阅读说明：本技术 一种注入式等离子废气处理装置 (Injection type plasma waste gas treatment device ) 是由 潘国聪 潘泽峰 李伯福 于 2020-05-26 设计创作，主要内容包括：本发明公开了一种注入式等离子废气处理装置,涉及等离子/废气处理装置领域。本发明中：废气处理装置内分为中和反应腔、中间缓冲腔、隔断处理腔以及离子废气混合腔；废气处理装置内设置有内位隔离层板；废气处理装置的中和反应腔的底部设置有位于内位隔离层板外围的一段隔离板；一段隔离板上设置有自调节进气体；废气处理装置的下部设有气体隔断处理机构；隔断处理腔位于气体隔断处理机构内部；等离子真空注入管道的端侧位于废气处理装置的离子废气混合腔内。本发明使得废气的初步处理、反应物的析出以及气体的传导、处理更加高效,便于离子废气混合腔对预热后的气体进行高效分子改性,提升工业废气的最终处理效果。(The invention discloses an injection type plasma waste gas treatment device, and relates to the field of plasma/waste gas treatment devices. In the invention: the waste gas treatment device is internally divided into a neutralization reaction cavity, a middle buffer cavity, a partition treatment cavity and an ionic waste gas mixing cavity; an internal isolation laminate is arranged in the waste gas treatment device; the bottom of the neutralization reaction cavity of the waste gas treatment device is provided with a section of isolation plate positioned on the periphery of the inner isolation layer plate; a self-adjusting inlet gas is arranged on the first section of the isolation plate; the lower part of the waste gas treatment device is provided with a gas partition treatment mechanism; the partition processing cavity is positioned inside the gas partition processing mechanism; the end side of the plasma vacuum injection pipeline is positioned in an ion waste gas mixing cavity of the waste gas treatment device. The invention enables the primary treatment of the waste gas, the separation of reactants and the conduction and treatment of the gas to be more efficient, is convenient for the ion waste gas mixing cavity to carry out high-efficiency molecular modification on the preheated gas, and improves the final treatment effect of the industrial waste gas.)

1. An injection type plasma waste gas treatment device is characterized in that:

the plasma source device comprises a plasma generator (1), wherein one side of the plasma generator (1) is connected with a plasma vacuum injection pipeline (3) for directionally outputting plasma;

one end of the plasma vacuum injection pipeline (3) is connected with an exhaust gas treatment device (5);

the waste gas treatment device (5) is internally divided into a neutralization reaction cavity (6), a middle buffer cavity (7), a partition treatment cavity (15) and an ion waste gas mixing cavity (8);

an internal isolation layer plate (13) is arranged in the waste gas treatment device (5);

the bottom of the neutralization reaction cavity (6) of the waste gas treatment device (5) is provided with a section of isolation plate (11) positioned at the periphery of the inner isolation layer plate (13);

a self-adjusting gas inlet (12) is arranged on the first section of the isolation plate (11);

the intermediate buffer chamber (7) of the exhaust gas treatment device (5) is located below the self-regulating inlet gas (12);

the middle buffer cavity (7) of the waste gas treatment device (5) is positioned on the outer side of the inner isolation layer plate (13);

the ion waste gas mixing cavity (8) of the waste gas treatment device (5) is positioned on the inner side of the inner isolation layer plate (13);

comprises an exhaust gas injection pipeline (9) communicated with a neutralization reaction cavity (6) of an exhaust gas treatment device (5);

comprises a neutralization reaction gas injection pipeline (10) communicated with a neutralization reaction cavity (6) of the waste gas treatment device (5);

the self-adjusting gas inlet (12) is provided with an external gas inlet channel (16), a movable gas guide inner cavity (17) and an internal gas inlet channel (18);

a movably adjusted air guide piston (19) is arranged in the movable air guide inner cavity (17);

a gas partition treatment mechanism (14) is arranged at the lower part of the waste gas treatment device (5);

the separation processing cavity (15) is positioned inside the gas separation processing mechanism (14);

