Vacuum nitrogen-filling humidity control device and vacuum nitrogen-filling environment humidity adjusting method
阅读说明:本技术 一种真空充氮控湿装置及真空充氮环境湿度调节方法 (Vacuum nitrogen-filling humidity control device and vacuum nitrogen-filling environment humidity adjusting method ) 是由 不公告发明人 于 2020-08-17 设计创作,主要内容包括:本发明涉及一种真空充氮控湿装置,包括:气密围护,所述气密围护具有刚性结构;真空泵,其连接到所述气密围护,经配置以抽取所述气密围护中的气体;控湿装置,其连接在所述氮气气源与所述气密围护之间,配置为调节输入所述气密围护的氮气湿度;氮气气源,其与控湿装置相连,经配置以向所述气密围护提供氮气;以及控制器,其经配置以控制真空泵抽取所述气密围护中的气体,以及控制氮气气源向所述气密围护提供氮气。本发明还涉及一种真空充氮环境湿度调节方法。(The invention relates to a vacuum nitrogen-filling humidity-controlling device, which comprises: an airtight enclosure having a rigid structure; a vacuum pump connected to the gas-tight enclosure configured to draw gas in the gas-tight enclosure; the humidity control device is connected between the nitrogen source and the airtight enclosure and is configured to adjust the humidity of the nitrogen input into the airtight enclosure; a nitrogen gas source connected to a humidity control device configured to provide nitrogen gas to the airtight enclosure; and a controller configured to control a vacuum pump to pump gas in the gas-tight enclosure and to control a nitrogen gas source to provide nitrogen gas to the gas-tight enclosure. The invention also relates to a method for adjusting the humidity of the vacuum nitrogen-filled environment.)
1. A vacuum nitrogen-filled humidity control device, comprising:
an airtight enclosure having a rigid structure;
a vacuum pump connected to the gas-tight enclosure configured to draw gas in the gas-tight enclosure;
the humidity control device is connected between the nitrogen source and the airtight enclosure and is configured to adjust the humidity of the nitrogen input into the airtight enclosure;
a nitrogen gas source connected to a humidity control device configured to provide nitrogen gas to the airtight enclosure; and
a controller configured to control a vacuum pump to draw gas in the gas-tight enclosure and to control a nitrogen gas source to provide nitrogen gas to the gas-tight enclosure.
2. The vacuum nitrogen-filled humidity control device of claim 1, wherein the humidity control device comprises a humidification line and a drying line, the controller configured to control the nitrogen gas from the nitrogen gas source to pass through the humidification line and/or the drying line to control the proportion of gas of the nitrogen gas source.
3. The vacuum nitrogen-filled humidity control device according to claim 1, wherein the nitrogen gas output pressure of the nitrogen gas source is not lower than 10Pa and not higher than 100 kPa.
4. The vacuum nitrogen filled humidity control device of claim 1, wherein the controller is configured to activate a nitrogen gas source in response to a vacuum level of the airtight enclosure reaching a first threshold.
5. The vacuum nitrogen-filled humidity control device according to claim 4, wherein the first threshold value is 10 to 30kPa absolute.
6. The vacuum nitrogen-filled humidity control device of claim 1, wherein the controller is configured to control the vacuum pump to pump gas in the airtight enclosure again in response to a vacuum level of the airtight enclosure reaching a second threshold.
7. The vacuum nitrogen-filled humidity control device of claim 6, wherein the controller is configured to perform two coarse adjustments during the nitrogen filling process until the humidity inside the airtight enclosure approaches the preset value by about 5%, measure the actual humidity inside the airtight enclosure, perform multiple fine adjustments to approach the preset value, and adjust the humidity inside the airtight enclosure to the preset humidity range during the last nitrogen filling process.
8. The vacuum nitrogen-filled humidity control device of claim 1, wherein the controller is configured to adjust the humidity within the airtight enclosure to a preset humidity range in response to a change in humidity within the airtight enclosure exceeding a preset amount of change.
9. The vacuum nitrogen-filled humidity control device of claim 1, wherein the controller is configured to control the vacuum pump to first pump gas in the airtight enclosure until a gas pressure value equals a preset value in response to the gas pressure value of the airtight enclosure being higher than a preset value.
10. The vacuum nitrogen-filled humidity control device of claim 1, wherein the controller is configured to control a nitrogen gas source to re-perform gas replacement and humidity control on the air-tight enclosure in response to the oxygen concentration of the air-tight enclosure being above a preset value.
