阅读说明：本技术 一种mmg掩模板的制作方法 (Manufacturing method of MMG mask plate ) 是由 李春兰 于 2020-07-23 设计创作，主要内容包括：本发明实施例涉及光刻技术领域,公开了一种MMG掩模板的制作方法,该方法通过制作MMG掩模板的数据；分析数据中像素间隔值,将数据中X轴方向像素间隔值相同或/和Y轴方向像素间隔值相同的panel划分为同一曝光区域；将同一曝光区域内所有panel设计到同一图层；设置每个曝光区域的曝光参数,并在设置好曝光参数后进行格式转换；投入MMG掩模板原材料,根据转换后的曝光参数,按照曝光参数,依序对每个同一图层进行曝光；之后依照常规掩模板制作流程进行生产,直至获得MMG掩模板,本发明实施例提供的MMG掩模板的制作方法,在不需要通过光刻机设备自带收费软件功能,实现了MMG掩模板的制作,降低了生产成本。(The embodiment of the invention relates to the technical field of photoetching, and discloses a method for manufacturing an MMG mask plate, which comprises the steps of manufacturing data of the MMG mask plate; analyzing pixel interval values in the data, and dividing panel with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data into the same exposure area; designing all the panel in the same exposure area to the same layer; setting exposure parameters of each exposure area, and performing format conversion after the exposure parameters are set; inputting MMG mask plate raw materials, and sequentially exposing each same layer according to the converted exposure parameters and the exposure parameters; the MMG mask plate is produced according to a conventional mask plate manufacturing flow until the MMG mask plate is obtained.)

1. A method for manufacturing an MMG mask plate is characterized by comprising the following steps:

making data of an MMG mask plate, wherein the data comprises an X-axis direction pixel interval value and a Y-axis direction pixel interval value of each display screen panel;

analyzing pixel interval values in the data, and dividing panel with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data into the same exposure area;

designing all the panel in the same exposure area to the same layer, or setting a covering layer corresponding to each exposure area;

setting exposure parameters of each exposure area, and performing format conversion after the exposure parameters are set;

inputting MMG mask plate raw materials, and sequentially exposing each same layer or covering an exposure area outside the layer for exposure according to the converted exposure parameters and the exposure parameters;

and (4) producing according to a conventional mask plate manufacturing flow until an MMG mask plate is obtained.

2. The method for manufacturing an MMG mask blank according to claim 1, wherein the number of the exposure areas is arbitrarily many and is greater than 1.

3. The method for manufacturing an MMG mask blank according to claim 1, wherein the number of panels in the exposure area is any number and is greater than or equal to 1.

4. The method for manufacturing an MMG mask blank according to claim 1, wherein the designing all the panels in the same exposure area to the same layer comprises:

and setting the same exposure area on a corresponding image layer so as to set exposure parameters corresponding to each exposure area.

5. The method for manufacturing an MMG mask blank according to claim 1, wherein the setting of the covering layers corresponding to the same exposure area comprises:

setting other exposure areas except the first exposure area as covering layers corresponding to the first exposure area so as to complete independent exposure of the first exposure area;

setting other exposure areas except the second exposure area as covering layers corresponding to the second exposure area so as to complete the independent exposure of the second exposure area;

according to the method, the covering layers corresponding to the residual unexposed exposure areas are gradually completed until the exposure of all the exposure areas is completed.

6. The method for manufacturing an MMG reticle set according to claim 1, wherein the conventional reticle manufacturing process comprises:

developing the MMG mask plate in the exposed manufacture;

etching the developed MMG mask plate in the manufacture process;

measuring the etched MMG mask plate in the manufacture process;

inspecting the MMG mask plate in the measured manufacture;

repairing the checked manufacturing MMG mask plate;

pasting a film on the repaired MMG mask plate in the manufacturing process;

and packaging and delivering the MMG finished by the film.

7. The method for manufacturing an MMG mask blank according to claim 1, wherein the sequence of the exposure process can be set arbitrarily.

8. The method for manufacturing an MMG mask blank according to claim 1, wherein the panel size in the exposure area can be the same or different.

9. The method for manufacturing an MMG mask blank according to claim 1, wherein the size and shape of the pixel images in the panel can be the same or different.

10. The method of claim 1, wherein the reticle stock comprises MMG reticle stock or common reticle stock.

Technical Field

The embodiment of the invention relates to the technical field of photoetching, in particular to a method for manufacturing an MMG mask plate.

