阅读说明：本技术 液体涂布装置 (Liquid coating device ) 是由 川上武志 清水英满 三浦秀宣 于 2019-06-24 设计创作，主要内容包括：提供能抑制长条基材及长条基材分隔构件的损伤的涂布装置,其具备：输送机构,其用于将长条基材沿着长度方向输送；以及凹版辊,其用于向长条基材的表面涂布液体,凹版辊的宽度比向长条基材进行液体涂布的液体涂布宽度宽,在长条基材的宽度方向上的两端部中的各端部处,在长条基材与凹版辊之间设置有用于一边与输送的长条基材的端部接触一边使该端部从凹版辊分离的长条基材分隔构件,长条基材分隔构件的与长条基材接触的长条基材接触面的相对于环烯烃聚合物基材的静摩擦系数(μ<Sub>s</Sub>)为0.35以下,表面粗糙度的算术平均粗糙度(Ra)为0.22μm以下,表面粗糙度的最大高度(Rz)为2.2μm以下。(Provided is a coating device capable of suppressing damage to a long substrate and a long substrate partition member, the coating device including: a conveying mechanism for conveying the long substrate along the longitudinal direction; and a gravure roll for applying a liquid to a surface of the long substrate, the gravure roll having a width wider than a liquid application width for applying the liquid to the long substrate, and an end of the long substrate for one side conveyance is provided between the long substrate and the gravure roll at each of both ends of the long substrate in a width directionA long substrate separating member for separating the end portion from the gravure roll while being in contact with the gravure roll, and a coefficient of static friction (mu) with respect to the cycloolefin polymer substrate of a long substrate contact surface of the long substrate separating member which is in contact with the long substrate s ) Is 0.35 or less, the arithmetic average roughness (Ra) of the surface roughness is 0.22 μm or less, and the maximum height (Rz) of the surface roughness is 2.2 μm or less.)

1. A liquid application device, characterized in that,

the liquid application device is provided with:

a conveying mechanism for conveying the long substrate along the longitudinal direction; and

a gravure roll for applying a liquid to a surface of the elongated substrate,

the gravure roll has a width larger than a liquid application width for applying a liquid to the elongated substrate,

a long substrate separation member for separating an end portion of the long substrate from the gravure roll while contacting the end portion of the long substrate being conveyed, is provided between the long substrate and the gravure roll at each of both end portions in the width direction of the long substrate,

a coefficient of static friction (mu) with respect to a COP substrate that is a cycloolefin polymer, of a surface of the long substrate contacting the long substrate of the long substrate separation member_s) Is 0.35 or less, the arithmetic average roughness (Ra) of the surface roughness of the long substrate contact surface is 0.22 [ mu ] m or less, and the maximum height (Rz) of the surface roughness of the long substrate contact surface is 2.2 [ mu ] m or less.

2. The liquid application apparatus according to claim 1,

the surface roughness of the long substrate contact surface has an arithmetic average roughness (Ra) of 0.21 [ mu ] m or less.

3. The liquid application apparatus according to claim 1 or 2,

the maximum height (Rz) of the surface roughness of the long substrate contact surface is2 [ mu ] m or less.

4. The liquid application apparatus according to claim 1 or 2,

two or more long substrate partition members are provided at different positions in the transport direction of the long substrate at each of both ends in the width direction of the long substrate.

5. The liquid application apparatus according to claim 1 or 2,

at both ends of the long substrate in the width direction, one or more long substrate partitioning members are provided on the upstream side and the downstream side of the long substrate in the transport direction with respect to the rotation axis of the gravure roll.

6. The liquid application apparatus according to claim 1 or 2,

the long substrate partitioning member is a member movable in the width direction of the long substrate.

7. The liquid application apparatus according to claim 1 or 2,

the long substrate partition member has a wedge-shaped cross-sectional shape when viewed in the conveyance direction.

8. The liquid application apparatus according to claim 1 or 2,

the width of the long substrate partition member in contact with the long substrate is 1mm or more and 20mm or less in the transport direction of the long substrate.

9. The liquid application apparatus according to claim 1 or 2,

the width of the long substrate partition member in contact with the long substrate is 1mm or more and 100mm or less in the width direction of the long substrate.

