阅读说明：本技术 制造图形凸纹结构的方法 (Method for producing a relief structure ) 是由 T·特尔瑟 M·拜尔 D·弗莱舍 C·梅 于 2017-03-27 设计创作，主要内容包括：本发明涉及制造在层结构上的图形凸纹结构的方法。此方法包括：提供具有基底层的层结构。然后将至少一种含有至少一种第一反应性组分的流体以图形方式施加到基底层上,其中以图形方式施加的操作是以多个具有小于2μl液滴体积的液滴的形式进行,和其中以图形方式布置这些液滴。然后,至少一种第一反应性组分在预定的曝光时间内至少部分地扩散到基底层中,和/或至少一种第二反应性组分在预定的曝光时间内至少部分地扩散到以图形方式布置的流体液滴中,其中基底层包含至少一种第二反应性组分。所形成的凸纹然后在加热和/或辐照的作用下经由涉及第一反应性组分和/或第二反应性组分的反应来固定。本发明还涉及根据所述方法制造的图形凸纹结构,以及图形凸纹结构作为印版、作为微流体部件、作为微反应器、作为原子间致导电性电池、作为用于显示颜色的光控元件、作为光子晶体或作为服装用品的柔性部件的用途。(The invention relates to a method of producing a graphic relief structure on a layer structure. The method comprises the following steps: a layer structure having a base layer is provided. At least one fluid containing at least one first reactive component is then applied to the substrate layer in a pattern, wherein the pattern-wise application is performed in the form of a plurality of droplets having a droplet volume of less than 2 μ l, and wherein the droplets are arranged in a pattern. Then, at least one first reactive component is at least partially diffused into the substrate layer during the predetermined exposure time and/or at least one second reactive component is at least partially diffused into the graphically arranged fluid droplets during the predetermined exposure time, wherein the substrate layer comprises the at least one second reactive component. The formed relief is then fixed under the action of heat and/or radiation via a reaction involving the first reactive component and/or the second reactive component. The invention also relates to a patterned relief structure produced according to said method, and to the use of a patterned relief structure as a printing plate, as a microfluidic component, as a microreactor, as an interatomic electroconductivity cell, as a light control element for displaying colors, as a photonic crystal or as a flexible component of an item of clothing.)