阅读说明：本技术 一种集成电路制造光源优化方法及电子设备 (Integrated circuit manufacturing light source optimization method and electronic equipment ) 是由 闫歌 丁明 于 2020-11-20 设计创作，主要内容包括：本发明涉及集成电路制造技术领域,尤其涉及集成电路制造光源优化方法及电子设备,所述方法包括如下步骤：S1、提供初始光源；S2、根据初始光源的光源强度分布进行区域分割以获得多个子光源区域；S3、提供至少两种匹配图形,将至少两种匹配图形分别与每个子光源区域进行匹配以获得与每个子光源区域对应的至少两个匹配结果；S4、基于至少两个匹配结果分别与每个子光源区域进行计算以获得与每个子光源区域对应的最佳匹配图形；及S5、基于与每个子光源区域对应的最佳匹配图形生成待优化光源。用匹配图形与分割的子光源区域进行匹配能很好的提高待优化光源的光源强度集中度,同时使得光源形状更加理想,更好的获得满足用户需求的光源。(The invention relates to the technical field of integrated circuit manufacturing, in particular to an integrated circuit manufacturing light source optimization method and electronic equipment, wherein the method comprises the following steps: s1, providing an initial light source; s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions; s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; s4, respectively calculating with each sub light source area based on at least two matching results to obtain the best matching pattern corresponding to each sub light source area; and S5, generating the light source to be optimized based on the optimal matching pattern corresponding to each sub light source area. The matching of the matching graph and the divided sub-light source areas can well improve the light source intensity concentration of the light source to be optimized, meanwhile, the shape of the light source is more ideal, and the light source meeting the requirements of users can be obtained better.)

1. An optimization method for manufacturing a light source by an integrated circuit, which is characterized by comprising the following steps:

s1, providing an initial light source;

s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions;

s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region;

s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; and

and S5, generating the light source to be optimized based on the optimal matching pattern corresponding to each sub light source area.

2. The integrated circuit fabrication light source optimization method of claim 1, wherein: the integrated circuit manufacturing light source optimization method further comprises the following steps:

and S6, optimizing the light source to be optimized by using a light source optimization algorithm.

3. The integrated circuit fabrication light source optimization method of claim 1, wherein: the integrated circuit manufacturing light source optimization method further comprises the following steps:

s20, pixelating the initial light source, setting a light source intensity threshold, removing light source pixel points lower than the light source intensity threshold, and simultaneously removing isolated light source pixel points;

the step S20 is between the step S1 and the step S2.

4. The integrated circuit fabrication light source optimization method of claim 1, wherein: in the above step S3, the at least two matching results include shape parameters for each matching figure.

5. The method of optimizing an integrated circuit manufacturing light source of claim 4, wherein: the step S4 includes the following steps:

s41, generating a corresponding shape based on the shape parameters of each matching graph and filling the shape with light source intensity values;

and S42, calculating to obtain a matching parameter based on the shape parameter and the light source intensity value in the step S41 and the initial light source, and determining the optimal matching graph according to the matching parameter.

6. The method of optimizing an integrated circuit manufacturing light source of claim 5, wherein: in the above step S42, the matching calculation is performed based on the normalization method, and the matching parameter R is_{ccoeff_normed}The calculation formula of (a) is as follows:

in the formula:

t ' (x ', y ') is the light source intensity value of the initial light source at the point x ', y '; i ' (x ', y ') is the light source intensity value at the point x ', y ' of the matching pattern corresponding to each matching result.

7. The method of optimizing an integrated circuit manufacturing light source of claim 5, wherein: in the above step S5, the best matching patterns are re-stitched in order to obtain the light source to be optimized.

8. The integrated circuit fabrication light source optimization method of claim 1, wherein: in step S3, the at least two matching patterns include regular polygons or irregular polygons, the regular polygons include one or more of circles, rectangles, and sectors, and the irregular polygons include one or more of leaf shapes, zigzag shapes, and N shapes.

