阅读说明：本技术 一种基于氧化铟锡准周期结构的超材料吸收器 (Metamaterial absorber based on indium tin oxide quasi-periodic structure ) 是由 路海 董超 刘洪超 张军 沈克胜 郑耘 董世青 张博 于 2021-02-17 设计创作，主要内容包括：本发明公开了一种基于氧化铟锡准周期结构的超材料吸收器,该超材料吸收器由基片及镀制于基片上的准周期结构薄膜组成,所述准周期结构薄膜的膜系机构为：基底/BABABBABABBABBABABBAB/Air,其中A表示厚度为87nm的氧化铟锡薄膜,B表示厚度为220nm的氧化铪薄膜,该超材料吸收器在300-1000nm的波长范围内实现高达96%的平均吸收率。本发明提出了一种基底无关且对应用环境具有良好适应性的吸收器,该吸收器在较宽的入射角以及不同偏振情况下依然能够保持宽带光谱吸收性能。(The invention discloses a metamaterial absorber based on an indium tin oxide quasi-periodic structure, which consists of a substrate and a quasi-periodic structure film plated on the substrate, wherein a film system mechanism of the quasi-periodic structure film is as follows: substrate/BABABBABBABBABABBAB/Air, wherein A represents an indium tin oxide thin film with a thickness of 87nm and B represents a hafnium oxide thin film with a thickness of 220nm, the metamaterial absorber achieves an average absorption rate of up to 96% in the wavelength range of 300-1000 nm. The invention provides an absorber which is independent of a substrate and has good adaptability to application environment, and the absorber can still maintain broadband spectrum absorption performance under the conditions of a wider incidence angle and different polarizations.)

1. A metamaterial absorber based on an indium tin oxide quasi-periodic structure is characterized by comprising a substrate and a quasi-periodic structure film coated on the substrate, wherein a film system mechanism of the quasi-periodic structure film is as follows: substrate/BABABBABBABBABABBAB/Air, wherein A represents an indium tin oxide thin film with a thickness of 87nm and B represents a hafnium oxide thin film with a thickness of 220nm, the metamaterial absorber achieves an average absorption rate of up to 96% in the wavelength range of 300-1000 nm.

2. The metamaterial absorber based on an indium tin oxide quasi-periodic structure of claim 1, wherein: the substrate is a silicon substrate or a glass substrate.

Technical Field

The invention belongs to the technical field of optical films, and particularly relates to a metamaterial absorber based on a non-metallic material Indium Tin Oxide (ITO) quasi-periodic structure.

Background

With the development of society, energy shortage has become a major challenge facing human beings at present, and the full utilization of renewable energy sources such as solar energy has become a popular field of research. Early studies on metamaterial absorbers have been extensive, but are generally made based on metals such as gold, silver, chromium, titanium, and the like. These metal-based absorbers, while capable of significantly increasing the interaction of optical species, and thus greatly increasing the absorption enhancement in certain spectral ranges due to the plasma effect, also suffer from drawbacks such as difficulty in forming a continuous smooth film; incompatible with the manufacture of standard semiconductor processes; poor chemical and thermal stability, poor adhesion to substrates such as silicon and fused silica, and the like.

In practical production application, the metamaterial absorber has strong environmental adaptability besides high absorption performance. For example, as the solar energy absorber is changed with the climate all the year round and the day rises to the sunset, good stability, insensitivity to angle and polarization and the like are necessary conditions for ensuring the efficient working performance of the absorber. The substrate-independent performance can enable the absorber to have more flexible and variable practical application.

Disclosure of Invention

The invention aims to provide a metamaterial absorber based on an indium tin oxide quasi-periodic structure with good absorption performance, wherein the absorber is made of a non-metal material and has a flattened thin film structure, so that the metamaterial absorber has no dependence on a substrate, and can realize an average absorption rate of up to 96% in the whole solar spectrum (in a wavelength range of 300-1000 nm) on a silicon substrate or a glass substrate (even on a flexible material substrate), and the highest absorption rate is more than 99%. Moreover, the metamaterial absorber designed by the invention provides effective broadband absorption enhancement for light with wide incidence angle and different polarization.

