阅读说明：本技术 一种新型曝光机 (Novel exposure machine ) 是由 陈铭 李金水 朱世敏 于 2021-07-01 设计创作，主要内容包括：本申请涉及曝光设备技术领域,尤其是涉及一种新型曝光机,包括沿光刻胶传送方向依次设置的放卷装置、曝光装置以及收卷装置,曝光装置包括机架、固设于机架顶部的光刻板、固设于光刻板下方的曝光机构以及盖板机构,盖板机构包括盖设于光刻板顶面的框架、软性压片组件、抽真空组件以及升降组件,软性压片组件封盖于框架内侧,以令光刻板、框架以及软性压片组件可共同形成一抽真空腔体,抽真空组件固设于机架上且与抽真空腔体相连通,升降组件固设于机架上且用于驱动框架沿竖向升降。本申请能够将光刻胶与光刻板之间的残留空气压出,以提高光刻胶的平整度,从而提高光刻胶的曝光效果。(The utility model belongs to the technical field of the exposure equipment technique and specifically relates to a novel exposure machine is related to, include the unwinding device who sets gradually along photoresist direction of transfer, exposure device and coiling mechanism, exposure device includes the frame, set firmly in the photoetching board at frame top, set firmly exposure mechanism and apron mechanism below the photoetching board, the frame of photoetching board top surface is located including the lid to apron mechanism, soft preforming subassembly, evacuation subassembly and lifting unit, soft preforming subassembly closing cap is inboard in the frame, so that the photoetching board, frame and soft preforming subassembly can form a evacuation cavity jointly, evacuation subassembly sets firmly in the frame and is linked together with the evacuation cavity, lifting unit sets firmly in the frame and is used for driving frame along vertical lift. This application can be extruded the residual air between photoresist and the photoetching board to improve the roughness of photoresist, thereby improve the exposure effect of photoresist.)

1. The utility model provides a novel exposure machine, includes unwinding device (200), exposure device (300) and coiling mechanism (400) that set gradually along photoresist (100) direction of transfer, and exposure device (300) include frame (1), set firmly in photoetching board (2) at frame (1) top, set firmly in exposure mechanism (3) and apron mechanism (4) of photoetching board (2) below, its characterized in that: the cover plate mechanism (4) comprises a frame (41) covered on the top surface of the photoetching plate (2), a soft pressing sheet assembly (42), a vacuumizing assembly (43) and a lifting assembly (44), wherein the soft pressing sheet assembly (42) is covered on the inner side of the frame (41) so that the photoetching plate (2), the frame (41) and the soft pressing sheet assembly (42) can jointly form a vacuumizing cavity (500), the vacuumizing assembly (43) is fixedly arranged on the rack (1) and communicated with the vacuumizing cavity (500), and the lifting assembly (44) is fixedly arranged on the rack (1) and used for driving the frame (41) to lift vertically.

2. The novel exposure machine of claim 1, characterized in that: the soft tabletting component (42) comprises a high-elasticity tabletting (421) and a low-elasticity tabletting (422) which are sequentially arranged from top to bottom, the high-elasticity tabletting (421) is covered on the top of the inner side of the frame (41), two opposite sides of the middle part of the inner side of the frame (41) are respectively provided with a mounting groove (51), a mounting shaft (52) is rotatably arranged in each mounting groove (51), and two sides of the low-elasticity tabletting (422) are respectively fixedly wound on the two mounting shafts (52); elastic reset pieces (53) are arranged between the two mounting shafts (52) and the frame (41) so that the two mounting shafts (52) respectively form tension on two sides of the low-elasticity pressing sheet (422).

3. The novel exposure machine of claim 2, characterized in that: a sealing groove (54) is formed in the periphery of the top of the inner side of the frame (41), a sealing block (55) is fixedly arranged on the lower side of the notch of the sealing groove (54), and a sealing strip (56) is fixedly arranged on one side, facing the bottom of the sealing groove (54), of the sealing block (55); the periphery of the high-elasticity pressing sheet (421) extends into the sealing groove (54) and is fixedly connected with the sealing block (55), so that the sealing strip (56) is clamped between the sealing block (55) and the high-elasticity pressing sheet (421).

