阅读说明：本技术 光掩模盒及其耐磨件 (Photomask box and wear-resisting piece thereof ) 是由 邱铭乾 盛剑平 于 2020-04-14 设计创作，主要内容包括：本发明提供了一种光掩模盒及其耐磨件,特别是一种具有耐磨件的光掩模盒。其中,该光掩模盒为一种大尺寸光掩模盒且为直立式,用以容置光掩模,主要包括一上盖体与一盒体,该盒体用以与该上盖体组合,形成一内部空间可容纳一光掩模。该盒体外设置有一导位块,该导位块可以协助导正盒体与上盖体的相对位置,该盒体内接触直立式光掩模的接触面设置有至少一卡槽,而该卡槽上设置有至少一耐磨组。其中,该耐磨组更包括一设置于卡槽上部的第一耐磨件以及一设置于该卡槽下部的第二耐磨件。(The invention provides a photomask box and a wear-resistant part thereof, in particular to a photomask box with a wear-resistant part. The photomask box is a large-size photomask box which is vertical and used for accommodating a photomask, and mainly comprises an upper cover body and a box body, wherein the box body is used for being combined with the upper cover body to form an inner space for accommodating the photomask. The box body is externally provided with a guide block which can assist in guiding the relative position of the box body and the upper cover body, the contact surface of the box body contacting the vertical photomask is provided with at least one clamping groove, and the clamping groove is provided with at least one wear-resistant group. The wear-resistant group further comprises a first wear-resistant part arranged on the upper portion of the clamping groove and a second wear-resistant part arranged on the lower portion of the clamping groove.)

1. A photomask cassette comprising:

an upper cover body;

a box body, which is matched with the upper cover body through at least one guide block and comprises a vertical space;

a plurality of slots, which are arranged in pairs on the vertical space;

the clamping groove is provided with a wear-resistant group;

this wear-resisting group includes:

the first wear-resistant part is arranged at one end of the clamping groove; and

and the second wear-resistant part is arranged at the other end of the clamping groove.

2. The photomask box of claim 1, wherein the upper cover and the box body are made of an electrostatic dissipation material.

3. The photomask box of claim 1, wherein the box body is further provided with a handle outside the box body, and the handle is arranged in pairs at symmetrical positions outside the box body.

4. The photomask box of claim 1, wherein a third inclined surface is disposed at the center of the clamping groove where the second wear-resistant member is connected.

5. The photomask box of claim 1, wherein the upper end of the clamping slot is further provided with at least one fixing member, and the at least one fixing member is correspondingly matched with at least one fixing member hole formed on the first wear-resistant member to connect the first wear-resistant member to the clamping slot.

6. The photomask box of claim 5, wherein each of the fixing members has a tapered portion that mates with each of the fixing member holes.

7. The photomask cassette of claim 1, wherein the first wear member is coupled to the cavity through at least one embedded member.

8. The utility model provides a wear-resisting group sets up on the plural slot that is equipped with in a base plate container, its characterized in that, this wear-resisting group includes:

the first wear-resistant part is arranged at one end of the clamping groove; and

and the second wear-resistant part is arranged at the other end of the clamping groove.

9. The wear pack of claim 8, wherein the upper end of the slot is further provided with at least one fastener, and the at least one fastener is correspondingly engaged with the at least one fastener hole formed on the first wear member to connect the first wear member to the slot.

10. The wear pack of claim 9, wherein the fastener has a tapered portion that mates with the fastener hole.

11. The wear pack of claim 8, wherein the first wear member is coupled to the slot by at least one embedded member.

12. The wear group of claim 8, wherein the first wear member further comprises a first chamfer.

13. The wear group of claim 8, wherein the second wear member further comprises a second chamfer.

14. The wear assembly of claim 8 or 13, wherein the second wear member further comprises at least one tenon portion.

Technical Field

The present invention relates to a photomask box, and more particularly, to a large-sized vertical photomask box with a wear-resistant member and a wear-resistant member thereof for preventing dust particles from contacting a photomask surface.

