阅读说明：本技术 一种自清洁防护罩 (Self-cleaning protective cover ) 是由 胡堃 于 2019-10-22 设计创作，主要内容包括：本发明公开了一种自清洁防护罩,属于半导体技术领域,包括：自清洁防护罩由第一罩部件和至少一个第二罩部件拼接而成,第一罩部件和每个所述第二罩部件拼接形成一通孔,通孔的周向环设有用于喷射流体的喷嘴；上述技术的有益效果是：通过于通孔周围增加用于喷射流体的喷嘴,不仅使得底罩具备了自清洁的能力,于研磨工艺中实时的对进入底罩的研磨液飞雾进行清洗,减少了研磨液在防护罩上的沉积结晶,还通过喷嘴喷出的流体于底罩的通孔周围形成一气帘,避免研磨液飞雾进入底罩,起到一定的隔离作用,从而有效杜绝了抛光机台在研磨作业的过程中结晶物掉落的问题,避免出现研磨中的产品被结晶物划伤表面的现象,提高了产品的良率。(The invention discloses a self-cleaning protective cover, belonging to the technical field of semiconductors, comprising: the self-cleaning protective cover is formed by splicing a first cover component and at least one second cover component, the first cover component and each second cover component are spliced to form a through hole, and nozzles for jetting fluid are arranged around the circumference of the through hole; the beneficial effect of the above technology is: through increase the nozzle that is used for the jet fluid around the through-hole, not only make the end cover possess the ability of automatically cleaning, in the grinding process real-time lapping liquid that gets into the end cover flies the fog and washs, the deposit crystallization of lapping liquid on the protection casing has been reduced, still form an air curtain around the through-hole of end cover through nozzle spun fluid, it gets into the end cover to avoid lapping liquid to fly the fog, certain isolation effect plays, thereby effectively stopped the problem that the in-process crystal thing of polishing board at the grinding operation drops, the product of avoiding appearing grinding is by the phenomenon on crystal thing fish tail surface, the yield of product has been improved.)

1. The self-cleaning protective cover is formed by splicing a first cover component and at least one second cover component, the first cover component and each second cover component are spliced to form a through hole, and the circumferential ring of the through hole is provided with an injection device for injecting fluid.

2. The self-cleaning protective cover of claim 1, wherein the first cover member is joined to the second cover member by a key and slot arrangement.

3. The self-cleaning shield of claim 1 wherein said first shield member is of a cruciform configuration, said first shield member further comprising:

and the mounting hole is positioned in the center of the cross-shaped structure.

4. The self-cleaning protective cover of claim 3 wherein the number of second cover members is 4, each being spliced to four tips of the cross-shaped structure.

5. A self-cleaning protective cover according to claim 1, wherein said spraying means comprises spray holes provided on a cleaning conduit, said cleaning conduit being arranged circumferentially along said through hole.

6. The self-cleaning protective hood according to claim 5, wherein the cleaning duct is connected to a fluid source, the fluid source being a mixed gas source of pure water and compressed air.

7. The self-cleaning protective cover of claim 5, wherein the injection holes comprise a first injection hole set and a second injection hole set;

the direction of the nozzle of the first nozzle hole group forms an acute angle or a right angle with the self-cleaning protective cover, and an air curtain is formed around the through hole;

and the direction of the nozzles of the second nozzle hole group faces the self-cleaning protective cover and is used for cleaning the self-cleaning protective cover.

8. The self-cleaning protective cover of claim 1, wherein a seal is provided at the juncture of the first cover member and the second cover member.

9. The self-cleaning protective cover of claim 1, wherein the second cover member is obliquely disposed to the first cover member.

10. The self-cleaning shield cap according to claim 1, wherein the first cover member has a plurality of exhaust holes disposed adjacent to the mounting holes for discharging waste liquid flowing out during self-cleaning.

11. The self-cleaning protective cover of claim 10, wherein a top end of the first cover member is disposed obliquely to the clearance hole.

Technical Field

The invention relates to the technical field of semiconductor manufacturing, in particular to a self-cleaning protective cover.

