阅读说明：本技术 一种双测试室测量材料放气率的装置及方法 (A kind of device and method of dual testing room measured material outgassing rate measuring ) 是由 关玉慧 董海义 宋洪 于 2019-09-18 设计创作，主要内容包括：本申请公开了一种双测试室测量材料放气率的装置及方法,该装置包括高真空室、第一测试室、第一阀门、第二测试室、第二阀门、超高真空室、粗抽泵机组、精抽泵、第一真空规、第二真空规以及第三真空规。由于增设了第二真空规,打开第一阀门或第二阀门时,可以同时测得第一测试室和第二测试室内的压强,消除了时间引起的误差,同时在实际测量过程中无需进行转换气路的机械动作,既避免了开关阀门对真空读数的扰动,也提高了测量效率。(This application discloses a kind of device and method of dual testing room measured material outgassing rate measuring, which includes high vacuum chamber, the first test cabinet, the first valve, the second test cabinet, the second valve, supervacuum chamber, roughing vacuum pump unit, essence pumping pump, the first vacuum gauge, the second vacuum gauge and third vacuum gauge.Due to being additionally arranged the second vacuum gauge, when opening the first valve or the second valve, the first test cabinet and the second indoor pressure of test can be measured simultaneously, eliminate error caused by the time, it is not necessarily to carry out the mechanical action of conversion gas circuit during actual measurement simultaneously, both disturbance of the controlled valve to vacuum readings had been avoided, measurement efficiency is also improved.)

1. a kind of device of dual testing room measured material outgassing rate measuring characterized by comprising

High vacuum chamber is used to place material sample；

First test cabinet, is connected to high vacuum chamber, so that the indoor gas of high vacuum can flow into the first test cabinet, described One test cabinet has the first aperture, for for the indoor gas outflow of the first test；

First valve is arranged between the first test cabinet and high vacuum chamber, for realizing high vacuum chamber and the first test cabinet On-off；

Second test cabinet, is connected to high vacuum chamber, so that the indoor gas of high vacuum can flow into the second test cabinet, described Two test cabinets have second orifice, for for the indoor gas outflow of the second test；

Second valve is arranged between the second test cabinet and high vacuum chamber, for realizing high vacuum chamber and the second test cabinet On-off；

Supervacuum chamber is connected to the first test cabinet by the first aperture, is connected to by second orifice with the second test cabinet, is used In the gas that reception is flowed out from the first aperture and second orifice；

At least a set of roughing vacuum pump unit, the supervacuum chamber and high vacuum chamber are connected to roughing vacuum pump unit, the roughing vacuum pump Unit is for slightly vacuumizing supervacuum chamber and/or high vacuum chamber；

Essence takes out pump, is connected to supervacuum chamber, vacuumizes for carrying out essence to supervacuum chamber；

First vacuum gauge is connect with the first test cabinet, for measuring the first indoor pressure of test；

Second vacuum gauge is connect with the second test cabinet, for measuring the second indoor pressure of test；

And third vacuum gauge, it is connect with supervacuum chamber, for measuring the pressure in ultrahigh vacuum room.

2. device as described in claim 1, which is characterized in that first test cabinet and the second test cabinet are arranged symmetrically and big It is small, shape is identical, first aperture is identical with size, the shape of second orifice.

3. device as described in claim 1, which is characterized in that the roughing vacuum pump unit includes molecular pump and mechanical pump, described Molecular pump and mechanical series connection of pumps.

4. device as described in claim 1, which is characterized in that further include third valve, the third valve is arranged in superelevation Between vacuum chamber and roughing vacuum pump unit, for realizing the on-off of supervacuum chamber and roughing vacuum pump unit.

5. device as claimed in claim 4, which is characterized in that further include the 4th valve, the 4th valve is arranged in Gao Zhen Between empty room and roughing vacuum pump unit, for realizing the on-off of high vacuum chamber and roughing vacuum pump unit.

6. device as claimed in claim 5, which is characterized in that first valve, the second valve, third valve and the 4th valve Door includes slide valve and/or angle valve.

7. device as described in claim 1, which is characterized in that it further include the 4th vacuum gauge, the 4th vacuum gauge and Gao Zhen Empty room connection, for measuring the indoor pressure of high vacuum.

8. device as described in claim 1, which is characterized in that it includes ionic pump, getter pump or cryogenic pump that the essence, which takes out pump,.

