阅读说明：本技术 一种晶圆自动清洗装置 (Automatic wafer cleaning device ) 是由 贺贤汉 杉原一男 佐藤泰幸 原英樹 于 2021-07-28 设计创作，主要内容包括：本发明公开了一种晶圆自动清洗装置,涉及晶圆清洗技术领域,包括箱体、过滤箱、电机、底座,箱体上设有操作板,操作版下侧设有插入孔,箱体一侧固定设有过滤箱,电机输出轴固定连接有均匀排列的连接杆,连接杆上通过关节连接有摆动柱,输出轴顶端固定设有与连接杆相匹配的固定架,过滤箱通过水泵连接有水管,水管上设有水阀,水管另一端固定设有加粗管,加粗管另一端固定连接有喷淋头,加粗管内设有旋转柱,且旋转柱上均匀的设有螺旋桨,旋转柱固定连接有毛刷盘,毛刷盘上设有毛刷。本发明结构简单,便于操作,能够对晶圆自动清洗,在清洗的过程中防止吸盘对清洗后的晶圆污染,且清洗全面,能够在清洗的时候对晶圆进行刷洗,适合推广。(The invention discloses an automatic wafer cleaning device, which relates to the technical field of wafer cleaning and comprises a box body, a filter box, a motor and a base, wherein an operation plate is arranged on the box body, an insertion hole is formed in the lower side of an operation plate, the filter box is fixedly arranged on one side of the box body, uniformly-arranged connecting rods are fixedly connected with an output shaft of the motor, a swinging column is connected onto the connecting rods through joints, a fixing frame matched with the connecting rods is fixedly arranged at the top end of the output shaft, the filter box is connected with a water pipe through a water pump, a water valve is arranged on the water pipe, a thickening pipe is fixedly arranged at the other end of the water pipe, a spray head is fixedly connected to the other end of the thickening pipe, a rotating column is arranged in the thickening pipe, propellers are uniformly arranged on the rotating column, a brush disk is fixedly connected with the rotating column, and brushes are arranged on the brush disk. The wafer cleaning device is simple in structure, convenient to operate, capable of automatically cleaning wafers, capable of preventing the wafers after cleaning from being polluted by the sucker in the cleaning process, comprehensive in cleaning, capable of brushing the wafers during cleaning and suitable for popularization.)

1. An automatic wafer cleaning device comprises a box body (1), a filter box (4), a motor (8) and a base (11), and is characterized in that an operation plate (2) is arranged on the box body (1), an insertion hole (3) is formed in the lower side of the operation plate (2), the filter box (4) is fixedly arranged on one side of the box body (1), a bottom plate (5) is fixedly arranged on the inner lower surface of the box body (1), support frames (6) are fixedly arranged at four corners of the bottom plate (5), a stabilizing frame (7) is fixedly arranged on each support frame (6), the motor (8) is fixedly arranged at the center of each stabilizing frame (7), a support plate (9) is fixedly arranged at the top end of each support frame (6), a baffle ring (10) is fixedly arranged on each support plate (9), the base (11) fixed on each support plate (9) is arranged in each baffle ring (10), and drainage channels (33) are arranged on two sides of each base (11), an annular rail (12) is fixedly arranged on the upper surface of the base (11), a groove (13) is arranged on the annular rail (12), a lower electric control sucking disc (21) is fixedly arranged in the water flowing groove (33) of the base (11), an output shaft (14) of the motor (8) penetrates through the support plate (9) and the base (11) and extends to the upper part of the base (11), the output shaft (14) is fixedly connected with connecting rods (15) which are uniformly arranged, the connecting rod (15) is connected with a swing column (32) through a joint (16), a fixing frame (17) matched with the connecting rod (15) is fixedly arranged at the top end of the output shaft (14), a stable seat (35) is fixedly arranged above the swing column (32), a compression spring (36) is fixedly arranged on the stable seat (35), the other end of the compression spring (36) is fixedly connected with the fixed frame (17);

the utility model discloses a novel motor vehicle engine oil filter, including rose box (4), water pipe (18) are connected with through the water pump, be equipped with water valve (19) on water pipe (18), water pipe (18) other end is fixed to be equipped with thick pipe (24), add thick pipe (24) other end fixedly connected with shower head (20), be equipped with column spinner (25) in adding thick pipe (24), and even on column spinner (25) be equipped with screw (28), shower head (20) center department runs through and is equipped with lug (27), run through in lug (27) and be equipped with stabilizing block (26), stabilizing block (26) are fixed continuous with column spinner (25), column spinner (25) other end fixedly connected with brush dish (34), even brush (31) that are equipped with on brush dish (34).

