阅读说明：本技术 掩膜板、显示基板及其制作方法、显示装置 (Mask plate, display substrate, manufacturing method of display substrate and display device ) 是由 徐哲 张文轩 尤飞 廖飞 李策 蒋龙 于 2020-04-30 设计创作，主要内容包括：本公开提供了一种掩膜板、显示基板及其制作方法、显示装置,属于显示技术领域。掩膜板,用以制作显示基板的像素界定层,包括第一透光图形和第一不透光图形,还包括位于所述第一透光图形和所述第一不透光图形之间的过渡结构,所述过渡结构包括交替排布的多个第二透光图形和第二不透光图形,所述第二透光图形和所述第二不透光图形的线宽小于使用所述掩膜板进行曝光的曝光机的解像力。本公开的技术方案能够提高显示装置的良率。(The disclosure provides a mask plate, a display substrate, a manufacturing method of the display substrate and a display device, and belongs to the technical field of display. The mask plate is used for manufacturing a pixel defining layer of the display substrate and comprises a first light-transmitting graph and a first light-tight graph, and further comprises a transition structure located between the first light-transmitting graph and the first light-tight graph, the transition structure comprises a plurality of second light-transmitting graphs and second light-tight graphs which are alternately arranged, and the line width of the second light-transmitting graphs and the line width of the second light-tight graphs are smaller than the resolution power of an exposure machine which uses the mask plate to carry out exposure. The technical scheme of the disclosure can improve the yield of the display device.)

1. The mask plate is characterized in that the mask plate is used for manufacturing a pixel defining layer of a display substrate and comprises a first light-transmitting graph and a first light-tight graph, and further comprises a transition structure located between the first light-transmitting graph and the first light-tight graph, the transition structure comprises a plurality of second light-transmitting graphs and second light-tight graphs which are alternately arranged, and the line width of the second light-transmitting graphs and the second light-tight graphs is smaller than the resolution power of an exposure machine which uses the mask plate to carry out exposure.

2. A mask according to claim 1, wherein the first opaque pattern has the same shape as the upper surface of the pixel defining layer, the first transparent pattern has the same shape as the pixel opening area defined by the pixel defining layer, and the transition structure has the same shape as the orthographic projection of the side surface of the pixel defining layer on the display substrate.

3. A mask according to claim 1, wherein the first light-transmitting pattern has the same shape as the upper surface of the pixel defining layer, the first light-non-transmitting pattern has the same shape as the pixel opening area defined by the pixel defining layer, and the transition structure has the same shape as the orthographic projection of the side surface of the pixel defining layer on the display substrate.

4. A mask according to claim 1, wherein the second light-transmitting pattern and the second opaque pattern are both annular, and the center of the second light-transmitting pattern coincides with the center of the second opaque pattern.

5. A mask according to claim 1, wherein the first opaque patterns surround the first transparent patterns, and among the plurality of edges of the first transparent patterns, the transition structures between some of the edges and the first opaque patterns are opaque patterns or transparent patterns.

6. A mask plate according to claim 5, wherein the first opaque patterns surround the first transparent patterns, the first transparent patterns are rectangular and comprise a first edge, a second edge, a third edge and a fourth edge which are sequentially connected end to end, and the transition structures between the second edge and the first opaque patterns and between the fourth edge and the first opaque patterns are both opaque patterns or transparent patterns.

7. A mask according to claim 1, wherein the transition structure comprises a first transition structure and a second transition structure, the first light-transmitting pattern surrounds the first light-transmitting pattern, the first light-transmitting pattern is rectangular and comprises a first edge, a second edge, a third edge and a fourth edge which are sequentially connected end to end, the first transition structure is arranged between the first edge and the third edge and between the first light-transmitting pattern, the second transition structure is arranged between the second edge and the fourth edge and between the first light-transmitting pattern, and the first transition structure and the second transition structure satisfy any one of the following conditions:

the number of the second light-transmitting patterns included in the first transition structure is different from that of the second light-transmitting patterns included in the second transition structure;

the number of the second light-tight patterns included in the first transition structure is different from the number of the second light-tight patterns included in the second transition structure;

the line width of the second light-transmitting pattern included in the first transition structure is different from the line width of the second light-transmitting pattern included in the second transition structure;

the line width of the second opaque pattern included in the first transition structure is different from the line width of the second opaque pattern included in the second transition structure.

8. A mask according to claim 2, wherein the line width of the second light-transmitting pattern increases gradually in a direction from the first opaque pattern to the first light-transmitting pattern.

9. A mask according to claim 1, wherein the transition structure comprises 3-5 second light-transmissive patterns and 3-5 second light-opaque patterns.

10. A mask according to claim 1, wherein the line widths of the second light-transmitting pattern and the second opaque pattern are both less than 2.5 um.

11. A method for manufacturing a display substrate is characterized by comprising the following steps:

forming a photosensitive pixel defining layer material layer on a driving substrate, exposing the pixel defining layer material layer by using the mask plate according to any one of claims 1 to 10, and forming a pattern of the pixel defining layer after developing.

12. A display substrate, wherein the pixel defining layer of the display substrate is obtained by patterning a layer of a pixel defining layer material with a mask plate according to any one of claims 1 to 10.

13. The display substrate of claim 12, wherein the pattern of the pixel defining layer has a slope angle of less than 20 °.

14. The display substrate of claim 12, wherein the pixel defining layer of the display substrate defines a pixel opening area exposing at least two anode patterns, orthogonal projections of the at least two anode patterns on the display substrate not overlapping.

15. The display substrate according to claim 12, wherein the pixel opening area has a rectangular shape, the pattern of the pixel defining layer includes a first side surface, a second side surface, a third side surface and a fourth side surface which are sequentially connected end to end around the pixel opening area, the first side surface and the third side surface have the same slope angle, the second side surface and the fourth side surface have the same slope angle, and the slope angle of the first side surface is larger than that of the second side surface.

16. The display substrate according to claim 12, wherein the pixel opening region has the same shape as the first light-transmissive pattern; or

The shape of the pixel opening area is the same as the shape defined by the contour of the transition structure.

