阅读说明：本技术 紧缩场馈源偏焦量化值的确定方法及装置 (Method and device for determining tight range feed source deflection quantization value ) 是由 姜涌泉 莫崇江 于 2021-09-23 设计创作，主要内容包括：本发明提供了一种紧缩场馈源偏焦量化值的确定方法及装置,其中方法包括：确定反射面的类型；根据确定的该类型,确定馈源相位中心未偏焦时,该馈源发射的电磁波所对应未偏焦路径的第一绝对相位；根据确定的该类型,确定馈源相位中心偏焦时,该馈源发射的电磁波所对应偏焦路径的第二绝对相位；将所述第一绝对相位与所述第二绝对相位的差值,确定为紧缩场馈源偏焦量化值。本方案,能够快速得到紧缩场馈源偏焦量化值,提高了计算时效性。(The invention provides a method and a device for determining a tight range feed source deflection quantization value, wherein the method comprises the following steps: determining the type of the reflecting surface; according to the determined type, when the phase center of the feed source is not deflected to be focused, determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source; according to the determined type, when the phase center of the feed source is deflected to be focused, a second absolute phase of a deflection path corresponding to the electromagnetic wave transmitted by the feed source is determined; determining a difference of the first absolute phase and the second absolute phase as a compact range feed offset quantization value. According to the scheme, the deflection focus quantized value of the compact range feed source can be quickly obtained, and the calculation timeliness is improved.)

1. A method for determining a compact range feed offset focus quantized value, comprising:

determining the type of the reflecting surface;

according to the determined type, when the phase center of the feed source is not deflected to be focused, determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source;

according to the determined type, when the phase center of the feed source is deflected to be focused, a second absolute phase of a deflection path corresponding to the electromagnetic wave transmitted by the feed source is determined;

determining a difference of the first absolute phase and the second absolute phase as a compact range feed offset quantization value.

2. The method of claim 1, wherein determining the second absolute phase of the out-of-focus path corresponding to the electromagnetic wave transmitted by the feed when the phase center of the feed is out-of-focus according to the determined type comprises:

determining position information and observation position information of a phase center of the feed source in the deflection focus path;

determining the position information of at least one reflection point on the deflection path according to the determined type, the position information of the phase center of the feed source in deflection focus and the observation position information;

calculating the length of the deflection path according to the determined position information;

and calculating to obtain the second absolute phase according to the length of the deflection path and the wavelength of the electromagnetic wave transmitted by the feed source.

3. The method of claim 2,

the determining the type of the reflecting surface comprises: determining the type of the reflecting surface as a single reflecting surface; the off-focus path comprises a reflection point;

determining position information of the reflection point included on the off-focus path, including:

and taking a symmetrical point corresponding to the normal line passing through the reflecting point of the phase center of the feed source in the deflection focus as an intermediate parameter, obtaining a calculation formula for calculating the position information of the reflecting point by using the theoretical formula of the single reflecting surface, the position information of the phase center of the feed source in the deflection focus, the observation position information and the intermediate parameter, and calculating the position information of the reflecting point by using the calculation formula.

4. The method of claim 3, wherein the single reflective surface is a single paraboloid of revolution;

the calculating the position information of the reflection point by using the calculation formula includes: the position information of the reflection point is calculated by the following formula:

wherein F is the focal length of the reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information, (a, b, c) is position information of the symmetrical point corresponding to the intermediate parameter, (x)₁，y₁，z₁) Is the position information of the reflection point.

5. The method of claim 2,

the determining the type of the reflecting surface comprises: determining the type of the reflecting surface as a double reflecting surface; the double reflecting surfaces comprise an auxiliary reflecting surface and a main reflecting surface; the deflection path comprises a primary reflection point on the secondary reflection surface and a secondary reflection point on the main reflection surface;

determining position information of the primary reflection point and the secondary reflection point included on the off-focus path, including:

projecting the double reflecting surfaces in a set direction to obtain the projection surfaces of the double reflecting surfaces; the main reflecting surface is a parabola on the projection surface, and the auxiliary reflecting surface is a straight line;

determining a feed source deflection angle and an auxiliary reflecting surface deflection angle according to the projection surface; taking a first symmetric point corresponding to the phase center of the feed source in the deflection focus relative to the normal passing through the primary reflection point and a second symmetric point corresponding to the primary reflection point relative to the normal passing through the secondary reflection point as intermediate parameters;

and obtaining a calculation formula for calculating the position information of the primary reflection point and the secondary reflection point by using the theoretical formula of the double reflection surfaces, the position information of the phase center of the feed source when the feed source is deflected to the focus, the observation position information, the deflection angle of the feed source, the deflection angle of the secondary reflection surface and each intermediate parameter, and calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula.

