阅读说明：本技术 一种图案转移印刷装置及方法 (Pattern transfer printing device and method ) 是由 陈维强 韩涵 张鹤仙 黄国保 王存辉 范卫芳 于 2021-07-23 设计创作，主要内容包括：本申请涉及一种图案转移印刷装置及方法,所述图案转移印刷装置包括脉冲光源系统、控制脉冲光源系统产生脉冲光的脉冲光源控制系统、透明材质的图案转印模板和待印刷基板,在图案转印模板的第二表面设置凹槽,并在凹槽中填充浆料,通过脉冲光源控制系统控制脉冲光源系统产生脉冲光,利用脉冲光照射到浆料上提供的热量,使浆料快速、整体的转移印刷到待印刷基板上,使用该装置在作为待印刷基板的太阳能电池基板上制造栅线,相比丝网印刷技术,该装置可以降低太阳能电池栅线的宽度,提高栅线的高宽比,降低金属化成本,同时提高栅线制造的速率。(The utility model relates to a pattern shifts printing device and method, the pattern shifts printing device includes pulse light source system, the pulse light source control system who controls pulse light source system production pulse light, transparent material's pattern rendition template and wait to print the base plate, set up the recess on the second surface of pattern rendition template, and fill the thick liquids in the recess, produce pulse light through pulse light source control system control pulse light source system, utilize the heat that the pulse light shines on the thick liquids provides, make thick liquids quick, holistic transfer printing is to waiting to print on the base plate, use the device to make the grid line on the solar cell base plate as waiting to print the base plate, compare screen printing technique, the device can reduce the width of solar cell grid line, improve the aspect ratio of grid line, reduce the metallization cost, improve the rate that the grid line was made simultaneously.)

1. The pattern transfer printing device is characterized by comprising a pulse light source system (100), a pulse light source control system (101), a pattern transfer printing template (200) and a substrate to be printed (300), wherein the pulse light source control system (101) is used for controlling the pulse light source system (100) to generate pulse light and irradiating the pulse light to a first surface (208) of the pattern transfer printing template (200);

the pattern transfer printing template (200) is made of transparent materials, a preset groove (400) filled with slurry (203) is formed in the second surface (209) of the pattern transfer printing template (200), the second surface (209) of the pattern transfer printing template (200) is arranged opposite to the substrate (300) to be printed, and a preset distance is kept between the second surface and the substrate (300) to be printed.

2. The pattern transfer printing apparatus according to claim 1, wherein the surface of the pregroove (400) is provided with a light energy absorbing layer (204), and the light energy absorbing layer (204) has a thickness of 1-10 μm.

3. The pattern transfer printing apparatus according to claim 1, wherein the area of the second surface (209) of the pattern transfer stamp (200) where the pregroove (400) is not located is provided with a light-reflective film (202), the light-reflective film (202) having a thickness of 1-100 μm.

4. The pattern transfer printing apparatus according to claim 1, further comprising a scraper assembly (500) for scraping the paste (203) into the predetermined groove (400), wherein the scraper assembly (500) comprises a filler scraper (501), a cleaning scraper (502), a paste recovery member (503) and a scraper shoe (504), the filler scraper (501) and the cleaning scraper (502) are respectively disposed at both ends of the scraper shoe (504), the paste recovery member (503) is disposed between the filler scraper (501) and the cleaning scraper (502), an included angle between the filler scraper (501) and the pattern transfer template (200) is 10-90 °, and an included angle between the cleaning scraper (502) and the pattern transfer template (200) is 90-160 °.

5. The pattern transfer printing apparatus according to claim 1, wherein the predetermined distance is 1-1000 μm.

6. The pattern transfer printing apparatus according to claim 1, wherein the pulsed light source system (100) comprises one of a pulsed xenon lamp or a pulsed krypton lamp, the pulsed light source system (100) producing illumination pulses of a width of less than 10 ms.

7. The pattern transfer printing apparatus according to claim 1, wherein the cross-sectional shape of the pregroove (400) comprises a square, a semi-ellipse, a trapezoid, or a semicircle, and the pregroove (400) has a width of 1-100 μm and a depth of 5-50 μm.

8. The pattern transfer printing device according to claim 1, wherein the pattern transfer template (200) comprises one of plexiglass, borosilicate glass, quartz glass or silicate glass and has a thickness of 1-100 mm.