10. The liquid application apparatus according to claim 3,

two or more long substrate partition members are provided at different positions in the transport direction of the long substrate at each of both ends in the width direction of the long substrate.

Technical Field

The present invention relates to a liquid application apparatus.

Background

Liquid application apparatuses including a roller for applying a liquid to a long substrate are known (japanese patent laid-open nos. 5-220847, 2014-188410, and 2000-245765).

When applying a liquid to a long substrate, it is sometimes required to form non-liquid-applied portions at both ends of the long substrate.

Disclosure of Invention

The invention aims to provide a coating device which can form a non-coating part on the end part of a long substrate and can coat liquid on the long substrate and can inhibit the damage of the long substrate and a long substrate separating member.

The present invention provides the following liquid application apparatus.

[1] A liquid application device, characterized in that,

the liquid application device is provided with:

a conveying mechanism for conveying the long substrate along the longitudinal direction; and

a gravure roll for applying a liquid to a surface of the elongated substrate,

the gravure roll has a width larger than a liquid application width for applying a liquid to the elongated substrate,

a long substrate separation member for separating an end portion of the long substrate from the gravure roll while contacting the end portion of the long substrate being conveyed, is provided between the long substrate and the gravure roll at each of both end portions in the width direction of the long substrate,

a coefficient of static friction mu of a strip substrate contact surface of the strip substrate separation member contacting the strip substrate with respect to a cycloolefin polymer (COP) substrate_sIs 0.35 or less, the arithmetic average roughness Ra of the surface roughness of the contact surface of the long substrate is 0.22 [ mu ] m or less, and the maximum height Rz of the surface roughness of the contact surface of the long substrate is2.2 μm or less.

[2] The liquid application apparatus according to [1], wherein the arithmetic average roughness Ra of the surface roughness of the contact surface of the long substrate is 0.21 μm or less.

[3] The liquid application apparatus according to [1] or [2], wherein the maximum height Rz of the surface roughness of the contact surface of the long substrate is2 μm or less.

[4] The liquid application apparatus according to any one of [1] to [3], wherein two or more of the long substrate partition members are provided at different positions in a transport direction of the long substrate at each of both end portions in a width direction of the long substrate.

[5] The liquid application apparatus according to any one of [1] to [4], wherein the one or more long substrate partition members are provided at both ends of the long substrate in the width direction on an upstream side and a downstream side in the transport direction of the long substrate with respect to the rotation axis of the gravure roll.

[6] The liquid application apparatus according to any one of [1] to [5], wherein the long substrate partition member is a member movable in a width direction of the long substrate.

[7] The liquid application apparatus according to any one of [1] to [6], wherein a cross-sectional shape of the long substrate partition member when viewed from a transport direction is a wedge shape.

[8] The liquid application apparatus according to any one of [1] to [7], wherein a width of the long substrate partition member in contact with the long substrate is 1mm or more and 20mm or less in a transport direction of the long substrate.

[9] The liquid application apparatus according to any one of [1] to [8], wherein a width of the long substrate partition member in contact with the long substrate is 1mm or more and 100mm or less in a width direction of the long substrate.

According to the present invention, it is possible to provide a coating apparatus capable of preventing damage to the non-liquid-coated portions at both ends of the long substrate, while forming the non-liquid-coated portions at both ends of the long substrate.

Drawings

Fig. 1 is a schematic cross-sectional view showing an example of a liquid application apparatus, as viewed from a conveyance direction of a long substrate.

Fig. 2 is a schematic cross-sectional view of an example of the liquid application apparatus, as viewed from the width direction of the long substrate.

Fig. 3 is a schematic view showing an example of the long substrate partitioning member.

Fig. 4 is a schematic diagram showing an example of a manufacturing apparatus for a laminate provided with a liquid application device.

FIG. 5 is a schematic view showing a liquid application apparatus used in an example.