Background

Chemical Mechanical Polishing (CMP), also known as chemical mechanical polishing or buffing, is a common technique used in semiconductor device manufacturing processes to planarize wafers or other substrate materials during processing using chemical etching and mechanical forces. In the existing chemical mechanical polishing machine, mechanical parts exposed outside in a mechanical grinding area are usually protected by a cover matched with the appearance of the mechanical parts, and the purpose is to prevent grinding fluid from splashing to the outer surface of the exposed mechanical parts in the grinding process of the chemical mechanical polishing machine, so that the grinding fluid is dried by air and then crystals are separated out from the outer surface of the mechanical parts; secondly, in order to prevent personnel from colliding with mechanical parts during maintenance and overhaul, causing personnel injury and mechanical parts's damage.

In the existing machine, a protective bottom cover for protecting a cross base in a mechanical grinding area is designed in a non-closed mode, and the purpose is to reserve the running space of other parts. However, this non-enclosed design often creates a potential hazard to the grinding operation. The inside that the mill liquid that the board was taken up because of the high-speed rotation of machine flies the fog and can enter into the protection under shield at the in-process of grinding operation, after the dry evaporation of lapping liquid, can be at the internal surface of protection under shield and precipitate the crystal, because current protection casing does not possess self-cleaning function, and the cooperation of protection casing is not inseparable, there is the gap, when small crystal accumulates when a certain amount, the convergence gathers and forms great crystal grain and falls to the grinding region, thereby cause the surface of the product in the grinding by the fish tail, the yield of greatly reduced product, probably cause scrapping of product even when serious.

Disclosure of Invention

According to the problems in the prior art, a self-cleaning bottom cover is provided, nozzles for jetting fluid are additionally arranged around a through hole of the bottom cover, the bottom cover is enabled to have self-cleaning capacity, the grinding fluid entering the bottom cover is cleaned in real time in a grinding process, deposited crystals of the grinding fluid on a protective cover are reduced, an air curtain is formed around the through hole of the bottom cover through the fluid sprayed out of the nozzles, the grinding fluid is prevented from flying into the bottom cover and playing a certain isolation role, the problem that crystals of a polishing machine drop in the grinding operation process is effectively solved, the phenomenon that the product in grinding is scratched by the crystals is avoided, and the yield of the product is improved.

The technical scheme specifically comprises the following steps:

the self-cleaning protective cover is formed by splicing a first cover component and at least one second cover component, the first cover component and each second cover component are spliced to form a through hole, and the circumferential ring of the through hole is provided with an injection device for injecting fluid.

Preferably, wherein the first cover part is spliced to the second cover part by a key and slot arrangement.

Preferably, wherein the first cover member is a cruciform structure, the first cover member further comprising:

the mounting hole is positioned in the center of the cross-shaped structure;

the first cover component is provided with a plurality of chip removal holes, and the chip removal holes are distributed near the mounting holes and used for discharging waste liquid flowing out during self-cleaning.

Preferably, the number of the second cover parts is 4, and the second cover parts are respectively spliced with four top ends of the cross-shaped structure.

Preferably, the spraying device comprises a spraying hole arranged on a cleaning pipeline, and the cleaning pipeline is arranged along the circumferential direction of the through hole.

Preferably, the cleaning pipeline is connected with a fluid source, and the fluid source is a mixed gas source formed by pure water and compressed air.

Preferably, wherein the injection hole includes a first injection hole group and a second injection hole group;

the direction of the nozzle of the first nozzle hole group forms an acute angle or a right angle with the self-cleaning protective cover, and an air curtain is formed around the through hole;

and the direction of the nozzles of the second nozzle hole group faces the self-cleaning protective cover and is used for cleaning the self-cleaning protective cover.

Preferably, a sealing means is provided at the junction of the first cover part and the second cover part.

Preferably, wherein the second cover member is disposed obliquely to the first cover member.

Preferably, wherein four tips of the cross-shaped structure in the first cover member are disposed obliquely to the clearance hole.

The beneficial effects of the above technical scheme are that:

the utility model provides a self-cleaning under cover, this under cover is through increasing the nozzle that is used for the jet fluid around the through-hole, not only make the under cover possess the ability of automatically cleaning, fly the fog to the lapping liquid that gets into the under cover in real time in grinding process and wash, the deposit crystallization of lapping liquid on the protection casing has been reduced, still form an air curtain around the through-hole of under cover through nozzle spun fluid, it gets into the under cover to avoid lapping liquid to fly the fog, certain isolation effect is played, thereby the problem that the in-process crystallization thing of polishing board at the grinding operation dropped has effectively been stopped, the product of avoiding appearing grinding is by the phenomenon on crystal fish tail surface, the yield of product has been improved.