17. A display device comprising the display substrate according to any one of claims 12 to 16.

Technical Field

The present disclosure relates to the field of display technologies, and in particular, to a mask plate, a display substrate, a manufacturing method thereof, and a display device.

Background

Disclosure of Invention

The technical problem to be solved by the present disclosure is to provide a mask plate, a display substrate, a manufacturing method thereof, and a display device, which can improve the yield of the display device.

In order to solve the above technical problem, embodiments of the present disclosure provide the following technical solutions:

on one hand, the mask plate is used for manufacturing a pixel defining layer of a display substrate and comprises a first light-transmitting graph and a first light-tight graph, and further comprises a transition structure located between the first light-transmitting graph and the first light-tight graph, the transition structure comprises a plurality of second light-transmitting graphs and second light-tight graphs which are alternately arranged, and the line width of the second light-transmitting graphs and the line width of the second light-tight graphs are smaller than the resolution power of an exposure machine which uses the mask plate to carry out exposure.

In an alternative embodiment of the present disclosure, the first opaque pattern has the same shape as an upper surface of the pixel defining layer, the first transparent pattern has the same shape as a pixel opening region defined by the pixel defining layer, and the transition structure has the same shape as an orthographic projection of a side surface of the pixel defining layer on the display substrate.

In an alternative embodiment of the present disclosure, the first light-transmissive pattern has the same shape as an upper surface of the pixel defining layer, the first light-opaque pattern has the same shape as a pixel opening region defined by the pixel defining layer, and the transition structure has the same shape as an orthographic projection of a side surface of the pixel defining layer on the display substrate.

In an optional embodiment of the present disclosure, the second light-transmitting pattern and the second opaque pattern are both annular, and a center of the second light-transmitting pattern coincides with a center of the second opaque pattern.

In an optional embodiment of the present disclosure, the first opaque pattern surrounds the first light transmissive pattern, and the transition structures between a part of the edges of the first light transmissive pattern and the first opaque pattern are opaque patterns or light transmissive patterns.

In an optional embodiment of the present disclosure, the first opaque pattern surrounds the first transparent pattern, the first transparent pattern is rectangular and includes a first edge, a second edge, a third edge and a fourth edge that are sequentially connected end to end, wherein the transition structure between the second edge and the fourth edge and the first opaque pattern is an opaque pattern or a transparent pattern.

In an optional embodiment of the present disclosure, the transition structure includes a first transition structure and a second transition structure, the first light-transmitting pattern surrounds the first light-transmitting pattern, the first light-transmitting pattern is rectangular and includes a first edge, a second edge, a third edge and a fourth edge that are sequentially connected end to end, wherein the first edge and the third edge and the first light-transmitting pattern are provided with the first transition structure therebetween, the second edge and the fourth edge and the first light-transmitting pattern are provided with the second transition structure therebetween, and the first transition structure and the second transition structure satisfy any one of the following conditions:

the number of the second light-transmitting patterns included in the first transition structure is different from that of the second light-transmitting patterns included in the second transition structure;

the number of the second opaque patterns included in the first transition structure is different from the number of the second opaque patterns included in the second transition structure.

The line width of the second light-transmitting pattern included in the first transition structure is different from the line width of the second light-transmitting pattern included in the second transition structure;

the line width of the second opaque pattern included in the first transition structure is different from the line width of the second opaque pattern included in the second transition structure.

In an optional embodiment of the present disclosure, a line width of the second light-transmitting pattern gradually increases from the first opaque pattern to the first light-transmitting pattern.

In an alternative embodiment of the present disclosure, the transition structure includes 3 to 5 of the second light-transmissive patterns and 3 to 5 of the second light-opaque patterns.

In an optional embodiment of the present disclosure, line widths of the second light-transmitting pattern and the second light-tight pattern are both less than 2.5 um.

The embodiment of the present disclosure further provides a manufacturing method of a display substrate, including:

and forming a photosensitive pixel defining layer material layer on the driving substrate, exposing the pixel defining layer material layer by using the mask plate, and developing to form a pattern of the pixel defining layer.

The embodiment of the disclosure also provides a display substrate, wherein the pixel defining layer of the display substrate is obtained by adopting the mask plate to perform composition on the material layer of the pixel defining layer.

In an alternative embodiment of the disclosure, the slope angle of the pattern of the pixel defining layer is less than 20 °.

In an alternative embodiment of the present disclosure, the pixel defining layer of the display substrate defines a pixel opening area exposing at least two anode patterns, orthographic projections of the at least two anode patterns on the display substrate do not overlap.

In an optional embodiment of the present disclosure, the pixel opening area is rectangular, the pattern of the pixel defining layer includes a first side surface, a second side surface, a third side surface and a fourth side surface which are sequentially connected end to end around the pixel opening area, the first side surface and the third side surface have the same slope angle, the second side surface and the fourth side surface have the same slope angle, and the slope angle of the first side surface is greater than the slope angle of the second side surface.

In an alternative embodiment of the present disclosure, the pixel opening area has the same shape as the first light-transmissive pattern; or

The shape of the pixel opening area is the same as the shape defined by the contour of the transition structure.

Embodiments of the present disclosure also provide a display device including the display substrate as described above.

The embodiment of the disclosure has the following beneficial effects:

in the scheme, the mask plate comprises a first light-transmitting graph and a first light-proof graph, a transition structure is arranged between the first light-transmitting graph and the first light-proof graph, the transition structure comprises a plurality of second light-transmitting graphs and second light-proof graphs which are alternately arranged, the line width of the second light-transmitting graphs and the line width of the second light-proof graphs are smaller than the resolving power of an exposure machine which uses the mask plate to carry out exposure, thus, when the mask plate is used for exposing a material layer of a pixel defining layer, when exposure light penetrates through the transition structure, the patterns of the transition structure can not be effectively resolved, the light penetrates through the transition structure and then becomes a fuzzy form, only part of the light can irradiate the material layer of the pixel defining layer through the transition structure, transition can be formed between the first light-transmitting graph and the first light-proof graph, thus, after the material layer of the pixel defining layer is developed, the junction between the pixel definition layer material layer removing area and the pixel definition layer material layer retaining area forms gentle transition, so that the side surface of the formed graph of the pixel definition layer has gentle slope, the slope angle of the graph of the pixel definition layer can be reduced, color cast is not easy to form, a packaging layer is formed subsequently, when the organic rheological material is printed on the display substrate, the leveling of the organic rheological material is easy, the packaging reliability can be ensured, and the yield of the display device is improved.

