Optical anti-fake element with multiple layers of coatings and manufacturing method thereof
阅读说明：本技术 多层镀层光学防伪元件及其制作方法 (Optical anti-fake element with multiple layers of coatings and manufacturing method thereof ) 是由 *** 张巍巍 张宝利 朱军 于 2019-05-05 设计创作，主要内容包括：本发明提供一种光学防伪元件,属于光学防伪技术领域。该光学防伪元件包括：起伏结构层；所述起伏结构层包括：具有第一微结构的第一区域和具有第二微结构的第二区域；所述第二微结构的结构参数大于所述第一微结构的结构参数；所述起伏结构层还包括具有第三微结构的第三区域；所述第三微结构的结构参数大于所述第二微结构的结构参数；所述第一区域上设置有第一镀层；所述第二区域上设置有第二镀层；所述第三区域不设置所述第一镀层或所述第二镀层；从光学防伪元件的一侧观察,所述第一区域具有所述第一微结构和所述第一镀层结合的光学特征、所述第二区域具有所述第二微结构和所述第二镀层结合的光学特征且所述光学防伪元件的第三区域具有镂空特征。(The invention provides an optical anti-counterfeiting element, and belongs to the technical field of optical anti-counterfeiting. The optical security element comprises: a relief structure layer; the relief structure layer includes: a first region having a first microstructure and a second region having a second microstructure; the structural parameter of the second microstructure is larger than that of the first microstructure; the relief structure layer further comprises a third region having a third microstructure; the structural parameter of the third microstructure is larger than that of the second microstructure; a first plating layer is arranged on the first area; a second plating layer is arranged on the second area; the third region is not provided with the first plating layer or the second plating layer; and when viewed from one side of the optical anti-counterfeiting element, the first area has the optical characteristic of the combination of the first microstructure and the first plating layer, the second area has the optical characteristic of the combination of the second microstructure and the second plating layer, and the third area of the optical anti-counterfeiting element has a hollow-out characteristic.)
1. An optical security element, comprising:
a relief structure layer (2);
the relief structure layer (2) comprises: a first region (a) having a first microstructure and a second region (B) having a second microstructure;
the structural parameter of the second microstructure is larger than that of the first microstructure;
a first plating layer (3) is arranged on the first area (A);
a second plating layer (5) is arranged on the second area (B);
the first region (A) has optical characteristics of the first microstructure in combination with the first coating (3);
the second region (B) has optical characteristics of the second microstructure in combination with the second cladding layer (5).
2. An optical security element according to claim 1,
the first microstructure or the second microstructure is: one of a periodic structure and a non-periodic structure, or a structure in which a periodic structure and a non-periodic structure are combined;
the cross section structure of the first microstructure or the second microstructure along the extension direction is as follows: the grating structure comprises a flat structure, a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure, a blazed grating structure and an arc-shaped grating structure, or a structure formed by combining at least any two structures of the flat structure, the sinusoidal structure, the rectangular grating structure, the trapezoidal grating structure, the blazed grating structure and the arc-shaped grating structure.
3. An optical security element according to claim 1, further comprising:
the structure secondary parameter of the second microstructure is larger than that of the first microstructure;
the structural parameter is selected from one of an aspect ratio and a specific volume;
the structural sub-parameter is the remaining one of the aspect ratio and the specific volume relative to the structural parameter.
4. An optical security element according to claim 1,
the structural parameters include: aspect ratio or specific volume.
5. An optical security element according to claim 3 or 4,
the structural parameter is an aspect ratio;
the depth-to-width ratio range of the first microstructure is more than or equal to 0 and less than 0.3;
the depth-to-width ratio of the second microstructure is greater than 0.2 and less than 0.5.
6. An optical security element according to claim 3 or 4,
the structural parameter is specific volume;
the range of the specific volume of the first microstructure is more than or equal to 0um3/um2And less than 0.5um3/um2；
The range of the specific volume of the second microstructure is more than 0.4um3/um2And less than 2um3/um2。
7. An optical security element according to claim 1,
first cladding material (3) with second cladding material (5) are the metallic reflection cladding material, perhaps first cladding material (3) with second cladding material (5) are multilayer interference light becomes cladding material, perhaps first cladding material (3) are the metallic reflection cladding material second cladding material (5) are multilayer interference light becomes cladding material, perhaps first cladding material (3) are multilayer interference light becomes cladding material the second cladding material is metallic reflection cladding material (5).