4. The novel exposure machine of claim 1, characterized in that: the lifting assembly (44) comprises a lifting frame (441), two groups of lifting columns (442) and a driving structure (443), wherein the lifting frame (441) is arranged around the frame (41) and fixedly connected with the frame (41), the two groups of lifting columns (442) are fixedly arranged on the rack (1) and are respectively positioned at two sides of the lifting frame (441), one side of each lifting column (442) is provided with a lifting groove (444) extending vertically, a sliding block (445) fixedly connected with the lifting frame (441) is arranged in each lifting groove (444) in a sliding manner, and a screw rod (446) in threaded connection and transmission with the sliding block (445) is rotatably arranged in each lifting groove (444); the driving structure (443) is installed on the top of the lifting column (442) and is used for driving all the screw rods (446) to rotate synchronously.

5. The novel exposure machine of claim 4, wherein: the driving structure (443) comprises a main shaft (61), two auxiliary shafts (62) and a driving part (63), the main shaft (61) is rotatably arranged on a preset bracket of the rack (1), the two auxiliary shafts (62) and two groups of lifting columns (442) are arranged in a one-to-one corresponding manner, each auxiliary shaft (62) is rotatably arranged on the top of the corresponding lifting column (442) in a penetrating manner, and the main shaft (61) and the two auxiliary shafts (62) are connected and driven through a preset transmission structure (64) between each auxiliary shaft (62) and a screw rod (446) in the corresponding lifting column (442); the driving piece (63) is fixedly arranged on the support and used for driving the main shaft (61) to rotate.

6. The novel exposure machine of claim 4, wherein: the photoresist lifting device is characterized in that a lifting assembly (7) is arranged between the rack (1) and the unreeling device (200) and between the rack (1) and the reeling device (400), the lifting assembly (7) comprises a lifting roller (71) and two lifting rods (72) which are located below photoresist (100), one side of each lifting rod (72) is fixedly provided with a linear guide rail (73), each linear guide rail (73) is slidably arranged in a linear sliding groove (74) preset by the lifting frame (441), the top of each lifting rod (72) is fixedly provided with a limiting block (75), and two ends of each lifting roller (71) are respectively and rotatably arranged at the bottoms of the two lifting rods (72).

7. The novel exposure machine of claim 1, characterized in that: the frame (41) comprises a frame (411) and a sealing ring (412), wherein the sealing ring (412) is fixedly arranged on one side, facing the photoetching plate (2), of the frame (411).

8. The novel exposure machine of claim 7, wherein: an air hole (413) communicated with the vacuumizing cavity (500) is formed in one side of the frame (411), and a quick connector (414) communicated with the vacuumizing assembly (43) is detachably mounted at one end, far away from the vacuumizing cavity (500), of the air hole (413).

Technical Field

The application relates to the technical field of exposure equipment, especially, relate to a novel exposure machine.

Background

The exposure machine is a complex semiconductor processing device which is integrated with electron optics, electricity, machinery, vacuum and computer technologies and used for transmitting ultraviolet rays by starting lamplight and transferring image information of a photoetching plate to photoresist. Exposure machines were widely used in the semiconductor integrated circuit manufacturing industry after the 70 s.

The existing exposure machine generally comprises an unwinding device, an exposure device and a winding device which are sequentially arranged along the photoresist conveying direction, wherein the exposure device comprises a frame, a photoetching plate fixedly arranged at the top of the frame, an exposure mechanism fixedly arranged below the photoetching plate and a plate covering mechanism covering the photoetching plate. In the working process, the photoresist is intermittently conveyed into the exposure device under the combined action of the unwinding device and the winding device and is flatly paved on the top surface of the photoresist plate, at the moment, the photoresist plate is firstly covered above the photoresist plate by the cover plate mechanism, and then the photoresist is exposed by a focused electron beam generated by the exposure mechanism, so that the physicochemical property of the photoresist irradiated by the electron beam is changed, a good-soluble or non-good-soluble area is formed in a certain solvent, and a fine pattern is formed on the resist.

However, in the working process of the existing exposure machine, when the photoresist is tiled on the top surface of the photoresist plate, air is easily left between the photoresist and the photoresist plate, which causes the flatness of the photoresist to be reduced, and thus the exposure effect of the photoresist to be reduced; therefore, further improvement can be made.

Disclosure of Invention

In order to improve the exposure effect of photoresist, this application provides a novel exposure machine.

The above object of the present application is achieved by the following technical solutions:

the utility model provides a novel exposure machine, includes unwinding device, exposure device and the coiling mechanism that sets gradually along photoresist direction of transfer, and exposure device includes the frame, sets firmly in the photoetching board at frame top, sets firmly exposure mechanism and apron mechanism in photoetching board below, apron mechanism is including covering frame, soft preforming subassembly, evacuation subassembly and the lifting unit of locating the photoetching board top surface, soft preforming subassembly closing cap is inboard in the frame to make photoetching board, frame and soft preforming subassembly can form a evacuation cavity jointly, the evacuation subassembly sets firmly in the frame and is linked together with the evacuation cavity, lifting unit sets firmly in the frame and is used for driving frame along vertical lift.