the upper part of the gas partition processing mechanism (14) is provided with a second gas inlet channel (25) communicated with the middle buffer cavity (7);

a second power device (27) is hermetically arranged on the gas isolating treatment mechanism (14);

the output end of the second power device (27) is connected with a second telescopic connecting rod (28);

a second end side piston (29) matched with the second air inlet channel (25) is installed at the end side of the second telescopic connecting rod (28);

the lower part of the gas partition processing mechanism (14) is provided with a second gas outlet channel (30) communicated with the ion waste gas mixing cavity (8);

a third power device (31) is hermetically arranged on the gas isolating treatment mechanism (14);

the output end of the third power device (31) is connected with a third telescopic connecting rod (32);

a third end side piston (34) matched with the second air outlet channel (30) is installed at the end side of the third telescopic connecting rod (32);

the end side of the plasma vacuum injection pipeline (3) is positioned in an ion waste gas mixing cavity (8) of the waste gas treatment device (5);

an air pressure sensing device (38) is arranged in an ion waste gas mixing cavity (8) of the waste gas treatment device (5);

and the waste gas treatment device (5) is connected with an exhaust pipeline (42) communicated with the ion waste gas mixing cavity (8).

2. An injection plasma exhaust treatment device according to claim 1, wherein:

the plasma vacuum injection pipeline (3) is provided with a vacuum directional injection device (4).

3. An injection plasma exhaust treatment device according to claim 1, wherein:

a primary heating device (39) for heating the waste gas and the neutralization reaction gas is arranged in the neutralization reaction cavity (6) of the waste gas treatment device (5);

a first temperature sensor (44) is arranged in a neutralization reaction cavity (6) of the waste gas treatment device (5).

4. An injection plasma exhaust treatment device according to claim 1, wherein:

a sealing ring (20) is arranged on the ring side surface of the air guide piston (19);

the bottom side surface of the air guide piston (19) is connected with a plurality of first movable guide rods (21) which movably penetrate through one side of the self-adjusting air inlet (12);

a first inner side baffle ring (22) positioned in the movable air guide inner cavity (17) is arranged on the first movable guide rod (21);

a first outer side baffle ring (23) is arranged on the outer end side of the first movable guide rod (21);

an inner position adjusting spring (24) for supporting and adjusting the air guide piston (19) is sleeved on the first movable guide rod (21).

5. An injection plasma exhaust treatment device according to claim 1, wherein:

a second air inlet taper opening (26) matched with a second end side piston (29) is formed in an inner end opening of a second air inlet channel (25) of the air partition processing mechanism (14);

and a third conical outlet (33) matched with a third end side piston (34) is formed in an outer port of a second air outlet channel (30) of the gas partition processing mechanism (14).

6. An injection plasma exhaust treatment device according to claim 1, wherein:

the gas partition treatment mechanism (14) is provided with an internal preheating device (40) for heating the ion waste gas to be introduced into the ion waste gas mixing cavity (8);

and a second temperature sensor (45) is arranged in the separation processing cavity (15) of the gas separation processing mechanism (14).

7. An injection plasma exhaust treatment device according to claim 1, wherein:

an electronic control valve (36) is arranged on the plasma vacuum injection pipeline (3);

a plurality of inclined outlets (37) which are distributed at equal intervals are arranged at the end side of the plasma vacuum injection pipeline (3);

and an internal mixing and stirring device (41) for accelerating the gas movement in the ion and waste gas mixing cavity (8) is hermetically arranged on the waste gas treatment device (5).

Technical Field

The invention relates to the field of plasma/waste gas treatment devices, in particular to an injection type plasma waste gas treatment device.

Background

Nowadays, more and more enterprises adopt plasma to treat organic waste gas, such as waste gas generated in plastic spraying drying, waste gas generated in rubber extrusion and the like. Before the waste gas is subjected to plasma treatment, a plurality of different waste gas substances exist in the waste gas generated in industrial production, and the different waste gases are simultaneously subjected to plasma treatment in the same state, so that the generated substances are different. Especially, some waste gases with strong acidity and alkalinity are directly subjected to plasma treatment, and generated substances also have certain acidity and alkalinity, so that after the waste gases generated in industry are subjected to primary treatment, the waste gases with few component types are subjected to plasma treatment, and the treatment effect of the industrial waste gases can be effectively improved.