9. device as described in claim 1, which is characterized in that it further include residual gas analyzer, the residual gas analysis Instrument is connect with high vacuum chamber.

10. a kind of method of dual testing room measured material outgassing rate measuring, which is characterized in that using such as dress described in claim 5 or 6 It sets, comprising:

First pump step: when high vacuum chamber no sample, start roughing vacuum pump component, high vacuum chamber and supervacuum chamber are carried out It slightly vacuumizes, after slightly vacuumizing, starts essence in predetermined pressure and take out pump, and close third valve and the 4th valve, take out pump dimension with essence Hold the ultrahigh vacuum of supervacuum chamber；

First data collection steps: the first valve is opened, the pressure Pu " of the first test cabinet is measured by the first vacuum gauge, is passed through Second vacuum gauge measures the pressure Pu " ' of the second test cabinet, and the pressure Pd " of supervacuum chamber is measured by third vacuum gauge；

Background discharge quantity calculates step: the background discharge quantity Q of high vacuum chamber_BackgroundIt is calculated by lower formula (I),

Q_Background=C [(Pu "-Pd ")-(Pu " '-Pd ")]=C (Pu "-Pu " ') (I)

In formula, C is orifice conductance value, unit: m³s^-1；

After completing the test of background discharge quantity, the first valve is closed, supervacuum chamber continues to vacuum state, high vacuum chamber is filled Nitrogen is to 1 atmospheric pressure；

It is put into sample step: being put into sample in high vacuum chamber；

Second pump step: after completion is put into sample step, start roughing vacuum pump component, to high vacuum chamber and/or supervacuum chamber It is slightly vacuumized, after slightly vacuumizing, closes roughing vacuum pump component, the ultrahigh vacuum that pump maintains supervacuum chamber is taken out by essence；

Second data collection steps: opening the first valve, the pressure Pu of the first test cabinet measured by the first vacuum gauge, by the Two vacuum gauges measure the pressure Pu ' of the second test cabinet, and the pressure Pd of high vacuum chamber is measured by third vacuum gauge；

Total discharge quantity calculates step: total discharge quantity Q of sample and high vacuum chamber_AlwaysIt is calculated by lower formula (II),

Q_Always=C [(Pu-Pd)-(Pu '-Pd)]=C (Pu-Pu ') (II)

Sample discharge quantity calculates step: sample discharge quantity Q is calculated by lower formula (III):

Q=Q_Always-Q_Background=C (Pu-Pu ')-C (Pu "-Pu " ') (III)

Sample deflation rate calculates step: sample deflation rate is calculated by lower formula (IV),

In formula, q is the deflation rate of sample, unit: Pam³s^-1cm^-2, s is the surface area of sample, unit: cm²。

Technical field

This application involves vacuumatic measuring field, in particular to the device of a kind of dual testing room measured material outgassing rate measuring and side Method.

Background technique

When using dual testing room measured material outgassing rate measuring, need to be arranged two full symmetric test cabinets (No. 1 test cabinet and No. 2 test cabinets), two test cabinets all have valve, and the conversion of gas passage may be implemented by opening/shutting valve.It is measuring When work, the valve of No. 1 test cabinet is first opened and only opened to the first step, allows gas by No. 1 test cabinet, is surveyed by vacuum gauge Try the pressure P1 of No. 1 test cabinet.The valve of No. 2 test cabinets is opened and only opened to second step, tests No. 1 test by vacuum gauge The pressure P2 of room.Third step subtracts each other first two steps pressure P1 and pressure P2 measured in No. 1 test cabinet.

But having time is poor between the above-mentioned first step and second step, and since deflation rate is changed with pumpdown time, above-mentioned survey Pressure P1 and pressure P2 subtract each other the influence for having ignored the time in amount method, so that error is introduced, especially in multiple conversions gas Lu Shi will introduce more errors, so have much room for improvement.

Summary of the invention

The application provides a kind of device and method of dual testing room measured material outgassing rate measuring, to solve existing test device The problem of introducing error with test method.

