阅读说明：本技术 包括乙硅烷基胺化合物的含硅薄膜沉积组合物以及用其制备含硅薄膜的方法 (Silicon-containing film deposition composition including disilazane compound and method of preparing silicon-containing film using the same ) 是由 金成基 张世珍 杨炳日 朴重进 李相道 朴廷主 李三东 朴建柱 李相益 金铭云 于 2018-04-19 设计创作，主要内容包括：本发明涉及包括乙硅烷基胺化合物的含硅薄膜沉积组合物以及使用该组合物制造含硅薄膜的方法。本发明的含硅薄膜沉积组合物能借助包括作为硅前体的乙硅烷基胺化合物来制备高质量含硅薄膜,该乙硅烷基胺化合物显示出优异的反应性、热稳定性和高挥发性。(The present invention relates to a silicon-containing film deposition composition including a disilazane-based amine compound and a method of manufacturing a silicon-containing film using the same. The silicon-containing film deposition composition of the present invention can prepare a high-quality silicon-containing film by including, as a silicon precursor, a disilazane-based amine compound which exhibits excellent reactivity, thermal stability and high volatility.)

1. a composition for depositing a silicon-containing thin film, comprising a disilazane-based amine compound represented by the following chemical formula 1:

[ chemical formula 1]

In the chemical formula 1, the metal oxide is represented by,

Ra, Rb, and R1 through R9 are each independently hydrogen, C1-C7 alkyl, or C2-C7 alkenyl, provided that Ra and Rb are not both hydrogen.

2. the composition for depositing silicon-containing films of claim 1,

In the chemical formula 1, the first and second organic solvents,

Ra and Rb are each independently hydrogen, C1-C5 alkyl, or C2-C5 alkenyl, provided that Ra and Rb are not both hydrogen;

r1 to R3 are hydrogen;

R4 to R9 are each independently hydrogen, C1-C5 alkyl or C1-C5 alkenyl.

3. The composition for depositing silicon-containing films of claim 1,

the chemical formula 1 is represented by the following chemical formula 2:

[ chemical formula 2]

In the chemical formula 2, R is C1-C7 alkyl, and R11 to R14 are each independently hydrogen, C1-C7 alkyl, or C2-C7 alkenyl.

4. The composition for depositing silicon-containing films according to claim 3,

in the chemical formula 2, R11 to R14 are each independently hydrogen or C1-C5 alkyl.

5. The composition for depositing silicon-containing films of claim 1,

The disilazane-based amine compound of chemical formula 1 is selected from the group consisting of:

6. a method for manufacturing a silicon-containing film using the composition for depositing a silicon-containing film according to any one of claims 1 to 5.

7. The method for producing a silicon-containing film according to claim 6,

the manufacturing method is performed by atomic layer deposition, chemical vapor deposition, metal organic chemical vapor deposition, low pressure chemical vapor deposition, plasma enhanced chemical vapor deposition, or plasma enhanced atomic layer deposition.

8. The method of claim 6, comprising:

a) Maintaining a temperature of a substrate installed in the chamber at 30 to 400 ℃;

b) injecting a carrier gas and the composition for depositing a silicon-containing thin film according to claim 1; and

c) injecting a reaction gas to deposit the silicon-containing thin film on the substrate.

9. The method for producing a silicon-containing film according to claim 8,

The reaction gas is any one or two or more selected from the group consisting of: oxygen, ozone, distilled water, hydrogen peroxide, nitric oxide, nitrous oxide, nitrogen dioxide, ammonia, nitrogen, hydrazine, amines, diamines, carbon monoxide, carbon dioxide, C1 to C12 saturated or unsaturated hydrocarbons, hydrogen, argon, and helium.

Technical Field

The present invention relates to a composition for depositing a silicon-containing film comprising a disilazane-based amine compound and a method for manufacturing a silicon-containing film using the same.

background

Silicon-containing thin films, such as Silicon films (Silicon), Silicon oxide films (Silicon oxides), Silicon nitride films (Silicon nitrides), Silicon carbonitride films (Silicon carbonitrides), and Silicon oxynitride films (Silicon oxynitrides), are manufactured in various thin film forms by various deposition processes in the semiconductor field, and are widely used in many fields. In particular, since silicon oxide films and silicon nitride films have very excellent barrier properties and oxidation resistance, they are used as insulating films, diffusion barrier layers, hard masks, etch stop layers, seed layers, spacers, trench isolations, intermetal dielectric materials, and protective film layers in manufacturing devices. Recently, polycrystalline silicon thin films are used for Thin Film Transistors (TFTs), solar cells, and the like, and application fields thereof are gradually diversified.

