阅读说明：本技术 一种水基环保中性清洗液 (Water-based environment-friendly neutral cleaning solution ) 是由 刘江华 付元涛 章小琴 于 2019-09-18 设计创作，主要内容包括：一种水基环保中性清洗液,属于微电子材料用清洗液的技术领域,按重量百分比计,包括式I结构的烷基醇聚醚0.1-25％、醇醚类溶剂0.1-50％、醇类溶剂0.1-25％,去离子水30-99.7％,<Image he="189" wi="446" file="DSA0000191220040000011.GIF" imgContent="drawing" imgFormat="GIF" orientation="portrait" inline="no"></Image>其中m,n均为1-50的整数。本发明清洗液适用于TFT-LCD、LED、OLED、先进封装和半导体晶圆等制造过程中基材设备表面的清洗。(A water-based environment-friendly neutral cleaning solution belongs to the technical field of cleaning solutions for microelectronic materials, and comprises, by weight, 0.1-25% of alkyl alcohol polyether with a structure of formula I, 0.1-50% of alcohol ether solvents, 0.1-25% of alcohol solvents, 30-99.7% of deionized water, wherein m and n are integers from 1 to 50. The cleaning solution is suitable for TFT-LCD, LED and OLEDCleaning of substrate equipment surfaces during packaging and semiconductor wafer fabrication processes.)

1. The water-based environment-friendly neutral cleaning solution is characterized by comprising 0.1-25 wt% of alkyl alcohol polyether with a structure shown in formula I, 0.1-50 wt% of alcohol ether solvent, 0.1-25 wt% of alcohol solvent and 30-99.7 wt% of deionized water,

2. The water-based environment-friendly neutral cleaning solution as claimed in claim 1, wherein the alcohol ether solvent is glycol ether and/or propylene glycol ether.

3. The water-based environment-friendly neutral cleaning solution as claimed in claim 1, wherein the deionized water has a resistance value of more than 2M Ω/cm.

4. The water-based environmentally friendly neutral cleaning solution as claimed in claim 1, wherein said alcohol solvent is selected from one or more of ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, nonanol, decanol, isopropanol, isobutanol, ethylene glycol, propylene glycol, glycerol, pentaerythritol, xylitol, sorbitol, cyclopentanol, cyclohexanol, benzyl alcohol, phenethyl alcohol, and phenylpropyl alcohol.

5. The water-based environment-friendly neutral cleaning solution as claimed in claim 1, wherein the cleaning solution is prepared by sequentially adding alkyl alcohol polyether with a structure of formula I, alcohol ether solvent, alcohol solvent and deionized water, stirring and dissolving, controlling the temperature in the dissolving process to be less than or equal to 50 ℃, and filtering through a 0.2 μm filter element after the dissolution is finished.

6. The water-based environment-friendly neutral cleaning solution as claimed in claim 1, wherein the cleaning solution is used directly or diluted by 2-100 times.

Technical Field

The invention relates to the technical field of cleaning solution for microelectronic materials, in particular to water-based environment-friendly neutral cleaning solution which is suitable for cleaning the surface of substrate equipment in the manufacturing processes of TFT-LCD, LED, OLED, advanced packaging, semiconductor wafers and the like.

Background

The manufacturing processes of TFT-LCD, LED, OLED, advanced packaging and semiconductor wafer are mainly realized by the photoetching process. In the whole photoetching process, a large amount of photoresist and matched electronic chemicals are used, a large amount of residual impurities are generated on the surface of the equipment substrate in the whole process flow, and the surface of the equipment substrate needs to be cleaned regularly. If the residue cannot be effectively removed, the subsequent process or the production of the product will be affected. Some devices require, in particular, manual cleaning. Some strong-alkali strong-acid cleaning solutions in the market can remove the residual impurities, and the cleaning solutions not only severely corrode equipment substrates, but also cause great harm to human bodies and influence human health.

Disclosure of Invention

The invention aims to provide a water-based environment-friendly neutral cleaning solution which can effectively remove residues on the surface of substrate equipment in the manufacturing processes of TFT-LCDs, LEDs, OLEDs, advanced packages, semiconductor wafers and the like. The product has good cleaning effect, strong wetting permeability, no toxicity and no pollution, and can be directly and manually scrubbed.