A kind of device of dual testing room measured material outgassing rate measuring provided by applying, comprising:

High vacuum chamber is used to place material sample；

First test cabinet, is connected to high vacuum chamber, so that the indoor gas of high vacuum can flow into the first test cabinet, institute The first test cabinet is stated with the first aperture, for for the indoor gas outflow of the first test；

First valve is arranged between the first test cabinet and high vacuum chamber, tests for realizing high vacuum chamber and first The on-off of room；

Second test cabinet, is connected to high vacuum chamber, so that the indoor gas of high vacuum can flow into the second test cabinet, institute The second test cabinet is stated with second orifice, for for the indoor gas outflow of the second test；

Second valve is arranged between the second test cabinet and high vacuum chamber, tests for realizing high vacuum chamber and second The on-off of room；

Supervacuum chamber is connected to by the first aperture with the first test cabinet, is connected by second orifice and the second test cabinet It is logical, for receiving the gas flowed out from the first aperture and second orifice；

At least a set of roughing vacuum pump unit, the supervacuum chamber and high vacuum chamber are connected to roughing vacuum pump unit, described thick Pump assembly is taken out for slightly being vacuumized to supervacuum chamber and/or high vacuum chamber；

Essence takes out pump, is connected to supervacuum chamber, vacuumizes for carrying out essence to supervacuum chamber；

First vacuum gauge is connect with the first test cabinet, for measuring the first indoor pressure of test；

Second vacuum gauge is connect with the second test cabinet, for measuring the second indoor pressure of test；

And third vacuum gauge, it is connect with supervacuum chamber, for measuring the pressure in ultrahigh vacuum room.

As the further improvement of described device, first test cabinet and the second test cabinet are symmetrical arranged and size, shape Shape is identical, and first aperture is identical with size, the shape of second orifice.

As the further improvement of described device, the roughing vacuum pump unit includes molecular pump and mechanical pump, the molecular pump With mechanical series connection of pumps.

It further include third valve as the further improvement of described device, the third valve is arranged in supervacuum chamber Between roughing vacuum pump unit, for realizing the on-off of supervacuum chamber and roughing vacuum pump unit.

Further include the 4th valve as the further improvement of described device, the 4th valve setting high vacuum chamber with Between roughing vacuum pump unit, for realizing the on-off of high vacuum chamber and roughing vacuum pump unit.

As the further improvement of described device, first valve, the second valve, third valve and the 4th valve are wrapped Include slide valve and/or angle valve.

It further include the 4th vacuum gauge as the further improvement of described device, the 4th vacuum gauge and high vacuum chamber connect It connects, for measuring the indoor pressure of high vacuum.

As the further improvement of described device, it includes ionic pump, getter pump or cryogenic pump that the essence, which takes out pump,.

It further include residual gas analyzer as the further improvement of described device, the residual gas analyzer and height Vacuum chamber connection.

A kind of method of dual testing room measured material outgassing rate measuring provided herein, use are as described in any one of the above embodiments Device, comprising:

First pump step: when high vacuum chamber no sample, start roughing vacuum pump component, to high vacuum chamber and supervacuum chamber It is slightly vacuumized, after slightly vacuumizing, starts essence in predetermined pressure and take out pump, and close third valve and the 4th valve, taken out with essence Pump maintains the ultrahigh vacuum of supervacuum chamber；

First data collection steps: opening the first valve, the pressure Pu " of the first test cabinet measured by the first vacuum gauge, The pressure Pu " ' that the second test cabinet is measured by the second vacuum gauge measures the pressure Pd " of supervacuum chamber by third vacuum gauge；

Background discharge quantity calculates step: the background discharge quantity Q of high vacuum chamber_BackgroundIt is calculated by lower formula (I),

Q_Background=C [(Pu "-Pd ")-(Pu " '-Pd ")]=C (Pu "-Pu " ') (I)

In formula, C is orifice conductance value, unit: m³s^-1；

After completing the test of background discharge quantity, the first valve is closed, supervacuum chamber continues to vacuum state, by high vacuum Room nitrogen charging is to 1 atmospheric pressure；

It is put into sample step: being put into sample in high vacuum chamber；

Second pump step: after completion is put into sample step, starting roughing vacuum pump component, true to high vacuum chamber and/or superelevation Empty room is slightly vacuumized, and after slightly vacuumizing, closes roughing vacuum pump component, is taken out pump by essence and is maintained the superelevation of supervacuum chamber true It is empty；

Second data collection steps: opening the first valve, the pressure Pu of the first test cabinet measured by the first vacuum gauge, leads to The pressure Pu ' that the second vacuum gauge measures the second test cabinet is crossed, the pressure Pd of high vacuum chamber is measured by third vacuum gauge；