Background

MMG mask plate (multi model on glass) is one of the key materials for producing TFT-LCD/AMOLED, and has been paid more and more attention in recent years to the improvement of manufacturing technology, especially to the production of MMG layout design. The MMG product refers to that a TFT-LCD/AMOLED panel factory simultaneously designs several types of panel on the same mask plate, and requires that the panel of each specification guarantees the product quality, and the guarantee of the product quality refers to the aspects of stripe management and control, line precision uniformity control and the like. For a mask plate manufacturing company, through the development of MMG layout mask plate product technologies, the production quantity of orders is increased, and the competitive force in the mask plate manufacturing industry is improved.

As shown in fig. 1, when exposing a common mask plate product, usually no other operation is needed in the design link, and only the exposure parameters of the mask plate panel are set in the exposure parameters, and then the exposure format is converted to further complete scanning exposure. Not only the manufacturing process is as follows: mask plate manufacturing data, data pre-exposure parameter setting, exposure data format conversion, mask plate raw material input, exposure, development, etching, measurement, inspection, repair, film pasting, packaging and shipment.

At present, the MMG mask manufacturing method shown in FIG. 2 can also achieve the mask quality of MMG mode products through the self-contained software function of the photoetching machine. The production and manufacturing process is approximately the same as the production process of a common mask plate, other auxiliary designs are not needed in the design link, and only in the parameter setting link, the boundary coordinate points of different areas needing to be controlled in quality are set on the pre-exposure parameter setting interface. During exposure, the lens of the photoetching machine performs exposure through the set coordinate points. Every time one region is completed, the lens moves to the next region with reference to the set coordinate position, and exposure is started at the position where the exposure start point is set. However, this function is an additional service item for the lithography software, and it is necessary to purchase this service function for an additional fee from the equipment supplier.

Therefore, there is a need for a method for manufacturing an MMG mask that does not require a charging software function of a lithography apparatus to complete the MMG mask manufacturing.

Disclosure of Invention

The technical problem mainly solved by the embodiment of the invention is to provide a method for manufacturing an MMG mask plate, which can solve the problems that the conventional MMG mask plate needs to be manufactured with a self-provided charging software function through photoetching equipment and is high in cost.

In order to solve the above technical problem, one technical solution adopted by the embodiments of the present invention is: a manufacturing method of an MMG mask plate is provided, and the method comprises the following steps:

making data of an MMG mask plate, wherein the data comprises an X-axis direction pixel interval value and a Y-axis direction pixel interval value of each display screen panel;

analyzing pixel interval values in the data, and dividing panel with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data into the same exposure area;

designing all the panel in the same exposure area to the same layer, or setting a covering layer corresponding to each exposure area;

setting exposure parameters of each exposure area, and performing format conversion after the exposure parameters are set;

inputting MMG mask plate raw materials, and sequentially exposing each same layer or covering an exposure area outside the layer for exposure according to the converted exposure parameters and the exposure parameters;

and (4) producing according to a conventional mask plate manufacturing flow until an MMG mask plate is obtained.

Further, the number of the exposure areas is any number and is larger than 1.

Further, the number of panel in the exposure area is arbitrary and is 1 or more.

Further, the designing all the panel in the same exposure area to the same layer includes:

and setting the same exposure area on a corresponding image layer so as to set exposure parameters corresponding to each exposure area.

Further, the setting of the covering layer corresponding to the same exposure area includes:

setting other exposure areas except the first exposure area as covering layers corresponding to the first exposure area so as to complete independent exposure of the first exposure area;

setting other exposure areas except the second exposure area as covering layers corresponding to the second exposure area so as to complete the independent exposure of the second exposure area;

according to the method, the covering layers corresponding to the residual unexposed exposure areas are gradually completed until the exposure of all the exposure areas is completed.

Further, the conventional mask plate manufacturing process includes:

developing the MMG mask plate in the exposed manufacture;

etching the developed MMG mask plate in the manufacture process;

measuring the etched MMG mask plate in the manufacture process;

inspecting the MMG mask plate in the measured manufacture;

repairing the checked manufacturing MMG mask plate;

pasting a film on the repaired MMG mask plate in the manufacturing process;

and packaging and delivering the MMG finished by the film.

Further, the order of the exposure process may be set arbitrarily.

Further, the panel size within the exposed area may be the same or different.

Further, the size, shape of the pixel image within the panel may be the same or different.

Further, the mask blank material includes MMG mask blank material or general mask blank material.

The embodiment of the invention has the beneficial effects that: different from the situation of the prior art, the embodiment of the invention provides a method for manufacturing an MMG mask plate, which comprises the steps of manufacturing data of the MMG mask plate; analyzing pixel interval values in the data, and dividing panel with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data into the same exposure area; designing all the panels in the same exposure area to the same layer, or setting a covering layer corresponding to each exposure area; setting exposure parameters of each exposure area, and carrying out format conversion on the exposure parameters; inputting MMG mask plate raw materials, and exposing each same layer or covering an exposure area outside the layer for exposure according to the converted exposure parameters and the exposure parameters; according to the manufacturing method of the MMG mask plate, provided by the embodiment of the invention, the manufacturing of the MMG mask plate is realized without a self-provided charging software function of a photoetching machine, and the production cost is reduced.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the embodiments of the present invention will be briefly described below. It is obvious that the drawings described below are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.

