阅读说明：本技术 热压成型玻璃及其加工方法 (hot press forming glass and processing method thereof ) 是由 王晶 张必明 于 2019-07-02 设计创作，主要内容包括：本发明公开了一种热压成型玻璃及其加工方法。所述热压成型玻璃包括基体及形成于所述基体的衍射微结构,所述衍射微结构包括多个平行间隔设置的线纹以及位于相邻所述刻痕之间的狭缝。所述线纹的线宽大于等于150nm,所述狭缝的深度为所述线宽的0.9-1.2倍。本发明提供的加工方法包括升温至模压温度、对玻璃基板进行合模、加压、保温,冷却到开模温度后开模得到所述热压成型玻璃。本发明的热压成型玻璃及工艺方法精确制作出设计尺寸,降低对设备的要求,满足实际工业应用需求。(The invention discloses hot-press formed glass and a processing method thereof. The hot-press forming glass comprises a base body and a diffraction microstructure formed on the base body, wherein the diffraction microstructure comprises a plurality of lines arranged in parallel at intervals and a slit positioned between every two adjacent scores. The line width of the lines is more than or equal to 150nm, and the depth of the slits is 0.9-1.2 times of the line width. The processing method provided by the invention comprises the steps of heating to a mould pressing temperature, carrying out mould closing, pressurization and heat preservation on the glass substrate, cooling to a mould opening temperature, and then opening the mould to obtain the hot-press formed glass. The hot-press formed glass and the process method accurately manufacture the designed size, reduce the requirements on equipment and meet the requirements of actual industrial application.)

1. The hot-press formed glass comprises a base body and a diffraction microstructure formed on the base body, and is characterized in that the diffraction microstructure comprises a plurality of parallel lines arranged at intervals and slits located between adjacent notches, and the line width of each line is larger than or equal to 150 nm.

2. the hot press formed glass of claim 1, wherein the depth of the slit is 0.9 to 1.2 times the line width.

3. the processing method of the hot-press formed glass is characterized by comprising the following steps:

S1: providing a first mold, a second mold arranged opposite to the first mold in a spaced mode, and heating the first mold and the second mold to a first temperature T1;

s2: providing a grating template and a glass sample, placing the glass sample on the grating template, and fixing the grating template on the first mold so that the glass sample faces the second mold;

s3: raising the temperature of the first mold and the second mold to a molding temperature T2;

s4: after the temperature reaches the molding temperature T2, applying a first pressure N1 to the second mold, pressing the second mold at a stable pressing speed V1 to the first mold, and maintaining the pressure of the first mold under the pressure maintaining pressure N2;

S5: cooling the second mold to a mold opening temperature T3, opening the mold at a demolding speed V2 after the mold opening temperature T3 is reached, and enabling the glass sample printed with the target structure to fall off from the grating template and the second mold;

wherein T2-2T 1.

4. The method as claimed in claim 3, wherein the pressing temperature T2 in step S3 is 450-600 ℃.

5. The method as set forth in claim 3, wherein the first pressure N1 in the step S4 is 5000-15000N.

6. The method for processing hot press formed glass according to claim 3, wherein the press-down speed V1 in step S4 is 100N/S to 500N/S.

7. The method of claim 3, wherein the holding pressure N2 in step S4 is 3000-12000N.

8. The method for processing hot press formed glass according to claim 3, wherein the dwell time in step S4 is 100 to 300S.

9. The method for processing hot press formed glass according to claim 3, wherein the cooling rate for cooling the second mold in step S5 is 10 ℃/S to 50 ℃/S.

10. The method as claimed in claim 3, wherein the mold release temperature T3 in step S5 is 400-500 ℃.

11. The method as claimed in claim 3, wherein the releasing speed V2 in step S5 is 200-500N/S.

[ technical field ] A method for producing a semiconductor device

the embodiment of the invention relates to a diffractive micro-optical component, in particular to hot-press forming glass and a processing method thereof.

[ background of the invention ]

At present, the optical micro-nano structure applied to the diffraction micro-optical component has four manufacturing methods, including a maskless direct writing technology, a traditional overlay method, a gray mask method and a nano-imprint method.

