Unloading device and chemical mechanical polishing auxiliary equipment
阅读说明:本技术 一种卸载装置及化学机械抛光辅助设备 (Unloading device and chemical mechanical polishing auxiliary equipment ) 是由 孙强 沈思情 张俊宝 陈猛 于 2019-11-20 设计创作,主要内容包括:本发明涉及抛光辅助设备技术领域,尤其涉及一种卸载装置及化学机械抛光辅助设备。本发明提供的卸载装置,包括抛盘、喷淋机构、回收机构、传送机构和卸载机构,喷淋机构包括喷淋槽和多组喷头,回收机构包括回收片盒,传送机构包括传送带,卸载机构包括卸载台和高压水喷头。该卸载装置,通过将抛盘放置在喷淋槽内的传送带上,在传送带能够将抛盘传送至卸载口的过程中,喷头向抛盘上喷射保护液,当传送带将抛盘传送至卸载口处时,卸载台向上运动以将抛盘顶升起来并与传送带分离,并使抛盘与回收片盒的开口相对,高压水喷头将抛盘上的产品喷射入回收片盒内,实现了使抛盘上的产品在卸载过程一直处于湿润状态,便于产品后续的清洗操作。(The invention relates to the technical field of auxiliary polishing equipment, in particular to an unloading device and auxiliary chemical mechanical polishing equipment. The unloading device provided by the invention comprises a throwing disc, a spraying mechanism, a recovery mechanism, a conveying mechanism and an unloading mechanism, wherein the spraying mechanism comprises a spraying groove and a plurality of groups of spray heads, the recovery mechanism comprises a recovery film box, the conveying mechanism comprises a conveying belt, and the unloading mechanism comprises an unloading platform and a high-pressure water spray head. According to the unloading device, the throwing disc is placed on the conveying belt in the spraying groove, the spray head sprays protection liquid onto the throwing disc in the process that the conveying belt can convey the throwing disc to the unloading opening, when the conveying belt conveys the throwing disc to the unloading opening, the unloading platform moves upwards to lift the throwing disc and separate the throwing disc from the conveying belt, the throwing disc is opposite to the opening of the recovery sheet box, the high-pressure water spray head sprays products on the throwing disc into the recovery sheet box, the effect that the products on the throwing disc are always in a wet state in the unloading process is achieved, and the subsequent cleaning operation of the products is facilitated.)
1. An unloading device comprising a throwing disk (100), said throwing disk (100) being configured for placing a product, characterized in that it further comprises:
the spraying mechanism comprises a spraying groove (11) and a plurality of groups of spray heads (12), wherein unloading openings (111) are formed in the spraying groove (11), and the plurality of groups of spray heads (12) are arranged and suspended above the spraying groove (11) along the horizontal direction and can spray protective liquid into the spraying groove (11);
the recovery mechanism comprises a recovery box (21), and an opening of the recovery box (21) is arranged opposite to the unloading opening (111);
the conveying mechanism comprises a conveying belt (31), the conveying belt (31) is partially arranged in the spraying groove (11), the throwing disc (100) is arranged on the conveying belt (31), and the conveying belt (31) can convey the throwing disc (100) to the unloading opening (111);
the unloading mechanism comprises an unloading platform (41) and a high-pressure water spray head (42), the unloading platform (41) can push and lift the throwing disk (100) on the conveying belt (31) and separate from the conveying belt (31), and the high-pressure water spray head (42) can flush the products on the throwing disk (100) into the recovery wafer box (21).
2. Unloading device according to claim 1, wherein each group of spray heads (12) comprises at least two nozzles, the nozzles having a spray angle α, the throwing disk (100) having a diameter D, the spray heads (12) being at a distance L from the throwing disk (100)1Not less than 0.5D (0.5 alpha), and the distance L between two adjacent nozzles2≤0.25D。
3. Unloading device according to claim 2, wherein the spraying mechanism further comprises a spraying pipe (13), the spraying pipe (13) being arranged above the spraying trough (11), the groups of spray heads (12) being in communication with the spraying pipe (13).
4. Unloading device according to claim 2, wherein the unloading device further comprises a blocking mechanism comprising a partition plate (51), an avoiding groove (112) is provided on the bottom of the spray tank (11), the partition plate (51) is arranged in the avoiding groove (112) in a penetrating manner, the partition plate (51) can move in a vertical direction to block the throwing disk (100) from moving along with the conveyor belt (31) or allow the throwing disk (100) to move along with the conveyor belt (31).
5. Unloading device according to claim 4, wherein the number of partitions (51) is multiple, the distance L between two adjacent partitions (51) being such that3In the range of D < L3<2D。
6. Unloading device according to claim 5, wherein the barrier means further comprise a barrier drive (52), the output of the barrier drive (52) being connected to the barrier (51), the barrier drive (52) being able to drive the barrier (51) in a vertical direction.
7. Unloading device according to any one of claims 1-6, wherein the polishing plate (100) is provided with an opening for the product to enter and exit, the unloading mechanism further comprising an unloading drive (43), the unloading drive (43) being capable of driving the unloading station (41) to move in a vertical direction and to rotate in a horizontal plane, so that the opening of the polishing plate (100) is disposed opposite to the opening of the recovery cassette (21).
