阅读说明：本技术 湿空气制备装置、湿空气制备方法以及光刻装置 (Humid air preparation device, humid air preparation method and photoetching device ) 是由 赵丹平 杨志斌 罗晋 于 2018-07-05 设计创作，主要内容包括：本发明公开了湿空气制备装置、湿空气制备方法以及光刻装置。此湿空气制备装置包括：水供给单元、空气供给单元、电场供给单元和雾化腔室单元；其中,水供给单元、空气供给单元以及电场供给单元分别与雾化腔室单元连接；水供给单元用于向雾化腔室单元供给水；电场供给单元用于向雾化腔室单元供电,使雾化腔室单元中形成电场,使水电离雾化；空气供给单元用于向雾化腔室单元中供给压缩空气,压缩空气与雾化后的水在雾化腔室单元中混合,共同形成湿空气；雾化腔室单元包括出气口,出气口用于将形成的湿空气输出,输出的湿空气用于浸没式光刻装置。本发明的技术方案可制备超洁净湿空气,减缓光刻装置中浸没液蒸发速率,增强位置测量单元的抗干扰性能。(The invention discloses a humid air preparation device, a humid air preparation method and a photoetching device. The humid air preparation device comprises: the device comprises a water supply unit, an air supply unit, an electric field supply unit and an atomization chamber unit; wherein, the water supply unit, the air supply unit and the electric field supply unit are respectively connected with the atomizing chamber unit; the water supply unit is used for supplying water to the atomizing chamber unit; the electric field supply unit is used for supplying power to the atomizing chamber unit to form an electric field in the atomizing chamber unit and enable water to be ionized and atomized; the air supply unit is used for supplying compressed air to the atomizing chamber unit, and the compressed air and the atomized water are mixed in the atomizing chamber unit to jointly form wet air; the atomizing chamber unit comprises an air outlet for outputting the formed humid air, and the outputted humid air is used for the immersion lithography device. The technical scheme of the invention can prepare ultra-clean wet air, slow down the evaporation rate of the immersion liquid in the photoetching device and enhance the anti-interference performance of the position measuring unit.)

1. A humid air preparation device, comprising: the device comprises a water supply unit, an air supply unit, an electric field supply unit and an atomization chamber unit;

wherein the water supply unit, the air supply unit and the electric field supply unit are respectively connected with the atomization chamber unit;

the water supply unit is used for supplying water to the atomizing chamber unit;

the electric field supply unit is used for supplying power to the atomizing chamber unit, so that an electric field is formed in the atomizing chamber unit, and water is ionized and atomized;

the air supply unit is used for supplying compressed air into the atomizing chamber unit, and the compressed air and atomized water are mixed in the atomizing chamber unit to jointly form wet air;

the atomizing chamber unit includes an air outlet for outputting the humid air.

2. The humid air preparation device according to claim 1, wherein said water supply unit comprises an ultrapure water supply subunit, a carbon dioxide supply subunit, a mixing chamber subunit and at least one nozzle;

wherein the ultrapure water supply subunit, the carbon dioxide supply subunit and the at least one nozzle are respectively connected with the mixing chamber subunit;

the ultrapure water supply subunit is used for supplying ultrapure water to the mixing chamber subunit;

the carbon dioxide supply subunit is used for supplying carbon dioxide to the mixing chamber subunit;

the mixing chamber sub-unit is used for mixing the ultrapure water with the carbon dioxide;

the nozzle is positioned in the atomizing chamber unit and is used for spraying the mixed ultrapure water.

3. The humid air preparation device according to claim 2, wherein said atomizing chamber unit further comprises at least one perforated plate, said perforated plate being disposed opposite to said nozzle; the electric field supply unit comprises a first electrode and a second electrode; the first electrode is electrically connected with the nozzle, and the second electrode is electrically connected with the porous plate;

the perforated plate and the nozzle are used for forming an electric field inside the atomizing chamber unit when the electric field supply unit supplies power.

4. The humid air preparation device according to claim 3, wherein said perforated plate is plural, said nozzle is plural;

the perforated plate and the nozzles are arranged in a one-to-one opposite mode.

5. The humid air preparation device according to claim 1, further comprising a waste unit;

the atomizing chamber unit still includes the waste discharge mouth, the waste discharge mouth with the unit connection of wasting discharge, the waste discharge mouth is used for discharging waste liquid in the atomizing chamber unit extremely the unit of wasting discharge.

6. The humid air preparation device according to claim 1, further comprising a humid air handling unit;

the wet air processing unit is connected with the atomizing chamber unit;

the humid air handling unit comprises at least one secondary air outlet;

the wet air processing unit is used for monitoring the temperature, cleanliness and flow of the wet air and distributing the wet air, and the secondary air outlet is used for outputting the distributed wet air.