9. A method for optimizing a light source for integrated circuit fabrication as recited in claim 3, wherein: in step S2, the rule of region division is: and (3) dividing light source pixel points with light source intensity values at 8 pixel positions around each pixel into the same group.

10. An electronic device, characterized in that: comprising one or more processors;

a storage device for storing one or more programs,

when executed by the one or more processors, cause the one or more processors to implement the integrated circuit fabrication light source optimization method of claim 1.

[ technical field ] A method for producing a semiconductor device

The invention relates to the technical field of integrated circuit manufacturing, in particular to an integrated circuit manufacturing light source optimization method and electronic equipment.

[ background of the invention ]

Photolithography is one of the key technologies in the manufacture of very large scale integrated circuits. Under the condition that the exposure wavelength and the numerical aperture of the photoetching machine are fixed, a resolution enhancement technology is required to reduce process factors and improve photoetching resolution. The light source optimization technology is an important resolution enhancement technology, has higher degree of freedom compared with the traditional resolution enhancement technology such as an optical proximity correction technology, has the advantages of low cost and high implementation speed, and is a key technology for further improving the photoetching resolution and the process window.

The light source optimization methods currently under study include a genetic algorithm-based light source mask optimization method, a particle swarm-based light source optimization algorithm, a linear programming-based light source optimization method, and the like. However, due to the limitation of practical production technologies, the light source intensity is not concentrated enough sometimes, so that an ideal optimization effect cannot be achieved, and a desired light source shape cannot be obtained.

[ summary of the invention ]

The invention provides an integrated circuit manufacturing light source optimization method and electronic equipment, aiming at overcoming the technical problem that light source distribution is not concentrated when the light source is optimized at present.

In order to solve the above technical problems, the present invention provides a technical solution: an integrated circuit manufacturing light source optimization method, comprising the steps of: s1, providing an initial light source; s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions; s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; and S5, generating the light source to be optimized based on the optimal matching pattern corresponding to each sub light source area.

Preferably, the integrated circuit manufacturing light source optimization method further comprises the following steps: and S6, optimizing the light source to be optimized by using a light source optimization algorithm.

Preferably, the integrated circuit manufacturing light source optimization method further comprises the following steps: s20, pixelating the initial light source, setting a light source intensity threshold, removing light source pixel points lower than the light source intensity threshold, and simultaneously removing isolated light source pixel points; the step S20 is between the step S1 and the step S2.

Preferably, in the above step S3, the at least two matching results include shape parameters for each matching figure.

Preferably, the step S4 includes the steps of: s41, generating a corresponding shape based on the shape parameters of each matching graph and filling the shape with light source intensity values; and S42, calculating to obtain a matching parameter based on the shape parameter and the light source intensity value in the step S41 and the initial light source, and determining the optimal matching graph according to the matching parameter.

Preferably, in the step S42, the matching calculation is performed based on a normalization method, and the matching parameter R is_{ccoeff_normed}The calculation formula of (a) is as follows:

in the formula: t ' (x ', y ') is the light source intensity value of the initial light source at the point x ', y '; i ' (x ', y ') is the light source intensity value at the point x ', y ' of the matching pattern corresponding to each matching result.

Preferably, in the above step S5, the best matching patterns are re-stitched in order to obtain the light source to be optimized.

Preferably, in step S3, the at least two matching patterns include regular polygons or irregular polygons, the regular polygons include one or more of circles, rectangles and sectors, and the irregular polygons include one or more of leaf shapes, zigzag shapes and N shapes.

Preferably, in step S2, the rule of region division is: and (3) dividing light source pixel points with light source intensity values at 8 pixel positions around each pixel into the same group.

In order to solve the above technical problem, the present invention also provides an electronic device, which includes one or more processors; storage means for storing one or more programs which, when executed by the one or more processors, cause the one or more processors to carry out the method as described above.