Description of reference numerals:

a liquid coating apparatus 101, a long substrate 102, a conveying mechanism 103, a gravure roll 104, a liquid supply circulation mechanism 105, a liquid 106, a backup roll 107, a non-coating portion forming mechanism 108, a doctor blade 109, a long substrate contact surface 201, a long substrate coating surface 202, an inclination angle 203, a liquid coating width for liquid coating on the long substrate 204, a support member 205, a dimension in a long substrate conveying direction 206, a dimension in a long substrate width direction 207, an inclination angle 208, a tip end dimension 209, a 301 laminate manufacturing apparatus, a 302 resin film, a 303 unwinding portion, a 304 resin film, a 305 unwinding portion, a 306 nip roll, a 307UV irradiation apparatus, a 308 guide roll, a 309 coated long substrate, and a 310 laminate.

Detailed Description

(liquid applying apparatus)

Hereinafter, the liquid application apparatus will be described with reference to the drawings.

Fig. 1 and 2 are schematic cross-sectional views schematically showing a liquid application apparatus according to an embodiment of the present invention. In fig. 1, the arc-shaped broken line arrow indicates the rotation direction of the roller, and the arrow 110 indicates the conveyance direction of the long substrate. The liquid coating apparatus 101 includes a guide roller 103 as a part of a conveying mechanism for conveying the long substrate 102 in the longitudinal direction, a gravure roller 104 for coating a surface of the long substrate 102 with a liquid 106, a liquid supply and circulation mechanism 105, and a backup roller 107 for bringing the long substrate 102 into contact with the gravure roller 104. In the liquid coating apparatus 101, a long substrate partition member 108 for separating an end portion of the long substrate 102 from the gravure roll while contacting the end portion is provided between the long substrate 102 and the gravure roll 104 at both end portions of the long substrate. At each of both ends of the long substrate 102 in the width direction (hereinafter, also referred to as the long substrate width direction), two or more long substrate partition members 108 are provided at different positions in the conveyance direction of the long substrate. The liquid coating apparatus 101 is a reverse gravure coating system in which the gravure roll 104 is rotated in the reverse direction with respect to the conveyance direction of the long substrate 102 (hereinafter also referred to as the long substrate conveyance direction) in fig. 1, but may be a coating system in which the gravure roll 104 is rotated in the forward direction with respect to the long substrate conveyance direction.

The long substrate 102 may be, for example, a resin film, a resin sheet, a resin plate, a glass sheet, a glass plate, or the like. Among them, preferred is a resin film. The resin film may be a long resin film or a single resin film. As shown in fig. 1, a long resin film is preferable because it can be continuously coated. The resin film may be a single layer or a multilayer film obtained by laminating a plurality of resin films.

Examples of the resin constituting the resin film include thermoplastic resins. Among them, a thermoplastic resin having light transmittance is preferable, and an optically transparent thermoplastic resin is more preferable. Examples of the thermoplastic resin include cellulose resins such as triacetyl cellulose and diacetyl cellulose; polyolefin resins such as chain polyolefin resins (polypropylene resins, etc.) and cycloolefin resins (norbornene resins, etc.); polyester resins such as polyethylene terephthalate and polybutylene terephthalate; a polycarbonate-based resin; and (meth) acrylic resins such as methyl methacrylate resins. The resin film may be formed of, for example, a polystyrene resin; a polyvinyl chloride resin; acrylonitrile-butadiene-styrene resins; acrylonitrile-styrene resins; polyvinyl acetate resin; a polyvinylidene chloride resin; a polyamide resin; a polyacetal resin; modified polyphenylene ether resin; a polysulfone-based resin; a polyether sulfone-based resin; a polyarylate-based resin; a polyamide imide resin; a film made of a polyimide resin or the like. These resins may be used alone or in combination.

The thickness of the long substrate 102 may be, for example, 1 μm or more and 1mm or less, preferably 5 μm or more and 500 μm or less, more preferably 10 μm or more and 200 μm or less, and still more preferably 20 μm or more and 100 μm or less. When the thickness of the long substrate 102 is 1 μm or more and 1mm or less, the long substrate 102 is less likely to be broken and the conveyance stability tends to be improved.

The width of the long base material 102 may be, for example, 100mm or more and 2000mm or less, preferably 200mm or more and 1800mm or less, and more preferably 400mm or more and 1500mm or less.

