Measuring device and method for ceramic column support height based on adjustable plane and application

文档序号:358174 发布日期:2021-12-07 浏览:11次 中文

阅读说明:本技术 基于可调平面的陶瓷柱支撑高度的测量装置、测量方法及应用 (Measuring device and method for ceramic column support height based on adjustable plane and application ) 是由 安超 田晓明 于 2020-06-02 设计创作,主要内容包括:本发明公开了一种基于可调平面的陶瓷柱支撑高度的测量装置、测量方法及应用,其中,所述测量装置和测量方法利用归零基准件可以对测量基准件进行归零,之后,将该测量基准件配合放置于加热盘上,通过调节调节装置,并使千分表的读数相同,可以使基准底面与接触面平行,之后,通过测量件即可以所述基准底面为参考面来测量加热盘上的陶瓷柱的支撑高度,获得所述支撑高度后,通过调节所述支撑高度,可以保证各陶瓷柱相对基准底面的支撑高度一致,进而使其与晶圆较好接触,降低晶圆表面成膜厚差异,提高晶圆良品率。(The invention discloses a measuring device and a measuring method for ceramic column supporting height based on an adjustable plane and application thereof, wherein the measuring device and the measuring method can zero a measuring reference part by utilizing the zeroing reference part, then the measuring reference part is placed on a heating plate in a matching way, reading of a dial indicator is enabled to be the same by adjusting an adjusting device, a reference bottom surface can be enabled to be parallel to a contact surface, then the supporting height of a ceramic column on the heating plate can be measured by taking the reference bottom surface as a reference surface through the measuring part, after the supporting height is obtained, the supporting height of each ceramic column relative to the reference bottom surface can be ensured to be consistent by adjusting the supporting height, so that the ceramic column can be in better contact with a wafer, the difference of the thickness of the surface of the wafer is reduced, and the yield of the wafer is improved.)

1. Measuring device based on adjustable planar ceramic post support height, wherein, the ceramic post sets up on heating plate (4), the periphery of heating plate (4) is provided with the first annular step face of fine processing, its characterized in that includes: the device comprises a return-to-zero reference part (1), a measurement reference part (2) and a measurement part (3), wherein the return-to-zero reference part (1) is used for providing a reference plane (11) for the measurement reference part (2), the measurement reference part (2) comprises a reference bottom surface (21), an adjusting device (22) and dial indicators (23), the adjusting device (22) and the dial indicators (23) are 3, the dial indicators (23) are fixed on the reference bottom surface (21) and are uniformly distributed on a circle taking the center of the reference bottom surface (21) as the circle center, the adjusting device (22) and the dial indicators (23) are correspondingly arranged on the reference bottom surface (21) one by one and are positioned on the radius of the same reference circle, when the measurement reference part (2) is cooperatively placed on the return-to-zero reference part (1), the reference bottom surface (21) is parallel to the reference plane (11) provided by the return-to-zero reference part (1), and measuring heads of the dial indicators (23) are contacted with the reference plane (11), when the measuring reference part (2) is placed on the first annular step surface of the heating plate (4) in a matched mode, the distance between the reference bottom surface (21) and a contact surface can be adjusted through the adjusting device (22), the contact surface is a plane formed by three points which are located on the heating plate (4) and are in contact with a measuring head of a dial indicator (23), the reference bottom surface (21) can be adjusted to be parallel to the contact surface through the reading of the dial indicator (23), and the measuring part (3) can be vertically placed on the reference bottom surface (21) and used for measuring the supporting height of the ceramic column on the heating plate (4) by taking the reference bottom surface (21) as a reference surface.

2. The adjustable plane based ceramic post support height measuring device according to claim 1, wherein: the return-to-zero reference piece (1) further comprises a second annular step surface (12) for finish machining, the second annular step surface (12) is parallel to the reference plane (11), a plurality of placing seats (211) with the same height are fixedly arranged below the reference bottom surface (21), and the placing seats (211) can be placed on the first annular step surface and the second annular step surface (12) in a matched mode.

3. The adjustable plane based ceramic post support height measuring device according to claim 2, wherein: the number of the placing seats (211) is 3, and the adjusting devices (22) are in one-to-one correspondence with the placing seats (211) and are in threaded connection.

4. The adjustable plane based ceramic post support height measuring device according to claim 1, wherein: the measuring reference part (2) further comprises a connecting piece (24), and the connecting piece (24) is fixedly connected with the dial indicator (23) and fixedly connected to the reference bottom surface (21) through bolts.

5. The adjustable plane based ceramic post support height measuring device according to claim 1, wherein: the measuring piece (3) is a dial indicator, the dial indicator is fixed on the supporting seat (31), and the bottom of the supporting seat (31) is in surface contact with the upper surface of the reference bottom surface (21).

