阅读说明：本技术 光电协同催化耦合胶体射流加工超光滑表面的方法 (Method for processing ultra-smooth surface by coupling photoelectric synergistic catalysis with colloid jet ) 是由 宋孝宗 王继波 于 2020-03-04 设计创作，主要内容包括：光电协同催化耦合胶体射流加工超光滑表面的方法,纳米颗粒胶体喷射系统包括增压泵及电机组、流量控制阀、流量表、压力表及液压控制开关等；光催化光路组件包括可见光光源、两端带准直镜的光纤、导电玻璃镜片、可见光触发的纳米颗粒胶体等；电催化组件包括正极、负极和外置电源。其中导电玻璃镜片与所述电催化组件正极连接形成阳极,旋转工作台上的金属铜板电极与所述电催化组件负极连接形成阴极。光电协同催化喷嘴将纳米颗粒胶体喷射系统、光催化光路组件、电催化组件有机连接成一个整体,在光电协同催化作用下,胶体抛光液中的纳米颗粒与工件表面发生充分的界面反应,从而实现半导体、光学玻璃及金属等工件表面材料的高效纳米级超光滑表面抛光。(A method for processing an ultra-smooth surface by coupling photoelectric cooperative catalysis with colloid jet flow is characterized in that a nanoparticle colloid injection system comprises a booster pump, a motor set, a flow control valve, a flow meter, a pressure gauge, a hydraulic control switch and the like; the photocatalysis light path component comprises a visible light source, an optical fiber with collimating lenses at two ends, a conductive glass lens, a visible light triggered nano-particle colloid and the like; the electrocatalysis assembly comprises a positive electrode, a negative electrode and an external power supply. The conductive glass lens is connected with the anode of the electrocatalysis assembly to form an anode, and the metal copper plate electrode on the rotary worktable is connected with the cathode of the electrocatalysis assembly to form a cathode. The photoelectricity collaborative catalysis nozzle organically connects the nanoparticle colloid injection system, the photocatalysis light path component and the electrocatalysis component into a whole, and under the action of photoelectricity collaborative catalysis, nanoparticles in the colloid polishing solution and the surface of a workpiece are subjected to sufficient interface reaction, so that the efficient nanoscale super-smooth surface polishing of the surface materials of the workpiece such as semiconductors, optical glass and metals is realized.)

1. The method for processing the ultra-smooth surface by coupling photoelectric concerted catalysis and colloid jet is characterized by comprising the following steps:

preparing polishing solution, dispersing the prepared colloidal polishing solution for 20 minutes by using ultrasonic waves to obtain nano-particle colloidal polishing solution with stable dispersibility, and filling the nano-particle colloidal polishing solution into a polishing solution container (2);

a workpiece (15) to be processed is arranged on a rotary worktable (17) in a photoelectrocatalysis reaction chamber (10); starting a visible light source (13) to generate a visible light beam, wherein the visible light beam irradiates the surface of the conductive glass lens (11) with approximately parallel light after passing through an optical fiber with collimating lenses at two ends and then enters a cavity of the photoelectricity collaborative catalytic nozzle (8) and focuses on a photoelectricity collaborative catalytic nozzle opening;

meanwhile, the nano particle colloid is pressurized by a booster pump and a motor set (3), the colloid flow is controlled by a flow control valve (4), the flow and the pressure of a nano particle colloid injection system are displayed by a flow meter (5) and a pressure meter (6), the high-pressure nano-particle colloid enters a cavity of the photoelectric synergistic catalytic nozzle (9) through a hydraulic control switch (7) and is coupled with a visible light beam entering the cavity of the photoelectric synergistic catalytic nozzle, simultaneously connecting the positive electrode and the negative electrode of a power supply (18) of the electric catalytic assembly, forming a photoelectric coupling nano-particle colloid jet beam (14) through a photoelectric synergistic catalytic nozzle and spraying the photoelectric coupling nano-particle colloid jet beam on the surface to be processed of a processed workpiece (15), wherein photoelectric coupling nano-particle colloid polishing solution is filled in a gap between a conductive glass lens (11) and a copper plate electrode (16) on a workbench and generates a loop;

under the action of photoelectricity concerted catalysis, the nano particles in the colloid polishing solution and the surface of the workpiece are subjected to interface reaction, so that the surface material of the workpiece is efficiently removed;

the industrial personal computer (1) controls the numerical control multi-axis workbench (9) and the rotary workbench (17) to enable the photoelectric synergetic catalytic nozzle (8) and the processed workpiece (15) to move according to a required track, so that the surface material of the workpiece can be efficiently and controllably removed.