2. The automatic wafer cleaning device as claimed in claim 1, wherein an upper electrically controlled suction cup (34) is fixedly arranged at one end of the swing post (32) far away from the output shaft.

3. The automatic wafer cleaning device according to claim 1, wherein an insertion slot (22) is detachably disposed in the insertion hole (3), a supply slot (23) is fixedly disposed in the insertion slot (22) and is matched with the upper electric control suction cup (34), a spring disc is disposed in the supply slot (23), and a wafer to be cleaned is placed on the spring disc.

4. The automatic wafer cleaning device as claimed in claim 1, wherein the number of the water pipes (18) is two, the spray header (20) of one water pipe (18) is located above the lower electrically controlled suction cup (21), the spray header (20) of the other water pipe (18) is located below the upper electrically controlled suction cup (34), and the spray headers (20) are uniformly provided with the spray holes (30) around the bump (27).

5. The automatic wafer cleaning device as claimed in claim 1, wherein the brush (31) is made of corrosion-resistant flexible material, and the brush (31) extends to the suction cups of the lower electrically-controlled suction cup (21) and the upper electrically-controlled suction cup (34).

6. The automatic wafer cleaning device according to claim 1, wherein a drain hole is formed at the bottom of the water flowing groove (33), and a pipeline connected with the drain hole is connected with the filter box (4).

7. The automatic wafer cleaning device according to claim 1, wherein the joint (16) is internally provided with a sliding block which can swing up and down, the annular track (12) is provided with a sliding block (37) in a sliding manner, and the upper part of the sliding block (37) is fixedly connected with the swing column (32).

Technical Field

The invention belongs to the technical field of wafer cleaning, and particularly relates to an automatic wafer cleaning device.

Background

The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the shape is circular; various circuit device structures can be fabricated on a silicon wafer to form an IC product with specific electrical functions. The original material of the wafer is silicon, in the manufacturing process of the wafer, the wafer cleaning is a process for removing pollutants generated by contacting with various organic matters, particles and metals in the process of continuously processing, shaping and polishing the wafer, the cleaning occupies an important ring, along with the evolution of the manufacturing process, how to fully clean the wafer becomes a difficult problem for how to protect the wafer in the cleaning process, the cost of the equipment is reduced, and the practicability of the equipment is stronger, so the invention provides the automatic wafer cleaning equipment which can clean the wafer while cleaning.

Disclosure of Invention

The invention aims to provide an automatic wafer cleaning device which is simple in structure, convenient to operate, capable of automatically cleaning wafers, capable of preventing a sucker from polluting the cleaned wafers in the cleaning process, comprehensive in cleaning, capable of brushing the wafers in the cleaning process and suitable for popularization.

The invention provides the following technical scheme: an automatic wafer cleaning device comprises a box body, a filter box, a motor and a base, wherein an operation plate is arranged on the box body, an inserting hole is formed in the lower side of an operation plate, the filter box is fixedly arranged on one side of the box body, a bottom plate is fixedly arranged on the inner lower surface of the box body, support frames are fixedly arranged at four corners of the bottom plate, a stabilizing frame is fixedly arranged on each support frame, the motor is fixedly arranged at the center of each stabilizing frame, a support plate is fixedly arranged at the top end of each support frame, a baffle ring is fixedly arranged on each support plate, a base fixed on each support plate is arranged in each baffle ring, water flowing grooves are formed in two sides of each base, an annular rail is fixedly arranged on the upper surface of each base, grooves are formed in the annular rails, a lower electric control sucking disc is fixedly arranged in each base positioned in each water flowing groove, an output shaft of the motor penetrates through the support plates and the bases to extend to the positions above the bases, and is fixedly connected with uniformly arranged connecting rods, the output shaft is fixedly provided with a fixed frame matched with the connecting rod, a stable seat is fixedly arranged above the swing column, a compression spring is fixedly arranged on the stable seat, and the other end of the compression spring is fixedly connected with the fixed frame;