8. Unloading device according to any one of claims 1-6, wherein a plurality of pockets are provided in the recovery magazine (21), the recovery magazine (21) being movable in a vertical direction so that one pocket receives one product.
9. Unloading device according to claim 8, wherein the recovery mechanism further comprises a recovery station (22) provided with a protective liquid, the recovery cassettes (21) being arranged on the recovery station (22) and the products inside the recovery cassettes (21) being able to be immersed in the protective liquid.
10. A chemical mechanical polishing auxiliary apparatus, characterized by comprising the unloading device according to any one of claims 1 to 9.
Technical Field
The invention relates to the technical field of auxiliary polishing equipment, in particular to an unloading device and auxiliary chemical mechanical polishing equipment.
Background
Chemical Mechanical Polishing (CMP) processes smooth wafers or other substrate materials during processing by Chemical etching and Mechanical forces. The method comprises a chemical process and a physical process, wherein the chemical process is that chemicals in grinding fluid and the surface of a wafer are subjected to chemical reaction to generate substances which are easy to remove; the physical process is that abrasive grains in the grinding fluid and the surface material of the wafer generate mechanical and physical friction to remove substances generated by chemical reaction.
The surface defects of the wafer, which generally include scratches, residues and surface contamination, are inevitably caused after the CMP process, so that the wafer must be effectively cleaned after the CMP process to realize the process advantages of the CMP, and the cleaning process can effectively clean the surface defects of the wafer on the premise that the surface of the wafer after the CMP process is always kept in a wet and non-dry state, otherwise, the wafer cannot be cleaned completely, and the product is unqualified. The existing unloading device can not ensure that the wafer is in a wet state while the wafer is unloaded.
Therefore, there is a need for an unloading apparatus that can ensure that the wafer is in a wet state after polishing.
Disclosure of Invention
An object of the present invention is to provide an unloading apparatus to solve the problems of the prior art, which can ensure the wet state of the polished product.
Another object of the present invention is to provide a chemical mechanical polishing auxiliary device, which can ensure the polished product to be in a wet state by using the unloading device, so as to facilitate cleaning of the product and improve the product quality.
In order to realize the purpose, the following technical scheme is provided:
an unloading device comprising a parabolic dish configured for placement of a product, the unloading device further comprising:
the spraying mechanism comprises a spraying groove and a plurality of groups of spray heads, wherein the spraying groove is provided with an unloading opening, and the plurality of groups of spray heads are arranged and suspended above the spraying groove along the horizontal direction and can spray protective liquid into the spraying groove;
the recovery mechanism comprises a recovery sheet box, and an opening of the recovery sheet box is opposite to the unloading opening;
the conveying mechanism comprises a conveying belt, the conveying belt is partially arranged in the spraying groove, the throwing disc is arranged on the conveying belt, and the conveying belt can convey the throwing disc to the unloading port;
the unloading mechanism comprises an unloading platform and a high-pressure water spray head, the unloading platform can push and lift the throwing disc on the conveying belt and separate from the conveying belt, and the high-pressure water spray head can shoot products on the throwing disc into the recovery film box.
Further, each group of spray heads comprises at least two nozzles, the spray angle of each nozzle is alpha, the diameter of each throwing disk is D, and the distance L from each spray head to each throwing disk1Not less than 0.5D (0.5 alpha), and the distance L between two adjacent nozzles2≤0.25D。
Furthermore, the spraying mechanism further comprises a spraying pipeline, the spraying pipeline is arranged above the spraying groove, and the plurality of groups of spray heads are communicated with the spraying pipeline.
Further, the uninstallation device still includes and separates fender mechanism, it includes the baffle to separate fender mechanism, it dodges the groove to be provided with on the bottom in groove to spray, the baffle wears to establish dodge the inslot, the baffle can remove along vertical direction, in order to block throw the dish along the conveyer belt removes or allows throw the dish along the conveyer belt removes.
Further, the number of the partition plates is multiple, and the distance L between every two adjacent partition plates3In the range of D < L3<2D。
Further, the baffle mechanism further comprises a baffle driver, an output end of the baffle driver is connected with the baffle, and the baffle driver can drive the baffle to move along the vertical direction.
Further, an opening for the products to enter and exit is formed in the throwing disc, the unloading mechanism further comprises an unloading driver, and the unloading driver can drive the unloading table to move in the vertical direction and rotate in the horizontal plane, so that the opening of the throwing disc and the opening of the recovery wafer box are arranged oppositely.
Further, be provided with a plurality of draw-in grooves in retrieving the spool box, retrieve the spool box and can follow vertical direction and remove to make one a product is accomodate to the draw-in groove.
Further, retrieve the mechanism and still including being provided with the recovery platform of protection liquid, retrieve the setting of spool box and be in retrieve the bench, just product in retrieving the spool box can submerge in the protection liquid.
A chemical mechanical polishing auxiliary device comprises the unloading device.