2. The method for processing the ultra-smooth surface by the coupling of the photoelectric synergistic catalysis colloid jet flow according to claim 1, wherein a booster pump and a motor set adopted by the nano particle colloid injection system are motor-driven hydraulic diaphragm pumps, and the boosting range is 0.1-50 MPa, preferably 1-10 MPa; the nano particle colloid spraying system forms a photoelectric cooperative catalysis coupling nano particle colloid jet beam through a photoelectric cooperative catalysis nozzle, and the spraying speed of the photoelectric cooperative catalysis coupling nano particle colloid jet beam is 2-150 m/s, preferably 10-50 m/s.

3. The method for processing the ultra-smooth surface by the photoelectric cooperative catalysis coupled colloid jet flow according to claim 1, wherein the wavelength of the visible light source is 380-780 nm, and the light source includes but is not limited to sunlight, xenon lamp, iodine tungsten lamp, incandescent lamp, metal halide lamp or other light sources emitting visible light; the diameter range of the light spot of the generated visible light beam is 0.1-10 mm, preferably 0.2-2 mm; the irradiation intensity range of the light spot is 0.01-500 mW/cm²Preferably 10-200 mW/cm²。

4. The method for processing the ultra-smooth surface by the aid of the photoelectric cooperative catalytic coupling colloid jet flow according to claim 1, wherein the voltage of an external power supply of the electrocatalytic component is Direct Current (DC) 24V, and the current regulation range is 0.1-200.0A; the anode of the electro-catalytic assembly is connected with a conductive glass lens in the photoelectric synergetic catalytic nozzle to form an anode, and the cathode of the electro-catalytic assembly is connected with a copper metal plate on the workbench to form a cathode; the diameter of the conductive glass lens is within the range of 5-200 mm, preferably 10-50 mm, and the thickness of the conductive glass lens is within the range of 1-3 mm, preferably 2-2.5 mm; the size of the copper metal plate on the workbench is determined according to the size of the processed workpiece, and the thickness of the copper metal plate is within the range of 0.2-2 mm, preferably 1-1.25 mm.

5. The method for processing the ultra-smooth surface by the photoelectric synergistic catalytic coupling colloid jet flow, according to claim 1, characterized in that the nano-particle colloid polishing solution has visible light catalytic activity, the mass fraction of nano-particles in the colloid polishing solution is 0.1-30%, the mass fraction of dispersing agent is 0.2-0.5%, the mass fraction of acidity regulator is 0.1-0.2%, the mass fraction of deionized water is 69-99%, and the density of the prepared nano-particle colloid polishing solution is 1.01-1.80 × 10³kg/m³The dynamic viscosity is in the range of 0.001-0.03 Ns/m 2, and the pH value is in the range of 4-11.

6. The method of claim 5, wherein the nano-particle colloid polishing solution comprises nano-titanium dioxide particles, core-shell nano-ferrite particles, and SiO particles with visible light catalytic activity and modified by doping₂Loaded nitrogen doped TiO₂Nanoparticles, ceria-based composite nanoparticles, and paired combinations of the foregoing nanoparticles; the particle size of the used nano particles is within the range of 5-40 nm.

7. The method of claim 5, wherein the acidity regulator is sodium tripolyphosphate, sodium hexametaphosphate, sodium citrate, sodium bicarbonate, or any combination thereof.

8. The method of claim 5, wherein the dispersing agent is sodium pyrophosphate, sodium polymetaphosphate, sodium orthophosphate, or a combination thereof.

Technical Field

The invention relates to a method for processing an ultra-smooth surface by coupling photoelectric cooperative catalysis and colloid jet.

Background

The ultra-smooth and nondestructive surface element device has great application requirements in the fields of optical systems, nano circuits, chemical biosensors, medical detection and diagnosis, biological imaging and the like, and optical elements with extremely low surface roughness and extremely high surface shape precision are required to be used in high-precision optical test systems, soft X-ray optical systems and high-energy laser systems to ensure high reflectivity and low scattering property; the substrate with the ultra-smooth and damage-free surface in the ultra-large scale integrated circuit can ensure that the characteristic line width with smaller scale can be obtained; novel characteristics such as quantum effect, size effect, exciton effect and the like which are unique to a special nanoscale and are obviously different from characteristics of a macroscopic device are obtained by ensuring that a micro-nano structure and a device have extremely accurate characteristic physical dimensions and a complete surface lattice structure in micro-nano optical devices such as an optical waveguide, a micro lens array and the like. Therefore, in the modern high-precision field, nano-scale and sub-nano-scale processing technology is required to realize the new characteristics of ultra-smooth and damage-free components.