By adopting the technical scheme, in the working process of the cover plate mechanism, when the photoresist is tiled on the top surface of the photoresist plate, the frame is driven by the lifting assembly to vertically descend and cover the top surface of the photoresist plate, so that the photoresist plate, the frame and the soft tabletting assemblies jointly form a vacuumizing cavity, at the moment, air in the vacuumizing cavity is pumped out by the vacuumizing assembly to form negative pressure, the soft tabletting assemblies covered on the inner side of the frame are elastically stretched and deformed under the action of atmospheric pressure and tightly attached to one side of the photoresist, so that residual air between the photoresist and the photoresist plate is pressed out, the flatness of the photoresist is improved, and the exposure effect of the photoresist is improved.

Optionally, the soft tabletting assembly comprises a high-elasticity tabletting and a low-elasticity tabletting which are sequentially arranged from top to bottom, the high-elasticity tabletting is covered on the top of the inner side of the frame, two opposite sides of the middle part of the inner side of the frame are respectively provided with a mounting groove, a mounting shaft is rotatably arranged in each of the two mounting grooves, and two sides of the low-elasticity tabletting are respectively fixedly wound on the two mounting shafts; and elastic reset pieces are arranged between the two mounting shafts and the frame, so that the two mounting shafts respectively form tension on two sides of the low-elasticity pressing sheet.

By adopting the technical scheme, when the vacuum pumping assembly pumps air in the vacuum pumping cavity to form negative pressure, the high-elasticity pressing sheet generates elastic stretching deformation under the action of atmospheric pressure, the middle area of the high-elasticity pressing sheet moves vertically downwards, and the middle area of the low-elasticity pressing sheet is pushed, so that the low-elasticity pressing sheet overcomes the torsion action of the elastic reset piece and moves vertically downwards to be tightly attached to one side, away from the photoetching plate, of the photoresist, and residual air between the photoresist and the photoetching plate is extruded; meanwhile, the low-elasticity pressing sheet is tightly attached to one side, away from the photoetching plate, of the photoresist in an unreeling mode through overcoming the torsion action of the elastic resetting piece, so that the deformation amount of the low-elasticity pressing sheet in the tightly attaching process is small, a protection effect is formed on the film-shaped photoresist, the photoresist is prevented from deforming due to the fact that the large deformation generated by the high-elasticity pressing sheet directly acts on the photoresist, and the exposure effect of the photoresist is improved.

Optionally, a sealing groove is formed in the periphery of the top of the inner side of the frame, a sealing block is fixedly arranged on the lower side of a notch of the sealing groove, and a sealing strip is fixedly arranged on one side, facing the bottom of the sealing groove, of the sealing block; the periphery of the high-elasticity pressing sheet extends into the sealing groove and is fixedly connected with the sealing block, so that the sealing strip is clamped between the sealing block and the high-elasticity pressing sheet.

By adopting the technical scheme, the periphery of the high-elasticity pressing sheet bypasses the sealing strip and then is fixedly connected with the sealing block, so that the sealing strip is clamped between the sealing block and the high-elasticity pressing sheet, the high-elasticity pressing sheet is sealed and covered at the top of the inner side of the frame, and when the high-elasticity pressing sheet gradually generates elastic stretching deformation under the action of atmospheric pressure, the acting force between the high-elasticity pressing sheet and the sealing strip is gradually increased, and the sealing effect is ensured.

Optionally, the lifting assembly comprises a lifting frame, two groups of lifting columns and a driving structure, the lifting frame is arranged around the frame and fixedly connected with the frame, the two groups of lifting columns are fixedly arranged on the frame and respectively located on two sides of the lifting frame, a lifting groove extending vertically is formed in one side of each lifting column, a sliding block fixedly connected with the lifting frame is arranged in each lifting groove in a sliding manner, and a screw rod in threaded connection transmission with the sliding block is rotatably arranged in each lifting groove; the driving structure is installed at the top of the lifting column and used for driving all the screw rods to synchronously rotate.

