阅读说明：本技术 一种钟摆式基板蚀刻装置及蚀刻工艺 (Pendulum type substrate etching device and etching process ) 是由 严立巍 符德荣 陈政勋 文锺 于 2021-09-30 设计创作，主要内容包括：本发明公开一种钟摆式基板蚀刻装置,包括蚀刻槽,蚀刻槽外壁上方对称固定安装升降导轨,升降导轨之间固定安装横板,横板两端与升降导轨滑动连接,横板中间固定安装钟摆机构,钟摆机构底部固定安装蚀刻篮,蚀刻篮内壁对称固定安装若干夹板,夹板均匀等距设置,夹板远离蚀刻篮一侧设有V形槽,V形槽的内壁固定安装弹性垫,蚀刻槽底部固定安装气体分布器。本发明通过钟摆机构带动蚀刻篮做钟摆简谐运动,基板在两个夹板存在一定的偏斜角度,使基板摆动时与蚀刻液之间存在一定的应力缓冲,减少了基板破损的风险,同时随着蚀刻槽底部的气体分布器均匀产生向上的垂直气泡,以达到无死角的反应生成物移除,提高基板表面的蚀刻均匀度。(The invention discloses a pendulum type substrate etching device which comprises an etching groove, wherein lifting guide rails are symmetrically and fixedly arranged above the outer wall of the etching groove, a transverse plate is fixedly arranged between the lifting guide rails, two ends of the transverse plate are connected with the lifting guide rails in a sliding manner, a pendulum mechanism is fixedly arranged in the middle of the transverse plate, an etching basket is fixedly arranged at the bottom of the pendulum mechanism, a plurality of clamping plates are symmetrically and fixedly arranged on the inner wall of the etching basket, the clamping plates are uniformly arranged at equal intervals, a V-shaped groove is formed in one side of each clamping plate, which is far away from the etching basket, an elastic pad is fixedly arranged on the inner wall of the V-shaped groove, and a gas distributor is fixedly arranged at the bottom of the etching groove. The etching basket is driven to do the pendulum simple harmonic motion by the pendulum mechanism, the substrate has a certain deflection angle between the two clamping plates, so that certain stress buffering exists between the substrate and etching liquid when the substrate swings, the risk of substrate damage is reduced, upward vertical bubbles are uniformly generated along with a gas distributor at the bottom of an etching tank, the removal of reaction products without dead angles is achieved, and the etching uniformity of the surface of the substrate is improved.)

1. A pendulum type substrate etching device is characterized by comprising an etching groove (1), lifting guide rails (2) are symmetrically and fixedly arranged above the outer wall of the etching tank (1), a transverse plate (3) is fixedly arranged between the lifting guide rails (2), two ends of the transverse plate (3) are connected with the lifting guide rail (2) in a sliding way, a pendulum mechanism (4) is fixedly arranged in the middle of the transverse plate (3), an etching basket (5) is fixedly arranged at the bottom of the pendulum mechanism (4), a plurality of clamping plates (6) are symmetrically and fixedly arranged on the inner wall of the etching basket (5), the clamping plates (6) are uniformly arranged at equal intervals, one side of each clamping plate (6) far away from the etching basket (5) is provided with a V-shaped groove (601), an elastic pad (602) is fixedly mounted on the inner wall of the V-shaped groove (601), a gas distributor (7) is fixedly mounted at the bottom of the etching groove (1), and the gas distributor (7) is externally connected with an air pump.

2. The pendulum-type substrate etching device according to claim 1, wherein the lifting guide rail (2) comprises a fixing base (8), one side of the fixing base (8) is provided with a mounting groove (9), a lead screw (10) penetrates through the inside of the mounting groove (9), guide rods (11) are symmetrically and fixedly mounted on two sides of the lead screw (10), the lead screw (10) is rotatably connected with the fixing base (8), the bottom end of the lead screw (10) is connected with an output shaft of a first motor (12), sliding blocks (13) are arranged on the lead screw (10) and the guide rods (11), the sliding blocks (13) are in threaded fit with the lead screw (10), the sliding blocks (13) are slidably connected with the guide rods (11), and two ends of the transverse plate (3) are fixedly connected with the sliding blocks (13) on two sides respectively.