As a representative technique known in the art for manufacturing a silicon-containing thin film, there is Metal Organic Chemical Vapor Deposition (MOCVD) in which a mixed gas type silicon precursor and a reaction gas are reacted to form a film on a surface of a substrate or by direct reaction on the surface of the substrate to form a film, and Atomic Layer Deposition (ALD) of forming a film by physically or chemically adsorbing a gaseous silicon precursor on a substrate surface and sequentially feeding reaction gases, various techniques for manufacturing thin films, such as Low Pressure Chemical Vapor Deposition (LPCVD), Plasma Enhanced Chemical Vapor Deposition (PECVD) using plasma capable of being deposited at a low temperature, Plasma Enhanced Atomic Layer Deposition (PEALD), etc., are applied to a process for manufacturing next-generation semiconductors and display devices, thereby being used for forming ultra-fine patterns and depositing ultra-thin films having a nano-scale thickness with uniform and excellent properties.

As representative precursors for forming silicon-containing films, compounds in the form of silanes, silane chlorides, aminosilanes and alkoxysilanes are listed, and the precursor characteristics that are generally required are as follows:

a compound which is in a liquid form at normal temperature and normal pressure, and a compound having excellent volatility;

(xii) a compound having high thermal stability and low activation energy to have excellent reactivity;

Compound without non-volatile by-product in the process of forming film; and

And fourthly, the compound is easy to handle, transport and store.

At present, studies on deposition of silicon-containing thin films using silane chlorides such as dichlorosilane (dichlorosilane: SiH2Cl2) and hexachlorodisilane (hexachlorodisilane: Cl3 SiCl3) and compounds in the form of aminosilanes such as trisilylamine (N (SiH3)3), bis-diethylaminosilane (bis-diethylaminosilane: H2Si (N (CH2CH3)2)2) and diisopropylaminosilane (di-isopyrazolamide: H3SiN (i-C3H7)2) have been reported in various literatures, and the precursors are used for mass production of semiconductors and displays. However, according to device miniaturization, increase in aspect ratio, and diversification of device materials caused by ultra-high integration of devices, a technology of forming an ultra-thin film having a uniform and thin thickness and excellent electrical properties at a desired low temperature has been required, and thus, when using the existing silicon precursor, problems are occurring in terms of a high-temperature process at 600 ℃ or more, step coverage, etching properties, and physical and electrical properties of the thin film.

however, even in the case of forming an ultrafine thin film having a uniform and thin thickness and excellent electrical properties at a desired low temperature in a device, productivity is problematic due to a low film formation speed, and thus, development of a novel silicon precursor having improved properties is required.

Disclosure of Invention

technical problem

The present invention provides a composition for depositing a silicon-containing thin film, which comprises a disilazane-based amine compound having high thermal stability and excellent reactivity as a silicon precursor, thereby having excellent cohesion at a low temperature.

in addition, the present invention provides a method of manufacturing a silicon-containing film capable of forming a silicon-containing film having excellent physical and electrical properties such as a high deposition rate, excellent step coverage, etc., using the composition for depositing a silicon-containing film according to an embodiment of the present invention.

Means for solving the problems

the present invention provides a composition for depositing a silicon-containing thin film, comprising a disilazane compound having a low activation energy to have excellent reactivity, thermal stability, and volatility, and thus being very suitable for use as a precursor of a deposited thin film, and the disilazane compound contained in the composition for depositing a silicon-containing thin film of the present invention is represented by the following chemical formula 1:

[ chemical formula 1]

(in the chemical formula 1 mentioned above,

Ra, Rb, and R1 through R9 are each independently hydrogen, (C1-C7) alkyl, or (C2-C7) alkenyl, provided that Ra and Rb are not both hydrogen. )

Preferably, in the chemical formula 1 according to an embodiment of the present invention, Ra and Rb may each independently be hydrogen, (C1-C5) alkyl or (C2-C5) alkenyl, provided that Ra and Rb are not simultaneously hydrogen; r1 to R3 may be hydrogen; r4 to R9 may each independently be hydrogen, (C1-C5) alkyl, or (C1-C5) alkenyl.

