阅读说明：本技术 用于对准光学元件的致动器装置和方法、光学组装件和投射曝光设备 (Actuator device and method for aligning an optical element, optical assembly and projection exposure apparatus ) 是由 B.普尼尼 于 2020-01-24 设计创作，主要内容包括：本发明涉及一种用于对准投射曝光设备(100、200、400)的光学元件(2)的致动器装置(3),致动器装置(3)包括轴(9),轴(9)的第一端部分(9.1)通过接合件(10)在载体结构(5)的基点(11)可偏转地悬置且其第二端部分(9.2)固定到光学元件(2)。提供至少一个致动器单元(7),其具有固定到轴(9)的平移器(12)和出于达到向轴(9)施加偏转力(F-(A))的目的而机械连接到载体结构(5)的定子(13)以便使轴(9)从中间位置(M)径向偏转。另外,提供补偿装置(16),其配置成独立于偏转力(F-(A))向轴(9)施加补偿力(F-(K)),补偿力(F-(k))取决于轴(9)从中间位置(M)的偏转而增加,补偿力抵消由光学元件(2)的重量(F-(G))引起的、在中间位置(M)的方向上作用在轴(9)上的恢复力(F-(R))。(The invention relates to an actuator device (3) for aligning an optical element (2) of a projection exposure apparatus (100, 200, 400), the actuator device (3) comprising a shaft (9), a first end portion (9.1) of the shaft (9) being deflectably suspended at a base point (11) of a carrier structure (5) by means of a joint (10) and a second end portion (9.2) thereof being fixed to the optical element (2). At least one actuator unit (7) is provided, having a translator (12) fixed to the shaft (9) and a drive shaftTo achieve the application of a deflecting force (F) to the shaft (9) A ) Is mechanically connected to the stator (13) of the carrier structure (5) in order to radially deflect the shaft (9) from the intermediate position (M). In addition, a compensation device (16) is provided, which is configured to be independent of the deflection force (F) A ) Applying a compensating force (F) to the shaft (9) K ) Compensating force (F) k ) The compensation force is increased depending on the deflection of the shaft (9) from the middle position (M) and is counteracted by the weight (F) of the optical element (2) G ) Induced restoring force (F) acting on the shaft (9) in the direction of the intermediate position (M) R )。)

1. An actuator device (3) for aligning an optical element (2) of a projection exposure apparatus (100, 200, 400), the actuator device (3) having a shaft (9) and at least one actuator unit (7), a first end portion (9.1) (11) of the shaft (9) being suspended pivotably from a base point of a support structure (5) by means of a joint (10) and a second end portion (9.2) thereof being fixed to the optical element (2), and the at least one actuator unit (7) having a base point fixed to the shaft (9)A translator (12) and a stator (13) mechanically connected to the support structure (5) so as to apply a deflecting force (F) to the shaft (9)_A) In order to radially deflect said shaft (9) from a neutral position (M), characterized in that compensation means (16) are provided, arranged independently of said deflection force (F)_A) Applying a compensating force (F) to the shaft (9)_K) Said compensation force (F)_k) Increasing and offsetting the weight (F) of the optical element (2) according to the deflection of the shaft (9) from the intermediate position (M)_G) Induced restoring force (F) acting on the shaft (9) in the direction of the intermediate position (M)_R)。

2. Actuator device (3) according to claim 1, characterized in that a weight compensation device (8) is provided, that the shaft (9) is designed as a translator of the weight compensation device (8) or connected to the weight compensation device (8), and that the weight compensation device (8) is arranged to at least partially compensate the weight (F) of the optical element (2)_G)。

3. Actuator device (3) according to claim 1 or 2, wherein the engagement member is designed as a flexure by means of which the first end portion (9.1) is deflectably suspended from a base point (11) of the support structure (5).

4. Actuator device (3) according to any one of claims 1 to 3, characterized in that the at least one actuator unit (7) is fixed by its translator (12) in the area (9) of the second end portion (9.2) of the shaft.

5. Actuator device (3) according to any of claims 1 to 4, wherein two actuator units (7) are provided, their respective translators (12) being fixed on opposite sides of the shaft (9).

6. Actuator device (3) according to any of claims 1 to 5, characterized in that the compensation device (16) hasMagnet arrangement for generating a compensating force (F)_K)。

7. Actuator device (3) according to claim 6, wherein the magnet arrangement has at least one ring magnet (17) extending around the shaft (9), in particular at least one radially magnetized ring magnet (17).

8. Actuator device (3) according to claim 6 or 7, characterized in that the magnet arrangement is designed and/or positioned such that the shaft (9) does not contact the magnet arrangement in the position in which it is deflected from the intermediate position to a maximum.

9. Actuator device (3) according to any of claims 1 to 8, characterized in that the compensation device (16) has a spring arrangement to generate the compensation force (F)_K)。

10. Actuator device (3) according to claim 9, characterized in that the spring arrangement has at least one tension spring (18), which tension spring (18) is fixed with a first end on the support structure (5) and with a second end on the shaft (9), and which tension spring (18) is stretched beyond its relaxed length when the shaft (9) is in the intermediate position (M).

11. Actuator device (3) according to claim 9 or 10, wherein the spring arrangement has at least one compression spring (19), preferably two compression springs (19), the at least one compression spring (19) being fixed with a first end on the support structure (5) and with a second end on the shaft (9), the compression spring (19) being compressed with respect to its relaxed length when the shaft (9) is in the intermediate position (M).

12. Actuator device (3) according to any of claims 1 to 11, characterized in that the compensation means (16) are arranged to pass the compensation force (F)_K) Partially or completely compensating or overcompensating the restoring force (F) acting on the shaft (9)_R)。

13. An optical assembly (1) of a projection exposure apparatus (100, 200, 400), comprising three actuator devices (3) according to any one of claims 1 to 12, the three actuator devices (3) being designed and aligned with one another in order to tilt a common optical element (2), preferably a mirror.

14. Projection exposure apparatus (100, 200, 400) for semiconductor lithography, having an illumination system (103, 401) with a radiation source (402) and an optical unit (107, 403) with at least one optical element (415, 416, 418, 419, 420, 108, 201) to be aligned, which at least one optical element (415, 416, 418, 419, 420, 108, 201) to be aligned can be aligned, mounted, adjusted, manipulated and/or deformed by at least one actuator device (3) according to one of claims 1 to 12.

15. Method for aligning an optical element (2) of a projection exposure apparatus (100, 200, 400), according to which at least one actuator unit (3) applies a deflection force (F) to a shaft (9) by means of a translator (12)_A) -a first end portion (9.1) of the shaft (9) is deflectably suspended from a base point (11) of the support structure (5) by means of a joint (10) and a second end portion (9.2) thereof is fixed to the optical element (2) in order to deflect the shaft (9) radially from a neutral position (M), characterized in that a compensating device (16) is used, which is independent of the deflection force (F)_A) Applying a compensating force (F) to the shaft (9)_k) Said compensation force (F)_k) Counteracting the weight (F) of the optical element (2)_G) Induced restoring force (F) acting on the shaft (9) in the direction of the intermediate position (M)_R) And increases according to the deflection of the shaft (9) from the intermediate position (M).