the filter box is connected with the water pipe through the water pump, be equipped with the water valve on the water pipe, the water pipe other end is fixed to be equipped with thick pipe, add thick pipe other end fixedly connected with shower head, be equipped with the column spinner in adding thick pipe, and even on the column spinner be equipped with the screw, shower head center department runs through and is equipped with the lug, run through in the lug and be equipped with stable piece, stable piece is fixed continuous with the column spinner, column spinner other end fixedly connected with brush dish, the even brush that is equipped with on the brush dish.

Preferably, an upper electric control sucking disc is fixedly arranged at one end, far away from the output shaft, of the swing column.

Preferably, an insertion groove is detachably arranged in the insertion hole, a supply groove matched with the upper electric control suction disc in position is fixedly arranged in the insertion groove, a spring disc is arranged in the supply groove, and a wafer to be cleaned is placed on the spring disc.

Preferably, the number of the water pipes is two, the spray header of one water pipe is positioned above the lower electric control sucking disc, the spray header of the other water pipe is positioned below the upper electric control sucking disc, and spray holes are uniformly formed in the periphery of the spray header positioned on the convex block.

Preferably, the brush is made of corrosion-resistant flexible material, and the brush extends to the suction cups of the lower electric control suction cup and the upper electric control suction cup.

Preferably, the bottom of the running water tank is provided with a drain hole, and a pipeline connected with the drain hole is connected with the filter box.

Preferably, the joint is internally provided with a sliding block which can swing up and down, the annular track is provided with a sliding block in a sliding manner, and the upper part of the sliding block is fixedly connected with the swing column.

The invention has the beneficial effects that: simple structure, the operation of being convenient for can prevent at abluent in-process that the sucking disc from polluting the wafer after wasing to wafer self-cleaning, and wash comprehensively, can scrub wafer when wasing, specifically as follows:

(1) the invention is provided with an insertion hole, when in use, a wafer is placed into a supply groove, the insertion groove is inserted into the insertion hole and fixed, a motor operates, an output shaft starts to rotate, a connecting rod and a fixing frame rotate, a sliding block on a swinging column moves on an annular track, when the swinging column drives an upper electric control sucking disc to move to the upper part of the wafer, the upper electric control sucking disc sucks the wafer, when the upper electric control sucking disc moves the wafer to a spray head, the wafer is cleaned, after the cleaning is finished, the output shaft continues to rotate, when the sliding block rotates to a groove on the annular track, the sliding block slides into the groove and drives the swinging column to sink under the pushing of a compression spring, when the sliding block slides to the bottommost end of the groove, the swinging column drives the upper electric control sucking disc to move to the lower part of the lower electric control sucking disc, the upper electric control sucking disc releases the wafer, the lower electric control sucking disc sucks the wafer and cleans the other surface of the wafer, the wafer can be cleaned more comprehensively.

(2) The water flow cleaning device is provided with the spray header, when a water valve on the water pipe is opened, the water pipe passes through water flow, when the water flow passes through the thickening pipe, the propeller rotates under the action of the water flow to drive the rotating column to rotate, the rotating column realizes stable rotation on the spray header through the stabilizing block, the rotating column drives the brush disc to rotate, the water flow is sprayed out through the spray holes, and meanwhile, the brush rotates on the cleaning surface of a wafer, so that the cleaning is realized during spraying.