Preferably, the chemical formula 1 of the present invention may be represented by the following chemical formula 2:

[ chemical formula 2]

(in the chemical formula 2, R is a (C1-C7) alkyl group, and R11 to R14 are each independently hydrogen, (C1-C7) alkyl or (C2-C7) alkenyl.)

In said chemical formula 2 according to an embodiment of the present invention, it is preferable that R11 to R14 may be each independently hydrogen or (C1-C5) alkyl, from the viewpoint of depositing a thin film having better purity and durability.

Specifically, the disilazane-based amine compound of chemical formula 1 according to the present invention may be selected from the following compounds, but is not limited thereto:

In addition, the present invention provides a method for manufacturing a silicon-containing film using the composition for depositing a silicon-containing film of the present invention.

The method of manufacturing a silicon-containing thin film of the present invention may be performed by Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Metal Organic Chemical Vapor Deposition (MOCVD), Low Pressure Chemical Vapor Deposition (LPCVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), or Plasma Enhanced Atomic Layer Deposition (PEALD).

The method for manufacturing a silicon-containing film of the present invention may specifically include the steps of:

a) Maintaining a temperature of a substrate installed in the chamber at 30 to 400 ℃;

b) injecting a carrier gas and the composition for depositing a silicon-containing thin film according to claim 1; and

c) And injecting a reaction gas to deposit a silicon-containing film on the substrate.

The reaction gas according to an embodiment of the present invention may be any one, two or more selected from the group consisting of: oxygen (O2), ozone (O3), distilled water (H2O), hydrogen peroxide (H2O2), Nitric Oxide (NO), nitrous oxide (N2O), nitrogen dioxide (NO2), ammonia (NH3), nitrogen (N2), hydrazine (N2H4), amines, diamines, carbon monoxide (CO), carbon dioxide (CO2), C1 to C12 saturated or unsaturated hydrocarbons, hydrogen, argon and helium.

Effects of the invention

The composition for depositing a silicon-containing thin film of the present invention comprises a disilazane-based amine compound as a precursor for depositing a silicon-containing thin film, which has a low activation energy to have excellent reactivity, excellent thermal stability and high volatility, thereby enabling the production of a thin film having excellent physical and electrical properties, such as a high deposition rate and excellent step coverage, as well as excellent purity and durability.

In addition, the disilazane compound contained in the composition for depositing a silicon-containing film according to the present invention exists in a liquid state at room temperature or a pressure capable of handling, and thus is easy to handle, and thus, it is easier to manufacture a silicon-containing film.

in addition, according to the method for manufacturing a silicon-containing film of the present invention, a silicon-containing film can be manufactured using a composition for a deposited silicon-containing film comprising a disilazane-based amine compound having high thermal stability and excellent reactivity, thereby allowing the manufacture of a silicon-containing film having a high silicon content and excellent thermal stability, durability, and high quality.

drawings

FIG. 1 is a graph of vapor pressure measurements of bis-dimethylsilylmethylethylalkylamine prepared in example 1.

Detailed Description

Hereinafter, the disilazane-based amine compound, the method for preparing the same, and the composition for depositing a silicon-containing film containing the disilazane-based amine compound according to the present invention will be described in detail.

The "alkyl" as used herein refers to straight, branched and cyclic, saturated and unsaturated hydrocarbons having 1 to 7, preferably 1 to 5, more preferably 1 to 3 carbon atoms, and includes, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl and the like.

As used herein, "halogen" refers to elements of the halogen family, including, for example, fluorine, chlorine, bromine, and iodine.

the term "alkenyl" as used herein alone or as part of another group refers to straight, branched or cyclic hydrocarbon radicals having from 2 to 7 carbon atoms and one or more carbon-carbon double bonds. More preferred alkenyl groups are lower alkenyl groups having 2 to 5 carbon atoms. The most preferred lower alkenyl groups are those having from 2 to about 3 carbon atoms. In addition, the alkenyl groups may be substituted at any available attachment point. Examples of alkenyl groups include ethenyl, propenyl, allyl, butenyl, and 4-methylbutenyl. The terms "alkenyl" and "lower alkenyl" include groups that are cis and trans oriented, or alternatively, groups having E and Z orientations.