In the existing ultra-smooth surface polishing process, nanoparticles having high specific surface area and surface energy have been widely used as polishing abrasives to achieve ultra-smooth surface polishing of the workpiece surface. In the prior art, Zhang Fei Hu, Song Xiaozong [1] and the like provide a method for polishing the surface of an element by using a nano colloid jet in a method for polishing the surface of the element (publication No. CN101462256, published: 2009.06.24). However, the method of polishing the surface of the element by using the nano colloid jet flow has the defect of low material removal efficiency. Zhang Yong, Zhang Fei Hu, Song Xiao Zong [2], and others propose to improve the material removal rate of nanoparticle colloid jet by using the cavitation jet method in the colloid fluid hydrodynamic cavitation jet polishing device and method (publication No. CN101670556, published: 2010.03.17), but because of the randomness generated by the cavitation effect in the jet process and the high-temperature and high-pressure characteristics of the cavitation point, the processing removal characteristics and the processing surface quality have uncontrollable factors. In the method (publication No. CN 103286694A, published: 2013.09.11) of ultraviolet light induced nanoparticle colloid jet machining of ultra-smooth surface, Songxiazong [3] et al proposed that the sub-nanoscale removal of the surface material of the workpiece is realized by utilizing photochemical reaction, interface chemical reaction and shearing viscous action generated by colloid jet under the coupling action of ultraviolet light field and colloid jet dynamic pressure field between the nanoparticles and the machined surface. On one hand, the method has insufficient penetrating power of ultraviolet light, a large amount of ultraviolet light is blocked and consumed in light path transmission, and the utilization rate is not high; on the other hand, a large number of photo-generated electron-hole pairs generated by ultraviolet light induction can be rapidly compounded in the colloid jet beam, so that the photocatalysis effect of the method is greatly influenced; on the other hand, special ultraviolet protection is needed for operators in the processing process of the method, so that the cost is increased and the inconvenience in use is increased.

Disclosure of Invention

The invention aims to provide a method for processing an ultra-smooth surface by coupling photoelectric cooperative catalysis with colloid jet.

The invention relates to a method for processing an ultra-smooth surface by coupling photoelectric synergistic catalysis and colloid jet, which comprises the following steps: preparing polishing solution, dispersing the prepared colloidal polishing solution for 20 minutes by using ultrasonic waves to obtain nano-particle colloidal polishing solution with stable dispersibility, and filling the nano-particle colloidal polishing solution into a polishing solution container 2;

a workpiece 15 to be processed is mounted on a rotary table 17 in the photoelectrocatalysis reaction chamber 10; starting a visible light source 13 to generate a visible light beam, irradiating the visible light beam on the surface of the conductive glass lens 11 by approximately parallel light after passing through an optical fiber with collimating lenses at two ends, then entering a cavity of the photoelectricity collaborative catalytic nozzle 8 and focusing on a photoelectricity collaborative catalytic nozzle opening;

meanwhile, pressurizing the nano-particle colloid through a booster pump and a motor set 3, controlling the colloid flow through a flow control valve 4, displaying the flow and the pressure of a nano-particle colloid injection system through a flow meter 5 and a pressure gauge 6, enabling the high-pressure nano-particle colloid to enter a cavity of a photoelectric synergistic catalytic nozzle 9 through a hydraulic control switch 7, coupling with a visible light beam entering the cavity of the photoelectric synergistic catalytic nozzle, simultaneously connecting with the anode and the cathode of a power supply 18 of a photoelectric catalytic assembly, forming a photoelectric coupling nano-particle colloid jet beam 14 through the photoelectric synergistic catalytic nozzle and injecting the photoelectric coupling nano-particle colloid jet beam on the surface to be processed of a processed workpiece 15, and filling a gap between a conductive glass lens 11 and a copper plate electrode 16 on a workbench with photoelectric coupling nano-particle colloid polishing liquid and generating a loop;

under the action of photoelectricity concerted catalysis, the nano particles in the colloid polishing solution and the surface of the workpiece are subjected to interface reaction, so that the surface material of the workpiece is efficiently removed;

the industrial personal computer 1 controls the numerical control multi-axis workbench 9 and the rotary workbench 17 to enable the photoelectric synergistic catalytic nozzle 8 to move by the processed workpiece 15 according to a required track, so that the surface material of the workpiece can be efficiently and controllably removed.