9. A pattern transfer printing method applied to the pattern transfer printing apparatus according to any one of claims 1 to 9, comprising the steps of:

machining a preset groove (400) on the second surface (209) of the pattern transfer template (200);

filling the slurry (203) into the preset groove (400);

arranging the pattern transfer template (200) at a predetermined position, wherein the second surface of the pattern transfer template (200) is arranged opposite to the substrate (300) to be printed and keeps a preset distance from the substrate (300) to be printed;

and irradiating the first surface of the pattern transfer template (200) by using a pulse light source system (100) according to preset time so as to transfer the slurry (203) onto the substrate to be printed (300).

Technical Field

The application relates to the technical field of precision printing, in particular to a pattern transfer printing device and method.

Background

The electric energy is obtained from solar energy and needs to be converted into electricity by a solar cell, the crystalline silicon solar cell is a semiconductor electronic device which can effectively absorb solar radiation and convert the solar radiation into electric energy, one of the most critical steps for producing the crystalline silicon solar cell is to manufacture very fine grid lines on the front and back surfaces of a silicon wafer, the grid lines are used for guiding electrons generated by converting the light energy into the electric energy out of the crystalline silicon solar cell, and the process for manufacturing the grid lines is generally completed by a screen printing technology.

Grid lines deposited through screen printing are arranged on the front side and the back side of each silicon solar cell, the grid lines on the front side are thinner than those on the back side, and photo-generated electrons collected by the front effective area of the solar cell are transmitted to a larger collecting lead and then transmitted to a circuit system of the module through the grid lines on the front side. One negative effect of the grid lines on the front side of the cell is shadowing, which blocks a small amount of sunlight from entering the active area of the cell, thereby reducing the photoelectric conversion efficiency.

Solar cell screen printing equipment and automation have had very big progress, have possessed the ability of carrying out the repeated printing many times on micron order size, however, because thinner grid line requires more highly to the half tone of screen printing, need the better electrically conductive silver thick liquid of matching performance, lead to manufacturing cost to improve, more importantly, to producing high-efficient solar cell, the speed that the screen printing technique printed low temperature silver thick liquid still seriously restricts the productivity of production line.

Disclosure of Invention

The application provides a pattern transfer printing device and method, which are used for solving the problems that the printing speed of the traditional screen printing is low and the width of a grid line caused by the limitation of a screen printing plate cannot be reduced.

In a first aspect of the present application, a pattern transferring and printing apparatus provided to solve the above technical problems includes a pulse light source system, a pulse light source control system, a pattern transferring template, and a substrate to be printed, where the pulse light source control system is configured to control the pulse light source system to generate pulsed light, and irradiate the pulsed light onto a first surface of the pattern transferring template;

the pattern transfer printing template is made of transparent materials, a preset groove filled with slurry is formed in the second surface of the pattern transfer printing template, the second surface of the pattern transfer printing template is opposite to the substrate to be printed, and a preset distance is kept between the second surface of the pattern transfer printing template and the substrate to be printed.

Further, a light energy absorption layer is arranged on the surface of the preset groove, and the thickness of the light energy absorption layer is 1-10 μm.

Furthermore, a reflective film is arranged in the second surface of the pattern transfer printing template in the area where the preset groove is not arranged, and the thickness of the reflective film is 1-100 μm.

Further, still including be used for with thick liquids blade coating extremely the scraper subassembly in the predetermined recess, the scraper subassembly includes filler scraper, clear scraper, thick liquids recovery part and scraper collet, the filler scraper with clear scraper sets up respectively the both ends of scraper collet, thick liquids recovery part sets up the centre of filler scraper with clear scraper, the filler scraper with the contained angle between the pattern rendition template is 10-90, clear scraper with the contained angle between the pattern rendition template is 90-160.

The cleaning assembly comprises a cleaning storage part and a nozzle part, the cleaning storage part is used for storing the cleaned residual slurry, and the nozzle part is in a fan shape.

Further, the preset distance is 1-1000 μm.

Further, the pulse light source system comprises one of a pulse xenon lamp and a pulse krypton lamp, and the pulse width of illumination generated by the pulse light source system is less than 10 ms.