By adopting the technical scheme, when the driving structure drives all the screw rods to synchronously rotate, the plurality of screw rods are all in transmission through threaded connection so as to drive all the slide blocks to vertically ascend/descend, so that the lifting frame is driven to vertically ascend/descend, and further the frame is driven to vertically ascend/descend, namely, the lifting assembly drives the frame to vertically descend and cover the top surface of the photoetching plate, so that the photoetching plate, the frame and the soft tabletting assembly jointly form a vacuumizing cavity.

Optionally, the driving structure includes a main shaft, two auxiliary shafts and a driving element, the main shaft is rotatably disposed on a preset bracket of the frame, the two auxiliary shafts and the two groups of lifting columns are arranged in a one-to-one correspondence manner, each auxiliary shaft rotatably penetrates through the top of the corresponding lifting column, and the auxiliary shaft and a lead screw in the corresponding lifting column, and the main shaft and the two auxiliary shafts are connected for transmission through a preset transmission structure; the driving piece is fixedly arranged on the support and used for driving the main shaft to rotate.

By adopting the technical scheme, the transmission between each auxiliary shaft and the screw rod in the corresponding lifting column and between the main shaft and the two auxiliary shafts are connected through the preset transmission structure, so that when the driving part drives the main shaft to rotate, the main shaft drives the two auxiliary shafts to synchronously rotate through the transmission structure, the two auxiliary shafts drive all the screw rods to synchronously rotate through the transmission structure, the effect of driving all the screw rods to synchronously rotate through the driving structure is realized, and the frame is kept horizontally arranged in the vertical lifting/descending process.

Optionally, a lifting assembly is arranged between the frame and the unwinding device and between the frame and the winding device, the lifting assembly includes a lifting roller and two lifting rods, the lifting roller and the two lifting rods are located below the photoresist, a linear guide rail is fixedly arranged on one side of each lifting rod, each linear guide rail is slidably arranged in a linear sliding groove preset by the lifting frame, a limiting block is fixedly arranged at the top of each lifting rod, and two ends of each lifting roller are respectively rotatably arranged at the bottoms of the two lifting rods in a penetrating manner.

By adopting the technical scheme, in the process that the lifting assembly drives the frame to vertically lift after the photoresist exposure is finished, the lifting roller of the lifting assembly can lift the photoresist to separate the photoresist from the photoetching plate, so that the photoresist adhered to the top surface of the photoetching plate is prevented from being pulled and deformed by the winding device; meanwhile, in order to reduce the space required for installing the lifting assembly between the rack and the unwinding device and between the rack and the winding device, the lifting rod and the lifting frame are arranged to slide relatively, when the lifting roller descends to a certain height and cannot descend continuously, the lifting frame can descend unaffected through the relative sliding between the lifting rod and the lifting frame, and therefore the space reserved for installing the lifting assembly between the rack and the unwinding device and between the rack and the winding device is reduced.

Optionally, the frame includes a frame and a sealing ring, and the sealing ring is fixedly disposed on one side of the frame facing the photolithography mask.

Through adopting above-mentioned technical scheme, the leakproofness between frame and the photoetching board can be strengthened to the sealing washer.

Optionally, an air hole communicated with the vacuumizing cavity is formed in one side of the frame, and a quick connector communicated with the vacuumizing assembly is detachably mounted at one end, far away from the vacuumizing cavity, of the air hole.

Through adopting above-mentioned technical scheme, quick-operation joint is favorable to evacuation subassembly's quick installation.

In summary, the present application includes at least one of the following beneficial technical effects:

in the working process of the cover plate mechanism, when the photoresist is tiled on the top surface of the photoresist plate, the frame is driven by the lifting assembly to vertically descend and cover the top surface of the photoresist plate, so that the photoresist plate, the frame and the soft tabletting assembly jointly form a vacuum pumping cavity, at the moment, air in the vacuum pumping cavity is pumped out by the vacuum pumping assembly to form negative pressure, the soft tabletting assembly covered on the inner side of the frame generates elastic tensile deformation under the action of atmospheric pressure, and is tightly attached to one side of the photoresist, which is away from the photoresist plate, so as to press out residual air between the photoresist and the photoresist plate, thereby improving the flatness of the photoresist and further improving the exposure effect of the photoresist;