7. The humid air preparation device according to claim 6, wherein said humid air handling unit comprises a temperature control subunit, a pollution monitoring subunit and a flow distribution subunit;

the temperature control subunit is used for monitoring the temperature of the wet air;

the pollution monitoring subunit is used for monitoring the cleanliness of the wet air;

the flow distribution subunit is used for distributing the wet air.

8. The humid air preparation device according to claim 1, further comprising a control unit and a sensor unit;

the sensor unit is connected with the atomization chamber unit, the sensor unit is electrically connected with the control unit, and the control unit is electrically connected with the adjusting end of the water supply unit and the adjusting end of the air supply unit;

the sensor unit is used for monitoring the flow and/or humidity of the wet air and feeding back the flow and/or humidity to the control unit;

the control unit is used for increasing or decreasing the water supply amount of the water supply unit according to the humidity of the humid air; and/or the control unit is used for increasing or decreasing the air supply quantity of the air supply unit according to the flow quantity of the wet air.

9. A humid air preparation method, performed by the humid air preparation device according to any one of claims 1 to 8, comprising:

supplying power to the atomizing chamber unit by using the electric field supply unit to form an electric field in the atomizing chamber unit;

supplying water to the atomizing chamber unit by using the water supply unit, wherein the water is ionized and atomized in the electric field;

supplying compressed air to the atomizing chamber unit by using the air supply unit, and mixing the compressed air with atomized water to form wet air;

the wet air is output from the air outlet;

the humid air is transported to an air using area.

10. The humid air preparation method according to claim 9, further comprising, before supplying water to the atomization chamber unit using the water supply unit:

carbon dioxide is mixed with ultrapure water.

11. The method of preparing humid air according to claim 9, further comprising, after the humid air is output from the air outlet:

acquiring the flow and/or the humidity of the wet air, and transmitting the flow and/or the humidity to a control unit;

the control unit increases or decreases the water supply amount of the water supply unit according to the humidity of the humid air; and/or the control unit increases or decreases the air supply amount of the air supply unit according to the flow rate of the humid air.

12. The method of preparing humid air according to claim 9, further comprising, after the humid air is output from the air outlet:

monitoring the temperature, cleanliness and flow rate of the humid air;

dispensing the humid air;

the distributed wet air is output from the secondary air outlet.

13. The humid air preparation method of claim 9, wherein the water supply unit comprises at least one nozzle, the atomization chamber unit comprises at least one perforated plate, and the perforated plate is disposed opposite to the nozzle; the perforated plate and the nozzle are respectively electrically connected with the electric field supply unit;

utilize the electric field supply unit to supply power to the atomizing chamber unit, make form the electric field in the atomizing chamber unit, include:

and supplying power to the perforated plate and the nozzle by using the electric field supply unit, and forming an electric field between the nozzle and the perforated plate.

14. A lithographic apparatus comprising the humid air preparation device according to any one of claims 1 to 8, further comprising a light source unit, a pattern forming unit, a projection system, an immersion liquid, a substrate, and a carrying unit, which are arranged in sequence along a light propagation direction, further comprising a position measuring unit and an immersion liquid limiting mechanism;

the position measuring unit is used for determining the position of the bearing unit by processing optical information;

the immersion liquid limiting mechanism is used for limiting the immersion liquid and maintaining the immersion liquid to be stable in the field of view of an objective lens of the projection system;

the wet air preparation device is used for preparing wet air and distributing the wet air to the position measuring unit and the immersion liquid limiting mechanism.

Technical Field

The embodiment of the invention relates to the technical field of photoetching, in particular to a wet air preparation device, a wet air preparation method and a photoetching device.

Background

The photolithography process directly determines the feature size of LSI, and is a key process for manufacturing LSI. Existing lithographic apparatus are based on optical lithography, using a projection system to accurately project and expose a pattern on a patterning unit onto a substrate (e.g. a silicon wafer) coated with a photoresist. In a conventional lithographic apparatus, a medium between a lens of a projection system and a photoresist is air, an immersion lithographic apparatus is configured to change an air medium into a liquid medium, and light passes through the liquid medium to shorten a wavelength of a light source, thereby improving a resolution, wherein a shortened magnification is a refractive index of the liquid medium. Since the refractive index of the liquid medium is larger than that of the air medium, the numerical aperture of the lens group of the projection system is increased, and thus a smaller feature size can be obtained.

