阅读说明：本技术 一种离线高透净色低辐射可钢镀膜玻璃及其制造方法 (Off-line high-transmittance clean-color low-radiation steel-coated glass and manufacturing method thereof ) 是由 章余华 张波 朱海勇 程晓瑜 任建林 熊平 于 2020-12-11 设计创作，主要内容包括：本发明公开了一种离线高透净色低辐射可钢镀膜玻璃,包括第一玻璃基片和第二玻璃基片,所述第一玻璃片上依次溅射第一氮化硅SiNx、第一氧化锌铝ZnAlOx和第一氮铝硅SiAlNx、金属银、第二氮铝硅SiAlNx、第二氧化锌铝ZnAlOx、第二氮化硅SiNx,然后将第二玻璃基片热压在第二氮化硅SiNx上,在上述玻璃层一周涂刷高温液态玻璃溶液进行封边,然后离线钢化,制造方法采用高真空磁控溅射镀膜设备进行逐层溅射镀膜。本发明将溅射层设置在夹层玻璃之间,提高了溅射层的使用寿命,不仅能有效隔离辐射,还能具备对自然光的高透过率,透过率为85.2-87.3％。(The invention discloses off-line high-transmittance clear-color low-radiation toughened coated glass which comprises a first glass substrate and a second glass substrate, wherein the first glass substrate is sputtered with first silicon nitride SiNx, first zinc aluminum oxide ZnAlOx, first aluminum silicon nitride SiAlNx, metallic silver, second aluminum silicon nitride SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx in sequence, then the second glass substrate is hot-pressed on the second silicon nitride SiNx, high-temperature liquid glass solution is coated on the periphery of the glass layer for edge sealing, then off-line tempering is carried out, and high-vacuum magnetron sputtering coating equipment is adopted for carrying out layer-by-layer sputtering coating in the manufacturing method. The sputtering layer is arranged between the laminated glass, so that the service life of the sputtering layer is prolonged, the radiation can be effectively isolated, and the high transmittance of natural light is realized, wherein the transmittance is 85.2-87.3%.)

1. An off-line high-transmittance clean-color low-emissivity steel-coated glass is characterized in that: the high-temperature liquid glass edge sealing device comprises a first glass substrate and a second glass substrate, wherein the first glass substrate is sputtered with first silicon nitride SiNx, first zinc aluminum oxide ZnAlOx, first aluminum silicon nitride SiAlNx, metal silver, second aluminum silicon nitride SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx in sequence, then the second glass substrate is hot-pressed on the second silicon nitride SiNx, a high-temperature liquid glass solution is coated on the periphery of the glass layer for edge sealing, and then offline tempering is carried out.

2. The off-line high-transmittance clear-color low-emissivity coated glass according to claim 1, wherein: the thicknesses of the first glass substrate and the second glass substrate are respectively 3-4mm and 1-2 mm; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 30-50nm, 10-20nm and 15-20nm, the thickness of the metal silver is 10-20nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 20-30nm, 15-25nm and 40-60 nm.

3. The off-line high-transmittance clear-color low-emissivity coated glass according to claim 2, wherein: the thicknesses of the first glass substrate and the second glass substrate are respectively 3mm and 2 mm; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 40nm, 15nm and 18nm, the thickness of the metal silver is 15nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 25nm, 20nm and 50 nm.

4. A manufacturing method of off-line high-transmittance clean-color low-radiation steel-coated glass is characterized by comprising the following steps of: the method comprises the following specific steps:

s1: selecting a first glass substrate, and placing the first glass substrate in high-vacuum magnetron sputtering coating equipment, wherein the vacuum is set to be 2-3MPa, and the linear speed is 2.5-3.5 m/min;

s2: sputtering a first silicon nitride SiNx, a first zinc aluminum oxide ZnAlOx and a first aluminum silicon nitride SiAlNx on a first glass substrate in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment for sputtering layers is 80KW-100KW, 20KW-30KW and 5KW-10KW respectively;

s3: sputtering metal silver on the first nitrogen aluminum silicon SiAlNx in the step S2, wherein the power of the high vacuum magnetron sputtering coating equipment is 3KW-5 KW;

s4: sputtering second silicon nitride aluminum silicon SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx on the metal silver in the step S3 in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment of the sputtering layer is 5KW-10KW, 20KW-30KW and 80KW-100KW respectively, and then placing the sputtered glass in a hot press for preheating;

s5: covering the second glass substrate on the upper glass cover in the hot press in the step S4, performing hot-pressing and bonding, and taking out;

s6: and (5) brushing high-temperature liquid glass solution for one circle of the laminated glass formed in the step S5, performing edge sealing, and then performing off-line tempering.

5. The method for manufacturing the off-line high-transmittance clean-color low-emissivity coated glass according to claim 4, wherein the method comprises the following steps: the sputtering thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first aluminum silicon nitride SiAlNx are respectively about 70-80% of the thicknesses of the second silicon nitride SiNx, the second zinc aluminum oxide ZnAlOx and the second aluminum silicon nitride SiAlNx.