Drawings

FIG. 1 is a schematic diagram of a conventional mask;

FIG. 2 is a schematic view of a mask shown in FIG. 1 being used to expose a material layer of a pixel defining layer;

FIG. 3 is a diagram illustrating a pixel definition layer pattern in the related art;

FIG. 4 is a schematic diagram of a mask according to an embodiment of the present disclosure;

FIG. 5 is a schematic diagram of exposing a material layer of a pixel defining layer using the mask shown in FIG. 4 according to an embodiment of the disclosure;

FIG. 6 is a schematic diagram of a pixel definition layer pattern according to an embodiment of the disclosure;

fig. 7 is a schematic view of a mask according to another embodiment of the present disclosure;

fig. 8 is a schematic view of a mask according to still another embodiment of the present disclosure.

Reference numerals

1 substrate base plate

2 buffer layer

3 gate insulating layer

4 interlayer insulating layer

5 passivation layer and planarization layer

61 pixel definition layer material layer

6 pixel definition layer

7 active layer

8 grid

9 source electrode

10 drain electrode

11 Anode

Mask plate in Y correlation technology

Y1 opaque pattern

Y2 light transmissive graphic

M mask plate of this disclosed embodiment

M1 first opaque pattern

M2 first light transmissive pattern

M3 transition structure

M31 second opaque pattern

M32 second light-transmitting pattern

B1 first edge

B2 second edge

B3 third edge

B4 fourth edge

Detailed Description

In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present disclosure clearer, the following detailed description will be given with reference to the accompanying drawings and specific embodiments.

Fig. 1 is a schematic view of a conventional mask, as shown in fig. 1, a conventional mask Y for manufacturing a pixel defining layer includes an opaque pattern Y1 and a transparent pattern Y2, where the opaque pattern Y1 corresponds to a pattern of a pixel defining layer to be formed, fig. 2 is a schematic view of exposing a material layer of the pixel defining layer by using the mask shown in fig. 1, where the mask shown in fig. 2 is a schematic view of a cross section of the mask shown in fig. 1 in an AA' direction, fig. 3 is a schematic view of a pattern of the pixel defining layer formed after developing the material layer of the pixel defining layer, as shown in fig. 3, a value of a slope angle α of the pattern of the pixel defining layer is generally large and reaches 30 ° or more, such as 34.8 °, an organic light emitting layer of a display substrate is a continuous film layer covering an entire layer of the pattern of the pixel defining layer, if the slope angle of the pattern of the pixel defining layer is too large, light emission efficiency of the organic light emitting layer is affected, a large viewing angle color shift is easily caused, and an encapsulation layer is subsequently formed, when the organic material is printed on the display substrate, the organic material is not easy.

The embodiment of the disclosure provides a mask plate, a display substrate, a manufacturing method of the display substrate and a display device, and can improve the yield of the display device.

The embodiment of the present disclosure provides a mask plate, which is used to manufacture a pixel defining layer of a display substrate, where fig. 4 is a schematic view of the mask plate in the embodiment of the present disclosure, and fig. 5 is a schematic view of a cross section of the mask plate in the AA' direction shown in fig. 4, as shown in fig. 4 and fig. 5, the mask plate M in the embodiment includes a first transparent pattern M2 and a first opaque pattern M1, and further includes a transition structure M3 located between the first transparent pattern M2 and the first opaque pattern M1, the transition structure M3 includes a plurality of second transparent patterns M32 and second opaque patterns M31 that are alternately arranged, a line width d2 of the second transparent pattern M32 is smaller than a resolving power of an exposure machine that performs exposure using the mask plate, and a line width d1 of the second opaque pattern M31 is smaller than a resolving power of an exposure machine that performs exposure using the mask plate.

In this embodiment, the mask plate includes a first light-transmitting pattern and a first light-tight pattern, a transition structure is disposed between the first light-transmitting pattern and the first light-tight pattern, the transition structure includes a plurality of second light-transmitting patterns and second light-tight patterns which are alternately arranged, line widths of the second light-transmitting patterns and the second light-tight patterns are smaller than a resolving power of an exposure machine which uses the mask plate to perform exposure, so that when the mask plate is used to expose a material layer of a pixel defining layer, when exposure light passes through the transition structure, the patterns of the transition structure cannot be resolved effectively, the light passes through the transition structure and becomes a fuzzy form, only part of the light can irradiate the material layer of the pixel defining layer through the transition structure, a transition can be formed between the first light-transmitting pattern and the first light-tight pattern, so that after the material layer of the pixel defining layer is developed, the junction between the pixel definition layer material layer removing area and the pixel definition layer material layer retaining area forms gentle transition, so that the side surface of the formed graph of the pixel definition layer has gentle slope, the slope angle of the graph of the pixel definition layer can be reduced, color cast is not easy to form, a packaging layer is formed subsequently, when the organic rheological material is printed on the display substrate, the leveling of the organic rheological material is easy, the packaging reliability can be ensured, and the yield of the display device is improved.

Compared with the method of reducing the gradient angle of the pixel defining layer by soft baking, curing and other process means, the mask plate of the embodiment is used for preparing the pixel defining layer, so that the process time for preparing the pixel defining layer can be reduced, and the method is beneficial to mass production. In addition, compared with the mode that a semi-permeable film is arranged between the first light-transmitting pattern M2 and the first light-tight pattern M1 to reduce the gradient angle of the pixel defining layer, the technical scheme of the embodiment can greatly reduce the production cost of the mask plate.