8. An optical security element according to claim 7,
the metal reflective coating comprises the following materials: one metal of aluminum, silver, copper, tin, chromium, nickel and titanium, or an alloy formed by combining at least any two metals of aluminum, silver, copper, tin, chromium, nickel and titanium.
9. An optical security element according to claim 8,
the metal reflective coating is made of aluminum.
10. An optical security element according to claim 7,
the multilayer interference light variable plating layer comprises: a reflective layer, a dielectric layer, and an absorbing layer;
the material of the reflecting layer comprises: one metal of aluminum, silver, copper, tin, chromium, nickel and titanium, or an alloy formed by combining at least any two metals of aluminum, silver, copper, tin, chromium, nickel and titanium;
the material of the dielectric layer comprises: magnesium fluoride, silicon dioxide, zinc sulfide, titanium nitride, titanium dioxide, titanium monoxide, titanium sesquioxide, titanium oxide triacetate, tantalum pentoxide, niobium pentoxide, cerium dioxide, bismuth trioxide, chromium trioxide, iron oxide, hafnium dioxide, or zinc oxide;
the material of the absorption layer comprises: one metal of nickel, chromium, aluminum, silver, copper, tin and titanium, or an alloy formed by combining at least any two metals of nickel, chromium, aluminum, silver, copper, tin and titanium.
11. An optical security element according to claim 10,
the reflecting layer is made of aluminum;
the material of the absorption layer is nickel or chromium, or nickel-chromium alloy.
12. An optical security element according to claim 1,
the relief structure layer (2) further comprises: a third region (C) having a third microstructure;
the structural parameter of the third microstructure is larger than that of the second microstructure;
the third region (C) is free of the first plating layer (3) or the second plating layer (5);
when viewed in transmission, the third region (C) has hollow-out features relative to the first region (A) and the second region (B).
13. An optical security element according to claim 12,
the structural parameter is an aspect ratio;
the depth-to-width ratio of the third microstructure is in a range of more than 0.3 and less than 1.
14. An optical security element according to claim 12,
the structural parameter is specific volume;
the range of the specific volume of the third microstructure is more than 1um3/um2And less than 3um3/um2。
15. An optical security element according to claim 12,
one of the first plating layer (3) and the second plating layer (5) is a multilayer interference light variable plating layer;
the multilayer interference light variable plating layer comprises: a reflective layer, a dielectric layer, and an absorbing layer.
16. An optical security element according to claim 15,
the third region (C) does not have any of a reflective layer, a dielectric layer, or an absorptive layer.
17. An optical security element according to claim 15,
the third region (C) has an absorption layer and a dielectric layer and does not have a reflective layer.
18. A method for producing an optical security element, the method comprising:
s1) forming a relief structure layer (2), wherein the relief structure layer (2) has a first region (a) and a second region (B), the first region (a) having a first microstructure and the second region (B) having a second microstructure characterized by a second microstructure having a structural parameter greater than that of the first microstructure;
s2) forming a plating layer for obtaining the first plating layer (3);
s3) forming a first protective layer;
s4) placing the semi-finished product of step S3) in an atmosphere capable of reacting with the coating formed in step S2) until part or all of the coating formed in step S2) located in the second area (B) is removed, so that the first coating (3) is obtained after the reaction is stopped and the first coating (3) and the first microstructure present a combined optical characteristic at the first area (a);
s5) for obtaining the second plating layer (5).
19. The method for manufacturing an optical security element according to claim 18, wherein the step S1) further comprises:
wherein the relief structure layer further comprises a third region (C) having a third microstructure characterized in that the third microstructure has a structural parameter greater than that of the second microstructure.
20. The method for manufacturing an optical security element according to claim 18 or 19, wherein the step S1) further comprises:
wherein the second microstructure is characterized in that the structural sub-parameter of the second microstructure is greater than the structural sub-parameter of the first microstructure;
wherein the structural parameter is a selected one of an aspect ratio and a specific volume;
wherein the structural sub-parameter is a remaining one of the aspect ratio and the specific volume with respect to the structural parameter.