Total discharge quantity calculates step: total discharge quantity Q of sample and high vacuum chamber_AlwaysIt is calculated by lower formula (II),

Q_Always=C [(Pu-Pd)-(Pu '-Pd)]=C (Pu-Pu ') (II)

Sample discharge quantity calculates step: sample discharge quantity Q is calculated by lower formula (III):

Q=Q_Always-Q_Background=C (Pu-Pu ')-C (Pu "-Pu " ') (III)

Sample deflation rate calculates step: sample deflation rate is calculated by lower formula (IV),

In formula, q is the deflation rate of sample, unit: Pam³s^-1cm^-2, s is the surface area of sample, unit: cm²。

The application's the utility model has the advantages that

Due to being additionally arranged the second vacuum gauge, when opening the first valve or the second valve, the first test cabinet can be measured simultaneously With the second indoor pressure of test, error caused by the time is eliminated；Conversion gas circuit is realized in technique, and as by deduction item Ultrahigh vacuum chamber pressure before and after " converting gas circuit " into same value, avoid the approximately equal processing converted before and after gas circuit, subtract Error is lacked；It is not necessarily to carry out the mechanical action of conversion gas circuit during actual measurement simultaneously, had both avoided controlled valve to true The disturbance of sky reading；Also improve measurement efficiency.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of the device of dual testing room measured material outgassing rate measuring in a kind of embodiment of the application；

Fig. 2 is the flow chart of the method for dual testing room measured material outgassing rate measuring in a kind of embodiment of the application；

Fig. 3 is the flow chart of the method for dual testing room measured material outgassing rate measuring in the application another kind embodiment.

Appended drawing reference: 1, high vacuum chamber；2, supervacuum chamber；3, the first test cabinet；31, the first aperture；4, the second test Room；41, second orifice；5, the first valve；6, the second valve；7, third valve；8, the 4th valve；9, roughing vacuum pump unit；91, divide Son pump；92, mechanical pump；10, essence takes out pump；11, the first vacuum gauge；12, the second vacuum gauge；13, third vacuum gauge；14, the 4th is true Sky rule；15, residual gas analyzer.

Specific embodiment

The application is described in further detail below by specific embodiment combination attached drawing, wherein different embodiments Middle similar component uses associated similar element numbers.In the following embodiments, many datail descriptions be in order to The application is better understood.However, those skilled in the art can recognize without lifting an eyebrow, part of feature It is dispensed, or can be substituted by other elements, material, method in varied situations.In some cases, this Shen Please it is relevant it is some operation there is no in the description show or describe, this is the core in order to avoid the application by mistake More descriptions are flooded, and to those skilled in the art, these relevant operations, which are described in detail, not to be necessary, they Relevant operation can be completely understood according to the general technology knowledge of description and this field in specification.

It is formed respectively in addition, feature described in this description, operation or feature can combine in any suitable way Kind embodiment.Meanwhile each step in method description or movement can also can be aobvious and easy according to those skilled in the art institute The mode carry out sequence exchange or adjustment seen.Therefore, the various sequences in the description and the appended drawings are intended merely to clearly describe a certain A embodiment is not meant to be necessary sequence, and wherein some sequentially must comply with unless otherwise indicated.

It is herein component institute serialization number itself, such as " first ", " second " etc., is only used for distinguishing described object, Without any sequence or art-recognized meanings.And " connection ", " connection " described in the application, unless otherwise instructed, include directly and It is indirectly connected with (connection).

The present embodiment provides a kind of devices of dual testing room measured material outgassing rate measuring.

Referring to FIG. 1, the device includes high vacuum chamber 1, supervacuum chamber 2, the first test cabinet 3, the second test cabinet 4, One valve 5, the second valve 6, third valve 7, the 4th valve 8, roughing vacuum pump unit 9, essence take out the 10, first vacuum gauge 11, second of pump Vacuum gauge 12, third vacuum gauge 13, the 4th vacuum gauge 14 and residual gas analyzer 15.

Referring to FIG. 1, in one embodiment, high vacuum chamber 1 is for placing material sample.The gas of material sample release Initially enter high vacuum chamber 1.

First test cabinet 3 is connected to high vacuum chamber 1, so that the gas in high vacuum chamber 1 can flow into the first test cabinet 3, First test cabinet 3 has the first aperture 31, for for the gas outflow in the first test cabinet 3.