Taking the mask plate as an example for performing exposure on an exposure machine with resolution of 2.5 μ M, the line width d1 of the first transparent pattern M2 and the line width d2 of the first opaque pattern M1 of the present embodiment are both smaller than 2.5um, when light passes through the pattern region of the transition structure M3, the pattern of the transition structure M3 cannot be effectively resolved, and the light passes through the pattern region of the transition structure M3 to become a blurred form, so as to achieve a partially transparent effect, only a part of the light can pass through the transition structure M3 and irradiate onto the pixel defining layer material layer, so as to form a transition between the first transparent pattern M2 and the first opaque pattern M1, so that after the pixel defining layer material layer is developed, a smooth transition is formed at the boundary between the pixel defining layer material layer removing region and the pixel defining layer material layer retaining region, so that the side surface of the formed pattern of the pixel defining layer has a smooth slope, the slope angle of the pattern of the pixel defining layer can be reduced, and the slope angle of the pixel defining layer manufactured by the mask plate of the embodiment can be less than 20 degrees, for example, up to 14.9 degrees.

In this embodiment, the second light-transmitting pattern of the mask plate and the line width of the second light-tight pattern are determined by the resolution of the exposure machine that uses the mask plate to perform exposure, the resolution of different exposure machines is different, and the second light-transmitting pattern of the mask plate and the line width of the second light-tight pattern need to be smaller than the resolution of the exposure machine that uses the mask plate to perform exposure.

In some embodiments, if the photosensitive pixel defining layer is made of a positive photoresist material, the first opaque pattern M1 corresponds to the upper surface of the pixel defining layer, the first transparent pattern M2 corresponds to the pixel opening region defined by the pixel defining layer, the transition structure M3 corresponds to the side surface of the pixel defining layer, the first opaque pattern M1 has the same shape as the upper surface of the pixel defining layer, the first transparent pattern M2 has the same shape as the pixel opening region defined by the pixel defining layer, and the transition structure M3 has the same shape as the orthographic projection of the side surface of the pixel defining layer on the display substrate.

In some embodiments of the present disclosure, as shown in fig. 4, the second transparent pattern M32 and the second opaque pattern M31 may be both ring-shaped, and the center of the second transparent pattern M32 coincides with the center of the second opaque pattern M31. That is, the transition structure M3 is continuous, and the transition structure M3 surrounds the first light transmissive pattern M2, so that the slope angle of all side surfaces of the pixel defining layer can be reduced.

In some embodiments of the present disclosure, the first opaque pattern M1 surrounds the first light transmission pattern M2, and the transition structure M3 may be disposed between each edge and the first opaque pattern M1 or the transition structure M3 may be disposed between a partial edge and the first opaque pattern M1, that is, the transition structure M3 is discontinuous, so that in a region where the transition structure M3 is disposed, a slope angle of a side surface of a corresponding pixel defining layer may be reduced, and in a region where the transition structure M3 is not disposed, a slope angle of a side surface of a corresponding pixel defining layer is not changed, that is, side surfaces of pixel defining layers in different regions have different slope angles, so that when a luminescent material ink is inkjet-printed on the display substrate, the luminescent material ink is relatively easily leveled in a region where the slope angle of the side surface of the pixel defining layer is relatively low, in the region where the slope angle of the side surface of the pixel defining layer is relatively high, the leveling of the luminescent material ink is not easy to achieve, so that the leveling direction of the luminescent material ink can be controlled.

In a specific example, as shown in fig. 7, the first opaque pattern M1 surrounds the first transparent pattern M2, the first transparent pattern M2 is rectangular, and includes a first edge B1, a second edge B2, a third edge B3 and a fourth edge B4 which are sequentially connected end to end, where the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 are opaque patterns, and of course, the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 may also be transparent patterns.

Thus, after the mask plate M shown in fig. 7 is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer extending in the direction perpendicular to the CC ' direction has a smaller slope angle, and the side surface of the pixel defining layer extending in the direction perpendicular to the BB ' direction has a larger slope angle, so that after the luminescent material ink is printed on the display substrate by ink jet, the luminescent material ink is easier to level in the CC ' direction.

In some embodiments of the present disclosure, the transition structure may further include a first transition structure and a second transition structure, the first light-transmitting pattern surrounds the first light-transmitting pattern, the first light-transmitting pattern is rectangular and includes a first edge, a second edge, a third edge and a fourth edge that are sequentially connected end to end, wherein the first edge and the third edge and the first light-transmitting pattern are respectively provided with the first transition structure therebetween, the second edge and the fourth edge and the first light-transmitting pattern are respectively provided with the second transition structure therebetween, and the first transition structure and the second transition structure satisfy any one of the following conditions:

the number of the second light-transmitting patterns included in the first transition structure is different from that of the second light-transmitting patterns included in the second transition structure;

the number of the second opaque patterns included in the first transition structure is different from the number of the second opaque patterns included in the second transition structure.

The line width of the second light-transmitting pattern included in the first transition structure is different from the line width of the second light-transmitting pattern included in the second transition structure;

the line width of the second opaque pattern included in the first transition structure is different from the line width of the second opaque pattern included in the second transition structure.

The larger the line width of the second light-transmitting pattern is, the more light is transmitted, and the smaller the gradient angle is; the larger the line width of the second light-tight pattern is, the less the light is transmitted, and the larger the gradient angle is; the larger the number of the second light-transmitting patterns and the second light-tight patterns is, the smaller the slope angle is.

Therefore, the slope angle of the side surface of the pixel defining layer corresponding to the transition structure can be adjusted by adjusting the line width of the second opaque pattern, the line width of the second light-transmitting pattern, the number of the second opaque patterns and the number of the second light-transmitting patterns which are included by the first transition structure and the second transition structure, so that the pixel defining layer meeting the requirements is obtained.

If the number of the second transparent patterns M32 and the second opaque patterns M31 included in the transition structure M3 is too large, the cost and the structural complexity of the mask may be increased, and therefore, the transition structure may include 3 to 5 second transparent patterns M32 and 3 to 5 second opaque patterns M31, which may effectively reduce the slope angle of the patterns of the pixel defining layer without increasing the cost of the mask.

In some embodiments, the line widths of the second opaque patterns M32 and the second opaque patterns M31 are gradually increased in a direction from the first opaque patterns M1 to the first transparent patterns M2, so that when exposure is performed by using a mask M, the transmittance of light passing through the transition structure M3 is gradually increased in a direction from the first opaque patterns M1 to the first transparent patterns M2, a smooth transition can be formed at an interface between a pixel defining layer material layer removal region and a pixel defining layer material layer retention region, and a pattern side surface of a pixel defining layer is formed to have a gradual slope.