21. The method for manufacturing an optical security element according to claim 18 or 19, wherein the step S1) further comprises:
wherein the structural parameters include: aspect ratio or specific volume.
22. A method of making an optical security element according to claim 19, the method further comprising:
s6) forming a second protective layer;
s7) placing the product of step S6) in an atmosphere capable of reacting with the coating formed in step S5) until part or all of the coating formed in step S5) located in the third region (C) is removed, so that the second coating (5) is obtained after the reaction has ceased and the second coating (5) and the second microstructure present a combined optical characteristic at the second region (B), and also so that the third region (C) has a hollow-out characteristic in transmission view with respect to the first region (a) and the second region (B).
23. A method of manufacturing an optical security element according to claim 22,
wherein the coating used in step S2) to obtain the first coating (3) and/or the coating used in step S5) to obtain the second coating (5) has an aluminum layer;
wherein the atmosphere capable of reacting with the coating in step S2) and/or the atmosphere capable of reacting with the coating in step S5) is selected to be an acid solution, or the atmosphere capable of reacting with the coating in step S2) and/or the atmosphere capable of reacting with the coating in step S5) is selected to be an alkali solution.
24. A method of producing an optical security element according to claim 18 or 22, wherein the method of production further comprises:
and applying an inorganic or organic coating or an inorganic or organic coating process to realize an additional optical anti-counterfeiting function or an auxiliary function.
Technical Field
The invention relates to the technical field of optical anti-counterfeiting, in particular to an optical anti-counterfeiting element and a manufacturing method of the optical anti-counterfeiting element.
Background
In order to prevent counterfeiting by means of scanning, copying and the like, optical anti-counterfeiting technology is widely adopted in various high-security or high-value-added printed matters such as bank notes, credit cards, passports, securities, product packages and the like, and a very good effect is achieved.
In various optical anti-counterfeiting technologies, optical effects formed by microstructures, including diffraction and non-diffraction effects, are widely applied due to high brightness and obvious dynamic effect. Microstructure optical anti-counterfeiting technology to increase the brightness of an image, a metal reflective layer, such as aluminum, is generally used. Among them, the holographic technique, which is the most widely used optical anti-counterfeit technique for optical films, is an optical technique developed by using the diffraction effect of microstructure formation. The fifth 1999 edition of security threads for 5-, 10-, 20-, 50-, 100-membered RMB uses holographic technology. In addition, the multilayer interference light variation technology has been receiving more and more attention because of the strong optical color variation effect under different viewing angles. The multilayer interference light variation technology generally adopts a vapor deposition method to realize evaporation of multilayer interference coatings. Classical multilayer interference coatings generally comprise a reflective layer, a dielectric layer and an absorbing layer. The reflective layer is generally made of a high-brightness metal material, the dielectric layer is generally made of a transparent inorganic or organic material, and the absorption layer is also called a semitransparent layer and is generally made of a thin metal material with good absorptivity. The fifth set of 2015 edition 100 yuan RMB security thread adopts multilayer interference light variation technology, and is seen as magenta in front view and green in oblique view.
If the optical microstructure, the high-brightness metal reflecting layer characteristic and the multilayer interference light variation characteristic are integrated into the same optical anti-counterfeiting element, the optical anti-counterfeiting effect can be greatly enhanced. Patent application CN200980104829.3 proposes that the preparation of the optics anti-fake product that multilayer interference light becomes cladding material and hi-lite metal reflecting layer phase integration has been realized through local printing fretwork technology, and partial region has multilayer interference light becomes the characteristic promptly, and partial region has hi-lite metal reflecting layer optical characteristic, and other regions then have perspective fretwork effect. However, the precision of the mutual alignment of the three regions in the patent application depends on the printing precision, which is generally over 100um, and the application in high-end anti-counterfeiting optical products is limited to a certain extent.
