阅读说明：本技术 一种光热双重固化树脂组合物及其制备方法和应用 (Photo-thermal dual-curing resin composition and preparation method and application thereof ) 是由 刘涛 陈长敬 林鸿腾 李帅 于 2021-09-29 设计创作，主要内容包括：本发明属于胶黏剂与密封剂领域,涉及一种光热双重固化树脂组合物及其制备方法和应用。所述树脂组合物包括以下重量份数的组分：环氧树脂20-40份、多硫醇化合物15-30份、丙烯酸酯树脂20-40份、潜伏性固化剂1-5份、自由基型光引发剂1-5份和助剂0.1-10份,丙烯酸酯树脂中包含至少两个不饱和碳碳双键。本发明采用树脂体系的合理搭配,并与耐水解的多硫醇化合物配合,其中,所述环氧树脂和丙烯酸酯树脂均具有多官能度并且多硫醇化合物具有独特的刚性结构和多官能度,如此能够实现快速UV光固定和低温快速固化,而固化物具有耐热性能优良、吸水率低、热粘接强度高以及耐湿热实验后粘结强度保持性突出等众多优点,特别适用于作为图像传感器模组制造的胶黏剂或密封剂。(The invention belongs to the field of adhesives and sealants, and relates to a photo-thermal dual-curing resin composition, and a preparation method and application thereof. The resin composition comprises the following components in parts by weight: 20-40 parts of epoxy resin, 15-30 parts of polythiol compound, 20-40 parts of acrylate resin, 1-5 parts of latent curing agent, 1-5 parts of free radical photoinitiator and 0.1-10 parts of auxiliary agent, wherein the acrylate resin contains at least two unsaturated carbon-carbon double bonds. The epoxy resin and the acrylate resin both have multiple functionality and the polythiol compound has unique rigid structure and multiple functionality, so that rapid UV light fixation and low-temperature rapid curing can be realized, and a cured product has the advantages of excellent heat resistance, low water absorption, high thermal bonding strength, outstanding bonding strength retention after a damp and heat resistance experiment and the like, and is particularly suitable for being used as an adhesive or a sealant for manufacturing an image sensor module.)

1. The photo-thermal dual-curing resin composition is characterized by comprising the following components in parts by weight:

the polythiol compound is represented by the general formula (I):

in the general formula (I), R¹、R²And R³Each independently selected from the group consisting of substituents represented by the general formula (II):

in the general formula (II), R⁴Selected from sulfur atoms, methylene or ester bonds, R⁵Selected from a hydrogen atom, a methyl group or a hydroxyl group, m and n are each independently selected from 0, 1 or 2;

The acrylate resin contains at least two unsaturated carbon-carbon double bonds.

2. The photothermal dual curable resin composition according to claim 1, wherein in the general formula (II), if R is⁴When it is a sulfur atom, then R⁵Is a hydrogen atom, m is 2, n is 1 or 2; if R is⁴When it is methylene, then R⁵Is a hydrogen atom, m is 0 or 1, n is 0; if R is⁴In the case of an ester bond, then R⁵Is hydrogen atom or methyl, m is 2, and n is 0 or 1.

3. The photothermal dual curable resin composition according to claim 1, wherein the polythiol compound is one or more compounds selected from the group consisting of tris (3-mercaptoethyl) isocyanurate, tris (3-mercaptopropyl) isocyanurate, tris (2-mercaptoacetoxyethyl) isocyanurate, tris (3-mercaptopropionyloxyethyl) isocyanurate and tris (3-mercaptobutanoyloxyethyl) isocyanurate.

4. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the epoxy resin is a combination of a bisphenol A type epoxy resin, diallyl biphenyl diglycidyl ether, and bisphenol A epoxy monoacrylate in a weight ratio of (0.1-0.5): of (0.3-1.2): 1;

the diallyl biphenyl diglycidyl ether is represented by the general formula (III):

In the general formula (III), R⁶And R⁷Each independently is a hydrogen atom or a methoxy group.

5. The photothermal dual curable resin composition according to claim 4, wherein the diallyl biphenyl diglycidyl ether is prepared according to a method comprising the steps of:

weighing a diallyl biphenyl diphenol compound and 3-halogenated epoxypropane according to a molar ratio of 1 (10-50), adding the weighed compounds into a reaction kettle, adding a phase transfer catalyst of benzyltriethylammonium chloride, heating to 60-120 ℃, stirring and reacting for 2-4 hours under the protection of inert gas, dropwise adding a sodium hydroxide aqueous solution, continuously reacting for 1-3 hours at 60-120 ℃, filtering the reaction liquid, distilling the filtrate under reduced pressure to remove the redundant 3-halogenated epoxypropane after the reaction, extracting with an organic solvent after washing, collecting the organic phase, and evaporating to dryness to obtain a liquid colorless or light yellow final product, namely diallyl biphenyl diglycidyl ether;

the diallyl biphenyl diphenol compound is 5,5' -diallyl-2, 2' -biphenol and/or 5,5' -diallyl-3, 3' -dimethoxy-2, 2' -biphenol; the 3-halogenated epoxypropane is epichlorohydrin and/or epibromohydrin.

6. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the acrylate resin is one or more selected from the group consisting of epoxy (meth) acrylate, urethane (meth) acrylate, polyester (meth) acrylate, polyether (meth) acrylate, silane-modified (meth) acrylate, polyol (meth) acrylate, polyolefin (meth) acrylate, melamine (meth) acrylate, isocyanuric acid (meth) acrylate, and (meth) acrylated acrylic resin.

7. The photo-thermal dual-curable resin composition according to claim 6, wherein the acrylate resin is one or more selected from the group consisting of isosorbide diacrylate, tricyclodecane dimethanol diacrylate, bisphenol A epoxy diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate.

8. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the latent curing agent is one or more selected from dicyandiamide, hydrazide, guanidine compound, modified imidazole, modified amine, urea adduct, amine-epoxy adduct and microcapsule type curing agent.

9. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the radical type photoinitiator is selected from the group consisting of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexylphenylketone, 2-hydroxy-4- (2-hydroxyethoxy) -2-methylpropiophenone, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, ethyl 2,4, 6-trimethylbenzoyl phenylphosphinate, bis (2,4, 6-trimethylbenzoyl) phenylphosphine oxide, 2-methyl-1- [4- (methylthio) phenyl ] -2- (4-morpholinyl) -1-propanone, and mixtures thereof, 2-phenylbenzyl-2-dimethylamine-1- (4-morpholinobenzylphenyl) butanone, 4-benzoyl-4 '-methyl-diphenylsulfide, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) -1-butanone, 1' - (methylenebis-4, 1-phenylene) bis [ 2-hydroxy-2-methyl-1-propanone ], 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-1-hexanophenone, bis-2, 6-difluoro-3-pyrrolylphenyltitanocene, methyl benzoylformate, benzophenone, 4-methylbenzophenone, methyl benzoylformate, methyl ester, 4-phenyl benzophenone, 4-chlorobenzophenone, methyl o-benzoylbenzoate, ethyl 4-dimethylaminobenzoate, isooctyl p-dimethylaminobenzoate, 4' -bis (diethylamino) benzophenone, isopropylthioxanthone, 2, 4-diethylthioxanthone and 2-ethylanthraquinone.

10. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the auxiliary agent is one or more selected from the group consisting of a stabilizer, a polymerization inhibitor, an antioxidant, a flame retardant, a diluent, an adhesion promoter, a silane coupling agent, a dye, a pigment, an antifoaming agent, a leveling agent and an ion scavenger.

11. The photothermal dual curable resin composition according to any one of claims 1 to 3, wherein the photothermal dual curable resin composition further comprises a filler; the filler is selected from one or more of silicon dioxide, alumina, talc, calcium carbonate, glass microspheres, metal powder and polytetrafluoroethylene filler; the filler is used in an amount of 0.1 to 10 parts by weight.

12. The method for preparing the photothermal dual curable resin composition according to any one of claims 1 to 11, comprising: under the condition of keeping out of the sun, stirring and mixing the epoxy resin, the polythiol compound, the acrylate resin, the free radical photoinitiator, the auxiliary agent and the optional filler for 0.5 to 2 hours at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to-0.1 MPa, then adding the latent curing agent, stirring and mixing for 0.1 to 1 hour at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to-0.1 MPa, and immediately sealing and packaging in the absence of the sun.

13. Use of the photothermal dual curable resin composition according to any one of claims 1 to 11 as an adhesive or a sealant.

14. The use of claim 13, wherein the adhesive is used for bonding of sensors or cameras.

Technical Field

The invention belongs to the field of adhesives and sealants, and particularly relates to a photo-thermal dual-curing resin composition as well as a preparation method and application thereof.

Background

Based on the recent requirements of the electronic circuit field for protecting semiconductor elements, enabling high circuit concentration and improving connection reliability, attention is paid to adhesives which are quickly fixed by Ultraviolet (UV) irradiation and then bonded with high strength by heating. In the UV light/heat dual-curing system, the advantages of UV light curing, energy conservation, environmental protection and second-speed curing enable the UV light curing system to meet the requirement of quick positioning when a precise electronic component is assembled; while thermally cured epoxy composition systems are used to achieve high strength bonds.

However, the heat-curable epoxy adhesive has problems of high curing temperature and slow curing speed while satisfying one-component storage stability, and thus is difficult to be applied to the assembly of some precision electronic components, particularly to the use of image sensor modules. If the temperature is too high or the heat time is too long in the assembling process of the image sensor, the components such as the lens and the like can be degraded. An epoxy resin system cured by mercaptan is an effective alternative for meeting the requirements of low-temperature short-time curing epoxy adhesives. For example, CN200480034851.2 discloses a photo/thermal dual curing composition which achieves low temperature fast curing of epoxy glue using ester thiol compounds or dimercapto aliphatic polythiols or aromatic polythiols with significant sulfur odor and lower functionality. However, in the manufacture of electronic image sensor modules, high temperature and high humidity resistance and high heat resistance are also required to ensure long-term stability of electronic components. After the CN200480034851.2 technology is repeated, the ester thiol compound adopted by the technology contains an ester bond easy to hydrolyze, and after a continuous high temperature and high humidity resistance experiment of 85 ℃/85% RH, the optical/thermal dual-curing composition serving as an adhesive almost completely fails to be bonded to an image sensor module; when dimercapto aliphatic polythiol or aromatic polythiol without ester bond is adopted, the bonding strength is obviously reduced and the heat resistance is extremely poor after high temperature and high humidity resistance experiments. In other prior art, there is also a dual-curing resin composition using a thiol compound without an ester bond, but there is a problem that the heat resistance of the cured product is not sufficient in some cases. In addition, in the manufacture of the image sensor module, the water absorption rate of the used adhesive is required to be low, so that moisture in the air can be prevented from permeating into the module and interfering with a lens system after the module is bonded, assembled and sealed. However, the water absorption of the conventional dual-curable resin composition is generally high, and it is difficult to satisfy this requirement.

Therefore, how to prepare a resin composition which has low cost, can be rapidly fixed by light and cured at low temperature, has excellent heat resistance after curing, low water absorption rate and good bonding strength retention after moisture and heat resistance by adopting a proper main resin combination and a thiol compound becomes a problem to be solved, and the performances are very important particularly when the resin composition is used for bonding in the fields of cameras, sensors and the like.

Disclosure of Invention

The invention aims to overcome the defects that the existing UV light/heat dual-curing system cannot simultaneously have excellent heat resistance, low water absorption and good bonding strength retention after moisture and heat resistance after curing, and provides a novel photo-thermal dual-curing resin composition which can realize rapid UV light fixation and low-temperature rapid curing, and has high heat resistance, low water absorption, outstanding moisture and heat resistance and excellent bonding strength after curing.

The second object of the present invention is to provide a method for preparing the photo-thermal dual curable resin composition.

The third object of the present invention is to provide an application of the photo-thermal dual curable resin composition.

The purpose of the invention is realized as follows:

The invention provides a photo-thermal dual-curing resin composition, which comprises the following components in parts by weight:

the polythiol compound is represented by the general formula (I):

in the general formula (I), R¹、R²And R³Each independently selected from the group consisting of substituents represented by the general formula (II):

in the general formula (II), R⁴Selected from sulfur atoms, methylene or ester bonds, R⁵Selected from a hydrogen atom, a methyl group or a hydroxyl group, m and n are each independently selected from 0, 1 or 2;

the acrylate resin contains at least two unsaturated carbon-carbon double bonds.

In a preferred embodiment, in the formula (II), if R is⁴When it is a sulfur atom, then R⁵Is a hydrogen atom, m is 2, n is 1 or 2; if R is⁴When it is methylene, then R⁵Is a hydrogen atom, m is 0 or 1, n is 0; if R is⁴In the case of an ester bond, then R⁵Is hydrogen atom or methyl, m is 2, and n is 0 or 1.