The invention realizes the efficient removal of surface material atoms of a processed workpiece by utilizing the interfacial chemical reaction between the charged nanoparticles and the processing surface and the shearing viscous action of colloid jet under the multi-field synergistic coupling action of a visible light field, an electric field and a colloid jet flow pressure field. The method can obviously improve the removal rate of atoms on the surface of the material and improve the efficiency of manufacturing the ultra-smooth surface, and is suitable for carrying out high-efficiency ultra-smooth surface processing on brittle and hard materials such as optical glass, semiconductor materials and the like.

Drawings

Fig. 1 is a schematic diagram of a photoelectric concerted catalysis coupled colloid jet processing system, with reference numbers and relative names: 1. industrial personal computer, 2, polishing solution container, 3, booster pump and motor group, 4, flow control valve, 5, flowmeter, 6, manometer, 7, hydraulic control switch, 8, photoelectricity concerted catalysis nozzle, 9, numerical control multiaxis workstation, 10, photoelectricity catalysis reaction chamber, 11, conductive glass lens, 12, both ends take the optic fibre of collimating mirror, 13, visible light source, 14, photoelectric coupling nanoparticle colloid efflux bunch, 15, the work piece that is processed, 16, copper electrode, 17, swivel work head, 18, electro-catalysis power supply, 19, nanoparticle colloid polishing solution activation device.

Detailed Description

As shown in figure 1, the invention is a method for processing an ultra-smooth surface by coupling photoelectric cooperative catalysis with colloid jet, which comprises the following steps: preparing polishing solution, dispersing the prepared colloidal polishing solution by ultrasonic waves for 20 minutes to obtain nano-particle colloidal polishing solution with stable dispersibility, and filling the nano-particle colloidal polishing solution into a polishing solution container 2. A workpiece 15 to be processed is mounted on a rotary table 17 in the photoelectrocatalysis reaction chamber 10; starting a visible light source 13 to generate a visible light beam, irradiating the visible light beam on the surface of the conductive glass lens 11 by approximately parallel light after passing through an optical fiber with collimating lenses at two ends, then entering a cavity of the photoelectricity collaborative catalytic nozzle 8 and focusing on a photoelectricity collaborative catalytic nozzle opening; meanwhile, the nano particle colloid is pressurized through a booster pump and a motor set 3, the colloid flow is controlled through a flow control valve 4, the flow and the pressure of a nano particle colloid injection system are displayed through a flow meter 5 and a pressure gauge 6, high-pressure nano particle colloid enters a cavity of a photoelectric synergistic catalytic nozzle 9 through a hydraulic control switch 7, is coupled with a visible light beam entering the cavity of the photoelectric synergistic catalytic nozzle, is simultaneously connected with the anode and the cathode of a power supply 18 of a photoelectric catalytic assembly, forms a photoelectric coupling nano particle colloid jet beam 14 through the photoelectric synergistic catalytic nozzle and injects the photoelectric coupling nano particle colloid jet beam onto the surface to be processed of a processed workpiece 15, and photoelectric coupling nano particle colloid polishing liquid is filled in a gap between a conductive glass lens 11 and a copper plate electrode 16 on a workbench to generate a loop. Under the action of photoelectricity concerted catalysis, the nano particles in the colloid polishing solution and the surface of the workpiece are subjected to interface reaction, so that the surface material of the workpiece is efficiently removed. The industrial personal computer 1 controls the numerical control multi-axis workbench 9 and the rotary workbench 17 to enable the photoelectric synergetic catalytic nozzle 8 and the processed workpiece 15 to move according to a required track, so that the surface material of the workpiece can be efficiently and controllably removed.