6. The method of claim 5, wherein the dual reflective surfaces are dual parabolic cylinders;

the calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula comprises: calculating the position information of the primary reflection point and the secondary reflection point by using the following formula:

wherein, FL1 and FL2 are respectively the focal length of the main reflecting surface and the focal length of the sub reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information; theta₁、θ₂Respectively a feed source deflection angle and an auxiliary reflecting surface deflection angle; (a)₁，b₁，c₁) Is the position information of the first point of symmetry, (a)₂，b₂，c₂) Position information of the first symmetric point; (x)₁，y₁，z₁) Position information of the primary reflection point; (x)₂，y₂，z₂) And the position information of the secondary reflection point.

7. The method according to any one of claims 2-6, wherein said calculating the second absolute phase from the length of the defocused path and the wavelength of the electromagnetic wave transmitted by the feed comprises:

and multiplying the quotient of the length of the focusing path and the wavelength by 360 degrees to obtain the second absolute phase.

8. An apparatus for determining a compact range feed offset quantization value, comprising:

a reflecting surface type determining unit for determining the type of the reflecting surface;

the absolute phase determining unit is used for determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is unfocused according to the determined type; determining a second absolute phase of a focus-biased path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is focused;

a quantization determination unit to determine a difference of the first absolute phase and the second absolute phase as a compact range feed offset quantization value.

9. A computing device comprising a memory having stored therein a computer program and a processor that, when executing the computer program, implements the method of any of claims 1-7.

10. A computer-readable storage medium, on which a computer program is stored which, when executed in a computer, causes the computer to carry out the method of any one of claims 1-7.

Technical Field

The embodiment of the invention relates to the technical field of electromagnetic measurement, in particular to a method and a device for determining a focal offset quantization value of a compact range feed source.

Background

Compact field technology has received increasing attention in recent years as an important means of simulating far field testing. A common compact range system is built in a shielding darkroom with the inner wall covered with wave-absorbing materials, a test area (quiet area) irradiated by quasi-plane waves is formed in a specific area of the darkroom under the combined action of a primary feed source and a reflecting surface, and a target to be tested is placed in the test area. Because the working premise of compact range is that the phase center of the primary feed source is located at the focal position of the reflecting surface, once the phase center of the primary feed source deviates from the focal point (namely the feed source is out of focus), the performance of the dead zone can be seriously interfered, and the phase test result in the dead zone is seriously distorted.

The control of the primary feed source phase center mainly focuses on two aspects, namely the control of the phase center in the primary feed source simulation design process on one hand, and the control of the phase center in the installation and debugging process of a primary feed source real object on the other hand, which are not available. In order to be able to control the phase center in both of these respects, it is necessary to determine the quantized value of the compact range feed offset focus.

At present, a software simulation mode is generally adopted to determine a quantized value, in the process of utilizing software simulation, a reflector model needs to be constructed and substituted into a model of feed source data, so that a simulation scene is established, and a simulation algorithm is set aiming at the simulation scene so as to simulate and obtain the quantized value of the compact range feed source deflection.

However, in the prior art, when the reflecting surface changes or the working frequency of the electromagnetic wave changes, the reflecting surface model needs to be reconstructed, and the calculation amount is large; and when the size of the reflecting surface is larger, the complexity is higher, or the working frequency of the electromagnetic wave is higher, the calculation amount is increased. When the calculated amount is large, the calculation timeliness is poor.

Therefore, it is desirable to provide a method for determining a compact range feed offset quantization value that is computationally more time efficient.

Disclosure of Invention

The embodiment of the invention provides a method and a device for determining a focal offset quantization value of a compact range feed source, which can improve the calculation timeliness.

In a first aspect, an embodiment of the present invention provides a method for determining a compact range feed offset quantization value, including:

determining the type of the reflecting surface;

according to the determined type, when the phase center of the feed source is not deflected to be focused, determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source;

according to the determined type, when the phase center of the feed source is deflected to be focused, a second absolute phase of a deflection path corresponding to the electromagnetic wave transmitted by the feed source is determined;

determining a difference of the first absolute phase and the second absolute phase as a compact range feed offset quantization value.

Preferably, when the phase center of the feed source is determined to be out of focus according to the determined type, determining a second absolute phase of a out-of-focus path corresponding to the electromagnetic wave transmitted by the feed source comprises:

determining position information and observation position information of a phase center of the feed source in the deflection focus path;

determining the position information of at least one reflection point on the deflection path according to the determined type, the position information of the phase center of the feed source in deflection focus and the observation position information;

calculating the length of the deflection path according to the determined position information;

and calculating to obtain the second absolute phase according to the length of the deflection path and the wavelength of the electromagnetic wave transmitted by the feed source.