when the vacuum pumping assembly pumps air in the vacuum pumping cavity to form negative pressure, the high-elasticity pressing sheet generates elastic stretching deformation under the action of atmospheric pressure, so that the middle area of the high-elasticity pressing sheet moves vertically downwards, and the middle area of the low-elasticity pressing sheet is pushed, so that the low-elasticity pressing sheet overcomes the torsion action of the elastic resetting piece and moves vertically downwards to be tightly attached to one side, away from the photoetching plate, of the back of the photoresist, and residual air between the photoresist and the photoetching plate is extruded; meanwhile, the low-elasticity pressing sheet is tightly attached to one side, away from the photoetching plate, of the photoresist in an unreeling mode through overcoming the torsion action of the elastic resetting piece, so that the deformation amount of the low-elasticity pressing sheet in the tightly attaching process is small, a protection effect is formed on the film-shaped photoresist, the photoresist is prevented from deforming due to the fact that the large deformation generated by the high-elasticity pressing sheet directly acts on the photoresist, and the exposure effect of the photoresist is improved.

Drawings

Fig. 1 is a schematic overall structure diagram of an embodiment of the present application.

Fig. 2 is a sectional view of the exposure apparatus in the embodiment of the present application in a state where no vacuum is drawn.

Fig. 3 is a sectional view of the exposure apparatus in the embodiment of the present application in a vacuum state.

Fig. 4 is an enlarged view of a in fig. 3.

Figure 5 is a schematic diagram of the overall structure of a lift assembly in an embodiment of the present application.

Fig. 6 is an enlarged view of B in fig. 1.

Description of reference numerals: 1. a frame; 2. a photolithography plate; 3. an exposure mechanism; 4. a cover plate mechanism; 41. a frame; 411. a frame; 412. a seal ring; 413. air holes; 414. a quick coupling; 42. a soft tabletting component; 421. high-elasticity tabletting; 422. low-elasticity tabletting; 43. a vacuum pumping assembly; 44. a lifting assembly; 441. a lifting frame; 442. a lifting column; 443. a drive structure; 444. a lifting groove; 445. a slider; 446. a screw rod; 51. mounting grooves; 52. installing a shaft; 53. an elastic reset member; 54. a sealing groove; 55. a sealing block; 56. a sealing strip; 61. a main shaft; 62. a counter shaft; 63. a drive member; 64. a transmission structure; 7. a lifting assembly; 71. lifting the roller; 72. lifting the rod; 73. a linear guide rail; 74. a linear chute; 75. a limiting block; 100. photoresist; 200. an unwinding device; 300. an exposure device; 400. a winding device; 500. and (4) vacuumizing the cavity.

Detailed Description

The present application is described in further detail below with reference to figures 1-6.

The embodiment of the application discloses novel exposure machine.

Referring to fig. 1, the novel exposure machine includes an unwinding device 200, an exposure device 300, and a winding device 400 sequentially arranged along a transferring direction of the photoresist 100, wherein the exposure device 300 includes a frame 1, a photolithography board 2 fixedly disposed at a top of the frame 1, an exposure mechanism 3 fixedly disposed below the photolithography board 2, and a cover board mechanism 4 covering a top surface of the photolithography board 2. In the working process of the exposure machine, the photoresist 100 is intermittently conveyed into the exposure device 300 under the combined action of the unreeling device 200 and the reeling device 400 and is tiled on the top surface of the photoetching plate 2, at the moment, the photoresist 100 is covered above the photoetching plate 2 by the cover plate mechanism 4, and then the photoresist 100 is exposed by the focused electron beam generated by the exposure mechanism 3, so that the physicochemical property of the photoresist 100 irradiated by the electron beam is changed, a good-soluble or non-good-soluble area is formed in a certain solvent, and a fine pattern is formed on the resist.

Referring to fig. 2 and 3, in the embodiment, the plate covering mechanism 4 includes a frame 41, a soft tablet pressing assembly 42, a vacuum pumping assembly 43 and a lifting assembly 44, wherein the frame 41 includes a frame 411 and a sealing ring 412, the frame 411 is a square frame structure, and an outer contour of the frame 411 is smaller than an outer contour of the photolithography plate 2, so that the frame 411 can be covered on the top surface of the photolithography plate 2, the sealing ring 412 is fixedly disposed on one side of the frame 411 facing the photolithography plate 2 by gluing, so that when the frame 411 is covered on the top surface of the photolithography plate 2, the frame 411 and the photolithography plate 2 have better sealing performance. The lifting assembly 44 is fixedly arranged on the frame 1, and the lifting assembly 44 is fixedly connected with the frame 411 for driving the frame 411 to vertically ascend/descend, so that the frame 41 can be covered on the top surface of the photolithography panel 2 under the driving of the lifting assembly 44. The soft pressing component 42 is covered on the inner side of the frame 41, so that when the frame 41 is driven by the lifting component 44 to cover the top surface of the photoetching plate 2, the frame 41 and the soft pressing component 42 can jointly form a sealed vacuumizing cavity 500, and in addition, the soft pressing component 42 is made of elastic materials, so that the soft pressing component 42 can generate elastic stretching deformation. The vacuum pumping assembly 43 comprises a vacuum pump, a vacuum tube with one end communicated with the vacuum pump and a control unit for controlling the operation of the vacuum pump; an air hole 413 communicated with the vacuum-pumping cavity 500 is formed in one side of the frame 411, a quick connector 414 is detachably mounted at one end of the air hole 413 far away from the vacuum-pumping cavity 500, the quick connector 414 is well known to those skilled in the art and is not described herein again; the quick connector 414 is connected to the end of the vacuum tube far from the vacuum pump, so that the control unit can control the vacuum pump to pump out air in the vacuum chamber 500/introduce air into the vacuum chamber 500, i.e. control the air pressure in the vacuum chamber 500.