Disclosure of Invention

The technical problem to be solved by the invention is to provide an injection type plasma waste gas treatment device, so that the primary treatment of waste gas, the separation of reactants and the conduction and treatment of gas are more efficient, an ion waste gas mixing cavity is convenient to carry out efficient molecular modification on preheated gas, and the final treatment effect of industrial waste gas is improved.

In order to solve the technical problems, the invention is realized by the following technical scheme:

the invention provides an injection type plasma waste gas treatment device, which comprises a plasma generator, wherein one side of the plasma generator is connected with a plasma vacuum injection pipeline for directionally outputting plasma; one end of the plasma vacuum injection pipeline is connected with a waste gas treatment device; the waste gas treatment device is internally divided into a neutralization reaction cavity, a middle buffer cavity, a partition treatment cavity and an ionic waste gas mixing cavity; an internal isolation laminate is arranged in the waste gas treatment device; the bottom of the neutralization reaction cavity of the waste gas treatment device is provided with a section of isolation plate positioned on the periphery of the inner isolation layer plate; a self-adjusting inlet gas is arranged on the first section of the isolation plate; the middle buffer cavity of the waste gas treatment device is positioned below the self-regulating inlet gas; the middle buffer cavity of the waste gas treatment device is positioned on the outer side of the inner isolation layer plate; the ion waste gas mixing cavity of the waste gas treatment device is positioned on the inner side of the internal isolation laminate.

Comprises a waste gas injection pipeline communicated with a neutralization reaction cavity of a waste gas treatment device; comprises a neutralization reaction gas injection pipeline communicated with a neutralization reaction cavity of the waste gas treatment device; the self-adjusting gas inlet is provided with an external gas inlet channel, a movable gas guide inner cavity and an internal gas inlet channel; an air guide piston which is movably adjusted is arranged in the movable air guide inner cavity.

The lower part of the waste gas treatment device is provided with a gas partition treatment mechanism; the partition processing cavity is positioned inside the gas partition processing mechanism; the upper part of the gas partition processing mechanism is provided with a second gas inlet channel communicated with the middle buffer cavity; the gas partition processing mechanism is hermetically provided with a second power device; the output end of the second power device is connected with a second telescopic connecting rod; a second end side piston matched with the second air inlet channel is arranged at the end side of the second telescopic connecting rod; the lower part of the gas partition treatment mechanism is provided with a second gas outlet channel communicated with the ion waste gas mixing cavity; a third power device is hermetically arranged on the gas partition processing mechanism; the output end of the third power device is connected with a third telescopic connecting rod; and a third end side piston matched with the second air outlet channel is arranged on the end side of the third telescopic connecting rod.

The end side of the plasma vacuum injection pipeline is positioned in an ion waste gas mixing cavity of the waste gas treatment device; an air pressure sensing device is arranged in an ion waste gas mixing cavity of the waste gas treatment device; the waste gas treatment device is connected with an exhaust pipeline communicated with the ion waste gas mixing cavity.

As a preferred technical scheme of the invention, a vacuum directional injection device is arranged on the plasma vacuum injection pipeline.

As a preferred technical scheme of the invention, a primary heating device for heating the waste gas and the neutralization reaction gas is arranged in a neutralization reaction cavity of the waste gas treatment device; a first temperature sensor is arranged in a neutralization reaction cavity of the waste gas treatment device.

As a preferred technical scheme of the invention, a sealing ring is arranged on the side surface of the air guide piston; the bottom side surface of the air guide piston is connected with a plurality of first movable guide rods which movably penetrate through the side of the self-adjusting air inlet; the first movable guide rod is provided with a first inner side baffle ring positioned in the movable air guide inner cavity; a first outer side baffle ring is arranged at the outer end side of the first movable guide rod; the first movable guide rod is sleeved with an internal position adjusting spring for supporting and adjusting the air guide piston.