In some embodiments, when the transition structure M3 is annular, the outline shape of the transition structure M3 may be substantially the same as the shape of the first light transmission pattern M2; as shown in fig. 8, the contour shape of the transition structure M3 may also be different from the shape of the first light transmission pattern M2.

The above embodiment is described by using a positive photoresist material for the photosensitive pixel defining layer material layer, but it is needless to say that a negative photoresist material may be used for the photosensitive pixel defining layer material layer, when the photosensitive pixel defining layer material layer uses a negative photoresist material, the first transparent pattern M2 corresponds to the upper surface of the pixel defining layer, the first opaque pattern M1 corresponds to the pixel opening region defined by the pixel defining layer, the transition structure M3 corresponds to the side surface of the pixel defining layer, the first transparent pattern M2 has the same shape as the upper surface of the pixel defining layer, the first opaque pattern M1 has the same shape as the pixel opening region defined by the pixel defining layer, and the transition structure M3 has the same shape as the positive projection of the side surface of the pixel defining layer on the display substrate.

The embodiment of the present disclosure further provides a method for manufacturing a display substrate, including:

and forming a photosensitive pixel defining layer material layer on the driving substrate, exposing the pixel defining layer material layer by using the mask plate, and forming a pattern of the pixel defining layer after developing, wherein the gradient angle of the pattern of the pixel defining layer is less than 20 degrees.

In this embodiment, the mask plate includes a first light-transmitting pattern and a first light-tight pattern, a transition structure is disposed between the first light-transmitting pattern and the first light-tight pattern, the transition structure includes a plurality of second light-transmitting patterns and second light-tight patterns which are alternately arranged, line widths of the second light-transmitting patterns and the second light-tight patterns are smaller than a resolving power of an exposure machine which uses the mask plate to perform exposure, so that when the mask plate is used to expose a material layer of a pixel defining layer, when exposure light passes through the transition structure, the patterns of the transition structure cannot be resolved effectively, the light passes through the transition structure and becomes a fuzzy form, only part of the light can irradiate the material layer of the pixel defining layer through the transition structure, a transition can be formed between the first light-transmitting pattern and the first light-tight pattern, so that after the material layer of the pixel defining layer is developed, the junction between the pixel definition layer material layer removing area and the pixel definition layer material layer retaining area forms gentle transition, so that the side surface of the formed graph of the pixel definition layer has gentle slope, the slope angle of the graph of the pixel definition layer can be reduced, color cast is not easy to form, a packaging layer is formed subsequently, when the organic rheological material is printed on the display substrate, the leveling of the organic rheological material is easy, the packaging reliability can be ensured, and the yield of the display device is improved.

In some embodiments, the layer of photosensitive pixel defining layer material employs a positive photoresist, the method comprising:

a photosensitive pixel defining layer material layer is formed on the driving substrate, the pixel defining layer material layer is exposed by using the mask plate, and a pattern of the pixel defining layer is formed after development, wherein a first opaque pattern M1 of the mask plate corresponds to the upper surface of the pixel defining layer, a first transparent pattern M2 corresponds to a pixel opening area defined by the pixel defining layer, and a transition structure M3 corresponds to the side surface of the pixel defining layer.

In a specific example, taking a positive negative photoresist as an example of the photosensitive pixel defining layer material layer, as shown in fig. 5, when the pixel defining layer is patterned, a photosensitive pixel defining layer material layer 61 is formed on a driving substrate, where the driving substrate includes a substrate 1, and a buffer layer 2, an active layer 7, a gate insulating layer 3, a gate electrode 8, an interlayer insulating layer 4, a source electrode 9, a drain electrode 10, a passivation layer, a planarization layer 5, an anode electrode 11, and the like, which are located on the substrate 1. The mask plate M is used for exposing the material layer 61 of the pixel defining layer, a first light-tight graph M1 of the mask plate M corresponds to a graph region of the pixel defining layer, a first light-transmitting graph M2 of the mask plate M corresponds to a pixel region defined by the graph of the pixel defining layer, a transition structure M3 is arranged between the first light-tight graph M1 and the first light-transmitting graph M2, the transition structure M3 comprises a plurality of second light-transmitting graphs M32 and second light-tight graphs M31 which are alternately arranged, the line width d2 of each second light-transmitting graph M32 is smaller than the resolving power of an exposure machine which uses the mask plate M for exposure, and the line width d1 of each second light-tight graph M31 is smaller than the resolving power of the exposure machine which uses the mask plate M for exposure.

When exposure light penetrates through the transition structure M3, the pattern of the transition structure M3 cannot be effectively resolved, the light becomes a fuzzy form after penetrating through the transition structure M3, only part of the exposure light penetrates through the transition structure M3 to irradiate the pixel defining layer material layer 61, so that after the pixel defining layer material layer 61 is developed, a gentle transition is formed at the junction between the pixel defining layer material layer removing region and the pixel defining layer material layer retaining region, the side surface of the formed pattern of the pixel defining layer has a gentle slope, and the slope angle of the pattern of the pixel defining layer can be reduced.

In this embodiment, the pattern of the pixel defining layer 6 includes a lower surface close to the substrate base plate 1, an upper surface far from the substrate base plate 1, and a side surface between the two surfaces, and the slope angle β of the pattern of the pixel defining layer 6 is an included angle between the side surface and the surface far from the substrate base plate 1.

Taking the example that the photosensitive pixel defining layer material layer adopts a positive negative photoresist material, the shape of the first opaque pattern M1 and the upper surface of the pixel defining layer 6 may be the same, the shape of the first transparent pattern M2 and the pixel opening area defined by the pixel defining layer 6 may be the same, and the shape of the transition structure M3 and the shape of the orthographic projection of the side surface of the pixel defining layer 6 on the display substrate may be the same.

In the mask M for manufacturing the display substrate of this embodiment, as shown in fig. 4, the second transparent pattern M32 and the second opaque pattern M31 may be both ring-shaped, and the center of the second transparent pattern M32 is overlapped with the center of the second opaque pattern M31. That is, the transition structure M3 is continuous, and the transition structure M3 surrounds the first transparent pattern M2, so that after the pixel defining layer 6 of the display substrate is manufactured by using the mask plate M, the slope angles of all side surfaces of the pixel defining layer 6 are relatively small.