First valve 5 is arranged between the first test cabinet 3 and high vacuum chamber 1, tests for realizing high vacuum chamber 1 and first The on-off of room 3.

Second test cabinet 4 is connected to high vacuum chamber 1, so that the gas in high vacuum chamber 1 can flow into the second test cabinet 4, Second test cabinet 4 has second orifice 41, for for the gas outflow in the second test cabinet 4.

Second valve 6 is arranged between the second test cabinet 4 and high vacuum chamber 1, tests for realizing high vacuum chamber 1 and second The on-off of room 4.

First test cabinet 3 and the second test cabinet 4 are symmetrical arranged and size, shape are identical, the first aperture 31 and second orifice 41 size, shape are identical.It can reduce using full symmetric the first test cabinet 3 and the second test cabinet 4 because of the first test cabinet 3 With error caused by the second test cabinet 4 itself difference, improving measurement accuracy.

Supervacuum chamber 2 is connected to by the first aperture 31 with the first test cabinet 3, and second orifice 41 and the second test cabinet are passed through 4 connections, for receiving the gas flowed out from the first aperture 31 and second orifice 41.

Referring to FIG. 1, in one embodiment, roughing vacuum pump unit 9 is provided at least one, supervacuum chamber 2 and Gao Zhen Empty room 1 is connected to roughing vacuum pump unit 9, and roughing vacuum pump unit 9 is used to carry out supervacuum chamber 2 and/or high vacuum chamber 1 slightly to take out true It is empty.

In the present embodiment, roughing vacuum pump unit 9 may also be referred to as molecule pump assembly, including molecular pump 91 and mechanical pump 92, point Son pump 91 is connected with mechanical pump 92.Diffusion pump or other pumps also can be used in other embodiments, as long as black vacuum can be taken out The vacuum degree that essence takes out pump 10 can be started by reaching.

Referring to FIG. 1, in one embodiment, roughing vacuum pump unit 9 is provided with one, the roughing vacuum pump unit 9 and superelevation are true Empty room 2 is connected to high vacuum chamber 1, for slightly being vacuumized to supervacuum chamber 2 and high vacuum chamber 1.The device further includes Third valve 7 and the 4th valve 8, third valve 7 is arranged between supervacuum chamber 2 and roughing vacuum pump unit 9, for realizing superelevation The on-off of vacuum chamber 2 and roughing vacuum pump unit 9.4th valve 8 is arranged between high vacuum chamber 1 and roughing vacuum pump unit 9, for realizing The on-off of high vacuum chamber 1 and roughing vacuum pump unit 9.

When needing slightly to vacuumize supervacuum chamber 2, third valve 7 is opened, starts roughing vacuum pump unit 9, with reality Now slightly vacuumizing to supervacuum chamber 2 after completing the work slightly vacuumized, starts essence and takes out pump, close third valve 7, close Roughing vacuum pump unit 9.When needing slightly to vacuumize high vacuum chamber 1, the 4th valve 8 is opened, starts roughing vacuum pump unit 9, with It realizes slightly vacuumizing to high vacuum chamber 1, after completing the work slightly vacuumized, closes the 4th valve 8, close roughing vacuum pump unit 9. Specifically, it slightly vacuumizes to need to reach and can start the vacuum degree that essence takes out pump 10.

In other embodiments, the roughing vacuum pump unit 9 of two or more quantity also can be set.For example, in a kind of implementation In example, there are two the settings of roughing vacuum pump unit 9, and one in two roughing vacuum pump units 9 is connected to supervacuum chamber 2, for super High vacuum chamber 2 is slightly vacuumized, another in two roughing vacuum pump units 9 is connected to high vacuum chamber 1, for high vacuum chamber 1 is slightly vacuumized.The similar vacuum pump such as diffusion pump also can be used in addition to useful molecules pump in roughing vacuum pump unit 9.

First valve 5, the second valve 6, third valve 7 and the 4th valve 8 include slide valve and/or angle valve.

In one embodiment, the first valve 5, the second valve 6, third valve 7 and the 4th valve 8 are angle valve, specifically, Angle valve can be all-metal angle valve.In other embodiments, the first valve 5, the second valve 6, third valve 7 and the 4th valve 8 At least one of can use slide valve.