FIG. 1 is a layout diagram of a display panel of the same specification of a common mask plate according to the background art of the present invention;

FIG. 2 is a design diagram of the panel distribution of an MMG mask plate provided by the background art of the invention;

fig. 3 is a flowchart of a method for manufacturing an MMG mask blank according to an embodiment of the present invention;

FIG. 4 is a schematic diagram of designing the same exposure region to the same layer according to an embodiment of the present invention;

FIG. 5 is a schematic illustration of the shielding of other exposure regions during the exposure of the first exposure region (i.e., the A region) according to the embodiment of the present invention;

FIG. 6 is a schematic illustration of the shielding of the other exposure regions during the exposure of the second exposure region (i.e., the B region) according to the embodiment of the present invention;

fig. 7 is a schematic view of blocking other exposure regions when the third exposure region (i.e., the C region) is exposed according to an embodiment of the present invention.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

Referring to fig. 3, a flow chart of a method for manufacturing an MMG mask blank is shown, which includes, but is not limited to, the following steps:

step 11: and manufacturing data of the MMG mask plate, wherein the data comprises an X-axis direction pixel interval value and a Y-axis direction pixel interval value of each display screen panel.

In the embodiment of the invention, the data comprises an X-axis direction pixel interval value and a Y-axis direction pixel interval value of each display screen panel, the data of an MMG mask plate is manufactured according to a customer design drawing, the sizes of pixel images in the panel on the MMG mask plate can be the same or different according to needs, and the shapes and the sizes of the pixel images in the panel can be the same or different; the panel sizes may be the same or different.

Step 12: analyzing the pixel interval value in the data, and dividing the panel with the same X-axis direction pixel interval value (pixel interval value) or/and the same Y-axis direction pixel interval value in the data into the same exposure area.

In the embodiment of the invention, the panels of the MMG mask plate are arranged in a mixed mode, and the data of the MMG mask plate are subjected to data analysis, so that the panels with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data are divided into the same exposure area. As shown in FIG. 2, after the arrangement, the first exposure region (i.e., region A) is composed of 8 panels having the same pixel interval value, the second exposure region (i.e., region B) is composed of 3 panels having the same pixel interval value, and the third exposure region (i.e., region C) is a new exposure region composed of 4 panels having the same pixel interval value. Data analysis is carried out on data which are arranged by mixing the MMG mask plate before exposure, and panels with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data are divided into the same exposure area. The purpose is to prevent the same exposure treatment on the same exposure area when exposing one exposure area, thereby preventing the same exposure treatment from being mistakenly exposed and playing a role in protection.

It should be noted that the panels with the same pixel interval value are not necessarily the same model of panel, that is, the panels with the same pixel interval value may be 2.2 ", 3.5" or 7.0 ", and the entire panel may be regarded as the same exposure region as long as the pixel interval values in the same direction of the key display regions in the panels are the same.

Step 13: and designing all the panel in the same exposure area to the same layer, or setting a covering layer corresponding to each exposure area.

In the embodiment of the invention, the exposure sequence of the exposure area can be set arbitrarily. The number of the exposure areas is any number and is more than 1, and the number of the panel in the exposure areas is any number and is more than or equal to 1. The pattern in the mask data exposure area may not be designed as a panel pattern.

Preferably, the designing all the panels in the same exposure region to the same layer comprises:

and setting the same exposure area on a corresponding image layer so as to set exposure parameters corresponding to each exposure area.

In the embodiment of the present invention, as shown in fig. 4, the image layers may be replaced by the patterns exposed in the area a, the area B, and the area C, that is, in the design, the patterns in the area A, B, C are placed in different image layers, and may be selectively placed in layerN, layerN +1, and layerN + 2. When the exposure parameters are set, the parameters before exposure are set for layerN, layerN +1 and layerN +2 respectively, and the exposure format conversion accepted by the equipment is completed. The method can also meet the quality requirement of the product mask plate in the MMG method.

In a preferred mode, the setting of the covering layer corresponding to each exposure area includes:

setting other exposure areas except the first exposure area as covering layers corresponding to the first exposure area so as to complete independent exposure of the first exposure area; as shown in fig. 5, in order to expose the pattern of the a region alone, the patterns of the B region and the C region are masked.