6. The method for manufacturing the off-line high-transmittance clean-color low-emissivity coated glass according to claim 4, wherein the method comprises the following steps: the sputtering direction in the step S4 is rotated 180 ° with respect to the sputtering direction in the step S2.

Technical Field

The invention relates to the technical field of low-emissivity tempered coated glass, in particular to off-line high-transmittance clean-color low-emissivity tempered coated glass and a manufacturing method thereof.

Background

The existing common transparent glass has wide application, the transmission range of the glass is just coincided with the solar radiation spectrum region, therefore, when visible light is transmitted, infrared heat energy in sunlight can also transmit a large amount of glass, and heat energy in an intermediate infrared band of 2.5-5um is absorbed by a large amount, for the heat radiation with the wavelength more than 5um emitted by the heater, the common glass can not directly transmit but almost completely absorb, and transfers the energy to the outside by conduction, radiation and convection with the air, so as to reduce the temperature in the room, in addition, common glass can not block ultraviolet rays, indoor furniture and fabrics are easy to fade, and at present, off-line high-transmittance low-emissivity coated glass is also provided, and consists of metal compound layers and metal layers with different thicknesses, which are generated by tin, Sn, silver, Ag, nickel, chromium, NiCr, silicon, Si or zinc, through a double-end off-line high-vacuum magnetron sputtering technology.

However, when sputtering the coating, thickness is difficult too big, sputtering effect is not good otherwise, sputtering is inhomogeneous, but need improve the effect of low radiation, often need sputter the same structural layer many times and reach its needs effect, because sputter the level becomes many, lead to its surface easily to be damaged, in case sputter the anomaly appears in sputtering in-process moreover, local sputtering poor problem of effect can appear, and under the same sputtering condition to same platform equipment, the probability that sputtering the problem appears in a position is higher relatively, if adopt multilayer sputtering, sputter the direction upset will cover the not good problem of sputtering.

Disclosure of Invention

The present invention is directed to solving, at least to some extent, one of the technical problems in the related art. Therefore, the invention aims to provide the off-line high-transmittance clean-color low-emissivity steel coated glass and the preparation method thereof, solve the problem that the coating is easy to damage after multi-layer sputtering, and ensure high transmittance of the coating to natural light.

The off-line high-transmittance clear-color low-radiation steel-coated glass provided by the invention comprises a first glass substrate and a second glass substrate, wherein the first glass substrate is sputtered with first silicon nitride SiNx, first zinc aluminum oxide ZnAlOx, first aluminum silicon nitride SiAlNx, metallic silver, second aluminum silicon nitride SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx in sequence, then the second glass substrate is hot-pressed on the second silicon nitride SiNx, a high-temperature liquid glass solution is coated on the periphery of the glass layer for edge sealing, and then off-line tempering is carried out.

In some embodiments of the invention, the first glass substrate and the second glass substrate have a thickness of 3-4mm and 1-2mm, respectively; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 30-50nm, 10-20nm and 15-20nm, the thickness of the metal silver is 10-20nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 20-30nm, 15-25nm and 40-60 nm.

In other embodiments of the present invention, the first glass substrate and the second glass substrate have a thickness of 3mm and 2mm, respectively; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 40nm, 15nm and 18nm, the thickness of the metal silver is 15nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 25nm, 20nm and 50 nm.

A manufacturing method of off-line high-transmittance clean-color low-radiation steel-coated glass comprises the following specific steps:

s1: selecting a first glass substrate, and placing the first glass substrate in high-vacuum magnetron sputtering coating equipment, wherein the vacuum is set to be 2-3MPa, and the linear speed is 2.5-3.5 m/min;

s2: sputtering a first silicon nitride SiNx, a first zinc aluminum oxide ZnAlOx and a first aluminum silicon nitride SiAlNx on a first glass substrate in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment for sputtering layers is 80KW-100KW, 20KW-30KW and 5KW-10KW respectively;

s3: sputtering metal silver on the first nitrogen aluminum silicon SiAlNx in the step S2, wherein the power of the high vacuum magnetron sputtering coating equipment is 3KW-5 KW;

s4: sputtering second silicon nitride aluminum silicon SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx on the metal silver in the step S3 in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment of the sputtering layer is 5KW-10KW, 20KW-30KW and 80KW-100KW respectively, and then placing the sputtered glass in a hot press for preheating;

s5: covering the second glass substrate on the upper glass cover in the hot press in the step S4, performing hot-pressing and bonding, and taking out;

s6: and (5) brushing high-temperature liquid glass solution for one circle of the laminated glass formed in the step S5, performing edge sealing, and then performing off-line tempering.

In other embodiments of the present invention, the first silicon nitride SiNx, first zinc aluminum oxide ZnAlOx, and first aluminum silicon nitride SiAlNx are sputtered to a thickness of about 70 to 80% of the thickness of the second silicon nitride SiNx, second zinc aluminum oxide ZnAlOx, and second aluminum silicon nitride SiAlNx, respectively.

In other embodiments of the present invention, the sputtering direction in the step S4 is rotated by 180 ° with respect to the sputtering direction in the step S2.

