阅读说明：本技术 一种高透型低辐射镀膜玻璃及其制备工艺 (High-transmittance low-emissivity coated glass and preparation process thereof ) 是由 魏伟兴 于 2020-12-07 设计创作，主要内容包括：本发明公开了一种高透型低辐射镀膜玻璃及其制备工艺,所述低辐射镀膜玻璃包括由下至上层叠设置的玻璃基片、第一介质膜、功能膜、外层介质膜,所述第一介质膜由氧化锡层、二氧化钛层组成,所述外层介质膜由氧化锌层、硅铝合金层组成,所述功能膜各组分原料如下,按重量份数计,包括聚苯乙烯、苯酚、4-氯硝基苯、抗紫外线防老剂、粘结剂、增塑剂、分散剂。聚苯丙烯薄膜具有高度的透明性,加工方便,成本低廉,并且在焚烧时时不会散发出有毒的氯化氢等气体,用在玻璃薄膜上时能够提玻璃的高透明性能和耐水性能,保证可见光透过率,掺杂聚苯酚,可以提高薄膜的耐磨和耐腐蚀性能,进而提高玻璃的可见光透过率的效果。(The invention discloses high-transmittance low-radiation coated glass and a preparation process thereof, wherein the low-radiation coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top, the first dielectric film comprises a tin oxide layer and a titanium dioxide layer, the outer dielectric film comprises a zinc oxide layer and a silicon-aluminum alloy layer, and the functional film comprises the following raw materials in parts by weight, including polystyrene, phenol, 4-chloronitrobenzene, an anti-ultraviolet anti-aging agent, a binder, a plasticizer and a dispersing agent. The polyphenyl propylene film has high transparency, is convenient to process and low in cost, does not emit toxic gases such as hydrogen chloride and the like during incineration, can improve the high transparency and the water resistance of glass when used on a glass film, ensures the visible light transmittance, can improve the wear resistance and the corrosion resistance of the film by doping polyphenol, and further improves the effect of the visible light transmittance of the glass.)

1. A high-transmittance low-radiation coated glass is characterized in that: the low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

2. The high-transmittance low-emissivity coated glass according to claim 1, wherein: the first dielectric film is composed of a tin oxide layer and a titanium dioxide layer, and the glass substrate, the tin oxide layer and the titanium dioxide layer are stacked from bottom to top.

3. The high-transmittance low-emissivity coated glass according to claim 1, wherein: the outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer, and the functional film, the zinc oxide layer and the silicon-aluminum alloy layer are stacked from bottom to top.

4. The high-transmittance low-emissivity coated glass according to claim 1, wherein: the thickness of the first dielectric film is 0.3-0.5 μm, and the thickness of the outer dielectric film is 0.5-0.7 μm.

5. The high-transmittance low-emissivity coated glass according to claim 1, wherein: the functional film comprises the following raw materials, by weight, 40-50 parts of polystyrene, 10-15 parts of phenol, 5-7 parts of 4-chloronitrobenzene, 2-4 parts of ultraviolet-resistant anti-aging agent, 5-7 parts of binder, 2-4 parts of plasticizer and 0.5-1 part of dispersing agent.

6. The high-transmittance low-emissivity coated glass according to claim 5, wherein: the anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

7. The high-transmittance low-emissivity coated glass according to claim 5, wherein: the binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

8. A preparation process of high-transmittance low-radiation coated glass is characterized by comprising the following steps: the steps are as follows,

(1) surface treatment of glass: polishing one surface of the glass to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, heating at 90-100 ℃, stirring, reacting for 4-5 hours, adding deionized water, cooling to 5-8 ℃, standing for 2-3 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(3) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating at the temperature of 170-;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1200-1500 rmp, the pressure of a spray gun to be 0.2-0.25MPa, and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum for 10-15 minutes, and baking at the baking temperature to be 90-100 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

9. The process for preparing high-transmittance low-emissivity coated glass according to claim 8, wherein the process comprises the following steps: in the step (1), one surface of the glass is polished to ensure the polished surface to be flat, and the polished surface is washed by deionized water and isopropanol for 3 times and then dried.