Compared with the prior art, the integrated circuit manufacturing light source optimization method and the electronic equipment provided by the invention have the following beneficial effects that the method comprises the following steps: s1, providing an initial light source; s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions; s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; s5, generating a light source to be optimized based on the optimal matching pattern corresponding to each sub light source region, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; and respectively calculating with each sub light source region based on the at least two matching results to obtain an optimal matching pattern corresponding to each sub light source region, wherein the provided matching pattern has the characteristics of concentrated light source intensity distribution and ideal light source shape, the light source intensity concentration ratio of the light source to be optimized can be well improved by matching with the segmented sub light source regions, meanwhile, the light source shape is more ideal, the light source meeting the user requirements can be better obtained, and the light source quality is improved.

The integrated circuit manufacturing light source optimization method further comprises the following steps:

s20, pixelating the initial light source, setting a light source intensity threshold value, removing light source pixel points lower than the light source intensity threshold value, and simultaneously removing isolated light source pixel points, so that the light source can be well centralized, meanwhile, an effective light source area needing to be optimized can be well obtained, the light source optimization efficiency is improved, and meanwhile, the light source concentration ratio is improved.

The electronic equipment provided by the invention has the same beneficial effects as the method.

[ description of the drawings ]

FIG. 1 is a flow chart of a method for optimizing an integrated circuit manufacturing light source according to a first embodiment of the present invention;

FIG. 2 is a schematic diagram of an initial light source provided in the method for optimizing an integrated circuit manufacturing light source according to the first embodiment of the present invention;

FIG. 3 is an isolated schematic diagram of a region N of FIG. 2 in a method for optimizing an integrated circuit manufacturing light source according to a first embodiment of the present invention;

FIG. 4 is a flow chart of a method for optimizing an integrated circuit manufacturing light source provided in a variation of the first embodiment of the present invention;

fig. 5 is a schematic diagram of the distribution of light sources after step S20 is performed in the method for optimizing light sources in the manufacture of integrated circuits provided in the variation of the first embodiment of the present invention;

fig. 6 is a schematic diagram of the light source distribution divided into 8 regions after step S20 is performed in the integrated circuit manufacturing light source optimization method provided in the variation of the first embodiment of the present invention;

FIG. 7 is a schematic diagram of the shape of the first embodiment of the present invention after fan-matching the first region and after the light source intensity is filled after the pattern is regenerated based on the shape parameters;

FIG. 8 is a schematic diagram of the shape of the first embodiment of the present invention after the light source intensity is filled after the first region is rectangular-matched and the pattern is regenerated according to the shape parameters;

FIG. 9 is a schematic diagram of the shape of the first embodiment of the present invention after the light source intensity is filled after the first region is matched with a circle and the pattern is regenerated according to the shape parameters;

FIG. 10 is a detailed flowchart of step S4 in the method for optimizing light source for manufacturing integrated circuit according to the first embodiment of the present invention;

fig. 11 is a schematic diagram of the light source to be optimized generated after step S5 is performed in the first embodiment;

fig. 12 is another schematic diagram of the light source to be optimized generated after step S5 is performed in the first embodiment;

FIG. 13 is a flow chart of a variation of the method for optimizing an integrated circuit manufacturing light source according to the first embodiment of the present invention;

fig. 14 is a block diagram of an electronic device provided in a second embodiment of the present invention;

FIG. 15 is a schematic block diagram of a computer system suitable for use with a server implementing an embodiment of the invention.

[ detailed description ] embodiments

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

Referring to fig. 1, a first embodiment of the invention provides a method for optimizing a light source for integrated circuit manufacturing, comprising the following steps:

s1, providing an initial light source;

s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions;

s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region;

s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; and

and S5, generating the light source to be optimized based on the optimal matching pattern corresponding to each sub light source area.