Background

In recent years, semiconductor technology has been rapidly developed, wherein Optical Lithography (Optical Lithography) plays an important role, and the definition of pattern (pattern) is required to depend on the Optical Lithography. In semiconductor applications, the optical lithography technology is to fabricate a designed circuit into a light-transmissive photomask (Reticle) with a specific shape. Using the exposure principle, a light source is projected through a photomask to a Silicon wafer (Silicon wafer) to expose and display a specific pattern. The photomask used to generate the pattern must be kept perfectly clean because any dust particles (e.g., particles, dust, or organics) attached to the photomask will degrade the quality of the projected image, wherein the purpose of the SMIF system is to reduce the excess particles experienced during storage and transport in the semiconductor manufacturing process.

According to the above technical concept, except for the exposure process, the wafer and the photomask must be placed in a carrier with high cleanliness, good gas tightness, low gas emission (evacuation) and anti-static discharge (ESD), such as a Cassette (case), a FOUP (FOUP), a FOSB (FOSB), a Mask storage box (Mask Package), and a photomask transfer box (RSP), so as to effectively prevent the wafer and the photomask from being contaminated, and ensure high cleanliness and high production yield of the wafer and the photomask.

Furthermore, due to the progress of the manufacturing process, when the semiconductor factory enters higher-level manufacturing processes, in addition to the electrostatic effect, the electromagnetic pulse (EMI) in the semiconductor factory may also cause damage to the wafer and the photomask, and especially when the wafer and the photomask are in a storage state, the change of the surrounding environment cannot be expected, so that it is also an important problem to prevent the wafer and the photomask from being damaged by the electrostatic Effect (ESD) and the electromagnetic pulse (EMI).

The wafer/photomask carrier of the prior art is usually laid down, because the contact area is large, a plurality of wear-resistant members, supporting members or pressing units are required to prevent the wafer or photomask and carrier from friction and collision, even dust particles (particles) are adhered due to friction or collision. In other words, it is an important issue to provide a wafer/photomask carrier with excellent antistatic effect, abrasion resistance and high cleanliness.

Disclosure of Invention

The present invention is directed to the problems encountered in the use of the wafer and photomask carriers, and an improvement and trial development thereof, and is to develop a wafer/photomask carrier, which can solve the inconvenience and trouble caused by the poor wear resistance of the conventional wafer/photomask carrier.

The invention provides a wear-resistant set, which is arranged on a plurality of clamping grooves arranged in a substrate container, and comprises: the first wear-resistant part is arranged at one end of the clamping groove; and the second wear-resistant part is arranged at the other end of the clamping groove.

Under the foregoing concept, the present invention further provides a photomask case, comprising: an upper cover body; a box body matched with the upper cover body, wherein the box body comprises an upright space for accommodating at least one photomask; at least one guide block is arranged outside the box body, and the guide block can assist in guiding the relative position of the box body and the upper cover body; a plurality of slots, which are arranged in pairs on the vertical space; the clamping groove is provided with a wear-resistant group; this wear-resisting group includes: the first wear-resistant part is arranged at one end of the clamping groove; and the second wear-resistant part is arranged at the other end of the clamping groove.

The foregoing summary of the invention is provided to introduce a basic description of various aspects and features of the present invention. This summary is not an extensive overview of the invention, and is intended to neither identify key or critical elements of the invention nor delineate the scope of the invention, but to present some concepts of the invention in a simplified form.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.

Fig. 1 is an external view schematically showing an embodiment of the present invention.

Figure 2 is a schematic view of a photomask and photomask cassette according to embodiments of the invention.

Fig. 3 is a schematic view of a card slot and a wear-resistant set according to an embodiment of the invention.

Fig. 4 is a schematic view of a first wear part of an embodiment of the invention.

Fig. 5 is a schematic diagram of the connection with the card slot according to the embodiment of the present invention.

Fig. 6 is a side view of the first wear member in connection with the channel in an embodiment of the present invention.

Fig. 7 is a schematic view of a second wear part according to an embodiment of the invention.

Fig. 8 is a schematic view of the second wear-resistant member and the locking groove according to the embodiment of the invention.

Fig. 9 is a schematic view of the second wear-resistant member and the locking groove according to the embodiment of the invention.

