阅读说明：本技术 一种钛靶材组件的车削方法 (Turning method of titanium target assembly ) 是由 姚力军 边逸军 潘杰 王学泽 徐蔓 于 2020-10-26 设计创作，主要内容包括：本发明涉及一种钛靶材组件的车削方法,所述车削方法包括如下步骤：先将钛锭切断进行塑性变形；然后将得到的钛靶材坯料与背板进行焊接,得到钛靶材组件粗品；随后将得到的钛靶材组件粗品中的所述钛靶材坯料的溅射面依次进行粗车削和精车削,得到所述钛靶材组件；其中,所述精车削的待加工余量为0.4-0.6mm,所述精车削分为至少2刀进行车削。本发明所述车削方法采用依次进行粗车削和精车削的机加工方式,并进一步限定了所述精车削的待加工余量以及分为至少2刀进行车削,使得钛靶材组件的溅射面不仅可以满足粗糙度要求,还可以保证平面度＜0.1mm,避免表面应力留存,而且能够使得刀片的磨损速度变慢。(The invention relates to a turning method of a titanium target assembly, which comprises the following steps: firstly, cutting off a titanium ingot to perform plastic deformation; welding the obtained titanium target blank with a back plate to obtain a crude product of the titanium target assembly; then, carrying out rough turning and finish turning on the sputtering surface of the titanium target blank in the obtained titanium target assembly crude product in sequence to obtain the titanium target assembly; wherein the allowance to be machined of the finish turning is 0.4-0.6mm, and the finish turning is divided into at least 2 cutters for turning. The turning method adopts a machining mode of sequentially carrying out rough turning and finish turning, further limits the allowance to be machined of the finish turning and carries out turning by at least 2 cutters, so that the sputtering surface of the titanium target assembly can meet the roughness requirement, the flatness can be ensured to be less than 0.1mm, the surface stress is prevented from being retained, and the abrasion speed of the blade can be slowed down.)

1. A turning method of a titanium target assembly is characterized by comprising the following steps:

(1) cutting off the titanium ingot and carrying out plastic deformation to obtain a titanium target material blank;

(2) welding the titanium target blank obtained in the step (1) with a back plate to obtain a crude product of the titanium target assembly;

(3) carrying out rough turning and fine turning on the sputtering surface of the titanium target blank in the titanium target assembly crude product obtained in the step (2) in sequence to obtain the titanium target assembly;

wherein the allowance to be machined of the finish turning is 0.4-0.6mm, and the finish turning is divided into at least 2 cutters for turning.

2. The turning method according to claim 1, wherein the finish turning in the step (3) is divided into 4-9 turning;

preferably, the cutting feed of the first tool for finish turning in the step (3) is 0.2-0.25mm, and the cutting feed of each subsequent tool is 0.03-0.07 mm;

preferably, the rotation speed of the finish turning in the step (3) is 200-300 r/min.

3. The turning method according to claim 1 or 2, wherein the rough turning of step (3) has a allowance to be machined of 0.7-1.3 mm;

preferably, the feed amount of each rough turning in the step (3) is 0.3-0.5 mm;

preferably, the rotation speed of the rough turning in the step (3) is 200-300 r/min.

4. The turning method according to any one of claims 1 to 3, wherein the rough turning and the finish turning of step (3) both use a turning liquid;

preferably, the turning fluid is an aqueous solution of an emulsion;

preferably, the volume concentration of the aqueous solution of the emulsion is 5-10%;

preferably, the oil content of the emulsion is 50-80 vol%;

preferably, the emulsion is a gardener fast 3380 water-soluble lathe fluid.

5. The turning method according to any one of claims 1 to 4, wherein the rough turning and the finish turning of step (3) are both performed by a horizontal numerically controlled machine tool;

preferably, the horizontal numerical control machine tool is a table-center finishing machine VT22 model machine tool.

6. The turning method according to any one of claims 1 to 5, wherein the plastic deformation of step (1) comprises forging, annealing, rolling, end annealing and machining in sequence.

7. The turning method according to any one of claims 1-6, wherein the purity of the titanium ingot of step (1) is 99.995-99.999%.

8. The turning method according to any one of claims 1 to 7, wherein the backing plate of step (2) is a copper alloy backing plate or an aluminum alloy backing plate.