The present invention provides a composition for depositing a silicon-containing thin film, the composition comprising a disilazane-based amine compound represented by the following chemical formula 1, which has excellent reactivity and thermal stability as a precursor for depositing a thin film, and at the same time, exists mainly in a liquid form at room temperature, thus being easily handled:

[ chemical formula 1]

In the chemical formula 1, the first and second organic solvents,

ra, Rb, and R1 through R9 are each independently hydrogen, (C1-C7) alkyl, or (C2-C7) alkenyl, provided that Ra and Rb are not both hydrogen.

The disilazane-based amine compound contained in the composition for depositing a silicon-containing thin film according to the present invention has an unshared pair of nitrogen atom electrons additionally provided to silicon atoms in the molecule, thereby increasing the binding energy of silicon and nitrogen atoms, and has a low activation energy in the form of a triangular plane Si3N molecular structure in which three silicon atoms are bonded to nitrogen atoms, thereby having excellent reactivity and excellent thermal stability, and thus, is very useful as a silicon-containing thin film precursor.

Further, the disilazane-based amine compound of the present invention is a compound that is mainly in a liquid form at normal temperature and pressure, and has excellent volatility and a high content of silicon atoms in the molecule, and thus, the composition for depositing a silicon-containing film comprising the compound can produce a high-quality silicon-containing film at a high deposition rate.

Preferably, in the chemical formula 1 of the present invention, Ra and Rb may each independently be hydrogen, (C1-C5) alkyl or (C2-C5) alkenyl, provided that Ra and Rb are not simultaneously hydrogen; r1 to R3 may be hydrogen; r4 to R9 may each independently be hydrogen, (C1-C5) alkyl or (C1-C5) alkenyl, more preferably Ra and Rb are each independently hydrogen or (C1-C5) alkyl, provided that Ra and Rb are not both hydrogen at the same time; r1 to R3 may be hydrogen; r4 to R9 may each independently be hydrogen, (C1-C5) alkyl, or (C1-C5) alkenyl.

More preferably, the chemical formula 1 of the present invention may be represented by the following chemical formula 2:

[ chemical formula 2]

(in the chemical formula 2, R is a (C1-C7) alkyl group, and R11 to R14 are each independently hydrogen, (C1-C7) alkyl group, or (C2-C7) alkenyl group.)

The disilanamide compound represented by the above chemical formula 2 is a silicon precursor contained in the composition for depositing a silicon-containing thin film of the present invention, which has an unshared pair of nitrogen atom electrons additionally provided to silicon atoms in the molecule so that the binding energy of silicon and nitrogen atoms is increased, has the form of a triangular plane Si3N molecular structure in which three silicon atoms are bonded to nitrogen atoms, and also has the form of a Si2 molecular structure having electron sensitivity by having two silicon atoms, which includes three hydrogens with cationic properties bound thereto to lower the activation energy to have better reactivity, and thus, the silicon-containing thin film can be easily deposited at a high deposition rate.

In addition, thermal stability is excellent, and therefore, a thin film having high durability and excellent purity can be manufactured.

More preferably, in the chemical formula 2, R11 to R14 may be each independently hydrogen or (C1-C5) alkyl, more preferably, R is (C1-C3) alkyl, and R11 to R14 may be each independently hydrogen, (C1-C3) alkyl, or (C2-C3) alkenyl, from the viewpoint of manufacturing a better silicon-containing film.

Chemical formula 1 according to an embodiment of the present invention may be represented by the following chemical formula 1-1 or 1-2:

[ chemical formula 1-1]

[ chemical formulas 1-2]

(in the chemical formulas 1-1 and 1-2,

Ra and Rb are each independently (C1-C7) alkyl; r21 and R22 are each independently hydrogen, (C1-C7) alkyl, or (C2-C7) alkenyl. )

Specifically, the disilazane-based amine compound of chemical formula 1 according to the present invention may be selected from the following compounds, but is not limited thereto:

In addition, the present invention provides the compound of the above chemical formula 1 included in the composition for depositing a silicon-containing thin film of the present invention.