In order to improve the adhesion between the long substrate 102 and the liquid 106, the coated surface of the long substrate 102 may be subjected to a surface treatment before the liquid 106 is applied to the long substrate 102. Examples of the surface treatment include corona discharge treatment, flame treatment, plasma treatment, ultraviolet treatment, undercoating treatment, saponification treatment, and the like. Among them, corona discharge treatment and plasma treatment are preferable from the viewpoint of uniform treatment, simple apparatus, and low cost.

The conveying mechanism 103 is a roller for conveying the long substrate 102 in the longitudinal direction. The conveyance mechanism 103 may be, for example, a drive roller (e.g., a nip roller, an adsorption roller, etc.), a guide roller (a free roller), a winding device, a combination thereof, or the like.

The speed at which the long substrate 102 is conveyed may be, for example, 1 m/min to 100 m/min, preferably 5 m/min to 50 m/min, and more preferably 15 m/min to 30 m/min.

The gravure roll 104 is engraved with unevenness on the surface. The surface of the gravure roll 104 contacts the applied liquid 106, and the liquid 106 is accumulated in the concave portions of the surface of the gravure roll 104 while rotating, and the excess liquid 106 on the surface of the gravure roll 104 is scraped off by the doctor blade 109. Thereafter, the long substrate 102 is pressed by the backup roller 107 while the gravure roll 104 is rotated, whereby the liquid 106 accumulated in the concave portions of the gravure roll 104 is transferred to the long substrate 102. The pressure at which the gravure roll 104 is pressed against the long substrate 102 can be adjusted by the tension of the long substrate 102 and the pressing depth of the backup roll 107 against the long substrate 102.

The width of the gravure roll 104 (the length of the gravure roll 104 in the width direction of the long substrate) is larger than the width of the long substrate 102 and the liquid application width for applying the liquid to the long substrate. The width of the gravure roll 104 may be, for example, 200mm or more and 2500mm or less, preferably 300mm or more and 2200mm or less, and more preferably 500mm or more and 2000mm or less.

The diameter of the gravure roll 104 may be 50mm or more and 500mm or less, for example.

The amount of the liquid 106 applied to the gravure roll 104 may be, for example, 0.05g/m²Above and 12g/m²Below, it is preferably 0.2g/m²Above and 6g/m²Hereinafter, more preferably 0.5g/m²Above and 4g/m²The following. The amount of the liquid 106 applied to the gravure roll 104 was 0.05g/m²Above and 12g/m²In the following case, the coating unevenness due to dripping of the liquid or the like is less likely to occur, and the desired coating thickness of the liquid 106 tends to be easily obtained. The coating amount can be adjusted by selecting the type of engraving process of the gravure roll 104, the depth of unevenness, the rotation speed, the pressure of pressure bonding, and the like.

The rotation speed of gravure roll 104 may be, for example, 1 to 100 revolutions per minute, preferably 10 to 80 revolutions per minute, and more preferably 15 to 60 revolutions per minute. When the rotation speed of the gravure roll 104 is 1 rpm or more and 100 rpm or less, the liquid 106 tends to be uniformly applied to the long substrate 102.

The shape of the unevenness engraved on the surface of the gravure roll 104 may be, for example, a lattice type, a honeycomb type, a diagonal type, or the like. The width and depth of the uneven portion may be, for example, 1 μm or more and 3mm or less.

The liquid application device 101 includes a liquid supply and circulation mechanism 105. The liquid supply and circulation mechanism 105 supplies the liquid 106 to the surface of the gravure roll 104 while circulating the liquid 106 from the direction of arrow 111 to the direction of arrow 112. The liquid supply circulation mechanism 105 is preferably sealed in order to prevent vaporization of the liquid 106 itself or volatile components contained therein and to prevent contamination of foreign substances into the liquid 106.

The liquid 106 is not particularly limited as long as it is a solution, a dispersion, or the like that can be applied by gravure coating, and may be, for example, a composition containing an active energy ray-curable compound (hereinafter, also referred to as an active energy ray-curable composition). The active energy ray-curable composition can be cured by irradiation with an active energy ray such as an ultraviolet ray, a visible light, an electron ray, or an X-ray. The active energy ray-curable composition can be used as, for example, an adhesive, an ink, an undercoat layer, a hard coat layer-forming material, a polarizing film-forming material, and the like.