Preferably, the determining the type of the reflecting surface includes: determining the type of the reflecting surface as a single reflecting surface; the off-focus path comprises a reflection point;

determining position information of the reflection point included on the off-focus path, including:

and taking a symmetrical point corresponding to the normal line passing through the reflecting point of the phase center of the feed source in the deflection focus as an intermediate parameter, obtaining a calculation formula for calculating the position information of the reflecting point by using the theoretical formula of the single reflecting surface, the position information of the phase center of the feed source in the deflection focus, the observation position information and the intermediate parameter, and calculating the position information of the reflecting point by using the calculation formula.

Preferably, the single reflecting surface is a single paraboloid of revolution;

the calculating the position information of the reflection point by using the calculation formula includes: the position information of the reflection point is calculated by the following formula:

wherein F is the focal length of the reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information, (a, b, c) is position information of the symmetrical point corresponding to the intermediate parameter, (x)₁，y₁，z₁) Is the position information of the reflection point.

Preferably, the determining the type of the reflecting surface includes: determining the type of the reflecting surface as a double reflecting surface; the double reflecting surfaces comprise an auxiliary reflecting surface and a main reflecting surface; the deflection path comprises a primary reflection point on the secondary reflection surface and a secondary reflection point on the main reflection surface;

determining position information of the primary reflection point and the secondary reflection point included on the off-focus path, including:

projecting the double reflecting surfaces in a set direction to obtain the projection surfaces of the double reflecting surfaces; the main reflecting surface is a parabola on the projection surface, and the auxiliary reflecting surface is a straight line;

determining a feed source deflection angle and an auxiliary reflecting surface deflection angle according to the projection surface; taking a first symmetric point corresponding to the phase center of the feed source in the deflection focus relative to the normal passing through the primary reflection point and a second symmetric point corresponding to the primary reflection point relative to the normal passing through the secondary reflection point as intermediate parameters;

and obtaining a calculation formula for calculating the position information of the primary reflection point and the secondary reflection point by using the theoretical formula of the double reflection surfaces, the position information of the phase center of the feed source when the feed source is deflected to the focus, the observation position information, the deflection angle of the feed source, the deflection angle of the secondary reflection surface and each intermediate parameter, and calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula.

Preferably, the double reflecting surface is a double parabolic cylinder;

the calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula comprises: calculating the position information of the primary reflection point and the secondary reflection point by using the following formula:

wherein, FL1 and FL2 are respectively the focal length of the main reflecting surface and the focal length of the sub reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information; theta₁、θ₂Respectively a feed source deflection angle and an auxiliary reflecting surface deflection angle; (a)₁，b₁，c₁) Is the position information of the first point of symmetry, (a)₂，b₂，c₂) Position information of the first symmetric point; (x)₁，y₁，z₁) Position information of the primary reflection point; (x)₂，y₂，z₂) And the position information of the secondary reflection point.

Preferably, the calculating the second absolute phase according to the length of the defocused path and the wavelength of the electromagnetic wave emitted by the feed source includes:

and multiplying the quotient of the length of the focusing path and the wavelength by 360 degrees to obtain the second absolute phase.

In a second aspect, an embodiment of the present invention further provides an apparatus for determining a compact range feed offset quantization value, including:

a reflecting surface type determining unit for determining the type of the reflecting surface;

the absolute phase determining unit is used for determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is unfocused according to the determined type; determining a second absolute phase of a focus-biased path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is focused;

a quantization determination unit to determine a difference of the first absolute phase and the second absolute phase as a compact range feed offset quantization value.

In a third aspect, an embodiment of the present invention further provides a computing device, including a memory and a processor, where the memory stores a computer program, and the processor, when executing the computer program, implements the method described in any embodiment of this specification.

In a fourth aspect, the present invention further provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed in a computer, the computer program causes the computer to execute the method described in any embodiment of the present specification.

The embodiment of the invention provides a method and a device for determining a tight range feed source deflection quantized value.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a flowchart of a method for determining a compact range feed offset quantization value according to an embodiment of the present invention;

fig. 2 is a schematic diagram of a single rotational parabolic feed offset focus according to an embodiment of the present invention;

FIG. 3 is a projection plane of a bi-parabolic cylinder in the z-axis direction according to an embodiment of the present invention;

FIG. 4 is a diagram of a hardware architecture of a computing device according to an embodiment of the present invention;

FIG. 5 is a block diagram of an apparatus for determining a compact range feed offset quantization value according to an embodiment of the present invention.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer and more complete, the technical solutions in the embodiments of the present invention will be described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention, and based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the scope of the present invention.