[ notation ] to show

Photomask box … 3

Photomask … 5

Upper cover … 310

Box … 320

Guide block … 3210

Card slot … 3220

Third inclined surface … 3221

Handle … 3230

Buried member … 400

Wear group … 4

First wear part … 410

First inclined surface … 4110

Second wear part … 420

First tenon portion … 4210

Second tenon … 4220

Third tenon … 4230

Second inclined surface … 4240

Fastening … 430

Fastener holes … 431

The implementation, functional features and advantages of the objects of the present invention will be further explained with reference to the accompanying drawings.

Detailed Description

In order to understand the technical features and practical effects of the present invention and to implement the invention according to the content of the specification, the preferred embodiment as shown in the drawings is further described in detail as follows:

referring to fig. 3, fig. 3 is a schematic view of a card slot and a wear-resistant set according to an embodiment of the invention. In the embodiment of fig. 3, a wear group 4 is provided to be arranged in a substrate container. The substrate container may be a photomask cassette 3 (i.e., a photomask carrier) as shown in fig. 1 of the present application; or a Substrate Carrier (Substrate Carrier) for carrying a Substrate (Substrate) such as a wafer.

The photomask carrier may be a photomask storage box (Mask Package), a photomask transfer box (RSP), an extreme ultraviolet photomask box (EUV Pod), or the like; the substrate carrier may be a Cassette, a FOUP, or a FOSB, and the invention is not limited thereto.

Therefore, in the present embodiment, the wear-resistant set 4 is implemented on the premise that a substrate container is provided, and the substrate container includes an accommodating space. In the accommodating space, a plurality of slots 3220 are disposed in pairs on the accommodating space. Meanwhile, one end (generally, an opening end into which a semiconductor plate-shaped wafer such as a photomask or a wafer is placed) of each of the clamping grooves 3220 is correspondingly provided with a first wear-resistant member 410; and the other end is provided with a second wear member 420. In order to clearly understand the concept of the present invention, the photo mask box 3 is taken as a more precise embodiment of the present invention, so as to explain possible embodiments of the substrate container, the clamping groove 3220, the first wear-resistant member 410 and the second wear-resistant member 420.

Referring to fig. 1, an appearance of the wear-resistant assembly 4 according to the embodiment of the invention is schematically shown in fig. 1. The present embodiment provides a photo mask cassette 3. Furthermore, the photomask box 3 is a large-sized photomask box designed to accommodate a large-sized photomask. Generally, large-sized photomasks are typically specified in the panel industry, and can be as wide as 800 mm to 960 mm, and thus cannot be transported or stored in a conventional small-sized photomask box; a specially-sized photomask box must be used.

Accordingly, in view of the storage or handling characteristics of the large-sized photomask, the present embodiment accommodates the photomask 5 in an upright manner; therefore, the accommodating space of the photomask case 3 is an upright space formed in an upright manner. The mask box 3 of this embodiment mainly comprises an upper cover 310 and a box 320, wherein the box 320 is used to cooperate with the upper cover 310 to form an upright space for accommodating the mask 5 (see fig. 2). As shown in fig. 1, in the present embodiment, the large-sized photo mask box 3 is made of an integrally formed transparent material. Preferably, the material may be a resin material with electrostatic dissipation, such as Acrylonitrile Butadiene Styrene (ABS).

In addition, referring to fig. 1 and fig. 2, a guiding block 3210 is disposed on the upper edge of the box 320, and the guiding block 3210 can help guide the relative position of the box 320 and the upper cover 310 when they are engaged, so that the upper cover 310 can be sealed at a correct angle when it is closed, and the sealing degree between the upper cover 310 and the box 320 is more stable. In other possible embodiments, the guiding block 3210 may further use an airtight rubber strip design, which has better structural strength and sealing performance, and avoids particle contamination during transportation. In this embodiment, two handles 3230 are further disposed outside the box 320, and are disposed at symmetrical positions outside the box 320 in pairs to assist in carrying the photomask box 3; at least two engaging grooves 3220 are further disposed on the contact surface of the box 320 contacting the vertical photomask 5. In one preferred embodiment, as shown in FIG. 2, a plurality of slots 3220 are disposed in parallel on the sides of photomask 5 within photomask cassette 3 that contact the edges of photomask 5, so that photomask 5 may be placed in upright position within photomask cassette 3 in parallel arrangement within photomask cassette 3, reducing the chance of particles being generated by direct rubbing against the interior walls of photomask cassette 3.