Referring to fig. 2, the initial light source may be optimized without any optimization method or after being primarily optimized by a conventional light source optimization method. In fig. 2, the horizontal axis represents the x-coordinate and the vertical axis represents the y-coordinate. The color at the corresponding coordinate location corresponds to the color value bar pattern on the right side. The right side is a color chart of the intensity values of the light source, the more red the color is, the more blue the color is, and the lower the intensity is, and hereinafter, for convenience of describing steps, the coordinate axis and the intensity color chart are not shown, and both are the same as fig. 2. It should be noted that: since the black-and-white drawing cannot well show the shade of the color, and cannot visually represent the light source intensity value, fig. 2 is only an example, and cannot actually show the representation of the actual light source intensity value of the initial light source, in the black-and-white view, the black represents that the light source intensity value is 0, and the light source intensity value is greater than 0 for a color with a lighter black. In order to better illustrate the condition of the light source intensity value in fig. 2, a small area N in fig. 2 is taken out for labeling the light source intensity value, as shown in fig. 3 corresponding to the area N. The light source intensity values are as follows: from first row to second row and each row from left to right as follows:

0.08，0.00，0.00，0.08；

0.90，0.95，0.95，0.90。

the traditional light source optimization methods are available, and include a genetic algorithm-based light source mask optimization method, a particle swarm-based light source optimization algorithm, a linear programming-based light source optimization method and the like.

Referring to fig. 4, a method for optimizing a light source for integrated circuit manufacturing further includes the following steps:

s20, pixelating the initial light source, setting a light source intensity threshold, removing light source pixel points lower than the light source intensity threshold, and simultaneously removing isolated light source pixel points; the step S20 is between the step S1 and the step S2.

In step S20, the light source pixels below the light source intensity threshold and the isolated light source pixels are removed, so that the concentration of the light source can be improved well, and a suitable light source can be obtained better in the light source optimization process. The specific light source intensity threshold may be set according to the user's requirement, such as 0.1, 0.2, 0.3, etc. As shown in fig. 5, the light source intensity threshold is 0.1, and the schematic diagram after removing the isolated light source pixel points.

In step S2, region division is performed according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions.

Referring to fig. 6, in this step, the specific region segmentation rule is: and (3) dividing light source pixel points with light source intensity values at 8 pixel positions around each pixel into the same group. Specifically, the 8 pixel positions specifically include up, down, left, right, upper left, lower right, and upper right. As an example, the initial light source is divided to include 8 sub-light source regions, specifically, region 1, region 2, region 3, region 4, region 5, region 6, region 7, and region 8. Corresponding to the reference numerals 1, 2, 3, 4, 5, 6, 7, 8 in fig. 6.

After the initial light source is divided, the pixels of each sub-light source region may be subjected to uniform pixel values, or the original light source intensity value may be retained.

In the step S3, at least two kinds of matching patterns are provided, and the at least two kinds of matching patterns are respectively matched with each sub light source region to obtain at least two matching results corresponding to each sub light source region. The at least two matching patterns comprise regular polygons or irregular polygons, the regular polygons comprise one or more of shapes of circles, rectangles, sectors and the like, and the irregular polygons comprise one or more of shapes of leaf shapes, zigzag shapes, N shapes and the like.

The at least two matching results include shape parameters for each matching figure. Such as: the shape parameters of the fan shape comprise an inner radius r1, an outer radius r2, an angle a1 and an angle a2, wherein the inner radius and the outer radius are calculated by taking a (0,0) coordinate point as a circle center; the shape parameters of the rectangle are a lower left abscissa x1, a lower left ordinate y1, an upper right abscissa x2, an upper right ordinate y2, an upper left abscissa x3, an upper left ordinate y3, a lower right abscissa x4 and a lower right ordinate y 4; the shape parameters of the circle are the coordinates (x, y) of the center of the circle and the radius r.