Furthermore, the cross section of the preset groove comprises a square shape, a semi-ellipse shape, a trapezoid shape or a semicircular shape, the width of the preset groove is 1-100 μm, and the depth of the preset groove is 5-50 μm.

Further, the pattern transfer template comprises one of organic glass, high borosilicate glass, quartz glass or silicate glass, and has a thickness of 1-100 mm.

In a second aspect of the present application, there is provided a pattern transfer printing method for solving the above-mentioned technical problem, the method comprising the steps of:

processing a preset groove on the second surface of the pattern transfer printing template;

filling the slurry into the preset groove;

arranging the pattern transfer printing template at a preset position, wherein the second surface of the pattern transfer printing template is arranged opposite to the substrate to be printed and keeps a preset distance from the substrate to be printed;

and according to preset time, irradiating the first surface of the pattern transfer printing template by using a pulse light source system to transfer the slurry onto the substrate to be printed.

The technical scheme provided by the application comprises the following beneficial technical effects:

the utility model provides a technical scheme provides a pattern transfer printing device includes the pulsed light source system, the pulsed light source control system of control pulsed light source system production pulsed light, transparent material's pattern rendition template and treat the printing substrate, second surface at pattern rendition template sets up the recess, and fill thick liquids in the recess, through pulsed light source control system control pulsed light source system production pulsed light, utilize the heat that the pulsed light shines and provides on the thick liquids, it is quick to make thick liquids, holistic transfer printing is to treating on the printing substrate, use the device to make the grid line on the solar cell base plate as treating the printing substrate, compare screen printing technique, the device can reduce the width of solar cell grid line, improve the aspect ratio of grid line, reduce the metallization cost, improve the rate that the grid line was made simultaneously.

Drawings

In order to more clearly explain the technical solution of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious to those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic view of a pattern transfer printing apparatus according to an embodiment of the present disclosure;

FIG. 2 is a top packing blade assembly provided in an embodiment of the present application;

FIG. 3 is an underfill scraper assembly provided in accordance with an embodiment of the present application;

FIG. 4 is a cross-sectional square pattern transfer template of grooves according to an embodiment of the present application;

FIG. 5 is a cross-sectional view of a pattern transfer template with oval grooves according to an embodiment of the present application;

FIG. 6 is a schematic view of a pattern transfer template with trapezoidal groove cross-sections according to an embodiment of the present application;

FIG. 7 is a cross-sectional view of a pattern transfer template having grooves with semicircular cross-sections according to an embodiment of the present application;

FIG. 8 is a schematic view of a second surface of a pattern transfer template provided with a reflective film according to an embodiment of the present application;

fig. 9 is a schematic view of a light energy absorbing layer disposed in a groove of a pattern transfer template according to an embodiment of the present disclosure.

Description of reference numerals: 100-pulsed light source system; 101-a pulsed light source control system; 200-a pattern transfer template; 201-quartz glass; 202-a reflective film; 203-slurry; 204-light energy absorbing layer; 208-a first surface; 209-a second surface; 300-a substrate to be printed; 400-groove; 500-a doctor assembly; 501-a filler scraper; 502-clearing scraper; 503-a slurry recovery means; 504-doctor blade holder.

Detailed Description

In order to make the technical solutions in the present application better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application; it is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

In the manufacturing process of the silicon solar cell, very fine grid lines need to be manufactured on the front surface and the back surface, and the application provides a pattern transfer printing device and a method capable of quickly manufacturing the fine grid lines on the silicon solar cell.

Fig. 1 is a diagram illustrating a pattern transfer printing apparatus according to an exemplary embodiment of the present application, as shown in fig. 1, the apparatus including: the pattern transfer printing device comprises a pulse light source system 100 for generating pulse illumination, a pulse light source control system 101 for controlling the pulse light source system to generate the pulse illumination, a pattern transfer printing template 200 with a groove 400 arranged on a second surface 209, slurry 203 capable of being filled in the groove 400, a substrate 300 to be printed with grid lines to be prepared, wherein the pulse light generated by the pulse light source system 100 is irradiated on a first surface 208 of the pattern transfer printing template 200, and the second surface 209 of the pattern transfer printing template 200 is arranged opposite to the substrate 300 to be printed and keeps a distance of 1-1000 mu m with the substrate 300 to be printed. The pulse light source system 100 includes a pulse lamp capable of generating high-intensity pulse light and a reflector for controlling an illumination range, the pulse lamp may be a pulse xenon lamp, a pulse krypton lamp, or the like, the illumination pulse width is usually less than 10ms, for example, a xenon lamp tube is used, the pulse width of the pulse light is controlled to be 100 μ s, and the reflector is planar or circular, so that all light generated by the lamp tube is uniformly and intensively irradiated on the pattern transfer template 200, thereby improving the utilization rate of the light.