In a preferred embodiment, the polythiol compound is selected from one or more of tris (3-mercaptoethyl) isocyanurate, tris (3-mercaptopropyl) isocyanurate, tris (2-mercaptoacetoxyethyl) isocyanurate, tris (3-mercaptopropionyloxyethyl) isocyanurate, and tris (3-mercaptobutyryloxyethyl) isocyanurate.

In a preferred embodiment, the epoxy resin is a combination of bisphenol A type epoxy resin, diallyl biphenyl diglycidyl ether, and bisphenol A epoxy monoacrylate in a weight ratio of (0.1-0.5): (0.3-1.2): 1;

the diallyl biphenyl diglycidyl ether is represented by the general formula (III):

in the general formula (III), R⁶And R⁷Each independently is a hydrogen atom or a methoxy group.

In a preferred embodiment, the diallyl biphenyl diglycidyl ether is prepared according to a process comprising the steps of: weighing a diallyl biphenyl diphenol compound and 3-halogenated epoxypropane according to a molar ratio of 1 (10-50), adding the weighed compounds into a reaction kettle, adding a phase transfer catalyst of benzyltriethylammonium chloride, heating to 60-120 ℃, stirring and reacting for 2-4 hours under the protection of inert gas, dropwise adding a sodium hydroxide aqueous solution, continuously reacting for 1-3 hours at 60-120 ℃, filtering the reaction liquid, distilling the filtrate under reduced pressure to remove the redundant 3-halogenated epoxypropane after the reaction, extracting with an organic solvent after washing, collecting the organic phase, and evaporating to dryness to obtain a liquid colorless or light yellow final product, namely diallyl biphenyl diglycidyl ether; the diallyl biphenyl diphenol compound is 5,5' -diallyl-2, 2' -biphenol and/or 5,5' -diallyl-3, 3' -dimethoxy-2, 2' -biphenol; the 3-halogenated epoxypropane is epichlorohydrin and/or epibromohydrin.

In a preferred embodiment, the acrylate resin is selected from one or more of epoxy (meth) acrylate, urethane (meth) acrylate, polyester (meth) acrylate, polyether (meth) acrylate, silane-modified (meth) acrylate, polyol (meth) acrylate, polyolefin (meth) acrylate, melamine (meth) acrylate, isocyanuric acid (meth) acrylate, and (meth) acrylated acrylic resin.

In a preferred embodiment, the acrylate resin is selected from one or more of isosorbide diacrylate, tricyclodecane dimethanol diacrylate, bisphenol A epoxy diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate.

In a preferred embodiment, the latent curing agent is selected from one or more of dicyandiamide, hydrazide, guanidine compound, modified imidazole, modified amine, urea adduct, amine-epoxy adduct, and microcapsule type curing agent.

In a preferred embodiment, the free radical photoinitiator is selected from the group consisting of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexylphenylmethanone, 2-hydroxy-4- (2-hydroxyethoxy) -2-methylpropiophenone, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, ethyl 2,4, 6-trimethylbenzoyl phenylphosphonate, bis (2,4, 6-trimethylbenzoyl) phenylphosphine oxide, 2-methyl-1- [4- (methylthio) phenyl ] -2- (4-morpholinyl) -1-propanone, 2-phenylbenzyl-2-dimethylamine-1- (4-benzylmorpholinyl) butanone, 2-hydroxy-2-methyl-1-phenyl-1-propanone, 2-hydroxy-4- (2-hydroxyethoxy) -2-methylpropiophenone, 2, 4-trimethylbenzoyl-diphenylphosphine oxide, 2, 4-trimethylbenzoyl-phenylphosphonate, 2-methyl-1-propanone, 2-methyl-one, 2-methyl-1-methyl-phenyl-1-propanone, 2, 4-benzoyl-4 '-methyl-diphenyl sulfide, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) -1-butanone, 1' - (methylenebis-4, 1-phenylene) bis [ 2-hydroxy-2-methyl-1-propanone ], 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-1-hexanophenone, bis-2, 6-difluoro-3-pyrrolylphenyltitanocene, methyl benzoylformate, benzophenone, 4-methylbenzophenone, 4-phenylbenzophenone, 4-chlorobenzophenone, methyl benzoylbenzoate, methyl N-propylbenzenesulfonate, N-2-propylbenzenesulfonate, N-propylphenoxide, N-2-propylphenoxide, N-p-phenylbenzophenone, N-2-p-propylphenoxide, N-p-propylphenoxide, N-2-p-2-p-phenylbenzophenone, p-2-p-2-phenylbenzophenone, p-2-p-2-p-phenyltole, p-methyle, p-2-p-m-2-p-2-p-m-p-m-p-m-p-, One or more of ethyl 4-dimethylaminobenzoate, isooctyl p-dimethylaminobenzoate, 4' -bis (diethylamino) benzophenone, isopropyl thioxanthone, 2, 4-diethyl thioxanthone and 2-ethylanthraquinone.

In a preferred embodiment, the auxiliary agent is selected from one or more of a stabilizer, a polymerization inhibitor, an antioxidant, a flame retardant, a diluent, an adhesion promoter, a silane coupling agent, a dye, a pigment, an antifoaming agent, a leveling agent and an ion trapping agent.

In a preferred embodiment, the photo-thermal dual-curable resin composition further includes a filler; the filler is selected from one or more of silicon dioxide, alumina, talc, calcium carbonate, glass microspheres, metal powder and polytetrafluoroethylene filler; the filler is used in an amount of 0.1 to 10 parts by weight.

The preparation method of the photo-thermal dual-curing resin composition provided by the invention comprises the following steps: under the condition of keeping out of the sun, stirring and mixing the epoxy resin, the polythiol compound, the acrylate resin, the free radical photoinitiator, the auxiliary agent and the optional filler for 0.5 to 2 hours at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to-0.1 MPa, then adding the latent curing agent, stirring and mixing for 0.1 to 1 hour at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to-0.1 MPa, and immediately sealing and packaging in the absence of the sun.

The invention also provides application of the photo-thermal dual-curing resin composition as an adhesive or a sealant.

In a preferred embodiment, the adhesive is used for bonding of a sensor or a camera.