According to the invention, the sputtering layer is arranged between the laminated glasses, after tempering, the sputtering layer between the laminated glasses is not easy to damage, the service life of the sputtering layer is prolonged, and double sputtering is adopted, so that the radiation can be effectively isolated, and the laminated glass has high transmittance to natural light, wherein the transmittance is 85.2-87.3%.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.

An off-line high-transmittance clear-color low-radiation toughened coated glass comprises a first glass substrate and a second glass substrate, wherein first silicon nitride SiNx, first zinc aluminum oxide ZnAlOx, first aluminum silicon nitride SiAlNx, metal silver, second silicon nitride SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx are sputtered on the first glass substrate in sequence, then the second glass substrate is hot-pressed on the second silicon nitride SiNx, a high-temperature liquid glass solution is coated on the glass layer for edge sealing for one circle, and then off-line toughening is carried out.

Example 1

The thicknesses of the first glass substrate and the second glass substrate are respectively 3mm and 2 mm; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 40nm, 15nm and 18nm, the thickness of the metal silver is 15nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 25nm, 20nm and 50 nm.

A manufacturing method of off-line high-transmittance clean-color low-radiation steel-coated glass comprises the following specific steps:

s1: selecting a first glass substrate, and placing the first glass substrate in high-vacuum magnetron sputtering coating equipment, wherein the vacuum is set to be 2MPa, and the linear speed is 2.5 m/min;

s2: sputtering a first silicon nitride SiNx, a first zinc aluminum oxide ZnAlOx and a first nitrogen aluminum silicon SiAlNx on a first glass substrate in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment for sputtering layers is 80KW, 20KW and 5KW respectively;

s3: sputtering metal silver on the first nitrogen aluminum silicon SiAlNx in the step S2, wherein the power of the high-vacuum magnetron sputtering coating equipment is 3 KW;

s4: sputtering second silicon nitride aluminum silicon SiAlNx, second zinc aluminum oxide ZnAlOx and second silicon nitride SiNx on the metal silver in the step S3 in sequence, wherein the power of high-vacuum magnetron sputtering coating equipment of the sputtering layer is 5KW, 20KW and 80KW respectively, and then putting the sputtered glass into a hot press for preheating;

s5: covering the second glass substrate on the upper glass cover in the hot press in the step S4, performing hot-pressing and bonding, and taking out;

s6: and (5) brushing high-temperature liquid glass solution for one circle of the laminated glass formed in the step S5, performing edge sealing, and then performing off-line tempering.

Example 2

The thicknesses of the first glass substrate and the second glass substrate are respectively 4mm and 1 mm; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 30nm, 10nm and 15nm, the thickness of the metal silver is 10nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 20nm, 15nm and 40 nm.

The specific steps of the manufacturing method of the off-line high-transmittance clean-color low-radiation steel-coated glass are the same as those of the embodiment 1, and the differences are as follows:

s1: the vacuum is set to be 3MPa, and the linear velocity is 3.5 m/min;

s2: the power of the high-vacuum magnetron sputtering coating equipment for the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first nitrogen aluminum silicon SiAlNx sputtering layer is respectively 100KW, 30KW and 10 KW;

s3: the power of the high vacuum magnetron sputtering coating equipment for sputtering the metallic silver is 5 KW;

s4: the power of the high-vacuum magnetron sputtering coating equipment for sputtering the second metal silver, the second silicon nitride aluminum silicon SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx is 5KW, 10KW, 30KW and 100KW respectively.

Example 3

The thicknesses of the first glass substrate and the second glass substrate are respectively 3.5mm and 1.5 mm; the thicknesses of the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first silicon aluminum nitride SiAlNx are respectively 50nm, 20nm and 20nm, the thickness of the metal silver is 20nm, and the thicknesses of the second silicon aluminum nitride SiAlNx, the second zinc aluminum oxide ZnAlOx and the second silicon nitride SiNx are respectively 25nm, 25nm and 60 nm.

The specific steps of the manufacturing method of the off-line high-transmittance clean-color low-radiation steel-coated glass are the same as those of the embodiment 1, and the differences are as follows:

s1: the vacuum is set to be 2.5MPa, and the linear velocity is 3.0 m/min;

s2: the power of high vacuum magnetron sputtering coating equipment for the first silicon nitride SiNx, the first zinc aluminum oxide ZnAlOx and the first nitrogen aluminum silicon SiAlNx sputtering layer is respectively 90KW, 25KW and 8 KW;

s3: the power of the high vacuum magnetron sputtering coating equipment for sputtering the metallic silver is 4 KW;

s4: the power of the high vacuum magnetron sputtering coating equipment for sputtering the second metal silver, the second silicon nitride aluminum silicon SiAlNx, the second zinc oxide aluminum ZnAlOx and the second silicon nitride SiNx on the metal silver is 5KW, 90KW, 25KW and 90KW respectively.

The glass of examples 1-3 has a moderate color depth, can not only reflect infrared radiation, but also has the effects of heat insulation and energy saving, and has a high transmittance of 85.2-87.3% for natural light. The lifetime of the use of a sputtered layer is significantly longer than that of direct sputtering on a glass substrate.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.