3. The pendulum type substrate etching apparatus according to claim 1, wherein the pendulum mechanism (4) comprises a second motor (14), a driving disc (15) is fixedly mounted on an output shaft of the second motor (14), a driving hole (16) is formed in the surface of the transverse plate (3) below the driving disc (15), a swinging rod (17) vertically penetrates through the driving hole (16), the middle of the swinging rod (17) is rotatably connected with the inner wall of the driving hole (16), a sliding hole (18) is formed in the upper end of the driving rod (17) along the length direction, an eccentric shaft (19) is fixedly mounted on the surface of the driving disc (15), the eccentric shaft (19) penetrates through the sliding hole (18), and the etching basket (5) is detachably fixed at the lower end of the swinging rod (17).

4. The pendulum type substrate etching apparatus according to claim 3, wherein the bottom of the etching basket (5) is a screen (501), a basket (502) is fixed above the screen (501), the clamp plate (6) is fixedly installed on the inner wall of the basket (502), a connecting rod (503) is fixedly installed in the middle of the top of the basket (502), and the connecting rod (503) is fixed with the swinging rod (17) through a bolt.

5. The pendulum-type baseplate etching device according to claim 1, wherein the elastic pad (602) is made of corrosion-resistant resin, and the outer wall of the elastic pad (602) is uniformly provided with stepped clamping grooves (603).

6. The pendulum-type substrate etching apparatus according to claim 1, wherein the gas distributor (7) is an annular gas distributor, the gas distributor (7) comprises a plurality of annular pipes (701) with successively decreasing diameters, the annular pipes (701) are communicated with each other through a connecting pipe (702), a gas inlet pipe (703) is fixedly installed on one side of the outermost annular pipe (701), the gas inlet pipe (703) penetrates through the sidewall of the etching bath (1), and the gas inlet pipe (703) is externally connected with an air pump.

7. An etching process based on the pendulum type baseplate etching device of any one of claims 1 to 6, comprising the steps of:

s1, sequentially placing the substrates to be thinned into an etching basket, and fixing two sides of the substrates through clamping plates;

s2, fixing the etching basket and the pendulum mechanism, putting the etching basket into an etching tank through a lifting guide rail, and injecting etching solution into the etching tank;

s3, introducing air into the gas distributor through an air pump, wherein the gas distributor enables the air to be uniformly dispersed to the bottom of the etching bath;

and S4, driving the etching basket to do simple harmonic motion through a pendulum mechanism, and combining bubbles generated by a bottom gas distributor to form uniform etching on the surface of the substrate.

Technical Field

The invention relates to the field, in particular to a pendulum type substrate etching device and an etching process.

Background

With the development of portable electronic devices, electronic devices such as mobile phones, flat panels, televisions, and computers are becoming increasingly finer and thinner, and therefore thinner and ultrathin glass substrates are required as accessories. The ultra-thin glass substrate is obtained mainly in two modes, one mode is to directly produce ultra-thin glass, the ultra-thin glass obtained in the mode has high requirements on production and processing technology and equipment, the production cost is high, most manufacturers cannot produce the ultra-thin glass, a carrier is required to be used for protecting the ultra-thin glass during transportation, in the production of the glass substrate, the glass and the carrier are required to be simultaneously processed into a liquid crystal glass substrate, and finally the carrier on the glass is removed, so that the processing procedures are multiple, and the production efficiency is low. The other method is to produce the glass with the conventional thickness, firstly form the liquid crystal glass substrate and finally thin the glass on the two sides of the liquid crystal glass substrate, and the method has the advantages of low requirements on the production and processing of the glass and low production and transportation costs of the glass, and is the most common method in the prior art.