Referring to fig. 7, 8 and 9, after the sector, rectangle and circle are respectively demapped with the region 1, corresponding shape parameters are obtained, and the corresponding shape is regenerated by the shape parameters, and the intensity value of the filling light source is 1 in the shape. The shape in fig. 7 is different from the fan shape in some degree, and is mainly determined by the resolution. If the resolution is increased, a strict fan shape will be obtained. The circular area in fig. 9 also appears to be square-like in shape due to the lower resolution of the picture.

In the above step S4, a calculation is performed with each of the sub light source regions based on the at least two matching results to obtain a best matching pattern corresponding to each of the sub light source regions.

The at least two matching results are shape parameters corresponding to each matching pattern.

Referring to fig. 10, the step S4 includes the following steps:

s41, generating a corresponding shape based on the shape parameters of each matching graph and filling the shape with light source intensity values;

and S42, calculating to obtain a matching parameter based on the shape parameter and the light source intensity value in the step S41 and the initial light source, and determining the optimal matching graph according to the matching parameter.

In the above step S41, the light source intensity values filled in the shapes may be the same value for each shape fill. Alternatively, different values may be filled according to some filling rules.

In the above step S42, there are many methods for calculating and matching, and no specific limitation is made. The following provides a way of performing a matching calculation based on the normalization method, the matching parameter R_{ccoeff_normed}The calculation formula of (a) is as follows:

in the formula: t ' (x ', y ') is the light source intensity value of the initial light source at the point x ', y '; i ' (x ', y ') is the light source intensity value at the point x ', y ' of the matching pattern corresponding to each matching result.

After the calculation is finished, the matching parameters of each matching pattern are obtained, and the matching pattern with a larger matching parameter value is selected as the best matching pattern.

Referring to fig. 11, after obtaining the best matching pattern for each sub-light source region, in step S5, the light source to be optimized is generated based on the best matching pattern corresponding to each sub-light source region. That is, the best matching patterns of each sub-light source region are sequentially re-spliced to obtain the light source to be optimized. Shown in fig. 11 is an image of the same resolution as the original source layout, with a coordinate point spacing of 0.625.

Referring to fig. 12, generally, different users have different requirements for the resolution of the image, and the image in fig. 12 shows the result of image display after increasing the resolution, and the coordinate point interval is 0.1.

Referring to fig. 13, the method for optimizing the light source for integrated circuit manufacturing further includes the following steps:

and S6, optimizing the light source to be optimized by using a light source optimization algorithm. In this step, the light source optimization algorithm is an existing light source optimization algorithm, and includes a genetic algorithm-based light source mask optimization method, a particle swarm-based light source optimization algorithm, a linear programming-based light source optimization method, and the like.

Referring to fig. 14, a second embodiment of the invention provides an electronic device 300, which includes one or more processors 301;

a storage device 302 for storing one or more programs,

when executed by the one or more processors 301, the one or more programs cause the one or more processors 301 to implement the integrated circuit manufacturing light source optimization method as provided in the first embodiment or its modified embodiments.

Referring now to FIG. 15, a block diagram of a computer system 800 suitable for use with a terminal device/server implementing an embodiment of the present invention is shown. The terminal device/server shown in fig. 15 is only an example, and should not bring any limitation to the functions and the scope of use of the embodiments of the present application.

As shown in fig. 15, the computer system 800 includes a Central Processing Unit (CPU)801 that can perform various appropriate actions and processes in accordance with a program stored in a Read Only Memory (ROM)802 or a program loaded from a storage section 808 into a Random Access Memory (RAM) 803. In the RAM 803, various programs and data necessary for the operation of the system 800 are also stored. The CPU 801, ROM 802, and RAM 803 are connected to each other via a bus 804. An input/output (I/O) interface 805 is also connected to bus 804.