(3) The invention is provided with a water flowing groove, when the spray head sprays water for washing, the cleaning wastewater flows into the water flowing groove, a drain hole is arranged at the bottom of the water flowing groove, a pipeline connected with the drain hole is connected with a filter box, the filter box filters the wastewater, and the filtered water is guided into a water pipe through a water pump for recycling the water source.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:

FIG. 1 is an overall schematic view of the present invention;

FIG. 2 is an internal schematic view of the present invention;

FIG. 3 is a schematic view of a showerhead of the present invention;

FIG. 4 is a cross-sectional view of a showerhead of the present invention;

FIG. 5 is an enlarged view of the invention at A;

labeled as: 1 box body, 2 operating boards, 3 inserting holes, 4 filter boxes, 5 bottom boards, 6 supporting frames, 7 stabilizing frames, 8 motors, 9 supporting boards, 10 baffle rings, 11 bases, 12 circular tracks, 13 grooves, 14 output shafts, 15 connecting rods, 16 joints, 17 fixing frames, 18 water pipes, 19 water valves, 20 spray headers, 21 lower electric control suction cups, 22 inserting grooves, 23 supply grooves, 24 thickening pipes, 25 rotating columns, 26 stabilizing blocks, 27 convex blocks, 28 propellers, 29 hairbrush discs, 30 spray holes, 31 hairbrushes, 32 swinging columns, 33 water flowing grooves, 34 upper electric control suction cups, 35 stabilizing seats, 36 compression springs and 37 sliding blocks.

Detailed Description

The invention will be further illustrated with reference to the following specific examples. These examples are intended to illustrate the invention and are not intended to limit the scope of the invention. In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted", "provided" and "connected" are to be interpreted broadly, e.g. as a fixed connection, a detachable connection or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

The structural features of the present invention will now be described in detail with reference to the accompanying drawings.

Referring to fig. 1-2, an automatic wafer cleaning device comprises a box body 1, a filter box 4, a motor 8 and a base 11, wherein an operation panel 2 is arranged on the box body 1, the device is operated through the operation panel 2, the operation state of the device is observed, an insertion hole 3 is arranged at the lower side of the operation panel 2, a placing space of an insertion groove 22 is provided through the insertion hole 3, the insertion groove 22 is fixed, the filter box 4 is fixedly arranged at one side of the box body 1, cleaning liquid is supplied to a water pipe 18 through the filter box 4, waste water flowing into a water channel 33 is filtered, a bottom plate 5 is fixedly arranged at the lower surface in the box body 1, the ground is supported through a plurality of bottom plates 5, support frames 6 are fixedly arranged at four corners of the bottom plate 5, the cleaning device is supported through the support frames 6, stabilizing frames 7 are fixedly arranged on the support frames 6, and the motor 8 is fixed through the stabilizing frames 7, the influence factors such as violent vibration and the like on the device in the running process are prevented, the motor 8 is fixedly arranged at the center of the stabilizing frame 7, driven by a motor 8, the top end of the support frame 6 is fixedly provided with a support plate 9, the cleaning device at the upper part is supported by the support plate 9, the support plate 9 is fixedly provided with a baffle ring 10, the cleaning liquid is prevented from splashing out in the cleaning process by the baffle ring 10, a base 11 fixed on the supporting plate 9 is arranged in the baffle ring 10, the annular track 12 is supported by the base 11, meanwhile, the baffle ring 10 is matched to form a water flowing groove 33, the water flowing grooves 33 are arranged at two sides of the base 11, waste liquid is contained and discharged through the water flowing grooves 33, meanwhile, the running space of the spray header 20 and the lower electric control suction cup 21 is provided, the upper surface of the base 11 is fixedly provided with an annular rail 12, and the movement track of the sliding block 37 is provided through the annular rail 12.

Referring to fig. 5, a groove 13 is formed in the circular track 12, the slider 37 sinks through the groove 13, and the swing post 32 is driven to sink by the pushing of the compression spring 36, the lower electrically controlled suction cup 21 is fixedly disposed in the water flowing groove 33 of the base 11, and the wafer released from the upper electrically controlled suction cup 34 is sucked by the lower electrically controlled suction cup 21.

Referring to fig. 2, an output shaft 14 of the motor 8 penetrates through the support plate 9 and the base 11 and extends to the upper side of the base 11, transmission is performed through the output shaft 14, the output shaft 14 is fixedly connected with connecting rods 15 which are uniformly arranged, the connecting rods 15 are connected with swing columns 32 through joints 16, the upper electric control suction cups 34 are fixed through the swing columns 32 and can swing up and down, a fixing frame 17 matched with the connecting rods 15 is fixedly arranged at the top end of the output shaft 14, and compression springs 36 are fixed through the fixing frame 17.