Drawings

FIG. 1 is a schematic view of a preferred embodiment of a self-cleaning undercover according to the present invention;

FIG. 2 is a schematic diagram of a preferred embodiment of the present invention for cleaning the pipeline;

fig. 3 is a schematic structural view of the second cover member slot in the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

It should be noted that the embodiments and features of the embodiments may be combined with each other without conflict.

The invention is further described with reference to the following drawings and specific examples, which are not intended to be limiting.

A self-cleaning protective cover is applied to a chemical mechanical polishing machine table, as shown in figure 1, wherein the self-cleaning protective cover is formed by splicing a first cover component 1 and at least one second cover component 2, the first cover component 1 and each second cover component 2 are spliced to form a through hole 3, and nozzles for jetting fluid are arranged on the circumferential ring of the through hole 3. The shape of the through holes 3 is specifically set according to specific situations, and fig. 1 of the present application only shows an example of the shape of the through holes 3, which is not intended to limit the embodiments and the protection scope of the present invention, and the through holes 3 are set to leave a movement space for other mechanical structures of the machine, so that the number and the shape of the through holes 3 are only required to not affect the normal operation of the machine.

In an embodiment of the invention, the self-cleaning protective cover is installed at the bottom of a cross base in a grinding area in a chemical mechanical polishing machine and used for wrapping the bottom of the exposed cross base, so that the self-cleaning protective cover can play a role in preventing an operator from colliding with the bottom of the cross base to damage the operator or the base in the machine maintenance process, and can prevent grinding liquid mist generated by sputtering of a grinding platform from adhering to the outer surface of the cross base in the grinding operation process of the polishing machine and further depositing to generate crystals. Because the characteristics of cross base self structure, this kind of automatically cleaning protection casing adopts split type concatenation design, and whole protection casing is formed by the concatenation of first cover part 1 and a plurality of second cover part 2 promptly, and the aim at of concatenation design makes things convenient for the installation and the dismantlement of protection casing. Meanwhile, the self-cleaning protective cover adopts an open design, so that grinding fluid flying mist can enter the protective cover through the through hole and then deposit at the edge of the through hole to generate crystal particles.

In the preferred embodiment of the invention, as shown in figures 1 and 3, the first cover part 1 is spliced to the second cover part 2 by means of a key 4 and slot 5 arrangement.

In an embodiment of the invention, since the cleaning fluid sprayed from the nozzle on the self-cleaning protective cover flushes the upper surface of the protective cover, a waste liquid mixed with the grinding fluid and the crystal of the grinding fluid flows on the upper surface of the protective cover, if the waste liquid falls into the grinding area of the polishing machine through the gap at the joint of the first cover component 1 and the second cover component 2, the crystal carried in the waste liquid still damages the wafer being ground, even causes the wafer to be scrapped, therefore, the first cover component 1 and the second cover component 2 are spliced by adopting the structure of matching the inserting key 4 and the inserting slot 5, thereby reducing the gap at the joint of the first cover component 1 and the second cover component 2, playing a certain sealing role, and preventing the waste liquid generated when the self-cleaning protective cover is cleaned from falling into the grinding area of the machine from the joint. The specific positions of the insertion key 4 and the insertion slot 5 may be set according to specific conditions, for example, the insertion key 4 may be provided on the first cover member 1, and the insertion slot 5 may be provided on the second cover member 2, or the insertion key 4 may be provided on the second cover member 2, and the insertion slot 5 may be provided on the first cover member 1.

In the above embodiments, the shapes of the first cover component 1 and the second cover component 2 can be specifically set according to specific application environments, and fig. 1 in the specification of the present application only shows an example of the shapes of the first cover component 1 and the second cover component 2, and does not limit the embodiments and the protection scope of the present invention; meanwhile, the above-mentioned embodiment is also only an embodiment given in terms of the splicing structure between the first cover part 1 and the second cover part 2, and the splicing manner between the two can be specifically set according to specific situations, but no matter what splicing manner is adopted, the sealing at the splicing position of the first cover part 1 and the second cover part 2 should be ensured. In a preferred embodiment of the invention, the first cover part 1 has a cruciform configuration, the first cover part 1 further comprising:

the mounting hole 10 is positioned in the center of the cross-shaped structure;

the chip removal holes 11 are circumferentially and uniformly distributed around the mounting hole and used for discharging waste liquid flowing out during self-cleaning.