9. The turning method according to any one of claims 1 to 8, wherein the welding of step (2) is diffusion welding or brazing.

10. Turning method according to any of claims 1-9, characterized in that the turning method comprises the steps of:

(1) cutting a titanium ingot with the purity of 99.995-99.999%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with a copper alloy back plate or an aluminum alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is diffusion welding or brazing;

(3) putting the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform finishing machine VT22, and performing rough turning and finish turning on the sputtering surface of the titanium target blank in sequence to obtain the titanium target component;

wherein the allowance to be machined for the rough turning is 0.7-1.3mm, the feed amount of each tool for the rough turning is 0.3-0.5mm, and the rotation speed of the rough turning is 200-300 r/min;

the allowance to be machined for the finish turning is 0.4-0.6mm, the finish turning is divided into turning by 4-9 cutters, the feed amount of a first cutter for the finish turning is 0.2-0.25mm, the feed amount of each subsequent cutter is 0.03-0.07mm, and the rotation speed of the finish turning is 200-300 r/min;

the rough turning and the finish turning both adopt Gadeshman-Hakukuai 3380 water-soluble turning liquid, and the volume concentration of the turning liquid is 5-10%.

Technical Field

The invention relates to the field of target processing, in particular to a turning method of a titanium target assembly.

Background

The magnetron sputtering coating process is that the target material and the wafer are placed in the same vacuum closed environment, inert gas argon is filled in the vacuum closed environment, the target material is placed in the positive electrode, the wafer is placed in the negative electrode, the inert gas argon is ionized and decomposed into argon ions under the action of an electric field, and the argon ions bombard the surface of the target material under the action of the electric field so that target material atoms of the target material are sputtered onto the surface of the wafer. Therefore, the surface quality of the target material placed on the positive electrode is very important for the magnetron sputtering coating process, and various requirements such as size, flatness, purity, component content, density, grain size, internal structure defect control and the like are generally met.

Because the strength of the target material is different, in the practical application process, the target material meeting the performance requirement and the back plate with certain strength need to be combined to prepare a target material assembly, and then the target material assembly is arranged on a sputtering machine table to effectively perform magnetron sputtering control under the action of a magnetic field and an electric field. The backing plate can provide a supporting function for the target material and has the function of conducting heat, so that the target material and the backing plate need to be processed and welded to form the target material.

Currently, high purity titanium targets are widely used in semiconductor chip fabrication, such as conductive plug metal filling, metal electrode film deposition, etc. However, since the high-purity titanium target material is generally prepared by casting and plastically deforming a high-purity titanium ingot, the high-purity titanium target material has the characteristics of high strength, high hardness and the like, and titanium is easy to burn when being powdered. Therefore, when the high-purity titanium target and the titanium target assembly welded to the back plate need to be machined, the requirements for the size, the flatness and the like of the magnetron sputtering coating can be met.

The prior art discloses preparation methods of some titanium target assemblies, for example, CN111185659A discloses a diffusion welding method of a titanium target and a back plate and a prepared titanium target assembly, wherein the welding method effectively improves the assembly structure of the titanium target and the back plate by adding a gasket, improves the welding combination degree of the titanium target and the back plate, and then sequentially performs machining, dimension detection, cleaning and drying to obtain the titanium target assembly for magnetron sputtering coating; CN108687492A discloses a method for manufacturing a target assembly, comprising: providing a blank of a titanium target material and a back plate, wherein the blank has a sputtering surface and a welding surface opposite to the sputtering surface; turning the welding surface to form a thread on the welding surface; and welding the blank of the titanium target material and the back plate together by adopting a hot isostatic pressing process to form a target material assembly.

Although the above-mentioned scheme discloses machining a high-purity titanium target material and a titanium target material assembly, especially machining by turning, only the turning method of the welding surface of the high-purity titanium target material in contact with the back plate is focused, and the turning method of the sputtering surface of the high-purity titanium target material is not disclosed. However, the existing machining method for the sputtering surface of the high-purity titanium target only adopts a rough turning method, which not only easily causes the surface of the sputtering surface of the high-purity titanium target to generate an extrusion stress layer, thereby causing abnormal discharge in the magnetron sputtering coating process, seriously polluting the environment of a cavity, even polluting a wafer, and easily accelerating the wear rate of a blade.