As a preferred technical scheme of the invention, an inner port of a second gas inlet channel of the gas partition processing mechanism is provided with a second gas inlet conical port matched with a second end side piston; and a third conical outlet matched with the third end side piston is formed in the outer port of the second air outlet channel of the gas partition treatment mechanism.

As a preferred technical scheme of the invention, the gas partition treatment mechanism is provided with an internal preheating device for heating the ion waste gas to be introduced into the ion waste gas mixing cavity; and a second temperature sensor is arranged in the separation treatment cavity of the gas separation treatment mechanism.

As a preferred technical scheme of the invention, an electronic control valve is arranged on the plasma vacuum injection pipeline; the end side of the plasma vacuum injection pipeline is provided with a plurality of inclined outlets which are distributed at equal intervals; and the waste gas treatment device is hermetically provided with an internal mixing device for accelerating the gas movement in the ion and waste gas mixing cavity.

Compared with the prior art, the invention has the beneficial effects that:

1. according to the invention, waste gas and neutralizing gas are filled into the neutralizing reaction cavity, after reaction, the waste gas and the neutralizing gas enter the intermediate buffer cavity for cooling and separation, and separated gas storage is carried out in the separated treatment cavity in the gas separated treatment mechanism, and when gas needs to be injected into the ion and waste gas mixing cavity, preheating supply is rapidly carried out, so that the independence of gas reaction and storage in each cavity is ensured, and meanwhile, the gas fluidity can be ensured, so that the preliminary treatment of the waste gas, the separation of reactants and the conduction and treatment of the gas are more efficient;

2. according to the invention, the internal preheating device is arranged in the gas partition treatment mechanism, and gas conduction and matching are carried out through the second end side piston at the upper part and the third end side piston at the lower part, so that the ion waste gas mixing cavity can conveniently carry out high-efficiency molecular modification on the preheated gas, and the final treatment effect of the industrial waste gas is improved.

Drawings

FIG. 1 is a schematic diagram of the overall apparatus of the present invention;

FIG. 2 is an enlarged view of a portion A of FIG. 1;

FIG. 3 is a partially enlarged view of the structure at B in FIG. 2;

FIG. 4 is a schematic structural view of a gas barrier treatment mechanism according to the present invention;

wherein: 1-a plasma generator; 2-a plasma drive power supply; 3-a plasma vacuum injection pipe; 4-vacuum directional injection device; 5-an exhaust gas treatment device; 6-neutralization reaction chamber; 7-intermediate buffer chamber; 8-an ion waste gas mixing chamber; 9-an exhaust gas injection conduit; 10-a neutralisation reaction gas injection line; 11-a section of insulation board; 12-self-regulating inlet gas; 13-inner position isolation layer plate; 14-gas barrier treatment mechanism; 15-isolating the treatment chamber; 16-external intake channel; 17-movable air guide inner cavity; 18-internal intake channel; 19-an air guide piston; 20-sealing the ring; 21-a first movable guide bar; 22-a first inner retainer ring; 23-a first outer retainer ring; 24-inner position adjusting spring; 25-a second gas inlet channel; 26-a second air inlet cone opening; 27-a second power plant; 28-a second pantograph linkage; 29-second end side piston; 30-a second outlet channel; 31-a third power plant; 32-a third pantograph linkage; 33-a third conical outlet; 34-a third end side piston; 35-installing a sealing cushion plate; 36-an electronically controlled valve; 37-an oblique outlet; 38-air pressure sensing means; 39-primary heating means; 40-internal preheating device; 41-internal mixing and stirring device; 42-an exhaust duct; 43-an exhaust pump; 44-a first temperature sensor; 45-a second temperature sensor; 46-bottom export line.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