Therefore, the optical anti-counterfeiting element which simultaneously has the characteristics of the high-brightness metal reflecting layer and the multilayer interference light variation characteristics and has zero positioning error of two characteristic areas has important significance. Further, if the optical anti-counterfeiting element further integrates a hollow-out feature, and the hollow-out area and the image area are positioned with zero error, the anti-counterfeiting performance of the product can be further improved.
Disclosure of Invention
The embodiment of the invention aims to provide an optical anti-counterfeiting element and a manufacturing method thereof, wherein when the optical anti-counterfeiting element is observed by reflection from one side, the optical anti-counterfeiting element has two different optical characteristics presented by a plating layer, and areas with the two different optical characteristics have strict zero-error positioning; particularly, the two coatings are respectively a metal coating and a multilayer interference light variation coating, so that the product can present abundant high-brightness metal reflecting layer characteristics (such as holography) and interference light variation characteristics, and has excellent comprehensive integration anti-counterfeiting performance; further, if the optical anti-counterfeiting element further integrates a hollow-out feature, and the hollow-out area and the image area are positioned with zero error, the anti-counterfeiting performance of the product can be further improved.
In order to achieve the above object, an embodiment of the present invention provides an optical security element, including:
a relief structure layer;
the relief structure layer includes: a first region having a first microstructure and a second region having a second microstructure;
the structural parameter of the second microstructure is larger than that of the first microstructure;
a first plating layer is arranged on the first area;
a second plating layer is arranged on the second area;
the first region having optical features of the first microstructure in combination with the first cladding layer;
the second region has optical characteristics of the second microstructure and the second plating layer in combination;
since the two image areas (the first area and the second area) present in reflection observation are determined by the microstructure, there is a location zero error feature.
Optionally, the first microstructure or the second microstructure is: one of a periodic structure and a non-periodic structure, or a structure in which a periodic structure and a non-periodic structure are combined;
the cross section structure of the first microstructure or the second microstructure along the extension direction is as follows: the grating structure comprises a flat structure, a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure, a blazed grating structure and an arc-shaped grating structure, or a structure formed by combining at least any two structures of the flat structure, the sinusoidal structure, the rectangular grating structure, the trapezoidal grating structure, the blazed grating structure and the arc-shaped grating structure. The dimensions and lateral arrangement of the first and second microstructures are determined by the desired optical effect.
Optionally, the method further includes:
the structure secondary parameter of the second microstructure is larger than that of the first microstructure;
the structural parameter is selected from one of an aspect ratio and a specific volume;
the structural sub-parameter is the remaining one of the aspect ratio and the specific volume relative to the structural parameter;
the aspect ratio of the microstructure of the relief structure referred to herein means the ratio of the depth of the relief structure to the width in the direction of the period (or quasiperiodic); the specific volume of the relief structure refers to the ratio of the volume of liquid just completely covering the surface of the relief structure to the projection area of the relief structure on the horizontal plane when the relief structure layer is placed in a horizontal state; by this definition, the aspect ratio is a dimensionless physical quantity, the dimension of the specific volume being um3/um2(ii) a By this definition, a planar structure is considered to be a relief structure with an aspect ratio of zero and a specific volume of zero; the aspect ratio and the specific volume are two physical quantities which are not directly related in quantity; for example, if the a structure is a one-dimensional sawtooth grating with a depth of 1um and a width of 1um along the period direction, the aspect ratio is 1 and the specific volume is 0.5um3/um2(ii) a The structure B is a one-dimensional sawtooth grating with the depth of 2um and the width of 4um along the period direction, the depth-to-width ratio is 0.5, and the specific volume is 1um3/um2(ii) a That is, the aspect ratio of the a-structure is greater than the aspect ratio of the B-structure, and the specific volume of the B-structure is greater than the specific volume of the a-structure; the difference between the depth-to-width ratio and the specific volume of the first microstructure and the second microstructure directly determines the method adopted by the hollowing procedure.
Optionally, the structural parameters include: aspect ratio or specific volume.
Optionally, the structural parameter is an aspect ratio;
the depth-to-width ratio range of the first microstructure is more than or equal to 0 and less than 0.3;
aspect ratio of the second microstructure the range of the aspect ratio of the second microstructure is greater than 0.2 and less than 0.5.