In summary, there is a need to develop a turning method for a titanium target assembly, so that the sputtering surface of the titanium target can meet the requirement of roughness, and the flatness can be ensured to be less than 0.1mm, thereby avoiding surface stress retention, effectively improving the surface quality of the titanium target, and slowing down the wear rate of the blade.

Disclosure of Invention

In order to solve the technical problems, the invention provides a turning method of a titanium target assembly, which adopts a machining mode of sequentially carrying out rough turning and finish turning, further limits the allowance to be machined of the finish turning and carries out turning by at least 2 cutters, so that the sputtering surface of the titanium target assembly can meet the roughness requirement, can ensure that the flatness is less than 0.1mm, avoids surface stress retention, reduces the abnormal discharge phenomenon in the magnetron sputtering coating process, and can slow down the abrasion speed of a blade.

In order to achieve the purpose, the invention adopts the following technical scheme:

the invention aims to provide a turning method of a titanium target assembly, which comprises the following steps:

(1) cutting off the titanium ingot and carrying out plastic deformation to obtain a titanium target material blank;

(2) welding the titanium target blank obtained in the step (1) with a back plate to obtain a crude product of the titanium target assembly;

(3) carrying out rough turning and fine turning on the sputtering surface of the titanium target blank in the titanium target assembly crude product obtained in the step (2) in sequence to obtain the titanium target assembly;

wherein the allowance to be machined of the finish turning is 0.4-0.6mm, and the finish turning is divided into at least 2 cutters for turning.

In the prior art, a rough turning mode is adopted to machine a titanium target component crude product, the feed amount is large, so that a turning extrusion layer is generated on a sputtering surface of a titanium target, the problem of surface stress retention is generated, and an abnormal discharge phenomenon is generated on a wafer in a magnetron sputtering coating process to pollute the environment of a sputtering chamber. In order to solve the problem, the turning method adopts a machining mode of sequentially carrying out rough turning and finish turning, when a product is to be machined to a finished product, the original rough turning is changed into finish turning by dividing the original rough turning into at least 2 cutters for turning, so that the sputtering surface of a titanium target component can meet the roughness requirement, the flatness can be ensured to be less than 0.1mm, the retention of surface stress is avoided, the abnormal discharge phenomenon in the magnetron sputtering coating process is reduced, the surface quality of the titanium target is effectively improved, and the abrasion speed of a blade can be slowed down.

The finishing turning according to the invention has a machining allowance of 0.4 to 0.6mm, for example 0.4mm, 0.45mm, 0.5mm, 0.55mm or 0.6mm, but is not limited to the values listed, and other values not listed in this range of values are equally applicable.

As a preferred technical solution of the present invention, the finish turning in the step (3) is divided into 4-9 cutting, for example, any one of 4 cutting, 5 cutting, 6 cutting, 7 cutting, 8 cutting and 9 cutting.

Preferably, the first tool for finish turning in step (3) has a cutting depth of 0.2-0.25mm, such as 0.2mm, 0.21mm, 0.22mm, 0.23mm, 0.24mm or 0.25mm, etc., and the subsequent tools have a cutting depth of 0.03-0.07mm, such as 0.03mm, 0.04mm, 0.05mm, 0.06mm or 0.07mm, etc., but not limited to the recited values, and other values not recited in the above-mentioned ranges are equally applicable.

Preferably, the finish turning in step (3) has a rotation speed of 200-300r/min, such as 200r/min, 220r/min, 240r/min, 250r/min, 270r/min, 290r/min or 300r/min, but not limited to the enumerated values, and other unrecited values in the numerical range are also applicable.

The finish turning of the invention is further limited to be turned by 4-9 cutters, the cutter feeding amount of the first cutter is limited to be 0.2-0.25mm, and the cutter feeding amount of each subsequent cutter is 0.03-0.07mm, so that the requirements on roughness and flatness are ensured to be less than 0.1mm, surface stress retention is avoided, abnormal discharge in the magnetron sputtering film coating process is reduced, the surface quality of the titanium target material is effectively improved, time can be saved as much as possible, and the processing efficiency is improved.