The key point of the invention is that the reasonable collocation of a resin system is adopted and matched with a hydrolysis-resistant polythiol compound, wherein, the adopted epoxy resin and acrylate resin both have multifunctionality, and the adopted polythiol compound has unique rigid structure and multifunctionality, thus being capable of realizing rapid UV light fixation and low-temperature rapid curing, and the resin composition has the advantages of excellent heat resistance, low water absorption, high thermal bonding strength, outstanding bonding strength retention after a damp-heat resistant experiment and the like after curing, and is particularly suitable for being used as an adhesive or a sealant for manufacturing an image sensor module.

Drawings

FIG. 1 is an IR spectrum of 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether obtained in preparation example 1;

FIG. 2 is a drawing showing 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether obtained in preparation example 1¹H-NMR chart.

Detailed Description

The photo-thermal dual-curing resin composition provided by the invention contains epoxy resin, polythiol compound, acrylate resin, latent curing agent, free radical photoinitiator, auxiliary agent and optional filler. Wherein, the content of the epoxy resin is 20-40 parts by weight, such as 20, 22, 25, 28, 30, 32, 35, 38 and 40 parts by weight. The polythiol compound is contained in an amount of 15 to 30 parts, for example, 15, 18, 20, 22, 25, 28, and 30 parts by weight. The content of the acrylate resin is 20-40 parts by weight, such as 20, 22, 25, 28, 30, 32, 35, 38 and 40 parts by weight. The content of the latent curing agent is 1-5 parts by weight, such as 1, 2, 3, 4 and 5 parts by weight. The content of the free radical type photoinitiator is 1-5 parts by weight, such as 1, 2, 3, 4 and 5 parts by weight. The content of the auxiliary agent is 0.1-10 parts by weight, such as 0.1, 0.5, 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 parts by weight. The content of the filler is 0 to 10 parts by weight, such as 0, 0.1, 0.5, 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 parts by weight.

The polythiol compound has a structure represented by general formula (I):

in the general formula (I), R¹、R²And R³Each independently selected from the group consisting of substituents represented by the general formula (II); in the general formula (II), R⁴Selected from sulfur atoms, methylene or ester bonds, R⁵Selected from a hydrogen atom, a methyl group or a hydroxyl group, and m and n are each independently selected from 0, 1 or 2. Preferably, in the formula (II), if R⁴When it is a sulfur atom, then R⁵Is a hydrogen atom, m is 2, n is 1 or 2; if R is⁴When it is methylene, then R⁵Is a hydrogen atom, m is 0 or 1, n is 0; if R is⁴In the case of an ester bond, then R⁵Is hydrogen atom or methyl, m is 2, and n is 0 or 1. The polythiol compound does not contain ester bonds which are easy to hydrolyze, and has a rigid and stable six-membered heterocyclic ring structure, and the specific structure can endow a cured product with extremely high heat resistance and moisture resistance.

Specific examples of the polythiol compound include, but are not limited to: one or more of tris (3-mercaptoethyl) isocyanurate, tris (3-mercaptopropyl) isocyanurate, tris (2-mercaptoacetoxyethyl) isocyanurate, tris (3-mercaptopropionyloxyethyl) isocyanurate and tris (3-mercaptobutanoyloxyethyl) isocyanurate.

The epoxy resin has two or more epoxy groups, and specifically may be an aliphatic epoxy resin and/or an aromatic epoxy resin, and preferably is an aromatic epoxy resin. When the epoxy resin is aromatic epoxy resin, the photo-thermal dual-curing resin composition has better heat resistance and lower water absorption rate after being cured.

Specific examples of the aliphatic epoxy resin include, but are not limited to: at least one of (poly) ethylene glycol diglycidyl ether, (poly) propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, 6-hexanediol diglycidyl ether, trimethylolpropane diglycidyl ether, polytetramethylene ether glycol diglycidyl ether, glycerol diglycidyl ether, neopentyl glycol diglycidyl ether, cyclohexane type diglycidyl ether, dicyclopentadiene type diglycidyl ether, and cyclohexane type diglycidyl ether.

Specific examples of the aromatic epoxy resin include, but are not limited to: at least one of bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol aldehyde type epoxy resin, tetrabromobisphenol A type epoxy resin, fluorene type epoxy resin, biphenyl aralkyl epoxy resin, diepoxy resin (e.g., 1, 4-phenyl dimethanol diglycidyl ether), biphenyl type epoxy resin (e.g., 3 ', 5,5 ' -tetramethyl-4, 4 ' -diglycidyloxybiphenyl), glycidylamine type epoxy resin (e.g., diglycidylaniline, diglycidyltoluidine, triglycidyl-p-aminophenol, tetraglycidyl m-xylylenediamine, etc.), naphthalene ring-containing epoxy resin.

In a preferred embodiment, the epoxy resin is a combination of bisphenol a type epoxy resin, diallyl biphenyl diglycidyl ether, and bisphenol a epoxy monoacrylate, more preferably, the weight ratio of the bisphenol a type epoxy resin, diallyl biphenyl diglycidyl ether, and bisphenol a epoxy monoacrylate is (0.1-0.5): (0.3-1.2): 1. Due to the poor compatibility of the epoxy resin system and the acrylic resin system, the compatibility of the diallyl biphenyl diglycidyl ether and the bisphenol A epoxy monoacrylate can be remarkably improved, and the cured product can have better thermal bonding strength by compounding the two specific epoxy resins and the traditional bisphenol A epoxy resin as the epoxy resin. In the specific use process, the amount of the bisphenol A type epoxy resin is 0.1-0.5 parts by weight, such as 0.1, 0.2, 0.3, 0.4 and 0.5 part by weight, based on 1 part by weight of the bisphenol A epoxy monoacrylate; the diallyl biphenyl diglycidyl ether is used in an amount of 0.3 to 1.2 parts by weight, such as 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, 1.1, 1.2 parts by weight.

The diallyl biphenyl diglycidyl ether has a structure represented by general formula (III):

In the general formula (III), R⁶And R⁷Each independently is a hydrogen atom or a methoxy group.

In a preferred embodiment, the diallyl biphenyl diglycidyl ether is prepared according to a process comprising the steps of: weighing a diallyl biphenyl diphenol compound and 3-halogenated epoxypropane according to a molar ratio of 1 (10-50), adding the weighed diallyl biphenyl diphenol compound and the 3-halogenated epoxypropane into a reaction kettle, adding a phase transfer catalyst of benzyltriethylammonium chloride, heating to 60-120 ℃, stirring under the protection of inert gas for reaction for 2-4 hours, dropwise adding a sodium hydroxide aqueous solution, continuously reacting for 1-3 hours at the temperature of 60-120 ℃, filtering the reaction liquid, distilling the filtrate under reduced pressure to remove the redundant 3-halogenated epoxypropane after the reaction, extracting with an organic solvent after washing, collecting the organic phase, and evaporating to dryness to obtain a liquid colorless or light yellow final product. Wherein the diallyl biphenyl diphenol compound is 5,5' -diallyl-2, 2' -biphenol and/or 5,5' -diallyl-3, 3' -dimethoxy-2, 2' -biphenol. The 3-halogenated epoxypropane is epichlorohydrin and/or epibromohydrin. Specific examples of the organic solvent include, but are not limited to: one or more of dichloromethane, trichloromethane, ethyl acetate, toluene, xylene, n-hexane and cyclohexane.