As mentioned above, in the prior art, when the quantized value of the compact range feed offset focus is determined, the calculation is poor due to the large calculation amount. The quantized value of the compact range feed source deflection comprises a deviated amplitude value and a deviated phase value, when the quantized value is the deviated phase value, the phase is considered to be related to the frequency of an electromagnetic field and the length of a path (when the electromagnetic wave transmitted by the feed source irradiates on a reflecting surface and is reflected to an observation position through the reflecting surface), and the absolute phase of the corresponding ideal path is a known quantity when the feed source is not deflected, so that the absolute phase of the deflection path and the absolute phase of the ideal path can be calculated by calculating the absolute phase of the deflection path, and the difference is the deviated phase value when the feed source is deflected.

Specific implementations of the above concepts are described below.

Referring to fig. 1, an embodiment of the present invention provides a method for determining a compact range feed offset quantization value, where the method includes:

step 100, determining the type of the reflecting surface.

And 102, determining a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is not defocused according to the determined type.

And step 104, determining a second absolute phase of a deflection path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source deflects to the focus according to the determined type.

And step 106, determining the difference value of the first absolute phase and the second absolute phase as a compact range feed focusing deflection quantized value.

In the embodiment of the invention, when the types of the reflecting surfaces are different, the determination modes of the absolute phase of the focus bias path and the absolute phase of the non-focus bias path are different, the absolute phase of the focus bias path and the absolute phase of the non-focus bias path are respectively determined according to the types of the reflecting surfaces, the difference value of the absolute phase of the focus bias path and the absolute phase of the non-focus bias path is the focus bias quantized value of the compact range feed source, the construction of a simulation model is not needed, the focus bias quantized value of the compact range feed source can be quickly obtained, and the calculation timeliness is improved.

The manner in which the various steps shown in fig. 1 are performed is described below.

First, for step 100, the type of reflective surface is determined.

The compact field applies the near field focusing principle to generate a quasi-plane wave zone in the near zone of the measuring antenna, and the system can measure far-field measuring data without the far-field distance away from the measured object or the antenna during measurement. Wherein the compact range mainly comprises an edge-processed reflecting surface feed source. Common compact range approaches include: single reflector compact, double reflector compact and triple reflector compact.

The single reflecting surface compact range focuses the electromagnetic wave emitted from the feed source through a reflecting surface, so as to form a plane wave form on a receiving plane.

A dual reflector compact field system in the conventional sense is a dual mirror system in the form of cassegrains. The Cassegrain double-reflector compact field system consists of a feed source, a hyperboloid sub-reflecting surface and a revolution paraboloid main reflecting surface.

The three-reflecting surface compact range system is a reflecting surface compact range system consisting of a main reflecting surface of a standard surface and a secondary reflecting surface of two shaping surfaces.

Since the types of the reflecting surfaces are different, and the paths of the electromagnetic waves from the phase center of the feed source to the observation position are different, in order to calculate the paths corresponding to the electromagnetic waves, the types of the reflecting surfaces need to be determined, and according to the above, the types of the reflecting surfaces at least include three types: single reflecting surface, double reflecting surface, three reflecting surfaces.

Wherein, the single reflecting surface can comprise a single rotating paraboloid, a single parabolic cylinder and the like; the double reflecting surface comprises double parabolic cylinders, Cassegrain, Grighuri and the like.

Then, aiming at step 102, according to the determined type, a first absolute phase of an unfocused path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is unfocused is determined.

The absolute phase is related to the path length, and if the absolute phase of the unfocused path needs to be determined, the length of the unfocused path needs to be determined first.

In the embodiment of the invention, when the types of the reflecting surfaces are different, the length calculation modes of the paths without deflection are different.

When the reflecting surface type is a single reflecting surface, the length of the non-defocused path is calculated from the reflecting surface focal length F and the coordinates (x, y, z) of the observation position, and the length of the non-defocused path is equal to (F + z).

When the reflecting surface type is a double reflecting surface, the length of the non-defocused path is calculated from the focal length FL2 of the main reflecting surface in the double reflecting surface and the coordinates (x, y, z) of the observation position, and the length of the non-defocused path is equal to (FL2+ x).

In the embodiment of the invention, after the length of the unfocused path is calculated, the quotient of the length of the unfocused path and the wavelength of the electromagnetic wave is multiplied by 360 degrees to obtain the first absolute phase.

