阅读说明：本技术 一种通过金属和介质组合制备诱导透射滤光片的方法 (Method for preparing induced transmission filter by combining metal and medium ) 是由 李建潮 蒋红霞 欧旭良 石矿 庞华华 于 2021-01-22 设计创作，主要内容包括：本发明公开了一种通过金属和介质组合制备诱导透射滤光片的方法,该方法包括以下步骤：步骤一、挑选基片,并按照设定好的尺寸对所述基片依次进行切割、粗磨和清洗；步骤二、在清洗后的所述基片的上表面沉积1层介质反射膜,再在介质反射膜的上表面叠加1层间隔层,再在间隔层的表面镀1层金属膜,按照在金属膜的上表面叠加1层间隔层,沉积1层介质反射膜的顺序,完成膜层的制作,得到透导透射滤光片；步骤三、对步骤二得到的所述透导透射滤光片进行精磨和抛光；步骤四、将抛光后的所述透导透射滤光片清洗干净后进行性能测试。本发明的有益效果是,透导透射滤光片具有高的峰值透射率和特宽的长波截止区,实用性强。(The invention discloses a method for preparing an induced transmission filter by combining metal and a medium, which comprises the following steps: the method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size; depositing 1 dielectric reflection film on the upper surface of the cleaned substrate, superposing 1 interlayer on the upper surface of the dielectric reflection film, plating 1 metal film on the surface of the interlayer, and finishing the manufacture of a film layer according to the sequence of superposing 1 interlayer on the upper surface of the metal film and depositing 1 dielectric reflection film to obtain the transmission filter; step three, carrying out fine grinding and polishing on the transmission filter obtained in the step two; and step four, cleaning the polished transmission filter and then carrying out performance test. The transmission filter has the advantages of high peak value transmittance, extremely wide long wave cut-off area and strong practicability.)

1. A method of making an induced transmission filter from a combination of a metal and a medium, the method comprising the steps of:

the method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

depositing 1 dielectric reflection film on the upper surface of the cleaned substrate, superposing 1 interlayer on the upper surface of the dielectric reflection film, plating 1 metal film on the surface of the interlayer, and finishing the manufacture of a film layer according to the sequence of superposing 1 interlayer on the upper surface of the metal film and depositing 1 dielectric reflection film to obtain the transmission filter;

step three, carrying out fine grinding and polishing on the transmission filter obtained in the step two;

and step four, cleaning the polished transmission filter and then carrying out performance test.

2. The method of claim 1, wherein the film structure is dielectric reflective film/spacer layer/metal film/spacer layer/dielectric reflective film.

3. The method of claim 1, wherein the metal film comprises Ag and the dielectric reflective films each comprise Ta₅O₂And SiO₂。

4. The method of claim 1, wherein the metal film is deposited under vacuum at a vacuum degree of 1 × e in the second step^－3－8×e^－4Pa, the evaporation temperature is 25-85 ℃, and the evaporation rate is 0.4-0.6 nm/s.

5. The method of claim 1, wherein the equivalent admittance Y of the metal film and the spacer layer stacked on the upper surface thereof in the second step is a real number.

6. The method of claim 1, wherein the dielectric reflective film of the uppermost layer in step two is a λ/4 film with alternating high and low refractive indices.

7. The method of claim 1, wherein the thickness of each of the two spacer layers in step two is 1.74 wavelengths 1/4 wavelengths.

8. The method of claim 1, wherein the metal film provides a symmetric single-seal shape to the passband.

9. The method of claim 1, wherein the transmission filter has a peak transmission of no less than 90%.

Technical Field

The invention relates to the technical field of optical filters, in particular to a method for preparing an induced transmission optical filter by combining metal and a medium.

Background

In recent years, the laser technology has been well developed, and the high-efficiency wavelength conversion of a free electron laser and the appearance of a new laser light source of a high-power ultraviolet laser make requirements on the performance of an optical coating element of a resonant cavity and a peripheral optical system; in applications such as low gain lasers and high power wavelength conversion, ultra-low power consumption laser mirrors become important optical devices; the laser reflecting film is required to have the advantages of small absorption, less scattering, large reflecting power, high laser damage resistance threshold value and the like.

The optical filter is one of optical elements, can present three conditions of passing, reflection and absorption to various chromatic lights, has selective absorptivity of passing the required chromatic light and absorbing other chromatic lights, thereby achieving the function of filtering light, has wide application in spectral analysis, laser technology, chemical industry, space navigation, large-scale precision instruments and various military products, and plays a very important role in various testing and analyzing instruments; so far, its application mainly manifests as: astronomy, plasma detection, space detection, laser detection, chemical analysis, indirect temperature measurement, harmful gas analysis, color measurement, optical communication systems, and the like; a filter such as 763nm is designed for detecting the spectral line of oxygen molecules; in the infrared gas sensor, filters with different central wavelengths can detect different gas components; the infrared filter is used as a narrow-band and ultra-narrow-band-pass optical film filter of an infrared spectrometer, and can be applied to the fields of satellite remote sensing, optical analysis instruments, environmental tests and the like.