According to the liquid application apparatus 101, since the non-application portion is formed at the end portion in the width direction of the long substrate, even when the long substrate 102 on which the liquid 106 is applied is bonded to another long substrate in the subsequent bonding step using, for example, a nip roller or the like to form a laminate, the applied liquid tends not to easily overflow from the bonded long substrate. Therefore, the liquid application apparatus 101 is suitable for application of an adhesive used for manufacturing a laminate, for example.

The viscosity of the liquid 106 may be, for example, 10 to 200mPa · s, preferably 20 to 150mPa · s, and more preferably 30 to 120mPa · s. When the viscosity of the liquid 106 is 10mPa · s or more and 200mPa · s or less, the coating film thickness tends to be easily adjusted.

The backup roller 107 has mobility in any direction of the arrow 113, and a desired coating film thickness can be obtained by adjusting the position of the backup roller 107, for example.

The coating film thickness of the liquid 106 may be, for example, 0.1 μm or more and 10 μm or less, preferably 0.2 μm or more and 5 μm or less, and more preferably 0.5 μm or more and 3 μm or less.

The width of the backing roll 107 can be wider than the width of the elongated substrate 102. When the width of the backup roll 107 is made larger than the width of the long substrate 102, the pressure of the pressure contact of the gravure roll 104 tends to be uniformly applied to the long substrate 102, and the uniformity of the coating film thickness and the conveyance stability tend to be easily improved. The width of the support roller 107 may be, for example, 200mm or more and 2500mm or less, preferably 300mm or more and 2200mm or less, and more preferably 500mm or more and 2000mm or less.

The diameter of the backup roller 107 may be, for example, 50mm or more and 500mm or less.

The long substrate separation member 108 is provided so as to be in contact with the end of the long substrate 102 being conveyed between the long substrate 102 and the gravure roll 104 at each of both ends in the width direction of the long substrate. Thus, the liquid 106 can be applied to the long substrate 102 while forming a non-coating portion at the end of the long substrate 102 without bringing the end of the long substrate 102 into contact with the gravure roll.

The long base material partition member 108 is provided at each of both end portions in the width direction of the long base material. In fig. 1, 2 long substrate partition members 108 are provided at each end at different positions in the long substrate conveyance direction. The long substrate separation member 108 may be provided at different positions in the long substrate transport direction by 2 or more, or 3 or 4 or more, from the viewpoints of improving the stability of the liquid application width of the long substrate 102, meandering transport, and easily suppressing damage to the long substrate and the long substrate separation member.

The long substrate separation member 108 may be separated by, for example, 5mm or more and 50mm or less, preferably 10mm or more and 40mm or less, and more preferably 15mm or more and 30mm or less in the long substrate transport direction with respect to the rotation axis of the gravure roll 104. When the long substrate separation member 108 is separated by 5mm or more and 50mm or less in the long substrate transport direction with respect to the rotation axis of the gravure roll 104, the stability of the liquid application width of the long substrate 102 tends to be easily improved.

When 2 or more long substrate partitioning members 108 are provided at different positions in the long substrate transport direction, the long substrate partitioning member 108 provided at one end portion in the long substrate width direction may be provided at an interval of, for example, 10mm or more and 100mm or less, preferably 20mm or more and 80mm or less, and more preferably 30mm or more and 60mm or less, from the other long substrate partitioning member 108 provided in the long substrate transport direction. When the long substrate separation member 108 is provided at an interval of 10mm to 100mm from another long substrate separation member 108 provided in the transport direction of the long substrate, the stability of the liquid application width of the long substrate 102 tends to be improved easily. The long substrate separation member 108 is preferably provided between the gravure roll 104 and the backup roll 107 in the long substrate conveyance direction. The long substrate partition member 108 provided at the other end portion may be provided in the same manner in the long substrate conveying direction. The long substrate partition members 108 provided at both ends of the long substrate 102 are preferably provided at the same position in the conveyance direction.