The maskless direct writing technology mainly comprises laser direct writing, electron beam direct writing and ion beam direct writing, is more suitable for manufacturing a single continuous profile device with multiple phases or a simple structure, and has higher diffraction efficiency. But the greatest problem is that the profile depth and the profile distortion of the etched pattern cannot be precisely controlled, and the required equipment is expensive. The electron beam direct writing with higher resolution ratio also has the problems of increasing the manufacturing cost and efficiency of the device due to long exposure time, and the practical processing problems of difficult accurate control of the exposure of the device with a complex outline due to the influence of proximity effect, and the like.

The traditional alignment method has the defects of more processing links, long period and difficult control of alignment precision, so that the manufacturing precision and the diffraction efficiency of the diffraction micro-optical component are further improved. However, if the existing manufacturing process of the integrated chip is adopted for alignment, the manufacturing precision can reach below 50nm, but the process equipment is very expensive and is not sold in China, and the equipment technology is in a blocked state.

Therefore, there is a need for a new method for manufacturing diffractive micro-optical components.

[ summary of the invention ]

Aiming at the problems that the manufacturing method of the optical micro-nano structure of the diffraction micro-optical component in the related technology has more processing links, long period and difficult control of alignment precision, and further improves the manufacturing precision and the diffraction efficiency of the diffraction micro-optical component, a new diffraction optical component and a processing method thereof are needed to be provided.

In order to achieve the purpose, the invention provides hot-press forming glass, which comprises a base body and a diffraction microstructure formed on the base body, wherein the diffraction microstructure comprises a plurality of parallel lines arranged at intervals and slits positioned between adjacent nicks, and the line width of each line is more than or equal to 150 nm.

Preferably, the depth of the slit is 0.9 to 1.2 times the line width.

the invention provides a processing method of hot-press formed glass, which comprises the following steps:

s1: providing a first mold, a second mold arranged opposite to the first mold in a spaced mode, and heating the first mold and the second mold to a first temperature T1;

S2: providing a grating template and a glass sample, placing the glass sample on the grating template, and fixing the grating template on the first mold so that the glass sample faces the second mold;

s3: raising the temperature of the first mold and the second mold to a molding temperature T2;

S4: and after the temperature reaches the molding temperature T2, applying a first pressure N1 to the second mold, pressing the second mold at a stable pressing speed V1 to the first mold, and maintaining the pressure of the first mold under the pressure keeping pressure N2.

S5: cooling the second mold to a mold opening temperature T3, opening the mold at a demolding speed V2 after the mold opening temperature T3 is reached, and enabling the glass sample printed with the target structure to fall off from the grating template and the second mold; wherein T2-2T 1.

preferably, the molding temperature T2 in step S3 is 450-600 ℃.

Preferably, the first pressure N1 in the step S4 is 5000 to 15000N.

Preferably, the pressing-down speed V1 in step S4 is 100N/S to 500N/S.

Preferably, the holding pressure N2 in the step S4 is 3000-12000N.

Preferably, the dwell time in step S4 is 100 to 300S.

Preferably, the cooling rate of cooling the second mold in step S5 is 10 ℃/S to 50 ℃/S.

preferably, the mold release temperature T3 in step S5 is 400-500 ℃.

Preferably, the mold release speed V2 in step S5 is 200N/S to 500N/S.

Compared with the prior art, the processing method of the hot-press formed glass does not need subsequent etching treatment on the workpiece and exposure and development, so that the designed size can be accurately manufactured. In addition, the optical stability of the glass is much higher than that of the common transparent resin or photoresist, the short service life in a sunlight irradiation environment is not concerned, and the relative refractive index of the glass is higher in the current transparent material. The invention can accurately manufacture the design size, reduce the requirement on equipment and meet the requirement of practical industrial application.

[ description of the drawings ]

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without inventive efforts, wherein:

FIG. 1 is a schematic side view of a hot press forming glass processing apparatus of the present invention;

FIG. 2 is a partial block diagram of an electroforming daughter template of the present invention;

FIG. 3 is a schematic view of a processing configuration for processing the glass substrate;

FIG. 4 is a flow chart of a method of processing hot press formed glass according to the present invention;

FIG. 5 is an electron microscope photograph of a hot press formed glass of the present invention.

