阅读说明：本技术 用于数字光刻工具的基于模型的动态位置校正 (Model-based dynamic position correction for digital lithography tools ) 是由 塔纳·科斯坤 穆罕默德·波伊拉兹 钟钦 帕查·蒙哥尔旺格罗恩 于 2020-01-16 设计创作，主要内容包括：本公开内容一般涉及光刻系统以及用于校正光刻系统中的位置误差的方法。在第一次启动光刻系统时,所述系统进入稳定期。在所述稳定期期间,在所述系统印刷或曝光基板时,收集位置读数和数据,诸如温度、压力和湿度数据。基于所收集的数据和位置读数来产生模型。在后续稳定期中,使用所述模型来估计误差,并且在所述后续稳定期期间动态地校正所估计的误差。(The present disclosure relates generally to a lithography system and a method for correcting position errors in a lithography system. At the first start-up of the lithography system, the system enters a stabilization phase. During the stabilization period, position readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes substrates. A model is generated based on the collected data and the location readings. In a subsequent stationary phase, an error is estimated using the model, and the estimated error is dynamically corrected during the subsequent stationary phase.)