In the case where the long substrate separation member 108 is provided at a position different from each other in the long substrate conveyance direction at each of both ends in the long substrate width direction, it is preferable that the long substrate separation member 108 is provided at 1 or more on each of the upstream side and the downstream side with respect to the rotation axis of the gravure roll in the conveyance direction of the long substrate, from the viewpoint that the stability of the liquid application width of the long substrate 102 is easily improved, the meandering conveyance is easily suppressed, and the damage to the long substrate and the long substrate separation member and the flexure of the long substrate are easily suppressed. When 3 or more long substrate partition members 108 are provided in the long substrate transport direction, 2 long substrate partition members may be provided on the upstream side and 1 long substrate partition member may be provided on the downstream side, or 1 long substrate partition member may be provided on the upstream side and 2 long substrate partition members may be provided on the downstream side. In the case where 4 long substrate dividing members 108 are provided in the long substrate conveying direction, 2 may be provided on the upstream side and 2 may be provided on the downstream side, 3 may be provided on the upstream side and 1 may be provided on the downstream side, or 1 may be provided on the upstream side and 3 may be provided on the downstream side.

The long substrate partition member 108 is a member movable in the width direction of the long substrate. The liquid application width may need to be adjusted depending on the type of the long substrate, the specification of the product, the meandering state in the initial stage of operation after the start of conveyance, and the like. Therefore, when the long substrate partitioning member 108 is a member movable in the width direction of the long substrate, the liquid application width tends to be easily adjusted even during the application operation. The long substrate separation member 108 may be a member movable in a direction perpendicular to the long substrate.

The width of the non-liquid-applying portion may be, for example, 1mm or more and 100mm or less, preferably 3mm or more and 80mm or less, and more preferably 5mm or more and 50mm or less. The width of the non-liquid-applied portion may vary depending on, for example, the type and application of the liquid 106 and the long substrate 102 to which the liquid 106 is applied, the type of treatment performed after the application, and the like.

The shape of the elongated base material partition member 108 is not particularly limited as long as it has a surface that can contact the elongated base material 102, and may be, for example, a prism shape (e.g., a rectangular parallelepiped, a cube, a triangular prism, a quadrangular prism, etc.), a pyramid shape (e.g., a triangular pyramid, a quadrangular pyramid, etc.), a half pyramid shape, a truncated pyramid shape (e.g., a triangular truncated pyramid, etc.), a cylinder shape, a semi-cylinder shape, a cone shape, a truncated cone shape, a semicircular cone shape, or the like. In the case where the long substrate separation member has a cylindrical or conical shape, the long substrate separation member 108 may be a free roller. The long substrate partition member 108 preferably has a wedge-like cross-sectional shape when viewed from the conveyance direction.

The long substrate partition member 108 may be formed of, for example, metal, plastic, paper, or the like, and is preferably made of metal. Examples of the metal include stainless steel, iron, and aluminum.

In fig. 2, a long substrate partition member 108 having a wedge shape is provided. The long substrate separation member 108 is provided so that, at both ends of the long substrate 102, a long substrate contact surface 201 that is in contact with the long substrate 102 is inclined so that the end of the long substrate 102 is separated from the gravure roll 104.

Coefficient of static friction μ of elongated substrate contact surface 201 with respect to cycloolefin polymer (COP) substrate_sIs 0.35 or less, preferably 0.32 or less. Coefficient of static friction μ with respect to cycloolefin Polymer (COP) substrate at elongated substrate contact surface 201_s0.35 or lessThe slidability of the long substrate 102 on the long substrate contact surface 201 is improved, and the long substrate partition member tend to be easily damaged. On the other hand, the coefficient of static friction μ of the elongated substrate contact surface 201 with respect to the cycloolefin polymer (COP) substrate_sUsually 0 or more, for example, 0.001 or more, 0.005 or more, or 0.01 or more. Coefficient of static friction mu with respect to cycloolefin Polymer (COP) substrate_sThe measurement can be carried out by the method described in the examples described later.