In the mask M for manufacturing the display substrate of this embodiment, the first opaque pattern M1 surrounds the first transparent pattern M2, and in a plurality of edges of the first transparent pattern M1, the transition structure M3 may be disposed between each edge and the first opaque pattern M1, or the transition structure M3 may be disposed between a partial edge and the first opaque pattern M1, that is, the transition structure M3 is discontinuous, when the transition structure M3 is a discontinuous structure, after the pixel defining layer 6 of the display substrate is manufactured by using the mask M, the region of the transition structure M3 is disposed, the slope angle of the side surface of the formed pixel defining layer is smaller, the region of the transition structure M3 is not disposed, the slope angle of the side surface of the formed pixel defining layer is larger, that is, the side surfaces of the pixel defining layers in different regions have different slope angles, so that when the luminescent material ink is printed on the display substrate by ink jet, the light-emitting material ink is easy to level in an area with a lower side surface slope angle of the pixel defining layer, and the light-emitting material ink is not easy to level in an area with a higher side surface slope angle of the pixel defining layer, so that the leveling direction of the light-emitting material ink can be controlled.

In a specific example, in manufacturing the mask M of the display substrate of this embodiment, as shown in fig. 7, the first opaque pattern M1 surrounds the first transparent pattern M2, the first transparent pattern M2 is rectangular, and includes a first edge B1, a second edge B2, a third edge B3, and a fourth edge B4 which are sequentially connected end to end, where the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 are opaque patterns, and of course, the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 may also be transparent patterns.

Thus, after the mask plate M shown in fig. 7 is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer extending in the direction perpendicular to the CC ' direction has a smaller slope angle, and the side surface of the pixel defining layer extending in the direction perpendicular to the BB ' direction has a larger slope angle, so that after the luminescent material ink is printed on the display substrate by ink jet, the luminescent material ink is easier to level in the CC ' direction.

The pixel opening area manufactured by using the mask shown in fig. 7 is rectangular, but the pixel opening area of the display substrate manufactured in this embodiment is not limited to be rectangular, and may have other shapes, and fig. 7 is only an exemplary illustration. For example, the pixel opening area made by using the mask shown in fig. 8 is a diamond shape.

In some display substrates, the sub-pixels of the same color are positioned in the same column, and the luminescent material ink for ink-jet printing is easy to level in the column direction, so that the luminescent material ink for ink-jet printing can be prevented from overflowing to the adjacent columns to cause pixel color crosstalk; in order to enable the luminescent material ink for ink-jet printing to be easy to level in the column direction, the mask plate M may be designed, for example, the mask plate M is provided with a transition structure M3 with an extension direction perpendicular to the column direction, but not with a transition structure M3 with an extension direction perpendicular to the row direction, so that after the mask plate M is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer with the extension direction perpendicular to the column direction has a smaller slope angle, and the side surface of the pixel defining layer with the extension direction perpendicular to the row direction has a larger slope angle, so that the luminescent material ink for ink-jet printing is easy to level in the column direction.

In some display substrates, the sub-pixels of the same color are positioned in the same row, and the luminescent material ink for ink-jet printing is easy to level in the row direction, so that the luminescent material ink for ink-jet printing can be prevented from overflowing to the adjacent rows to cause pixel cross color; in order to enable the luminescent material ink for ink-jet printing to be relatively easy to level in the row direction, the mask plate M may be designed, for example, the mask plate M is provided with a transition structure M3 with an extension direction perpendicular to the row direction, but not with a transition structure M3 with an extension direction perpendicular to the column direction, so that after the mask plate M is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer with the extension direction perpendicular to the row direction has a smaller slope angle, and the side surface of the pixel defining layer with the extension direction perpendicular to the column direction has a larger slope angle, so that the luminescent material ink for ink-jet printing is relatively easy to level in the row direction.

In some embodiments of the present disclosure, the transition structure may further include a first transition structure and a second transition structure, the first light-transmitting pattern surrounds the first light-transmitting pattern, the first light-transmitting pattern is rectangular and includes a first edge, a second edge, a third edge and a fourth edge that are sequentially connected end to end, wherein the first edge and the third edge and the first light-transmitting pattern are respectively provided with the first transition structure therebetween, the second edge and the fourth edge and the first light-transmitting pattern are respectively provided with the second transition structure therebetween, and the first transition structure and the second transition structure satisfy any one of the following conditions:

the number of the second light-transmitting patterns included in the first transition structure is different from that of the second light-transmitting patterns included in the second transition structure;

the number of the second opaque patterns included in the first transition structure is different from the number of the second opaque patterns included in the second transition structure.

The line width of the second light-transmitting pattern included in the first transition structure is different from the line width of the second light-transmitting pattern included in the second transition structure;

the line width of the second opaque pattern included in the first transition structure is different from the line width of the second opaque pattern included in the second transition structure.

The larger the line width of the second light-transmitting pattern is, the more light is transmitted, and the smaller the gradient angle is; the larger the line width of the second light-tight pattern is, the less the light is transmitted, and the larger the gradient angle is; the larger the number of the second light-transmitting patterns and the second light-tight patterns is, the smaller the slope angle is.

Therefore, the slope angle of the side surface of the pixel defining layer of the display substrate can be adjusted by adjusting the line width of the second opaque patterns, the line width of the second light-transmitting patterns, the number of the second opaque patterns and the number of the second light-transmitting patterns which are included in the first transition structure and the second transition structure, so that the pixel defining layer meeting the requirements is obtained.

For large-sized display products, the pixel defining layer of the display substrate defines a pixel opening area exposing at least two anode patterns, orthographic projections of the at least two anode patterns on the display substrate do not overlap.

For small-sized display products, in order to ensure the pixel density of the display products, the area of a pixel opening area of a display substrate is unequal, when materials are evaporated or printed by ink jet in the pixel opening area, in order to meet the manufacturing deviation, the position and parameters of a transition structure in a mask plate can be designed, so that the pixel opening area with a large area has a large slope angle and the pixel opening area with a small area has a small slope angle in the manufactured display substrate, and the requirement of the manufacturing deviation is met.