The pattern transfer printing apparatus of the present application further includes a scraper assembly 500 for scraping and filling the slurry 203 into the groove 400, as shown in fig. 2, the scraper assembly 500 includes a filling scraper 501 for scraping and filling the slurry into the groove 400, a cleaning scraper 502 for scraping and cleaning the slurry on the quartz glass 200 except the groove 400 and repairing the flatness of the surface of the slurry 203 in the groove 400, a scraper mounting 504 for mounting the filling scraper 501 and the cleaning scraper 502, and a slurry recovery part 503 for recovering and cleaning the excess slurry, wherein the filling scraper 501 and the cleaning scraper 502 are respectively disposed at two ends of the scraper mounting 504, the slurry recovery part 503 is disposed between the filling scraper 501 and the cleaning scraper 502, the filling scraper 501 is made of a plastic adhesive tape with hardness greater than HB95, the cleaning scraper is made of stainless steel, and when in use, the angle between the filler blade 501 and the pattern transfer template 200 is set to 10-90 deg., and the angle between the clean blade 502 and the pattern transfer template 200 is set to 90-160 deg..

The pattern transfer printing apparatus of the present application further includes a cleaning assembly for cleaning the residual slurry on the used pattern transfer template 200, the cleaning assembly includes a cleaning storage part for collecting and storing the cleaned residual slurry and a head part for spraying a cleaning liquid, the head part is fan-shaped and has a size capable of covering the entire pattern transfer template 200.

The first embodiment of the present application: the hard transparent substrate is used as the pattern transfer template 200, one of organic glass, high borosilicate glass, quartz glass and silicate glass can be selected, the thickness of the glass is 1-100mm, for example, a quartz glass plate with the thickness of 2mm is used, according to the shape and distribution condition of the grid line required on the solar cell, a mask chemical corrosion or mechanical processing method is adopted on the quartz glass plate, a groove 400 corresponding to the grid line of the solar cell is obtained by processing, the width of the groove 400 is usually 1-100 μm, the depth is 5-50 μm, the preferred width of the groove 400 is 20-40 μm, the depth is 15-25 μm, for example, the groove 400 is prepared by the processes of masking, exposure, development, chemical etching and the like, the prepared groove 400 has the width of 30 μm and the depth of 20 μm, and can be prepared into a groove with the cross section as shown in fig. 4, Square, semi-oval, trapezoidal, semi-circular, etc. shapes as shown in fig. 5, 6, 7.

After the groove 400 is prepared on the quartz glass plate, the slurry is required to be filled into the groove 400, the slurry is high in viscosity and not easy to flow, such as tin paste for electronic industry, silver paste for solar cells, aluminum paste and the like, and an organic solvent which is easy to volatilize after being heated is added into the slurry. The process of filling the groove 400 with paste containing silver paste is as follows: one side of the groove 400 of the quartz glass plate is arranged below the lower filling scraper component 500, as shown in fig. 3, an included angle between the advancing direction of the filling scraper 501 and the quartz glass plate is set to be 60 degrees, an included angle between the advancing direction of the cleaning scraper 502 and the quartz glass plate is set to be 130 degrees, firstly, slurry is extruded to the quartz glass plate in front of the filling scraper 501 through a slurry feeding device, then, the scraper component 500 is moved, the slurry is scraped and filled into the groove 400 on the quartz glass plate through the filling scraper 501, slurry at other positions on the quartz glass plate is completely removed through the cleaning scraper 502, the surface flatness of the slurry 203 in the groove 400 is repaired, and the slurry in the groove 400 is full and flat.