The surface roughness of the elongated substrate contact surface 201 has an arithmetic average roughness Ra of 0.22 μm or less, preferably 0.21 μm or less, more preferably 0.15 μm or less, and particularly preferably 0.1 μm or less. When the arithmetic average roughness Ra of the surface roughness of the long substrate contact surface 201 is 0.22 μm or less, the long substrate and the long substrate spacer member on the long substrate contact surface 201 tend not to be easily damaged. The surface roughness of the elongated substrate contact surface 201 has an arithmetic average roughness Ra of usually 0 μm or more, and may be, for example, 0.001 μm or more, 0.005 μm or more, or 0.01 μm or more. The arithmetic average roughness Ra of the surface roughness can be measured by the method described in the examples described later.

The maximum height Rz of the surface roughness of the long substrate contact surface 201 is 2.2 μm or less, preferably 2 μm or less, more preferably 1.8 μm or less, and particularly preferably 1.6 μm or less. When the maximum height Rz of the surface roughness of the long substrate contact surface 201 is 2.2 μm or less, the long substrate and the long substrate spacer member on the long substrate contact surface 201 tend not to be easily damaged. The maximum height Rz of the surface roughness of the long substrate contact surface 201 is usually 0 μm or more, and may be, for example, 0.1 μm or more, 0.2 μm or more, or 0.4 μm or more. The maximum height Rz of the surface roughness can be measured by the method described in the examples described later.

In the long base material partition member 108, the static friction coefficient μ is set so that the long base material contact surface 201 is as described above_sThe maximum height Rz and the arithmetic mean roughness Ra, for example, polishing treatment, ceramic coating and fluorine treatment can be applied to the long substrate contact surface 201A surface treatment such as resin coating, and a fluororesin tape, an ultrahigh molecular weight polyethylene tape, or the like may be applied. The long substrate separation member 108 may be subjected to the above-described treatment on a surface other than the long substrate contact surface 201, for example, a surface adjacent to the long substrate contact surface 201, or the entire surface of the long substrate separation member 108, or a tape may be added.

The long substrate contact surface 201 of the long substrate separation member 108 may be provided obliquely to the long substrate application surface 202 so as to separate the end of the long substrate 102 from the gravure roll 104. The inclination angle 203 of the long substrate partition member 108 may be, for example, 1 degree or more and 20 degrees or less, preferably 2 degrees or more and 15 degrees or less, and more preferably 3 degrees or more and 10 degrees or less. When the inclination angle 203 is 1 degree or more and 20 degrees or less, the long substrate 102 tends to be prevented from being flexed, and the conveyance stability of the long substrate 102 tends to be improved.

The width of the long substrate partition member 108 in contact with the long substrate 102 may be, for example, 1mm or more and 20mm or less, preferably 1.5mm or more and 15mm or less, and more preferably 2mm or more and 10mm or less in the long substrate conveyance direction. When the width of the long substrate partitioning member 108 in the long substrate conveyance direction in contact with the long substrate 102 is 1mm or more and 20mm or less, the long substrate and the long substrate partitioning member tend not to be easily damaged.

The width of the long substrate partition member 108 in contact with the long substrate 102 may be, for example, 1mm or more and 100mm or less, preferably 3mm or more and 80mm or less, and more preferably 5mm or more and 50mm or less in the long substrate width direction. When the width of the long substrate partition member 108 in the long substrate conveyance direction in contact with the long substrate 102 is 1mm or more and 100mm or less, the following tendency is present: the end portion of the long substrate 102 can be prevented from being shaken during conveyance, and the conveyance position can be easily and precisely adjusted, and the type of the long substrate to be conveyed is not easily limited.

The liquid application width 204 for liquid application to the long substrate may be, for example, 100mm or more and 2000mm or less, preferably 200mm or more and 1800mm or less, and more preferably 400mm or more and 1500mm or less. When the liquid application width 204 of the liquid application to the long substrate is 100mm or more and 2000mm or less, the width of the non-application portion tends to be easily controlled.

Hereinafter, a long substrate partition member having a wedge shape will be described with reference to fig. 3. The long substrate separation member 108 having a wedge shape is provided so as to be supported by the support member 205 so that the long substrate 102 comes into contact with the long substrate contact surface 201 at two different positions in the long substrate conveyance direction. The long substrate separation member 108 may be integrally formed with the support member 205.