In a preferred embodiment of the present invention, the rough turning in step (3) has a machining allowance of 0.7 to 1.3mm, for example, 0.7mm, 0.8mm, 0.9mm, 1mm, 1.1mm, 1.2mm, or 1.3mm, but is not limited to the above-mentioned values, and other values not shown in the above-mentioned range are also applicable.

Preferably, the feed per pass of the rough turning in step (3) is 0.3-0.5mm, such as 0.3mm, 0.35mm, 0.4mm, 0.45mm or 0.5mm, but not limited to the recited values, and other values not recited in the range of values are also applicable.

Preferably, the rotation speed of the rough turning in the step (3) is 200-300r/min, such as 200r/min, 220r/min, 240r/min, 250r/min, 270r/min, 290r/min or 300r/min, etc., but not limited to the enumerated values, and other non-enumerated values in the numerical range are also applicable.

The purpose of the rough turning is to remove impurities on the surface of the titanium target blank, because the titanium target blank is formed by casting, and the surface of the titanium target blank has more impurities after multiple heat treatments during the previous plastic deformation, therefore, the allowance to be machined by the rough turning is larger, and the feed amount of each cut is also larger.

As a preferable technical scheme of the invention, the rough turning and the finish turning in the step (3) both adopt turning liquid.

The turning liquid belongs to an auxiliary material for rough turning and finish turning, and because the rotation speed of the blade is higher in the rough turning and finish turning processes, the temperature of the contact surface between the blade and a titanium target blank can be increased, the temperature of the contact surface can be effectively reduced by using the turning liquid, and the target assembly and the cutter are prevented from being damaged and even dangerous accidents caused by sparks generated due to overhigh temperature are avoided.

Preferably, the turning liquid is an aqueous solution of an emulsion, that is, the turning liquid is obtained by mixing the emulsion with water.

Preferably, the aqueous solution of the emulsion has a concentration of 5 to 10% by volume, for example 5%, 6%, 7%, 8%, 9% or 10%, but is not limited to the recited values, and other values not recited within this range of values are equally applicable.

Preferably, the oil content of the emulsion is 50-80 vol%, such as 50 vol%, 55 vol%, 60 vol%, 65 vol%, 70 vol%, 75 vol% or 80 vol%, but not limited to the recited values, and other values not recited within the range of values are equally applicable.

The oil content in the invention refers to the volume content of the base oil in the emulsion.

Preferably, the emulsion is a gardener fast 3380 water-soluble lathe fluid.

The emulsion disclosed by the invention has the advantages of strong lubricating capability, good cooling property, quick heat dissipation and the like in the rough turning and fine turning processes, so that the friction between the blade and a titanium target blank is reduced, the surface temperature of a contact surface is reduced, the roughness requirement of a sputtering surface of the titanium target is further met, and meanwhile, the processing efficiency is favorably improved.

As the preferable technical scheme of the invention, the rough turning and the fine turning in the step (3) adopt horizontal numerical control machine tools.

Preferably, the horizontal numerical control machine tool is a table-center finishing machine VT22 model machine tool.

As a preferred technical scheme of the invention, the plastic deformation in the step (1) comprises forging, annealing, rolling, terminal annealing and machining which are sequentially carried out.

The plastic deformation including forging, annealing, rolling, terminal annealing and machining in sequence can remove defects in the titanium ingot and refine grains, so that the requirement of grains of the titanium target material in the subsequent magnetron sputtering coating process can be met, and the plastic deformation is the prior art and is not described again.

As a preferable technical scheme of the invention, the purity of the titanium ingot in the step (1) is 99.995-99.999%, and the balance is inevitable impurities.

As a preferable technical scheme of the invention, the back plate in the step (2) is a copper alloy back plate or an aluminum alloy back plate.

In a preferred embodiment of the present invention, the welding in step (2) is diffusion welding or brazing.

