阅读说明：本技术 一种抛光盘用抛光材料及其制备方法 (Polishing material for polishing disc and preparation method thereof ) 是由 张光明 于 2020-07-01 设计创作，主要内容包括：本发明涉及抛光技术领域,尤其是指一种抛光盘用抛光材料及其制备方法。所述抛光材料包括如下重量份的原料：聚氨酯预聚体70-80份、聚酯纤维18-25份、磨料15-22份、填料8-12份、硅烷偶联剂3-6份、固化剂2-6份、功能助剂10-15份。该抛光盘用抛光材料在研磨抛光过程中只需采用水作为辅助研磨料即可,相对于传统抛光盘用抛光材料,不仅可以节约大量的研磨剂、抛光剂,还解决了工作浆料中对环境的污染问题,降低了生产成本,提高了生产效率,其制备方法操作简单,控制方便,生产效率高,生产成本低,可用于大规模生产。(The invention relates to the technical field of polishing, in particular to a polishing material for a polishing disc and a preparation method thereof. The polishing material comprises the following raw materials in parts by weight: 70-80 parts of polyurethane prepolymer, 18-25 parts of polyester fiber, 15-22 parts of abrasive, 8-12 parts of filler, 3-6 parts of silane coupling agent, 2-6 parts of curing agent and 10-15 parts of functional assistant. The polishing material for the polishing disc only needs to adopt water as an auxiliary abrasive in the grinding and polishing process, compared with the traditional polishing material for the polishing disc, the polishing material for the polishing disc can save a large amount of grinding agents and polishing agents, solves the problem of environmental pollution in working slurry, reduces the production cost, improves the production efficiency, is simple to operate, convenient to control, high in production efficiency and low in production cost, and can be used for large-scale production.)

1. A polishing material for a polishing disk, characterized in that: the polishing material comprises the following raw materials in parts by weight: 70-80 parts of polyurethane prepolymer, 18-25 parts of polyester fiber, 15-22 parts of abrasive, 8-12 parts of filler, 3-6 parts of silane coupling agent, 2-6 parts of curing agent and 10-15 parts of functional assistant.

2. The polishing material for a polishing disk according to claim 1, wherein: the preparation method of each part of polyurethane prepolymer comprises the following steps: according to the weight parts, 20-28 parts of polyoxypropylene triol, 10-15 parts of polytetrahydrofuran ether glycol, 10-15 parts of glycidyl amine epoxy resin and 5-10 parts of N, N-dimethylformamide are mixed, heated to 90-110 ℃, added with 45-55 parts of diisocyanate, 1-2.5 parts of catalyst and 8-12 parts of chain extender and reacted for 60-100min to obtain the polyurethane prepolymer.

3. The polishing material for a polishing disk according to claim 2, wherein: the diisocyanate is at least one of isophorone diisocyanate, diphenylmethane diisocyanate and dimethyl biphenyl diisocyanate.

4. The polishing material for a polishing disk according to claim 2, wherein: the molecular weight of the polyoxypropylene triol is 3000-5000; the molecular weight of the polytetrahydrofuran ether glycol is 1000-2000.

5. The polishing material for a polishing disk according to claim 2, wherein: the catalyst is at least one of stannous octoate, dibutyltin dilaurate, dibutyltin diacetate and N, N-dimethyl cyclohexylamine.

6. The polishing material for a polishing disk according to claim 2, wherein: the chain extender is at least one of hydroquinone dihydroxyethyl ether, trimethylolpropane and triethylene glycol.

7. The polishing material for a polishing disk according to claim 2, wherein: each part of the functional auxiliary agent comprises the following raw materials in parts by weight: 10-15 parts of gas-phase titanium dioxide, 8-13 parts of modified graphene, 4-8 parts of ethyl cellulose and 3-7 parts of sodium dodecyl sulfate.

8. The polishing material for a polishing disk according to claim 1, wherein: the abrasive is at least one of alumina and silicon carbide.

9. The polishing material for a polishing disk according to claim 1, wherein: the filler is at least one of calcium carbonate, nano silicon dioxide and talcum powder.

10. The method for producing a polishing material for a polishing pad according to any one of claims 1 to 9, wherein: the method comprises the following steps: mixing the raw materials in proportion, heating to 60-70 ℃, stirring at the speed of 800-.

Technical Field

The invention relates to the technical field of polishing, in particular to a polishing material for a polishing disc and a preparation method thereof.

Background

In modern industrial production, glass panels, LCD panels, semiconductors, metals, and ceramic products, etc. are often polished and ground to achieve good visual and optical properties and to improve product performance and quality. Then, the traditional grinding and polishing material must use abrasive slurry with a certain concentration to realize the purpose of grinding and polishing along with work in the application process, and the process is complicated and pollutes the environment. Therefore, the research and development of the polishing material for the polishing disc, which has good polishing and grinding effects and high grinding efficiency, does not need to consume a large amount of abrasive slurry in the working process, is clean and environment-friendly, and has very important significance.