Placing the quartz glass plate filled with the slurry right above a solar cell substrate serving as a grid line to be prepared of a substrate 300 to be printed, wherein one surface of the quartz glass plate with the groove 400 is opposite to the solar cell substrate, the other surface of the quartz glass plate is opposite to a pulse xenon lamp serving as a light source, the distance between the quartz glass plate and the solar cell substrate is 200 mu m, the distance between the quartz glass plate and the pulse xenon lamp is 5cm, the pulse light source control system 101 controls the pulse xenon lamp to expose for 100 mus, the slurry in the groove 400 of the quartz glass plate is irradiated by light, the temperature is rapidly increased, the organic components in the slurry 203 are vaporized, and the generated gas generates a certain gas pressure between the interface of the slurry 203 and the grooves 400, under the driving of the air pressure, the silver paste remaining in the paste 203 is separated from the groove 400, and is transferred and printed on the solar cell substrate, so that the preparation of the grid line of the solar cell substrate is completed.

Second embodiment of the present application: different from the first embodiment, one side of the groove 400 on the quartz glass plate after the groove 400 is etched is placed above the upper filling scraper component 500, as shown in fig. 2, the angle between the advancing direction of the filling scraper 501 and the quartz glass plate is set to 60 degrees, the angle between the advancing direction of the cleaning scraper 502 and the quartz glass plate is set to 130 degrees, a slurry recycling component 503 is arranged between the filling scraper 501 and the cleaning scraper 502, and similarly, the scraper component is moved, the slurry 203 is filled into the groove 400 by using the filling scraper 501 and the cleaning scraper 502, and the slurry is full and flat, and meanwhile, the excess slurry is recycled by using the slurry recycling component 503, so that on one hand, the surface of the quartz glass plate is kept clean and tidy, and on the other hand, the recycled slurry can be reused. The quartz glass plate filled with the paste was subjected to gate line fabrication of the solar cell substrate in the same manner as in the first example.

A third embodiment of the present application: different from the two previous embodiments, before the groove 400 of the quartz glass plate is filled with the slurry 203, as shown in fig. 8, a reflective film 202 is disposed on the surface of the quartz glass plate except for the other region of the groove by a vacuum coating method, etc., the reflective film 202 has a high temperature resistance, and can be selected from a thin film layer such as a metal reflective film, an interference reflective film, a silver-aluminum alloy layer, a nichrome layer, etc., the thickness of the reflective film 202 is 1-100 μm, for example, a nichrome layer reflective film with a thickness of 5 μm is selected, the reflective film can be disposed to reflect the light irradiated on the region of the quartz glass plate without the groove into the glass plate again, so that more light can enter the side surface of the groove 400, the light energy can be fully utilized, the vaporization and separation speed of the slurry can be improved, the light can be prevented from passing through the quartz glass plate to irradiate on the substrate 300 to be printed, and the temperature of the substrate 300 to be printed can be prevented from rising, affecting the performance of the product.

A fourth embodiment of the present application: different from the first three embodiments, the surface of the groove 400 of the quartz glass plate is coated with the light energy absorbing layer 204, as shown in fig. 9, the light energy absorbing layer 204 can be selected from a black nickel, a chromium and an alloy layer, for example, a black nickel coating with a thickness of 1 μm is coated, the light energy absorbing layer 204 can absorb more light, the temperature of the paste 203 is increased more quickly, the paste 203 is further separated from the groove 400 more easily, the transfer rate is increased, the exposure energy can be reduced, and energy is saved.

According to the embodiment of the application, quartz glass is selected as the pattern transfer printing template 200 bearing the slurry 203, micron-sized grooves 400 are etched and processed on the surface of the pattern transfer printing template, the slurry for preparing grid lines is filled into the grooves 400, the quartz glass plate is irradiated by light emitted by a pulse xenon lamp, organic components in the slurry 400 are gasified, power is provided by generated air pressure, the conductive part in the slurry 400 is quickly and accurately transferred onto a solar cell substrate to form the required grid lines, the manufacturing of all the grid lines on one surface of the solar cell substrate can be completed in one time in such a mode, the manufacturing speed and the accuracy of the grid lines are improved, and the using amount of the slurry is reduced.

It is noted that relational terms such as "first" and "second," and the like, may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that an article or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

The above description is merely exemplary of the present application and is presented to enable those skilled in the art to understand and practice the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

It will be understood that the present application is not limited to what has been described above and shown in the accompanying drawings, and that various modifications and changes can be made without departing from the scope thereof. The scope of the application is limited only by the appended claims.