阅读说明：本技术 阴极电弧引弧装置 (Cathode arc striking device ) 是由 西格弗里德·克拉斯尼策 于尔格·哈格曼 安德烈亚斯·彼得·特雷霍尔茨 多米尼克·埃尔温·威德默 于 2019-12-20 设计创作，主要内容包括：一种用于将靶材阴极电弧沉积到基材上的引弧装置,该引弧装置包括触发指,其活动布置在接触位置与静止位置之间,其中在该接触位置中该触发指能物理接触相邻靶的侧表面,而在该静止位置中相邻靶不能被该触发指接触,其中在靶材的阴极电弧沉积期间,该触发指如此活动布置为在所述接触位置与静止位置之间,即,能将该触发指在靶材阴极电弧沉积期间被沉积的靶材污染减至最小。(An arc ignition device for cathodic arc deposition of a target onto a substrate, the arc ignition device comprising a trigger finger movably arranged between a contact position in which the trigger finger is able to physically contact a side surface of an adjacent target and a rest position in which the adjacent target is not able to be contacted by the trigger finger, wherein during cathodic arc deposition of the target the trigger finger is movably arranged between said contact position and the rest position in such a way that contamination of the trigger finger with the deposited target during cathodic arc deposition of the target is minimized.)