In the above embodiment, when the mask plate is used to manufacture the pixel defining layer of the display substrate, the mask plate is parallel to the display substrate, and the row direction of the mask plate is consistent with the row direction of the display substrate; the column direction of the mask plate is consistent with the column direction of the display substrate.

Of course, the photosensitive pixel defining layer material layer may also adopt a negative photoresist material, and when the photosensitive pixel defining layer material layer adopts a negative photoresist material, the method includes:

a photosensitive pixel defining layer material layer is formed on a driving substrate, the pixel defining layer material layer is exposed by using the mask plate, and a pattern of the pixel defining layer is formed after development, wherein a first light-transmitting pattern M2 of the mask plate corresponds to the upper surface of the pixel defining layer, a first light-tight pattern M1 corresponds to a pixel opening area defined by the pixel defining layer, and a transition structure M3 corresponds to the side surface of the pixel defining layer.

The embodiment of the disclosure also provides a display substrate manufactured by the manufacturing method of the display substrate, and the slope angle of the graph of the pixel defining layer of the display substrate is less than 20 degrees.

As shown in fig. 6, the display substrate of the present embodiment includes a pixel defining layer 6 on a driving substrate, wherein the driving substrate includes a substrate base 1, and a buffer layer 2, an active layer 7, a gate insulating layer 3, a gate electrode 8, an interlayer insulating layer 4, a source electrode 9, a drain electrode 10, a passivation layer, a planarization layer 5, an anode electrode 11, and the like on the substrate base 1.

In the display substrate of this embodiment, the slope angle β of pixel definition layer 6 is less, is difficult to form the colour cast like this to follow-up formation encapsulation layer, when printing organic rheological material on display substrate, the levelling of easy organic rheological material can guarantee the reliability of encapsulation, and then improves display device's yield.

In some embodiments, if the photosensitive pixel defining layer is made of a positive photoresist material, the first opaque pattern M1 corresponds to the upper surface of the pixel defining layer, the first transparent pattern M2 corresponds to the pixel opening region defined by the pixel defining layer, the transition structure M3 corresponds to the side surface of the pixel defining layer, the first opaque pattern M1 has the same shape as the upper surface of the pixel defining layer, the first transparent pattern M2 has the same shape as the pixel opening region defined by the pixel defining layer, and the transition structure M3 has the same shape as the orthographic projection of the side surface of the pixel defining layer on the display substrate.

In the mask M for manufacturing the display substrate of this embodiment, as shown in fig. 4, the second transparent pattern M32 and the second opaque pattern M31 may be both ring-shaped, and the center of the second transparent pattern M32 is overlapped with the center of the second opaque pattern M31. That is, the transition structure M3 is continuous, and the transition structure M3 surrounds the first transparent pattern M2, so that after the pixel defining layer 6 of the display substrate is manufactured by using the mask plate M, the slope angles of all side surfaces of the pixel defining layer 6 are relatively small.

In the mask M for manufacturing the display substrate of this embodiment, the first opaque pattern M1 surrounds the first transparent pattern M2, and in a plurality of edges of the first transparent pattern M1, the transition structure M3 may be disposed between each edge and the first opaque pattern M1, or the transition structure M3 may be disposed between a partial edge and the first opaque pattern M1, that is, the transition structure M3 is discontinuous, when the transition structure M3 is a discontinuous structure, after the pixel defining layer 6 of the display substrate is manufactured by using the mask M, the region of the transition structure M3 is disposed, the slope angle of the side surface of the formed pixel defining layer is smaller, the region of the transition structure M3 is not disposed, the slope angle of the side surface of the formed pixel defining layer is larger, that is, the side surfaces of the pixel defining layers in different regions have different slope angles, so that when the luminescent material ink is printed on the display substrate by ink jet, the light-emitting material ink is easy to level in an area with a lower side surface slope angle of the pixel defining layer, and the light-emitting material ink is not easy to level in an area with a higher side surface slope angle of the pixel defining layer, so that the leveling direction of the light-emitting material ink can be controlled.

In a specific example, as shown in fig. 7, the first opaque pattern M1 surrounds the first transparent pattern M2, the first transparent pattern M2 is rectangular, and includes a first edge B1, a second edge B2, a third edge B3 and a fourth edge B4 which are sequentially connected end to end, where the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 are opaque patterns, and of course, the transition structures M3 between the second edge B2 and the fourth edge B4 and the first opaque pattern M1 may also be transparent patterns.

Thus, after the mask plate M shown in fig. 7 is used to manufacture the pixel defining layer of the display substrate, the pixel opening region defined by the pixel defining layer is rectangular, the pattern of the pixel defining layer includes a first side surface, a second side surface, a third side surface and a fourth side surface which surround the pixel opening region and are sequentially connected end to end, the extending direction of the first side surface is perpendicular to the BB 'direction, the extending direction of the second side surface is perpendicular to the CC' direction, the slope angles of the first side surface and the third side surface are the same, the slope angles of the second side surface and the fourth side surface are the same, and the slope angle of the first side surface is greater than that of the second side surface. After the luminescent material ink is subjected to ink-jet printing on the display substrate, the luminescent material ink is relatively easy to level in the CC' direction.

The pixel opening area manufactured by using the mask shown in fig. 7 is rectangular, but the pixel opening area of the display substrate manufactured in this embodiment is not limited to be rectangular, and may have other shapes, and fig. 7 is only an exemplary illustration. For example, the pixel opening area made by using the mask shown in fig. 8 is a diamond shape.

In some display substrates, the sub-pixels of the same color are positioned in the same column, and the luminescent material ink for ink-jet printing is easy to level in the column direction, so that the luminescent material ink for ink-jet printing can be prevented from overflowing to the adjacent columns to cause pixel color crosstalk; in order to enable the luminescent material ink for ink-jet printing to be easy to level in the column direction, the mask plate M may be designed, for example, the mask plate M is provided with a transition structure M3 with an extending direction perpendicular to the column direction, but not with a transition structure M3 with an extending direction perpendicular to the row direction, so that after the mask plate M is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer of the display substrate, which is perpendicular to the column direction, has a smaller slope angle, and the side surface of the pixel defining layer of the display substrate, which is perpendicular to the row direction, has a larger slope angle, so that the luminescent material ink for ink-jet printing is easy to level in the column direction.

