阅读说明：本技术 一种消除电极电荷积累的方法 (Method for eliminating electrode charge accumulation ) 是由 金洲 于 2019-10-15 设计创作，主要内容包括：本发明公开了一种消除电极电荷积累的方法,用恒流电源不断提供的电荷来中和电极积累的异性电荷,保证电极的电位稳定。本方法涉及离子注入机,属于半导体器件制造领域。高压电源A(1)输出直流正电压,提供给电极A(2)正电位,用于离子束的加速并使其获得能量,高压电阻A(4)构成回路,恒流电源A(5)提供的电子(7)用于中和电极A上所积累的正电荷(6),保证电极A上电位的稳定。高压电源B(8)输出直流负电压,提供给电极B(9)负电位,用于抑制离子束中电子的发散,高压电阻B(9)构成回路,恒流电源B(11)提供的正电荷(13)用于中和其上所积累的电子(12),保证电极B上电位的稳定。(The invention discloses a method for eliminating electrode charge accumulation, which uses charges continuously provided by a constant current power supply to neutralize the opposite charges accumulated by an electrode and ensures the potential stability of the electrode. The method relates to an ion implanter, and belongs to the field of semiconductor device manufacturing. The high-voltage power supply A (1) outputs direct-current positive voltage, the direct-current positive voltage is supplied to the positive potential of the electrode A (2) and is used for accelerating the ion beam and enabling the ion beam to obtain energy, the high-voltage resistor A (4) forms a loop, and electrons (7) supplied by the constant-current power supply A (5) are used for neutralizing positive charges (6) accumulated on the electrode A, so that the stability of the potential on the electrode A is guaranteed. The high-voltage power supply B (8) outputs direct-current negative voltage, the direct-current negative voltage is supplied to the negative potential of the electrode B (9) and is used for inhibiting the divergence of electrons in an ion beam, the high-voltage resistor B (9) forms a loop, and positive charge (13) supplied by the constant-current power supply B (11) is used for neutralizing electrons (12) accumulated on the high-voltage resistor B, so that the stability of the potential on the electrode B is ensured.)

1. A method of eliminating electrode charge accumulation comprising: the high-voltage constant-current source comprises a high-voltage power supply A (1), a positive electrode A (2), a ground electrode C (3), a high-voltage resistor A (4), a constant-current source A (5), a high-voltage power supply B (8), a negative electrode B (9), a high-voltage resistor B (3) and a constant-current source B (4).

2. A method of eliminating electrode charge buildup, comprising: the high-voltage power supply A (1) outputs direct-current positive voltage, provides a positive potential for the positive electrode A (2), and forms a positive electric field between the positive potential and the ground electrode C (3) for accelerating the ion beam and enabling the ion beam to obtain initial energy meeting the process requirement; the accelerated ion beam bombards the electrode A (2), so that positive charges (6) are accumulated on the electrode A, and the potential on the electrode A is unstable; the high-voltage resistor A (4) forms a loop, electrons (7) provided by the constant-current power supply A (5) continuously flow into the electrode A (2) for neutralizing positive charges (6) accumulated on the electrode A (2), and the stability of the potential on the electrode A (2) is ensured; the high-voltage power supply (8) outputs direct-current negative voltage, supplies the negative voltage to the negative electrode B (9), forms a negative electric field between the negative electric field and the ground electrode C (3) and is used for inhibiting the divergence of electrons (12) in an ion beam, and the electrons (12) can bombard the electrode B (9) in the process, so that the electrons (12) are accumulated on the electrode B (9) and the electric potential on the electrode B is unstable; the high-voltage resistor B (10) forms a loop, and positive charges (13) provided by the constant-current power supply B (10) continuously flow into the electrode B (9) for neutralizing electrons (12) accumulated on the electrode B (9), so that the stability of the potential on the electrode B (9) is ensured.

Technical Field

The invention relates to a method for eliminating charge accumulation, which is applied to an ion implanter and belongs to the field of semiconductor device manufacturing.

Background

In a semiconductor manufacturing equipment ion implanter, the first process flow is acceleration of the ion beam in order to obtain the initial energy required for the process. The acceleration system is generally composed of a high voltage power supply and an electrode, wherein the high voltage power supply provides a direct current positive high voltage potential to the electrode for generating an electric field for accelerating the ion beam. Since the electrodes are in the beam path space of the ion implanter, space charges inevitably impinge on the electrodes. After the space charges bombard the electrode, the electrode continuously accumulates charges, which can cause the instability of the electric potential on the electrode, cause the instability of the acceleration energy of the ion beam, fail to meet the parameter requirements of the process, cause energy pollution, and influence the uniformity and dose distribution of the beam current, thereby reducing the qualification rate of the wafer. Maintaining a stable potential on the electrodes is therefore critical to acceleration of the ion beam and to improving wafer yield. Eliminating charge build-up on the electrodes is a goal we want to achieve.

