Splash guard and chemical mechanical polishing machine
阅读说明:本技术 一种防溅罩及化学机械抛光机台 (Splash guard and chemical mechanical polishing machine ) 是由 胡堃 于 2019-09-27 设计创作,主要内容包括:本发明公开了一种防溅罩及化学机械抛光机台,属于半导体制造技术领域,所述防溅罩环绕工作机台设置,用于阻挡所述工作机台甩溅出来的液体,所述防溅罩由多个罩部件组成,每个所述罩部件固定安装于一升降台;所述升降台连接一驱动装置,所述驱动装置驱动所述升降台上下运动。化学机械抛光机台应用了如上所述的防溅罩。本发明通过将一体式防溅罩改为组合式防溅罩,从而大大降低了对各个驱动装置同步性的要求,且当个别驱动装置发生故障不能正常升起或下降时,不会对整个防溅罩产生扯拽,进而也不会影响到其他正常工作的驱动装置,组合式防溅罩的设计可以仅仅针对损坏的罩部件进行更换,节约了维修费用。(The invention discloses a splash guard and a chemical mechanical polishing machine, belonging to the technical field of semiconductor manufacturing, wherein the splash guard is arranged around a working machine and used for blocking liquid thrown out by the working machine; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down. The chemical mechanical polishing machine employs a splash shield as described above. The integral splash guard is changed into the combined splash guard, so that the requirement on the synchronism of each driving device is greatly reduced, when a single driving device fails and cannot be normally lifted or lowered, the whole splash guard cannot be dragged, other driving devices which normally work cannot be influenced, the combined splash guard can be designed to be only replaced aiming at a damaged cover part, and the maintenance cost is saved.)
1. A splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table and is characterized in that,
the splash guard is composed of a plurality of cover components, and each cover component is fixedly arranged on a lifting platform;
the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
2. The splash shield according to claim 1, wherein said plurality of shield members are the same size.
3. The splash shield according to claim 1, wherein the cover parts are arranged in sequence, and gaps between the cover parts are small so as to cover the working machine.
4. The splash shield according to claim 1, wherein adjacent shield parts are staggered inside and outside and partially overlap at a junction.
5. The splash shield according to claim 1, wherein said drive means is a motor.
6. The splash shield according to claim 1, wherein said drive means is a pneumatic cylinder.
7. The splash shield according to claim 6, wherein said cylinder comprises a cylinder body and a drive rod;
the contact area of the cover component and the lifting table is larger than the cross-sectional area of the driving rod.
8. The splash shield according to claim 1, wherein the lift table upper surface is provided with a groove, and the shield member is embedded in the groove.
9. Splash shield according to claim 1, wherein said drive means are controlled in a unified way, such that the up and down movements of said cover parts are synchronized, or in an individually controlled way.
10. A chemical mechanical polishing machine employing the splash guard of any of claims 1-9, comprising:
the grinding platform is used for bearing the wafer;
the grinding head is matched with the grinding platform to grind the wafer;
and the power source interface is used for connecting the driving device.
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to a splash guard and a chemical mechanical polishing machine.
Background
A Chemical Mechanical Polishing (CMP) process, also called a chemical mechanical planarization process or a chemical mechanical polishing process, is a mainstream polishing process at present, and is used for reducing the surface roughness of a wafer or thinning the wafer. The chemical mechanical polishing machine is at the in-process that carries out the grinding operation, and rotatory grinding platform can be thrown the waste liquid around the grinding platform from grinding platform's surface, contains a large amount of lapping liquid compositions in these waste liquids, consequently, can separate out a large amount of crystallisates after the waste liquid volatilizees, and these crystallisates not only lead to the fact the hindrance to each moving part on the chemical polishing machine, still can cause the corruption to metal part, influence the life of board.
In the prior art, a splash guard is additionally arranged around a grinding platform to prevent waste liquid from splashing on parts around the grinding platform, the splash guard is arranged around the grinding platform and is made of plastic, the splash guard is fixedly connected with three cylinders positioned in different directions, the connection mode adopts a mode that the cylinders are in point contact with the splash guard, when a grinding head is matched with the grinding platform to carry out grinding operation, the splash guard needs to be lifted under the driving of the cylinders so as to cover the grinding platform, and the waste liquid thrown out by the grinding platform in the grinding operation process can be received by the splash guard and then is discharged along the splash guard flowing to a water outlet; after the grinding operation is completed, the grinding head needs to rotate to the next stop point, and at the moment, the air cylinder drives the splash guard to descend below the grinding platform so as to avoid hindering the rotation of the grinding head. In this process, because the splatter shield is a whole, consequently to 3 cylinder driven synchronization requirements of driving the splatter shield very high, if arbitrary 1 cylinder leads to up-and-down velocity and other cylinders inconsistent because of the trouble, will lead to the splatter shield to receive to drag, leads to the cover body distortion, damages even. The deformed splash guard can extrude and pull the cylinder in turn, and the service life of the cylinder is shortened.
The invention provides a splash guard which can effectively block liquid thrown out by various working machines, prevent the splash guard from deforming, prolong the service life of the machines and save the replacement cost.
Disclosure of Invention
According to the problems in the prior art, the splash guard and the chemical mechanical polishing machine are provided, and the integral splash guard in the prior art is changed into the combined splash guard.
The technical scheme specifically comprises the following steps: a splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table and is characterized in that,
the splash guard is composed of a plurality of cover components, and each cover component is fixedly arranged on a lifting platform;
the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
Preferably, the plurality of shroud components are the same size.