Referring to FIG. 1, in one embodiment, essence is taken out pump 10 and is connected to supervacuum chamber 2, for supervacuum chamber 2 Essence is carried out to vacuumize.

It includes ionic pump, getter pump or cryogenic pump that essence, which takes out pump 10,.

In one embodiment, essence takes out pump 10 and uses ionic pump, and in other implementations, essence, which takes out pump 10, can also use air-breathing Agent pump or cryogenic pump etc., as long as the requirement that the ultimate vacuum of pump can be vacuumized down to essence.

Referring to FIG. 1, in one embodiment, the first vacuum gauge 11 is connect with the first test cabinet 3, surveyed for measuring first Try the pressure in room 3.

Referring to FIG. 1, in one embodiment, the second vacuum gauge 12 is connect with the second test cabinet 4, surveyed for measuring second Try the pressure in room 4.

Since the first test cabinet 3 and the second test cabinet 4 are full symmetric, and it is fitted with vacuum gauge, so the first test cabinet 3 With the second test cabinet 4 it is intracavitary backflow, the error of the chambers such as vacuum gauge is identical.It opens and only opens the first valve When 5, the second test cabinet 4 is used as contrastive test room, and the pressure of the second test cabinet 4 is subtracted with the pressure of the first test cabinet 3 measured Can eliminate backflow, vacuum gauge equal error, while in technique realize conversion gas circuit, reduce practical operation conversion gas circuit machine Tool movement, not only eliminates time error, while improving measurement efficiency.

Referring to FIG. 1, in one embodiment, third vacuum gauge 13 is connect with supervacuum chamber 2, true for measuring superelevation Pressure in empty room 2.

Referring to FIG. 1, in one embodiment, which further includes the 4th vacuum gauge 14, the 4th vacuum gauge 14 and Gao Zhen Empty room 1 connects, for measuring the pressure in high vacuum chamber 1.

In one embodiment, the first vacuum gauge 11, the second vacuum gauge 12, third vacuum gauge 13 and the 4th vacuum gauge 14 are With a cold-cathode ionization gauge.Using with a vacuum gauge, being conducive to error caused by reducing because of vacuum gauge itself difference. In specifically measurement work, in order to be further reduced error, before measurements, need true to the first vacuum gauge 11, second Sky rule 12, third vacuum gauge 13 and the 4th vacuum gauge 14 are calibrated.In other embodiments, the first vacuum gauge 11, second is true Sky rule 12, third vacuum gauge 13 and the 4th vacuum gauge 14 can not also use cold-cathode ionization gauge, but use other kinds The vacuum gauge of class, as long as range meets measurement demand.Especially this test method does not use the 4th vacuum gauge 14 directly, this rule Different vacuum gauges can also be used from other three rule.

Referring to FIG. 1, in one embodiment, which further includes residual gas analyzer 15, residual gas analyzer 15 connect with high vacuum chamber 1.In other embodiments, residual gas analyzer 15 can also be not provided with.

When carrying out the measurement of material outgassing rate, since material is placed in high vacuum chamber 1, the gas that material is released is first Into high vacuum chamber 1, any of the first valve 5 or the second valve 6 can be then opened, when the first valve 5 is opened in selection When, the gas in high vacuum chamber 1 enters in the first test cabinet 3, then enters supervacuum chamber 2 by the first aperture 31；Work as selection When opening the second valve 6, the gas in high vacuum chamber 1 enters in the second test cabinet 4, then true into superelevation by second orifice 41 Empty room 2.

Due to being mounted with the first vacuum gauge 11 and the second vacuum gauge 12, when opening the first valve 5 or the second valve 6, first Vacuum gauge 11 measures the pressure in the first test cabinet 3, and the second vacuum gauge 12 measures the pressure in the second test cabinet 4, so as to The pressure in the first test cabinet 3 and the second test cabinet 4 is measured simultaneously, eliminates error caused by the time, and in actual measurement It is not necessarily to carry out the mechanical action of conversion gas circuit in the process, had both avoided disturbance of the controlled valve to vacuum readings, and improved measurement Accuracy, also improve measurement efficiency.

On the other hand, this implementation also provides a kind of method of dual testing room measured material outgassing rate measuring, and this method can be used Device is stated to realize.