In the preferred embodiment of the invention, there are 4 second cover members 2, each of which is joined to the four tips of the cross-shaped structure.

In some embodiments, the second cover part 2 can be arranged in 3, or 2 semicircular, 2 rectangular, etc. forms according to the shape of the machine.

In other embodiments, the number of second shroud components 2 may also be 1. The second cover member 2 may be a ring-shaped member having a circular, oval, rectangular or the like shape, and is fitted over the first cover member 1.

The chip removal hole 11 is not necessarily an essential part, and the waste liquid can be guided to a place without influencing the grinding work by arranging the inclination of the first cover component and the second cover component according to the difference of the working mode and the structure of the machine table, and the waste liquid can also be guided by arranging a drainage groove.

In an embodiment of the present invention, since the self-cleaning protective cover is matched with the cross-shaped base of the machine, the self-cleaning protective cover is also in a cross-shaped structure as a whole, the first cover component 1 forms the cross center of the cross-shaped structure, and the number of the second cover components 2 is 4, which are respectively located at the four top ends of the cross-shaped structure of the first cover component 1. Because the cross base center of the board is connected with a supporting column, the perpendicular to cross base setting for play the fixed action of support to the cross base, consequently, the cross center of first cover part 1 corresponds and is provided with a mounting hole 10, and the supporting column passes from mounting hole 10.

In the above embodiment, in order to facilitate the installation and detachment of the self-cleaning protective cover, the first cover component 1 is also designed in a split type, and is formed by splicing two sub-components with the same size, and the two sub-components are spliced to form the installation hole 10, so that the protective cover can be installed and detached without disassembling and assembling the polishing machine. And the periphery of the surrounding mounting hole 10 is provided with a chip removal hole 11 for discharging waste liquid, and the waste liquid generated by the self-cleaning protective cover in the cleaning process is uniformly discharged through the chip removal hole 11.

In other embodiments, the first cover component may also be formed by splicing a plurality of components with the same or different shapes according to the shape of the machine platform, for example, by splicing two or more parts with the same shape and structure to form the first cover component.

In the above embodiment, the number and/or size of the clearance holes 11 are determined according to the amount of the waste liquid generated during the self-cleaning process of the self-cleaning protective cover, and if the amount of the waste liquid to be discharged is relatively large, a relatively large number of clearance holes 11 may be arranged around the periphery of the mounting hole 10. In the embodiment, the four clearance holes 11 are arranged by taking the cross-shaped structure of the self-cleaning protective cover into consideration. The arrangement position of the chip removal hole 11 must be located in a non-grinding area of the polishing machine, and because the vicinity of the mounting hole 11 is the non-grinding area, the position of the chip removal hole 11 should be as close to the mounting hole 10 as possible, and the opening of the chip removal hole 11 should not be too large, so as to just meet the requirement of waste liquid discharge.

In the preferred embodiment of the invention, the nozzles are constituted by injection holes provided on the purge conduit 6, the purge conduit 6 being arranged circumferentially along the through-hole 3.

In one embodiment of the invention, the nozzle is constructed in such a way that it is used to clean the spray holes in the pipe 6. Because the grinding fluid entering the protective cover flies and mists mainly through the through hole 3, the arrangement positions of the cleaning pipelines 6 are circumferentially distributed along the outer edge of the through hole 3. Since the through-hole 3 is formed by splicing the first cover member 1 and the second cover member 2, the through-hole 3 is composed of two parts.

In the above-described specific embodiment, the through-hole 3 is composed of two parts, a first U-shaped opening located on the first cover member 1 and a second U-shaped opening located on the second cover member 2. Therefore, the arrangement mode of the cleaning pipeline 6 can adopt a two-section arrangement mode, the first section is arranged around the first U-shaped opening on the first cover component 1, the second section is arranged around the second U-shaped opening on the second cover component 2, and the cleaning pipeline 6 can be fixedly connected with the corresponding cover component, so that the protective cover is convenient to disassemble.