Next, in step 104, according to the determined type, a second absolute phase of a defocused path corresponding to the electromagnetic wave transmitted by the feed when the feed phase center is defocused is determined.

In an embodiment of the present invention, this step 102 can be implemented at least by one of the following ways:

s1: and determining the position information and the observation position information of the phase center of the feed source in the deflection focus path.

When the position of the feed source phase center deviates from the position of the focal point of the reflecting surface in the compact range, the position information of the feed source phase center when the feed source is out of focus can be determined through the existing scheme, for example, a reverse-deducing mode is used, the feed source is supposed to deviate from a certain position to a certain direction, the shape of a phase curve after the feed source is supposed to be out of focus is obtained, then the direction is judged to deviate from the certain direction according to the state of the phase curve, the adjustment is carried out to the direction until the adjustment is carried out, and the position information of the feed source phase center when the feed source is out of focus is reversely deduced.

Wherein the viewing position information is predetermined, for example at a coordinate (x, y, z) position.

S2: and determining the position information of at least one reflection point on the deflection path according to the determined type, the position information of the phase center when the feed source deflects to the focus and the observation position information.

When the types of the reflecting surfaces are different, the reflecting paths are different, and the number of the reflecting points is also different, and the following description is made with respect to the case where the types of the reflecting surfaces are a single reflecting surface and a double reflecting surface, respectively.

Firstly, the type of the reflecting surface is a single reflecting surface.

If it is determined in step 100 that the reflecting surface is of the single reflecting surface type, then a reflection point is included in the out-of-focus path.

The position information of the reflection point included on the off-focus path is determined in this step S2 by: and taking a symmetrical point corresponding to the normal line passing through the reflecting point of the phase center of the feed source in the deflection focus as an intermediate parameter, obtaining a calculation formula for calculating the position information of the reflecting point by using the theoretical formula of the single reflecting surface, the position information of the phase center of the feed source in the deflection focus, the observation position information and the intermediate parameter, and calculating the position information of the reflecting point by using the calculation formula.

The process will be described with an example in which the single reflection surface is a single paraboloid of revolution. Please refer to fig. 2, which is a schematic diagram of a single-rotation parabolic feed source focus offset, wherein a corresponding non-focus offset path when the feed source is not in focus is a line with an arrow in a dotted line in fig. 2, a corresponding focus offset path when the feed source is in focus is a line with an arrow in a solid line in fig. 2, and position information of a phase center when the feed source is in focus is (x)₀，y₀，z₀) The observation position information is (x, y, z), and the reflection point position of the electromagnetic wave on the reflection surface in the off-focus path is (x)₁，y₁，z₁) In order to obtain a calculation formula for calculating the position information of the reflection point, a symmetric point (a, b, c) corresponding to the phase center of the feed source when the feed source is out of focus with respect to a normal line passing through the reflection point is used as an intermediate parameter, please refer to fig. 2.

After the type of the reflecting surface is determined, a theoretical formula of a single reflecting surface of the type can be obtained, for example, when the single reflecting surface is a single rotating paraboloid, the theoretical formula is as follows: x is the number of²+y²＝4Fz；

Then, according to the theoretical formula and the position information, a calculation formula for calculating the position information of the reflection point can be obtained as follows:

wherein F is the focal length of the reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information, (a, b, c) is position information of the symmetrical point corresponding to the intermediate parameter, (x)₁，y₁，z₁) Is the position information of the reflection point.

Because of the above formula, the focal length F of the reflecting surface and the position information (x) of the phase center of the feed source when the feed source is deflected to the focal₀，y₀，z₀) Since the observed-position information (x, y, z) is a known quantity, the position information (x) of the reflection point can be calculated from the above formula₁，y₁，z₁)。

Other types of single reflecting surfaces can also obtain a calculation formula for calculating the position information of the reflecting point according to a corresponding theoretical formula, the position information and the intermediate parameter, and then substitute the calculation formula into the known quantity to solve the unknown quantity, namely the position information of the reflecting point.

And secondly, the type of the reflecting surface is a double reflecting surface.

If it is determined in step 100 that the type of the reflecting surface is a dual reflecting surface, the dual reflecting surface includes an auxiliary reflecting surface and a main reflecting surface, and the deflection path includes two reflecting points, which are a primary reflecting point on the auxiliary reflecting surface and a secondary reflecting point on the main reflecting surface, respectively;

the position information of the primary reflection point and the secondary reflection point included on the off-focus path is determined in this step S2 by:

s21: projecting the double reflecting surfaces in a set direction to obtain the projection surfaces of the double reflecting surfaces; the main reflecting surface is a parabola on the projection surface, and the auxiliary reflecting surface is a straight line.