10. The process for preparing high-transmittance low-emissivity coated glass according to claim 8, wherein the process comprises the following steps: in the step (2), when the polystyrene is added for modification, the polystyrene needs to be added for 10 times, and 1/10 in the total mass ratio is added each time, so that the reaction is ensured to be complete.

Technical Field

The invention relates to the technical field of coated glass preparation, in particular to high-transmittance low-emissivity coated glass and a preparation process thereof.

Background

The low-radiation coated glass is a film product formed by coating a plurality of layers of metals or other compounds on glass, the main performance of the functional film is to increase the permeability of visible light and the high reflection performance of middle and far infrared rays, and the low-radiation coated glass is widely applied to daily life of people.

The high-transparency low-radiation coated glass and the preparation process thereof are particularly important.

Disclosure of Invention

The invention aims to provide high-transmittance low-emissivity coated glass and a preparation process thereof, so as to solve the problems in the background art.

In order to solve the technical problems, the invention provides the following technical scheme: a high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

Further, the first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The first dielectric film of the present invention is composed of a tin oxide layer and a titanium dioxide layer, and is made of a metal insulating material. The adhesive force between the functional film and the glass is improved, and the transparency and the color of the glass are improved.

Furthermore, the outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The outer dielectric film is composed of the zinc oxide layer and the silicon-aluminum alloy layer, can improve the reflection capability of visible light and medium and far infrared light of glass, increases the transmittance of the glass, further enables the glass to have low radiation and heat insulation effects, and has the function of protecting the functional film as the outer dielectric film, so that the service life of the glass is prolonged, and the maintenance cost is reduced.

Furthermore, the thickness of the first dielectric film is 0.3-0.5 μm, and the thickness of the outer dielectric film is 0.5-0.7 μm.

Furthermore, the functional film comprises the following raw materials, by weight, 40-50 parts of polystyrene, 10-15 parts of phenol, 5-7 parts of 4-chloronitrobenzene, 2-4 parts of an ultraviolet-resistant anti-aging agent, 5-7 parts of a binder, 2-4 parts of a plasticizer and 0.5-1 part of a dispersing agent.

Furthermore, the anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

Further, the binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, heating at 90-100 ℃, stirring, reacting for 4-5 hours, adding deionized water, cooling to 5-8 ℃, standing for 2-3 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(3) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating at the temperature of 170-;

according to the method, through a method of dropwise adding polystyrene into a mixed solution of silver sulfate and concentrated sulfuric acid, the polyphenylpropylene is sulfonated, then phenol is added for doping, in order to ensure a sufficient reaction, the added phenol is excessive, in order to reduce the content of the phenol, the p-nitrochlorobenzene is added, the p-nitrochlorobenzene can absorb the excessive phenol under the conditions of potassium carbonate and copper powder, the content of phenol impurities is reduced, the problems that the visible light transmittance and the low radiation performance of glass are affected due to residue caused by the fact that the temperature cannot reach the boiling point of the phenol in subsequent vacuum drying and baking are solved, the pollution of toxic gas of the phenol can be reduced, and the use efficiency of raw materials is improved.

The added copper powder can affect the surface resistance of the film, but is easy to oxidize to form copper spots, and affects the visible light transmittance and the medium and far infrared light reflectance, so that the oxidation resistance is required to be improved, the p-nitrochlorobenzene and the aniline can generate 4-nitrodiphenylamine, and the 4-nitrodiphenylamine can be used as an anti-aging agent, so that the oxidation resistance of the film is improved, the oxidation speed of the copper powder is reduced, and the visible light transmittance of the glass is ensured.