In some display substrates, the sub-pixels of the same color are positioned in the same row, and the luminescent material ink for ink-jet printing is easy to level in the row direction, so that the luminescent material ink for ink-jet printing can be prevented from overflowing to the adjacent rows to cause pixel cross color; in order to enable the luminescent material ink for ink-jet printing to be relatively easy to level in the row direction, the mask plate M may be designed, for example, the mask plate M is provided with a transition structure M3 with an extending direction perpendicular to the row direction, but not with a transition structure M3 with an extending direction perpendicular to the column direction, so that after the mask plate M is used to manufacture the pixel defining layer of the display substrate, the side surface of the pixel defining layer of the display substrate, which is perpendicular to the row direction, has a smaller slope angle, and the side surface of the pixel defining layer of the display substrate, which is perpendicular to the column direction, has a larger slope angle, so that the luminescent material ink for ink-jet printing is relatively easy to level in the row direction.

In some embodiments of the present disclosure, the transition structure may further include a first transition structure and a second transition structure, the first light-transmitting pattern surrounds the first light-transmitting pattern, the first light-transmitting pattern is rectangular and includes a first edge, a second edge, a third edge and a fourth edge that are sequentially connected end to end, wherein the first edge and the third edge and the first light-transmitting pattern are respectively provided with the first transition structure therebetween, the second edge and the fourth edge and the first light-transmitting pattern are respectively provided with the second transition structure therebetween, and the first transition structure and the second transition structure satisfy any one of the following conditions:

the number of the second light-transmitting patterns included in the first transition structure is different from that of the second light-transmitting patterns included in the second transition structure;

the number of the second opaque patterns included in the first transition structure is different from the number of the second opaque patterns included in the second transition structure.

The line width of the second light-transmitting pattern included in the first transition structure is different from the line width of the second light-transmitting pattern included in the second transition structure;

the line width of the second opaque pattern included in the first transition structure is different from the line width of the second opaque pattern included in the second transition structure.

The larger the line width of the second light-transmitting pattern is, the more light is transmitted, and the smaller the gradient angle is; the larger the line width of the second light-tight pattern is, the less the light is transmitted, and the larger the gradient angle is; the larger the number of the second light-transmitting patterns and the second light-tight patterns is, the smaller the slope angle is.

Therefore, the slope angle of the side surface of the pixel defining layer of the display substrate can be adjusted by adjusting the line width of the second opaque patterns, the line width of the second light-transmitting patterns, the number of the second opaque patterns and the number of the second light-transmitting patterns which are included in the first transition structure and the second transition structure, so that the pixel defining layer meeting the requirements is obtained.

For large-sized display products, the pixel defining layer of the display substrate defines a pixel opening area exposing at least two anode patterns, orthographic projections of the at least two anode patterns on the display substrate do not overlap.

For small-sized display products, in order to ensure the pixel density of the display products, the area of a pixel opening area of a display substrate is unequal, when materials are evaporated or printed by ink jet in the pixel opening area, in order to meet the manufacturing deviation, the position and parameters of a transition structure in a mask plate can be designed, so that the pixel opening area with a large area has a large slope angle and the pixel opening area with a small area has a small slope angle in the manufactured display substrate, and the requirement of the manufacturing deviation is met.

In the above embodiment, the row direction of the mask plate is the same as the row direction of the display substrate; the column direction of the mask plate is consistent with the column direction of the display substrate.

In some embodiments, when the transition structure M3 is annular, the outline shape of the transition structure M3 may be substantially the same as the shape of the first light transmission pattern M2; as shown in fig. 8, the contour shape of the transition structure M3 may also be different from the shape of the first light transmission pattern M2. The pixel opening region defined by the pixel defining layer may have the same shape as the first light transmission pattern M3; alternatively, the shape of the pixel opening area is the same as the shape defined by the outline of the transition structure M3.

The above embodiment is described by using a positive photoresist material for the photosensitive pixel defining layer material layer, but the photosensitive pixel defining layer material layer is not limited to use of a positive photoresist material, and may also use a negative photoresist material, when the photosensitive pixel defining layer material layer uses a negative photoresist material, the first transparent pattern M2 corresponds to the upper surface of the pixel defining layer, the first opaque pattern M1 corresponds to the pixel opening region defined by the pixel defining layer, the transition structure M3 corresponds to the side surface of the pixel defining layer, the shape of the first transparent pattern M2 is the same as that of the upper surface of the pixel defining layer, the shape of the first opaque pattern M1 is the same as that of the pixel opening region defined by the pixel defining layer, and the shape of the transition structure M3 is the same as that of a positive projection of the side surface of the pixel defining layer on the display substrate.

Embodiments of the present disclosure also provide a display device including the display substrate as described above.

The display device includes but is not limited to: radio frequency unit, network module, audio output unit, input unit, sensor, display unit, user input unit, interface unit, memory, processor, and power supply. It will be appreciated by those skilled in the art that the above described configuration of the display device does not constitute a limitation of the display device, and that the display device may comprise more or less of the components described above, or some components may be combined, or a different arrangement of components. In the disclosed embodiments, the display device includes, but is not limited to, a display, a mobile phone, a tablet computer, a television, a wearable electronic device, a navigation display device, and the like.

The display device may be: the display device comprises a television, a display, a digital photo frame, a mobile phone, a tablet personal computer and any other product or component with a display function, wherein the display device further comprises a flexible circuit board, a printed circuit board and a back plate.

In the method embodiments of the present disclosure, the sequence numbers of the steps are not used to limit the sequence of the steps, and for those skilled in the art, the sequence of the steps is also within the protection scope of the present disclosure without creative efforts.

It should be noted that, in the present specification, all the embodiments are described in a progressive manner, and the same and similar parts among the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. In particular, for the embodiments, since they are substantially similar to the product embodiments, the description is simple, and the relevant points can be referred to the partial description of the product embodiments.

Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.

It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.

In the foregoing description of embodiments, the particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.

The above description is only for the specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present disclosure, and all the changes or substitutions should be covered within the scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.