Preferably, the cover parts are arranged in sequence, and gaps among the cover parts are small so as to cover the working machine table.
Preferably, two adjacent cover members are staggered inside and outside and partially overlap at the joint.
Preferably, the driving means is a motor.
Preferably, the driving means is a cylinder.
Preferably, the cylinder includes a cylinder body and a driving rod; the contact area of the cover component and the lifting table is larger than the cross-sectional area of the driving rod.
Preferably, the lifting table is provided with a groove on the upper surface, and the cover component is embedded in the groove.
Preferably, the driving means employs a method of unified control such that the up-and-down movements of the plurality of cover members are synchronized, or a method of independent control separately.
The invention also discloses a chemical mechanical polishing machine table, which adopts the splash guard, and is characterized by comprising the following components:
the grinding platform is used for bearing the wafer;
the grinding head is matched with the grinding platform to grind the wafer;
the power source interface is used for connecting the driving device;
the beneficial effects of the above technical scheme are that: the utility model provides a splashproof cover and chemical mechanical polishing board, through changing the integral type splashproof cover among the prior art into combination formula splashproof cover, thereby greatly reduced the requirement to each drive arrangement synchronism, and when individual drive arrangement breaks down and can not normally rise or descend, can not drag whole splashproof cover production, and then can not influence the drive arrangement of other normal work yet, the design of combination formula splashproof cover can only be changed to the cover part of damage, and the maintenance cost has been practiced thrift.
Drawings
FIG. 1 is a three-dimensional view of a preferred embodiment of a splash shield of the present invention;
FIG. 2 is a three-dimensional view of a preferred embodiment of a splash shield of the present invention;
FIG. 3 is a top view of a preferred embodiment of a splash shield of the present invention;
FIG. 4 is a schematic diagram of the operation of a splash guard at top dead center in a preferred embodiment of a CMP apparatus of the present invention;
FIG. 5 is a schematic diagram of the operation of the splash guard at the bottom dead center of the CMP apparatus according to the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.
The invention is further described with reference to the following drawings and specific examples, which are not intended to be limiting.
A splash guard is arranged around a working machine table and used for blocking liquid splashed by the working machine table, and is characterized by comprising a plurality of cover parts, wherein each cover part is fixedly arranged on a lifting table; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down.
As shown in fig. 1-3, the splash guard is composed of a plurality of
In one embodiment of the invention, the splash guard has an overall shape that is adapted to the shape of the edge of the work platform. Referring to fig. 4-5, taking CMP process as an example, in a conventional CMP machine, the
Each
In the above-described embodiment, when each
The manner of cooperation between the cover members can be varied. As shown in fig. 1, a plurality of
Each
If the driving means 3 is a cylinder, as shown in fig. 4-5, the cylinder further comprises a
In another embodiment of the invention, since the splash guard is of a combined design, the individual drives 3 for driving the entire splash guard up and down may be controlled in a unified manner, so that the cover parts move up and down synchronously, or individually. However, no matter what control method is adopted for the
Meanwhile, because the splash guard is designed in a combined mode, the
The contact area of the
In the preferred embodiment of the present invention, the upper surface of the lifting table 2 is provided with a groove, and the cover member is embedded in the groove.
In one embodiment of the present invention, the cylinder is located right below the
It should be noted that the splash guard of the present invention can be used not only on a chemical mechanical polishing machine, but also in the field of semiconductor lithography, a photoresist needs to be coated on a wafer, and the photoresist will be thrown off a working platform during a spin coating process, or a developing solution will be thrown off the working platform during a developing process if a spin spraying manner is adopted, which will affect the cleaning, the service life, etc. of other machines or components.
The invention discloses a splash guard which is arranged around a working machine table and used for blocking liquid thrown out by the working machine table, and is characterized by comprising a plurality of cover components, wherein each cover component is fixedly arranged on a lifting table; the lifting platform is connected with a driving device, and the driving device drives the lifting platform to move up and down, so that the corresponding cover components are respectively positioned at the top dead center and the bottom dead center. Through the design of the invention, the splashing of liquid can be effectively prevented, the deformation of the splash guard is prevented, the service life of the machine table is prolonged, and the replacement cost is saved.
The invention further discloses a chemical mechanical polishing machine, which adopts the splash guard design as described above, as shown in fig. 4-5, and is characterized by comprising:
a grinding
a grinding
and the power source interface is used for connecting the
The working principle is as follows: before the polishing
In an embodiment of the invention, the top dead center is an upper working position of the splash guard during operation, and is used for blocking the grinding liquid thrown out during the receiving grinding operation. The lower dead point is the lower station that the splashproof cover was located when the work, and after the grinding operation was finished, grinding
In the preferred embodiment of the present invention, the driving
In the preferred embodiment of the present invention, the
In the preferred embodiment of the present invention, when the
In an embodiment of the present invention, when the
In the preferred embodiment of the present invention, when the
The beneficial effects of the above technical scheme are that: the utility model provides a chemical mechanical polishing board, through changing the integral type splatter shield among the prior art into combination formula splatter shield to greatly reduced the requirement to each drive arrangement synchronism, and when individual drive arrangement breaks down and can not normally rise or descend, can not drag whole splatter shield production, and then can not influence the drive arrangement of other normal works yet, the design of combination formula splatter shield can only be changed to the cover part of damage, has practiced thrift the maintenance cost.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.
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