting the first vessel 11 is depressurized.

In order to maintain the gas pressure in the first container 11 at a constant value, the gas enters the first container after being subjected to pressure stabilization and pressure regulation in sequence;

the water vapor after pressure reduction enters the buffer tank 81 and then is discharged, and the discharged water vapor is discharged to the downstream after pressure regulation;

adjusting the pressure of the gas entering the first container 11 and the pressure of the water vapor exiting the buffer tank 81 such that the water vapor in said first container 11Is not lower than the threshold value_P0。

In order to maintain a stable water vapour content in the first container 11, further, the threshold value_P0The obtaining method is as follows:

_Tis the temperature inside said first container 11.

Example 2:

an application example of the water vapor generation apparatus and method according to embodiment 1 of the present invention.

In this application example, as shown in fig. 1, the second container 12 and the third container 13 are respectively containers with open upper ends, the liquid water in the second container 12 is sent into the third container 13 by a peristaltic pump, and the flow rate sent into the third container 13 is greater than the flow rate in the first pipeline 51, so that the liquid water in the third container 13 overflows from an overflow port at the upper end of the third container 13, thereby ensuring the stability of the pressure of the liquid water entering the first pipeline 51;

an airflow homogenizer 22, a filler 21 and a filtering module 23 are sequentially arranged in the first container 11 from bottom to top, the liquid level of liquid water sent into the first container 11 through a first pipeline 51 is higher than that of the airflow homogenizer 22, namely the airflow homogenizer 22 is immersed in water; the filtering module 23 adopts a filtering membrane, the filtering precision is 0.1 μm, the water vapor is allowed to permeate, and the liquid water is prevented from passing through; the airflow homogenizer 22 is provided with a plurality of through holes which penetrate through the airflow homogenizer, the aperture is 1mm, the farther the distance from the central axis of the airflow homogenizer 22, the larger the included angle between the through holes and the central axis, and the distance between the central axis of the through holes and the central axis of the airflow homogenizer 22 is gradually increased from bottom to top; the first pressure sensor 61 is provided on the first container 11, and the second pressure sensor 62 is provided on the buffer tank 81;

the decompression unit 44 is an expansion valve, and the heating unit 92 heats the decompression unit 44 so that the temperature of the decompression unit 44 is substantially the same as that of the first container 11, both being 30 ℃, thereby preventing the occurrence of condensed water; the pressure reduction unit 44 and the heating unit 92 are both arranged in the temperature control box 31; the water vapor after pressure reduction sequentially enters a buffer tank 81, a first pressure regulating valve 43, a first flow controller 71 and a mixing module 53, the diluent gas sequentially enters a second flow controller 72 and the mixing module 53, the mixing module 53 adopts a third pipeline, and the first flow controller 71 and the second flow controller 72 both adopt MFCs;

the second pipeline 52 is sequentially provided with a pressure stabilizing valve 41 and a second pressure regulating valve 42, and high-purity nitrogen gas passes through the pressure stabilizing valve 41, the second pressure regulating valve 42 and the first container in sequence.

The water vapor generation method of the embodiment of the invention comprises the following steps:

liquid water enters the second container 12 and then is pumped into the third container 13 through a peristaltic pump, and the liquid water overflows from an overflow port at the top end of the third container 13; the liquid water at the bottom of the third container 13 enters the first container 11 through the first pipeline 51, and the liquid water in the first container 11 submerges the airflow homogenizer 22;

high-purity nitrogen enters the first container 11 after passing through a pressure stabilizing valve 41 and a second pressure regulating valve 42, passes through the airflow homogenizer 22, and is subjected to gas-liquid exchange with liquid water;

the gas carries liquid water into the filler 21, and the gas and the water on the surface of the filler 21 are in gas-liquid equilibrium; the water vapour passes through the filtration module 23, the liquid water is trapped by said filtration module 23, after which the water vapour exits said first container 11; the first container 11 is positioned in a temperature control box 31, and the temperature is controlled at 30 ℃;

the water vapor discharged from the first container 11 is depressurized in the depressurizing unit 44, the depressurized water vapor enters the buffer tank 81, and then is discharged, and the discharged water vapor sequentially passes through the first pressure regulating valve 43, the first flow controller 71 and the mixing module;

the high purity nitrogen gas passes through the second flow controller 72 and the mixing module in sequence;

in the above method, the pressure of the water vapor in the first tank 11 is not lower than the threshold value by adjusting the first and second pressure-adjusting valves 43 and 42The unit of T is in degrees celsius,threshold value P of the present embodiment₀Taking 400KPa as an example, the pressure in the buffer tank 81 was 100KPa, so that the absolute content of water vapor in the first container 11 was a stable value.