Referring to fig. 3, at least one wear-resistant set 4 is disposed on the slot 3220. In one embodiment, the wear assembly 4 includes a first wear-resistant member 410 and a second wear-resistant member 420 respectively disposed at the upper and lower ends of the slot 3220. Further, reference may be made to fig. 9. In this embodiment, a third inclined plane 3221 is disposed at a center of the card slot 3220 connected to the second wear-resistant member 420, so that the photo mask 5 can be guided into the card slot 3220 at a correct angle when being placed in the photo mask box, and friction is reduced. In addition, the material of the first wear-resistant member 410 and the material of the second wear-resistant member 420 can be a combination of high heat-resistant engineering plastics and carbon nanotubes.

In the present embodiment, please refer to fig. 4 for a schematic view of the first wear-resistant member 410, and fig. 7 for a schematic view of the second wear-resistant member 420. Wherein, the material of the first wear-resistant member 410 or the second wear-resistant member 420 can be a combination of high heat-resistant engineering plastic and carbon nanotubes. In a preferred embodiment, referring to fig. 5, the first wear-resistant member 410 is installed on the slot 3220 by insert molding or by fitting the fixing member 430 and the fixing member hole 431 into each other.

Furthermore, in one embodiment, if the first wear-resistant member 410 is fixed on the slot 3220 by insert molding, the first wear-resistant member 410 further includes an embedded member 400, and the slot 3220 is connected to the first wear-resistant member 410 through the embedded member 400. As shown in fig. 5, wherein the buried member 400 may be a weight insert. For example, the buried member 400 is provided to provide a heavier downward pressure to the first wear member 410. Accordingly, the embedded member 400 of the present embodiment may be a metal insert such as a wrapped screw or a copper column of a screw, which is mainly used to increase the connection interface between the slot 3220 and the first wear-resistant member 410. In this embodiment, if the first wear-resistant member 410 is fixed on the slot 3220 in an embedded manner, the slot 3220 further includes at least one fixing member 430, so that the first wear-resistant member 410 is fixed on the slot 3220. In the present embodiment, the number of the fixing members 430 is two, and each fixing member 430 has a tapered portion. The tapered portion is fixed and engaged with the fixing hole 431 of the first wear-resistant member 410. For example, the fixing element 430 may be a protruding taper portion that is simply formed integrally with the upper end of the slot 3220; or additional pins, rivets, or screws, etc., the present invention is not limited thereto.

In this embodiment, the first wear-resistant member 410 can be mounted at a correct position by the tapered portion of the fixing member 430 and the fixing member hole 431 designed corresponding to the tapered portion. In other words, if the user installs the first wear-resistant member 410 upside down, the tapered portion of the fixing member 430 cannot be fitted into the fixing member hole 431, and thus the user will immediately perceive that the installation position is incorrect. Therefore, the fitting design between the fixing hole 431 and the tapered portion of the fixing member 430 has a fool-proof effect, thereby simplifying the assembly of the photomask case 3.

Please refer to fig. 4, fig. 6, fig. 7, fig. 8 and fig. 9. In this embodiment, the contact surface of the first wear-resistant member 410 contacting the photomask 5 is a first inclined surface 4110; the contact surface of the second wear-resistant member 420 and the photomask 5 is a second inclined surface 4240, and the first inclined surface 4110 and the second inclined surface 4240 function similarly to the third inclined surface 3221, so that the photomask 5 can be guided at a correct angle and possible friction and collision can be reduced when the photomask 5 is placed in the clamping groove 3220 in the photomask box 3. In addition, as shown in fig. 7, in order to fix the second wear-resistant member 420 to the lower end of the locking groove 3220, the second wear-resistant member 420 further includes at least one locking tongue portion. For the embodiment, the second wear-resistant member 420 is provided with a first tenon portion 4210, a second tenon portion 4220 and a third tenon portion 4230, so that the second wear-resistant member 420 can be adapted and inserted into the lower end of the slot 3220 at a correct angle, thereby further achieving the fool-proof effect during installation.

However, the above description is only a preferred embodiment of the present invention, and the scope of the present invention should not be limited thereby, and the invention is not limited by the claims and the description of the simple changes and modifications.