阅读说明：本技术 一种电场驱动熔融喷射沉积微结构的控制方法 (Control method for electric field driven fused jet deposition microstructure ) 是由 张礼兵 吴婷 汤成莉 宋海军 黄风立 邢博 左春柽 于 2021-08-05 设计创作，主要内容包括：本发明公开了一种电场驱动熔融喷射沉积微结构的控制方法,其包括以下步骤：1)初始化控制系统,2)确定误差,3)计算误差的变化因子,4)计算误差变量的量化因子,5)确定误差变化量化因子、控制输入信号的比例因子、控制输入增量信号的比例因子,6)确定比例增益、积分增益和微分增益的自适应变化量,7)确定多物理场工艺参数控制量,8)对工艺参数进行调整,并进行电场驱动熔融喷射沉积微结构的成型,实时检测微结构宽度,根据实时检测的微结构宽度变化,采用非线性自适应误差补偿控制方法,实时调控电场驱动熔融喷射沉积微结构的多物理场耦合参数,确保宽度的一致性,从而提高电场驱动熔融喷射沉积微结构的成型质量。(The invention discloses a control method of an electric field driven fused jet deposition microstructure, which comprises the following steps: 1) initializing the control system, 2) determining errors, 3) calculating variation factors of the errors, 4) calculating quantization factors of error variables, 5) determining error variation quantization factors, control input signal scale factors and control input increment signal scale factors, 6) determining adaptive variation of proportional gain, integral gain and differential gain, 7) determining multi-physical field process parameter control variables, 8) adjusting process parameters, and the electric field drives the formation of the melting jet deposition microstructure, the width of the microstructure is detected in real time, according to the width change of the microstructure detected in real time, a nonlinear adaptive error compensation control method is adopted to regulate and control the multi-physical field coupling parameters of the electric field driven fused jet deposition microstructure in real time, so that the consistency of the width is ensured, and the forming quality of the electric field driven fused jet deposition microstructure is improved.)

1. A control method for an electric field driven fused jet deposition microstructure is characterized in that: which comprises the following steps:

1) initializing and setting control system parameters;

2) determining the error between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by an industrial camera;

3) determining a variation factor of an error between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera;

4) calculating a quantitative factor of an error variable between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera;

5) determining an error change quantization factor between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera, a scale factor of a control input signal and a scale factor of a control input increment signal;

6) determining adaptive variation of proportional gain, integral gain and differential gain of a control system;

7) determining the multi-physical-field process parameter control quantity of the electric field driven fused jet deposition microstructure;

8) sending the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure to a controller of the electric-field-driven fused jet deposition microstructure, adjusting the process parameters by the controller according to the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure, and forming the electric-field-driven fused jet deposition microstructure;

9) and (3) judging whether the electric field driven fused jet deposition microstructure is finished or not, if the jet deposition is finished, finishing the jet deposition microstructure, otherwise, jumping to the step 2), and continuously and circularly carrying out the electric field driven fused jet deposition microstructure.

2. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 1), initializing initial values of proportional gain, integral gain and differential gain of a control system.

3. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 2), calculating an error between the expected width of the microstructure, which is driven by the electric field to perform melt jet deposition, and the actual width of the microstructure, which is detected by the industrial camera, according to the width of the microstructure, which is expected to be deposited, and the actual width of the microstructure, which is detected by the industrial camera: a (k) ═ r_y(k)-r_s(k) And a (k) is the error between the expected width of the microstructure of the electric field driven fused jet deposition at the k-th moment and the width of the microstructure actually detected by an industrial camera, r_y(k) Expected microstructure width, r, for electric field driven fused jet deposition at time k_s(k) The microstructure width actually detected by the industrial camera at the k-th moment.

4. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 3), calculating a variation factor of an error between the expected width of the microstructure, which is driven by the electric field to be fused and sprayed to deposit, and the actual width of the microstructure, which is detected by the industrial camera, according to the initial domain maximum value of the fuzzy variable of the error between the expected width of the microstructure, which is driven by the electric field to be fused and sprayed to deposit, and the actual width of the microstructure, which is detected by the industrial camera, as follows:b (k) is a variation factor of the error between the expected width of the microstructure of the electric field driven fused jet deposition at the k moment and the width of the microstructure actually detected by the industrial camera, A (k) is an error fuzzy variable between the expected width of the microstructure of the electric field driven fused jet deposition at the k moment and the width of the microstructure actually detected by the industrial camera, A_maxInitial domain maximum of error ambiguity variable between expected microstructure width for electric field driven meltblown deposition and microstructure width actually detected by industrial cameraC is a control coefficient satisfying c>0。

5. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in the step 4), according to the variation factor of the error between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera, the quantization factor of the error variable between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera is calculatedm_a(k) A quantification factor for the variation of the error between the expected microstructure width of the E-field driven meltblown deposition at the k-th instant and the microstructure width actually detected by the industrial camera, a_maxThe initial domain maximum of error between the expected microstructure width of the electric field driven meltblown deposition at time k and the microstructure width actually detected by the industrial camera.

6. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 5), according to the quantization factor of the error variable between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, the quantization factor of the error change between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, the scale factor of the control input signal and the scale factor of the control input increment signal are determinedm_Δa(k) The quantitative factor of the error change between the expected microstructure width of the electric field driven fused jet deposition at the kth moment and the microstructure width actually detected by an industrial camera is rho, which is an adjusting factor of a control system and meets rho epsilon (0,1),K_Psto control the initial value of the system proportional gain, K_IsTo control the initial value of the differential gain of the system, K_DsTo control the initial value of the differential gain of the system, m_u(k) Controlling the scale factor, m, of the input signal for the k-th instant_Δu(k) To control the scale factor of the input incremental signal.

7. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 6), determining adaptive variation quantity of proportional gain, integral gain and differential gain of a control system according to an error variation quantization factor between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera, a scale factor of a control input signal and a scale factor of a control input increment signal

K_P(k) For controlling the proportional gain of the system at the kth moment, K_I(k) For controlling the integral gain of the system at the kth moment, K_D(k) The differential gain of the system is controlled for time k.

8. The method of claim 1, wherein the step of controlling the electric field driven meltblown deposition microstructure comprises: in step 7), determining the control quantity of the multi-physical-field process parameters of the electric-field-driven fused jet deposition microstructure according to the adaptive variation quantity of the proportional gain, the integral gain and the differential gain of the control systemu (k) is the control quantity of the multi-physical field process parameters of the electric field driven fused jet deposition microstructure at the k time, and delta a (k) is the error between the expected microstructure width of the electric field driven fused jet deposition at the k time and the microstructure width actually detected by an industrial camera, and the requirement that delta a (k) is a (k) -a (k-1), and a (k-1) is the expected microstructure of the electric field driven fused jet deposition at the k-1 timeThe width is different from the width of the microstructure actually detected by the industrial camera.

Technical Field

The invention belongs to the technical field of electrohydrodynamic jet printing, and particularly relates to a control method of an electric field driven fused jet deposition microstructure.

Background

The fused jet deposition technique is a typical additive manufacturing technique, and is to heat a material such as solid particles or powder placed in a spray chamber to a molten state, to deposit a molten liquid jet on a substrate by pressing a spray head, and to cool and solidify the molten liquid in a very short time. The technology is suitable for forming polymers, biological materials, metal materials, composite materials and other materials, and is mainly used in the fields of biological medical treatment, tissue engineering, mechanical manufacturing and the like. Conventional meltblown deposition techniques use extrusion for structural formation and are difficult to use for spray deposited microstructures due to limited resolution.