[ detailed description ] embodiments

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1, fig. 1 is a schematic side view of a hot press forming glass processing apparatus 10 according to the present invention. The processing equipment 10 comprises a first machine table 11, a second machine table 13, a first mould 15, a second mould 17 and an electroforming sub-template 19. The first machine 11 and the second machine 13 are arranged at intervals relatively, and the distance between the first machine 11 and the second machine 13 is adjusted through relative movement. The first mold 15 is fixedly arranged on the side surface of the first machine table 11 close to the second machine table 13, the second mold 17 is fixedly arranged on the side surface of the second machine table 13 close to the first machine table 11, and the first mold 15 and the second mold 17 are arranged at intervals relatively. The electroforming sub-template 19 is stacked on the side surface of the second mold 17 far away from the second machine table 13, and is arranged at an interval relative to the first mold 15.

referring to fig. 2, fig. 2 is a structural diagram of an electroforming daughter board 19 according to the present invention. The electroforming sub-template 19 is a special-shaped mold which is replicated on the surface of a substrate by an electroforming process to form a precise fine, complicated and some difficult to process by other methods. The electroforming sub-template 19 includes an electroforming base 191, a columnar protrusion 193, and a columnar groove 195. The stud bumps 193 and the stud grooves 195 are formed on one side surface of the electroformed base 191, and the stud bumps 193 and the stud grooves 195 are uniformly spaced apart.

Referring to fig. 3 and 4, fig. 3 is a schematic view of a processing structure for processing the glass substrate 20, and fig. 4 is a flowchart of a processing method for hot press forming glass according to the present invention. In this embodiment, the electroforming sub-template 19 is a grating template 19, and the processing method specifically includes:

S1: providing a first mold 15, a second mold 17 spaced opposite to the first mold 15, and heating the first mold 15 and the second mold 17 to a first temperature T1.

s2: providing a reticle template 19 and a glass sample 20, placing the glass sample 20 on the reticle template 19, fixing the reticle template 19 to the first mold 15 such that the glass sample 20 is directed towards the second mold 17.

S3: the first mold 15 and the second mold 17 are heated to a molding temperature T2. Wherein the molding temperature T2 is 450-600 ℃, and the transition temperature Tg of glass is preferred.

S4: and after the temperature reaches the molding temperature T2, applying a first pressure N1 to the second mold 17 to press the first mold 15 at a stable pressing speed V1, and maintaining the pressure of the first mold under the pressure keeping pressure N2. Wherein the first pressure N1 is 5000-15000N, preferably 12000N; the pressing speed V1 is 100N/s-500N/s, preferably 300N/s; the pressure maintaining pressure N2 is 3000-12000N, preferably 10000N; the dwell time is 100 to 300s, preferably 240 s.

S5: cooling the second mold 17 to a mold opening temperature T3, opening the mold at a mold opening speed V2 after reaching the mold opening temperature T3, and allowing the glass sample 20 printed with the target structure to fall off from the grating template 19 and the second mold 17; wherein T2-2T 1. Specifically, the cooling speed for cooling the second mold 17 is 10 ℃/s to 50 ℃/s, preferably 30 ℃/s; the demolding temperature T3 is 400-500 ℃, and the transition temperature Tg of the glass sample is preferred; the mold release speed V2 is 200N/s to 500N/s, preferably 300N/s.

In step S2, the grating template 19 is obtained by nanoimprinting the master template through an electroplating method. The master template is obtained by electron beam direct writing or laser direct writing.

Referring to fig. 5, fig. 5 is an electron microscope image of the hot press formed glass 50 according to the present invention. The hot press molding glass 50 comprises a base body 51 and a diffraction microstructure 53 formed on the base body. The hot press molding glass 50 is formed by hot press processing of an electroforming replica mold plate 19. The diffractive microstructure 53 comprises a plurality of parallel spaced lines 531 and slits 533 between adjacent scores. As shown in the figure, the width between adjacent slits 533 is 147nm and 148nm, the pitch between adjacent lines 531 is 101nm, and the pitch between adjacent lines and slits is 351 nm. The line width of the line 531 is greater than or equal to 150nm, and the depth of the slit is 0.9-1.2 times of the line width.

Compared with the related art, the processing method of the hot press molding glass 50 does not need subsequent etching treatment on the workpiece and exposure and development, so that the designed size can be accurately manufactured. In addition, the optical stability of the glass is much higher than that of the common transparent resin or photoresist, the short service life in a sunlight irradiation environment is not concerned, and the relative refractive index of the glass is higher in the current transparent material. The invention can accurately manufacture the hot-press forming glass 50 with the designed size, reduce the requirement on equipment and meet the requirement of practical industrial application.

While the foregoing is directed to embodiments of the present invention, it will be understood by those skilled in the art that various changes may be made without departing from the spirit and scope of the invention.