阅读说明：本技术 显影添加剂组合物 (Developer additive composition ) 是由 陈敬伦 于 2021-07-28 设计创作，主要内容包括：本发明涉及一种显影添加剂组合物,包括第一组分和第二组分,所述的第一组分用于增溶和降低显影液表面张力；所述的第二组分用于析出溶解在显影液中的干膜；所述的第一组分包括非离子表面活性剂35-50份,消泡剂20-30份,蒸馏水100-120份；所述的第二组分包括有机溶剂20-50份,有机化合物10-30份,蒸馏水130-160份。本发明的优点是：减少槽液更换频率,减少人工及环保成本：显影液大多为无机碳酸盐类,随着干膜溶解量的增加,显影药水PH逐渐降低,溶解能力下降明显等。(The invention relates to a developer additive composition, comprising a first component and a second component, wherein the first component is used for solubilizing and reducing the surface tension of a developer solution; the second component is used for separating out a dry film dissolved in the developing solution; the first component comprises 35-50 parts of nonionic surfactant, 20-30 parts of defoaming agent and 120 parts of distilled water; the second component comprises 20-50 parts of organic solvent, 10-30 parts of organic compound and 160 parts of distilled water. The invention has the advantages that: reduce the tank liquor and change frequency, reduce artifical and environmental protection cost: most of the developing solution is inorganic carbonate, the PH of the developing solution is gradually reduced along with the increase of the dissolving amount of the dry film, the dissolving capacity is obviously reduced, and the like.)

1. A developer additive composition comprising a first component for solubilizing and reducing developer surface tension and a second component; the second component is used for separating out a dry film dissolved in the developing solution; the first component comprises 35-50 parts of nonionic surfactant, 20-30 parts of defoaming agent and 120 parts of distilled water; the second component comprises 20-50 parts of organic solvent, 10-30 parts of organic compound and 160 parts of distilled water.

2. A developer additive composition according to claim 1, wherein said nonionic surfactants comprise a solubilizing surfactant which is a polyoxyethylene ether surfactant and a tonicity-lowering surfactant; the surfactant for reducing tension is a carboxylic acid group type anionic surfactant.

3. A developer additive composition according to claim 1, wherein said defoamer is a polyether defoamer.

4. A developer additive composition according to claim 2 or 3, wherein said organic solvent is one or more of dichloromethane, tetrahydrofuran, chlorobenzene, DMF, acetonitrile, 1, 3-dichloropropane, toluene, xylene, ethyl acetate or small molecular alcohols in any proportion.

5. The developer additive composition of claim 4, wherein said organic compound is a compound containing a carboxyl, hydroxyl, aldehyde, amino, or nitro group.

Technical Field

The invention relates to a developer additive composition, and relates to the field of photoresist development.

Background

Integrated circuits have now entered the deep sub-micron stage and are continually evolving. With the rapid development of industries such as mobile phones, computers, household appliances, automotive electronics and the like, the domestic PCB industry is in the golden period of rapid development. With the development of the PCB industry, customers have higher and higher requirements on the appearance of the PCB and the impedance among various wires, and the width control of the wires is more strict. The development is an important process in the PCB manufacturing process, and the development quality directly influences the quality of the PCB. The developing process is to remove the unexposed part of the photosensitive film by chemical reaction to expose the copper pattern circuit to be etched and removed. As the resolution of the image is increased, the line width and the aperture size become smaller and smaller, and the influence of the development condition on the line becomes more obvious.

In the development process, when the dry film constantly dissolved into developing solution, the property of a medicine of solution can descend rapidly, and the dry film dissolution rate descends, leads to containing too much dry film piece in the developing solution, and easily be stained with inside the equipment, has increased the dry film and has inversely glued the probability on the circuit board, can cause the short circuit of circuit figure, product defect, the yield of direct influence product. In the prior art, the main adopted solution is to regularly maintain the developing line, and increase the frequency of replacing bath solution, rinsing solution and disassembling equipment, which can increase the cost of labor and waste liquid treatment and environmental hazard.