The invention relates to a method for processing an ultra-smooth surface by coupling photoelectric synergistic catalysis with colloid jet, which adopts the following technical scheme:

(1) the wavelength of the light source is 380-780 nmVisible light is used as a reaction excitation light source. The light source includes, but is not limited to, sunlight, xenon lamp, iodine tungsten lamp, incandescent lamp, metal halide lamp, or other light source emitting visible light. And (3) opening a visible light excitation light source, enabling the generated visible light to pass through the optical fiber with the collimating lenses at two ends, then entering the photoelectric cooperative catalysis nozzle as an approximately parallel light beam, and focusing the visible light on a nozzle opening of the photoelectric cooperative catalysis nozzle after passing through the conductive glass lens. The diameter range of the light spot of the visible light beam is 0.1-10 mm, preferably 0.2-2 mm; the irradiation intensity range of the light spot is 0.01-500 mW/cm²Preferably 10-200 mW/cm²。

(2) The electrocatalytic component used comprises a positive electrode, a negative electrode and an external power supply. The voltage of an external power supply of the electro-catalytic assembly is 24V direct current, and the current adjusting range is 0.1-100.0A. The anode of the electro-catalytic assembly is connected with a conductive glass lens in the photoelectric synergetic catalytic nozzle to form an anode, and the cathode of the electro-catalytic assembly is connected with a copper metal plate on the workbench to form a cathode. The diameter of the conductive glass lens is within the range of 5-200 mm, preferably 10-50 mm, and the thickness of the conductive glass lens is within the range of 1-3 mm, preferably 2-2.5 mm. The size of the copper metal plate on the workbench is determined according to the size of the processed workpiece, and the thickness of the copper metal plate is within the range of 0.2-2 mm, preferably 1-1.25 mm.

(3) According to the workpiece material to be processed, the required polishing liquid colloid with visible light catalytic activity is prepared according to specific components and components. The mass fraction of the nano particles in the colloid is 0.1-30%, the mass fraction of the dispersing agent is 0.2-0.5%, the mass fraction of the acidity regulator is 0.1-0.2%, and the mass fraction of the deionized water is 69-99%. Wherein the nano particles are doped modified nano titanium dioxide particles with visible light catalytic activity, core-shell structure nano ferrite particles and SiO₂Loaded nitrogen doped TiO₂Nanoparticles, ceria-based composite nanoparticles, and a combination of the nanoparticles, wherein the particle size of the nanoparticles is in the range of 5 to 40 nm. The acidity regulator comprises sodium tripolyphosphate, sodium hexametaphosphate, sodium citrate, sodium bicarbonate and various matched combinations thereof. The dispersing agent comprises sodium pyrophosphate, sodium polymetaphosphate, sodium orthophosphate and various pairing combinations thereof. Is pressed onThe dynamic viscosity of the colloid polishing solution prepared from the components is 0.001-0.03 Ns/m²Within the range of pH 4-11.

(4) The nano-particle colloid injection system adopts a motor to drive a hydraulic diaphragm pump to pressurize nano-particle colloid, and the pressure range is 0.1-50 MPa, preferably 1-10 MPa. The high-pressure nano particle colloid is controlled by a hydraulic valve to enter a cavity of a photoelectric synergistic catalytic nozzle, a photoelectric synergistic catalytic coupling nano particle colloid jet beam with the diameter of 0.1-2 mm is formed by the photoelectric synergistic catalytic nozzle and is jetted to an area to be processed on the surface of a workpiece, and the jetting speed is 2-150 m/s, preferably 10-50 m/s.

(5) The nano-particle colloid jet beam generates a large number of photo-generated electron-hole pairs under the photochemical action of a visible light field, and the photoelectric synergistic catalytic nozzle sprays nano-particle colloid polishing solution with an electrolysis function and a photocatalytic function and sprays the nano-particle colloid polishing solution to a region to be processed on the surface of a workpiece, so that a gap between the anode conductive glass lens and the cathode metal copper plate on the workbench is filled. Meanwhile, the anode and the cathode of the power supply of the electro-catalytic assembly are connected, a loop is generated between the conductive glass lens connected with the anode and the metal copper plate on the workbench connected with the cathode, and photo-generated electron-hole pairs generated by photocatalysis in the colloid jet beam are respectively directionally migrated under the action of an electric field, so that the photo-generated electron-hole pairs are separated, the catalytic effect of the photochemical action of visible light on atoms and nano particles on the surface of the workpiece can be greatly improved, the nano particles in the colloid polishing solution are ensured to fully react with the surface of the workpiece, and chemical adsorption is formed; meanwhile, atoms which are subjected to interface reaction with the nanoparticles on the surface of the workpiece are forced to leave the surface of the workpiece together with the nanoparticles by the shearing viscous action of the colloid jet, so that the atoms on the surface of the workpiece are efficiently removed, and the manufacturing efficiency of the ultra-smooth surface is greatly improved. The numerical control workbench controls the processed workpiece to move at a certain speed, so that the ultra-smooth surface of the processed workpiece can be efficiently generated.