Optionally, the structural parameter is specific volume;
the range of the specific volume of the first microstructure is more than or equal to 0um3/um2And less than 0.5um3/um2；
The range of the specific volume of the second microstructure is more than 0.4um3/um2And less than 2um3/um2。
Optionally, the first plating layer and the second plating layer are both metal reflective plating layers and may be different metal reflective layers (for example, the first plating layer is aluminum, and the second plating layer is copper), or the first plating layer and the second plating layer are both multilayer interference light variation plating layers and may be different multilayer interference light variation plating layers (for example, the first plating layer is magenta to green interference light variation plating layer, and the second plating layer is green to blue interference light variation plating layer), or the first plating layer is metal reflective plating layer, and the second plating layer is multilayer interference light variation plating layer, or the first plating layer is multilayer interference light variation plating layer, and the second plating layer is metal reflective plating layer.
Preferably, one of the first plating layer and the second plating layer is a metal reflective plating layer and the other is a multilayer interference light variable plating layer. In particular, a sub-plating of the first plating and the second plating may be achieved by different portions of the same plating covering different areas, i.e. a partial area of the metallic reflective plating may be a sub-plating belonging to a multi-layer interference light variation plating.
Optionally, the material of the metal reflective coating includes: one metal of aluminum, silver, copper, tin, chromium, nickel and titanium, or an alloy formed by combining at least any two metals of aluminum, silver, copper, tin, chromium, nickel and titanium.
Preferably, the material of the metal reflective coating is aluminum.
Optionally, the multilayer interference light variable plating layer comprises: a reflective layer, a dielectric layer, and an absorbing layer;
the material of the reflecting layer comprises: one metal of aluminum, silver, copper, tin, chromium, nickel and titanium, or an alloy formed by combining at least any two metals of aluminum, silver, copper, tin, chromium, nickel and titanium;
the mediumThe material of the electrical layer includes: magnesium fluoride (MgF)2) Silicon dioxide (SiO)2) Zinc sulfide (ZnS), titanium nitride (TiN), titanium dioxide (TiO)2) Titanium monoxide (TiO), titanium sesquioxide (Ti)2O3) Titanium (IV) pentoxide (Ti)3O5) Tantalum pentoxide (Ta)2O5) Niobium pentoxide (Nb)2O5) Cerium oxide (CeO)2) Bismuth trioxide (Bi)2O3) Chromium oxide (Cr)2O3) Iron oxide (Fe)2O3) Hafnium oxide (HfO)2) Or zinc oxide (ZnO);
the material of the absorption layer comprises: one metal of nickel, chromium, aluminum, silver, copper, tin and titanium, or an alloy formed by combining at least any two metals of nickel, chromium, aluminum, silver, copper, tin and titanium.
Preferably, the material of the reflecting layer is aluminum;
the material of the absorption layer is nickel or chromium, or nickel-chromium alloy.
Optionally, the relief structure layer further includes: a third region having a third microstructure;
the structural parameter of the third microstructure is larger than that of the second microstructure;
the third region is free of the first plating layer or the second plating layer;
and when in transmission observation, the third area has hollow-out characteristics relative to the first area and the second area. Thus, when the optical anti-counterfeiting element is observed in a transmission mode, the third area of the optical anti-counterfeiting element has a hollow-out characteristic; that is, the image area formed by the hollow area and the two plating layers is also positioned in a zero error mode, so that the anti-counterfeiting characteristic is more excellent.
Optionally, the third microstructure is: one of a periodic structure and a non-periodic structure, or a structure in which a periodic structure and a non-periodic structure are combined;
the section of the third microstructure along the extension direction is as follows: the grating structure comprises a sinusoidal structure, a rectangular grating structure, a trapezoidal grating structure and a blazed grating structure, or a structure formed by combining at least any two structures of the sinusoidal structure, the rectangular grating structure, the trapezoidal grating structure and the blazed grating structure. The third microstructure is generally used for hollowing out, and does not provide an additional optical effect, so that simplification can be achieved, for example, a blazed grating which is arranged in one dimension and has an isosceles triangle cross section and a larger depth-to-width ratio or a larger specific volume is provided.
Optionally, the structural parameter is an aspect ratio; the depth-to-width ratio of the third microstructure is in a range of more than 0.3 and less than 1.