Disclosure of Invention

In order to overcome the defects of the prior art, the invention provides a developer additive composition, and the technical scheme of the invention is as follows:

a developer additive composition comprising a first component for solubilizing and reducing developer surface tension and a second component; the second component is used for separating out a dry film dissolved in the developing solution; the first component comprises 35-50 parts of nonionic surfactant, 20-30 parts of defoaming agent and 120 parts of distilled water; the second component comprises 20-50 parts of organic solvent, 10-30 parts of organic compound and 160 parts of distilled water.

The nonionic surfactant comprises a solubilizing surfactant and a surfactant for reducing tension, wherein the solubilizing surfactant is polyoxyethylene ether surfactant; the surfactant for reducing tension is a carboxylic acid group type anionic surfactant.

The defoaming agent is a polyether defoaming agent.

The organic solvent is one or a composition of more of dichloromethane, tetrahydrofuran, chlorobenzene, DMF, acetonitrile, 1, 3-dichloropropane, toluene, xylene, ethyl acetate or micromolecular alcohols according to any proportion.

The organic compound is a compound containing carboxyl, hydroxyl, aldehyde group, amino or nitro group.

The invention has the advantages that:

1. reduce the tank liquor and change frequency, reduce artifical and environmental protection cost: most of the developing solution is inorganic carbonate, the PH of the developing solution is gradually reduced along with the increase of the dissolving amount of the dry film, and the dissolving capacity is obviously reduced.

The solubilizing component contained in the first component of the developer additive is a surfactant, one end of the molecular structure of which is hydrophilic and the other end of which is hydrophobic; can form a micelle in water, and the inside of the whole micelle is nonpolar and the outside is polar. The micelle is a tiny colloidal particle, and the dispersion system of the micelle belongs to colloidal solution, so that a dry film is occluded or adsorbed, the dissolving amount is increased, the service life of the developing solution is prolonged, the frequency of tank liquor replacement is reduced, and the labor and environmental protection cost is saved.

2. Reduce the reverse sticky of circuit board, improve the product yield: in the developer use, the PH of liquid medicine reduces gradually, makes when dissolving the membrane ability and reducing, and the phenomenon also can appear appearing separating out to the sensitization dry film, and this just makes on going the roller with the dry film residue, can anti-stick to the face on, residual copper when causing the etching, and product yield low scheduling problem.

The other nonionic surfactant contained in the first component of the developing additive can reduce the surface tension of water and improve the permeability of a developing solution, so that the developing solution is promoted to enter between patterns, photoresist in a line width and a pore diameter with smaller sizes is fully dissolved, and a developing part is fully dissolved; in addition, the non-ionic surfactant can be attached to the surface of the photoresist after development, the adhesive force between dry film residues and the board surface is reduced, and when the non-ionic surfactant is cleaned, the non-ionic surfactant is favorable for thoroughly removing reverse sticky substances of the photoresist with large molecular weight, avoids the residue of the reverse sticky substances, and further greatly improves the yield of chips and panels.

3. Bath foam problem: in the developing process, a spraying device is mainly adopted, and the developing solution can be continuously stirred to generate a plurality of foams. Too much foam can cause the poor development of the PCB, slow the later-stage production and affect the development quality. In addition, too much foam affects the cleaning of the board, and bath solution overflows with the foam. The polyether defoamer contained in the component A of the developing additive has good water solubility, has good defoaming effect under alkaline conditions, can effectively reduce foams generated by a developing neutralizer during spraying, prevents foam residues, does not need to additionally add a defoamer, and reduces cost. Most of the defoaming agents for the PCB sold in the market at present are modified silicone oil, and the products easily cause silicon spots on the board surface to remain, so that the performance of the subsequent products is changed. The defoaming agent selected in the product is a polyether defoaming agent, does not contain silicon, does not cause silicon residue on the board surface, and further reduces the product defects.