Preferably, in the chemical formula 1 of the present invention, Ra and Rb may each independently be hydrogen or (C1-C7) alkyl, provided that Ra and Rb are not simultaneously hydrogen; r1 to R3 may be hydrogen; r4 to R9 may each independently be hydrogen, (C1-C5) alkyl, or (C1-C5) alkenyl, and more preferably, formula 1 may be represented by the above formula 2.

Preferably, in the chemical formula 2 according to an embodiment of the present invention, R11 to R14 may each independently be hydrogen or (C1-C5) alkyl.

The disilazane compound of chemical formula 1 according to an embodiment of the present invention may be selected from the following compounds, but is not limited thereto.

further, as a method of preparing the compound of chemical formula 1 according to an embodiment of the present invention, any method is possible as long as it is within the recognition scope of those skilled in the art, however, as a specific example, the method includes:

reacting a compound of the following chemical formula 3 with a compound of the following chemical formula 4 in the presence of a base to prepare a compound of chemical formula 5; and

reducing a compound of the following chemical formula 5 in the presence of a reducing agent to prepare a disilanylamine compound of the following chemical formula 1, thereby enabling preparation of the disilanylamine compound of the following chemical formula 1:

[ chemical formula 1]

[ chemical formula 3]

[ chemical formula 4]

[ chemical formula 5]

(in chemical formula 1 and chemical formulae 3 to 5, Ra, Rb, and R1 to R9 are each independently hydrogen, (C1-C7) alkyl, or (C2-C7) alkenyl, provided that Ra and Rb are not simultaneously hydrogen; and

X1 to X4 are each independently halogen. )

as the base of one embodiment of the method for preparing the disilazane compound according to the present invention, any base is possible as long as it is within the scope of the knowledge of those skilled in the art to which the present invention pertains, however, the base may preferably be tri (C1-C5) alkylamine or pyridine, particularly trimethylamine, triethylamine, pyridine, etc., and the molar ratio of the base to the compound of said chemical formula 4 may be in the range of 1:1 to 1:2, 1:1 to 1:1.5, to rapidly complete the reaction, and more preferably 1: 1.25.

The reducing agent according to an embodiment of the method for preparing a disilazane compound according to the present invention is not limited, but may be preferably LiAlH4, NaBH4, or MH (where M is an alkali metal), and the alkali metal may be Li, Na, or K.

The reducing agent of the present invention may be used in a molar ratio of 1:1.25 to 1:6, preferably 1:1.25 to 1:5.5, to the compound of chemical formula 5, and the compound of chemical formula 3 may be used in a ratio of 1 to 2 moles with respect to 1 mole of the compound of chemical formula 2.

As the solvent used in the preparation method of the present invention, any commonly used organic solvent may be used, but it is preferable to use one or more selected from the group consisting of hexane, pentane, Dichloromethane (DCM), Dichloroethane (DCE), Toluene (tolumen), acetonitrile (MeCN), Nitromethane (Nitromethane), Tetrahydrofuran (THF), N-Dimethylformamide (DMF), tetraethylene glycol dimethylethane and N, N-Dimethylacetamide (DMA), polyethers (Diglyme), Triglyme and/or Tetraglyme).

The reaction temperature may be a temperature used in conventional organic synthesis, but varies depending on the amounts of the reaction substance and the starting material, and the reaction is completed after confirming complete consumption of the starting material by NMR or the like. When the reaction is completed, the solvent is distilled under reduced pressure after the extraction process, and then the desired substance can be isolated and purified by a typical method such as column chromatography.

in addition, the present invention provides a composition for depositing a silicon-containing film, the composition comprising the disilazane-based amine compound of the present invention.

the composition for depositing a silicon-containing thin film of the present invention must include the disilazane compound represented by said chemical formula 1 as a precursor, but may include one or more disilazane compounds, and the content of the disilazane compound in the composition for depositing a silicon-containing thin film may be within the recognition range of those skilled in the art, considering the film-forming conditions or thickness, properties, etc. of the thin film.