The invention relates to an injection type plasma waste gas treatment device, which comprises a plasma generator 1, wherein one side of the plasma generator 1 is connected with a plasma vacuum injection pipeline 3 for directionally outputting plasma; one end of the plasma vacuum injection pipeline 3 is connected with an exhaust gas treatment device 5; the waste gas treatment device 5 is internally divided into a neutralization reaction cavity 6, a middle buffer cavity 7, a partition treatment cavity 15 and an ionic waste gas mixing cavity 8; an internal isolation layer plate 13 is arranged in the waste gas treatment device 5; a section of isolation plate 11 positioned at the periphery of the inner isolation layer plate 13 is arranged at the bottom of the neutralization reaction cavity 6 of the waste gas treatment device 5; a self-adjusting inlet gas 12 is arranged on the first section of the isolation plate 11; the intermediate buffer chamber 7 of the exhaust gas treatment device 5 is located below the self-regulating inlet gas 12; the middle buffer cavity 7 of the waste gas treatment device 5 is positioned on the outer side of the inner isolation layer plate 13; the ion exhaust gas mixing chamber 8 of the exhaust gas treatment device 5 is located inside the inner barrier layer plate 13.

Comprises an exhaust gas injection pipeline 9 communicated with the neutralization reaction cavity 6 of the exhaust gas treatment device 5; comprises a neutralization reaction gas injection pipeline 10 communicated with the neutralization reaction cavity 6 of the waste gas treatment device 5; the self-adjusting gas inlet 12 is provided with an external gas inlet channel 16, a movable gas guide inner cavity 17 and an internal gas inlet channel 18; an air guide piston 19 which is movably adjusted is arranged in the movable air guide inner cavity 17.

The lower part of the waste gas treatment device 5 is provided with a gas separation treatment mechanism 14; the partition processing chamber 15 is positioned inside the gas partition processing mechanism 14; the upper part of the gas partition processing mechanism 14 is provided with a second gas inlet channel 25 communicated with the middle buffer cavity 7; the second power device 27 is hermetically arranged on the gas isolating processing mechanism 14; the output end of the second power device 27 is connected with a second telescopic connecting rod 28; a second end side piston 29 matched with the second air inlet channel 25 is arranged at the end side of the second telescopic connecting rod 28; the lower part of the gas partition processing mechanism 14 is provided with a second gas outlet channel 30 communicated with the ion waste gas mixing cavity 8; the third power device 31 is hermetically arranged on the gas isolating treatment mechanism 14; the output end of the third power device 31 is connected with a third telescopic connecting rod 32; a third end side piston 34 which is matched with the second air outlet channel 30 is arranged at the end side of the third telescopic connecting rod 32.

The end side of the plasma vacuum injection pipeline 3 is positioned in an ion waste gas mixing cavity 8 of the waste gas treatment device 5; an air pressure sensing device 38 is arranged in the ion waste gas mixing cavity 8 of the waste gas treatment device 5; an exhaust pipe 42 communicating with the ion exhaust gas mixing chamber 8 is connected to the exhaust gas treatment device 5.

Further, a vacuum directional injection device 4 is installed on the plasma vacuum injection pipeline 3.

Further, a primary heating device 39 for heating the waste gas and the neutralization reaction gas is arranged in the neutralization reaction cavity 6 of the waste gas treatment device 5; a first temperature sensor 44 is provided in the neutralization reaction chamber 6 of the exhaust gas treatment device 5.

Further, a sealing ring 20 is arranged on the side surface of the air guide piston 19; the bottom side surface of the air guide piston 19 is connected with a plurality of first movable guide rods 21 which movably penetrate through one side of the self-adjusting air inlet 12; the first movable guide rod 21 is provided with a first inner side baffle ring 22 positioned in the movable air guide inner cavity 17; a first outer baffle ring 23 is arranged at the outer end side of the first movable guide rod 21; the first movable guide rod 21 is sleeved with an inner position adjusting spring 24 for supporting and adjusting the air guide piston 19.