At present, mainstream liquid crystal glass substrate thinning processes are divided into two major types, one type is a physical thinning method, the purpose of glass thinning is mainly achieved by utilizing the friction effect between a display screen glass substrate and grinding powder, and the method is not good in control precision, long in time consumption and low in yield. The second method is a chemical thinning method, which utilizes the mutual reaction between the display screen glass substrate and the corrosive liquid to achieve the effect of chemical thinning, and the method has the advantages of short thinning time, small equipment investment, high product yield, simple components of the thinning liquid and low cost, and gradually becomes the mainstream technical method for thinning the display screen glass substrate.

In the prior art, the glass thinning technology mostly adopts a plurality of vertical soaking type thinning, namely, a glass substrate to be thinned is put into a reaction tank of thinning equipment, and the glass substrate reacts with an etching solution for a period of time, so that the thinning can be realized. The vertical soaking type thinning method can simultaneously treat a plurality of pieces of glass, and is high in efficiency. However, in the multi-piece vertical soaking type thinning method, white powdery precipitates generated by reaction are easy to deposit and adhere to the lower end of the glass substrate, and further the lower end of the glass is uneven and unsmooth, so that the product quality is influenced.

Disclosure of Invention

In order to solve the above-mentioned drawbacks of the prior art, the present invention provides a pendulum-type substrate etching apparatus and an etching process, wherein the substrate is formed into a fully-covered uniform surface by the simple harmonic motion of the left and right pendulums in combination with the vertical bubbles generated by the gas distributor at the bottom of the etching bath.

The purpose of the invention can be realized by the following technical scheme:

the utility model provides a pendulum formula base plate etching device, including the etching groove, etching groove outer wall top symmetry fixed mounting riser guide, fixed mounting diaphragm between the riser guide, diaphragm both ends and riser guide sliding connection, fixed mounting pendulum mechanism in the middle of the diaphragm, pendulum mechanism bottom fixed mounting etching basket, a plurality of splint of etching basket inner wall symmetry fixed mounting, the even equidistance setting of splint, splint keep away from etching basket one side and are equipped with the V-arrangement groove, the inner wall fixed mounting cushion in V-arrangement groove, etching groove bottom fixed mounting gas distributor, the external air pump of gas distributor.

The lifting guide rail comprises a fixing seat, a mounting groove is formed in one side of the fixing seat, a lead screw is arranged in the mounting groove in a penetrating mode, guide rods are symmetrically and fixedly mounted on two sides of the lead screw, the lead screw is connected with the fixing seat in a rotating mode, the bottom end of the lead screw is connected with an output shaft of a first motor, sliding blocks are arranged on the lead screw and the guide rods, the sliding blocks are in threaded fit with the lead screw, the sliding blocks are in sliding connection with the guide rods, and two ends of a transverse plate are fixedly connected with the sliding blocks on two sides respectively.

The pendulum mechanism includes the second motor, fixed mounting driving-disc on the output shaft of second motor, and the drive hole has been seted up on the cross-plate surface of driving-disc below, and the vertical swing arm that runs through in the drive hole, the swing arm centre is connected with the rotation of drive hole inner wall, and the slide opening has been seted up along length direction to the driving-disc upper end, driving-disc fixed surface installation eccentric shaft, and the eccentric shaft runs through the slide opening, and the fixed etching basket can be dismantled to the swing arm lower extreme.

The bottom of the etching basket is provided with a screen plate, a basket is fixed above the screen plate, a clamping plate is fixedly arranged on the inner wall of the basket, a connecting rod is fixedly arranged in the middle of the top of the basket, and the connecting rod is fixed with a swing rod through a bolt.

The elastic pad is made of corrosion-resistant resin, and the outer wall of the elastic pad is uniformly provided with clamping grooves which are arranged in steps.

The gas distributor is annular gas distributor, and the gas distributor includes a plurality of diameters degressive annular pipe in proper order, through the connecting pipe intercommunication between the annular pipe, outermost ring annular pipe one side fixed mounting intake pipe, and the intake pipe runs through the etching groove lateral wall, the external air pump of intake pipe.