The acrylate resin may be a resin comprising at least two (meth) acrylate groups (i.e. having at least two carbon-carbon unsaturated double bonds). Specific examples of the acrylate resin include, but are not limited to: one or more of epoxy (meth) acrylate, polyurethane (meth) acrylate, polyester (meth) acrylate, polyether (meth) acrylate, silane-modified (meth) acrylate, polyol (meth) acrylate, polyolefin (meth) acrylate, melamine (meth) acrylate, isocyanuric acid (meth) acrylate, and (meth) acrylated acrylic resin. The acrylate resin preferably has a rigid structure such as a biphenyl, six-membered heterocyclic ring or rigid polycyclic structure, so that the photo-thermal dual-curable resin composition obtained has better heat resistance and lower water absorption rate after curing. At this time, specific examples of the acrylate resin include, but are not limited to: one or more of isosorbide diacrylate, tricyclodecane dimethanol diacrylate, bisphenol A epoxy diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate, preferably a combination of isosorbide diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate. When the isosorbide diacrylate and the tris (2-hydroxyethyl) isocyanurate triacrylate are compounded for use, the mass ratio of the isosorbide diacrylate to the tris (2-hydroxyethyl) isocyanurate triacrylate is preferably 1 (1-10).

The latent curing accelerator is a compound which is inactive at room temperature and is activated by heating to function as a curing accelerator, and examples thereof include: one or more of dicyandiamide, hydrazide, guanidine compound, modified imidazole, modified amine, urea adduct, amine-epoxy adduct and microcapsule type curing agent.

The radical photoinitiator may be any available compound capable of absorbing ultraviolet energy to generate radicals to initiate polymerization of unsaturated monomers, and specific examples thereof include, but are not limited to: 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexylphenylketone, 2-hydroxy-4- (2-hydroxyethoxy) -2-methylpropiophenone, 2,4, 6-trimethylbenzoyl-diphenylphosphine oxide, ethyl 2,4, 6-trimethylbenzoylphenylphosphonate, bis (2,4, 6-trimethylbenzoyl) phenylphosphine oxide, 2-methyl-1- [4- (methylthio) phenyl ] -2- (4-morpholinyl) -1-propanone, 2-phenylbenzyl-2-dimethylamine-1- (4-morpholinylbenzyl) butanone, 4-benzoyl-4' -methyl-diphenylsulfide, methyl-2-phenylpropiophenone, methyl-2-propanone, methyl-2-methylbenzyl-1-propanone, methyl-4-methylbenzyl-ether, methyl-1-propanone, methyl-2-methylbenzyl-4-methylbenzyl-1-methyl-phenyl-2-methyl-1-propanone, methyl-2-methylbenzyl-methyl-1-methyl-2-methyl-phenyl-1-propanone, methyl-2-methylbenzyl-methyl-1-phenyl-methyl-1-one, methyl-phenyl-2-methyl-one, methyl-phenyl-2-methyl-one, methyl-2-phenyl-one, methyl-2-methyl-one, and methyl-one, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) -1-butanone, 1' - (methylenebis-4, 1-phenylene) bis [ 2-hydroxy-2-methyl-1-propanone ], 2-dimethoxy-2-phenylacetophenone, 2-diethoxy-1-phenylhexanone, bis 2, 6-difluoro-3-pyrrolophenyldicyclopentadienyl titanium, methyl benzoylformate, benzophenone, 4-methylbenzophenone, 4-phenylbenzophenone, 4-chlorobenzophenone, methyl benzoylbenzoate, ethyl 4-dimethylaminobenzoate, isooctyl p-dimethylaminobenzoate, methyl tert-butyl acetate, methyl ethyl p-dimethylaminobenzoate, methyl benzoate, ethyl p-dimethylaminobenzoate, ethyl p-ethyl ester, ethyl p-methyl benzoate, ethyl p-dimethylaminobenzoate, ethyl ester, p-dimethylaminobenzoate, p-ethyl ester, p-methyl benzoate, p-ethyl ester, p-methyl benzoate, p-ethyl ester, p-methyl benzoate, p-ethyl ester, p-methyl benzoate, p-ethyl ester, p-methyl ester, p-ethyl ester, p-methyl ester, p-ethyl ester, p-ethyl ester, p-p, One or more of 4,4' -bis (diethylamino) benzophenone, isopropyl thioxanthone, 2, 4-diethyl thioxanthone and 2-ethyl anthraquinone.

The kind of the assistant in the present invention is not particularly limited, and may be various additives conventionally used in the art, for example, one or more selected from a stabilizer, a polymerization inhibitor, an antioxidant, a flame retardant, a diluent, an adhesion promoter, a silane coupling agent, a dye, a pigment, an antifoaming agent, a leveling agent, and an ion scavenger.

The stabilizer is preferably one or more selected from liquid borate compounds, aluminum chelating agents and barbituric acid. Specific examples of the liquid borate compounds include, but are not limited to: 2,2 '-oxybis (5, 5' -dimethyl-1, 3, 2-oxahexaborane), trimethyl borate, triethyl borate, tri-n-propyl borate, triisopropyl borate, tri-n-butyl borate, pentyl borate, triallyl borate, trihexyl borate, tricyclohexyl borate, trioctyl borate, trinonyl borate, tridecyl borate, trihexadecyl borate, trioctadecyl borate, triphenyl borate, tricresyl borate, triethanolamine borate, and the like. The liquid boric acid ester compound is preferable because it is liquid at room temperature (25 ℃) and the viscosity of the complex is suppressed to be low. The aluminum chelate compound may be, for example, aluminum chelate compound A (available from Chuangmo Seiki chemical Co., Ltd.).

Specific examples of the polymerization inhibitor include, but are not limited to: one or more of hydroquinone, p-hydroxyanisole, p-benzoquinone, methyl hydroquinone, 2-tert-butyl hydroquinone, 2, 5-di-tert-butyl hydroquinone, 4-hydroxypiperidinol oxygen free radical, phenothiazine and anthraquinone.