As a preferable technical scheme of the invention, the turning method comprises the following steps:

(1) cutting a titanium ingot with the purity of 99.995-99.999%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with a copper alloy back plate or an aluminum alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is diffusion welding or brazing;

(3) putting the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform finishing machine VT22, and performing rough turning and finish turning on the sputtering surface of the titanium target blank in sequence to obtain the titanium target component;

wherein the allowance to be machined for the rough turning is 0.7-1.3mm, the feed amount of each tool for the rough turning is 0.3-0.5mm, and the rotation speed of the rough turning is 200-300 r/min;

the allowance to be machined for the finish turning is 0.4-0.6mm, the finish turning is divided into turning by 4-9 cutters, the feed amount of a first cutter for the finish turning is 0.2-0.25mm, the feed amount of each subsequent cutter is 0.03-0.07mm, and the rotation speed of the finish turning is 200-300 r/min;

the rough turning and the finish turning both adopt Gadeshman-Hakukuai 3380 water-soluble turning liquid, and the volume concentration of the turning liquid is 5-10%.

Compared with the prior art, the invention has at least the following beneficial effects:

the invention provides a turning method of a titanium target assembly, which adopts a machining mode of carrying out rough turning and finish turning in sequence, further limits the allowance to be machined of the finish turning and carries out turning by at least 2 cutters, so that the sputtering surface of the titanium target assembly can meet the requirement of roughness, the flatness can be ensured to be less than 0.1mm, the retention of surface stress is avoided, the abnormal discharge phenomenon in the magnetron sputtering coating process is reduced, and the abrasion speed of a blade can be slowed down.

Detailed Description

The technical solution of the present invention is further explained by the following embodiments. It should be understood by those skilled in the art that the examples are only for the understanding of the present invention and should not be construed as the specific limitations of the present invention.

Example 1

The embodiment provides a turning method of a titanium target assembly, which comprises the following steps:

(1) cutting a titanium ingot with the purity of 99.999%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with an aluminum alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is diffusion welding;

(3) putting the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform finishing machine VT22, and performing rough turning and finish turning on the sputtering surface of the titanium target blank in sequence to obtain the titanium target component;

the allowance to be machined of the rough turning is 1mm, the feed amount of each rough turning is 0.5mm, the rotation speed of the rough turning is 250r/min, the rough turning is carried out for 1 time in total, and the allowance to be machined of 0.5mm is reserved for the subsequent fine turning;

the finish turning is divided into 6-cutter turning, the feed amount of the first cutter of the finish turning is 0.25mm, the feed amount of each subsequent cutter is 0.05mm, and the rotation speed of the finish turning is 250 r/min;

the rough turning and the finish turning both adopt Gadeshira Kuaikuai 3380 water-soluble turning liquid, and the volume concentration of the turning liquid is 8%.

Example 2

The present embodiment provides a turning method for a titanium target assembly, except that "the finish turning is divided into 6-blade turning" in step (3) is replaced by "the finish turning is divided into 9-blade turning", and other conditions are exactly the same as those in embodiment 1, and the specific contents are as follows:

the finish turning is divided into 9-cutter turning, the cutting feed of the first cutter of the finish turning is 0.25mm, the cutting feed of each subsequent cutter is 0.03mm, the rotation speed of the finish turning is 250r/min, and it is worth explaining that although 0.01mm of allowance to be machined remains, the allowance can be ignored within the machining error range.

Example 3

The present embodiment provides a turning method for a titanium target assembly, except that "the finish turning is divided into 6-blade turning" in step (3) is replaced by "the finish turning is divided into 2-blade turning", and other conditions are exactly the same as those in embodiment 1, and the specific contents are as follows:

the finish turning is divided into 2 cutters for turning, the cutter feeding amount of each cutter of the finish turning is 0.25mm, and the rotating speed of the finish turning is 250 r/min.

Example 4

The embodiment provides a turning method of a titanium target assembly, which comprises the following steps:

(1) cutting a titanium ingot with the purity of 99.995%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with an aluminum alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is diffusion welding;

(3) putting the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform finishing machine VT22, and performing rough turning and finish turning on the sputtering surface of the titanium target blank in sequence to obtain the titanium target component;

the allowance to be machined of the rough turning is 0.7mm, the feed amount of each rough turning is 0.3mm, the rotation speed of the rough turning is 300r/min, 1 rough turning is carried out, and the allowance to be machined of 0.4mm is reserved for the subsequent fine turning;

the finish turning is divided into 6-cutter turning, the feed amount of the first cutter of the finish turning is 0.2mm, the feed amount of each subsequent cutter is 0.04mm, and the rotation speed of the finish turning is 300 r/min;

the rough turning and the finish turning both adopt Gadeshman-Hakukuai 3380 water-soluble turning liquid, and the volume concentration of the turning liquid is 10%.