An etching process comprising the steps of:

s1, sequentially placing the substrates to be thinned into an etching basket, and fixing two sides of the substrates through clamping plates;

s2, fixing the etching basket and the pendulum mechanism, putting the etching basket into an etching tank through a lifting guide rail, and injecting etching solution into the etching tank;

s3, introducing air into the gas distributor through an air pump, wherein the gas distributor enables the air to be uniformly dispersed to the bottom of the etching bath;

s4, driving the etching basket to make simple harmonic motion by the pendulum mechanism, combining the bubbles generated by the bottom gas distributor to form uniform etching on the substrate surface

The invention has the beneficial effects that:

according to the invention, the etching basket is driven to do pendulum simple harmonic motion by the pendulum mechanism, the substrate has a certain deflection angle on the two clamping plates, when the substrate does pendulum simple harmonic motion in the etching tank along with the etching basket, certain stress buffering exists between the substrate and the etching solution, the risk of substrate damage is reduced, meanwhile, upward vertical bubbles are uniformly generated along with a gas distributor at the bottom of the etching tank 1, etching reaction products deposited and adhered at the lower end of the glass substrate can be dispersed, so that the removal of the reaction products without dead angles is achieved, and the etching uniformity of the surface of the substrate is improved.

Drawings

The invention will be further described with reference to the accompanying drawings.

FIG. 1 is a schematic view of the overall structure of a pendulum-type substrate etching apparatus according to the present invention;

FIG. 2 is a schematic view of the internal structure of the pendulum type etching apparatus for substrates according to the present invention;

FIG. 3 is a schematic structural diagram of a lifting rail of the pendulum-type etching apparatus for substrates according to the present invention;

FIG. 4 is a schematic structural diagram of a swing mechanism of a pendulum-type substrate etching apparatus according to the present invention;

FIG. 5 is a schematic diagram of an etching basket of the pendulum-type etching apparatus for substrates according to the present invention;

FIG. 6 is an enlarged schematic view of the pendulum-type substrate etching apparatus of the present invention at position A in FIG. 5;

FIG. 7 is a schematic view showing the structure of a gas distributor of a pendulum-type etching apparatus for substrates according to the present invention;

FIG. 8 is a schematic diagram showing the positional relationship between the substrate to be thinned and the chucking plate when the etching basket of the pendulum-type substrate etching apparatus of the present invention is swung.

In the figure:

1-etching groove, 2-lifting guide rail, 3-transverse plate, 4-pendulum mechanism, 5-etching basket, 501-screen plate, 502-basket, 503-connecting rod, 6-clamping plate, 601-V-shaped groove, 602-elastic pad, 603-clamping groove, 7-gas distributor, 701-annular pipe, 702-connecting pipe, 703-gas inlet pipe, 8-fixing seat, 9-mounting groove, 10-screw rod, 11-guide rod, 12-first motor, 13-sliding block, 14-second motor, 15-driving disk, 16-driving hole, 17-driving rod, 18-sliding hole, 19-eccentric shaft and 20-base plate.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it is to be understood that the terms "opening," "upper," "lower," "thickness," "top," "middle," "length," "inner," "peripheral," and the like are used in an orientation or positional relationship that is merely for convenience in describing and simplifying the description, and do not indicate or imply that the referenced component or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be considered as limiting the present invention.

As shown in FIGS. 1-7, a pendulum type substrate etching device comprises an etching bath 1, wherein lifting guide rails 2 are symmetrically and fixedly arranged above the outer wall of the etching bath 1, transverse plates 3 are fixedly arranged between the lifting guide rails 2, two ends of each transverse plate 3 are slidably connected with the lifting guide rails 2, a pendulum mechanism 4 is fixedly arranged in the middle of each transverse plate 3, an etching basket 5 is fixedly arranged at the bottom of each pendulum mechanism 4, a plurality of clamping plates 6 are symmetrically and fixedly arranged on the inner wall of the etching basket 5, the clamping plates 6 are uniformly and equidistantly arranged, a V-shaped groove 601 is arranged on one side, far away from the etching basket 5, of each clamping plate 6, an elastic cushion 602 is fixedly arranged on the inner wall of each V-shaped groove 601, a gas distributor 7 is fixedly arranged at the bottom of the etching bath 1, and the gas distributor 7 is externally connected with an air pump.