11. A method for adjusting the humidity of a vacuum nitrogen-filled environment comprises the following steps:
extracting gas in the airtight enclosure;
starting a nitrogen source to pass through a humidity control device in response to the fact that the vacuum degree of the airtight enclosure reaches a first threshold value;
providing nitrogen to the airtight enclosure to a second threshold using the nitrogen source;
pumping the gas in the airtight enclosure again to the first threshold value;
adjusting the humidity of the nitrogen for the second time based on a preset humidity range;
and detecting the actual humidity in the airtight enclosure, finely adjusting for multiple times to be close to a preset value, and adjusting the humidity in the airtight enclosure to be within a preset humidity range in the last nitrogen filling process.
12. The method of claim 11, further comprising: and responding to the fact that the humidity change in the airtight enclosure exceeds a preset change amount, and adjusting the humidity in the airtight enclosure to be within a preset humidity range.
Technical Field
The present invention relates to a humidity control device, and more particularly, to a humidity control device and a humidity control method for a vacuum nitrogen charging system.
Background
Chinese has a long history of five thousand years and a brilliant culture, and a large amount of precious cultural relics are left in the past. However, these precious items, especially organic cultural relics, are extremely susceptible to corrosion and destruction due to the fact that their major components (cellulose, hemicellulose, proteins, starch and lignin) can be absorbed and metabolized by insects or microorganisms.
Researches show that the aging speed and the damage degree of the cultural relic archives can be accelerated by the combined action of various environmental factors such as temperature, humidity, illumination, air pollutants, pH value, mould and insect pests and the like. In contrast, the violent change of humidity will cause more serious damage to the cultural relics and archives, the humidity will be reduced rapidly during the vacuum process, and the humidity suitable for storing the organic material collections (books, archives, etc.) is 40-60% RH. However, the currently and generally applied vacuum nitrogen-filled insect killing device cannot effectively regulate and control the humidity, so that the damage to organic cultural relics cannot be brought in the insect killing process.
Therefore, a humidity control method for a vacuum nitrogen charging device is needed, which can effectively kill insects and inhibit bacteria, and can well protect organic material collections.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention provides a vacuum nitrogen-filling humidity control device, which comprises: a sealed enclosure having a rigid structure; a vacuum pump connected to the gas-tight enclosure configured to draw gas in the gas-tight enclosure; the humidity control device is connected between the nitrogen source and the airtight enclosure and is configured to adjust the humidity of the nitrogen input into the airtight enclosure; a nitrogen gas source connected to a humidity control device configured to provide nitrogen gas to the airtight enclosure; and a controller configured to control a vacuum pump to pump gas in the gas-tight enclosure and to control a nitrogen gas source to provide nitrogen gas to the gas-tight enclosure.
In particular, the humidity control device comprises a humidifying pipeline and a drying pipeline, and the controller is configured to control the nitrogen from the nitrogen source to pass through the humidifying pipeline and/or the drying pipeline so as to control the proportion of the gas of the nitrogen source.
In particular, the nitrogen output pressure of the nitrogen gas source is not lower than 10Pa and not higher than 100 kPa.
In particular, wherein the controller is configured to activate the nitrogen gas source in response to a vacuum level of the airtight enclosure reaching a first threshold.
Particularly, the first threshold value is 10-30 kPa absolute pressure.
In particular, wherein the controller is configured to control the vacuum pump to pump gas out of the gas-tight enclosure again in response to the vacuum level of the gas-tight enclosure reaching a second threshold.
Specifically, the controller is configured to perform two coarse adjustments during the nitrogen filling process until the humidity inside the airtight enclosure approaches a preset value and differs by about 5%, measure the actual humidity inside the airtight enclosure, perform multiple fine adjustments until the humidity approaches the preset value, and adjust the humidity inside the airtight enclosure to be within a preset humidity range during the last nitrogen filling process.
In particular, wherein the controller is configured to adjust the humidity within the airtight enclosure to a preset humidity range in response to a change in humidity within the airtight enclosure exceeding a preset amount of change.
In particular, wherein the controller is configured to control the vacuum pump to first pump gas from the gas-tight enclosure until the gas pressure value is equal to a preset value in response to the gas pressure value of the gas-tight enclosure being higher than the preset value.
In particular, wherein the controller is configured to control the nitrogen gas source to re-perform gas replacement and humidity control on the gas-tight enclosure in response to the oxygen concentration of the gas-tight enclosure being above a preset value.