The filter is mainly classified into a cut-off filter and a band pass filter, and a filter that suppresses a short wavelength region and transmits a long wavelength region is generally referred to as a long wavelength pass filter, whereas a cut-off filter that suppresses a long wavelength region and transmits a short wavelength region is referred to as a short wavelength pass filter.

Disclosure of Invention

The present invention is directed to solving the above problems by devising a method for manufacturing an induced transmission filter by combining a metal and a medium.

The technical scheme of the present invention is a method for preparing an induced transmission filter by combining a metal and a medium, the method comprising the steps of:

the method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

depositing 1 dielectric reflection film on the upper surface of the cleaned substrate, superposing 1 interlayer on the upper surface of the dielectric reflection film, plating 1 metal film on the surface of the interlayer, and finishing the manufacture of a film layer according to the sequence of superposing 1 interlayer on the upper surface of the metal film and depositing 1 dielectric reflection film to obtain the transmission filter;

step three, carrying out fine grinding and polishing on the transmission filter obtained in the step two;

and step four, cleaning the polished transmission filter and then carrying out performance test.

As a further explanation of the present invention, the film structure is dielectric reflective film/spacer layer/metal film/spacer layer/dielectric reflective film.

As a further explanation of the invention, the material of the metal film comprises Ag, and the material of the two dielectric reflective films comprises Ta₅O₂And SiO₂。

As a further explanation of the present invention, in the second step, the metal film is deposited under vacuum conditions with a degree of vacuum of 1 × e^－3－8×e^－4Pa, the evaporation temperature is 25-85 ℃, and the evaporation rate is 0.4-0.6 nm/s.

As a further illustration of the present invention, the equivalent admittance Y of the metal film and the spacer layer stacked on the upper surface thereof in the second step is a real number.

As a further description of the present invention, in the second step, the dielectric reflective film at the uppermost layer is a λ/4 film with alternating high and low refractive indexes.

As a further illustration of the present invention, the thickness of the two spacer layers in step two is 1.74 1/4 wavelengths each.

As a further illustration of the invention, the metal film gives the passband a symmetrical single-envelope shape.

As a further illustration of the present invention, the transmission filter has a peak transmittance of not less than 90%.

The induced transmission filter prepared by the invention is combined by metal and medium, has high peak transmittance and a very wide long wave cut-off region, is not only suitable for various applications requiring very high peak transmittance and wide long wave cut-off region without requiring very narrow pass band, but also has excellent characteristics when being used as a cut-off filter for inhibiting a long wave bypass band of a full-medium narrow-band filter, can be widely applied to the fields of optical communication, laser technology, air-assisted technology, medical instruments, spectral technology, fine chemical engineering, military industry and the like, and has strong practicability and great market potential.

Detailed Description

The invention provides a method for preparing an induced transmission filter by combining metal and a medium, which comprises the following steps:

the method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

step two, depositing 1 dielectric reflection film on the upper surface of the cleaned substrate (for the convenience of distinguishing in the following description, the dielectric reflection film is called a first dielectric reflection film), then superposing 1 interlayer on the upper surface of the first dielectric reflection film (the interlayer is called a first interlayer), plating 1 metal film on the surface of the first interlayer, and finishing the manufacturing of the film layer according to the sequence that the interlayer is superposed on the upper surface of the metal film (the interlayer is called a second interlayer) and the dielectric reflection film is deposited (the dielectric reflection film is called a second dielectric reflection film), so as to obtain the transmission and transmission optical filter;

step three, carrying out fine grinding and polishing on the transmission and transmission optical filter obtained in the step two;

and step four, cleaning the polished transmission filter and performing performance test.

Since the absorption of the metal film is not only determined by the optical properties of the technical film itselfThe number (refraction n, extinction coefficient k) and the thickness are closely related to the admittance of the adjacent medium, so the material of the metal film in the second step comprises Ag, and the material of the first dielectric reflective film and the second dielectric reflective film both comprise Ta₅O₂And SiO₂The refractive index of the second interlayer superposed on the upper surface of the metal film is nf, the equivalent admittance Y after the metal film and the second interlayer are combined is a real number, the second medium reflecting film deposited on the second interlayer is a lambda/4 film with high refractive index and low refractive index alternating, and the second medium reflecting film can eliminate the reflection of the equivalent admittance.

The film system structure of the transmission filter prepared by the invention is a dielectric reflection film/spacing layer/metal film/spacing layer/dielectric reflection film, a large number of experiments are carried out by adopting an ion-assisted deposition method during preparation, and the influence of different working air pressures, different oxygen and hydrogen ratios and different temperatures on the optical performance of the film layer is analyzed, so that the preparation process of the optical film meeting certain refractive index, film thickness and transmittance is obtained; there are three key points in the preparation process of the present invention, which are the thickness of the spacer layer, the thickness of the metal film and the condition of the metal film plating, and these three key points will be specifically described below.