Optionally, the structural parameter is specific volume; the range of the specific volume of the third microstructure is more than 1um3/um2And less than 3um3/um2。
Optionally, one of the first plating layer and the second plating layer is a multilayer interference light variable plating layer; the multilayer interference light variable plating layer comprises: a reflective layer, a dielectric layer, and an absorbing layer.
Optionally, the third region does not have any of a reflective layer, a dielectric layer, or an absorbing layer. In this case, the third region is completely or substantially completely transparent.
Optionally, the third region has an absorption layer and a dielectric layer and does not have a reflective layer. At this time, the third region is translucent.
The embodiment of the invention provides a manufacturing method of an optical anti-counterfeiting element, which comprises the following steps:
s1) forming a relief structure layer, wherein the relief structure layer has a first region and a second region, the first region has a first microstructure and the second region has a second microstructure, and the second microstructure has a characteristic that a structural parameter of the second microstructure is larger than that of the first microstructure;
s2) forming a plating layer for obtaining a first plating layer;
s3) forming a first protective layer;
s4) placing the semi-finished product of step S3) in an atmosphere capable of reacting with the plating layer formed in step S2) until part or all of the plating layer formed in step S2) located at the second region is removed, so that the first plating layer is obtained after the reaction is stopped and the first plating layer and the first microstructure exhibit a combined optical characteristic at the first region;
s5) for obtaining the second plating layer.
Specifically, step S1) further includes:
the relief structure layer further comprises a third region, the third region comprises a third microstructure, and the third microstructure is characterized in that the structural parameters of the third microstructure are larger than those of the second microstructure.
Specifically, step S1) further includes:
wherein the second microstructure is characterized in that the structural sub-parameter of the second microstructure is greater than the structural sub-parameter of the first microstructure;
wherein the structural parameter is a selected one of an aspect ratio and a specific volume;
wherein the structural sub-parameter is a remaining one of the aspect ratio and the specific volume with respect to the structural parameter.
Specifically, step S1) further includes:
wherein the structural parameters include: aspect ratio or specific volume.
If the precise removal of the plating layer on the specific microstructure is realized based on the difference of the depth-to-width ratio, a protective layer is formed on the plating layer by adopting a vapor deposition process; for example, if the aspect ratio of the first microstructure is smaller than that of the second microstructure, after vapor deposition of the protective layer, the protective layer on the second microstructure is more porous or has more cracks than the protective layer on the first microstructure, and thus is less protective; in this way, after a certain time in the etching atmosphere, the coating on the second microstructure is removed, while the coating on the first microstructure is not or substantially not etched, so that a coating precisely located on the first microstructure is obtained; in short, by using the vapor deposition protective layer process, a plating layer precisely located on a microstructure having a small aspect ratio can be obtained.
If the precise removal of the plating layer on the specific microstructure is realized based on the difference of the specific volumes, a protective layer is formed on the plating layer by adopting a coating process; for example, if the specific volume of the first microstructure is smaller than that of the second microstructure, then after a certain amount of liquid protective paste is applied and dried by leveling, the minimum thickness of the protective layer on the second microstructure is smaller than that on the first microstructure (generally on the top of the microstructure), so that the protective paste is less protective on the second microstructure and better protective on the first microstructure; in this way, after a certain time in the etching atmosphere, the coating on the second microstructure is removed, while the coating on the first microstructure is not or substantially not etched, so that a coating precisely located on the first microstructure is obtained; in short, with the process of applying a protective layer, a coating layer can be obtained that is precisely located on a microstructure having a small specific volume.
Obviously, if the aspect ratio of the first microstructure is smaller than that of the second microstructure and the specific volume of the first microstructure is smaller than that of the second microstructure, the coating layer accurately positioned on the first microstructure can be obtained by using the vapor deposition protective layer process and the protective layer coating process.
Specifically, the manufacturing method further comprises the following steps:
s6) forming a second protective layer;
s7) placing the product of step S6) in an atmosphere capable of reacting with the plating layer formed in step S5) until part or all of the plating layer formed in step S5) located in the third region is removed, so that the second plating layer is obtained after the reaction is stopped and the second plating layer and the second microstructure exhibit combined optical characteristics at the second region, and further so that the third region has cut-out characteristics with respect to the first region and the second region when viewed in transmission.