In addition, the present invention provides a method of manufacturing a silicon-containing film using the composition for depositing a silicon-containing film of the present invention.

according to the method of manufacturing a silicon-containing film of one embodiment of the present invention, a film is prepared using the composition for depositing a silicon-containing film of the present invention, which includes the disilazane compound represented by the above chemical formula 1 as a precursor, which is liquid at normal temperature, has high volatility and excellent thermal stability, so that the precursor can be easily processed, various films can be manufactured, and a high purity film having a high silicon content, which has a high deposition rate and excellent step coverage, is manufactured.

as a method of manufacturing the silicon-containing thin film of the present invention, any method is possible as long as it is within the scope of recognition by those skilled in the art, however, it may be preferably performed by Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Metal Organic Chemical Vapor Deposition (MOCVD), Low Pressure Chemical Vapor Deposition (LPCVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), or Plasma Enhanced Atomic Layer Deposition (PEALD), more preferably Plasma Enhanced Atomic Layer Deposition (PEALD), or Plasma Enhanced Chemical Vapor Deposition (PECVD).

The method for manufacturing a silicon-containing film of the present invention may specifically include the steps of:

a) Maintaining a temperature of a substrate installed in the chamber at 30 to 400 ℃;

b) injecting a carrier gas and a composition for depositing a silicon-containing film according to an embodiment of the present invention; and

c) And injecting a reaction gas to deposit a silicon-containing film on the substrate.

Preferably, when the silicon-containing thin film is deposited by Plasma Enhanced Atomic Layer Deposition (PEALD) or Plasma Enhanced Chemical Vapor Deposition (PECVD) according to an embodiment of the present invention, a step of generating plasma may be further included after the step a), and

b) The composition for depositing the silicon-containing film of step (a) may be injected together with a carrier gas.

In the method of manufacturing a silicon-containing film according to an embodiment of the present invention, deposition conditions may be adjusted according to the structure or thermal properties of a desired film. As the deposition conditions according to an embodiment of the present invention, input flow rates of a composition for depositing a silicon-containing thin film containing a disilazane compound, input flow rates of a reaction gas and a carrier gas, pressure, RF power, substrate temperature, and the like are exemplified, and as non-limiting examples of the deposition conditions, the conditions may be adjusted as follows: the composition for depositing the silicon-containing film has an input flow rate of 10 to 1000cc/min, a carrier gas flow rate of 10 to 1000cc/min, a reaction gas flow rate of 1 to 1000cc/min, a pressure of 0.5 to 10 torr, an RF power of 200 to 1000W, and a substrate temperature of 30 to 400 c, but is not limited thereto.

the method of manufacturing a silicon-containing film of the present invention may use a composition for depositing a silicon-containing film comprising a disilazane compound according to an embodiment of the present invention as a precursor to form a film at a low substrate temperature of 30 to 200 c, or even at a low temperature of 30 to 100 c, which is very economical and very advantageous for commercial applications.

The reaction gas used in the method for manufacturing the silicon-containing film of the present invention is not limited, however, may be one or two or more selected from the group consisting of: oxygen (O2), ozone (O3), distilled water (H2O), hydrogen peroxide (H2O2), Nitric Oxide (NO), nitrous oxide (N2O), nitrogen dioxide (NO2), ammonia (NH3), nitrogen (N2), hydrazine (N2H4), amines, diamines, carbon monoxide (CO), carbon dioxide (CO2), C1-C12 saturated or unsaturated hydrocarbons, hydrogen, argon and helium, and the carrier gas may be one or two or more selected from argon, helium and nitrogen.

The substrate used in the method of manufacturing a silicon-containing thin film according to an embodiment of the present invention may be a substrate including one or more semiconductor materials of Si, Ge, SiGe, GaP, GaAs, SiC, SiGeC, InAs, and InP; an SOI (silicon on insulator) substrate; a quartz substrate; or a glass substrate for a display; flexible plastic substrates of polyimide, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polymethyl methacrylate (PMMA), Polycarbonate (PC), Polyethersulfone (PES), and polyester; but is not limited thereto.

The silicon-containing film may be directly formed on the substrate, but in addition, a plurality of conductive layers, dielectric layers, insulating layers, and the like may be formed between the substrate and the silicon-containing film.

Hereinafter, the present invention will be described in detail by the following examples. Before this, the terms and words used in the present specification and claims should not be construed as general or dictionary meanings, but should be understood as meanings and concepts satisfying the technical idea of the present invention, based on the principle that the inventors can appropriately define the concepts of the terms to describe their own invention in the best way.

Therefore, the embodiment described herein and the configuration shown in the drawings are only the most preferable embodiment of the present invention and do not represent all technical ideas of the present invention, and therefore, it should be understood that there are examples of various equivalents and modifications that may be substituted for them at the time of filing this application.