The added p-nitrochlorobenzene can also react with the anti-ultraviolet anti-aging agent p-nitroaniline in the presence of copper powder and potassium carbonate, so that the problems of increased product impurities and reduced qualification rate caused by excessive addition of the p-nitrochlorobenzene are solved, 4' -trinitrotriphenylamine can be generated, and the triphenylamine compound can be used as an infrared light absorber, so that the heat-insulating property of glass is improved, and the infrared ray blocking property is improved.

(4) Film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1200-1500 rmp, the pressure of a spray gun to be 0.2-0.25MPa, and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum for 10-15 minutes, and baking at the baking temperature to be 90-100 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon gas to form silicon-aluminumAnd alloying the layers to obtain the high-transmittance low-emissivity coated glass.

Further, in the step (1), one surface of the glass is polished to ensure that the polished surface is smooth, deionized water and isopropanol are used for washing after polishing, and drying is carried out after washing for 3 times.

Furthermore, in the step (2), when the polystyrene is added for modification, the polystyrene needs to be added in 10 times, and 1/10 in the total mass ratio is added each time to ensure the reaction is complete.

Compared with the prior art, the invention has the following beneficial effects: the polyphenyl propylene film has high transparency, is convenient to process and low in cost, does not emit toxic gases such as hydrogen chloride and the like during incineration, can improve the high transparency and the water resistance of glass when being used on a glass film, and ensures the visible light transmittance, but the wear resistance and the corrosion resistance of the polyphenyl propylene film are poorer than those of the traditional polyethylene and polypropylene, so that the polyphenyl propylene film is modified and doped with the polyphenol to improve the wear resistance and the corrosion resistance of the film, and further improve the visible light transmittance of the glass.

Detailed Description

The technical solutions in the embodiments of the present invention are clearly and completely described below, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example 1

A high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

The first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The thickness of the first dielectric film is 0.3 μm, and the thickness of the outer dielectric film is 0.5 μm.

The functional film comprises the following raw materials, by weight, 40 parts of polystyrene, 10 parts of phenol, 5 parts of 4-chloronitrobenzene, 2 parts of an anti-ultraviolet antioxidant, 5 parts of a binder, 2 parts of a plasticizer and 0.5 part of a dispersant.

The anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

The binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass, washing the glass by using deionized water and isopropanol, and drying the glass after washing for 3 times to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, adding 1/10 in a total mass ratio every time, heating at 90 ℃, stirring, reacting for 4 hours, adding deionized water, cooling to 5 ℃, standing for 2 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2 hours, and filtering to obtain a modified polystyrene mixture;

(4) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating at the temperature of 170 ℃, adding potassium carbonate and copper powder, stirring, reacting for 2 hours, adding an anti-ultraviolet antioxidant, heating at the temperature of 200 ℃, stirring, reacting for 2 hours, cooling to room temperature, adding a binder, a dispersing agent and a plasticizer, and stirring to obtain a functional film mixed solution;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, deposited on the polished surface of the glass substrate under argon gas to form a tin oxide layerA glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1200rmp, the pressure of a spray gun to be 0.2MPa, and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum, wherein the drying time is 10 minutes, and baking at the baking temperature of 90 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

Example 2

A high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

The first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The thickness of the first dielectric film is 0.4 μm, and the thickness of the outer dielectric film is 0.6 μm.

The functional film comprises the following raw materials, by weight, 45 parts of polystyrene, 13 parts of phenol, 6 parts of 4-chloronitrobenzene, 3 parts of an anti-ultraviolet antioxidant, 6 parts of a binder, 3 parts of a plasticizer and 0.7 part of a dispersant.

The anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

The binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass, washing the glass by using deionized water and isopropanol, and drying the glass after washing for 3 times to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, adding 1/10 in a total mass ratio every time, heating at 95 ℃, stirring, reacting for 4.5 hours, adding deionized water, cooling to 7 ℃, standing for 2 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(5) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating to 175 ℃, adding potassium carbonate and copper powder, stirring, reacting for 2.5 hours, adding an anti-ultraviolet antioxidant, heating to 205 ℃, stirring, reacting for 2.5 hours, cooling to room temperature, adding a binder, a dispersing agent and a plasticizer, and stirring to obtain a functional film mixed solution;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1400rmp, the pressure of a spray gun to be 0.23MPa and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum, setting the drying time to be 13 minutes, and baking at the baking temperature of 95 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

Example 3

A high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

The first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The thickness of the first dielectric film is 0.5 μm, and the thickness of the outer dielectric film is 0.7 μm.

The functional film comprises the following raw materials, by weight, 50 parts of polystyrene, 15 parts of phenol, 7 parts of 4-chloronitrobenzene, 4 parts of an anti-ultraviolet antioxidant, 7 parts of a binder, 4 parts of a plasticizer and 1 part of a dispersant.

The anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

The binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass, washing the glass by using deionized water and isopropanol, and drying the glass after washing for 3 times to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, adding 1/10 in a total mass ratio every time, heating at 100 ℃, stirring, reacting for 5 hours, adding deionized water, cooling to 8 ℃, standing for 3 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(6) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating at 180 ℃, adding potassium carbonate and copper powder, stirring, reacting for 3 hours, adding an anti-ultraviolet antioxidant, heating at 210 ℃, stirring, reacting for 3 hours, cooling to room temperature, adding a binder, a dispersant and a plasticizer, and stirring to obtain a functional film mixed solution;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1500rmp, the pressure of a spray gun to be 0.25MPa and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum, setting the drying time to be 15 minutes, and baking at the baking temperature of 100 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

Comparative example 1

A high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

The first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The thickness of the first dielectric film is 0.5 μm, and the thickness of the outer dielectric film is 0.7 μm.

The functional film comprises the following raw materials, by weight, 50 parts of polystyrene, 15 parts of phenol, 4 parts of an ultraviolet-resistant anti-aging agent, 7 parts of a binder, 4 parts of a plasticizer and 1 part of a dispersing agent.

The anti-ultraviolet aging inhibitor is a mixture of p-nitroaniline, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

The binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass, washing the glass by using deionized water and isopropanol, and drying the glass after washing for 3 times to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, adding 1/10 in a total mass ratio every time, heating at 100 ℃, stirring, reacting for 5 hours, adding deionized water, cooling to 8 ℃, standing for 3 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(7) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding potassium carbonate and copper powder, stirring, reacting for 3 hours, adding an anti-ultraviolet antioxidant, heating to 210 ℃, stirring, reacting for 3 hours, cooling to room temperature, adding a binder, a dispersant and a plasticizer, and stirring to obtain a functional membrane mixed solution;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1500rmp, the pressure of a spray gun to be 0.25MPa and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum, setting the drying time to be 15 minutes, and baking at the baking temperature of 100 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

Comparative example 2

A high-transmittance low-emissivity coated glass comprises a glass substrate, a first dielectric film, a functional film and an outer dielectric film which are stacked from bottom to top.

The first dielectric film is composed of a tin oxide layer and a titanium dioxide layer.

The outer dielectric film consists of a zinc oxide layer and a silicon-aluminum alloy layer.

The thickness of the first dielectric film is 0.5 μm, and the thickness of the outer dielectric film is 0.7 μm.

The functional film comprises the following raw materials, by weight, 50 parts of polystyrene, 15 parts of phenol, 7 parts of 4-chloronitrobenzene, 4 parts of an anti-ultraviolet antioxidant, 7 parts of a binder, 4 parts of a plasticizer and 1 part of a dispersant.

The anti-ultraviolet aging inhibitor is a mixture of p-phenylenediamine, N-phenyl-alpha-naphthylamine and 4-methyl-6-tert-butylphenol.

The binder is any one or a mixture of more of siloxane, polytetrafluoroethylene and ethyl cellulose.