6. The adjustable plane based ceramic post support height measuring device according to claim 5, wherein: and a measuring through hole matched with the ceramic column on the heating plate (4) is arranged on the reference bottom surface (21).

7. The method for measuring the supporting height of the ceramic column based on the adjustable plane is characterized in that the device for measuring the supporting height of the ceramic column based on the adjustable plane according to any one of claims 1 to 6 is utilized, and comprises the following steps:

the measurement reference part (2) is placed on the return-to-zero reference part (1) in a matching mode, a reference bottom surface (21) is parallel to a reference plane (11), and at the moment, each dial indicator (23) is returned to zero;

the measuring reference piece (2) is placed on the heating plate (4) in a matching mode, the adjusting device (22) is adjusted until the readings of all dial indicators (23) are the same, and at the moment, the reference bottom surface (21) is parallel to the contact surface;

and the supporting height of each ceramic column on the heating plate (4) relative to the reference bottom surface (21) is obtained by using the measuring piece (3).

8. The application of the method for measuring the supporting height of the ceramic column based on the adjustable plane in the adjustment of the consistency of the supporting height of the ceramic column is characterized by comprising the following steps of:

obtaining the supporting height of each ceramic column relative to the reference bottom surface by using the method for measuring the supporting height of the ceramic columns based on the adjustable plane according to claim 7;

and adjusting the supporting height of each ceramic column relative to the reference bottom surface to be the same.

Technical Field

The invention relates to the field of semiconductor manufacturing equipment manufacturing, and particularly provides a device and a method for measuring the supporting height of a ceramic column based on an adjustable plane, and an application of the device and the method.

Background

In the field of semiconductor manufacturing, wafers are often coated or etched by placing them on a heating plate. To reduce contact between the bottom surface of the wafer and the surface of the heater plate to reduce contact particles (MCA), ceramic posts are often embedded in the aluminum heater plate to keep the wafer a small distance from the surface of the heater plate. In the process state, if the heights of the embedded ceramic columns for supporting the wafer are not equal, the distance from the upper polar plate or the distribution of a plasma field can be influenced, so that the thickness of a film on the surface of the wafer is different, and the yield of the wafer is influenced.

Aiming at the problem of different heights of the ceramic columns for supporting the wafers, the surface of the heating plate is mostly used as a measuring reference surface at the present stage, and the height of each ceramic column is measured independently as the supporting height of the ceramic column.

Therefore, how to ensure the comparability of the supporting height of the ceramic column becomes a problem to be solved urgently.

Disclosure of Invention

In view of this, the present invention provides a device, a method and an application for measuring the supporting height of a ceramic column based on an adjustable plane, so as to solve the problem that the comparability of the supporting height between the ceramic columns is poor due to the fact that the reference planes for measuring the height of the ceramic column cannot be guaranteed to be the same plane in the prior art.

The invention provides a measuring device for the supporting height of a ceramic column based on an adjustable plane, wherein the ceramic column is arranged on a heating plate, the periphery of the heating plate is provided with a first annular step surface which is finely processed, and the measuring device comprises: the measurement device comprises a zeroing reference part, a measurement reference part and a measurement part, wherein the zeroing reference part is used for providing a reference plane for the measurement reference part, the measurement reference part comprises a reference bottom surface, an adjusting device and dial indicators, the adjusting device and the dial indicators are all 3, the dial indicators are fixed on the reference bottom surface and are uniformly distributed on a circle with the center of the reference bottom surface as the circle center, the adjusting device and the dial indicators are arranged on the reference bottom surface in a one-to-one correspondence manner and are positioned on the radius of the same reference circle, when the measurement reference part is placed on the zeroing reference part in a matching manner, the reference bottom surface is parallel to the reference plane provided by the zeroing reference part, a measuring head of the dial indicator is contacted with the reference plane, when the measurement reference part is placed on a first annular step surface of the heating plate in a matching manner, the distance between the reference bottom surface and the contact surface can be adjusted through the adjusting device, the contact surface is a plane formed by three points which are positioned on the heating plate and are in contact with a measuring head of the dial indicator, the reference bottom surface can be adjusted to be parallel to the contact surface through the reading of the dial indicator, and the measuring piece can be vertically placed on the reference bottom surface and is used for measuring the supporting height of the ceramic column on the heating plate by taking the reference bottom surface as a reference surface.

Preferably, the zero-return reference part further comprises a second annular step surface which is subjected to finish machining, the second annular step surface is parallel to the reference plane, a plurality of placing seats with the same height are fixedly arranged below the reference bottom surface, and the placing seats can be placed on the first annular step surface and the second annular step surface in a matched mode.