In addition, the types of the antioxidant, the flame retardant, the diluent, the adhesion promoter, the silane coupling agent, the dye, the pigment, the defoamer, the leveling agent and the ion scavenger can be selected conventionally in the field, and can be known to those skilled in the art, and are not described herein again.

The photothermal dual curing resin composition provided by the invention can also comprise a filler. When the photothermal dual-curable resin composition is used as an adhesive or a sealant, if a filler is added thereto, the heat resistance, the moisture resistance, and particularly the heat cycle resistance of the bonded portion can be improved. The reason why the heat cycle resistance is improved by adding the filler is that the linear expansion coefficient of the cured product is reduced, that is, expansion-contraction of the cured product due to heat cycle is suppressed. The filler is not particularly limited as long as it has an effect of reducing the linear expansion coefficient, and specific examples thereof include, but are not limited to: at least one of silica, alumina, talc, calcium carbonate, glass microspheres, metal powder, and Polytetrafluoroethylene (PTFE).

The preparation method of the photo-thermal dual-curing resin composition provided by the invention comprises the following steps: under the condition of keeping out of the sun, stirring and mixing the epoxy resin, the polythiol compound, the acrylate resin, the free radical photoinitiator, the auxiliary agent and the optional filler for 0.5 to 2 hours at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to 0.1MPa, then adding the latent curing agent, stirring and mixing for 0.1 to 1 hour at the temperature of 20 to 30 ℃ and the vacuum degree of-0.05 to 0.1MPa, and immediately sealing and packaging in the absence of the sun.

The invention also provides application of the photo-thermal dual-curing resin composition as an adhesive or a sealant.

In a preferred embodiment, the adhesive is used for bonding of a sensor or a camera.

The present invention will be further described with reference to the following examples.

The raw materials and sources used in the following preparation examples are as follows: 5,5' -diallyl-2, 2' -biphenol available from Sahn's chemical technology (Shanghai) Inc. under the designation E100338; the catalyst benzyltriethylammonium chloride is sourced from Shanghai Tantake Technology Co., Ltd, and has the brand number of 65923B; NaOH is available from Shanghai Tantake Technique GmbH under the brand number G19852H; epichlorohydrin (ECH) was derived from Shandong Hai mechanical chemical Co., Ltd.

In the following examples and comparative examples, the parts of each raw material are parts by weight.

The raw materials and sources used in the following examples and comparative examples are as follows:

bisphenol A type epoxy resin selected from YD-128 of Korea KUKDO company, with an epoxy equivalent of 184-190 g/eq;

diallyl biphenyl diglycidyl ether selected from 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether prepared in preparation example 1, abbreviated as DADPDGE, having a total equivalent of epoxy and double bonds of 94.6g/eq and a structural formula shown in formula (iv):

bisphenol A epoxy monoacrylate is selected from EA-1010LC of Japan NK Oligo company, the epoxy equivalent is 412.5g/eq, and the structural formula is shown as the formula (V):

tris (3-mercaptopropyl) isocyanurate selected from Amitychem's TTTSH, having a thiol equivalent weight of 117g/eq and a structural formula shown in formula (vi):

trimethylolpropane tri (3-mercaptopropionate) selected from TMMP of SC (American society for expansion chemistry), having a thiol equivalent of 113g/eq and having a formula as shown in formula (VII):

a polyether polythiol selected from QE-340M, Toray corporation, Japan, having a thiol equivalent of 275g/eq and a formula represented by formula (VIII):

isosorbide diacrylate, selected from the group consisting of ISDA available from Sigma-Aldrich, having the formula (IX):

Tris (2-hydroxyethyl) isocyanurate triacrylate selected from SR368 from SARTOMER having the formula (X):

urethane acrylates selected from CN9001 NS from Sartomer corporation;

isobornyl acrylate (IBOA) selected from SR506NS from Sartomer company;

a latent curing agent selected from NOVACURE HXA-3922HP of asahi chemicals, japan;

the free radical photoinitiator is 2-hydroxy-2-methyl-1-phenyl acetone and diphenyl- (2,4, 6-trimethyl benzoyl) oxyphosphorus, which are respectively selected from Irgacure 1173 from BASF company and Omnirad TPO from IGM company;

the polymerization inhibitor is p-hydroxyanisole selected from MEHQ of Solvay company;

the stabilizer is triethyl borate selected from B0520 of TCI corporation of Japan;

the filler is fumed silica selected from AEROSIL R202 from Evonik corporation.

Preparation example 15 preparation of 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether

Dissolving 80g of 5,5 '-diallyl-2, 2' -biphenol in 1110.2g of epoxy chloropropane, stirring under the protection of inert gas until the 5,5 '-diallyl-2, 2' -biphenol is completely dissolved, adding 6.83g of benzyl triethyl ammonium chloride serving as a phase transfer catalyst, heating to 80 ℃, stirring under the protection of inert gas for reaction for 3 hours, dropwise adding 50 wt% of NaOH aqueous solution at the temperature of 80 ℃ for ring-closing reaction, filtering the reaction solution after 2 hours of reaction, distilling the filtrate under reduced pressure to remove redundant epoxy chloropropane, washing with water for three times, extracting with dichloromethane, adding anhydrous magnesium sulfate into the filtered organic phase to remove water, and distilling under reduced pressure to obtain a liquid light yellow final product, namely 103.8g of 5,5 '-diallyl-2, 2' -biphenol diglycidyl ether, wherein the yield is 91.3%.

IR spectrum of the 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether and¹the H-NMR chart is shown in FIG. 1 and FIG. 2, respectively. As can be inferred from the reaction principle in conjunction with fig. 1 and 2, the 5,5 '-diallyl-2, 2' -biphenyl diglycidyl ether has a structure represented by formula (iv):

example 1

Accurately weighing the raw materials according to the dosage of table 1, adding 2 parts of bisphenol A type epoxy resin (YD-128), 8 parts of diallyl biphenyl diglycidyl ether (DADPDGE), 10 parts of bisphenol A epoxy monoacrylate (EA-1010LC), 15 parts of polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH), 4 parts of isosorbide diacrylate (ISDA), 16 parts of tris (2-hydroxyethyl) isocyanurate triacrylate (SR368), 1 part of each of 2-hydroxy-2-methyl-1-phenyl acetone (Irgacure 1173) and diphenyl- (2,4, 6-trimethylbenzoyl) oxyphosphorous oxide (Omnirad TPO), 0.1 part of polymerization inhibitor p-hydroxy anisole (MEHQ), 0.3 part of stabilizer triethyl borate (B0520) and 2 parts of gas phase filler silicon dioxide (AEROSIL R202) into a dispersing and mixing device under dark conditions, controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, and stirring and mixing for 1 hour; then adding 3 parts of latent curing agent (NOVACURE HXA-3922HP), controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, stirring and mixing for 30 minutes, and immediately sealing and packaging in a dark place to obtain the photo-thermal dual-curing resin composition.