4. The waste liquid treatment problem is as follows: most of the existing developing additive products are photopolymerization inhibition products, which disperse and neutralize the electrical property of free radicals in a developing solution to inhibit the polymerization of a photoinitiator and a photopolymerization monomer, thereby achieving the effect of reducing the reverse sticking of a dry film. The photopolymerization inhibitor is added, so that a dry film is difficult to precipitate again during waste liquid treatment, and the problems of high COD (chemical oxygen demand) of waste water, increased environmental protection pressure and the like are caused. Particularly, the second component is added, so that the osmotic pressure on two sides of the surfactant membrane can be changed, the surfactant micelle is damaged, the dry membrane dissolved in the developing solution is precipitated again, the dry membrane can be removed by filtration, the COD in the waste liquid is reduced, and the wastewater treatment cost is reduced.

Detailed Description

The invention will be further described with reference to specific embodiments, and the advantages and features of the invention will become apparent as the description proceeds. These examples are illustrative only and do not limit the scope of the present invention in any way. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention, and that such changes and modifications may be made without departing from the spirit and scope of the invention.

The invention relates to a developer additive composition, comprising a first component and a second component, wherein the first component is used for solubilizing and reducing the surface tension of a developer solution; the second component is used for separating out a dry film dissolved in the developing solution; the first component comprises 35-50 parts of nonionic surfactant, 20-30 parts of defoaming agent and 120 parts of distilled water; the second component comprises 20-50 parts of organic solvent, 10-30 parts of organic compound and 160 parts of distilled water.

The nonionic surfactant comprises a solubilizing surfactant and a surfactant for reducing tension, wherein the solubilizing surfactant is a polyoxyethylene ether surfactant (such as fatty alcohol-polyoxyethylene ether, alkylphenol polyoxyethylene ether, tween and the like); the surfactant for reducing tension is carboxylic acid group type anionic surfactant (such as sodium alginate, carboxymethyl cellulose, acrylic acid copolymer, polyacrylamide and the like).

The defoaming agent is polyether defoaming agent (such as glycerol polyether fatty acid ester).

The organic solvent is one or a composition of more of dichloromethane, tetrahydrofuran, chlorobenzene, DMF, acetonitrile, 1, 3-dichloropropane, toluene, xylene, ethyl acetate or micromolecular alcohols according to any proportion.

The organic compound is a compound containing carboxyl, hydroxyl, aldehyde group, amino or nitro group.

Example 1:

a first component: the solubilizing surfactant is Tween 20, the Tween 20 accounts for 20 parts by weight, the surfactant for reducing tension is sodium alginate 30 parts by weight, and the defoaming agent is modified polyether self-defoaming surfactant Amulan CF-2020 parts by weight; distilled water 100 parts

A second component: 20 parts of methanol as an organic solvent, 10 parts of urea as an organic compound and 130 parts of distilled water.

Example 2:

a first component: 15 parts of nonylphenol polyoxyethylene ether serving as a solubilizing surfactant, 20 parts of polyacrylic acid serving as a surfactant for reducing tension, 30 parts of GP-type glycerol polyether serving as a defoaming agent and 120 parts of distilled water;

a second component: the organic solvent is 50 parts of tetrahydrofuran; the organic compound is 30 parts of N-methylacetamide; 150 parts of distilled water

Example 3:

a first component: the solubilizing surfactant is Tween 40, the Tween 40 accounts for 30 parts by weight, the surfactant for reducing tension is polyacrylamide 20 parts by weight, the defoaming agent 20 parts by weight and distilled water 100 parts by weight;

a second component:

30 parts of isohexane glycol as an organic solvent, 25 parts of GPE type polyoxyethylene (polyoxypropylene) ether as an organic compound and 160 parts of distilled water.

In the compatibility of the invention, the first component mainly comprises a nonionic surfactant with solubilization, a surfactant for reducing the surface tension of a developing solution and a polyether defoamer with excellent water solubility. The addition of the developer in the developing tank can effectively prolong the service life of the developer and reduce the defects caused by reverse adhesion of a dry film. The second component mainly comprises organic solvent with small molecular weight and strong polar organic compound. The dry film dissolved in the developing solution can be effectively separated out by adding the developing solution in the process of treating the developing waste liquid, so that the waste liquid treatment cost is reduced, and the environmental protection pressure is reduced.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.