The setting direction may be any one of an x-axis direction, a y-axis direction, and a z-axis direction. The x axis, the y axis and the z axis are coordinate axes based on the main reflecting surface, and the parabola vertex of the main reflecting surface is located at the origin of coordinates. Referring to fig. 3, the projection plane is obtained by projection in the z-axis direction when the dual-reflection plane is a dual-parabolic cylinder, and on the projection plane, the main reflection plane is a parabola AB and the sub-reflection plane is a straight line FE.

S22: determining a feed source deflection angle and an auxiliary reflecting surface deflection angle according to the projection surface; and taking a first symmetric point corresponding to the phase center relative to the normal passing through the primary reflection point when the feed source is out of focus and a second symmetric point corresponding to the primary reflection point relative to the normal passing through the secondary reflection point as intermediate parameters.

With continued reference to FIG. 3, the phase center C (x) is offset from the focal point by the feed₀，y₀，z₀) And making an auxiliary line towards the auxiliary reflecting surface FE, wherein the auxiliary line is perpendicular to the extension line of the auxiliary reflecting surface FE and intersects with the extension line of the auxiliary reflecting surface FE at a point D, and determining an included angle between CD and CJ1 as a feed source deflection angle, wherein J1 is a primary reflecting point. And determining the included angle between EC and EF as the deflection angle of the auxiliary reflecting surface.

A first symmetrical point (a) corresponding to the phase center C when the feed source is deflected to the focal point about a normal line passing through the primary reflection point J1₁，b₁，c₁) The first reflection point J1 is related to the second symmetric point (a) corresponding to the normal passing through the second reflection point J2₂，b₂，c₂) As an intermediate parameter.

S23: and obtaining a calculation formula for calculating the position information of the primary reflection point and the secondary reflection point by using the theoretical formula of the double reflection surfaces, the position information of the phase center of the feed source when the feed source is deflected to the focus, the observation position information, the deflection angle of the feed source, the deflection angle of the secondary reflection surface and each intermediate parameter, and calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula.

When the double reflecting surface is a double parabolic cylinder, the theoretical formula of the double parabolic cylinder is as follows: z is a radical of²＝4FL1(cosθ₂x+sinθ₂y-FL1-FL2cosθ₂)；y²＝4FL2x；

Then, according to the theoretical formula and the position information, a calculation formula for calculating the position information of the reflection point can be obtained as follows:

wherein, FL1 and FL2 are respectively the focal length of the main reflecting surface and the focal length of the sub reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information; theta₁、θ₂Respectively a feed source deflection angle and an auxiliary reflecting surface deflection angle; (a)₁，b₁，c₁) Is the position information of the first point of symmetry, (a)₂，b₂，c₂) Position information of the first symmetric point; (x)₁，y₁，z₁) Position information of the primary reflection point; (x)₂，y₂，z₂) And the position information of the secondary reflection point.

In the above formula, the focal length FL1 of the main reflecting surface, the focal length FL2 of the sub reflecting surface, and the position information (x) of the phase center of the feed when the feed is out of focus₀，y₀，z₀) Observation position information (x, y, z), feed deflection angle theta₁Angle of deflection theta of sub-reflecting surface₂All are known quantities, therefore, the position information (x) of the primary reflection point can be calculated according to the formula₁，y₁，z₁) And position information (x) of the secondary reflection point₂，y₂，z₂)。

Other types of double reflecting surfaces can also obtain a calculation formula for calculating the position information of the primary reflecting point and the position information of the secondary reflecting point according to a corresponding theoretical formula, the position information and the intermediate parameters, and further substitute the calculation formula into the known quantity to solve unknown quantities, namely the position information of the primary reflecting point and the position information of the secondary reflecting point.

S3: and calculating the length of the focus offset path according to the determined position information.

When the type of the reflecting surface is a single reflecting surface, the position information of the phase center of the feed source in the deflection focus on the deflection focus path, the position information of the reflecting point and the observation position information are known, so that the length of the deflection focus path can be calculated by using the coordinate values of the three points.

When the type of the reflecting surface is a double reflecting surface, the position information of the phase center of the feed source in the deflection focus on the deflection focus path, the position information of the primary reflecting point, the position information of the secondary reflecting point and the observation position information are known, so that the length of the deflection focus path can be calculated by using the coordinate values of the three points.

S4: and calculating to obtain the second absolute phase according to the length of the deflection path and the wavelength of the electromagnetic wave transmitted by the feed source.