When the immersion type photoetching device works, the bearing unit drives the substrate to perform high-speed scanning or stepping action, and the position measuring unit obtains the position and the motion state of the bearing unit by processing the information of the measuring light; meanwhile, the immersion liquid limiting mechanism provides a stable immersion liquid flow field in the field range of the objective lens of the projection system according to the motion state of the bearing unit, and ensures the sealing of the immersion liquid flow field with the outside, namely ensures that the immersion liquid does not leak. The pattern on the patterning unit is transferred to the substrate coated with the photoresist by means of an illumination unit, a projection system and an immersion liquid in an imagewise exposure, thereby completing the exposure. The immersion liquid in the immersion type photoetching device is evaporated quickly, and the anti-interference performance of the position measuring unit is poor.

Disclosure of Invention

The invention provides a wet air preparation device, a wet air preparation method and a photoetching device, which are used for slowing down the evaporation rate of immersion liquid and enhancing the anti-interference performance of a position measurement unit.

In a first aspect, an embodiment of the present invention provides a humid air preparation device, including:

the device comprises a water supply unit, an air supply unit, an electric field supply unit and an atomization chamber unit;

wherein the water supply unit, the air supply unit and the electric field supply unit are respectively connected with the atomization chamber unit;

the water supply unit is used for supplying water to the atomizing chamber unit;

the electric field supply unit is used for supplying power to the atomizing chamber unit, so that an electric field is formed in the atomizing chamber unit, and water is ionized and atomized;

the air supply unit is used for supplying compressed air into the atomizing chamber unit, and the compressed air and atomized water are mixed in the atomizing chamber unit to jointly form wet air;

the atomizing chamber unit comprises an air outlet, the air outlet is used for outputting the formed wet air, and the outputted wet air is used for an air using area of the immersion lithography device.

Further, the water supply unit includes an ultrapure water supply sub-unit, a carbon dioxide supply sub-unit, a mixing chamber sub-unit, and at least one nozzle;

wherein the ultrapure water supply subunit, the carbon dioxide supply subunit and the at least one nozzle are respectively connected with the mixing chamber subunit;

the ultrapure water supply subunit is used for supplying ultrapure water to the mixing chamber subunit;

the carbon dioxide supply subunit is used for supplying carbon dioxide to the mixing chamber subunit;

the mixing chamber sub-unit is used for mixing the ultrapure water with the carbon dioxide;

the nozzle is positioned in the atomizing chamber unit and is used for spraying the mixed ultrapure water.

Further, the atomizing chamber unit further comprises at least one perforated plate, and the perforated plate is arranged opposite to the nozzle; the electric field supply unit comprises a first electrode and a second electrode; the first electrode is electrically connected with the nozzle, and the second electrode is electrically connected with the porous plate;

the perforated plate and the nozzle are used for forming an electric field inside the atomizing chamber unit when the electric field supply unit supplies power.

Further, the perforated plate is plural, and the nozzle is plural;

the perforated plate and the nozzles are arranged in a one-to-one opposite mode.

Further, the device also comprises a waste discharge unit;

the atomizing chamber unit still includes the waste discharge mouth, the waste discharge mouth with the unit connection of wasting discharge, the waste discharge mouth is used for discharging waste liquid in the atomizing chamber unit extremely the unit of wasting discharge.

Further, the device also comprises a wet air processing unit;

the wet air processing unit is connected with the atomizing chamber unit;

the humid air handling unit comprises at least one secondary air outlet;

the wet air processing unit is used for monitoring the temperature, cleanliness and flow of the wet air and distributing the wet air, and the secondary air outlet is used for outputting the distributed wet air.

Further, the wet air processing unit comprises a temperature control subunit, a pollution monitoring subunit and a flow distribution subunit;

the temperature control subunit is used for monitoring the temperature of the wet air;

the pollution monitoring subunit is used for monitoring the cleanliness of the wet air;

the flow distribution subunit is used for distributing the wet air.

Further, the device also comprises a control unit and a sensor unit;

the sensor unit is connected with the atomization chamber unit, the sensor unit is electrically connected with the control unit, and the control unit is electrically connected with the adjusting end of the water supply unit and the adjusting end of the air supply unit;

the sensor unit is used for monitoring the flow and/or humidity of the wet air and feeding back the flow and/or humidity to the control unit;

the control unit is used for increasing or decreasing the water supply amount of the water supply unit according to the humidity of the humid air; and/or the control unit is used for increasing or decreasing the air supply quantity of the air supply unit according to the flow quantity of the wet air.