The following components are connected to the I/O interface 805: an input portion 806 including a keyboard, a mouse, and the like; an output section 807 including a signal such as a Cathode Ray Tube (CRT), a Liquid Crystal Display (LCD), and the like, and a speaker; a storage portion 808 including a hard disk and the like; and a communication section 809 including a network interface card such as a LAN card, a modem, or the like. The communication section 809 performs communication processing via a network such as the internet. A drive 810 is also connected to the I/O interface 805 as necessary. A removable medium 811 such as a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, or the like is mounted on the drive 810 as necessary, so that a computer program read out therefrom is mounted on the storage section 808 as necessary.

According to an embodiment of the present disclosure, the processes described above with reference to the flowcharts may be implemented as computer software programs. For example, embodiments of the present disclosure include a computer program product comprising a computer program embodied on a computer readable medium, the computer program comprising program code for performing the method illustrated in the flow chart. In such an embodiment, the computer program can be downloaded and installed from a network through the communication section 809 and/or installed from the removable medium 811. The computer program performs the above-described functions defined in the method of the present invention when executed by the Central Processing Unit (CPU) 801. It should be noted that the computer readable medium of the present invention can be a computer readable signal medium or a computer readable storage medium or any combination of the two. A computer readable storage medium may be, for example, but not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any combination of the foregoing. More specific examples of the computer readable storage medium may include, but are not limited to: an electrical connection having one or more wires, a portable computer diskette, a hard disk, a Random Access Memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing.

Computer program code for carrying out operations for aspects of the present application may be written in any combination of one or more programming languages, including an object oriented programming language such as Java, Smalltalk, C + + or the like and conventional procedural programming languages, such as the "C" programming language or similar programming languages. The program code may execute entirely on the user's computer, partly on the user's computer, as a stand-alone software package, partly on the user's computer and partly on a remote computer or entirely on the remote computer or server. In the case of a remote computer, the remote computer may be connected to the user's computer through any type of network, including a Local Area Network (LAN) or a Wide Area Network (WAN), or the connection may be made to an external computer (for example, through the Internet using an Internet service provider).

The flowchart and block diagrams in the figures illustrate the architecture, functionality, and operation of possible implementations of systems, methods and computer program products according to various embodiments of the present invention. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s). It should also be noted that, in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved. It will also be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.

The computer readable medium carries one or more programs which, when executed by the apparatus, cause the apparatus to perform the steps of: s1, providing an initial light source; s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions; s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; s5, generating a light source to be optimized based on the optimal matching graph corresponding to each sub light source area; and

and S6, optimizing the light source to be optimized by using a light source optimization algorithm.

Compared with the prior art, the integrated circuit manufacturing light source optimization method and the electronic equipment provided by the invention have the following beneficial effects that the method comprises the following steps: s1, providing an initial light source; s2, performing region division according to the light source intensity distribution of the initial light source to obtain a plurality of sub light source regions; s3, providing at least two matching patterns, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; s4, respectively calculating with each sub light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub light source region; s5, generating a light source to be optimized based on the optimal matching pattern corresponding to each sub light source region, and respectively matching the at least two matching patterns with each sub light source region to obtain at least two matching results corresponding to each sub light source region; and respectively calculating with each sub light source area based on the at least two matching results to obtain an optimal matching graph corresponding to each sub light source area, wherein the provided matching graph has the characteristics of concentrated light source intensity distribution and ideal light source shape, the light source intensity concentration ratio of the light source to be optimized can be well improved by matching with the divided sub light source areas, meanwhile, the light source shape is more ideal, and the light source meeting the user requirements can be better obtained.

The integrated circuit manufacturing light source optimization method further comprises the following steps:

s20, pixelating the initial light source, setting a light source intensity threshold value, removing light source pixel points lower than the light source intensity threshold value, and simultaneously removing isolated light source pixel points, so that the light source can be well centralized, meanwhile, an effective light source area needing to be optimized can be well obtained, the light source optimization efficiency is improved, and meanwhile, the light source concentration ratio is improved.

The electronic equipment provided by the invention has the same beneficial effects as the method.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit of the present invention are intended to be included within the scope of the present invention.