Referring to fig. 5, a stabilizing base 35 is fixedly arranged above the swing post 32, a compression spring 36 is fixed by the stabilizing base, so that the thrust of the compression spring 36 acts on the swing post 32, the compression spring 36 is fixedly arranged on the stabilizing base 35, the other end of the compression spring 36 is fixedly connected with the fixed frame 17, a sliding block 37 is tightly attached to the annular rail 12 by the thrust provided by the compression spring 36, and the auxiliary sliding block 37 sinks the swing post 32 when sliding to the groove 13, so as to drive the upper electric control suction cup 34 to sink.

Referring to fig. 2-4, the filter box 4 is connected with a water pipe 18 through a water pump, cleaning liquid circulates through the water pipe 18, the water pipe 18 is provided with a water valve 19, the release and blocking of the cleaning liquid in the water pipe 18 are realized through the water valve 19, the other end of the water pipe 18 is fixedly provided with a thickening pipe 24, a movement space between a rotating column 25 and a propeller 28 is provided through the thickening pipe 24, the other end of the thickening pipe 24 is fixedly connected with a spray header 20, the cleaning liquid is sprayed through the spray header 20, the thickening pipe 24 is internally provided with a rotating column 25, the rotating column 25 fixes the rotating column 25, the rotating column 25 is connected with a stabilizing block 28 and a brush disc 34, the propeller 28 is uniformly arranged on the rotating column 25, the rotating column 28 rotates when water flows through the thickening pipe 24 to drive the rotating column 25 to rotate, a projection 27 penetrates through the center of the spray header 20, the projection 27 provides a movement space for the stabilizing block 26, the wafer surface cleaning device is characterized in that the wafer surface cleaning device can rotate in a protruding block 27, a stabilizing block 26 penetrates through the protruding block 27, the rotating block 26 rotates in the boss 27, the rotating column 25 is limited, the stabilizing block 26 is fixedly connected with the rotating column 25, a brush disc 34 is fixedly connected to the other end of the rotating column 25, the brush 31 is fixed through the brush disc 34, the brush 31 is uniformly arranged on the brush disc 34, and the wafer surface is cleaned through the brush 31.

Referring to fig. 2, an upper electric control suction cup 34 is fixedly arranged at one end of the swing post 32 far from the output shaft, and the wafer is grabbed by the upper electric control suction cup 34, cleaned by the shower head 20, released by the lower electric control suction cup 21 and grabbed again after the wafer is cleaned.

Referring to fig. 1-2, an insertion groove 22 is detachably disposed in the insertion hole 3, a supply groove 23 is inserted into a designated position through the insertion groove and is fixed, a supply groove 23 whose position matches with that of the upper electric control chuck 34 is fixedly disposed in the insertion groove 22, wafers are accommodated through the supply groove 23, a spring plate is disposed in the supply groove 23, a wafer to be cleaned is placed on the spring plate, the wafer is accommodated through the spring plate, and after each wafer is sucked, the next wafer is accommodated so as to match with the position of the upper electric control chuck 34.

Referring to fig. 2, there are two water pipes 18, the shower head 20 of one water pipe 18 is located above the lower electrically controlled chuck 21 to clean the wafer sucked by the lower electrically controlled chuck 21, the shower head 20 of the other water pipe 18 is located below the upper electrically controlled chuck 34 to clean the wafer sucked by the upper electrically controlled chuck 21, and the shower heads 20 are evenly provided with spray holes 30 around the bumps 27.

Referring to fig. 3, the brush 31 is made of a corrosion-resistant flexible material so that it does not damage the wafer during the rinsing process and has corrosion resistance to the cleaning solution, and the brush 31 extends to the suction pads of the lower and upper electrically controlled suction pads 21 and 34 so that it can perform a spin-scrubbing process on the surface of the wafer while being rotated by the brush pad 29.