In the working process of the cover plate mechanism 4, when the photoresist 100 is tiled on the top surface of the photolithography board 2, the frame 41 is driven by the lifting component 44 to vertically descend and cover the top surface of the photolithography board 2, so that the photolithography board 2, the frame 41 and the soft tabletting components 42 jointly form a vacuum cavity 500, at the moment, air in the vacuum cavity 500 is pumped out through the vacuum component 43 to form negative pressure, so that the soft tabletting components 42 covering the inner side of the frame 41 generate elastic tensile deformation under the action of atmospheric pressure and are tightly attached to one side of the photoresist 100 departing from the photolithography board 2, so as to press out residual air between the photoresist 100 and the photolithography board 2, thereby improving the flatness of the photoresist 100 and further improving the exposure effect of the photoresist 100.

In the present embodiment, the soft pressing member 42 includes a high elastic pressing piece 421 and a low elastic pressing piece 422 sequentially arranged from top to bottom, wherein the high elastic pressing piece 421 and the low elastic pressing piece 422 are both sheet-shaped structures made of rubber materials, and the thickness of the high elastic pressing piece 421 is 3mm, and the thickness of the low elastic pressing piece 422 is 5mm, so that the elastic coefficient of the high elastic pressing piece 421 is smaller than that of the low elastic pressing piece 422.

Referring to fig. 3 and 4, a high elastic pressing sheet 421 is covered on the top of the inner side of the frame 411. Specifically, a sealing groove 54 with an inward opening is formed in the periphery of the top of the inner side of the frame 41, a sealing block 55 is fixedly arranged on the lower side of the notch of the sealing groove 54 in a welding mode, a sealing strip 56 is fixedly arranged on one side, facing the bottom of the sealing groove 54, of the sealing block 55 in an adhering mode, the sealing strip 56 is made of a rubber material, the high-elasticity pressing sheet 421 extends into the sealing groove 54 in the periphery, the high-elasticity pressing sheet 421 bypasses the sealing strip 56 in the periphery and then is fixedly connected with the sealing block 55, the sealing strip 56 is clamped between the sealing block 55 and the high-elasticity pressing sheet 421, the high-elasticity pressing sheet 421 is sealed and covered on the top of the inner side of the frame 411, and therefore the photoetching plate 2, the frame 41 and the soft pressing sheet assembly 42 can jointly form a sealed vacuumizing cavity 500.

The low-elasticity pressing piece 422 is arranged in the middle of the inner side of the frame 411. Specifically, mounting groove 51 that is the level and arranges is all seted up to the relative both sides that set up in the inboard middle part of frame 411 to all rotationally be equipped with in every mounting groove 51 and be the installation axle 52 that the level was arranged, the relative both sides that set up of low elasticity preforming 422 extend to respectively in two mounting grooves 51, and the relative both sides that set up of low elasticity preforming 422 are fixed respectively around locating two installation axle 52 peripheries, promptly, two installation axles 52 can be respectively to the relative both sides that set up of low elasticity preforming 422 rolling. Every installation axle 52 periphery all is overlapped and is equipped with an elasticity piece 53 that resets, elasticity piece 53 that resets in this embodiment is the torsional spring, elasticity resets 53 one end and installation axle 52 periphery fixed connection, the other end and frame 411 fixed connection, make two installation axles 52 can carry out the rolling to the relative both sides that set up of low elasticity preforming 422 respectively under the torsion effect of corresponding elasticity piece 53, namely, two installation axles 52 can form the pulling force to low elasticity preforming 422 both sides respectively, make low elasticity preforming 422 taut at evacuation cavity 500 middle part when not receiving other external acting forces.