Specifically, the plating layer used for obtaining the first plating layer in the step S2) and/or the plating layer used for obtaining the second plating layer in the step S5) has an aluminum layer;
wherein the atmosphere capable of reacting with the coating in step S2) and/or the atmosphere capable of reacting with the coating in step S5) is selected to be an acid solution, or the atmosphere capable of reacting with the coating in step S2) and/or the atmosphere capable of reacting with the coating in step S5) is selected to be an alkali solution.
Specifically, the manufacturing method further comprises the following steps:
and applying an inorganic or organic coating or an inorganic or organic coating process to realize an additional optical anti-counterfeiting function or an auxiliary function.
Additional features and advantages of embodiments of the invention will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the embodiments of the invention without limiting the embodiments of the invention. In the drawings:
fig. 1 is a schematic top-view structural diagram of a first exemplary optical security element according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of a first exemplary optical security element according to an embodiment of the present invention;
FIG. 3 is a schematic cross-sectional view of a first exemplary optical security element according to an embodiment of the present invention;
FIG. 4 is a schematic top-view structural diagram of a second exemplary optical security element in accordance with an embodiment of the present invention;
FIG. 5 is a schematic cross-sectional view of a second exemplary optical security element according to an embodiment of the present invention;
FIG. 6 is a schematic cross-sectional view of a second exemplary optical security element according to an embodiment of the present invention;
fig. 7 is a detailed cross-sectional structural diagram of a second exemplary optical security element according to an embodiment of the present invention, in which the third region has a dielectric layer and an absorption layer;
fig. 8 is a schematic cross-sectional view of a first exemplary optical security element after forming a relief structure layer according to an embodiment of the present invention;
FIG. 9 is a schematic cross-sectional view of a first exemplary optical security element after a first cladding layer is formed thereon according to an embodiment of the present invention;
FIG. 10 is a cross-sectional view of a first exemplary optical security element after forming a first protective layer according to an embodiment of the present invention;
FIG. 11 is a schematic cross-sectional view of a first exemplary optical security element after reaction in a corrosive atmosphere in accordance with an embodiment of the present invention;
FIG. 12 is a schematic cross-sectional view of a first exemplary optical security element after a second cladding layer is formed thereon according to an embodiment of the present invention;
fig. 13 is a schematic cross-sectional view of a second exemplary optical security element after forming a relief structure layer according to an embodiment of the present invention;
FIG. 14 is a schematic cross-sectional view of a second exemplary optical security element after a first cladding layer is formed thereon according to an embodiment of the present invention;
FIG. 15 is a cross-sectional view of a second exemplary optical security element after forming a first protective layer according to an embodiment of the present invention;
FIG. 16 is a schematic cross-sectional view of a second exemplary optical security element after a first etching ambient reaction according to an embodiment of the present invention;
FIG. 17 is a schematic cross-sectional view of a second exemplary optical security element after a second cladding layer is formed thereon according to an embodiment of the present invention;
fig. 18 is a schematic cross-sectional view of a second exemplary optical security element after a second protective layer is formed thereon according to an embodiment of the present invention;
FIG. 19 is a schematic cross-sectional view of a second exemplary optical security element after a second reaction in a first corrosive atmosphere in accordance with an embodiment of the present invention;
fig. 20 is a schematic cross-sectional structure diagram of a second exemplary optical security element after a second reaction in a second etching atmosphere according to an embodiment of the present invention.
Description of the reference numerals
1 substrate 2 relief structure layer
3 first plating layer 4 first protective layer
5 second plating layer 51 absorption layer
52 dielectric layer 53 reflective layer
6 second protective layer 7 other functional coating
A a first region B a second region
C third region
Detailed Description
The following detailed description of embodiments of the invention refers to the accompanying drawings. It should be understood that the detailed description and specific examples, while indicating embodiments of the invention, are given by way of illustration and explanation only, not limitation.
- 上一篇：一种医用注射器针头装配设备
- 下一篇：一种多功能企业财务核算系统