The invention adopts the following technical scheme for realizing the aim, and the metamaterial absorber based on the non-metallic material and the quasi-periodic structure is characterized by consisting of a substrate and a quasi-periodic structure film plated on the substrate, wherein a film system mechanism of the quasi-periodic structure film is as follows: substrate/BABABBABBABBABABBAB/Air, wherein A represents an indium tin oxide thin film with a thickness of 87nm and B represents a hafnium oxide thin film with a thickness of 220nm, the metamaterial absorber achieves an average absorption rate of up to 96% in the wavelength range of 300-1000 nm.

Further defined, the substrate is a silicon substrate or a glass substrate.

Compared with the prior art, the invention has the following advantages: the invention provides an absorber which is independent of a substrate and has good adaptability to application environment, and the absorber can still maintain broadband spectrum absorption performance under the conditions of a wider incidence angle and different polarizations. Especially, the average absorption rate of up to 96% is realized in the wavelength range of 300-1000nm, and the highest absorption rate is more than 99%. Above all, it is able to show good stability under 85% humidity and 85 ℃ environment.

Drawings

Fig. 1 is a schematic cross-sectional structure diagram of a designed metamaterial absorber.

Fig. 2 is an absorption rate curve of substrates (silicon substrate and glass substrate).

Figure 3 is a plot of the spectral absorptance of a non-metallic broadband light absorber based on silicon wafer and glass.

Figure 4 is a plot of the absorbance of a designed non-metallic broadband light absorber (here, a silicon substrate as an example) at different angles (15 °, 30 °, 45 ° and 60 °) and different polarizations (S-polarized, P-polarized and unpolarized) of incident light.

Fig. 5 is a spectrum absorption curve of a non-metallic broadband light absorber with silicon wafer and glass as substrates after 0 hour, 48 hours, 96 hours and 120 hours under the environment of 85% humidity and 85 ℃.

In the figure: 1-quasi-periodic structure film, 2-substrate.

Detailed Description

The following describes embodiments of the present invention in further detail with reference to the accompanying drawings.

The metamaterial absorber provided by the invention has a wider spectral absorption range (has obvious absorption effect in the range of 300-2000 nm), especially realizes the average absorption rate of 96% in the wavelength range of 300-1000nm, and the highest absorption rate is more than 99%.

At the beginning of design, firstly, a proper optical thin film material is selected in a required spectral range, and in consideration of some defects of a metal thin film, ITO and HfO are finally selected in the design₂Two thin film materials, ITO being the absorbing layer. ITO and HfO₂The materials were all thermally evaporated using an electron beam at evaporation rates of 2.5A/S and 2A/S, respectively, while maintaining an oxygenation rate of 30SCCM (standard mL/min) during the evaporation of the ITO.

The metamaterial absorber based on the nonmetallic materials and the quasi-periodic structure consists of a substrate 2 and a quasi-periodic structure film 1 coated on the substrate 2. The anti-reflection film of the present invention is a multi-layer quasi-periodic film structure. And quartz crystals are adopted for monitoring in the film system deposition process, and the film thickness deposition error is controlled, so that a result which is closer to the design is obtained. The film system structure is optimized through film system design software, and the film system structure of the broadband spectrum absorption film system is obtained by the following steps:

substrate/BABABBABBABBABBABBAB/Air

Wherein A is Indium Tin Oxide (ITO) film with thickness of 87nm, and B is hafnium oxide (HfO) with thickness of 220nm₂) A film; the substrate is a one inch round substrate of two materials, silicon substrate or glass substrate, respectively.

As can be seen by comparing FIG. 2 with FIG. 3, the absorber film designed by the present invention has a significant absorption enhancement effect in the whole spectral range of 300-1900nm, especially in the wavelength range of 300-1000nm, and the average absorption rate is as high as 96%, and the highest absorption rate is more than 99%, so that the metamaterial absorber designed by the present invention has a broad-band spectral absorption performance independent of the substrate. As can be seen from FIG. 4, the metamaterial absorber designed by the invention can maintain good absorption performance under different incident angles and different polarizations. As can be seen from FIG. 5, the absorption performance of the absorber designed by the invention does not change greatly under the environment of 85% humidity and 85 ℃, so the metamaterial absorber designed by the invention has good chemical and thermal stability.

While there have been shown and described what are at present considered the fundamental principles of the invention, its essential features and advantages, the invention further resides in various changes and modifications which fall within the scope of the invention as claimed.