Setting other exposure areas except the second exposure area as covering layers corresponding to the second exposure area so as to complete the independent exposure of the second exposure area; as shown in fig. 6, in order to expose the pattern of the B area separately, the patterns of the a area and the C area are blocked in segments.

According to the method, the covering layers corresponding to the residual unexposed exposure areas are gradually completed until the exposure of all the exposure areas is completed. As shown in fig. 7, in order to expose the pattern of the C region alone, the patterns of the a region and the B region are masked.

In general, if exposure of the A area pattern with the same value of Pixel Pitch is started, a pattern covering B, C is additionally designed; if the pattern of the B area is exposed, a pattern is additionally designed to shield the pattern of the A, C area; similarly, if the pattern in area C is exposed, the pattern in area A, B is masked by adding a design pattern. And then respectively setting exposure parameters for A, B, C areas in sequence. Because the graphs of the A, B, C areas are all placed in the same layer, the complicated operation of replacing the layer is not needed, and two setting interfaces of the graphs of the B, C areas are correspondingly added on an exposure parameter setting interface only in a covering mode. The method can adopt non-sequential covering, as long as the graphic parameters of the area to be exposed are correspondingly set on an exposure parameter setting interface, and then the graphics of other non-exposed areas are covered without considering the covering sequence. The exposure machine can expose according to the sequence of the set parameters, and unexposed data cannot be dropped. The time required for the exposure of this method is too long.

For convenience of explanation, only the case of three exposure regions is exemplified here, but the method also uses the case of more exposure regions.

Step 14: and setting exposure parameters of each exposure area, and carrying out format conversion on the exposure parameters.

In the embodiment of the invention, the exposure parameters of the first exposure area, the second exposure area and the third exposure area are independently set, and the format conversion is carried out on the exposure parameters to convert the exposure parameters into the exposure data format accepted by exposure equipment.

Step 15: and throwing an MMG mask plate raw material, and exposing each same layer or covering an exposure area outside the layer for exposure according to the converted exposure parameters and the exposure parameters.

In this embodiment, the lithography machine may expose the same layer in multiple times during exposure. Or taking an area A with the same pixel interval value as an exposure area to start exposure, after exposure is finished according to exposure parameters set for the area A, repositioning a lens of the photoetching machine, further taking a graph of the area B as new exposure data according to the sequence of parameter setting before exposure, and starting to expose the graph of the area B; after the exposure of the B area pattern is completed, the exposure machine is repositioned to the C area, and the C area is treated as new exposure data. And similarly, exposing the pattern of the C area. Until the photoetching machine completes exposure on the whole MMG mask plate.

Step 16: and then, producing according to a conventional mask plate manufacturing flow until the MMG mask plate is obtained.

In the embodiment of the present invention, the conventional mask plate manufacturing process includes the following substeps:

substep 151: and developing the MMG mask plate in the exposed manufacture.

Substep 152: and etching the developed MMG mask plate in the manufacture process.

Substep 153: and measuring the etched MMG mask plate in the manufacture process.

Substep 154: and inspecting the MMG mask plate in the measured manufacture.

Substep 155: and repairing the checked MMG mask plate in the manufacture process.

Substep 156: and pasting the repaired MMG mask plate in the manufacture process.

Substep 157: and packaging and delivering the MMG subjected to film pasting, and finishing the manufacture of the MMG mask plate.

The embodiment of the invention provides a method for manufacturing an MMG mask plate, which comprises the steps of manufacturing data of the MMG mask plate; analyzing pixel interval values in the data, and dividing panel with the same pixel interval value in the X-axis direction or/and the same pixel interval value in the Y-axis direction in the data into the same exposure area; designing all the panels in the same exposure area to the same layer, or setting a covering layer corresponding to each exposure area; setting exposure parameters of each exposure area, and carrying out format conversion on the exposure parameters; inputting MMG mask plate raw materials, and exposing each same layer or covering an exposure area outside the layer for exposure according to the converted exposure parameters and the exposure parameters; the MMG mask plate is produced according to a conventional mask plate manufacturing flow until the MMG mask plate is obtained.

Through the above description of the embodiments, those skilled in the art will clearly understand that each embodiment can be implemented by software plus a general hardware platform, and certainly can also be implemented by hardware. It will be understood by those skilled in the art that all or part of the processes of the methods of the embodiments described above can be implemented by hardware related to instructions of a computer program, which can be stored in a computer readable storage medium, and when executed, can include the processes of the embodiments of the methods described above. The storage medium may be a magnetic disk, an optical disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), or the like.

Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; within the idea of the invention, also technical features in the above embodiments or in different embodiments may be combined, steps may be implemented in any order, and there are many other variations of the different aspects of the invention as described above, which are not provided in detail for the sake of brevity; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.