In the embodiment of the present invention, after the length of the focus offset path is calculated, the quotient of the length of the focus offset path and the wavelength is multiplied by 360 degrees, so as to obtain the second absolute phase.

It should be noted that, the step 102 and the step 104 do not have a sequence, and the step 102 may be executed first and then the step 104 is executed, or the step 104 may be executed first and then the step 102 is executed, or may be executed simultaneously.

Finally, for step 106, a difference of the first absolute phase and the second absolute phase is determined as a compact range feed defocus quantization value.

In order to verify the accuracy of the method, the single rotating paraboloid and the double parabolic cylinders are used for respectively performing deflection focusing on an X axis, a Y axis and a Z axis, then the method and the existing simulation scheme are used for respectively analyzing, the phase difference of a horizontal transversal line and a vertical transversal line is respectively compared aiming at each deflection focusing, and the comparison result shows that the result of the method is almost the same as that of the existing simulation scheme.

As shown in fig. 4 and 5, the embodiment of the invention provides a device for determining the quantized value of the focus offset of the compact range feed source. The device embodiments may be implemented by software, or by hardware, or by a combination of hardware and software. From a hardware aspect, as shown in fig. 4, a hardware architecture diagram of a computing device where a compact range feed source focus offset quantization value determination apparatus provided for the embodiment of the present invention is located is shown, and in addition to the processor, the memory, the network interface, and the nonvolatile memory shown in fig. 4, the computing device where the apparatus is located may generally include other hardware, such as a forwarding chip responsible for processing a packet, and the like. Taking a software implementation as an example, as shown in fig. 5, as a logical means, the device is formed by reading a corresponding computer program in a non-volatile memory into a memory by a CPU of a computing device where the device is located and running the computer program. The embodiment provides a compact range feed source deflection quantization value determination device, which comprises:

a reflecting surface type determining unit 501 for determining the type of the reflecting surface;

an absolute phase determining unit 502, configured to determine, according to the determined type, a first absolute phase of an unfocused path corresponding to an electromagnetic wave transmitted by a feed source when a phase center of the feed source is unfocused; determining a second absolute phase of a focus-biased path corresponding to the electromagnetic wave transmitted by the feed source when the phase center of the feed source is focused;

a quantization determination unit 503, configured to determine a difference between the first absolute phase and the second absolute phase as a compact range feed offset quantization value.

In an embodiment of the present invention, when determining, according to the determined type, a phase center of the feed source to be out of focus, and determining a second absolute phase of a out-of-focus path corresponding to an electromagnetic wave transmitted by the feed source, the absolute phase determining unit 502 specifically includes: determining position information and observation position information of a phase center of the feed source in the deflection focus path; determining the position information of at least one reflection point on the deflection path according to the determined type, the position information of the phase center of the feed source in deflection focus and the observation position information; calculating the length of the deflection path according to the determined position information; and calculating to obtain the second absolute phase according to the length of the deflection path and the wavelength of the electromagnetic wave transmitted by the feed source.

In an embodiment of the present invention, the reflecting surface type determining unit 501 is specifically configured to determine that the type of the reflecting surface is a single reflecting surface; the off-focus path comprises a reflection point;

when determining the position information of the reflection point included on the off-focus path, the absolute phase determining unit 502 specifically includes: and taking a symmetrical point corresponding to the normal line passing through the reflecting point of the phase center of the feed source in the deflection focus as an intermediate parameter, obtaining a calculation formula for calculating the position information of the reflecting point by using the theoretical formula of the single reflecting surface, the position information of the phase center of the feed source in the deflection focus, the observation position information and the intermediate parameter, and calculating the position information of the reflecting point by using the calculation formula.

In one embodiment of the invention, the single reflecting surface is a single paraboloid of revolution;

the absolute phase determining unit 502 calculates the position information of the reflection point by using the following formula:

wherein F is the focal length of the reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information, (a, b, c) is position information of the symmetrical point corresponding to the intermediate parameter, (x)₁，y₁，z₁) Is the position information of the reflection point.