In order to improve the resolution of the fused jet deposition technology and expand the application of the fused jet deposition technology in the aspect of microstructure forming, an electric field driven fused jet deposition technology is provided, wherein the working principle is as follows: the nozzle is connected with the positive pole of the high-voltage power supply, the substrate is connected with the negative pole of the high-voltage power supply, the molten liquid to be sprayed is driven by the electric field force to form jet flow, and the platform moves according to a preset path to form a corresponding microstructure. The technology has wide application prospect in the fields of biological medical treatment, tissue engineering, energy, optics, new materials, microelectronic manufacturing, micro-electro-mechanical systems, micro-nano sensors, biochips, flexible electronics and the like. The electric field driven fusion jet deposition technology relates to the multi-physical field multi-parameter coupling effect of a thermal field, a flow field, an electric field, a velocity field and the like, wherein any one parameter causes the change of the jet flow form of the fusion jet due to the influence of factors such as external conditions or interference and the like, thereby influencing the quality of a deposition microstructure. However, the existing electric field driven fused jet deposition microstructure process is an open loop control mode, so that the quality of the electric field driven fused jet deposition microstructure is difficult to ensure.

Disclosure of Invention

Aiming at the defects in the prior art, the invention aims to provide a control method of an electric field driven fused jet deposition microstructure.

In order to achieve the above object, the present invention provides a method for controlling an electric field driven molten jet deposition microstructure, comprising the steps of:

1) initializing and setting control system parameters;

2) determining the error between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by an industrial camera;

3) determining a variation factor of an error between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera;

4) calculating a quantitative factor of an error variable between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera;

5) determining an error change quantization factor between an expected microstructure width of the electric field driven fused jet deposition and a microstructure width actually detected by an industrial camera, a scale factor of a control input signal and a scale factor of a control input increment signal;

6) determining adaptive variation of proportional gain, integral gain and differential gain of a control system;

7) determining the multi-physical-field process parameter control quantity of the electric field driven fused jet deposition microstructure;

8) sending the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure to a controller of the electric-field-driven fused jet deposition microstructure, adjusting the process parameters by the controller according to the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure, and forming the electric-field-driven fused jet deposition microstructure;

9) and (3) judging whether the electric field driven fused jet deposition microstructure is finished or not, if the jet deposition is finished, finishing the jet deposition microstructure, otherwise, jumping to the step 2), and continuously and circularly carrying out the electric field driven fused jet deposition microstructure.

In step 1), initializing initial values of proportional gain, integral gain and differential gain of a control system.

In step 2), calculating an error between the expected width of the microstructure, which is driven by the electric field to perform melt jet deposition, and the actual width of the microstructure, which is detected by the industrial camera, according to the width of the microstructure, which is expected to be deposited, and the actual width of the microstructure, which is detected by the industrial camera: a (k) ═ r_y(k)-r_s(k) And a (k) is the error between the expected width of the microstructure of the electric field driven fused jet deposition at the k-th moment and the width of the microstructure actually detected by an industrial camera, r_y(k) Expected microstructure width, r, for electric field driven fused jet deposition at time k_s(k) The microstructure width actually detected by the industrial camera at the k-th moment.

In step 3), calculating a variation factor of an error between the expected width of the microstructure, which is driven by the electric field to be fused and sprayed to deposit, and the actual width of the microstructure, which is detected by the industrial camera, according to the initial domain maximum value of the fuzzy variable of the error between the expected width of the microstructure, which is driven by the electric field to be fused and sprayed to deposit, and the actual width of the microstructure, which is detected by the industrial camera, as follows:b (k) is a variation factor of the error between the expected width of the microstructure of the electric field driven fused jet deposition at the k moment and the width of the microstructure actually detected by the industrial camera, A (k) is an error fuzzy variable between the expected width of the microstructure of the electric field driven fused jet deposition at the k moment and the width of the microstructure actually detected by the industrial camera, A_maxThe maximum value of the initial domain of the error fuzzy variable between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by an industrial camera, c is a control coefficient, and c satisfies the requirement>0。

In step 4), calculating the variation factor of the error between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial cameraQuantification factor of error variation between expected microstructure width and actual detected microstructure width of industrial cameram_a(k) A quantification factor for the variation of the error between the expected microstructure width of the E-field driven meltblown deposition at the k-th instant and the microstructure width actually detected by the industrial camera, a_maxThe initial domain maximum of error between the expected microstructure width of the electric field driven meltblown deposition at time k and the microstructure width actually detected by the industrial camera.