Compared with the prior art, the invention has the beneficial effects that:
the unloading device provided by the invention comprises a throwing disc, a spraying mechanism, a recovery mechanism, a conveying mechanism and an unloading mechanism, wherein the spraying mechanism comprises a spraying groove and a plurality of groups of spray heads, the recovery mechanism comprises a recovery film box, the conveying mechanism comprises a conveying belt, and the unloading mechanism comprises an unloading platform and a high-pressure water spray head. According to the unloading device, the throwing disc is placed on the conveying belt in the spraying groove, the spray head sprays the protective liquid onto the throwing disc in the process that the conveying belt can convey the throwing disc to the unloading opening, when the conveying belt conveys the throwing disc to the unloading opening, the unloading platform moves upwards to lift the throwing disc and separate the throwing disc from the conveying belt, the throwing disc is opposite to the opening of the recovery sheet box, the high-pressure water spray head sprays products on the throwing disc into the recovery sheet box, and the effect that the products on the throwing disc are always in a wet state in the unloading process is achieved.
According to the chemical mechanical polishing auxiliary equipment provided by the invention, the unloading device is applied, so that a polished product can be ensured to be in a wet state, the product is convenient to clean, and the product quality is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the contents of the embodiments of the present invention and the drawings without creative efforts.
Fig. 1 is a front view schematically illustrating an unloading apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic top view of an unloading apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic view of a spray tank and a partition according to an embodiment of the present invention;
fig. 4 is a schematic view of another state of the spray tank and the partition according to the embodiment of the present invention.
Reference numerals:
100-throwing a disc;
11-a spray tank; 111-an unloading port; 112-avoiding groove; 12-a spray head; 13-a spray line; 14-a control valve;
21-recovery box; 22-a recovery station;
31-a conveyor belt; 32-a transmission wheel;
41-unloading station; 42-high pressure water jet; 43-unload drive;
51-a separator; 52-diaphragm drive.
Detailed Description
In order to make the technical solutions of the present invention better understood by those skilled in the art, the technical solutions of the present invention are further described below by way of specific embodiments with reference to the accompanying drawings.
In the description of the present invention, it should be noted that the terms "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships conventionally laid out when the product is used, and are only for convenience of description of the present invention, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention.
In the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection or a removable connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
As shown in fig. 1 to 4, the present embodiment provides an unloading apparatus including a
It should be noted that the product may be a wafer or other optical element. In the present embodiment, the product refers to a polished wafer.
Preferably, as shown in fig. 1, the spraying mechanism includes a
Specifically, as shown in fig. 1 and fig. 3, the
Preferably, each set of nozzles 12 comprises at least two nozzles, the nozzles having an angle of ejection α, a diameter D of the
Further, the spraying mechanism further comprises a spraying pipeline 13, the spraying pipeline 13 is arranged above the
Optionally, as shown in fig. 1-2, the spray mechanism further comprises a support bar that supports the spray pipe 13 above the
Illustratively, the size of the
Preferably, as shown in fig. 1, the transmission mechanism further comprises a transmission wheel 32 and a motor, the motor can drive the transmission wheel 32 to rotate, and the
In order to ensure that the
Illustratively, as shown in fig. 1, in one transfer mechanism, four driving wheels 32 are arranged in two rows and two columns, two driving wheels 32 positioned above partially extend into the
Alternatively, the
Preferably, as shown in fig. 1, the unloading mechanism further includes an unloading driver 43, and the unloading driver 43 can drive the unloading table 41 to move in a vertical direction and rotate in a horizontal plane so that the opening of the
Illustratively, in the present embodiment, the unloading driver 43 includes a linear cylinder for driving the
Further, the spraying angle of the high pressure water spray 42 can be adjusted to adjust the direction of the force of the high pressure water spray 42 on the product on the
Illustratively, the size of the unloading
In order to facilitate the control of the conveying frequency of the
In short, the
In order to prevent the protective liquid in the
Further, in order to prevent the
Preferably, the number of the
Specifically, when the
Further, the blocking mechanism further comprises a partition driver 52, an output end of the partition driver 52 is connected with the
Preferably, the recovery mechanism further comprises a
To improve the accommodation amount of the
In addition, by adjusting the height of the
Illustratively, the recovery mechanism further includes a recovery driver capable of driving the
During actual manufacturing, the size of the unloading device can be flexibly designed according to the proportion according to the requirement, and the unloading device has the advantages of simple manufacture, low price, convenient use, obvious spraying effect and strong universality.
Table 1 shows a comparison table of metal particles and particle contaminants remaining on the surface of the cleaned wafer, and it can be seen from table 1 that, in the method of cleaning the wafer after the maintenance unloading device provided by the present invention is used to form a continuous non-dry aqueous protective film on the surface of the wafer, the remaining amount of the metal particles and particle contaminants is greatly reduced compared to the method of directly cleaning without the maintenance unloading device.
TABLE 1 comparative table of metal particles and particle contaminant residues on the surface of the cleaned wafer
The embodiment also provides chemical mechanical polishing auxiliary equipment which comprises the unloading device, and the unloading device can ensure that the polished product is in a wet state, is convenient to clean and improves the product quality.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
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