Referring to fig. 1-2, the bottom of the water flowing tank 33 is provided with a water discharging hole, a pipeline connected with the water discharging hole is connected with the filtering tank 4, the wastewater in the water flowing tank 33 can be discharged in time, meanwhile, the wastewater flows into the filtering tank 4, is filtered by the filtering tank 4, and enters the water pipe 18 through the water pump for reuse after the filtering is finished, so that the water circulation is realized.

Referring to fig. 2, a sliding block 37 is arranged in the joint 16 and slides up and down, the sliding block 37 moves on the circular track 12 to limit the position of the sliding block 37 on the circular track 12, and the upper part of the sliding block 37 is fixedly connected with the swing column 32, so that the swing column 32 can move up and down along with the sliding block 37 when the sliding block 37 moves on the circular track 12.

The automatic wafer cleaning device is simple in structure and convenient to operate, can automatically clean wafers, prevents the wafers after cleaning from being polluted by the suckers in the cleaning process, is complete in cleaning, can scrub the wafers in the cleaning process, and is suitable for popularization.

Specifically, referring to fig. 1-2, when in use, a wafer is placed into the supply groove 23, the insertion groove 22 is inserted into the insertion hole 3 and fixed, the motor 8 operates, the output shaft 14 starts to rotate, the connecting rod 15 and the fixing frame 17 rotate, the sliding block 37 on the swing post 32 moves on the circular track 12, when the swing post 32 drives the upper electric control suction cup 34 to move to the upper side of the wafer, the upper electric control suction cup 34 sucks the wafer, after each wafer is sucked, the next wafer is supported to be matched with the position of the upper electric control suction cup 34, when the upper electric control suction cup 24 moves the wafer to the position of the spray head 20, cleaning is performed, after cleaning, the output shaft 14 continues to rotate, when the wafer rotates to the groove 13 on the circular track 12, the sliding block 37 slides into the groove 13, and the swing post 32 is driven by the compression spring 36 to sink, so that the electric control suction cup 21 is driven to sink, when the slide block 37 slides to the bottom end of the groove 13, the swing column 32 drives the upper electric control suction disc 34 to move to the position right below the lower electric control suction disc 21, the upper electric control suction disc 34 releases the wafer, the lower electric control suction disc 21 sucks the wafer, the other side of the wafer is cleaned, the wafer is cleaned more comprehensively, after the cleaning is finished, the next upper electric control suction disc 34 grabs the wafer, the insertion groove 22 is taken out and placed into the cleaned insertion groove 22, and the upper electric control suction disc 34 is placed into the cleaned supply groove 23 after the cleaning is finished;

referring to fig. 3-4, when the shower head 20 is used, after the water valve 19 on the water pipe 18 is opened, the water pipe 18 passes through water flow, when the water flow passes through the thickening pipe 24, the propeller 28 rotates under the action of the water flow to drive the rotary column 25 to rotate, the rotary column 25 realizes stable rotation on the shower head 20 through the stabilizing block 26, the rotary column 25 drives the brush disc 29 to rotate, so that the water flow is sprayed out through the spray holes 30, the brush 31 rotates on the cleaning surface of the wafer to realize washing during spraying, and the shower head 20 is simultaneously responsible for washing the suction disc on the upper electric control suction disc 34.

Referring to fig. 2, in the using process of the shower head 20, when the shower head 20 sprays water for washing, the washing wastewater flows into the water flowing tank 33 and passes through the water discharging hole arranged at the bottom of the water flowing tank 33, the pipeline connected with the water discharging hole is connected with the filtering box 4, the filtering box 4 filters the wastewater, and the wastewater enters the water pipe 18 through the water pump to be reused after being filtered, so that the wastewater is recycled in the device.

In the operation process of the device, after the device is started, the motor 8 operates to drive the upper electric control suction cups 34 to the wafer dragged and dropped by the supply groove 23, the electric control system on the upper electric control suction cups 34 operates to grab the wafer, the motor 8 stops when each upper electric control suction cup 34 moves to the spray header 20 in the water flowing groove 33, the water valves 19 of the spray headers 20 are controlled to be opened, the wafer or the suction cups on the upper electric control suction cups 34 are cleaned, after the wafer is cleaned, the wafer is sucked again through the upper electric control suction cups 34 to move to the designated position, and automation is achieved.

Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.