When the vacuum-pumping assembly 43 pumps air out of the vacuum-pumping chamber 500 to form a negative pressure, the high-elasticity pressing sheet 421 generates elastic tensile deformation under the action of atmospheric pressure, so that the middle region of the high-elasticity pressing sheet 421 moves vertically downwards, and the middle region of the low-elasticity pressing sheet 422 is pushed, so that the low-elasticity pressing sheet 422 overcomes the torsion action of the elastic reset piece 53 and moves vertically downwards to be tightly attached to the side, away from the photolithography plate 2, of the photoresist 100, and residual air between the photoresist 100 and the photolithography plate 2 is pressed out; meanwhile, the low-elasticity pressing piece 422 is tightly attached to one side, away from the photoetching plate 2, of the photoresist 100 in an unreeling mode by overcoming the torsion action of the elastic resetting piece 53, so that the deformation amount of the low-elasticity pressing piece 422 in the tightly attaching process is small, a protective effect is formed on the film-shaped photoresist 100, the photoresist 100 is prevented from being deformed due to the fact that large deformation generated by the high-elasticity pressing piece 421 directly acts on the photoresist 100, and the exposure effect of the photoresist 100 is improved.

Referring to fig. 3, 5 and 6, in the embodiment, the lifting assembly 44 includes a lifting frame 441, two sets of lifting columns 442 and a driving structure 443, wherein the lifting frame 441 is a square frame structure, and an inner contour of the lifting frame 441 is larger than an outer contour of the side frame 411, so that the lifting frame 441 can be enclosed around the side frame 411, and the lifting frame 441 is fixedly connected with the side frame 411 through a plurality of preset connecting pieces; the two groups of lifting columns 442 are respectively positioned on two sides of the lifting frame 441, each group of lifting columns 442 consists of two lifting columns 442, and the bottom of each lifting column 442 is vertically and fixedly arranged on the rack 1; each lifting column 442 is provided with a lifting groove 444 extending vertically towards one side of the lifting frame 441, a sliding block 445 matched with the lifting groove 444 in a sliding manner is arranged in each lifting groove 444, and one side of each sliding block 445 facing the lifting frame 441 is fixedly connected with the lifting frame 441 in a welding manner, so that when the sliding blocks 445 slide along the extending direction of the lifting grooves 444, the lifting frame 441 can be driven by the sliding blocks 445 to vertically ascend/descend; a screw rod 446 which is vertically arranged is rotatably arranged in each lifting groove 444, and is positioned between the screw rod 446 and the sliding block 445 in the same lifting groove 444, and the screw rod 446 is in threaded connection with a screw hole which is preset on the sliding block 445, so that the sliding block 445 can be driven to vertically ascend/descend when the screw rod 446 rotates; a drive structure 443 is mounted on top of the lifting column 442 and the drive structure 443 is used to drive all the lead screws 446 to rotate synchronously.

When the driving structure 443 drives all the screw rods 446 to rotate synchronously, the screw rods 446 are in transmission through threaded connection to drive all the sliding blocks 445 to ascend/descend vertically, so as to drive the lifting frame 441 to ascend/descend vertically, and further drive the frame 411 to ascend/descend vertically, that is, the lifting assembly 44 drives the frame 41 to descend vertically and cover the top surface of the photoetching plate 2, so that the photoetching plate 2, the frame 41 and the soft tabletting assembly 42 form a vacuum-pumping cavity 500 together.

Specifically, in the present embodiment, the driving structure 443 for driving all the screw rods 446 to synchronously rotate includes a main shaft 61, two auxiliary shafts 62, and a driving element 63, where the driving element 63 in the present embodiment is a motor; a gantry-shaped bracket is erected above the rack 1, the main shaft 61 is rotatably arranged at the top of the bracket, the driving part 63 is fixedly arranged at the top of the bracket, and an output shaft of the driving part 63 is coaxially connected with one end of the main shaft 61, so that the driving part 63 can drive the main shaft 61 to rotate; two auxiliary shafts 62 are provided in one-to-one correspondence with the two sets of lifting columns 442, each auxiliary shaft 62 is rotatably inserted through the top of the corresponding lifting column 442, and each auxiliary shaft 62 is arranged perpendicular to the main shaft 61.