Further preferably, the number of the placing seats is 3, and the adjusting devices are in one-to-one correspondence with the placing seats and are in threaded connection with the placing seats.

Further preferably, the measuring reference part further comprises a connecting piece, and the connecting piece is fixedly connected with the dial indicator and fixedly connected to the reference bottom surface through a bolt.

Preferably, the measuring part is a dial indicator, the dial indicator is fixed on the supporting seat, and the bottom of the supporting seat is in surface contact with the upper surface of the reference bottom surface.

Further preferably, the reference bottom surface is provided with a measuring through hole matched with the ceramic column on the heating plate.

The invention also provides a method for measuring the supporting height of the ceramic column based on the adjustable plane, which utilizes the device for measuring the supporting height of the ceramic column based on the adjustable plane and comprises the following steps:

the measurement reference part is placed on the zeroing reference part in a matching mode, the bottom surface of the reference part is parallel to the reference plane, and at the moment, each dial indicator is zeroed;

the measuring reference piece is placed on the heating plate in a matched mode, the adjusting device is adjusted until the readings of all dial indicators are the same, and at the moment, the reference bottom surface is parallel to the contact surface;

and obtaining the supporting height of each ceramic column on the heating plate relative to the reference bottom surface by using the measuring piece.

The invention also provides an application of the method for measuring the supporting height of the ceramic column based on the adjustable plane in the adjustment of the consistency of the supporting height of the ceramic column, which comprises the following steps:

obtaining the supporting height of each ceramic column relative to the reference bottom surface by using the method for measuring the supporting height of the ceramic columns based on the adjustable plane;

and adjusting the supporting height of each ceramic column relative to the reference bottom surface to be the same.

According to the device and the method for measuring the supporting height of the ceramic columns based on the adjustable plane, the zeroing reference piece is utilized to perform zeroing on the measuring reference piece, then the measuring reference piece is placed on the heating plate in a matched mode, the bottom surface of the reference piece can be adjusted to be parallel to the contact surface by adjusting the adjusting device and matching with the dial indicator, then the supporting height of the ceramic columns on the heating plate can be measured by the measuring piece by taking the bottom surface of the reference piece as a reference surface, after the supporting height is obtained, the supporting height of each ceramic column relative to the bottom surface of the reference piece can be guaranteed to be consistent by adjusting the supporting height, so that the ceramic columns can be in better contact with a wafer, the difference of the thickness of the surface of the wafer is reduced, and the yield of the wafer is improved.

The device for measuring the supporting height of the ceramic columns based on the adjustable plane has a simple structure and is simple to operate, the supporting height of the ceramic columns is measured based on one plane, the problems that in the prior art, the thickness of a wafer film is different and the yield of the wafer is low due to the fact that the height of the ceramic columns is directly measured as the supporting height of the ceramic columns by taking the surface of a heating plate as a measuring reference surface are solved, the device for measuring the supporting height of the ceramic columns is utilized to increase the comparability of the height among the ceramic columns, the supporting height among the ceramic columns can be further adjusted, and the height consistency is ensured.

The device and the method for measuring the supporting height of the ceramic column based on the adjustable plane can also be used for measuring the relative height of concave and convex points on the plane, and the height is measured based on the reference bottom surface, so that errors caused by the concave and convex surfaces can be avoided, and the test result has better contrast.

Drawings

The invention is described in further detail below with reference to the following figures and embodiments:

FIG. 1 is an exploded view of an adjustable plane based ceramic post support height measurement device provided by the present invention;

FIG. 2 is a schematic structural view of a measuring member;

FIG. 3 is a view showing a state in which a measuring reference member is placed on a return-to-zero reference member;

fig. 4 is a diagram showing a state in which the supporting height of the ceramic column on the heating plate is measured by using the measuring reference member and the measuring member.

Detailed Description

The invention will be further explained with reference to specific embodiments, without limiting the invention.

As shown in fig. 1 to 4, in one aspect, the present invention provides an adjustable plane-based ceramic column support height measuring apparatus, wherein the ceramic column is disposed on a heating plate 4, and a first annular step surface is disposed on an outer circumference of the heating plate 4, the measuring apparatus comprising: the measurement device comprises a return-to-zero reference part 1, a measurement reference part 2 and a measurement part 3, wherein the return-to-zero reference part 1 is used for providing a reference plane 11 for the measurement reference part 2, the measurement reference part 2 comprises a reference bottom surface 21, an adjusting device 22 and dial indicators 23, the adjusting device 22 and the dial indicators 23 are 3 in number, the dial indicators 23 are fixed on the reference bottom surface 21 and are uniformly distributed along a circle with the center of the reference bottom surface 21 as the center of the circle, the adjusting device 22 and the dial indicators 23 are correspondingly arranged on the reference bottom surface 21 one by one and are positioned on the radius of the same reference circle, when the measurement reference part 2 is placed on the return-to-zero reference part 1 in a matching manner, the reference bottom surface 21 is parallel to the reference plane 11 provided by the return-to-zero reference part 1, a measuring head of the dial indicator 23 is contacted with the reference plane 11, when the measurement reference part 2 is placed on a first annular step surface of the heating plate 4 in a matching manner, the distance between the reference bottom surface 21 and a contact surface, which is a plane formed by three points that are located on the heating plate 4 and are in contact with a measuring head of the dial indicator 23, can be adjusted to be parallel to the contact surface by reading of the dial indicator 23, and the measuring part 3 can be vertically placed on the reference bottom surface 21 and is used for measuring the supporting height of the ceramic column on the heating plate 4 by using the reference bottom surface 21 as a reference surface.