Disclosure of Invention

As shown in fig. 1, the method for eliminating positive charge accumulation includes a high voltage power supply a (1), a positive electrode a (2), a ground electrode C (3), a high voltage resistor a (4), and a constant current power supply a (5), and is characterized in that:

the high-voltage power supply A (1) outputs direct-current positive voltage to provide a positive potential for the electrode A (2), and the electrode A (2) and the ground electrode C (3) form an electric field for accelerating the ion beam so that the ion beam obtains initial energy meeting the process requirement; the accelerated ion beam bombards the electrode A (2), so that positive charges (6) are accumulated on the electrode A (2), and the potential on the electrode A (2) continuously rises to cause the potential to be unstable; the high-voltage resistor A (4) forms a loop, electrons (7) provided by the constant-current power supply A (5) continuously flow into the electrode A (2) to neutralize positive charges (6) accumulated on the electrode A (2), and the stability of the potential on the electrode A (2) is ensured.

As shown in fig. 2, the method for eliminating negative charge accumulation includes a high voltage power supply B (8), a negative electrode B (9), a ground electrode C (3), a high voltage resistor (10), and a constant current power supply (11), and is characterized in that:

the high-voltage power supply B (8) outputs direct-current negative voltage and provides a negative potential for the electrode B (9), and the electrode B (9) and the ground electrode C (3) form an electric field for decelerating the ion beam, so that the divergence of electrons (12) in the ion beam is inhibited; because electrons in the ion beam can bombard the electrode B, electrons (12) are accumulated on the electrode B (9), and the potential on the electrode B is unstable; the high-voltage resistor B (8) forms a loop, and positive charges (13) provided by the constant-current power supply B (9) continuously flow into the electrode B (9) for neutralizing electrons (12) accumulated on the electrode B (9) so as to ensure the stability of the potential on the electrode B (9).

The invention has the advantages that:

by an active method, the electrodes are constantly supplied with electric charges to neutralize the charges of opposite polarity accumulated thereon. The process has real-time performance, not only improves the stability of electrode potential, but also effectively prevents energy pollution when ion beams are injected into the wafer, and improves the qualification rate of the wafer.

Drawings

The specific implementation mode of the invention is as follows:

FIG. 1 is a schematic diagram of the present invention eliminating positive charge accumulation on the electrodes;

fig. 2 is a schematic diagram of the present invention for eliminating negative charge accumulation on the electrodes.

Detailed Description

The invention will be further described with reference to specific embodiments thereof, which are not intended to be limiting.

Fig. 1 illustrates a method for eliminating positive charge accumulation, which includes a high-voltage power supply a (1), a positive electrode a (2), a ground electrode C (3), a high-voltage resistor a (4), and a constant-current power supply a (5). The high-voltage power supply A (1) outputs direct-current positive voltage to provide positive potential for the positive electrode A (2), and an electric field for accelerating ion beams is formed between the electrode A (2) and the electrode C (3) so that the ion beams obtain energy meeting the process requirements; the accelerated ion beam bombards the electrode A (2), so that positive charges (6) are accumulated on the electrode A, the potential on the electrode A continuously rises, and the potential is unstable; the high-voltage resistor A (4) forms a loop, and the constant-current power supply A (5) continuously supplies electrons (7) to the electrode A (2) for neutralizing positive charges (6) accumulated on the electrode A (2) so as to ensure the stability of the potential on the electrode A (2).

Fig. 2 illustrates a method for eliminating negative charge accumulation, which comprises a high-voltage power supply B (8), a negative electrode B (9), a ground electrode C (3), a high-voltage resistor B (10), and a constant-current power supply (11). The high-voltage power supply B (8) outputs direct-current negative voltage and provides negative potential for the electrode B (8), and the electrode B (8) and the ground electrode C (3) form an electric field for decelerating the ion beam, so that the divergence of electrons in the ion beam is inhibited; because electrons in the ion beam can bombard the electrode B (9), electrons (12) are accumulated on the electrode B, and the potential on the electrode B can be unstable; the high-voltage resistor B (10) forms a loop, and the constant-current power supply B (9) continuously provides positive charges (13) for neutralizing electrons (12) accumulated on the electrode B (9) so as to ensure the stability of the potential on the electrode A.

The contents of the present patent have been described in detail with reference to specific embodiments thereof. Any obvious modifications to the disclosure herein disclosed which do not depart from the spirit of the disclosure herein will be readily apparent to those skilled in the art as a violation of the disclosure and the pertinent legal responsibility will be afforded thereto.