In a second aspect, an embodiment of the present invention provides a humid air preparation method, which is performed by using the humid air preparation device provided in the first aspect, and the humid air preparation method includes:

supplying power to the atomizing chamber unit by using the electric field supply unit to form an electric field in the atomizing chamber unit;

supplying water to the atomizing chamber unit by using the water supply unit, wherein the water is ionized and atomized in the electric field;

supplying compressed air to the atomizing chamber unit by using the air supply unit, and mixing the compressed air with atomized water to form wet air;

the wet air is output from the air outlet;

the humid air is transported to an air using area.

Further, before supplying water to the atomizing chamber unit by the water supply unit, the method further includes:

carbon dioxide is mixed with ultrapure water.

Further, after the humid air is output from the air outlet, the method further comprises:

acquiring the flow and/or the humidity of the wet air, and transmitting the flow and/or the humidity to a control unit;

the control unit increases or decreases the water supply amount of the water supply unit according to the humidity of the humid air; and/or the control unit increases or decreases the air supply amount of the air supply unit according to the flow rate of the humid air.

Further, after the humid air is output from the air outlet, the method further comprises:

monitoring the temperature, cleanliness and flow rate of the humid air;

dispensing the humid air;

the distributed wet air is output from the secondary air outlet.

Further, the water supply unit includes at least one nozzle, and the atomizing chamber unit includes at least one perforated plate disposed opposite to the nozzle; the perforated plate and the nozzle are respectively electrically connected with the electric field supply unit;

utilize the electric field supply unit to supply power to the atomizing chamber unit, make form the electric field in the atomizing chamber unit, include:

and supplying power to the perforated plate and the nozzle by using the electric field supply unit, and forming an electric field between the nozzle and the perforated plate.

In a third aspect, an embodiment of the present invention provides a lithographic apparatus, including the wet air preparation apparatus provided in the first aspect, further including a light source unit, a pattern forming unit, a projection system, an immersion liquid, a substrate, and a carrying unit, which are sequentially arranged along a light propagation direction, and further including a position measuring unit and an immersion liquid limiting mechanism;

the position measuring unit is used for determining the position of the bearing unit by processing optical information;

the immersion liquid limiting mechanism is used for limiting the immersion liquid and maintaining the immersion liquid to be stable in the field of view of an objective lens of the projection system;

the wet air preparation device is used for preparing wet air and distributing the wet air to the position measuring unit and the immersion liquid limiting mechanism.

The embodiment of the invention provides a humid air preparation device, which comprises a water supply unit, an air supply unit, an electric field supply unit and an atomization chamber unit; wherein, the water supply unit, the air supply unit and the electric field supply unit are respectively connected with the atomizing chamber unit; the water supply unit is used for supplying water to the atomizing chamber unit; the electric field supply unit is used for supplying power to the atomizing chamber unit to form an electric field in the atomizing chamber unit and enable water to be ionized and atomized; the air supply unit is used for supplying compressed air to the atomizing chamber unit, and the compressed air and the atomized water are mixed in the atomizing chamber unit to jointly form wet air; the atomizing chamber unit comprises an air outlet, the air outlet is used for outputting formed wet air, and the outputted wet air is used for the immersion type photoetching device, so that the prepared ultra-clean wet air can be outputted to the photoetching device, the evaporation rate of immersion liquid in the photoetching device is reduced, the anti-interference performance of a position measuring unit in the photoetching device is enhanced, and the problems that the evaporation speed of the immersion liquid is high and the anti-interference performance of the position measuring unit is poor in the immersion type photoetching device are solved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, a brief description will be given below of the drawings required for the embodiments or the technical solutions in the prior art, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

FIG. 1 is a schematic structural view of a humid air preparation device according to an embodiment of the present invention;

FIG. 2 is a schematic structural view of another humid air preparation device according to an embodiment of the present invention;

FIG. 3 is a schematic structural view of another humid air preparation device according to an embodiment of the present invention;

FIG. 4 is a schematic structural view of another humid air preparation device according to an embodiment of the present invention;

FIG. 5 is a schematic structural view of another humid air preparation device according to an embodiment of the present invention;

FIG. 6 is a schematic structural view of still another humid air preparation device according to an embodiment of the present invention;

FIG. 7 is a schematic flow diagram of a method of producing humid air according to an embodiment of the present invention;

FIG. 8 is a schematic flow diagram of another method for producing humid air according to an embodiment of the present invention;

FIG. 9 is a schematic flow diagram of yet another method of producing moist air in accordance with an embodiment of the present invention;

FIG. 10 is a schematic flow diagram of yet another method of producing moist air in accordance with an embodiment of the present invention;

FIG. 11 is a schematic structural diagram of a lithographic apparatus according to an embodiment of the invention.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.