In addition, all the following examples were performed by known Plasma Enhanced Atomic Layer Deposition (PEALD) using a 200mm single wafer type (ALD) apparatus (CN1, Atomic Premium) in a commonly used shower head mode. In addition, it can be performed in a commonly used shower head mode by using a 200mm single wafer type (single wafer type) CVD apparatus (CN1, Atomic Premium) by known Plasma Enhanced Chemical Vapor Deposition (PECVD).

The thickness of the deposited silicon-containing film was measured by an Ellipsometer (Ellipsometer, M2000D, Woollam) and Transmission Electron Microscope (Transmission Electron Microscope), and the composition thereof was analyzed using Infrared Spectroscopy (Infrared Spectroscopy, IFS66V/S & Hyperion 3000, Bruker Optiks), X-ray photoelectron Spectroscopy (X-ray photoelectron Spectroscopy) and Secondary Ion Mass Spectrometer (SIMS, Secondary Ion Mass Spectrometer).

EXAMPLE 1 preparation of Didimethylsilylmethylethylalkylamine

Step 1: preparation of Didimethylsilyltetrachloromethylsilalkylamines

to a 5L SUS reactor dried under an anhydrous atmosphere and an inert atmosphere, 2000g (8.05mol) of methyl pentafluorodisilane (Si2Cl5CH3) and 1500mL of N-pentane as an organic solvent were added, and 752.7g (8.05mol) of triethylamine ((CH3CH2)3N) was slowly added with stirring while maintaining the temperature at-20 ℃. After the addition was complete, 1073g (8.05mol) of tetramethyldisilazane ((((CH3)2) SiH)2NH were slowly added while maintaining the temperature at-20 ℃. The reaction solution after completion of the addition was slowly heated to normal temperature and stirred for 6 hours while keeping the temperature at 25 ℃. After completion of the reaction, the reaction mixture was filtered to remove a white solid produced by the filtration to obtain a filtrate, and the solvent was removed under reduced pressure to obtain 2501g (7.24mol) of bis-dimethylsilyl tetrachloromethylsilyl ethylamine (((CH3)2) SiH)2NSi (Cl)2SiCl2CH3) in a yield of 90%.

H NMR(in CDCl):δ0.14(d,12H,(((CH))SiH)NSi(Cl)SiClCH),δ4.60(m,2H, (((CH))SiH)NSi(Cl)SiClCH),δ0.19(s,3H(((CH))Si H)NSi(Cl)SiClCH)

Step 2: preparation of Didimethylsilylmethylethylalkylamines

to a 20L SUS reactor dried under an anhydrous atmosphere and an inert atmosphere, 2000ml of tetraethylene glycol dimethyl ether (TEGDME) as an organic solvent was added, and 379g (9.99mol) of lithium aluminum hydride (LiAlH4) was slowly added with stirring while maintaining the temperature at-10 ℃. After the addition was complete, 2501g (7.24mol) of bis-dimethylsilyltetrachloromethylsilalkylamine ((((CH3)2 SiH)2NSi (Cl)2SiCl2CH3) were slowly added thereto while maintaining the temperature at-10 ℃. After the addition was complete, the reaction solution was stirred for 20 hours while maintaining the temperature at-10 ℃. After completion of the reaction, the reaction mixture was filtered to remove a white solid produced by the filtration to obtain a filtrate, and the solvent was removed under reduced pressure to conduct vacuum distillation to obtain 752g (3.62mol) of bisdimethylsilylmethylethylalkylamine (((CH3)2) SiH)2NSi (H)2SiH2CH3) in 50% yield.

H NMR(in CDCl):δ0.14(d,12H,(((CH))SiH)NSi(H)SiHCH),δ4.76(m,2H, (((CH))SiH)NSi(H)SiHCH),δ4.60(m,2H(((CH))SiH)NSi(H)SiHCH),δ3.80(m,2H (((CH))SiH)NSi(H)SiH₂ CH),δ0.26(m,3H(((CH))SiH)NSi(H)SiHCH₃ )

a graph of the vapor pressure measurements of the bis-dimethylsilylmethylethylalkylamine prepared in example 1 is shown in fig. 1. It can be seen from fig. 1 that a film can be easily deposited using the composition for depositing a silicon-containing film containing the disilazane compound according to the present invention.