The dimension 206 of the long substrate partitioning member 108 in the long substrate conveyance direction may be, for example, 1mm or more and 20mm or less, preferably 1.5mm or more and 15mm or less, and more preferably 2mm or more and 10mm or less. When the dimension 206 in the long substrate conveying direction is 1mm or more and 20mm or less, the long substrate and the long substrate partitioning member are less likely to be damaged and the distance between the long substrate 102 and the gravure roll 104 tends to be appropriate, the amount of abutment of the gravure roll tends to be easily adjusted, and the long substrate partitioning member 108 tends to be not too large and space saving of the installation portion tends to be easily performed.

The dimension 207 of the long substrate partition member 108 in the long substrate width direction may be, for example, 1mm or more and 500mm or less, preferably 5mm or more and 400mm or less, and more preferably 10mm or more and 300mm or less. When the dimension 206 in the width direction of the long substrate is 1mm or more and 500mm or less, a non-liquid-coated portion tends to be easily formed on the long substrate 102 and the long substrate 102 tends to have excellent conveyance stability.

In the long substrate partition member 108, the inclination angle 208 of the long substrate contact surface 201 with respect to the opposing surface of the long substrate contact surface 201 may be, for example, 1 degree or more and 20 degrees or less, preferably 2 degrees or more and 15 degrees or less, and more preferably 3 degrees or more and 10 degrees or less. When the inclination angle 208 is 1 degree or more and 20 degrees or less, the end portion of the long substrate to be conveyed is easily separated from the gravure roll while contacting the end portion, and the long substrate 102 can be prevented from being bent, so that the conveyance stability of the long substrate 102 is easily improved.

The dimension 209 of the distal end between the long substrate contact surface 201 of the long substrate partition member 108 and the opposing surface thereof is not particularly limited, and may be, for example, 1mm to 20 mm.

(apparatus for producing laminate)

Fig. 4 shows a laminate manufacturing apparatus 301 provided with the liquid application apparatus 101. The laminate manufacturing apparatus 301 includes a long resin film 302 unwinding section 303, a long resin film 304 unwinding section 305, a backup roll 107, a long base material partition member 108, a gravure roll 104, a liquid supply circulation mechanism 105, a nip roll 306, a UV irradiation apparatus 307, and a guide roll 308. The active energy ray-curable composition is applied to the resin film 302 by the liquid application apparatus 101, and after the long substrate 309 with a coating film is formed, the resin film 304 is passed between nip rollers 306 and bonded thereto, and then the active energy ray-curable composition is cured by the UV irradiation apparatus 307, thereby obtaining a laminate 310.

According to the liquid application apparatus 101, since the non-application portion is formed at the end portion of the long substrate, even when the long substrate on which the liquid is applied is bonded to another long substrate in the subsequent bonding step using, for example, a nip roller or the like, the applied liquid does not easily overflow from the bonded long substrate, and unevenness in the application width, meandering conveyance, damage to the long substrate and the long substrate partition member, or the like does not easily occur. Therefore, the liquid application apparatus 101 is suitable for a liquid application apparatus for a manufacturing apparatus of a laminate.

(liquid coating method)

Another aspect of the present invention relates to a method for applying a liquid to a long substrate while forming a non-coating portion at an end of the long substrate (hereinafter, also referred to as a coating method), the method including: a conveying step of conveying the long base material; and a coating step of bringing the long base material into contact with the gravure roll by means of a backup roll and applying a liquid to the surface of the long base material by means of the gravure roll, wherein in the coating step, both end portions of the long base material are separated from the gravure roll at least two different positions in the transport direction of the long base material.

The long substrate, the liquid, the gravure roll, and the backup roll in the coating method are each applied to the members exemplified in the liquid coating apparatus.

In the coating step, the method of separating both end portions of the long substrate from the gravure roll at two different positions in the transport direction of the long substrate may be a method using the long substrate-separating member exemplified in the liquid coating apparatus. Examples of the application of the long substrate partition member, the installation position, the installation amount, and the like are exemplified in the liquid application apparatus described above.

The present invention will be described more specifically by way of examples and comparative examples, but the present invention is not limited to the examples.