阅读说明：本技术 滤波器组件、检测器和滤波器组件的制造方法 (Filter assembly, detector and manufacturing method of filter assembly ) 是由 格哈德·艾尔姆施泰纳 德西斯拉娃·奥佩尔 黛博拉·莫尔克罗夫特 延斯·霍弗里希特 于 2019-07-26 设计创作，主要内容包括：一种滤波器组件,包括入射介质(10)、间隔件(30)、至少一个电介质滤波器(50)和出射介质(70)。间隔件(30)被设置在入射介质(10)与至少一个电介质滤波器(50)之间,使得入射介质(10)和至少一个电介质滤波器(50)被间隔开工作距离(32),并由此包围折射率低于入射介质(10)的介质。至少一个电介质滤波器(50)设置在出射介质(70)上。(A filter assembly includes an entrance medium (10), a spacer (30), at least one dielectric filter (50), and an exit medium (70). The spacer (30) is arranged between the entrance medium (10) and the at least one dielectric filter (50) such that the entrance medium (10) and the at least one dielectric filter (50) are spaced apart by a working distance (32) and thereby enclose a medium having a lower refractive index than the entrance medium (10). At least one dielectric filter (50) is arranged on the exit medium (70).)

1. A filter assembly comprising an entrance medium (10), a spacer (30), at least one dielectric filter (50) and an exit medium (70), wherein:

-the spacer (30) is arranged between the entrance medium (10) and the at least one dielectric filter (50) such that the entrance medium (10) and the at least one dielectric filter (50) are spaced apart by a working distance (32) and thereby enclose a medium having a lower refractive index than the entrance medium (10), and

-the at least one dielectric filter (50) is arranged on the exit medium (70).

2. The filter assembly according to claim 1, wherein the spacer (30) is arranged to limit spectral shift of incident light with changing angle of incidence.

3. The filter assembly of claim 1 or 2,

-a dielectric filter (50) placed within the working distance (32) from the incident medium has a transmission characteristic,

-the working distance (32) is set such that the spectral shift of the transmission characteristic of the dielectric filter (50) remains within given limits with varying angles of incidence.

4. A filter assembly according to claim 2 or 3, wherein the spectral shift remains constant or within ± 1nm, ± 2nm, ± 5nm, etc. at spaced angles of incidence less than ± 30 °, ± 20 °, ± 10 °, etc.

5. The filter assembly of one of claims 1 to 4,

-the entrance medium (10), the medium of lower refractive index and the dielectric filter (50) form a hybrid stack with an average refractive index,

-the average refractive index depends on the spacer (30) and the working distance (32), and

-the spectral characteristics of the dielectric filter (50) depend on the average refractive index.

6. The filter assembly according to one of claims 1 to 5, wherein the entrance medium (10) is arranged to modify the incident radiation such that the modified radiation leaves the entrance medium with a diffuse radiation distribution.

7. The filter assembly of one of claims 1 to 6,

-the entrance medium (10), the spacer (30) and the at least one dielectric filter (50) enclose a cavity (31), and

-said cavity (31) comprises a medium having a lower refractive index than said entrance medium.

8. The filter assembly according to one of claims 1 to 7, wherein the refractive index of the entrance medium (10) is greater than 1.

9. The filter assembly of one of claims 1 to 8,

-the working distance (32) has a value of 0.25 to 10 μm, and/or

-the value of the working distance (32) is at least 2 μm.

10. The filter assembly of claim 9,

-the cavity (31) is open to the surroundings,

-the cavity (31) is open, filled with ambient air, and the working distance (32) has a value of at least 2 μm, or

-said cavity (31) is closed to the surrounding environment.

11. The filter assembly according to one of claims 1 to 10, wherein the spacer (30) is provided at one edge, a plurality of edges or a frame of the at least one dielectric filter (50).

12. The filter assembly according to one of claims 1 to 11, wherein the spacer (30) comprises:

-a patterned adhesive agent, the adhesive agent,

-a patterned optical adhesive, and/or

-a metal layer.

13. Filter assembly according to one of claims 1 to 12, wherein the exit medium (70) comprises at least one active surface of a detector for electromagnetic radiation.

14. The filter assembly of one of claims 1 to 13, wherein:

-the at least one dielectric filter (50) comprises filter elements, and

-the filter elements have different transmission characteristics.

15. The filter assembly according to claim 14, wherein the filter element is arranged for bi-color, multi-color, photopic and/or photopic applications.

16. A method of manufacturing a filter assembly comprising the steps of:

-providing an entrance medium (10),

-providing a spacer (30) between the entrance medium (10) and at least one dielectric filter (50) such that the entrance medium (10) and the at least one dielectric filter (50) are spaced apart by a working distance (32) and surround a medium having a lower refractive index than the entrance medium, and

-arranging the at least one dielectric filter (50) on the exit medium (70).

17. The method of claim 16, wherein,

-arranging the spacer (30) between the entrance medium (10) and at least one dielectric filter (50) by patterning an adhesive and/or an optical adhesive, or

-arranging the spacer (30) between the entrance medium (10) and at least one dielectric filter (50) by patterning a metal layer.

18. A detector, comprising:

-a filter assembly according to one of claims 1 to 15,

-an optical sensor comprising one or more light sensitive areas, wherein the exit medium (70) consists of the optical sensor.

19. The detector of claim 18, wherein the dielectric filter (50) comprises one or more filter elements, wherein the one or more filter elements each have a different transmission characteristic.

20. The detector of claim 18 or 19, wherein the detector is a computed tomography detector.