Example 2

Accurately weighing the raw materials according to the dosage of table 1, adding 4 parts of bisphenol A type epoxy resin (YD-128), 16 parts of diallyl biphenyl diglycidyl ether (DADPDGE), 20 parts of bisphenol A epoxy monoacrylate (EA-1010LC), 30 parts of polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH), 8 parts of isosorbide diacrylate (ISDA), 32 parts of tris (2-hydroxyethyl) isocyanurate triacrylate (SR368), 1 part of each of 2-hydroxy-2-methyl-1-phenyl acetone (Irgacure 1173) and diphenyl- (2,4, 6-trimethylbenzoyl) oxyphosphorous oxide (Omnirad TPO), 0.1 part of polymerization inhibitor p-hydroxy anisole (MEHQ), 0.3 part of stabilizer triethyl borate (B0520) and 2 parts of gas phase filler silicon dioxide (AEROSIL R202) into a dispersing and mixing device under dark conditions, controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, and stirring and mixing for 1 hour; then adding 3 parts of latent curing agent (NOVACURE HXA-3922HP), controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, stirring and mixing for 30 minutes, and immediately sealing and packaging in a dark place to obtain the photo-thermal dual-curing resin composition.

Example 3

Accurately weighing the raw materials according to the dosage of table 1, adding 3 parts of bisphenol A type epoxy resin (YD-128), 12 parts of diallyl biphenyl diglycidyl ether (DADPDGE), 15 parts of bisphenol A epoxy monoacrylate (EA-1010LC), 20 parts of polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH), 6 parts of isosorbide diacrylate (ISDA), 24 parts of tris (2-hydroxyethyl) isocyanurate triacrylate (SR368), 1 part of each of 2-hydroxy-2-methyl-1-phenyl acetone (Irgacure 1173) and diphenyl- (2,4, 6-trimethylbenzoyl) oxyphosphorous oxide (Omnirad TPO), 0.1 part of polymerization inhibitor p-hydroxy anisole (MEHQ), 0.3 part of stabilizer triethyl borate (B0520) and 2 parts of gas phase filler silicon dioxide (AEROSIL R202) into a dispersing and mixing device under dark conditions, controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, and stirring and mixing for 1 hour; then adding 3 parts of latent curing agent (NOVACURE HXA-3922HP), controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, stirring and mixing for 30 minutes, and immediately sealing and packaging in a dark place to obtain the photo-thermal dual-curing resin composition.

Example 4

Accurately weighing the raw materials according to the dosage of table 1, adding 2.5 parts of bisphenol A type epoxy resin (YD-128), 10 parts of diallyl biphenyl diglycidyl ether (DADPDGE), 13 parts of bisphenol A epoxy monoacrylate (EA-1010LC), 17.5 parts of polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH), 5 parts of isosorbide diacrylate (ISDA), 20 parts of tris (2-hydroxyethyl) isocyanurate triacrylate (SR368), 1 part of each of 2-hydroxy-2-methyl-1-phenyl acetone (Irgacure 1173) and diphenyl- (2,4, 6-trimethylbenzoyl) oxyphosphorus (Omnirad TPO), 0.1 part of polymerization inhibitor p-hydroxy anisole (MEHQ), 0.3 part of stabilizer triethyl borate (B0520) and 2 parts of filler fumed silica (AEROSIL R202) into a dispersing and mixing device under dark conditions, controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, and stirring and mixing for 1 hour; then adding 3 parts of latent curing agent (NOVACURE HXA-3922HP), controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, stirring and mixing for 30 minutes, and immediately sealing and packaging in a dark place to obtain the photo-thermal dual-curing resin composition.

Example 5

Accurately weighing the raw materials according to the dosage of table 1, adding 3.5 parts of bisphenol A type epoxy resin (YD-128), 14 parts of diallyl biphenyl diglycidyl ether (DADPDGE), 18 parts of bisphenol A epoxy monoacrylate (EA-1010LC), 25 parts of polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH), 7 parts of isosorbide diacrylate (ISDA), 28 parts of tris (2-hydroxyethyl) isocyanurate triacrylate (SR368), 1 part of each of 2-hydroxy-2-methyl-1-phenyl acetone (Irgacure 1173) and diphenyl- (2,4, 6-trimethylbenzoyl) oxyphosphorous acid (Omnirad TPO), 0.1 part of polymerization inhibitor Methyl Ether (MEHQ), 0.3 part of stabilizer triethyl borate (B0520) and 2 parts of filler fumed silica (AEROSIL R202) into a dispersing and mixing device under dark conditions, controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, and stirring and mixing for 1 hour; then adding 3 parts of latent curing agent (NOVACURE HXA-3922HP), controlling the temperature at 25 ℃, vacuumizing to-0.07 MPa, stirring and mixing for 30 minutes, and immediately sealing and packaging in a dark place to obtain the photo-thermal dual-curing resin composition.

Example 6

A photothermal dual-curable resin composition was prepared in the same manner as in example 3, except that diallyl biphenyl diglycidyl ether (DADPDGE) and bisphenol A epoxy monoacrylate (EA-1010LC) were each replaced with a bisphenol A-type epoxy resin having the same epoxy equivalent, and the other conditions were the same as in example 3.

Example 7

A photothermal dual-curable resin composition was prepared in the same manner as in example 3, except that isosorbide diacrylate (ISDA) and tris (2-hydroxyethyl) isocyanurate triacrylate were each replaced by the same weight part of urethane acrylate (CN9001 NS), and the remaining conditions were the same as in example 3, to obtain a photothermal dual-curable resin composition.

Comparative example 1

A photothermal dual-curable resin composition was prepared by following the procedure of example 3, except that the polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH) was replaced with the polythiol compound trimethylolpropane tris (3-mercaptopropionic acid) ester (TMMP) having the same thiol functional group equivalent, and the remaining conditions were the same as in example 3, to obtain a photothermal dual-curable resin composition.