Referring to FIG. 2, in one embodiment, this method comprises:

First pump step: when high vacuum chamber no sample, start roughing vacuum pump component, to high vacuum chamber and supervacuum chamber It is slightly vacuumized, after slightly vacuumizing, starts essence in predetermined pressure and take out pump, and close third valve and the 4th valve, taken out with essence Pump maintains the ultrahigh vacuum of supervacuum chamber.It should be noted that " predetermined pressure " here is obtained by test or experience Suitable starting essence take out pump pressure, be the value that can be set in advance.

First data collection steps: opening the first valve, the pressure Pu " of the first test cabinet measured by the first vacuum gauge, The pressure Pu " ' that the second test cabinet is measured by the second vacuum gauge measures the pressure Pd " of supervacuum chamber by third vacuum gauge.

When opening and only opening the first valve, the second test cabinet is as contrastive test room, with the first test cabinet measured The pressure that pressure subtracts the second test cabinet can eliminate backflow, vacuum gauge equal error, while in technique realize conversion gas circuit, subtract The mechanical action for having lacked practical operation conversion gas circuit, not only eliminates time error, while improving measurement efficiency.In other implementations In example, the second valve can also be opened and only open, by the first test cabinet test cabinet as a comparison.

Background discharge quantity calculates step: the background discharge quantity Q of high vacuum chamber_BackgroundIt is calculated by lower formula (I),

Q_Background=C [(Pu "-Pd ")-(Pu " '-Pd ")]=C (Pu "-Pu " ') (I)

In formula, C is orifice conductance value, unit: m³s^-1。

After completing the test of background discharge quantity, the first valve is closed, supervacuum chamber continues to vacuum state, by high vacuum Room nitrogen charging is to 1 atmospheric pressure.

It is put into sample step: being put into sample in high vacuum chamber.

Second pump step: after completion is put into sample step, starting roughing vacuum pump component, true to high vacuum chamber and/or superelevation Empty room is slightly vacuumized, and after slightly vacuumizing, closes roughing vacuum pump component, is taken out pump by essence and is maintained the superelevation of supervacuum chamber true It is empty.It should be noted that, if supervacuum chamber is exposed to the atmosphere by selection, being needed after the completion of the test of background discharge quantity Again the operation slightly vacuumized and essence vacuumizes is carried out to supervacuum chamber.If selection maintains the vacuum shape of supervacuum chamber State does not need then again slightly to vacuumize supervacuum chamber in the second pump step and essence vacuumizes.

Second data collection steps: opening the first valve, the pressure Pu of the first test cabinet measured by the first vacuum gauge, leads to The pressure Pu ' that the second vacuum gauge measures the second test cabinet is crossed, the pressure Pd of high vacuum chamber is measured by third vacuum gauge.At other In embodiment, the second valve can also be opened and only open, by the first test cabinet test cabinet as a comparison.

Total discharge quantity calculates step: total discharge quantity Q of sample and high vacuum chamber_AlwaysIt is calculated by lower formula (II),

Q_Always=C [(Pu-Pd)-(Pu '-Pd)]=C (Pu-Pu ') (II)

Sample discharge quantity calculates step: sample discharge quantity Q is calculated by lower formula (III):

Q=Q_Always-Q_Background=C (Pu-Pu ')-C (Pu "-Pu " ') (III)

Sample deflation rate calculates step: sample deflation rate is calculated by lower formula (IV),

In formula, q is the deflation rate of sample, unit: Pam³s^-1cm^-2, s is the surface area of sample, unit: cm²。

Referring to FIG. 3, it should be noted that the data being put under sample state can also be measured first, then measure and be not put into Data under sample state.

Specifically, it is adopted with continued reference to FIG. 3, first successively carrying out being put into sample step, the second pump step and the second data Collect step and total discharge quantity and calculate step, then take out and take out the indoor sample of high vacuum in sample step, then successively carries out the One pump step and the first data collection steps are obtained followed by the first data collection steps and the second data collection steps Data calculate step by background discharge quantity, sample discharge quantity calculates step and sample deflation rate calculates step and calculates sample Deflation rate.

If device hardware does not change, background deflation measurement is primary, is applicable to the discharge quantity of different samples Test.

The foregoing is a further detailed description of the present application in conjunction with specific implementation manners, and it cannot be said that this Shen Specific implementation please is only limited to these instructions.For those of ordinary skill in the art to which this application belongs, it is not taking off Under the premise of from the present application design, a number of simple deductions or replacements can also be made.