In another embodiment of the present invention, the cleaning pipe 6 may also be integrally formed and arranged around the through hole 3 as a communicated whole, in which case, the cleaning pipe 6 is detachably mounted on the cover body of the self-cleaning protective cover, and the cleaning pipe 6 is mounted and dismounted before the protective cover is mounted and dismounted.

In the preferred embodiment of the present invention, the cleaning pipe 6 is connected to a fluid source, which is a mixed gas source of pure water and compressed air.

In the preferred embodiment of the present invention, as shown in FIG. 2, the injection holes include a first injection hole group 70 and a second injection hole group 71;

the direction of the first spray hole group 70 is perpendicular to the self-cleaning protective cover in the opposite direction, and is used for forming an air curtain around the through hole 3;

the second spray hole group 71 has a spray hole direction facing the self-cleaning protection cover for cleaning the self-cleaning protection cover.

In one embodiment of the invention, the cleaning pipe 6 is circulated with a gas-water mixed fluid. Two rows of injection holes are formed in the cleaning pipeline 6, the first row of injection holes, namely the first injection hole group 70, are perpendicular to the self-cleaning protective cover body in the opposite direction, so that air-water mixed fluid sprayed out of the first injection hole group 70 can form an air curtain at the edge of the through hole 3, the air curtain can effectively isolate grinding fluid flying mist generated in the grinding operation process, the originally opened protective cover becomes sealed, and grinding fluid flying mist is reduced or even prevented from entering the self-cleaning protective cover body.

In the above embodiment, the spraying direction of the first spraying hole group 70 is preferably perpendicular to the self-cleaning protective cover body, but is not limited to the perpendicular direction, and the spraying direction of the first spraying hole group 70 may be specifically set according to the specific application environment, but it should be ensured that the air curtain formed in the spraying direction can effectively isolate the abrasive liquid from the abrasive liquid, for example, the spraying direction may also form an acute angle with the protective cover body. In the above embodiment, the second injection hole group 71 is designed toward the self-cleaning shield body, and the second injection hole group 71 mainly functions to flush the shield body of the shield with the high-pressure aqueous vapor fluid injected through the injection holes, so that the abrasive grains adhering to the shield are discharged toward the chip removal holes 11 along with the flush fluid. The specific angle between the second injection hole group 71 and the protective cover body can be specifically designed according to actual conditions, so as to satisfy the design principle of flushing away the grinding fluid crystals on the protective cover. In a preferred embodiment of the invention, the joint of the first cover part 1 and the second cover part 2 is provided with a sealing means.

In an embodiment of the present invention, in order to further ensure the sealing performance of the splice, a sealing device is added at the splice, for example, a rubber gasket is fitted to further ensure that the waste liquid generated by the self-cleaning protective cover does not leak from the splice.

In a preferred embodiment of the invention, the second shroud component 2 is disposed obliquely to the first shroud component 1.

In the preferred embodiment of the invention, the four tips of the cross-shaped structure in the first cover member 1 are inclined toward the clearance hole 11.

In an embodiment of the present invention, in order to facilitate the cleaning waste liquid to be smoothly discharged from the exhaust hole 11 and avoid the cleaning waste liquid remaining on the shield, the first cover component 1 and the second cover component 2 are generally designed to be inclined toward the exhaust hole 11, so that the cleaning waste liquid flows toward the exhaust hole 11 by gravity.

The beneficial effects of the above technical scheme are that:

the utility model provides a self-cleaning under cover, this under cover is through increasing the nozzle that is used for the jet fluid around the through-hole, not only make the under cover possess the ability of automatically cleaning, fly the fog to the lapping liquid that gets into the under cover in real time in grinding process and wash, the deposit crystallization of lapping liquid on the protection casing has been reduced, still form an air curtain around the through-hole of under cover through nozzle spun fluid, it gets into the under cover to avoid lapping liquid to fly the fog, certain isolation effect is played, thereby the problem that the in-process crystallization thing of polishing board at the grinding operation dropped has effectively been stopped, the product of avoiding appearing grinding is by the phenomenon on crystal fish tail surface, the yield of product has been improved.

While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.