阅读说明：本技术 铜电积方法 (Copper electrodeposition method ) 是由 图姆·埃内贝勒 汉斯·格拉德 达安·霍夫曼 弗雷德里克·费尔哈格 于 2020-02-18 设计创作，主要内容包括：本发明涉及一种适合从高污染的电解液生产质量增强的阴极的铜电积方法。该方法在包括多个阳极和阴极、底部配备有气体喷射元件的电积槽中进行。它包括遍及阴极喷射气体的步骤,并且其特征在于该溶液含有大于100mg/L的砷。本发明提供了当处理高污染的电解液时,特别是当含有高浓度的砷时,对阴极质量问题的替代解决方案。(The present invention relates to a copper electrodeposition process suitable for producing quality-enhanced cathodes from highly contaminated electrolytes. The process is carried out in an electrodeposition cell comprising a plurality of anodes and cathodes, the bottom of which is equipped with gas injection elements. It comprises the step of sparging gas throughout the cathode and is characterized in that the solution contains more than 100mg/L arsenic. The present invention provides an alternative solution to the problem of cathode quality when handling highly contaminated electrolytes, particularly when containing high concentrations of arsenic.)