This measuring device based on adjustable planar ceramic post support height utilizes the benchmark spare of zeroing to carry out zeroing to the benchmark spare of measuring, later, places this benchmark spare of measuring cooperation on the heating plate to through adjusting device to the amesdial of cooperation can be transferred basic reference bottom surface and contact surface and be parallel, later, can use through the measuring part the basic reference bottom surface is the support height of the ceramic post on the heating plate of measuring as the reference surface.

As a modification of the technical solution, as shown in fig. 1, the zeroing reference member 1 further includes a second annular step surface 12 that is finished, the second annular step surface 12 is parallel to the reference plane 11, a plurality of placing seats 211 with the same height are fixedly disposed below the reference bottom surface 21, and the placing seats 211 can be placed on the first annular step surface and the second annular step surface 12 in a matching manner.

As the improvement of the technical scheme, the number of the placing seats 211 is 3, and the adjusting devices 22 are in one-to-one correspondence with the placing seats 211 and are in threaded connection with the placing seats 211.

As a modification of the technical solution, as shown in fig. 1, 3, and 4, the measurement reference member 2 further includes a connecting member 24, and the connecting member 24 is fixedly connected to the dial indicator 23 and fixedly connected to the reference bottom surface 21 by a bolt.

As a modification of the technical solution, as shown in fig. 2, the measuring part 3 is a dial indicator, the dial indicator is fixed on the supporting seat 31, and the bottom of the supporting seat 31 contacts with the upper surface of the reference bottom surface 21.

As an improvement of the technical scheme, the reference bottom surface 21 is provided with measuring through holes matched with the ceramic columns on the heating plate 4, and the supporting height of each ceramic column relative to the reference bottom surface can be measured through the measuring through holes.

The invention also provides a method for measuring the supporting height of the ceramic column based on the adjustable plane, which utilizes the device for measuring the supporting height of the ceramic column based on the adjustable plane and comprises the following steps:

s1: the measurement reference part 2 is arranged on the return-to-zero reference part 1 in a matching mode, the reference bottom surface 21 is parallel to the reference plane 11, and at the moment, each dial indicator 23 is returned to zero;

s2: the measuring reference piece 2 is placed on the heating plate 4 in a matching mode, the adjusting device 22 is adjusted until the readings of all the dial indicators 23 are the same, and at the moment, the reference bottom surface 21 is parallel to the contact surface;

s3: the supporting height of each ceramic column on the heating plate 4 relative to the reference bottom surface is obtained by using the measuring part 3.

According to the method for measuring the supporting height of the ceramic columns based on the adjustable plane, the measuring device is utilized, firstly, the zeroing reference part is utilized to perform zeroing on the measuring reference part, then, the measuring reference part is placed on the heating plate in a matched mode, reading numbers of all dial indicators are the same through adjusting the adjusting device and matching with the dial indicators, the reference bottom face and the contact face can be adjusted to be parallel, and finally, the measuring part can be utilized to measure the supporting height of all the ceramic columns on the heating plate based on the reference bottom face.

The invention also provides an application of the method for measuring the supporting height of the ceramic column based on the adjustable plane in the adjustment of the consistency of the supporting height of the ceramic column, which comprises the following steps:

obtaining the supporting height of each ceramic column relative to the reference bottom surface by using the method for measuring the supporting height of the ceramic columns based on the adjustable plane;

and adjusting the supporting height of each ceramic column relative to the reference bottom surface to be the same.

After the supporting height is obtained, the supporting height of each ceramic column relative to the reference bottom surface can be guaranteed to be consistent through adjusting the supporting height, so that the ceramic columns can be in good contact with the wafer, the difference of the thickness of the formed film on the surface of the wafer is reduced, and the yield of the wafer is improved.

The embodiments of the present invention have been written in a progressive manner with emphasis placed on the differences between the various embodiments, and similar elements may be found in relation to each other.

The embodiments of the present invention have been described in detail with reference to the drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.

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