In an embodiment of the present invention, the reflecting surface type determining unit 501 is specifically configured to determine that the type of the reflecting surface is a double reflecting surface; the double reflecting surfaces comprise an auxiliary reflecting surface and a main reflecting surface; the deflection path comprises a primary reflection point on the secondary reflection surface and a secondary reflection point on the main reflection surface;

when determining the position information of the primary reflection point and the secondary reflection point included on the off-focus path, the absolute phase determining unit 502 specifically includes: projecting the double reflecting surfaces in a set direction to obtain the projection surfaces of the double reflecting surfaces; the main reflecting surface is a parabola on the projection surface, and the auxiliary reflecting surface is a straight line; determining a feed source deflection angle and an auxiliary reflecting surface deflection angle according to the projection surface; taking a first symmetric point corresponding to the phase center of the feed source in the deflection focus relative to the normal passing through the primary reflection point and a second symmetric point corresponding to the primary reflection point relative to the normal passing through the secondary reflection point as intermediate parameters; and obtaining a calculation formula for calculating the position information of the primary reflection point and the secondary reflection point by using the theoretical formula of the double reflection surfaces, the position information of the phase center of the feed source when the feed source is deflected to the focus, the observation position information, the deflection angle of the feed source, the deflection angle of the secondary reflection surface and each intermediate parameter, and calculating the position information of the primary reflection point and the secondary reflection point by using the calculation formula.

In one embodiment of the present invention, the dual reflective surface is a dual parabolic cylinder;

the absolute phase determining unit 502 calculates the position information of the primary reflection point and the secondary reflection point by using the following formula:

wherein, FL1 and FL2 are respectively the focal length of the main reflecting surface and the focal length of the sub reflecting surface; (x)₀，y₀，z₀) Position information of the phase center when the feed source is out of focus; (x, y, z) is observation position information; theta₁、θ₂Respectively a feed source deflection angle and an auxiliary reflecting surface deflection angle; (a)₁，b₁，c₁) Is the position information of the first point of symmetry, (a)₂，b₂，c₂) Position information of the first symmetric point; (x)₁，y₁，z₁) Position information of the primary reflection point; (x)₂，y₂，z₂) And the position information of the secondary reflection point.

In an embodiment of the present invention, when the absolute phase determining unit 502 calculates the second absolute phase according to the length of the off-focus path and the wavelength of the electromagnetic wave transmitted by the feed source, specifically includes: and multiplying the quotient of the length of the focusing path and the wavelength by 360 degrees to obtain the second absolute phase.

It is to be understood that the illustrated configurations of the embodiments of the present invention do not constitute a specific limitation on a means for determining a compact range feed offset quantization value. In other embodiments of the invention, a means of determining a compact range feed defocus quantization value may comprise more or fewer components than shown, or some components may be combined, some components may be split, or a different arrangement of components. The illustrated components may be implemented in hardware, software, or a combination of software and hardware.

Because the content of information interaction, execution process, and the like among the modules in the device is based on the same concept as the method embodiment of the present invention, specific content can be referred to the description in the method embodiment of the present invention, and is not described herein again.

Embodiments of the present invention also provide a computing device, including a memory and a processor, where the memory stores a computer program, and the processor, when executing the computer program, implements a method for determining a compact range feed offset quantization value in any embodiment of the present invention.

Embodiments of the present invention also provide a computer-readable storage medium having stored thereon a computer program, which, when executed by a processor, causes the processor to perform a method for determining a compact range feed defocus quantization value in any of the embodiments of the present invention.

Specifically, a system or an apparatus equipped with a storage medium on which software program codes that realize the functions of any of the above-described embodiments are stored may be provided, and a computer (or a CPU or MPU) of the system or the apparatus is caused to read out and execute the program codes stored in the storage medium.

In this case, the program code itself read from the storage medium can realize the functions of any of the above-described embodiments, and thus the program code and the storage medium storing the program code constitute a part of the present invention.

Examples of the storage medium for supplying the program code include a floppy disk, a hard disk, a magneto-optical disk, an optical disk (e.g., CD-ROM, CD-R, CD-RW, DVD-ROM, DVD-RAM, DVD-RW, DVD + RW), a magnetic tape, a nonvolatile memory card, and a ROM. Alternatively, the program code may be downloaded from a server computer via a communications network.

Further, it should be clear that the functions of any one of the above-described embodiments may be implemented not only by executing the program code read out by the computer, but also by causing an operating system or the like operating on the computer to perform a part or all of the actual operations based on instructions of the program code.

Further, it is to be understood that the program code read out from the storage medium is written to a memory provided in an expansion board inserted into the computer or to a memory provided in an expansion module connected to the computer, and then causes a CPU or the like mounted on the expansion board or the expansion module to perform part or all of the actual operations based on instructions of the program code, thereby realizing the functions of any of the above-described embodiments.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an …" does not exclude the presence of other similar elements in a process, method, article, or apparatus that comprises the element.

Those of ordinary skill in the art will understand that: all or part of the steps for realizing the method embodiments can be completed by hardware related to program instructions, the program can be stored in a computer readable storage medium, and the program executes the steps comprising the method embodiments when executed; and the aforementioned storage medium includes: various media that can store program codes, such as ROM, RAM, magnetic or optical disks.

Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.