The application further includes a method for adjusting humidity in a vacuum nitrogen-filled environment, comprising: extracting gas in the airtight enclosure; starting a nitrogen source to pass through a humidity control device in response to the fact that the vacuum degree of the airtight enclosure reaches a first threshold value; providing nitrogen to the airtight enclosure to a second threshold using the nitrogen source; pumping the gas in the airtight enclosure again to the first threshold value; adjusting the humidity of the nitrogen for the second time based on a preset humidity range; and detecting the actual humidity in the airtight enclosure, finely adjusting for multiple times to be close to a preset value, and adjusting the humidity in the airtight enclosure to be within a preset humidity range in the last nitrogen filling process.
In particular, the method further comprises: and responding to the fact that the humidity change in the airtight enclosure exceeds a preset change amount, and adjusting the humidity in the airtight enclosure to be within a preset humidity range.
The vacuum nitrogen-filling humidity control device and the humidity control method can accurately regulate and control the humidity in the airtight enclosure, not only can realize insecticidal operation, but also pay attention to the protection operation of organic cultural relics. In the initial stage, the humidity parameter in the airtight enclosure can be adjusted to a preset value through multiple step-by-step adjustment. Then, in the subsequent maintenance stage, the environmental parameters such as the humidity in the airtight enclosure and the like can be monitored in real time so as to perform dynamic maintenance. High-precision adjustment can be realized in both adjustment processes.
Drawings
Preferred embodiments of the present invention will now be described in further detail with reference to the accompanying drawings, in which:
FIG. 1 is a schematic structural diagram of a vacuum nitrogen-filled humidity control device according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a vacuum nitrogen-filled humidity control device according to an embodiment of the present invention;
FIG. 3 is a flow chart of a humidity adjustment method for a vacuum nitrogen-filled environment according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the following detailed description, reference is made to the accompanying drawings that form a part hereof and in which is shown by way of illustration specific embodiments of the application. In the drawings, like numerals describe substantially similar components throughout the different views. Various specific embodiments of the present application are described in sufficient detail below to enable those skilled in the art to practice the teachings of the present application. It is to be understood that other embodiments may be utilized and structural, logical or electrical changes may be made to the embodiments of the present application.
The invention provides a vacuum nitrogen-filling humidity-controlling device. Fig. 1 is a schematic structural diagram of a vacuum nitrogen-filled humidity control device according to an embodiment of the present invention. As shown in fig. 1, the vacuum nitrogen-filled humidity control device comprises: the device comprises a nitrogen generating device 1, a humidifying
The nitrogen generating device 1 is a nitrogen source configured to provide high-purity nitrogen gas to a vacuum nitrogen-filled humidity control device. The nitrogen output pressure of the nitrogen generating device 1 is not lower than 10Pa and not higher than 100 kPa.
The gas outlet of the nitrogen generating device 1 is respectively connected to the humidifying
In some embodiments, the
The
The nitrogen gas generating device 1, the humidifying
The moisture control principle of the device is further explained in connection with fig. 1.
As shown in figure 1, the device adopts a parallel humidity control system, namely, the humidity of nitrogen entering the
The humidity control system shown in fig. 1 operates as follows:
first, relevant parameters, such as a first threshold (pumping vacuum degree), a second threshold (nitrogen charging vacuum degree), pumping and nitrogen charging times, preset air pressure, humidity, and the like, are set on the
During the nitrogen filling period, the controller can calculate the time that the nitrogen filled in each time needs to pass through the humidifying pipeline and/or the drying pipeline in the previous two nitrogen filling processes according to the preset humidity and the current humidity in the
Next, the
In the coarse adjustment process, the gas humidity value of the nitrogen after passing through the humidifying pipeline or the drying pipeline is a fixed value, so the humidity after the nitrogen is mixed with the gas in the
Next, the
In the fine adjustment process, the humidity detection device 7 detects the actual humidity value in the
In some embodiments, the preset air pressure is normal pressure, and after the humidity adjustment is completed, when the air pressure inside the
The device then enters a maintenance phase. When the humidity value in the
In the stage of filling nitrogen or maintaining, if the humidity value has reached the preset humidity but the oxygen content has not reached the set value, the
As shown in fig. 1, the
In some embodiments, the vacuum nitrogen-charging humidity-controlling device of the present invention needs to periodically repeat the above-mentioned process of pumping and charging nitrogen in order to further maintain the air pressure or oxygen concentration inside the
The invention provides another vacuum nitrogen-filling humidity-controlling device. Fig. 2 is a schematic structural diagram of a parallel humidity control vacuum nitrogen-filled humidity control device according to an embodiment of the present invention. As shown in fig. 2, the vacuum nitrogen-filled humidity control device comprises: the device comprises a
The adjustment process of the structure shown in fig. 2 is slightly different, and the same or similar parts to the structure shown in fig. 1 are not described herein again. The
As shown in fig. 2, the piping is simpler. When the humidity of the gas entering the vacuum
The invention also relates to a humidity adjusting method for a vacuum nitrogen-filled environment, as shown in fig. 3, before the equipment is started, parameters such as a first pressure threshold, a second pressure threshold, a preset air pressure, a preset humidity, an oxygen content, a return difference and the like are set on a touch screen, and then the equipment is carried out according to the following steps:
step 301: the gas in the gas tight enclosure is pumped down to a first pressure threshold in the gas tight enclosure. Wherein the first threshold value is 10-30 kPa absolute pressure. In some embodiments, the evacuation device is a vacuum pump.