Disclosure of Invention

The technical problem to be solved by the invention is to provide a polishing material for a polishing disc, which only needs water as an auxiliary abrasive in the grinding and polishing process, does not need to additionally adopt other auxiliary abrasives and polishing agents, can omit equipment such as slurry configuration and conveying equipment in the grinding and polishing process, does not have the problem that the slurry blocks a pipeline and the like, and can always keep a good grinding effect in work; compared with the traditional polishing material for the polishing disc, the polishing material can save a large amount of grinding agents and polishing agents, solves the problem of environmental pollution in working slurry, reduces the production cost and improves the production efficiency.

The invention also aims to provide a preparation method of the polishing material for the polishing disc, which has the advantages of simple operation, convenient control, reduced production cost and high product quality, ensures that the prepared polishing material has good flexibility and weather resistance, good contact property with a workpiece to be processed, is more suitable for high-precision grinding and polishing, can realize the grinding and polishing effect at high speed, and can be used for large-scale production.

In order to solve the technical problems, the invention adopts the following technical scheme:

a polishing material for a polishing disc comprises the following raw materials in parts by weight: 70-80 parts of polyurethane prepolymer, 18-25 parts of polyester fiber, 15-22 parts of abrasive, 8-12 parts of filler, 3-6 parts of silane coupling agent, 2-6 parts of curing agent and 10-15 parts of functional assistant.

The polishing material for the polishing disc only needs to adopt water as an auxiliary abrasive in the grinding and polishing process, does not need to additionally adopt other auxiliary abrasives and polishing agents (such as grinding liquid, grinding powder or grinding paste and the like), can omit equipment such as slurry preparation and conveying equipment in the grinding and polishing process, does not have the problem that the slurry blocks a pipeline and the like, and can always keep a good grinding effect in work; compared with the traditional polishing material for the polishing disc, the polishing material can save a large amount of grinding agents and polishing agents, solves the problem of environmental pollution in working slurry, reduces the production cost and improves the production efficiency; the polishing material for the polishing disc has good flexibility and good contact with a workpiece to be processed, is more suitable for high-precision grinding and polishing, and can realize the grinding and polishing effect at high speed.

Further, the preparation method of each part of polyurethane prepolymer comprises the following steps: according to the weight parts, 20-28 parts of polyoxypropylene triol, 10-15 parts of polytetrahydrofuran ether glycol, 10-15 parts of glycidyl amine epoxy resin and 5-10 parts of N, N-dimethylformamide are mixed, heated to 90-110 ℃, added with 45-55 parts of diisocyanate, 1-2.5 parts of catalyst and 8-12 parts of chain extender and reacted for 60-100min to obtain the polyurethane prepolymer. The epoxy modified polyurethane prepolymer is prepared by adopting the reaction of polyoxypropylene triol, polytetrahydrofuran ether glycol, glycidyl ether epoxy resin and diisocyanate, and compared with a common polyurethane prepolymer sold in the market, the epoxy modified polyurethane prepolymer can obviously improve the cohesive energy strength of the polyurethane prepolymer, and the prepared polyurethane prepolymer has the characteristics of multiple functionality, high activity and high crosslinking density.

Further, the molecular weight of the polyester fiber was 19000-23000. The polishing material for the polishing disc has the advantages that the polyester fiber is high in strength, high in modulus and low in water absorption, and the polyurethane prepolymer and the polyester fiber are compounded, and other raw materials are added, so that the prepared polishing material for the polishing disc has excellent heat resistance, corrosion resistance and mechanical strength. The silane coupling agent is at least one of a silane coupling agent KH-550, a silane coupling agent KH-560, a silane coupling agent KH-570 and a silane coupling agent KH-620.

Further, the diisocyanate is at least one of isophorone diisocyanate, diphenylmethane diisocyanate and dimethyl biphenyl diisocyanate.

According to the invention, the polyoxypropylene triol and the polytetrahydrofuran ether glycol are adopted to react with the diisocyanate, the reaction activity is high, and the reaction is stable in polymerization and crosslinking with the diisocyanate, so that the prepared polishing material for the polishing disk has good flexibility and weather resistance, is good in contact with a workpiece to be processed, is more suitable for high-precision grinding and polishing, and can realize the grinding and polishing effects at a high speed.

Further, the molecular weight of the polyoxypropylene triol is 3000-5000; the molecular weight of the polytetrahydrofuran ether glycol is 1000-2000. The invention adopts the polyoxypropylene triol and the polytetrahydrofuran ether glycol to catalyze the polymerization reaction of diisocyanate, promotes the crosslinking action of the polyurethane prepolymer, forms the polyurethane prepolymer with a stable network structure, and enables the prepared polishing material for the polishing disk to have excellent flexibility, weather resistance, water resistance and impact resistance.