Example 5

The embodiment provides a turning method of a titanium target assembly, which comprises the following steps:

(1) cutting a titanium ingot with the purity of 99.999%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with a copper alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is brazing;

(3) putting the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform finishing machine VT22, and performing rough turning and finish turning on the sputtering surface of the titanium target blank in sequence to obtain the titanium target component;

the allowance to be machined of the rough turning is 1.3mm, the feed amount of each rough turning is 0.35mm, the rotation speed of the rough turning is 200r/min, the rough turning is carried out for 2 times, and the allowance to be machined of 0.6mm is reserved for the subsequent fine turning;

the finish turning is divided into 6-cutter turning, the feed amount of the first cutter of the finish turning is 0.25mm, the feed amount of each subsequent cutter is 0.07mm, and the rotation speed of the finish turning is 200 r/min;

the rough turning and the finish turning both adopt Gadeshira Kuaikuai 3380 water-soluble turning liquid, and the volume concentration of the turning liquid is 5%.

Comparative example 1

The present comparative example provides a method of turning a titanium target assembly, the method comprising the steps of:

(1) cutting a titanium ingot with the purity of 99.999%, and sequentially carrying out plastic deformation including forging, annealing, rolling, terminal annealing and machining to obtain a titanium target blank;

(2) welding the titanium target blank obtained in the step (1) with an aluminum alloy back plate to obtain a crude product of the titanium target assembly;

wherein the welding is diffusion welding;

(3) placing the titanium target component crude product obtained in the step (2) into a machine tool with a model of a platform fine finishing machine VT22, and only carrying out rough turning on the sputtering surface of the titanium target blank to obtain the titanium target component;

the allowance to be machined in the rough turning is 1mm, the feed amount of each rough turning is 0.5mm, the rotation speed of the rough turning is 250r/min, and the rough turning is carried out for 2 times;

the rough turning adopts a water-soluble turning liquid of 3380 of Gadeshman Hakusho, and the volume concentration of the turning liquid is 8 percent.

That is, the present comparative example was completely the same as example 1 except that "rough turning and finish turning were sequentially performed" in step (3) was replaced with "rough turning only".

The sputtering surface of the titanium target assembly obtained in the above examples and comparative examples represents the magnitude of the surface stress through the flatness, when the flatness is less than 0.1mm, the surface stress of the sputtering surface is less remained, and the actual three-coordinate measuring instrument is adopted for detection, and the specific test result is shown in table 1.

TABLE 1

Group of

Example 1

Example 2

Example 3

Example 4

Example 5

Comparative example 1

Degree of flatness

0.04mm

0.04mm

0.09mm

0.05mm

0.06mm

0.3mm

From table 1, the following points can be seen:

(1) according to the turning method, a machining mode of performing rough turning and finish turning in sequence is adopted, the allowance to be machined of the finish turning is further limited, and the turning is performed by at least 2 cutters, so that the sputtering surface of the titanium target assembly can meet the roughness requirement, the flatness can be guaranteed to be less than 0.1mm, the surface stress is prevented from being retained, the abnormal discharge phenomenon in the magnetron sputtering coating process is reduced, and the abrasion speed of the blade can be slowed down;

(2) comparing the embodiment 1 with the embodiments 2 and 3, it can be seen that when the allowance to be machined and the rotation speed of the finish turning are kept consistent, the flatness of the sputtering surface is larger due to the fact that the number of the finish turning split turning in the embodiment 3 is smaller, that is, the average feed amount is larger; however, even if the number of the finish turning divided lathe turning in example 2 is as high as 9, that is, the average feed amount is small, the flatness of the sputtering surface is not correspondingly further reduced, but consumes energy and time.

The applicant states that the present invention is illustrated by the above examples to show the detailed process equipment and process flow of the present invention, but the present invention is not limited to the above detailed process equipment and process flow, i.e. it does not mean that the present invention must rely on the above detailed process equipment and process flow to be implemented. It should be understood by those skilled in the art that any modification of the present invention, equivalent substitutions of the raw materials of the product of the present invention, addition of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.