Lifting guide 2 includes fixing base 8, mounting groove 9 has been seted up to fixing base 8 one side, the inside lead screw 10 that runs through of mounting groove 9, the symmetry fixed mounting guide bar 11 in lead screw 10 both sides, lead screw 10 rotates with fixing base 8 to be connected, the output shaft of lead screw 10 bottom and first motor 12, be equipped with slider 13 on lead screw 10 and the guide bar 11, slider 13 and the 10 screw-thread fit of lead screw, slider 13 and 11 sliding connection of guide bar, 3 both ends of diaphragm respectively with the slider 13 fixed connection of both sides.

The pendulum mechanism 4 comprises a second motor 14, a driving disc 15 is fixedly mounted on an output shaft of the second motor 14, a driving hole 16 is formed in the surface of the transverse plate 3 below the driving disc 15, a swing rod 17 vertically penetrates through the driving hole 16, the middle of the swing rod 17 is rotatably connected with the inner wall of the driving hole 16, a sliding hole 18 is formed in the upper end of the driving rod 17 along the length direction, an eccentric shaft 19 is fixedly mounted on the surface of the driving disc 15, the eccentric shaft 19 penetrates through the sliding hole 18, and the lower end of the swing rod 17 can be detachably fixed with the etching basket 5.

The bottom of the etching basket 5 is provided with a screen plate 501, the surface of the screen plate 501 is provided with a plurality of meshes which are large enough so as not to influence the passing of vertical bubbles, a basket 502 is fixed above the screen plate 501, a clamping plate 6 is fixedly arranged on the inner wall of the basket 502, a connecting rod 503 is fixedly arranged in the middle of the top of the basket 502, and the connecting rod 503 is fixed with the swinging rod 17 through a bolt.

The elastic pad 602 is corrosion resistant resin material, can be PU resin or HDPE resin, and the outer wall of elastic pad 602 evenly is equipped with the draw-in groove 603 that is the step dress, and draw-in groove 603 can be the corrugate, can make and treat that the attenuate base plate is the mild transition to next floor at the swing.

The gas distributor 7 is an annular gas distributor, the gas distributor 7 comprises a plurality of annular pipes 701 with diameters decreasing in sequence, the annular pipes 701 are communicated with each other through a connecting pipe 702, a gas inlet pipe 703 is fixedly installed on one side of the outermost annular pipe 701, the gas inlet pipe 703 penetrates through the side wall of the etching groove 1, and the gas inlet pipe 703 is externally connected with an air pump.

As shown in FIG. 8, when the substrate etching is performed by using the apparatus of the present invention, the substrate 20 to be thinned is sequentially placed between the clamping plates 6 in the etching basket 5, wherein the width of the base plate 20 is larger than the distance between the openings of the two clamping plates 6 and smaller than the distance between the bottoms of the V-shaped grooves 601 of the two clamping plates 6, thus, the substrate 20 has a certain deflection angle (-30 to 30) between the two clamping plates 6, and the substrate 20 will not fall off from the two clamping plates 6, when the substrate 20 does pendulum simple harmonic motion in the etching tank 1 along with the etching basket 5, a certain stress buffer exists between the substrate 20 and the etching solution, so that the risk of damage to the substrate 20 is reduced, meanwhile, upward vertical bubbles are uniformly generated along with the gas distributor at the bottom of the etching tank 1, and etching reaction products deposited and adhered to the lower end of the glass substrate can be dispersed, so that the reaction products without dead corners can be removed, and the etching uniformity of the surface of the substrate can be improved.

In the description herein, references to the description of "one embodiment," "an example," "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.