Comparative example 2

A photothermal dual curable resin composition was prepared by following the procedure of example 3, except that the polythiol compound tris (3-mercaptopropyl) isocyanurate (TTTSH) was replaced with the polythiol compound polyether type polythiol (QE-340M) having the same thiol functional group equivalent, and the other conditions were the same as in example 3, to obtain a photothermal dual curable resin composition.

Comparative example 3

A photothermal dual-curable resin composition was prepared in the same manner as in example 3, except that isosorbide diacrylate (ISDA) and tris (2-hydroxyethyl) isocyanurate triacrylate were each replaced by the same weight part of isobornyl acrylate (IBOA), and the remaining conditions were the same as in example 3.

TABLE 1

Test example

(1) Hot bonding strength: respectively coating the photo-thermal dual-curing resin composition obtained in each example and each comparative example on a stainless steel sheet, overlapping and pressing the stainless steel sheets by using toughened glass sheets to manufacture a test sample, wherein the bonding area is 25.4mm multiplied by 5mm, and the thickness of a glue layer is ensured to be 0.1 mm; using an ultraviolet light source (365nm, light intensity 1000 mW/cm)²) Carrying out irradiation curing for 4 seconds, and then placing the sample in an oven at 80 ℃ for thermal curing for 60 minutes; pulling the two sheets apart in opposite directions by using a universal testing machine, testing under the condition that the environmental temperature is 85 ℃, and recording the measured force value by using strength (MPa); after the cured sample is treated under the conditions of heating and humidifying at 85 ℃/85% RH/120h, the shear bonding strength (MPa) of the sample is tested again under the condition that the ambient temperature is 85 ℃ and the result is recorded as shown in Table 2.

(2) Glass transition temperature (Tg): testing by using a Q-800 type dynamic thermomechanical analysis tester (DMA) of a American TA instrument, preparing the completely cured photothermal dual-cured resin composition into a film with the thickness of 42mm multiplied by 8mm multiplied by 0.3mm, and measuring the change rule of a loss factor (tan delta) along with the temperature in a liquid nitrogen atmosphere and a film stretching mode within the temperature range of-40 to 250 ℃, wherein the temperature rise rate is 10 ℃/min, the testing frequency is 10Hz, so that the glass transition temperature T of the cured photothermal dual-cured resin composition is determined_gIn degrees centigrade. The results are shown in Table 2.

(3) Water absorption: preparing a completely cured photo-thermal dual-curing resin composition into a sample with the size of 3mm multiplied by 1.5mm, weighing and recording the sample, immersing the sample into deionized water at the temperature of 100 ℃, and carrying out constant-temperature treatment for 2 hours; taking the sample out of the water, carefully absorbing the water attached to the surface of the sample by using filter paper, weighing the sample again and recording; the weight percentage increase of the sample before and after boiling was calculated as the water absorption (%). The results are shown in Table 2.

TABLE 2

As can be seen from the results in table 2, the epoxy resin system and the acrylic resin system are used in combination according to specific amounts, and the isocyanurate polythiol compound with unique rigid structure and multiple functionalities is used, so that the photo-thermal dual-curing resin composition obtained after curing has extremely high glass transition temperature and thermal bonding strength, and after heating and humidifying experiments, the photo-thermal dual-curing resin composition still can maintain most of the thermal bonding strength, reflecting that the photo-thermal dual-curing resin composition has excellent heat resistance, and the cured product has low water absorption and good moisture barrier property. As can be seen from the comparison of example 3 and example 6, after the conventional liquid bisphenol A epoxy resin is used to completely replace diallyl biphenyl diglycidyl ether and bisphenol A epoxy monoacrylate in example 6, the photo-thermal dual-curing resin composition still has the glass transition temperature of more than 97 ℃ and the thermal bonding strength of 5.76MPa after being cured, and after the heating and humidifying experiment, most of the hot bonding strength can be still maintained, which reflects that the adhesive still has better heat resistance, but the performance is reduced to a greater extent compared with the example 3, meanwhile, the water absorption of a cured product of the composition is increased to 5.12%, which shows that the heat resistance, the adhesive property and the moisture barrier property of the photo-thermal dual-curing resin composition are improved more favorably by matching the bisphenol A type epoxy resin, the diallyl biphenyl diglycidyl ether and the bisphenol A epoxy monoacrylate. As can be seen from the comparison of example 3 with example 7, when both the isosorbide diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate acrylate resins used in example 3 are replaced with conventional urethane acrylate resins, the photothermal dual-curing resin composition after curing has only a glass transition temperature of 68 ℃ and a thermal bonding strength of 5.12MPa, and still can maintain most of the thermal bonding strength after heating and humidifying experiments, but has a performance reduction to a greater extent than that of example 3, meanwhile, the water absorption of a cured product of the composition is increased to 5.15%, which shows that the combination of isosorbide diacrylate and tris (2-hydroxyethyl) isocyanuric acid triacrylate is more favorable for improving the heat resistance, the adhesive property and the moisture barrier property of the photo-thermal dual-curing resin composition. As can be seen from the comparison between example 3 and comparative examples 1-2, when the polythiol compound used in the present invention was replaced with trimethylolpropane tris (3-mercaptopropyl) isocyanurate or a polyether polythiol, the glass transition temperature of the photothermal dual cured resin composition after curing was greatly reduced, and the thermal bonding strength was also reduced to some extent, and it is particularly apparent that the thermal bonding strength of the composition after the heat and moisture test was reduced by more than 85%, indicating that the heat resistance and the wet heat resistance of the photothermal dual cured resin composition in comparative examples 1-2 were significantly inferior to those in example 3. From the comparison of example 3 with comparative example 3, it can be seen that, by replacing the acrylate resin containing at least two unsaturated carbon-carbon double bonds with a conventional monofunctional acrylate resin, although the glass transition temperature and water resistance can be maintained at good levels, the adhesive strength is too poor to meet the use requirements.

In conclusion, the epoxy resin system and the acrylate resin system are reasonably matched, and the hydrolysis-resistant isocyanate type polythiol compound with a unique structure is matched for use, so that the rapid UV light fixation and low-temperature rapid curing can be realized, the heat resistance, the humidity resistance and the thermal bonding strength of the cured resin composition are improved, and the water absorption rate of the resin composition is reduced.

The above embodiments are provided only for illustrating the present invention and not for limiting the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, and therefore all equivalent technical solutions should also fall within the scope of the present invention, and should be defined by the claims.