1) Thickness of spacer layer: the thickness of the first spacing layer directly influences the control of the next metal film and the second spacing layer, if the control is not accurate, the failure of metal film plating can be caused, and therefore the thickness of the spacing layer is controlled to be 1.74 1/4 wavelengths during preparation;

2) thickness of the metal film: if the thickness of the metal film is thinner than the optimal value, although the peak value transmissivity can be improved, the cut-off depth is different, the half width is wide, the passband is seriously asymmetric, even split double peaks appear, if the thickness of the metal film is too thick, although the bandwidth is narrowed, the peak value transmissivity is greatly reduced, the long-wave secondary peak used for eliminating the narrow-band all-dielectric interference filter cannot be used, so the thickness of the metal film is required to be the optimal value, tests show that the passband can obtain a symmetrical single-sealed shape, and the peak value transmissivity of the transmission filter is higher and is not less than 90%;

3) conditions for plating a metal film: the metal film is plated by evaporation under vacuum condition,vacuum degree of 1 × e^－3－8×e^{－ 4}Pa, the evaporation temperature is 25-85 ℃, and the evaporation rate is 0.4-0.6 nm/s.

Example 1.

The method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

step two, depositing 1 layer of SiO material on the upper surface of the cleaned substrate₂The first dielectric reflective film of (1), further stacking 1 first spacer layer with thickness of 1.74 layers and wavelength of 1/4 on the upper surface of the first dielectric reflective film, further plating 1 silver film on the surface of the first spacer layer, and performing evaporation under vacuum condition with vacuum degree of 1 × e^－3Pa, evaporation temperature of 25 deg.C, evaporation rate of 0.4nm/s, and deposition of 1 layer of SiO as the second interlayer with thickness of 1.74 layers and wavelength of 1/4 on the upper surface of the silver film₂The second dielectric reflection film, the film layer is manufactured to obtain the transmission filter;

step three, carrying out fine grinding and polishing on the transmission and transmission optical filter obtained in the step two;

and step four, cleaning the polished transmission filter and performing performance test.

Example 2.

The method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

step two, depositing 1 layer of SiO material on the upper surface of the cleaned substrate₂The first dielectric reflective film of (1), further stacking 1 first spacer layer with thickness of 1.74 layers and wavelength of 1/4 on the upper surface of the first dielectric reflective film, further plating 1 silver film on the surface of the first spacer layer, and performing evaporation under vacuum condition with vacuum degree of 8 × e^－4Pa, the evaporation temperature is 85 ℃, the evaporation rate is 0.6nm/s, and the material of the deposited 1 layer is SiO according to the superposition of 1 layer of second spacing layers with the thickness of 1.74 and the wavelength of 1/4 on the upper surface of the silver film₂The second dielectric reflection film, the film layer is manufactured to obtain the transmission filter;

step three, carrying out fine grinding and polishing on the transmission and transmission optical filter obtained in the step two;

and step four, cleaning the polished transmission filter and performing performance test.

Example 3.

The method comprises the following steps of firstly, selecting a substrate, and sequentially cutting, roughly grinding and cleaning the substrate according to a set size;

step two, depositing 1 layer of Ta on the upper surface of the cleaned substrate₅O₂The first dielectric reflective film of (1), further stacking 1 first spacer layer with thickness of 1.74 layers and wavelength of 1/4 on the upper surface of the first dielectric reflective film, further plating 1 silver film on the surface of the first spacer layer, and performing evaporation under vacuum condition with vacuum degree of 1 × e^－3Pa, evaporation temperature of 25 deg.C, evaporation rate of 0.4nm/s, and deposition of 1 layer of Ta₅O₂The second dielectric reflection film, the film layer is manufactured to obtain the transmission filter;

step three, carrying out fine grinding and polishing on the transmission and transmission optical filter obtained in the step two;

and step four, cleaning the polished transmission filter and performing performance test.

The transmission filter prepared by the invention has high peak value transmissivity and a very wide long wave cut-off area, is not only suitable for various applications which do not require very narrow pass bands but also require very high peak value transmissivity and a wide long wave cut-off area, and simultaneously has excellent characteristics when being used as a cut-off filter for inhibiting a long wave bypass band of an all-dielectric narrow band filter, can be widely applied to the fields of optical communication, laser technology, air-moving technology, medical instruments, spectrum technology, fine chemical engineering, military industry and the like, and has very large market potential.

The technical solutions described above only represent the preferred technical solutions of the present invention, and some possible modifications to some parts of the technical solutions by those skilled in the art all represent the principles of the present invention, and fall within the protection scope of the present invention.