The water-based environment-friendly neutral cleaning solution composition comprises the following components: a) alkyl alcohol polyether, b) alcohol ether solvent, c) alcohol solvent, and d) high purity water.

The technical scheme adopted by the invention for realizing the purpose is as follows:

the water-based environment-friendly neutral cleaning solution comprises, by weight, 0.1-25% (preferably 1-15%) of alkyl alcohol polyether with a structure shown in formula I, 0.1-50% (preferably 5-30%) of alcohol ether solvent, 0.1-25% (preferably 0.5-20%) of alcohol solvent, 30-99.7% (preferably 40-98%) of deionized water,

wherein m and n are integers from 1 to 50.

The alcohol ether solvent is glycol ether and/or propylene glycol ether. Wherein the glycol ether is preferably ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, ethylene glycol dibutyl ether, ethylene glycol methyl ethyl ether, ethylene glycol methyl propyl ether, ethylene glycol methyl butyl ether, ethylene glycol propyl butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropylene ether, diethylene glycol dibutyl ether, diethylene glycol methyl ethyl ether, diethylene glycol methyl propyl ether, diethylene glycol methyl butyl ether, diethylene glycol ethyl propyl ether, diethylene glycol monobutyl ether, diethylene glycol propyl butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monopropyl ether, triethylene glycol monobutyl ether, triethylene glycol monomethyl ether, One or more of triethylene glycol diethyl ether, triethylene glycol dipropyl ether, triethylene glycol dibutyl ether, triethylene glycol methyl ethyl ether, triethylene glycol methyl propyl ether, triethylene glycol methyl butyl ether, triethylene glycol ethyl propyl ether, triethylene glycol butyl ether and triethylene glycol propyl butyl ether; wherein the propylene glycol ether is preferably propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol dibutyl ether, propylene glycol methyl ethyl ether, propylene glycol methyl propyl ether, propylene glycol methyl butyl ether, propylene glycol ethyl propyl ether, propylene glycol ethyl butyl ether, propylene glycol propyl butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, one or more of dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, dipropylene glycol dipropyl ether, dipropylene glycol dibutyl ether, dipropylene glycol methyl ethyl ether, dipropylene glycol methyl propyl ether, dipropylene glycol methyl butyl ether, dipropylene glycol ethyl propyl ether, dipropylene glycol ethyl butyl ether, dipropylene glycol propyl butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monopropyl ether and tripropylene glycol monobutyl ether.

The deionized water is deionized water with the resistance value larger than 2M omega/cm.

The alcohol solvent in the present invention is preferably one or more selected from ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, nonanol, decanol, isopropanol, isobutanol, ethylene glycol, propylene glycol, glycerol, pentaerythritol, xylitol, sorbitol, cyclopentanol, cyclohexanol, benzyl alcohol, phenethyl alcohol, and phenylpropyl alcohol.

The cleaning solution is prepared by adding alkyl alcohol polyether with a structure shown in formula I, an alcohol ether solvent, an alcohol solvent and deionized water in sequence, stirring and dissolving, controlling the temperature in the dissolving process to be less than or equal to 50 ℃, and filtering through a 0.2 mu m filter element after the dissolution is finished.

The cleaning solution can be directly used or diluted by 2-100 times (preferably 5-50 times) for use. The cleaning liquid of the invention has no special limitation in the using process, and can be directly scrubbed by hands or washed.

The invention has the beneficial effects that: the water-based environment-friendly neutral cleaning solution can effectively remove impurities such as grease, photoresistance residues, particles, fingerprints, metal impurities and the like on the surface of substrate equipment in the manufacturing processes of TFT-LCDs, LEDs, OLEDs, advanced packages, semiconductor wafers and the like. The product has good cleaning effect, strong wetting permeability, no toxicity and no pollution, and can be directly and manually scrubbed.

Detailed Description

The invention is further illustrated by the following specific examples to further illustrate the advantages of the invention, but the scope of the invention is not limited to the following examples.