Step 302: and starting a nitrogen source to pass through a humidity control device in response to the fact that the vacuum degree of the airtight enclosure reaches a first threshold value. In some embodiments, the humidity control device comprises: a humidifying electromagnetic valve, a humidifying device and a drying electromagnetic valve. The dry-wet ratio of the nitrogen is adjusted by adjusting the time of the nitrogen passing through the humidifying branch and/or the drying branch.
Step 303: providing nitrogen to the gas tight enclosure to a second threshold using the nitrogen source. The gas generating device fills nitrogen to the airtight enclosure through the humidity control device. The purpose of this step is a first coarse moisture adjustment.
Step 304: the gas in the gas tight enclosure is pumped again to the first threshold. The purpose here is to remove oxygen again, while the humidity inside the airtight enclosure is unchanged.
Step 305: and filling nitrogen for the second time for the airtight enclosure. The nitrogen generating device charges nitrogen to the airtight enclosure again through the humidity control device, and the purpose of nitrogen charging is not only the second rough adjustment of the humidity, but also the reduction of the oxygen content, so as to achieve lower oxygen concentration.
In some embodiments, before step 301, the time that the nitrogen gas needs to pass through the humidifying pipeline and/or the drying pipeline in each of the two previous nitrogen charging processes is calculated according to the preset humidity and the current humidity in the air-tight enclosure so as to control the dry-wet ratio of the charged nitrogen gas.
In the coarse adjustment process, the gas humidity value of the nitrogen after passing through the humidifying pipeline or the drying pipeline is a fixed value, so the humidity after the nitrogen is mixed with the gas in the
Step 306: and detecting the actual humidity in the airtight enclosure, finely adjusting for multiple times to be close to a preset value, and adjusting the humidity in the airtight enclosure to be within a preset humidity range in the last nitrogen filling process.
In some embodiments, the method further comprises:
step 307: and adjusting the air pressure in the airtight enclosure to a preset air pressure value. In some embodiments, the air pressure value inside the airtight enclosure is detected, and when the air pressure value is greater than the preset air pressure, the air inside the airtight enclosure is extracted again, so that the air pressure value is reduced to the preset value. When the pressure value is smaller than the preset pressure, the nitrogen source is started again to pass through the humidity control device, the nitrogen is controlled to pass through the humidifying and/or drying pipeline to maintain the humidity in the airtight enclosure within the preset range in the manner, and the pressure value is increased to the preset value.
In some embodiments, the method further comprises:
step 308: and responding to the change of the humidity or the oxygen content in the airtight enclosure exceeding the preset change amount, and adjusting the humidity or the oxygen content in the airtight enclosure to be within the preset range by the method.
In some embodiments, the method can be applied to the vacuum nitrogen-filled humidity control device.
The method can accurately regulate and control the humidity of the vacuum nitrogen filling device, provides a stable low-oxygen environment with proper humidity, can realize insecticidal operation, and pays attention to the protection of organic cultural relics. Firstly, in the initial stage, parameters such as humidity, oxygen content and the like in the airtight enclosure can be adjusted to preset values through multiple step-by-step adjustment. Then, the gas environment parameters in the airtight enclosure can be monitored in real time in the subsequent maintenance stage, so that dynamic maintenance can be carried out. High-precision adjustment can be realized in both adjustment processes. The nitrogen-filled humidity control device and the nitrogen-filled humidity control method adopt a synchronous regulation mode to realize synchronous regulation of oxygen content and humidity in the airtight enclosure, the whole device and the regulation process can be controlled and monitored through a touch screen, and the operation is simple.
The above embodiments are provided only for illustrating the present invention and not for limiting the present invention, and those skilled in the art can make various changes and modifications without departing from the scope of the present invention, and therefore, all equivalent technical solutions should fall within the scope of the present invention.
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