In step 5), according to the quantization factor of the error variable between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera, determining the quantization factor of the error change between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera, the scale factor of the control input signal and the scale factor of the control input increment signal as

m_Δa(k) The quantitative factor of the error change between the expected microstructure width of the electric field driven fused jet deposition at the kth moment and the microstructure width actually detected by an industrial camera is rho, which is an adjusting factor of a control system and meets rho epsilon (0,1),K_Psto control the initial value of the system proportional gain, K_IsTo control the initial value of the differential gain of the system, K_DsTo control the initial value of the differential gain of the system, m_u(k) Controlling the scale factor, m, of the input signal for the k-th instant_Δu(k) To control the scale factor of the input incremental signal.

In step 6), determining the adaptive variation of the proportional gain, integral gain and differential gain of the control system as

K_P(k) For controlling the proportional gain of the system at the kth moment, K_I(k) For controlling the integral gain of the system at the kth moment, K_D(k) Controlling the differential gain of the system for the kth time;

in step 7), determining the control quantity of the multi-physical-field process parameters of the electric-field-driven fused jet deposition microstructure according to the adaptive variation quantity of the proportional gain, the integral gain and the differential gain of the control systemu (k) is a multi-physical-field process parameter control quantity of the electric field driven fused jet deposition microstructure at the k time, and Δ a (k) is an error between an expected microstructure width of the electric field driven fused jet deposition at the k time and a microstructure width actually detected by an industrial camera, wherein Δ a (k) is a (k) -a (k-1), and a (k-1) is an error between the expected microstructure width of the electric field driven fused jet deposition at the k-1 time and the microstructure width actually detected by the industrial camera.

The invention has the beneficial effects that: the width of the microstructure is detected in real time through an industrial camera, and according to the change of the width of the microstructure detected in real time, the control system adopts a nonlinear adaptive error compensation control method to regulate and control the multi-physical field coupling parameters of the electric field driven fused jet deposition microstructure in real time, so that the consistency of the width of the electric field driven fused jet deposition microstructure is ensured, and the forming quality of the electric field driven fused jet deposition microstructure is improved.

Drawings

FIG. 1 is a flow chart of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

It should be noted that all the directional indicators (such as up, down, left, right, front, and rear … …) in the embodiment of the present invention are only used to explain the relative position relationship between the components, the movement situation, etc. in a specific posture (as shown in the drawing), and if the specific posture is changed, the directional indicator is changed accordingly.

In order to improve the forming quality of the electric field driven fused jet deposition microstructure, the width of the microstructure is detected in real time by an industrial camera, according to the change of the width of the microstructure detected in real time, a control system adopts a nonlinear adaptive error compensation control method to regulate and control the multi-physical field coupling parameters of the electric field driven fused jet deposition microstructure in real time and effectively control the width consistency of the electric field driven fused jet deposition microstructure, thereby realizing the high-quality fused jet deposition microstructure of an electric field driven fused jet deposition microstructure controller, which comprises the following specific implementation steps:

(1) and initializing and setting control system parameters. Initializing initial values of proportional gain, integral gain and differential gain of the control system.

(2) An error between an expected microstructure width of the electric field driven meltblown deposition and a microstructure width actually detected by an industrial camera is determined. Calculating the error between the expected width of the microstructure of the electric field driven fused jet deposition and the actual width of the microstructure detected by the industrial camera according to the width of the microstructure expected to be deposited and the actual width of the microstructure detected by the industrial camera as follows:

a(k)＝r_y(k)-r_s(k) (1)

wherein a (k) is the error between the expected microstructure width of the electric field driven molten jet deposition at the k-th time and the microstructure width actually detected by the industrial camera, r_y(k) Expected microstructure width, r, for electric field driven fused jet deposition at time k_s(k) The microstructure width actually detected by the industrial camera at the k-th moment.