A preparation process of high-transmittance low-radiation coated glass comprises the following steps,

(1) surface treatment of glass: polishing one surface of the glass, washing the glass by using deionized water and isopropanol, and drying the glass after washing for 3 times to obtain a glass substrate for later use;

(2) modification of polystyrene:

mixing silver sulfate and concentrated sulfuric acid, adding polystyrene, adding 1/10 in a total mass ratio every time, heating at 100 ℃, stirring, reacting for 5 hours, adding deionized water, cooling to 8 ℃, standing for 3 days, and filtering to obtain a polystyrene sulfonic acid solution;

adding the polystyrene sulfonic acid solution into phenol and deionized water, stirring, adding ammonium persulfate, stirring for 2-3h, and filtering to obtain a modified polystyrene mixture;

(8) preparing a functional film: adding N, N-dimethylformamide into the modified polystyrene mixture obtained in the step (2), stirring, adding p-nitrochlorobenzene, heating at 180 ℃, adding potassium carbonate and copper powder, stirring, reacting for 3 hours, adding an anti-ultraviolet antioxidant, heating at 210 ℃, stirring, reacting for 3 hours, cooling to room temperature, adding a binder, a dispersant and a plasticizer, and stirring to obtain a functional film mixed solution;

(4) film coating:

firstly, tin oxide is used as target, medium frequency power supply and sputtering pressure is 4X 10^-3mbar, depositing on the polished surface of the glass substrate under argon gas to form a tin oxide layer, and obtaining a glass substrate A;

② titanium dioxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the tin oxide layer of the glass substrate under argon to form a titanium dioxide layer, and obtaining a glass substrate B;

thirdly, putting the functional film mixed liquid obtained in the step (3) into a spin coater, setting the rotating speed to be 1500rmp, the pressure of a spray gun to be 0.25MPa and the spraying time to be 15 seconds, spraying the functional film mixed liquid on the surface of the titanium dioxide layer of the glass substrate B, drying in vacuum, setting the drying time to be 15 minutes, and baking at the baking temperature of 100 ℃ to obtain a glass substrate C coated with a functional film;

fourthly, zinc oxide is adopted as a target, a medium frequency power supply is adopted, and the sputtering air pressure is 4 multiplied by 10^-3mbar, depositing on the surface of the glass substrate functional film under argon to form a zinc oxide layer, and obtaining a glass substrate D;

adopting Si-Al alloy layer as target, intermediate frequency power supply, sputtering pressure of 4X 10^-3mbar, depositing on the surface of the zinc oxide layer of the glass substrate under argon to form a silicon-aluminum alloy layer, and obtaining the high-transmittance low-emissivity coated glass.

Experiment of

And comparing the positions of the working examples 3, and setting a comparative example 1 and a comparative example 2, wherein the p-nitrochlorobenzene is not added in the comparative example 1, and the p-phenylenediamine is used in the comparative example 2 to replace the p-nitroaniline.

The comparative experiments of example 1, example 2, example 3, comparative example 1 and comparative example 2 were carried out, and the light transmittance and the solar light transmittance were measured by using the national standard GB/T2680-,

watch 1

The visible light transmittance and the refractive index of the comparative example 1, and the transmittance and the refractive index of sunlight are lower than those of the examples 1, 2 and 3, because no p-nitrochlorobenzene is added in the comparative example 1, so that excessive phenol impurities remain in the product, the light transmittance is reduced, the oxidation speed of copper powder is high, copper spots are formed, the functional film loses the working capacity, and the transmittance and the refractive index of sunlight are reduced.

The visible light transmittance, refractive index, solar transmittance and refractive index of comparative example 2 are lower than those of examples 1, 2 and 3, because p-phenylenediamine is used in the comparative example 2 instead of p-nitroaniline, so that the excessive p-nitrochlorobenzene remains, and the visible light transmittance, refractive index, solar transmittance and refractive index are reduced.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.