Further, an inner port of a second gas inlet channel 25 of the gas partition processing mechanism 14 is provided with a second gas inlet taper port 26 matched with a second end side piston 29; the outer port of the second outlet channel 30 of the gas blocking processing mechanism 14 is opened with a third conical outlet 33 matched with a third end side piston 34.

Further, an internal preheating device 40 for heating the ion waste gas to be introduced into the ion waste gas mixing chamber 8 is arranged on the gas partition treatment mechanism 14; the second temperature sensor 45 is provided in the blocking processing chamber 15 of the gas blocking processing mechanism 14.

Further, an electronic control valve 36 is arranged on the plasma vacuum injection pipeline 3; the end side of the plasma vacuum injection pipeline 3 is provided with a plurality of inclined outlets 37 which are distributed at equal intervals; the waste gas treatment device 5 is hermetically provided with an internal mixing and stirring device 41 for accelerating the gas movement in the ionic waste gas mixing cavity 8.

In the invention, the waste gas generated in industrial production passes through a dust, moisture and other filtering devices to filter impurity particles and a large amount of condensed water vapor in the waste gas, then the waste gas after primary treatment is transmitted to a waste gas injection pipeline 9 through a transmission pump and enters a neutralization reaction cavity 6 in a waste gas treatment device 5, and a proper amount of neutralization gas which is primarily reacted with the waste gas is injected into a neutralization reaction gas injection pipeline 10 and is heated and assisted by a primary heating device 39; along with the continuous input of waste gas and neutralizing gas to the neutralizing reaction cavity 6, when the gas in the neutralizing reaction cavity 6 is initially reacted, the gas pressure is gradually increased to drive the self-adjusting inlet gas 12 to be driven by the gas pressure, the gas guide piston 19 movably opens a gas flow conducting channel, the gas after the primary reaction enters the middle buffer cavity 7, the gas after the primary reaction is gradually cooled in the middle buffer cavity 7, and the moisture and the gasified substances generated by the primary reaction are gradually separated out and fall into the bottom of the middle buffer cavity 7 [ after long-term use, the separated substances can be discharged through the bottom outward conveying pipeline 46 when the gas is not used, the bottom outward conveying pipeline 46 is also provided with a sealing valve mechanism to ensure the sealing performance of the cavity in the operating state ].

After the primarily reacted and cooled waste gas passes through the intermediate buffer cavity 7, the second end side piston 29 on the gas partition treatment mechanism 14 is opened (the air pressure in the partition treatment cavity 15 before opening is lower), the gas in the intermediate buffer cavity 7 enters the partition treatment cavity 15, after a few seconds, the second end side piston 29 blocks the second air inlet channel 25 again, the air pressure in the intermediate buffer cavity 7 is reduced, and the air pressure in the partition treatment cavity 15 is increased; the reaction gas in the neutralization reaction chamber 6 is at a higher pressure and enters the intermediate buffer chamber 7 from the self-regulating feed gas 12.

The ion waste gas mixing chamber 8 is internally provided with a gas pressure sensing device 38 for monitoring the gas pressure in the current ion waste gas mixing chamber 8, when the gas pressure in the ion waste gas mixing chamber 8 is very low, an internal preheating device 40 preheats the gas in the partition treatment chamber 15 for a plurality of seconds, then a third end side piston 34 at the bottom of the gas partition treatment mechanism 14 is opened, the preheated gas enters the ion waste gas mixing chamber 8, plasma generated by a plasma generator 1 rapidly enters the ion waste gas mixing chamber 8 through a plasma vacuum injection pipeline 3 and is mixed with the preheated gas, an internal mixing and stirring device 41 and rotating blades are adopted for accelerating mixing, the preliminarily treated waste gas is subjected to mixing reaction, molecular chains are broken, carbon dioxide, water and other small substance molecules are generated, and the ions are effectively extracted through an exhaust pipeline 42 at the upper part.

In addition, in order to closely monitor the change of the air pressure in each chamber, air pressure sensors may be provided in the neutralization reaction chamber 6, the intermediate buffer chamber 7, and the partition treatment chamber 15.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.