(3) Determining a variation factor for the error between the expected microstructure width of the electric field driven meltblown deposition and the microstructure width actually detected by the industrial camera. According to the initial domain maximum value of an error fuzzy variable between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, calculating a change factor of the error between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera as follows:

wherein b (k) is a variation factor of an error between an expected microstructure width of the electric field driven molten jet deposition at the k moment and a microstructure width actually detected by an industrial camera, A (k) is an error fuzzy variable between the expected microstructure width of the electric field driven molten jet deposition at the k moment and the microstructure width actually detected by the industrial camera, A_maxThe maximum value of the initial domain of the error fuzzy variable between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by an industrial camera, c is a control coefficient, and c satisfies the requirement>0。

(4) A quantitative factor for the variation in error between the expected microstructure width of the electric field driven meltblown deposition and the microstructure width actually detected by the industrial camera is calculated. According to the variation factor of the error between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera, the quantization factor of the error variable between the expected width of the microstructure of the electric field driven fused jet deposition and the width of the microstructure actually detected by the industrial camera is calculated as

In the formula, m_a(k) A quantification factor for the variation of the error between the expected microstructure width of the E-field driven meltblown deposition at the k-th instant and the microstructure width actually detected by the industrial camera, a_maxIs the electricity at the k timeInitial domain maximum of error between the expected microstructure width of the field-driven meltblown deposition and the microstructure width actually detected by the industrial camera.

(5) And determining an error change quantization factor between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, a scale factor of a control input signal and a scale factor of a control input increment signal. According to the quantization factor of the error variable between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, the quantization factor of the error change between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by the industrial camera, the scale factor of the control input signal and the scale factor of the control input increment signal are calculated as follows:

in the formula, m_Δa(k) The quantitative factor of the error change between the expected microstructure width of the electric field driven fused jet deposition at the kth moment and the microstructure width actually detected by an industrial camera is rho, which is an adjusting factor of a control system and meets rho epsilon (0,1),K_Psto control the initial value of the system proportional gain, K_IsTo control the initial value of the differential gain of the system, K_DsTo control the initial value of the differential gain of the system, m_u(k) Controlling the scale factor, m, of the input signal for the k-th instant_Δu(k) To control the scale factor of the input incremental signal.

(6) Adaptive variations of the proportional gain, the integral gain, and the derivative gain of the control system are determined. According to an error change quantization factor between the expected microstructure width of the electric field driven fused jet deposition and the microstructure width actually detected by an industrial camera, a scale factor of a control input signal and a scale factor of a control input increment signal, calculating the self-adaptive variable quantity of the proportional gain, the integral gain and the differential gain of a control system as follows:

in the formula, K_P(k) For controlling the proportional gain of the system at the kth moment, K_I(k) For controlling the integral gain of the system at the kth moment, K_D(k) The differential gain of the system is controlled for time k.

(7) And determining the multi-physical-field process parameter control quantity of the electric field driven fused jet deposition microstructure. According to the adaptive variable quantity of the proportional gain, the integral gain and the differential gain of the control system, the multi-physical-field process parameter control quantity of the electric field driven fused jet deposition microstructure is calculated as follows:

wherein u (k) is the control quantity of the multiple physical field process parameters of the electric field driven molten jet deposition microstructure at the k time, and Δ a (k) is the error between the expected microstructure width of the electric field driven molten jet deposition at the k time and the microstructure width actually detected by the industrial camera, and satisfies the condition that Δ a (k) is a (k) -a (k-1), and a (k-1) is the error between the expected microstructure width of the electric field driven molten jet deposition at the k-1 time and the microstructure width actually detected by the industrial camera.

(8) And sending the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure to a controller of the electric-field-driven fused jet deposition microstructure, adjusting the process parameters by the controller according to the multi-physical-field process parameter control quantity of the electric-field-driven fused jet deposition microstructure, and forming the electric-field-driven fused jet deposition microstructure.

(9) And (3) judging whether the electric field driven fused jet deposition microstructure is finished or not, if the jet deposition is finished, finishing the jet deposition microstructure, otherwise, jumping to the step (2), and continuously and circularly carrying out the electric field driven fused jet deposition microstructure.

The examples should not be construed as limiting the present invention, but any modifications made based on the spirit of the present invention should be within the scope of protection of the present invention.