Further, the catalyst is at least one of stannous octoate, dibutyltin dilaurate, dibutyltin diacetate and N, N-dimethyl cyclohexylamine. The catalyst adopted by the invention can catalyze and promote the polymerization crosslinking reaction of the reaction of polyoxypropylene triol, polytetrahydrofuran ether glycol and diisocyanate; the photo-thermal stability of the polishing material for the composite polishing disc is improved, so that the polyurethane prepolymer is not easy to suffer from high temperature in subsequent high-temperature preparation to cause the phenomenon of integral hardening, the cross-linking polymerization process of the polishing material for the composite polishing disc can be effectively promoted, and the flexibility and the weather resistance are improved.

Further, the chain extender is at least one of hydroquinone dihydroxyethyl ether, trimethylolpropane and triethylene glycol. Furthermore, the chain extender is hydroquinone dihydroxyethyl ether, trimethylolpropane and triethylene glycol according to the weight ratio of 2-3: 0.5-1: 1. By adopting the chain extender, the weather resistance and the mechanical property of the polyurethane material can be improved.

Further, each part of the functional auxiliary agent comprises the following raw materials in parts by weight: 10-15 parts of gas-phase titanium dioxide, 8-13 parts of modified graphene, 4-8 parts of ethyl cellulose and 3-7 parts of sodium dodecyl sulfate. By adopting the functional assistant, the polishing material for the reinforced polishing disk has good toughness and strength, and the combination of the ethyl cellulose, the sodium dodecyl sulfate and other raw materials is beneficial to forming uniform pores in the composition of the polishing material for the reinforced polishing disk, so that the polishing material has good flexibility.

Further, the preparation method of the modified graphene comprises the following steps: a1, taking 20-25 parts of ethanol by weight, adding 40-50 parts of nano graphene into the ethanol, heating to 45-65 ℃, and uniformly stirring to obtain a mixture A; a2, uniformly adding 4-7 parts of dimethylol acetone, 4-7 parts of diethylamino ethylamine silane and 3-6 parts of silane coupling agent into the mixture A, heating to 70-80 ℃, keeping the temperature for 40-60min, continuously stirring, filtering and drying to obtain the modified graphene.

The modified graphene prepared by the preparation method can retain a certain amount of functional groups such as hydroxyl, carboxyl, carbonyl and the like on the surface, can remarkably improve the weather resistance and wear resistance of the modified graphene, is uniformly dispersed in a material for a polishing disc, is not easy to agglomerate, and can enhance the shearing resistance and deformation resistance of the polishing material for the polishing disc in the grinding process.

Further, the abrasive is at least one of alumina and silicon carbide. The grain size of the abrasive is 20-40 nm. The abrasive has high strength and good dispersibility, is easy to disperse in the polishing material for the polishing disc, can uniformly polish workpieces, and has high polishing efficiency.

Further, the filler is at least one of calcium carbonate, nano-silica and talcum powder. By adopting the filler, the mechanical property, the weather resistance and the dimensional stability of the polishing material for the polishing disc can be improved.

The other purpose of the invention is realized by adopting the following technical scheme: the preparation method of the polishing material for the polishing disk comprises the following steps: mixing the raw materials in proportion, heating to 60-70 ℃, stirring at the speed of 800-.

Further, the step of hot pressing treatment specifically comprises: placing the mixture in a grinding tool, preheating for 10-15min under the conditions of the temperature of 105-115 ℃ and the pressure of 700-1000MPa, then hot-pressing and molding under the conditions of the temperature of 130-145 ℃ and the pressure of 1000-1500MPa, and then drying and curing to obtain the polishing material for the polishing disc.

The preparation method has the advantages of simple operation, convenient control and reduction of production cost, and the prepared polishing material for the polishing disk has good flexibility and weather resistance and good contact with a workpiece to be processed, is more suitable for high-precision grinding and polishing, can realize grinding and polishing effects at high speed and can be used for large-scale production.

The invention has the beneficial effects that: the polishing material for the polishing disc only needs to adopt water as an auxiliary abrasive in the grinding and polishing process, does not need to additionally adopt other auxiliary abrasives and polishing agents, can omit equipment such as slurry preparation and conveying equipment in the grinding and polishing process, does not have the problem that the slurry blocks a pipeline and the like, and can always keep a good grinding effect in work; compared with the traditional polishing material for the polishing disc, the polishing material can save a large amount of grinding agents and polishing agents, solves the problem of environmental pollution in working slurry, reduces the production cost and improves the production efficiency.

Detailed Description

The present invention will be further described with reference to the following examples for facilitating understanding of those skilled in the art, and the description of the embodiments is not intended to limit the present invention.