Each auxiliary shaft 62 and the screw rod 446 in the corresponding lifting column 442, and the main shaft 61 and the two auxiliary shafts 62 are connected and driven through a preset transmission structure 64, so that when the driving part 63 drives the main shaft 61 to rotate, the main shaft 61 drives the two auxiliary shafts 62 to synchronously rotate through the transmission structure 64, the two auxiliary shafts 62 drive all the screw rods 446 to synchronously rotate through the transmission structure 64, and therefore the effect of driving all the screw rods 446 to synchronously rotate through the driving structure 443 is achieved, and the frame 41 is kept horizontally arranged in the vertical ascending/descending process.

In order to prevent the photoresist 100 adhered to the top surface of the photolithography plate 2 from being pulled and deformed by the winding device 400, a lifting assembly 7 is disposed between the frame 1 and the unwinding device 200, and between the frame 1 and the winding device 400.

Referring to fig. 1 and 5, in particular, in the present embodiment, each of the two lifting assemblies 7 includes a lifting roller 71 and two lifting rods 72 arranged vertically, wherein the two lifting rollers 71 are respectively located between the frame 1 and the unwinding device 200 and between the frame 1 and the winding device 400, and the two lifting rollers 71 are both always located below the photoresist 100.

In the same lifting assembly 7, a linear guide rail 73 which is vertically arranged is fixedly arranged on one side of each lifting rod 72, and each linear guide rail 73 is slidably arranged in a linear sliding groove 74 which is preset on the inner side of the lifting frame 441, so that the lifting rods 72 and the lifting frame 441 can generate relative sliding along the vertical direction; a limiting block 75 is fixedly arranged at the top of each lifting rod 72 to prevent the lifting rods 72 from sliding off the lifting frame 441 under the action of gravity, namely, the lifting frame 441 can utilize the limiting block 75 to drive the lifting rods 72 to vertically lift in the vertical lifting process; two ends of the lifting roller 71 are respectively and rotatably arranged at the bottoms of the two lifting rods 72 in a penetrating manner, so that the lifting roller 71 can be driven to vertically ascend along the vertical ascending process of the lifting rods.

After the photoresist 100 is exposed, in the process that the lifting assembly 44 drives the frame 41 to vertically lift, the lifting roller 71 of the lifting assembly 7 can lift the photoresist 100, so that the photoresist 100 is separated from the photoetching plate 2, and the photoresist 100 adhered to the top surface of the photoetching plate 2 is prevented from being pulled and deformed by the winding device 400; meanwhile, in order to reduce the space required for installing the lifting assembly 7 between the rack 1 and the unreeling device 200 and between the rack 1 and the reeling device 400, the lifting rod 72 and the lifting frame 441 are arranged to slide relatively, when the lifting roller 71 descends to a certain height and cannot descend continuously, the lifting frame 441 can descend unaffected by the relative sliding between the lifting rod 72 and the lifting frame 441, so that the space required to be reserved for installing the lifting assembly 7 between the rack 1 and the unreeling device 200 and between the rack 1 and the reeling device 400 is reduced.

The working principle is as follows:

s1, the photoresist 100 is intermittently transferred into the exposure device 300 under the combined action of the unwinding device 200 and the winding device 400, and is spread on the top surface of the reticle 2.

S2, the lifting assembly 44 drives the frame 41 to vertically descend and cover the top surface of the photolithography plate 2, so that the photolithography plate 2, the frame 41 and the soft sheeting assembly 42 together form a vacuum-pumping chamber 500.

S3, pumping out the air in the vacuum chamber 500 by the vacuum pumping assembly 43 to form a negative pressure, so that the soft pressing assembly 42 covered on the inner side of the frame 41 generates elastic stretching deformation under the action of atmospheric pressure and is attached to the side of the photoresist 100 away from the reticle 2, so as to press out the residual air between the photoresist 100 and the reticle 2.

S4, the photoresist 100 is exposed by the focused electron beam generated by the exposure mechanism 3, the physicochemical properties of the photoresist 100 after being irradiated by the electron beam are changed, and a good-soluble or non-good-soluble region is formed in a certain solvent, thereby forming a fine pattern on the resist.

S5, the lifting assembly 44 drives the frame 41 to vertically lift and drives the lifting assembly 7 to lift the photoresist 100, so that the photoresist 100 is separated from the reticle 2.

Thus circulating.

The embodiments of the present invention are preferred embodiments of the present application, and the scope of protection of the present application is not limited by the embodiments, so: all equivalent changes made according to the structure, shape and principle of the present application shall be covered by the protection scope of the present application.